JP2013544670A - ナノシリカ系コーティングを有する反射防止物品 - Google Patents
ナノシリカ系コーティングを有する反射防止物品 Download PDFInfo
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- JP2013544670A JP2013544670A JP2013532811A JP2013532811A JP2013544670A JP 2013544670 A JP2013544670 A JP 2013544670A JP 2013532811 A JP2013532811 A JP 2013532811A JP 2013532811 A JP2013532811 A JP 2013532811A JP 2013544670 A JP2013544670 A JP 2013544670A
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/70—Carbohydrates; Sugars; Derivatives thereof
- A61K31/7088—Compounds having three or more nucleosides or nucleotides
- A61K31/7105—Natural ribonucleic acids, i.e. containing only riboses attached to adenine, guanine, cytosine or uracil and having 3'-5' phosphodiester links
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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Abstract
Description
シリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程であって、コーティング組成物が3未満のpHを有する工程と、
シリカナノ粒子に酸焼結させて物品をもたらす工程と、を含む。
シリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程と、
コーティングを加熱して物品をもたらす工程と、を含む。
コア−シェルシリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程であって、各コア−シェル粒子は、ポリマーコア上に配置された無孔の球状シリカ粒子のシェルにより包囲されたポリマーコアを含み、無孔の球状シリカ粒子は60ナノメートル以下(一部の実施形態では、50ナノメートル以下、40ナノメートル以下、30ナノメートル以下、20ナノメートル以下、又は更には10ナノメートル以下)の体積平均粒子直径を有する、工程と、
コーティングを加熱して物品をもたらす工程と、を含む。
「反射防止」は、法線入射角にて4%未満の反射を有する表面を意味する。
用語「シリカナノ粒子の多孔質ネットワーク」は、ナノ粒子が連続コーティングを形成するとき、シリカナノ粒子間に空隙が存在することを示す。好ましくは、ネットワークは、乾燥したとき、25〜45体積パーセント、より好ましくは30〜40体積パーセントの多孔性を有する。幾つかの実施形態では、多孔性はより高くてもよい。本明細書に参照することにより開示が組み込まれるW.L.Bragg、A.B.Pippard、Acta Crystallographica,volume 6,page 865(1953)などの公開されている手順に従って、コーティングの屈折率から多孔性を計算することができる。任意の例示的な、シリカナノ粒子の三次元多孔質ネットワークが図1に示されている。
反応スキーム1
式中、nは1以上であり、ポリオール対ジイソシアネートの比によって決まり、例えば、その比が2:1である場合、nは1である。ポリオールとジカルボン酸又は二酸無水物との間の類似反応によって、エステル結合基を有するHO−B−OHプレポリマーを提供することができる。
コーティング汚れ耐性は、95mm正方形プラスチックペトリ皿(Becton Dickinson Labware(Franklin Lakes,NJ)から商品名「Falcon 35112」で入手可能)から構成される装置(5cm孔がペトリ皿の下半分にドリルにより貫通されている)を用いて、試験される。5cm×8cmのコーティングされたサンプルを、サンプルのコーティングされた表面がペトリ皿の内側を向き、試験汚れに直接曝露されるように、接着テープで5cm孔を覆ってペトリ皿の外側上に取り付ける。50グラムのアリゾナ試験用ダスト(0〜600マイクロメートル分布、Powder Technology Incorporated(Burnsville,MN)から入手可能)を、コーティングされたサンプル上のペトリ皿の下半分の中に配置する。ペトリ皿の二等分部分二つをしっかりと組み合わせて、汚れがサンプルの表面にわたって前後に転回するように、左右方向のサイクルで軽く振る。サンプルを手により秒当たり1サイクルの速度にて60サイクルにわたって左右方向に振る。次に、サンプルを試験装置から取り出し、軽くたたいて、汚れを除去してその付着をゆるやかにする。コーティングされたサンプルの透過性を、透過率計(BYK−Gardner(Columbia,MD)から商品名「HAZE GARD PLUS」で入手可能)を用いて、汚れ試験の前後で測定する。汚れ試験後、サンプルを軽く水ですすいで、汚れを除去し、乾燥させ、透過性を再測定して清浄性の尺度とする。
