JP2014079865A - Polishing method - Google Patents

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JP2014079865A
JP2014079865A JP2012230823A JP2012230823A JP2014079865A JP 2014079865 A JP2014079865 A JP 2014079865A JP 2012230823 A JP2012230823 A JP 2012230823A JP 2012230823 A JP2012230823 A JP 2012230823A JP 2014079865 A JP2014079865 A JP 2014079865A
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polishing
composite material
synthetic fiber
buff
ultra
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JP6021577B2 (en
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Takayuki Yamashita
孝幸 山下
Hiroyuki Kawato
博之 川戸
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Mitsubishi Heavy Industries Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a polishing method by which a composite material composed of materials having greatly different hardness can be smoothly polished.SOLUTION: There is provided the polishing method of a composite material composed of a super low hardness material which is a base material, and a super high hardness material. The polishing method comprises: a precision polishing step S20 of polishing the composite material with a ceramic-based abrasive disc by spraying diamond abrasive grains onto the surface of the ceramic-based abrasive disc; a preliminary burnishing step S30 of burnishing the composite material with a first synthetic fiber-based buff while supplying the diamond abrasive grains onto the surface of the first synthetic fiber-based buff after the precision polishing step S20; and a burnishing step S40 of burnishing the composite material with a second synthetic fiber-based buff having lower elasticity than that of the first synthetic fiber-based buff while supplying oxide abrasives onto the surface of the second synthetic fiber-based buff after the preliminary burnishing step.

Description

本発明は、複合材の研磨方法に関する。   The present invention relates to a method for polishing a composite material.

一般的に、材料の表面組織を評価する方法として光学顕微鏡や電子顕微鏡を使用して観察する方法が広く知られている。光学顕微鏡や電子顕微鏡によって金属材料の試料を組織観察する際には、正確な観察を行うために試料の観察面は鏡面となるまで、微視的に確認しても極めて平坦となるように研磨をする必要がある。研磨方法には、観察する対象や観察が必要とする精度によって様々な方法が用いられており、例えば、化学的な反応によって加工した表面を溶かしていく化学研磨や、加工する対象の表面を電気的な力で溶かしていく電解研磨、回転研磨機を使ってダイヤモンドなどの砥粒とともに表面を磨く機械研磨などが挙げられる。   In general, as a method for evaluating the surface structure of a material, a method of observing using an optical microscope or an electron microscope is widely known. When observing the structure of a metal material sample with an optical microscope or an electron microscope, the surface of the sample is polished to a mirror surface so that it can be accurately observed even if microscopically confirmed. It is necessary to do. Various polishing methods are used depending on the object to be observed and the accuracy required for the observation. For example, chemical polishing in which the surface processed by chemical reaction is melted, or the surface to be processed is electrically charged. Electrolytic polishing that melts with a specific force, and mechanical polishing that polishes the surface together with abrasive grains such as diamond using a rotary polishing machine.

研磨方法の一つである電解研磨は、電子顕微鏡による表面組織の観察を行う場合に試料を研磨するために用いられる。電子顕微鏡では、電解研磨にて表面を平坦に加工した後にエッチングを行い試料の組織を浮き出させる方法が用いられている。電子顕微鏡による表面組織の評価に用いる試料の研磨方法としては、例えば特許文献1に記載の方法が開示されている。   Electropolishing, which is one of the polishing methods, is used to polish a sample when observing a surface structure with an electron microscope. In an electron microscope, a method is used in which a surface of a sample is raised by etching after processing the surface to be flat by electrolytic polishing. As a polishing method of a sample used for evaluation of a surface structure by an electron microscope, for example, a method described in Patent Document 1 is disclosed.

特許文献1に記載の方法では、電解研磨を途中で一旦停止し、エッチングを行って金属組織を露呈させ、その後電解研磨を再開する。これにより、透過電子顕微鏡や走査電子顕微鏡で観察可能となるだけでなく、同じ試料を光学顕微鏡での観察にも用いることができるとされている。   In the method described in Patent Document 1, electrolytic polishing is temporarily stopped in the middle, etching is performed to expose the metal structure, and then electrolytic polishing is resumed. Thereby, it is said that not only can the observation be performed with a transmission electron microscope or a scanning electron microscope, but the same sample can also be used for observation with an optical microscope.

特開昭58−33150号公報JP 58-33150 A

ところで、光学顕微鏡による観察に用いられる試料の研磨方法としては、回転研磨機を使用する機械研磨が用いられる。この機械研磨は、研磨工程と琢磨工程とから構成される。前者の研磨工程は、ダイヤモンド砥粒などで固めた砥石を用いて表面の凹凸を徐々に平坦にする工程である。また、後者の琢磨工程は、砥石よりも柔らかく様々な材料で形成されるバフを用いて表面の微細な凹凸を除去することで光沢を出す工程である。   By the way, as a method for polishing a sample used for observation with an optical microscope, mechanical polishing using a rotary polishing machine is used. This mechanical polishing is composed of a polishing step and a polishing step. The former polishing step is a step of gradually flattening the surface irregularities using a grindstone hardened with diamond abrasive grains or the like. The latter polishing step is a step for producing gloss by removing fine irregularities on the surface using buffs made of various materials that are softer than a grindstone.

