JPS5833150A - Manufacture of specimen observation of structure - Google Patents

Manufacture of specimen observation of structure

Info

Publication number
JPS5833150A
JPS5833150A JP13125381A JP13125381A JPS5833150A JP S5833150 A JPS5833150 A JP S5833150A JP 13125381 A JP13125381 A JP 13125381A JP 13125381 A JP13125381 A JP 13125381A JP S5833150 A JPS5833150 A JP S5833150A
Authority
JP
Japan
Prior art keywords
observation
specimen
electrolytic grinding
etching
electrolytic polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13125381A
Other languages
Japanese (ja)
Inventor
Hitomi Ito
伊東 「あ」
Etsuro Shimizu
志水 悦郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP13125381A priority Critical patent/JPS5833150A/en
Publication of JPS5833150A publication Critical patent/JPS5833150A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32Polishing; Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To obtain a specimen for the observation of structure which can obtain an internal structure corresponding to a photo sensible structure, without the use of an electron ray diffraction which requires much labor, by a method wherein an etching is applied in the middle of electrolytic grinding of the specimen, and electrolytic grinding is applied to only one side. CONSTITUTION:A manufacturing process of specimen for the observation of structure consists of a sampling material setting process (a), a process (b) in the middle of electrolytic grinding, a completion (c) of electrolytic grinding and an etching (d). In a method used in this invention, an electrolytic grinding stops once at a time of the process (b) in the middle of electrolytic grinding to perform the etching (d) to expose a metalic structure, and then, an electrolytic grinding process starts again. During aforesaid process, only one side is ground by, for example, a jet electrolytic grinding method, and this allows to obtain an internal structure corresponding to a photo sensible structure. The use of said method permits to perform an easy operation to correspond to the photo sensible structure which requires a fairly well skill and much labor if a conventional electronic microscope observation is utilized.

Description

【発明の詳細な説明】 組織と対応させることのできる走査透過電子顕微鏡の組
織観察用試験片の作製方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a specimen for tissue observation using a scanning transmission electron microscope, which can be made to correspond to a tissue.

従来,透過電子顕微鏡(以下TEMと略称する)の組織
観察用試験片は,四部組織観察を主目的とするため, 
 10””Torr(約10−3Pa )中の真空中で
電子線が透過できるように約1μm’lで電解研摩して
作製されてきた。
Conventionally, specimens for microstructure observation using a transmission electron microscope (hereinafter abbreviated as TEM) are mainly used for four-part microstructure observation.
It has been produced by electrolytic polishing to a thickness of about 1 .mu.m'l in a vacuum of 10"" Torr (about 10@-3 Pa) so that electron beams can pass through it.

ところが、この方法で作製された組織観察試験片を用い
た観察においては両面が電解研摩されているために,そ
のままでは光学顕微鏡組織(以下光顕組織と略称する)
との対応がつかず。
However, in the observation using the microstructure observation specimen prepared by this method, since both sides are electrolytically polished, the microscopic structure (hereinafter abbreviated as "light microscopic structure") cannot be obtained as it is.
I couldn't deal with it.

また、対応をつけるために電子線回折法を用いると非常
に複雑な手続と熟練を必要とする欠点があった。たとえ
ば、オーステナイト系ステンレス鋼に析出するδーフー
ライトの光顕組織においては腐食液を選択することによ
り,基質のオーステナイトは白く,析出物のδ−フェラ
イトは灰色に腐食できるので,両者を簡単にべん別する
ことができる。
Furthermore, when electron diffraction is used to determine the correspondence, it has the disadvantage of requiring extremely complicated procedures and skill. For example, in the light microstructure of δ-fulrite precipitated on austenitic stainless steel, by selecting a corrosive solution, the austenite in the matrix can corrode white and the δ-ferrite precipitate can corrode gray, making it easy to distinguish between the two. can do.

しかし、TEMO組,織観祭試験片の観察においては,
上述のとおり両面を電解研摩しているため,両者の変化
は明らかにできず,従って電子線回折法を用いてオース
テナイト相とフ゛エライト相の結晶構造の違いから両者
を弁別しなければならないが、この方法は経験と大変な
手間が必要であるという欠点があった。
However, in the observation of TEMO structure and Orikansai test pieces,
As mentioned above, since both sides are electrolytically polished, it is not possible to clearly distinguish between the two, and therefore it is necessary to use electron diffraction to distinguish between the austenite and ferrite phases based on the difference in their crystal structures. The disadvantage of this method is that it requires experience and a lot of effort.