コーティング摩耗耐性は、落砂摩耗試験機(Humboldt MFG.Co.(Norridge,IL)から商品名「HP−1160」で入手可能)を用いて、試験される。5cm×8cmのコーティングされたサンプルは、落砂チューブの出口の下に中心を置いた試験プラットフォームに接着テープで取り付けられる。1000グラムのASTM C778シリカ砂(U.S.Silica Company(Ottawa,IL)から入手可能)は、落砂チューブに供給するホッパーの中に装填される。ゲートを開くと、砂が落砂チューブを通して100cmの距離を落下し始め、コーティングされたサンプルの表面上に当たる。コーティングされたサンプルの透過性は、透過率計(「HAZE GARD PLUS」)を用いて落砂試験前後で測定する。落砂試験後、このサンプルも軽く水ですすいで、細片を除去し、乾燥させ、透過性を再び測定する。
1.反射防止構造化表面と、その上にシリカナノ粒子の多孔質ネットワークを含む焼結コーティングと、を有する透明基材を含む物品であって、ここで、シリカナノ粒子が隣接するシリカナノ粒子に結合している、物品。
光エネルギー受容面を有する光吸収剤と、
光エネルギーの供給源と光エネルギーを受容する面との間にあるように配置された実施形態1〜42のいずれかの物品と、を含む、光エネルギー吸収デバイスであって、この間にわたって供給源からの光エネルギーが光吸収剤により吸収される、光エネルギー吸収デバイス。
第一主表面を有する熱吸収剤と、
熱吸収剤の第一主表面の上に位置する実施形態1〜42の物品と、
熱吸収剤の内側か又は熱吸収剤の第一主表面と物品の間かのうちの少なくとも一方に位置する液体と、を含む、太陽熱加熱デバイス。
シリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程と、
コーティングを加熱して実施形態1〜42のいずれかの物品をもたらす工程と、を含む、物品の製造方法。
コア−シェルシリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程であって、各コア−シェル粒子は、ポリマーコア上に配置された無孔の球状シリカ粒子のシェルにより包囲されたポリマーコアを含み、無孔の球状シリカ粒子は60ナノメートル以下の体積平均粒子直径を有する、工程と、
コーティングを加熱して実施形態1〜42のいずれかの物品をもたらす工程と、を含む、物品の製造方法。
シリカナノ粒子を含むコーティング組成物を透明基材の反射防止構造化表面上に適用してコーティングをもたらす工程であって、コーティング組成物が3未満のpHを有する工程と、
シリカナノ粒子を酸焼結させて実施形態1〜42のいずれかの物品をもたらす工程と、を含む、物品の製造方法。
70%の20nmナノ粒子溶液(Nalco Company(Naperville,IL)から商品名「NALCO 1050 NANOPARTICLE SOLUTION」で入手)を30%の4nmシリカナノ粒子溶液(Nalco Companyから商品名「NALCO 1115 NANOPARTICLE SOLUTION」で入手)と混合し、そのままの溶液に3重量%添加量の硝酸を添加し、脱イオン水で5重量%に希釈することにより調製された酸性化水性ナノ粒子溶液でマイクロ複製ポリメチルメタクリレート光学ライティングフィルム(かつては3M Company(St.Paul.MN)から商品名「OPTICAL LIGHTING FILM」で入手可能であったが、現在は代替的製品が3M Companyから商品名「OPTICAL LIGHTING FILM 2301」で入手可能である)をコーティングして、約20nmの乾燥厚さをもたらした。ナノシリカコーティングされたアクリル系プリズムフィルムを次に1時間にわたって85℃に加熱した。
銅製ロールに直線のプリズム溝を100マイクロメートルピッチで切削加工するために、53°の先端角度を持つダイヤモンドを用いて、マイクロ複製鋳造具を作製した。次いで、この金属マイクロ複製鋳造ロール具を使用して、溶融ポリプロピレンを金属鋳造ロール具上に連続的に押し出し、急冷することにより、同一のパターンの「外側突起」の53°の直線プリズムポリプロピレンポリマーフィルム具を作製した。
