JP2014116403A5 - - Google Patents
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- JP2014116403A5 JP2014116403A5 JP2012268340A JP2012268340A JP2014116403A5 JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5 JP 2012268340 A JP2012268340 A JP 2012268340A JP 2012268340 A JP2012268340 A JP 2012268340A JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5
- Authority
- JP
- Japan
- Prior art keywords
- detection
- mark
- reference member
- exposure
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001514 detection method Methods 0.000 claims description 69
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims 8
- 238000005259 measurement Methods 0.000 claims 7
- 238000007654 immersion Methods 0.000 claims 6
- 238000005286 illumination Methods 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012268340A JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012268340A JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014116403A JP2014116403A (ja) | 2014-06-26 |
| JP2014116403A5 true JP2014116403A5 (OSRAM) | 2015-12-03 |
| JP6102230B2 JP6102230B2 (ja) | 2017-03-29 |
Family
ID=51172120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012268340A Active JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6102230B2 (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10802407B2 (en) * | 2015-09-30 | 2020-10-13 | Nikon Corporation | Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1068604A (ja) * | 1996-08-27 | 1998-03-10 | Canon Inc | 光干渉計測方法およびそれを用いた光干渉計測装置 |
| EP1570232B1 (en) * | 2002-12-05 | 2016-11-02 | KLA-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| JP5115859B2 (ja) * | 2006-02-21 | 2013-01-09 | 株式会社ニコン | パターン形成装置、露光装置及び露光方法、並びにデバイス製造方法 |
| EP3267259A1 (en) * | 2006-02-21 | 2018-01-10 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| TWI622084B (zh) * | 2006-09-01 | 2018-04-21 | Nikon Corp | Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method |
| SG168488A1 (en) * | 2009-07-16 | 2011-02-28 | Asml Netherlands Bv | Position calibration of alignment heads in a multi-head alignment system |
| NL2005092A (en) * | 2009-07-16 | 2011-01-18 | Asml Netherlands Bv | Object alignment measurement method and apparatus. |
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2012
- 2012-12-07 JP JP2012268340A patent/JP6102230B2/ja active Active
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