本発明は、このような手間のかかる電子線回折を用いず
に、TEM組織欝察試験片の内□部組織と光顕組織との
対応を求められる試験片を得ることを目的とし。
The purpose of the present invention is to obtain a test piece in which the correspondence between the internal structure of a TEM tissue observation test piece and the light microscope structure can be obtained without using such time-consuming electron diffraction.

(1)  試験片の電解研摩の途中でエツチングを施こ
し、さらに片面だけ電解研摩を施こす事を特徴とし、ま
た1本発明は上述の試験片を得ることを目的として。
(1) The present invention is characterized in that etching is performed during the electrolytic polishing of the test piece, and further electrolytic polishing is performed only on one side, and another object of the present invention is to obtain the above-mentioned test piece.

(2)  試験片の電解研摩後にエツチングを施こす事
を特徴とする。
(2) It is characterized by etching the test piece after electrolytic polishing.

組織観察試験片の作製方法である。This is a method for producing a specimen for tissue observation.

なお、最近のTEMは通常の透過電子線像の他に電子線
を走査させながら観察試験片の内部組織を観察できるよ
うになっており、また、このような電子顕微鏡は、走査
電子顕微鏡としての二次電子線像の観察も可能となって
いる。
In addition to normal transmission electron beam images, recent TEMs can now observe the internal structure of observation specimens while scanning the electron beam, and such electron microscopes can also be used as scanning electron microscopes. Observation of secondary electron beam images is also possible.

この種の電子顕微鏡を走査透過電子顕微鏡(以)’ST
EMと称する)といい1本発明は特にこのSTEMにお
いて有効である。
This type of electron microscope is a scanning transmission electron microscope (hereinafter referred to as 'ST').
(referred to as EM), and the present invention is particularly effective in this STEM.

本発明の方法によって作製された組織観察試験片は約1
μmの厚さであるため、TEM観察が可能であり、さら
に観察表面がエツチングされておるため表面状態に対し
て敏感な2次電子線像を用いて光顕組織との対応を明確
にできるという効果がある。
The tissue observation specimen prepared by the method of the present invention is approximately 1
Because the thickness is only 1 μm, TEM observation is possible, and because the observation surface is etched, the correspondence with the light microscopic structure can be clearly seen using secondary electron beam images that are sensitive to surface conditions. There is.

以下、工程図をもって本発明の説明をおこなう。The present invention will be explained below with reference to process diagrams.

第1図に従来の方法B1本発明の第一番目の発明による
方法A1本発明の第二番目の発明による方法CによるS
TEM若しくはTEMに用いる組織観察試験片の作製工
程を示す。
FIG. 1 shows conventional method B1 method A1 according to the first invention of the present invention S according to method C according to the second invention of the present invention
The manufacturing process of TEM or a tissue observation test piece used for TEM is shown.

又、(a)は供試材設定、(b)は電解研摩途中、(C
)は電解研摩終了、(d)はエツチング、(e)は片面
電解研摩、(f)は試験片作製終了の各工程を示す。な
お、1は陽極を兼ねた薄板状の組織観察試験片用供試材
、2は同供試材1の前後に各1対設置された電解研摩用
の陰極、3は電解研摩液、4は工、チ/ダ液(腐食液)
、5はエツチング面をそれぞれ示す。従来方法Bは工程
Bに示すように電解研摩のみしかおこなわず、エツチン
グをおこなっていないので、その試験片の2次電子線像
から相を弁別すること、すなわち、光顕組織と対応させ
ることはできない。
In addition, (a) is the sample material setting, (b) is during electrolytic polishing, (C
) shows the completion of electropolishing, (d) shows the etching, (e) shows the single-sided electropolishing, and (f) shows the completion of test piece preparation. In addition, 1 is a sample material for a thin plate-like structure observation specimen that also serves as an anode, 2 is a cathode for electrolytic polishing that is installed in pairs before and after the same sample material 1, 3 is an electrolytic polishing liquid, and 4 is a Engineering, Chi/Da liquid (corrosive liquid)
, 5 indicate etched surfaces, respectively. Conventional method B only performs electropolishing and does not perform etching as shown in step B, so it is not possible to distinguish the phase from the secondary electron beam image of the test piece, that is, to make it correspond to the light microscopic structure. .