ポリフッ化ビニリデン(Dyneon(Oakdale,MN)から商品名「PVDF 6008」で入手)/ポリメチルメタクリレート(Arkema Inc.から商品名「PMMA CP82」で入手)/紫外線吸収剤マスターバッチ(Sukano Polymers Corporation(Duncan,SC)から商品名「SUKANO TA11−10 MB03」で入手)ブレンドスキン層を用いて、90重量%のポリカーボネート(Bayer Materials Scienceから商品名「MAKROLON OD2015」で入手)と10重量%のPC−UVAマスターバッチ(Sukano Polymers Corporationから商品名「SUKANO TA28−09 MB01」で入手)(「PC−UVA」)のブレンドをコア層として、3重量%のトリアジン紫外線吸収剤(Ciba Specialty Chemicalsから商品名「TINUVIN 1577」で入手)を含有する65重量%のポリメチルメタクリレート(「PMMA」;「CP−82」)と35重量%のポリビニリデン(Dyneonから商品名「PVDF 6008」で入手)のブレンドをスキン層として使用して、3マニホールドのダイにより、ポリカーボネート三層フィルムを共押出した。コア層は厚さ100マイクロメートル(4ミル)であり、PVDF/PMMA/UVAブレンドスキン層は厚さ50マイクロメートル(2ミル)であった。このUV安定性ポリカーボネート三層フィルムを次に、マイクロ複製ポリウレタンプリズムでコーティングし、その後、実施例2で上述したようにシリカナノ粒子をコーティングした。
ポリカーボネート/FC4400帯電防止ブレンドスキン層を用いて、90重量%のポリカーボネート(「MAKROLON OD2015」)と10重量%のPC−UVAマスターバッチ(Sukano Polymers Corporationから商品名「SUKANO TA28−09 MB01」で入手)のブレンドをコア層として、85重量%のポリカーボネート(「MAKROLON OD2015」)と10重量%のPC−UVAマスターバッチ(「SUKANO TA28−09 MB01」)と5重量%の高分子帯電防止添加剤(3M Companyから商品名「FC4400」で入手)のブレンドをスキン層として使用して、3マニホールドのダイにより、ポリカーボネート三層フィルムを共押出した。ポリカーボネートUVAブレンドコア層は厚さ100マイクロメートル(4ミル)に押出注型し、PC/UVA/FC4400ブレンドスキンは厚さ50マイクロメートル(2ミル)であった。このUV安定性ポリカーボネートコア層を次にマイクロ複製ポリウレタンでコーティングし、その後、実施例2で上述したようにシリカナノ粒子でコーティングした。
80重量%のポリフッ化ビニリデン(Solvay Plastics(Houston,TX)から商品名「PVDF 1008」で入手)と20重量%のポリメチルメタクリレート(ICI Acrylics Inc.(St.Louis,MO)から商品名「CP41」で入手)の層Aを53°のプリズムポリマー成形フィルムに対して共押出し、その間、同時に20重量%のポリフッ化ビニリデン(Solvay Plastics(Houston,TX)から商品名「PVDF 1008」で入手)と80重量%のポリメチルメタクリレート(ICI Acrylics Inc.から商品名「CP41」で入手)から作製した中間体PVDF/PMMA(20:80)結合層Bと、ポリウレタン(Morton International(Seabrook,NH)から商品名「MORTHANE PN03−215」で入手)から作製した第三共押出層Cと、一緒に共押出することにより、PVDF/PMMA(80:20)構造化表面三層フィルムを作製した。三層フィルムの層Aを厚さ19マイクロメートルになるように注型し、層Bを厚さ6マイクロメートルになるように注型し、層Cを厚さ69マイクロメートルになるように注型した。ポリマー成形フィルムを取り外した後、このマイクロ複製PVDF/PMMAプリズムは次に、70%の20nm粒子溶液(「NALCO 1050ナノ粒子溶液」)を30%の4nmシリカナノ粒子溶液(「NALCO 1115ナノ粒子溶液」)と混合し、そのままの溶液に3重量%添加量の硝酸を添加し、脱イオン水で5重量%に希釈することにより調製された酸性化水性ナノ粒子溶液でコーティングして、約20nmの乾燥厚さをもたらした。シリカナノ粒子をコーティングされた、ポリウレタンフィルム上のPVDF/PMMAプリズムを次に85℃に1時間にわたって加熱した。
光学ライティングフィルム(「OPTICAL LIGHTING FILM 2301」)に、2.5重量%のシリカナノ粒子(Nalco Companyから商品名「NALCO 2327」で入手)を2.5重量%のポリウレタンラテックス(「NEOREZ A612」)、3重量%の硝酸と脱イオン水中で混合してpHを2.5にすることにより調製された酸性化水性ウレタンコア−シェルナノ粒子溶液でコーティングされたマイクロ複製ポリカーボネートの押出を行い、この光学ライティングフィルム上で乾燥させて、コンフォーマルコーティングを約20nmの厚さにした。シリカナノ粒子をコーティングされた、アクリル系プリズムフィルムを次に85℃に1時間にわたって加熱した。