しかしながら、従来用いられる機械研磨では同程度の硬度を有する材料を対象とした研磨方法しか存在していない。そのため、例えば、硬度の大きく異なる材料で構成された複合材を、硬度の低い材料に合わせて研磨すると、研磨剤が柔らかすぎて硬度の高い材料を研磨することができない。
一方、図4の光学顕微鏡による写真に示すように、硬度の高い材料に合わせて研磨すると、研磨剤が硬すぎて硬度の低い材料に研磨剤が埋没してしまう。そのため、観察対象と研磨剤が混在してしまい観察対象が判別できず観察をすることができない。
また、図5の光学顕微鏡による写真に示すように、研磨剤の埋没を防止するために、弾力のあるバフを用いて研磨すると、研磨剤の埋没は防止できるが硬度の高い材料の周辺の硬度の低い材料が深く削られてしまう。そのため、硬度の高い材料の輪郭が観察できなくなり正確な観察ができない。このように、硬度の大きく異なる材料で構成された複合材について研磨を行うと、平滑に研磨ができず正確な観察をすることができないという問題を有している。
However, in the conventional mechanical polishing, there is only a polishing method for a material having the same degree of hardness. Therefore, for example, when a composite material composed of materials with greatly different hardnesses is polished according to a material with low hardness, the abrasive is too soft to polish a material with high hardness.
On the other hand, as shown in the photograph by the optical microscope of FIG. 4, when polishing is performed according to a material having high hardness, the polishing agent is too hard and the polishing agent is buried in the material having low hardness. For this reason, the observation object and the abrasive are mixed, and the observation object cannot be distinguished and cannot be observed.
In addition, as shown in the photograph by the optical microscope in FIG. 5, when polishing is performed using a resilient buff to prevent the burying of the abrasive, the burying of the abrasive can be prevented, but the hardness around the high hardness material. The low material is cut deeply. Therefore, the outline of the material with high hardness cannot be observed and accurate observation cannot be performed. As described above, when a composite material composed of materials having greatly different hardnesses is polished, there is a problem in that the polishing cannot be performed smoothly and accurate observation cannot be performed.

本発明は、上記課題を解決するためになされたものであって、硬度の大きく異なる材料で構成された複合材を平滑に研磨することが可能な研磨方法を提供するものである。   The present invention has been made to solve the above-described problems, and provides a polishing method capable of smoothly polishing a composite material made of materials having greatly different hardnesses.

上記課題を解決するために、本発明は以下の手段を提案している。
本発明の一態様に係る研磨方法は、母材である超低硬度材と超高硬度材とからなる複合材の研磨方法であって、セラミック系研磨ディスクの表面にダイヤモンド砥粒を吹き付けて前記セラミック系研磨ディスクで前記複合材を研磨する精研磨工程と、該精研磨工程の後に、第一合成繊維系バフの表面にダイヤモンド砥粒を供給しながら前記第一合成繊維系バフで前記複合材を琢磨する予備琢磨工程と、該予備琢磨工程の後に、前記第一合成繊維系バフよりも弾性の小さい第二合成繊維系バフの表面に酸化物研磨剤を供給しながら前記第二合成繊維系バフで前記複合材を琢磨する琢磨工程と、を備えることを特徴とする。
In order to solve the above problems, the present invention proposes the following means.
A polishing method according to an aspect of the present invention is a polishing method for a composite material composed of an ultra-low hardness material and an ultra-high hardness material, which are base materials, and the diamond abrasive grains are sprayed on the surface of a ceramic polishing disk. A fine polishing step of polishing the composite material with a ceramic polishing disk, and the composite material with the first synthetic fiber buff while supplying diamond abrasive grains to the surface of the first synthetic fiber buff after the fine polishing step A preliminary polishing step of polishing the second synthetic fiber system after the preliminary polishing step while supplying an oxide abrasive to the surface of the second synthetic fiber system buff having a lower elasticity than the first synthetic fiber system buff And a polishing step of polishing the composite material with a buff.