これに対して本願の第一番目の発明、すなわち工程Aに
示す方法では、従来方法の電解研摩途中時すで一旦電解
研摩を停止し、エツチングを行なって金属組織を呈させ
、その後電解研摩を再開する工程をとるが、このとき1
例えばジェット電解研摩法を用いて片面のみを研摩する
ことによって光顕組織と対応する内部組織を得ることが
できる。同様に本願の第二番目の発明。
On the other hand, in the first invention of the present application, that is, the method shown in step A, the electrolytic polishing is stopped once during the electrolytic polishing of the conventional method, etching is performed to present a metal structure, and then the electrolytic polishing is performed. The process of restarting is taken, but at this time 1
For example, by polishing only one side using a jet electrolytic polishing method, an internal structure corresponding to a light microscopic structure can be obtained. Similarly, the second invention of the present application.

すなわち工程Cに示す方法では従来方法により電解研摩
を終了した後エツチングを行なうという工程をとること
によって、光顕組織と対応する内部組織を得られるよう
な組織観察試験片を作製できる。
That is, in the method shown in step C, by performing etching after completing electrolytic polishing using the conventional method, a specimen for microstructural observation can be prepared that allows an internal structure to be obtained that corresponds to the microscopic structure.

以F &こ、上述の本発明を用いた効果についてのべる
Hereinafter, the effects of using the above-described present invention will be described.

組織観察試験片用供試材として、δフェライトの析出し
ているマルテンサイト系の12SCr鋼を用いてその内
部観察を行った。まず、高速力、りなどによりあらかじ
め作製した直径約3咽、厚さ0.1〜0.5mlの12
1Cr鋼を、電解研摩装置に装着する。ここで、電解液
は10%過塩素酸90%アルコール溶液を用いた。その
後。
A martensitic 12SCr steel in which δ ferrite is precipitated was used as a sample material for a microstructural observation test piece, and the interior of the steel was observed. First, 12 tubes with a diameter of about 3 mm and a thickness of 0.1 to 0.5 ml were prepared in advance by high-speed force, ri, etc.
Load the 1Cr steel into the electrolytic polisher. Here, a 10% perchloric acid 90% alcohol solution was used as the electrolyte. after that.

第1図の各工程に従って、それぞれ観察用試験片を作製
した。この際、腐食液はVilella試薬(100m
1アルコール、  lfピクリン酸、  5m/!塩酸
)を用い、又2片面電解研摩にはジェット式電解研摩法
を用いた。第2図は従来方法により作製した試験片の二
次電子像の写真であるが。
Observation test pieces were prepared according to each step shown in FIG. 1. At this time, the corrosive liquid was Vilella reagent (100 m
1 alcohol, lf picric acid, 5m/! Hydrochloric acid) was used, and a jet electrolytic polishing method was used for two-sided electrolytic polishing. FIG. 2 is a photograph of a secondary electron image of a test piece prepared by a conventional method.

試験片は白いだけで金属組織は認められない。The test piece is only white and no metallic structure is observed.

第3図m、 +21は本願の第一番目の発明の方法によ
り作製された試験片の二次電子線像の写真であるが、光
M組織によく対応している。
Figure 3m, +21 is a photograph of a secondary electron beam image of a test piece prepared by the method of the first invention of the present application, which corresponds well to the optical M structure.

第;3図(3)は、同試験片の透過電子線像の写真であ
り、第3図(2)と同一位置における内部組織を示して
いる。これによると透過電子線像は光顕組織と明確K 
13応している事がわかる。
Figure 3 (3) is a photograph of a transmission electron beam image of the same test piece, showing the internal structure at the same position as Figure 3 (2). According to this, the transmission electron beam image clearly corresponds to the light microscopic structure.
13 I can see that you are responding.

