JP2014053073A5 - - Google Patents
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- Publication number
- JP2014053073A5 JP2014053073A5 JP2012194664A JP2012194664A JP2014053073A5 JP 2014053073 A5 JP2014053073 A5 JP 2014053073A5 JP 2012194664 A JP2012194664 A JP 2012194664A JP 2012194664 A JP2012194664 A JP 2012194664A JP 2014053073 A5 JP2014053073 A5 JP 2014053073A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- charged particle
- particle beam
- film
- diaphragm member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims 38
- 239000012528 membrane Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 239000004642 Polyimide Substances 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 238000012423 maintenance Methods 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012194664A JP2014053073A (ja) | 2012-09-05 | 2012-09-05 | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
| US14/423,367 US20150206705A1 (en) | 2012-09-05 | 2013-07-11 | Member for charged particle beam device, charged particle beam device and diaphragm member |
| PCT/JP2013/069050 WO2014038287A1 (ja) | 2012-09-05 | 2013-07-11 | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
| KR1020157003635A KR20150036541A (ko) | 2012-09-05 | 2013-07-11 | 하전 입자선 장치용 부재, 하전 입자선 장치 및 격막 부재 |
| CN201380043744.5A CN104584180A (zh) | 2012-09-05 | 2013-07-11 | 带电粒子线装置用部件、带电粒子线装置以及隔膜部件 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012194664A JP2014053073A (ja) | 2012-09-05 | 2012-09-05 | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014053073A JP2014053073A (ja) | 2014-03-20 |
| JP2014053073A5 true JP2014053073A5 (cg-RX-API-DMAC7.html) | 2015-04-09 |
Family
ID=50236905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012194664A Pending JP2014053073A (ja) | 2012-09-05 | 2012-09-05 | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20150206705A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2014053073A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20150036541A (cg-RX-API-DMAC7.html) |
| CN (1) | CN104584180A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014038287A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6207824B2 (ja) * | 2012-10-01 | 2017-10-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ |
| DE112014001777T5 (de) * | 2013-05-10 | 2016-01-14 | Hitachi High-Technologies Corporation | Mit einem Strahl geladener Teilchen arbeitende Vorrichtung |
| KR101752164B1 (ko) * | 2013-09-06 | 2017-06-29 | 가부시키가이샤 히다치 하이테크놀로지즈 | 하전 입자선 장치 및 시료 화상 취득 방법 |
| WO2015083270A1 (ja) * | 2013-12-05 | 2015-06-11 | 株式会社日立製作所 | 試料ホルダ及び真空分析装置 |
| US10832885B2 (en) * | 2015-12-23 | 2020-11-10 | Massachusetts Institute Of Technology | Electron transparent membrane for cold cathode devices |
| WO2017183168A1 (ja) * | 2016-04-22 | 2017-10-26 | 株式会社 日立ハイテクノロジーズ | 荷電粒子顕微鏡および試料撮像方法 |
| JP6916074B2 (ja) * | 2017-09-20 | 2021-08-11 | 浜松ホトニクス株式会社 | 電子放出管、電子照射装置及び電子放出管の製造方法 |
| CN110186944B (zh) * | 2018-02-23 | 2021-11-09 | 台湾电镜仪器股份有限公司 | 检验容器以及电子显微镜 |
| WO2022219699A1 (ja) * | 2021-04-13 | 2022-10-20 | 株式会社日立ハイテク | 透過型電子顕微鏡 |
| KR102791688B1 (ko) * | 2021-11-25 | 2025-04-07 | 참엔지니어링(주) | 대기중으로 빔을 인출하는 빔 가공 장치 및 그 제어 방법 |
| JPWO2024142368A1 (cg-RX-API-DMAC7.html) * | 2022-12-28 | 2024-07-04 | ||
| KR102817234B1 (ko) * | 2025-02-02 | 2025-06-09 | (주)코셈 | 수동 xy 얼라인 수단 및 가스 주입수단을 구비한 대기압 전자 현미경용 멤브레인 어댑터, 및 이를 구비하는 대기압 전자현미경 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5142461A (cg-RX-API-DMAC7.html) * | 1974-10-09 | 1976-04-10 | Ryoji Takahashi | |
| JPH01117028A (ja) * | 1987-10-30 | 1989-05-09 | Nec Corp | 電子線位置検出基準マーク |
| JP3736487B2 (ja) * | 2002-03-25 | 2006-01-18 | 三菱マテリアル株式会社 | リソグラフィー用のダイヤモンドウェハ、マスクブランクス及びマスク並びにダイヤモンドウェハの製造方法 |
| JP2006147430A (ja) * | 2004-11-22 | 2006-06-08 | Hokkaido Univ | 電子顕微鏡 |
| WO2008050321A2 (en) * | 2006-10-24 | 2008-05-02 | B-Nano Ltd. | An interface, a methof for observing an object within a non-vacuum environment and a scanning electron microscope |
| EP1956633A3 (en) * | 2007-02-06 | 2009-12-16 | FEI Company | Particle-optical apparatus for simultaneous observing a sample with particles and photons |
| JP2008262886A (ja) * | 2007-04-12 | 2008-10-30 | Beam Seiko:Kk | 走査型電子顕微鏡装置 |
| JP5320418B2 (ja) * | 2011-01-31 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP5699023B2 (ja) * | 2011-04-11 | 2015-04-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
-
2012
- 2012-09-05 JP JP2012194664A patent/JP2014053073A/ja active Pending
-
2013
- 2013-07-11 CN CN201380043744.5A patent/CN104584180A/zh active Pending
- 2013-07-11 KR KR1020157003635A patent/KR20150036541A/ko not_active Ceased
- 2013-07-11 US US14/423,367 patent/US20150206705A1/en not_active Abandoned
- 2013-07-11 WO PCT/JP2013/069050 patent/WO2014038287A1/ja not_active Ceased
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