このような構成によれば、まず、精研磨工程によって、ダイヤモンド砥粒と弾性が低く硬度の高いセラミック系研磨ディスクで長時間にわたって研磨することで、僅かなダイヤモンド砥粒によって効率的に超高硬度材を研磨することができる。次に、予備琢磨工程によって、第一合成繊維系バフを用いて琢磨することで、ダイヤモンド砥粒が超低硬度材を研磨する際に第一合成繊維系バフが撓み、超低硬度材の表面に強く押し付けられることなく研磨される。一方、超高硬度材が簡単に削れないほど固いため、超高硬度材の表面では撓んでもダイヤモンド砥粒を押し付けながら研磨される。そのため、ダイヤモンド砥粒を供給しても超低硬度材にダイヤモンド砥粒がほとんど埋没することなく超高硬度材を研磨することが可能となる。そして、琢磨工程によって、酸化物研磨剤を使用して琢磨することで、化学研磨が行なわれ超高硬度材の表面の小さな凹凸を除去し平滑な状態にすることができる。一方、酸化物研磨材は、ダイヤモンド砥粒よりも硬度が低く、粒径が小さく角の少ない形状の粒子で構成されているため、第一合成繊維系バフよりも弾性の小さい第二合成繊維系バフと合わせて琢磨することで、超低硬度材の表面に押し付けながら研磨しても埋没することなく、僅かに埋没しているダイヤモンド砥粒を除去しながら凹凸を除去することが可能となる。これらの精研磨工程から琢磨工程まで実施することで、硬度の大きく異なる材料で構成された複合材を平滑に研磨することが可能となる。   According to such a configuration, first, the diamond abrasive grains and a low-elasticity, high-hardness ceramic polishing disc are polished over a long period of time by a fine polishing process, so that ultra-high hardness can be efficiently achieved with few diamond abrasive grains. The material can be polished. Next, by polishing using the first synthetic fiber system buff in the preliminary polishing process, when the diamond abrasive grinds the ultra low hardness material, the first synthetic fiber system buff is bent, and the surface of the ultra low hardness material It is polished without being strongly pressed against. On the other hand, since the ultra-high hardness material is so hard that it cannot be easily cut, the surface of the ultra-high hardness material is polished while pressing the diamond abrasive grains even if it is bent. Therefore, even if diamond abrasive grains are supplied, it is possible to polish the ultra-high hardness material with almost no diamond abrasive grains embedded in the ultra-low hardness material. And by polishing using an oxide abrasive | polishing agent by a polishing process, chemical polishing is performed and the small unevenness | corrugation of the surface of a super-hard material can be removed, and it can be made into a smooth state. On the other hand, the oxide abrasive is composed of particles having a shape lower in hardness and smaller in diameter than that of diamond abrasive grains, so that the second synthetic fiber system is less elastic than the first synthetic fiber system buff. By polishing together with the buff, it is possible to remove the irregularities while removing the slightly buried diamond abrasive grains without being buried even if it is polished while being pressed against the surface of the ultra-low hardness material. By carrying out from these fine polishing steps to the polishing step, it becomes possible to smoothly polish a composite material composed of materials having greatly different hardnesses.

また、本発明の他の態様に係る研磨方法は、前記琢磨工程の後に、前記第一合成繊維系バフよりも弾性の高い第三合成繊維系バフで前記複合材を琢磨する仕上工程を備えることを特徴とする。   Further, the polishing method according to another aspect of the present invention includes a finishing step of polishing the composite material with a third synthetic fiber buff having higher elasticity than the first synthetic fiber buff after the polishing step. It is characterized by.

このような構成によれば、仕上工程によって第一合成繊維系バフよりも弾性の高い第三合成繊維系バフの表面にダイヤモンド砥粒を用いて琢磨することで、ダイヤモンド砥粒を超低硬度材の表面に埋没させることなく、僅かな時間でも超低硬度材の表面を容易により平滑にすることが可能となる。   According to such a configuration, the diamond abrasive grains are polished on the surface of the third synthetic fiber buff having higher elasticity than the first synthetic fiber buff by a finishing process using the diamond abrasive grains, thereby making the diamond abrasive grains an ultra-low hardness material. The surface of the ultra-low hardness material can be easily smoothed even in a short time without being buried in the surface.

さらに、本発明の他の態様に係る研磨方法は、前記精研磨工程の前に、砥石で前記複合材の表面を平面とする面出工程を備えることを特徴とする。   Furthermore, the polishing method according to another aspect of the present invention is characterized by including a chamfering step in which the surface of the composite material is flattened with a grindstone before the fine polishing step.

このような構成によれば、複合材の表面に凹凸や大きな傷による歪みや変質している部分があった場合でも、精研磨工程が開始される前に面出工程によって事前に除去し平面とすることで、精研磨工程等で複合材の表面とセラミック系研磨ディスク等とを均一に接するようにすることができ、精度の高い平面を形成し易くなる。これにより、精研磨工程以降の工程で、容易に複合材の表面を鏡面に仕上げることが可能となる。   According to such a configuration, even if there are unevenness or large scratches or altered parts on the surface of the composite material, the surface of the composite material is removed in advance by the surface forming process before the fine polishing process is started. By doing so, the surface of the composite material and the ceramic polishing disk or the like can be uniformly contacted in a fine polishing step or the like, and a highly accurate plane can be easily formed. This makes it possible to easily finish the surface of the composite material into a mirror surface in the steps after the fine polishing step.

本発明の研磨方法によれば、精研磨工程から琢磨工程までを実施することで、硬度の大きく異なる材料で構成された複合材を平滑に研磨することが可能な研磨方法を提供するものである。   According to the polishing method of the present invention, it is possible to provide a polishing method capable of smoothly polishing a composite material composed of materials having greatly different hardnesses by performing from the fine polishing step to the polishing step. .

本発明の実施形態に係る研磨方法の工程を説明するフローチャートである。It is a flowchart explaining the process of the grinding | polishing method which concerns on embodiment of this invention. 本発明の実施形態に係る研磨方法の工程毎の試料表面の様子を説明する模式図である。It is a schematic diagram explaining the mode of the sample surface for every process of the grinding | polishing method which concerns on embodiment of this invention. 本発明の研磨方法で作成した試料表面を光学顕微鏡によって100倍にした写真図である。It is the photograph figure which made the sample surface created with the grinding | polishing method of this invention 100 times with the optical microscope. 従来の超高硬度材に合わせた研磨方法で作成した試料表面を光学顕微鏡によって100倍にした写真図である。It is the photograph figure which made the sample surface created with the grinding | polishing method match | combined with the conventional ultra-high hardness material 100 times with the optical microscope. 従来の超高硬度材に合わせた埋没を防ぐ研磨方法で作成した試料表面を光学顕微鏡によって100倍にした写真図である。It is the photograph figure which made the sample surface created with the grinding | polishing method which prevents the burial | deburring matched with the conventional ultra-high hardness material 100 times with the optical microscope.