同様に第4図(+l、 (21は本願の第二番目の発明
の方法により作製された試験片の二次電子線像の写真で
あるが光顕組織によく対応している。第4図(3)は同
試験片の透過電子線像の写真であり。
Similarly, FIG. 4 (+l, (21) is a photograph of a secondary electron beam image of a test piece prepared by the method of the second invention of the present application, which corresponds well to the light microscopic structure. 3) is a photograph of a transmission electron beam image of the same test piece.

第4図(2)と同一位置における内部組織を示している
。この方法によって作製された試験片を用と いてもその透過電子線像は光顕組織産明確に対応してい
る。
It shows the internal structure at the same position as FIG. 4(2). Even when a specimen prepared by this method is used, its transmission electron beam image clearly corresponds to that of a light microscopic tissue.

以上、述べてきだとおり9本発明による組織観察試験片
の作製方法を用いる事により、従来の電子顕微鏡観察で
はかなりの熟練と手間のかかっていた光顕組織との対応
が非常に容易にできるようになった。なお1本発明によ
って作製′1: された組織観察試験片はSTEMあるいは透過電子線検
出器の付属した走査電子顕微鏡にも用いる事ができるこ
とは云うまでもないことである。
As stated above, by using the method for preparing specimens for microstructural observation according to the present invention, it is now possible to very easily handle microstructures using light microscopy, which required considerable skill and effort in conventional electron microscopy. became. It goes without saying that the microstructure observation specimen prepared according to the present invention can also be used in a STEM or a scanning electron microscope equipped with a transmission electron beam detector.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来方法2本願の第一番目の発明の方tノ51
本願の第二番目の発明の方法によるSTEMれしくはT
EM組織観察試験片の作製方法を簡略に示した流れ図、
第2図は従来方法によって作製した組織観察試験片の5
00倍二次電子線像の写真、第3図は本願の第一番目の
発明の方法による組織観察試験片の電子顕微鏡組織写真
で同図fll、 +21はそれぞれ500倍、5000
倍の2次電子線像、同図(3)は同図(2)と同一視野
の5000倍透過電子線像を示している。第4図は本願
の第二番目の発明の方法による組織観察試験片の電子顕
微鏡組織写真で、同図+r3 +21はそれぞれ750
.5000倍の2次電子線像。 同図(3)は同図(2)と同一視野の5000倍透過電
子線像を示している。 A:本願第一番目の発明の方法を示す工程流れB:従来
方法の工程流れ C:本願の第二番目の発明の方法を示す上程流れ (a):供試材設定 (b):電解研摩途中 (C):電解研摩終了 (d):エノチング (e)−片面電解研摩 1:組織観察試験片用供試材(陽極を兼ねる)2:電解
研摩用陰極 3:電解研摩液 4:エツチング液 5:エツチング液 6:炭化物 7:デルタフエライト 第 1 0 ) 晃 2 巳 (2)         (3) 箭 3 凪
FIG. 1 shows the conventional method 2 of the first invention of the present application, t-51.
STEM or T by the method of the second invention of the present application
A flowchart that simply shows the method for preparing an EM structure observation specimen,
Figure 2 shows 5 specimens for microstructure observation prepared by the conventional method.
00x secondary electron beam image, Figure 3 is an electron micrograph of the microstructure observation specimen obtained by the method of the first invention of the present application, and +21 is 500x and 5000x, respectively.
The secondary electron beam image (3) in the same figure shows a 5000 times transmission electron beam image of the same field of view as (2) in the same figure. FIG. 4 is an electron microscope microstructure photograph of a microstructure observation specimen obtained by the method of the second invention of the present application, where +r3 and +21 are each 750
.. 5000x secondary electron beam image. Figure (3) shows a 5000x transmitted electron beam image of the same field of view as Figure (2). A: Process flow showing the method of the first invention of the present application B: Process flow of the conventional method C: Upstream flow showing the method of the second invention of the present application (a): Sample material setting (b): Electrolytic polishing Midway (C): End of electrolytic polishing (d): Enoching (e) - Single-sided electrolytic polishing 1: Sample material for tissue observation specimen (also serves as anode) 2: Cathode for electrolytic polishing 3: Electrolytic polishing solution 4: Etching solution 5: Etching liquid 6: Carbide 7: Delta ferrite No. 1 0) Akira 2 Mi (2) (3) Yasu 3 Nagi

