JP2014001925A5 - - Google Patents

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Publication number
JP2014001925A5
JP2014001925A5 JP2012135260A JP2012135260A JP2014001925A5 JP 2014001925 A5 JP2014001925 A5 JP 2014001925A5 JP 2012135260 A JP2012135260 A JP 2012135260A JP 2012135260 A JP2012135260 A JP 2012135260A JP 2014001925 A5 JP2014001925 A5 JP 2014001925A5
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JP
Japan
Prior art keywords
measurement
electromagnetic wave
relative position
reflecting surface
information
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Pending
Application number
JP2012135260A
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English (en)
Japanese (ja)
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JP2014001925A (ja
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Priority to JP2012135260A priority Critical patent/JP2014001925A/ja
Priority claimed from JP2012135260A external-priority patent/JP2014001925A/ja
Priority to US13/894,065 priority patent/US9134182B2/en
Publication of JP2014001925A publication Critical patent/JP2014001925A/ja
Publication of JP2014001925A5 publication Critical patent/JP2014001925A5/ja
Pending legal-status Critical Current

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JP2012135260A 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法 Pending JP2014001925A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012135260A JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法
US13/894,065 US9134182B2 (en) 2012-06-14 2013-05-14 Measurement apparatus and method, tomography apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012135260A JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法

Publications (2)

Publication Number Publication Date
JP2014001925A JP2014001925A (ja) 2014-01-09
JP2014001925A5 true JP2014001925A5 (enExample) 2015-07-30

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Family Applications (1)

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JP2012135260A Pending JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法

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US (1) US9134182B2 (enExample)
JP (1) JP2014001925A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013181929A (ja) 2012-03-04 2013-09-12 Canon Inc 測定装置及び方法、トモグラフィ装置及び方法
JP2014122875A (ja) * 2012-11-26 2014-07-03 Canon Inc 層状物体の測定装置および方法
WO2015112284A2 (en) * 2013-12-17 2015-07-30 Picometrix, Llc System for transmitting and receiving electromagnetic radiation
DE102014212633B4 (de) * 2014-06-30 2017-03-09 Inoex Gmbh Messvorrichtung und Verfahren zur Vermessung von Prüfobjekten
CN105181623B (zh) * 2015-08-04 2017-11-28 深圳市太赫兹科技创新研究院有限公司 一种邮件检测装置和方法
JP6754446B2 (ja) * 2016-12-06 2020-09-09 パイオニア株式会社 検査装置、検査方法、コンピュータプログラム及び記録媒体
KR102102776B1 (ko) * 2018-04-24 2020-04-21 아이오솔루션(주) 초점각도 조정방법 및 초점각도 조정장치
JP7428597B2 (ja) * 2020-06-18 2024-02-06 株式会社アドバンテスト 光超音波測定装置、方法、プログラム、記録媒体
TWI799875B (zh) * 2021-05-28 2023-04-21 國立中央大學 折射率量測系統、方法與其所使用的全反射子系統
JP2023131441A (ja) * 2022-03-09 2023-09-22 三菱重工業株式会社 検査装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5489984A (en) * 1994-04-01 1996-02-06 Imra America, Inc. Differential ranging measurement system and method utilizing ultrashort pulses
JP3602925B2 (ja) * 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定装置
US6957099B1 (en) * 1999-02-23 2005-10-18 Teraview Limited Method and apparatus for terahertz imaging
JP4046158B2 (ja) * 2002-06-21 2008-02-13 財団法人大阪産業振興機構 塗装膜測定方法及び装置
GB2405466B (en) * 2003-08-27 2006-01-25 Teraview Ltd Method and apparatus for investigating a non-planner sample
JP4892719B2 (ja) * 2005-08-24 2012-03-07 国立大学法人大阪大学 断層計測装置及び断層計測方法
JP4963640B2 (ja) 2006-10-10 2012-06-27 キヤノン株式会社 物体情報取得装置及び方法
JP2008157710A (ja) * 2006-12-22 2008-07-10 Naohiro Tanno 光コヒーレンストモグラフィー装置
GB2445957B (en) * 2007-01-29 2009-08-19 Tera View Ltd A method and apparatus for analysing an LCD
US20090040527A1 (en) * 2007-07-20 2009-02-12 Paul Dan Popescu Method and apparatus for speckle noise reduction in electromagnetic interference detection
JP5339934B2 (ja) * 2009-01-22 2013-11-13 キヤノン株式会社 光断層撮像装置および光断層撮像方法
JP5717335B2 (ja) * 2009-01-23 2015-05-13 キヤノン株式会社 分析装置
JP5472675B2 (ja) * 2009-02-03 2014-04-16 アイシン精機株式会社 非接触膜厚測定装置
US8053733B2 (en) * 2009-09-30 2011-11-08 Advantest Corporation Electromagnetic wave measuring apparatus
EP2526373B1 (de) * 2010-01-22 2013-12-11 Universität Stuttgart Verfahren und anordnung zur robusten interferometrie
JP5675219B2 (ja) * 2010-08-27 2015-02-25 キヤノン株式会社 光パルス発生装置、テラヘルツ分光装置およびトモグラフィ装置

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