以下、図1及び図2を参照し、本実施形態に係る複合材1の研磨成方法について説明する。
本実施形態の研磨方法は、超低硬度材11であるアルミニウムと超高硬度材12であるボロンカーバイト(B4C)が混在している複合材1を光学顕微鏡で観察可能とするように表面を鏡面となるまで研磨される試料の作成に用いられる。
複合材1は、母材として超低硬度材11であるアルミニウムを有し、アルミニウム中に超高硬度材12であるボロンカーバイトの粒子が混在するように硬度の大きく異なった二種の材料で構成された材料である。
超低硬度材11であるアルミニウムは、非常に柔らかく展性の高い金属であり、ビッカース硬さが約50HV程度である。
超高硬度材12であるボロンカーバイトは、研磨剤として使用されることもあるセラミックで、ダイヤモンドに次ぐ高い高度を有し、そのビッカース硬さは約2000HV程度である。
Hereinafter, with reference to FIG.1 and FIG.2, the grinding | polishing method of the composite material 1 which concerns on this embodiment is demonstrated.
The polishing method of the present embodiment is such that the surface of the composite material 1 in which aluminum as the ultra-low hardness material 11 and boron carbide (B4C) as the ultra-high hardness material 12 are mixed can be observed with an optical microscope. Used to create a sample that is polished to a mirror surface.
The composite material 1 has two kinds of materials having extremely different hardness so that the base material includes aluminum which is an ultra-low hardness material 11 and particles of boron carbide which is an ultra-high hardness material 12 are mixed in the aluminum. It is a structured material.
Aluminum which is the ultra-low hardness material 11 is a very soft and highly malleable metal and has a Vickers hardness of about 50 HV.
Boron carbide, which is an ultra-hard material 12, is a ceramic that may be used as an abrasive, has a high altitude after diamond, and has a Vickers hardness of about 2000 HV.

図1に示すように、本実施形態の研磨方法は、複合材1の表面を平面に切削するよう研磨する面出工程S10と、超高硬度材12の表面を粗削りするよう研磨する精研磨工程S20と、超低硬度材11の表面を粗削りするよう琢磨する予備琢磨工程S30と、超高硬度材12の表面を鏡面とするよう琢磨する琢磨工程S40と、超低硬度材11の表面を鏡面とするよう琢磨する仕上工程S50とを備える。   As shown in FIG. 1, the polishing method of the present embodiment includes a surface forming step S <b> 10 for polishing the surface of the composite material 1 to be cut into a flat surface, and a fine polishing step for polishing the surface of the ultrahigh hardness material 12 for rough cutting. S20, a preliminary polishing step S30 for polishing the surface of the ultra-low hardness material 11 to rough cut, a polishing step S40 for polishing the surface of the ultra-high hardness material 12 as a mirror surface, and the surface of the ultra-low hardness material 11 as a mirror surface And finishing step S50 for polishing.

面出工程S10は、冷却材として循環水を用いてダイヤモンド砥粒で固めた砥石を回転研磨機に設置し、複合材1の表面を切削するよう研磨する。面出工程S10を開始する前から複合材1の表面にある視認できる非常に大きな凹凸や傷、及び、変質している部分を除去し、砥石と均一に接触するような平面と複合材1の表面がなった段階で面出工程S10を終了する。   In the surface forming step S <b> 10, a grindstone hardened with diamond abrasive grains using circulating water as a coolant is placed in a rotary polishing machine and polished so as to cut the surface of the composite material 1. Before starting the chamfering step S10, a very large unevenness and scratches on the surface of the composite material 1 that can be visually recognized, and a part that has deteriorated are removed, and a flat surface that makes uniform contact with the grindstone and the composite material 1 At the stage when the surface is finished, the surface forming step S10 is completed.

精研磨工程S20は、面出工程S10を実施後に、冷却材として水道水を用いて弾性の低く硬いセラミック系研磨ディスクを回転研磨機に設置し、複合材1の表面を研磨する。砥粒には粒径9μmのダイヤモンド砥粒を使用し、精研磨工程S20開始前にのみセラミック系研磨ディスクに吹き付けて研磨する。なお、ダイヤモンド砥粒の粒径は9μmに限られず、例えば9〜15μmの粒径のものを使用しても良い。
研磨時間は30分以上とし、面出工程S10の生じた視認できる傷を除去し、次工程である予備琢磨工程S30以降で除去できる程度の僅かな傷が残った面を形成する。
In the fine polishing step S20, the surface of the composite material 1 is polished by setting a hard, low-elasticity ceramic polishing disc in a rotary polishing machine using tap water as a coolant, after performing the capping step S10. As the abrasive grains, diamond abrasive grains having a particle diameter of 9 μm are used, and are polished by spraying on the ceramic polishing disk only before the start of the fine polishing step S20. In addition, the particle diameter of a diamond abrasive grain is not restricted to 9 micrometers, For example, you may use the thing of a 9-15 micrometers particle diameter.
The polishing time is set to 30 minutes or longer, and the visible scratches generated in the chamfering step S10 are removed, and a surface with slight scratches that can be removed after the preliminary polishing step S30, which is the next step, is formed.

