JP2013539543A5 - - Google Patents

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Publication number
JP2013539543A5
JP2013539543A5 JP2013518646A JP2013518646A JP2013539543A5 JP 2013539543 A5 JP2013539543 A5 JP 2013539543A5 JP 2013518646 A JP2013518646 A JP 2013518646A JP 2013518646 A JP2013518646 A JP 2013518646A JP 2013539543 A5 JP2013539543 A5 JP 2013539543A5
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JP
Japan
Prior art keywords
film
reflective property
change
radiation
birefringence
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JP2013518646A
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English (en)
Japanese (ja)
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JP2013539543A (ja
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Priority claimed from PCT/US2011/042368 external-priority patent/WO2012012177A1/en
Publication of JP2013539543A publication Critical patent/JP2013539543A/ja
Publication of JP2013539543A5 publication Critical patent/JP2013539543A5/ja
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JP2013518646A 2010-06-30 2011-06-29 空間選択的な複屈折低減を有するフィルムを使用するマスク加工 Withdrawn JP2013539543A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36012910P 2010-06-30 2010-06-30
US61/360,129 2010-06-30
PCT/US2011/042368 WO2012012177A1 (en) 2010-06-30 2011-06-29 Mask processing using films with spatially selective birefringence reduction

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016068116A Division JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

Publications (2)

Publication Number Publication Date
JP2013539543A JP2013539543A (ja) 2013-10-24
JP2013539543A5 true JP2013539543A5 (enExample) 2014-08-14

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JP2013518646A Withdrawn JP2013539543A (ja) 2010-06-30 2011-06-29 空間選択的な複屈折低減を有するフィルムを使用するマスク加工
JP2016068116A Expired - Fee Related JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

Family Applications After (1)

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JP2016068116A Expired - Fee Related JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

Country Status (7)

Country Link
US (3) US9101956B2 (enExample)
EP (1) EP2588903B1 (enExample)
JP (2) JP2013539543A (enExample)
KR (2) KR101851813B1 (enExample)
CN (1) CN103038681B (enExample)
BR (1) BR112012033235A2 (enExample)
WO (1) WO2012012177A1 (enExample)

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JP2021531502A (ja) * 2018-07-17 2021-11-18 カール ツァイス エスエムエス リミテッド フォトリソグラフィマスクの基板に導入される１つまたは複数のピクセルの効果を決定するための方法および装置
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