Claims (2)

【特許請求の範囲】[Claims] (1)電子顕微鏡組織観察用試験片を作製するに際し、
試験片の電解研摩の途中でエツチングを施こし、さらに
片面だけ電解研摩を施こす事を特徴とする組繊観察試験
片の作製方法。
(1) When preparing a specimen for electron microscopic structure observation,
A method for producing a composite fiber observation test piece, characterized by etching the test piece during electrolytic polishing and further electrolytically polishing only one side.
(2)電子顕微鏡組織観察用試験片を作製するに際し、
試験片の電解研摩後にエツチングを施こす事を特徴とす
る組織観察試験片の作製方法
(2) When preparing a specimen for electron microscope structure observation,
A method for preparing a specimen for microstructural observation, characterized by etching the specimen after electrolytic polishing.
JP13125381A 1981-08-21 1981-08-21 Manufacture of specimen observation of structure Pending JPS5833150A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13125381A JPS5833150A (en) 1981-08-21 1981-08-21 Manufacture of specimen observation of structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13125381A JPS5833150A (en) 1981-08-21 1981-08-21 Manufacture of specimen observation of structure

Publications (1)

Publication Number Publication Date
JPS5833150A true JPS5833150A (en) 1983-02-26

Family

ID=15053581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13125381A Pending JPS5833150A (en) 1981-08-21 1981-08-21 Manufacture of specimen observation of structure

Country Status (1)

Country Link
JP (1) JPS5833150A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014079865A (en) * 2012-10-18 2014-05-08 Mitsubishi Heavy Ind Ltd Polishing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014079865A (en) * 2012-10-18 2014-05-08 Mitsubishi Heavy Ind Ltd Polishing method

Similar Documents

Publication Publication Date Title
Prenitzer et al. Transmission electron microscope specimen preparation of Zn powders using the focused ion beam lift-out technique
CN111735836B (en) Preparation method of ultra-pure high-chromium ferrite stainless steel EBSD sample
CN206163454U (en) Porous silicon nitride support membrane pane and a device for TEM formation of image thereof
CN112857932A (en) Preparation method of metallographic sample of silver-gallium diffusion alloy
CN105977122B (en) The preparation of porous silicon nitride support membrane pane
JPS5833150A (en) Manufacture of specimen observation of structure
Li Advanced techniques in TEM specimen preparation
KR20210037113A (en) Method of fabricating specimens for electron backscattering diffraction (ebsd) and analysis method of scale structure of hot rolled steel sheet using the same
CN114184628B (en) Method for rapidly preparing massive ceramic EBSD sample
Blank et al. Structural analysis of oxide scales grown on zirconium alloys in autoclaves and in a PWR
CN113125481A (en) Sample preparation method of EBSD sample of AlSc sputtering target material
Lepetre et al. Novel characterization of thin film multilayered structures: microcleavage transmission electron microscopy
Isselin et al. Assessment of the effects of cold work on crack initiation in a light water environment using the small-punch test
Ambler et al. New metallographic techniques for the examination of uranium, uranium alloys and uranium dioxide
JPH05231996A (en) Method of manufactureing intermetallic compound estimation test piece and reagent
SINES et al. Flaws responsible for slow cracking in the delayed fracture of alumina
Hunter et al. Techniques Used in Electron Microscopy of Aluminum Alloys
Weirick et al. The Effect of Stress on the Low‐Temperature Oxidation of Niobium: II. Oxide Wedge Formation
JPS5932842A (en) Preparation of thin membrane test piece
CN110592499B (en) Novel aluminum-containing austenitic heat-resistant steel and preparation method and application thereof
CN117740778A (en) Grain boundary display method for measuring grain size of 2Cr13 prior austenite
JP2021056098A (en) Method of manufacturing test piece and method for testing precipitates in steel
Angenete et al. Preparation of TEM specimens from fragile oxide films using focused ion beam(FIB)
US3996119A (en) Method for electrolytic etching of gray irons with Stead's reagent
Ambrož et al. Effect of Metallographic Pretreatment of TRIP Steel Specimens on Correlative Imaging and Electron Backscatter Diffraction Analysis