予備琢磨工程S30は、精研磨工程S20を実施後に、冷却材としてアルコール系潤滑剤であるルーブリカントを用いて、ポリエステル織布で形成された第一合成繊維系バフを回転研磨機に設置し、複合材1の表面を琢磨する。砥粒には粒径9μmのダイヤモンド砥粒を使用し、アルコール系潤滑剤と共に第一合成繊維系バフが乾かないように供給し続けながら琢磨する。なお、上記同様、ダイヤモンド砥粒の粒径は9μmに限られず、例えば6〜9μmの粒径のものを使用しても良い。
琢磨時間は30分以上とし、精研磨工程S20で生じた僅かな傷を除去し、次工程である琢磨工程S40以降で除去できる程度に表面が曇った均一な面を形成する。
In the preliminary polishing step S30, after carrying out the fine polishing step S20, the first synthetic fiber buff formed of a polyester woven fabric is installed in a rotary polishing machine using a lubricant which is an alcohol-based lubricant as a coolant. Polish the surface of the composite 1. As the abrasive grains, diamond abrasive grains having a particle diameter of 9 μm are used and polished while continuing to supply the alcohol-based lubricant so that the first synthetic fiber buff does not dry. As described above, the diameter of the diamond abrasive grains is not limited to 9 μm, and for example, a grain having a particle diameter of 6 to 9 μm may be used.
The polishing time is set to 30 minutes or longer, and slight scratches generated in the fine polishing step S20 are removed, and a uniform surface with a cloudy surface is formed to such an extent that it can be removed in the subsequent polishing step S40.

琢磨工程S40は、予備琢磨工程S30を実施後に、ポリエステル織布で形成された第一合成繊維系バフよりも弾性の小さいナイロン系織布で形成された第二合成繊維系バフを回転研磨機に設置し、複合材1の表面を琢磨する。砥粒にはコロイダルシリカ系の酸化物研磨剤を使用し、供給し続けながら琢磨する。琢磨時間は30分以上60分以内とし、予備琢磨工程S30で生じた曇りが低減され、次工程である仕上工程S50以降で鏡面とできる程度に表面が僅かにくすみのある面を形成する。
コロイダルシリカ系の酸化物研磨剤は、硬度がダイヤモンド砥粒よりも低く、粒径が数十nmと小さく、角の少ない形状の粒子を有機溶媒に安定的に分散させて構成されており、有機溶媒によって化学反応も生じることで化学研磨としての効果も有する。
In the polishing step S40, after the preliminary polishing step S30, the second synthetic fiber buff formed of a nylon woven fabric having a lower elasticity than the first synthetic fiber buff formed of a polyester woven fabric is used as a rotary polishing machine. Install and polish the surface of the composite 1. Colloidal silica-based oxide abrasive is used for the abrasive grains, and polishing is continued while being supplied. The polishing time is 30 minutes or more and 60 minutes or less, the fogging generated in the preliminary polishing step S30 is reduced, and a surface with a slight dullness is formed to the extent that it can be a mirror surface in the subsequent finishing step S50.
Colloidal silica-based oxide abrasives have a hardness lower than that of diamond abrasive grains, a particle size as small as several tens of nanometers, and are formed by stably dispersing particles having a small angle in an organic solvent. A chemical reaction is also caused by the solvent, thereby providing an effect as chemical polishing.

仕上工程S50は、琢磨工程S40を実施後に、冷却材として予備琢磨工程S30と同じアルコール系潤滑剤であるルーブリカントを用いて、第一合成繊維系バフよりも弾性の大きい起毛した柔らかな織布で形成された第三合成繊維系バフを回転研磨機に設置し、複合材1の表面を琢磨する。砥粒には粒径1μmのダイヤモンド砥粒を使用し、アルコール系潤滑剤と共に第一合成繊維系バフが乾かないように供給し続けながら琢磨する。なお、ダイヤモンド砥粒の粒径は1μmに限られず、例えば、0.25〜1μmの粒径のものを用いても良い。
琢磨時間は5分以内とし、表面が鏡面となるまで琢磨する。
In the finishing step S50, after performing the polishing step S40, using a lubricant that is the same alcohol lubricant as the pre-polishing step S30 as a coolant, a raised soft woven cloth having higher elasticity than the first synthetic fiber buff The third synthetic fiber buff formed in step 1 is installed in a rotary polishing machine, and the surface of the composite material 1 is polished. As the abrasive grains, diamond grains having a particle diameter of 1 μm are used and polished while continuing to supply the first synthetic fiber buff together with the alcohol-based lubricant so as not to dry. In addition, the particle diameter of a diamond abrasive grain is not restricted to 1 micrometer, For example, you may use the thing of a particle diameter of 0.25-1 micrometer.
The polishing time is 5 minutes or less, and polishing is performed until the surface becomes a mirror surface.