実施例2で上述したように作製したPMMAフィルム上の反射防止構造化表面架橋ウレタンプリズムに、4.5重量%のシリカナノ粒子溶液(NALCO Companyから商品名「NALCO 1050」で入手)を4.5重量%のポリウレタンラテックス(DSM Neoresins,Inc.から商品名「NEOREZ R960」で入手)、3重量%の硝酸と脱イオン水中で混合してpHを2.5にすることにより調製された酸性化水性ウレタンコア−シェルナノ粒子溶液をコーティングし、この構造化表面フィルム上で乾燥させて、コンフォーマルコーティングを約20nmの厚さにした。このナノシリカポリウレタン結合剤をコーティングしたプリズムフィルムを次に85℃に1時間にわたって加熱した。
ポリウレタン熱可塑性(「MORTHANE PN03−215」)基材の代わりに静電気消散性ポリウレタン熱可塑性基材(Lubrizol Corporation(Wickcliffe,OH)から商品名「STATRITE 5091」で入手)を用いる以外は、実施例5と同様に、反射防止構造化表面PVDF/PMMAブレンドプリズムフィルムを作製した。
Claims (10)
- 反射防止構造化表面と、前記反射防止構造化表面の上にシリカナノ粒子の多孔質ネットワークを含む焼結コーティングと、を有する透明基材を含む物品であって、ここで、前記シリカナノ粒子が隣接するシリカナノ粒子に結合している、物品。
- 前記シリカナノ粒子の多孔質ネットワークが三次元ネットワークである、請求項1に記載の物品。
- 前記焼結コーティングが、前記透明基材の反射防止構造化表面に対するコンフォーマルコーティングである、請求項1又は2に記載の物品。
- 前記ナノ粒子が二峰性サイズ分布を有する、請求項1〜3のいずれか一項に記載の物品。
- 前記焼結コーティングが、前記透明基材の反射防止構造化表面に対するコンフォーマルコーティングである、請求項1〜4のいずれか一項に記載の物品。
- 前記焼結コーティングが、前記表面構造それ自体よりも、広い範囲の入射光角度にわたって高い光透過率を有する、請求項1〜5のいずれか一項に記載の物品。
- 前記透明基材がフィルムである、請求項1〜6のいずれか一項に記載の物品。
- 前記反射防止構造化表面をもつ透明フィルムが、静電気消散性材料を含む、請求項7に記載の物品。
- 前記透明フィルムの前記反射防止構造化表面が、光に対して反射防止する構造化面を有し、少なくとも前記反射防止構造が架橋ポリマー材料を含み、前記構造化表面が、前記フィルムの残部よりも高い架橋ポリマー密度を有する、請求項7に記載の物品。
- 光エネルギー受容面を有する光吸収剤と、
光エネルギーの供給源と前記光エネルギーを受容する面との間にあるように配置された請求項1〜9のいずれか一項に記載の物品と、を含む、光エネルギー吸収デバイスであって、この間にわたって前記供給源からの光エネルギーが前記光吸収剤により吸収される、光エネルギー吸収デバイス。
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JP2016087561A (ja) * | 2014-11-06 | 2016-05-23 | 富士フイルム株式会社 | 水性塗布液、膜及びその製造方法、積層体、並びに太陽電池モジュール |
JP2017193688A (ja) * | 2016-04-22 | 2017-10-26 | パンサーフェス株式会社 | 親水性付与剤、親水性被膜形成方法、親水性被膜、及び太陽光パネル |
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KR20170137206A (ko) | 2017-12-12 |
BR112013008304A2 (pt) | 2016-06-14 |
EP2625313A1 (en) | 2013-08-14 |
CN103154320A (zh) | 2013-06-12 |
KR20130139959A (ko) | 2013-12-23 |
WO2012047422A1 (en) | 2012-04-12 |
US20130186466A1 (en) | 2013-07-25 |
US20210257504A1 (en) | 2021-08-19 |
JP5869581B2 (ja) | 2016-02-24 |
CN103154320B (zh) | 2015-12-16 |
KR20190120456A (ko) | 2019-10-23 |
US20200123568A1 (en) | 2020-04-23 |
EP2625313B1 (en) | 2020-12-09 |
KR102115937B1 (ko) | 2020-05-27 |
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