JP2014122123A5 - - Google Patents
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- Publication number
- JP2014122123A5 JP2014122123A5 JP2012277817A JP2012277817A JP2014122123A5 JP 2014122123 A5 JP2014122123 A5 JP 2014122123A5 JP 2012277817 A JP2012277817 A JP 2012277817A JP 2012277817 A JP2012277817 A JP 2012277817A JP 2014122123 A5 JP2014122123 A5 JP 2014122123A5
- Authority
- JP
- Japan
- Prior art keywords
- solution
- silicic acid
- silica sol
- concentration
- purity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims 10
- 239000000243 solution Substances 0.000 claims 7
- 235000012239 silicon dioxide Nutrition 0.000 claims 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 230000002378 acidificating effect Effects 0.000 claims 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims 3
- 239000007788 liquid Substances 0.000 claims 3
- 238000005498 polishing Methods 0.000 claims 3
- 239000012527 feed solution Substances 0.000 claims 2
- 238000005342 ion exchange Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 239000013522 chelant Substances 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 150000002391 heterocyclic compounds Chemical class 0.000 claims 1
- 239000003456 ion exchange resin Substances 0.000 claims 1
- 229920003303 ion-exchange polymer Polymers 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000003002 pH adjusting agent Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012277817A JP6047395B2 (ja) | 2012-12-20 | 2012-12-20 | 高純度シリカゾルおよびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012277817A JP6047395B2 (ja) | 2012-12-20 | 2012-12-20 | 高純度シリカゾルおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014122123A JP2014122123A (ja) | 2014-07-03 |
| JP2014122123A5 true JP2014122123A5 (https=) | 2015-11-05 |
| JP6047395B2 JP6047395B2 (ja) | 2016-12-21 |
Family
ID=51402969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012277817A Active JP6047395B2 (ja) | 2012-12-20 | 2012-12-20 | 高純度シリカゾルおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6047395B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102611733B1 (ko) * | 2015-10-20 | 2023-12-11 | 닛산 가가쿠 가부시키가이샤 | 정제된 규산수용액의 제조방법 |
| CN111186840B (zh) * | 2020-01-17 | 2022-09-23 | 山东百特新材料有限公司 | 一种提高硅溶胶颗粒球形度的方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3463328B2 (ja) * | 1992-09-25 | 2003-11-05 | 日産化学工業株式会社 | 酸性シリカゾルの製造方法 |
| JP4643085B2 (ja) * | 2001-09-19 | 2011-03-02 | 日本化学工業株式会社 | 研磨剤用高純度コロイダルシリカの製造方法 |
| JP4566645B2 (ja) * | 2003-07-25 | 2010-10-20 | 扶桑化学工業株式会社 | シリカゾル及びその製造方法 |
| JP4011566B2 (ja) * | 2003-07-25 | 2007-11-21 | 扶桑化学工業株式会社 | シリカゾル及びその製造方法 |
| JP4580674B2 (ja) * | 2004-04-13 | 2010-11-17 | 裕子 石栗 | 微細な高純度金属酸化物の製造方法 |
| JP2006104354A (ja) * | 2004-10-06 | 2006-04-20 | Nippon Chem Ind Co Ltd | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 |
| JP5398963B2 (ja) * | 2007-04-23 | 2014-01-29 | 日本化学工業株式会社 | 低ナトリウムで非球状のコロイダルシリカ |
| JP5464834B2 (ja) * | 2008-10-14 | 2014-04-09 | 日揮触媒化成株式会社 | 研磨用シリカゾル、研磨用組成物および研磨用シリカゾルの製造方法 |
-
2012
- 2012-12-20 JP JP2012277817A patent/JP6047395B2/ja active Active
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