次に、各工程実施後の複合材1の表面の状態について説明する。
図2(a)に示すように、面出工程S10を実施前の複合材1の表面は微視的に確認すると、母材であるアルミニウムの面が大きく波うち、さらに大きな傷がある状態となっている。また、混在するボロンカーバイトは母材であるアルミニウムの表面に対して埋没したり突出したりと均一な状態ではない。巨視的に確認しても大きな傷や変形が視認できる状態となっている。そのため、この状態では、回転研磨機に研磨ディスクやバフを設置しても複合材1の表面に対して均一に接触させることができず、研磨しても正確な観察に適した平面を形成できない。
Next, the state of the surface of the composite material 1 after each process will be described.
As shown in FIG. 2 (a), when the surface of the composite material 1 before performing the chamfering step S10 is microscopically confirmed, the surface of the aluminum, which is the base material, is greatly waved, and there is a larger scratch. It has become. In addition, the mixed boron carbide is not in a uniform state such as being buried or protruding from the surface of aluminum as a base material. Even when confirmed macroscopically, large scratches and deformations are visible. Therefore, in this state, even if a polishing disk or buff is installed in the rotary polishing machine, it cannot be brought into uniform contact with the surface of the composite material 1, and even if it is polished, a plane suitable for accurate observation cannot be formed. .

図2(b)に示すように、面出工程S10を実施後の複合材1の表面を微視的に確認すると、母材であるアルミニウムの表面とボロンカーバイトの表面には大きな凹凸が残っており荒れているものの、一様な面を形成しており巨視的に確認すると平面を形成している。   As shown in FIG. 2 (b), when the surface of the composite material 1 after performing the chamfering step S10 is microscopically confirmed, large irregularities remain on the surface of the base material aluminum and the surface of the boron carbide. Although it is rough, it forms a uniform surface, and forms a flat surface when confirmed macroscopically.

図2(c)に示すように、精研磨工程S20を実施後の複合材1の表面を微視的に確認すると、母材であるアルミニウムの表面には大きな凹凸が残り精研磨工程S20前と比較しても荒れ具合が僅かに改善された程度の状態に留まっている。一方、ボロンカーバイトの表面には大きな凹凸は残っておらず、アルミニウムよりも荒れ具合が改善されている状態となっている。巨視的に確認すると複合材1の表面は僅かな傷が残った面となっている。   As shown in FIG. 2 (c), when the surface of the composite material 1 after the fine polishing step S20 is microscopically confirmed, large irregularities remain on the surface of the aluminum, which is the base material, before the fine polishing step S20. Even in comparison, the degree of roughening remains slightly improved. On the other hand, no large irregularities remain on the surface of the boron carbide, and the roughness is improved compared to aluminum. When confirmed macroscopically, the surface of the composite material 1 is a surface on which slight scratches remain.

図2(d)に示すように、予備琢磨工程S30を実施後の複合材1の表面を微視的に確認すると、母材であるアルミニウムの表面には大きな凹凸は残っておらず荒れ具合がさらに改善している状態となっている。さらに、ボロンカーバイトの表面には、小さな凹凸しか存在せず、荒れ具合もより一層改善している状態となっている。巨視的に確認すると複合材1の表面は曇った均一な面となっている。   As shown in FIG. 2D, when the surface of the composite material 1 after the preliminary polishing step S30 is microscopically confirmed, there is no large unevenness on the surface of the aluminum, which is the base material, and the roughness is not high. The situation is further improved. Furthermore, there are only small irregularities on the surface of the boron carbide, and the roughness is further improved. When confirmed macroscopically, the surface of the composite material 1 is a cloudy and uniform surface.

図2(e)に示すように、琢磨工程S40を実施後の複合材1の表面を微視的に確認すると、母材であるアルミニウムの表面には小さな凹凸しか存在せず荒れ具合がより一層改善している状態となっている。さらに、ボロンカーバイトの表面には、小さな凹凸もほぼ存在せず、荒れが改善された状態となっている。巨視的に確認すると複合材1の表面は僅かにくすみのある面となっている。   As shown in FIG. 2 (e), when the surface of the composite material 1 after the polishing step S40 is microscopically confirmed, only a small unevenness exists on the surface of the aluminum that is the base material, and the degree of roughness is further increased. It is in an improved state. Further, the surface of the boron carbide is almost free of small irregularities, and the roughness is improved. When confirmed macroscopically, the surface of the composite 1 is a slightly dull surface.

図2(f)に示すように、仕上工程S50を実施後の複合材1の表面を微視的に確認すると、母材であるアルミニウムの表面には小さな凹凸もほぼ存在せず、荒れが改善された状態となっている。さらに、ボロンカーバイトの表面も前工程の時点で、荒れが改善された状態となっている。巨視的に確認すると複合材1の表面は鏡面となっている。
このような状態で光学顕微鏡を用いて複合材1の表面を観察すると、図3の光学顕微鏡による写真に示すように、超低硬度材11に研磨剤が埋没することなく、超高硬度材12の輪郭を明瞭に観察することが可能となる。
As shown in FIG. 2 (f), when the surface of the composite material 1 after the finishing step S50 is microscopically confirmed, there is almost no small unevenness on the surface of the aluminum that is the base material, and the roughness is improved. It has become a state. Furthermore, the surface of the boron carbide is in a state in which the roughness is improved at the time of the previous process. When confirmed macroscopically, the surface of the composite 1 is a mirror surface.
When the surface of the composite material 1 is observed using an optical microscope in such a state, the ultrahigh hardness material 12 is not buried in the ultralow hardness material 11 as shown in the photograph by the optical microscope of FIG. It becomes possible to clearly observe the outline of.

上記のような研磨方法によれば、面出工程S10によって複合材1の表面にある凹凸や大きな傷による歪みや変質している部分を事前に除去し、研磨ディスクやバフと均一に接触させることができる平面とすることで、精研磨工程S20以降の工程で正確に研磨・琢磨することができ、精度の高い平面を形成し易くなる。これにより、精研磨工程S20以降の工程で、容易に複合材1の表面を鏡面に仕上げることが可能となる。   According to the polishing method as described above, the unevenness on the surface of the composite material 1 and the distortion or altered part due to the large scratches are removed in advance by the surface forming step S10, and the contact with the polishing disk or buff is made uniform. By using a flat surface that can be polished, it is possible to accurately polish and polish in the steps after the fine polishing step S20, and it is easy to form a highly accurate flat surface. Thereby, it becomes possible to finish the surface of the composite material 1 into a mirror surface easily in the steps after the fine polishing step S20.

また、精研磨工程S20によって、ダイヤモンド砥粒の研磨剤と弾性が低く硬度の高いセラミック系研磨ディスクで30分以上と長時間にわたって研磨することで、僅かなダイヤモンド砥粒によって効率的に超高硬度材12を研磨することができる。さらに、ダイヤモンド砥粒の使用量を抑え精研磨工程S20のみに供給することで、研磨剤であるダイヤモンド砥粒を超低硬度材11の表面にほとんど埋没させることなく研磨することができる。   Also, by the fine polishing step S20, polishing with a diamond abrasive and a ceramic-based polishing disk having low elasticity and high hardness over a long period of time of 30 minutes or more enables efficient ultra-high hardness with a few diamond abrasive grains. The material 12 can be polished. Furthermore, by reducing the amount of diamond abrasive used and supplying it only to the fine polishing step S20, it is possible to polish the diamond abrasive, which is an abrasive, almost without being buried in the surface of the ultra-low hardness material 11.

さらに、予備琢磨工程S30によって、ポリエステル織布で形成された第一合成繊維系バフを用いて琢磨することで、ダイヤモンド砥粒が超低硬度材11を研磨する際に第一合成繊維系バフが撓み、超低硬度材11の表面に強く押し付けられることなく研磨される。一方、ポリエステル織布で形成された第一合成繊維系バフの弾性はそれほど高くない上に超高硬度材12が簡単に削れないほど固いため、超高硬度材12の表面では撓んでもダイヤモンド砥粒を押し付けながら研磨される。そのため、ダイヤモンド砥粒を供給し続けても超低硬度材11にダイヤモンド砥粒がほとんど埋没することなく超高硬度材12を研磨することが可能となる。   Further, by polishing using the first synthetic fiber buff formed of the polyester woven fabric in the preliminary polishing step S30, when the diamond abrasive grains polish the ultra-low hardness material 11, the first synthetic fiber buff is It is bent and polished without being pressed strongly against the surface of the ultra-low hardness material 11. On the other hand, since the elasticity of the first synthetic fiber buff formed of polyester woven fabric is not so high and the ultra-high hardness material 12 is so hard that it cannot be easily scraped, even if it is bent on the surface of the ultra-high hardness material 12, diamond grinding is performed. Polishing while pressing the grain. Therefore, even if the diamond abrasive grains are continuously supplied, the ultrahigh hardness material 12 can be polished without the diamond abrasive grains being almost buried in the ultralow hardness material 11.

また、琢磨工程S40によって、コロイダルシリカ系の酸化物研磨剤を使用して30分以上と長時間にわたって琢磨することで、化学研磨を行なわれ超高硬度材12の表面の小さな凹凸を除去し平滑な状態にすることができる。一方、コロイダルシリカ系の酸化物研磨材は、ダイヤモンド砥粒よりも硬度が低く、粒径が小さく角の少ない形状の粒子で構成されているため、ポリエステル織布で形成された第一合成繊維系バフよりも弾性の小さいナイロン系織布で形成された第二合成繊維系バフと合わせて研磨することで、超低硬度材11の表面に押し付けながら琢磨しても埋没することなく、僅かに埋没しているダイヤモンド砥粒を除去しながら凹凸を除去することが可能となる。
これらの精研磨工程S20から琢磨工程S40まで実施することで、超低硬度材11と超高硬度材12との硬度の大きく異なる材料で構成された複合材1を平滑に研磨することが可能となる。
Further, the polishing step S40 is performed using a colloidal silica-based oxide abrasive for a long time of 30 minutes or longer, so that chemical polishing is performed and small irregularities on the surface of the ultra-high hardness material 12 are removed and smoothened. It can be in a state. On the other hand, the colloidal silica-based oxide abrasive is composed of particles having a shape lower in hardness than diamond abrasive grains and having a small particle size and a small number of corners. By polishing together with the second synthetic fiber buff formed of nylon woven fabric which is less elastic than the buff, even if polishing while pressing against the surface of the ultra low hardness material 11, it will be buried slightly Unevenness can be removed while removing the diamond abrasive grains.
By carrying out from these fine polishing steps S20 to polishing step S40, it is possible to smoothly polish the composite material 1 composed of materials having extremely different hardnesses between the ultra-low hardness material 11 and the ultra-high hardness material 12. Become.

そして、仕上工程S50によって、第一合成繊維系バフよりも弾性の高い起毛した柔らかな織布で形成された第三合成繊維系バフと粒径が1μmのダイヤモンド砥粒とを用いて5分間と短時間で琢磨することで、ダイヤモンド砥粒を超低硬度材11の表面に埋没させることなく、僅かに超低硬度材11の表面に残る凹凸を除去することができる。これにより、より平滑にすることができ、複合材1の表面を精度の高い鏡面とすることが可能となる。   And by finishing process S50, it is 5 minutes using the 3rd synthetic fiber system buff formed with the soft woven cloth which raised the elasticity higher than the 1st synthetic fiber system buff, and the diamond abrasive grain whose particle size is 1 micrometer. By polishing in a short time, the unevenness slightly remaining on the surface of the ultra-low hardness material 11 can be removed without burying the diamond abrasive grains in the surface of the ultra-low hardness material 11. Thereby, it can be made smoother and it becomes possible to make the surface of the composite material 1 into a highly accurate mirror surface.

以上、本発明の実施形態について図面を参照して詳述したが、各実施形態における各構成及びそれらの組み合わせ等は一例であり、本発明の趣旨から逸脱しない範囲内で、構成の付加、省略、置換、およびその他の変更が可能である。また、本発明は実施形態によって限定されることはなく、クレームの範囲によってのみ限定される。   Although the embodiments of the present invention have been described in detail with reference to the drawings, the configurations and combinations of the embodiments in the embodiments are examples, and the addition and omission of configurations are within the scope not departing from the gist of the present invention. , Substitutions, and other changes are possible. Further, the present invention is not limited by the embodiments, and is limited only by the scope of the claims.

なお、本実施形態で使用したダイヤモンド砥粒の粒径、冷却材、バフの種類、酸化物研磨剤などは、本時実施形態で使用した道具に限定されるものではなく、使用環境に合わせて適宜選択されれば良い。例えば、セラミック材料や金属材料等の高硬度材の研磨に使用される公知の道具を適宜選択して使用すれば良い。   In addition, the grain size of the diamond abrasive grains used in the present embodiment, the coolant, the type of buff, the oxide abrasive, etc. are not limited to the tools used in the present embodiment, but according to the use environment. What is necessary is just to select suitably. For example, a known tool used for polishing a hard material such as a ceramic material or a metal material may be appropriately selected and used.

1…複合材 11…超低硬度材 12…超高硬度材 S10…面出工程 S20…精研磨工程 S30…予備琢磨工程 S40…琢磨工程 S50…仕上工程 DESCRIPTION OF SYMBOLS 1 ... Composite material 11 ... Ultra-low-hardness material 12 ... Ultra-high-hardness material S10 ... Surface forming process S20 ... Fine polishing process S30 ... Pre-polishing process S40 ... Polishing process S50 ... Finishing process

Claims (3)

母材である超低硬度材と超高硬度材とからなる複合材の研磨方法であって、
セラミック系研磨ディスクの表面にダイヤモンド砥粒を吹き付けて前記セラミック系研磨ディスクで前記複合材を研磨する精研磨工程と、
該精研磨工程の後に、第一合成繊維系バフの表面にダイヤモンド砥粒を供給しながら前記第一合成繊維系バフで前記複合材を琢磨する予備琢磨工程と、
該予備琢磨工程の後に、前記第一合成繊維系バフよりも弾性の小さい第二合成繊維系バフの表面に酸化物研磨剤を供給しながら前記第二合成繊維系バフで前記複合材を琢磨する琢磨工程と、
を備えることを特徴とする複合材の研磨方法。
A method for polishing a composite material composed of an ultra-low hardness material and an ultra-high hardness material, which are base materials,
A fine polishing step of polishing the composite material with the ceramic polishing disc by spraying diamond abrasive grains on the surface of the ceramic polishing disc;
After the fine polishing step, a preliminary polishing step of polishing the composite material with the first synthetic fiber buff while supplying diamond abrasive grains to the surface of the first synthetic fiber buff;
After the preliminary polishing step, the composite material is polished with the second synthetic fiber buff while supplying an oxide abrasive to the surface of the second synthetic fiber buff which is less elastic than the first synthetic fiber buff. Polishing process,
A polishing method for a composite material comprising:
前記琢磨工程の後に、前記第一合成繊維系バフよりも弾性の高い第三合成繊維系バフで前記複合材を琢磨する仕上工程を備えることを特徴とする請求項1に記載の研磨方法。   The polishing method according to claim 1, further comprising a finishing step of polishing the composite material with a third synthetic fiber buff having higher elasticity than the first synthetic fiber buff after the polishing step. 前記精研磨工程の前に、砥石で前記複合材の表面を平面とする面出工程を備えることを特徴とする請求項1又は請求項2に記載の研磨方法。   The polishing method according to claim 1, further comprising a chamfering step in which a surface of the composite material is flattened with a grindstone before the fine polishing step.
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