JP2013527028A - 浸漬型反応器 - Google Patents
浸漬型反応器 Download PDFInfo
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- JP2013527028A JP2013527028A JP2013504180A JP2013504180A JP2013527028A JP 2013527028 A JP2013527028 A JP 2013527028A JP 2013504180 A JP2013504180 A JP 2013504180A JP 2013504180 A JP2013504180 A JP 2013504180A JP 2013527028 A JP2013527028 A JP 2013527028A
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- mixing
- water
- suction chamber
- pipe
- chlorine dioxide
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- 238000007654 immersion Methods 0.000 title description 4
- 238000002156 mixing Methods 0.000 claims abstract description 121
- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 claims abstract description 100
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 93
- 239000004155 Chlorine dioxide Substances 0.000 claims abstract description 50
- 235000019398 chlorine dioxide Nutrition 0.000 claims abstract description 50
- 238000006243 chemical reaction Methods 0.000 claims abstract description 43
- 239000008400 supply water Substances 0.000 claims abstract description 7
- 238000001816 cooling Methods 0.000 claims description 25
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 17
- 239000000460 chlorine Substances 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 238000003786 synthesis reaction Methods 0.000 abstract description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000000498 cooling water Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 6
- 229960002218 sodium chlorite Drugs 0.000 description 6
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 5
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 4
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 3
- 229910001919 chlorite Inorganic materials 0.000 description 3
- 229910052619 chlorite group Inorganic materials 0.000 description 3
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 239000003139 biocide Substances 0.000 description 1
- 230000000035 biogenic effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000003657 drainage water Substances 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
- C02F1/763—Devices for the addition of such compounds in gaseous form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
- B01F23/2323—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by circulating the flow in guiding constructions or conduits
- B01F23/23231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by circulating the flow in guiding constructions or conduits being at least partially immersed in the liquid, e.g. in a closed circuit
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23763—Chlorine or chlorine containing gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
- B01F23/454—Mixing liquids with liquids; Emulsifying using flow mixing by injecting a mixture of liquid and gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
- B01F25/3124—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow
- B01F25/31243—Eductor or eductor-type venturi, i.e. the main flow being injected through the venturi with high speed in the form of a jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
- B01J4/002—Nozzle-type elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B11/00—Oxides or oxyacids of halogens; Salts thereof
- C01B11/02—Oxides of chlorine
- C01B11/022—Chlorine dioxide (ClO2)
- C01B11/023—Preparation from chlorites or chlorates
- C01B11/024—Preparation from chlorites or chlorates from chlorites
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
- C02F1/685—Devices for dosing the additives
- C02F1/686—Devices for dosing liquid additives
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/023—Water in cooling circuits
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Inorganic Chemistry (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
Description
2 混合管
3 ベースプレート
4 サクションチャンバ
5a 供給管路1
5b 供給管路2
6 開口部
7a ポンプ
7b ポンプ
8a タンク
8b タンク
9a チューブ
9b チューブ
10 混入開口
11 給水管路
12 ノズル
13 排水管路
14 クランプセット
15a 引っ張り負荷軽減部材
15b 引っ張り負荷軽減部材
16 アイボルト
17 冷却塔
18 冷却カップ
19 冷却水ポンプ
20 戻り管路
Claims (12)
- 第1の反応成分を供給する第1の供給管路(5a)と、
第2の反応成分を供給する第2の供給管路(5b)と、
両反応成分を混合して反応させ、二酸化塩素を生成する混合管(2)であって、一端において、前記の両供給管路(5a,5b)が開口し、他端において、二酸化塩素濃度を高めたい供給水をノズル(12)によって噴入可能なサクションチャンバ(4)が配置されている混合管(2)と、
前記サクションチャンバ(4)から下流に延びる排水管路(13)と、
を備える、二酸化塩素を水に添加する装置(1)であって、
前記混合管(2)は、二酸化塩素濃度を高めたい、反応成分を含まない混入水を、前記混合管(2)に混入させる少なくとも1つの混入開口(10)を有することを特徴とする、二酸化塩素を水に添加する装置。 - 前記混入開口(10)は、前記供給管路(5a,5b)の、前記混合管(2)への両開口部(6)の下流に配置されている、請求項1記載の装置。
- 前記ノズル(12)と前記排水管路(13)とは、前記サクションチャンバ(4)の領域で、互いに同軸的に配置されている、請求項1又は2記載の装置。
- 前記混合管(2)は、少なくとも前記サクションチャンバ(4)の領域で、前記ノズル(12)及び前記排水管路(13)に対して半径方向に延在する、請求項3記載の装置。
- 前記混合管(2)の、前記サクションチャンバ(4)とは反対側の端部を閉鎖し、前記の両供給管路(5a,5b)が貫通するベースプレート(3)と、前記混合管(2)に前記ベースプレート(3)と前記サクションチャンバ(4)との間で軸方向力を加えるクランプセット(14)とを備える、請求項4記載の装置。
- 前記混合管(2)は、少なくとも前記サクションチャンバ(4)の領域で、前記ノズル(12)及び前記排水管路(13)に対して同軸的に延在する、請求項3記載の装置。
- 前記混合管(2)の縦横比は、最も下流側に配置された開口部(6)から、最も上流側に配置された混入開口(10)までを測定して、5〜8である、請求項1から6までのいずれか1項記載の装置。
- 塩素ガスを供給する供給管路と、
塩素ガスを水と混合させる混合管であって、一端において、前記供給管路が開口し、他端において、塩素濃度を高めたい供給水をノズルによって噴入可能なサクションチャンバが配置されている混合管と、
前記サクションチャンバから下流に延びる排水管路と、
を備える、塩素ガスを水に添加する装置であって、
前記混合管は、塩素ガス濃度を高めたい混入水を、前記混合管に混入させる少なくとも1つの混入開口を有することを特徴とする、塩素ガスを水に添加する装置。 - 水を前記混合管に供給する第2の供給管路を備え、該第2の供給管路は、前記混合管の、第1の供給管路も開口する端部において開口している、請求項8記載の装置。
- 水槽、特に冷却塔(17)の冷却カップ(18)であって、請求項1から9までのいずれか1項記載の装置(1)の少なくとも混合管(2)が、前記混入開口(10)を通して混入水が前記水槽から前記混合管(2)に混入される程度に前記水槽中に沈められていることを特徴とする水槽。
- 前記排水管路(13)は前記水槽に開口する、請求項10記載の水槽。
- 前記水槽から前記ノズル(12)に延びる給水管路(11)を備える、請求項10又は11記載の水槽。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010027840A DE102010027840A1 (de) | 2010-04-16 | 2010-04-16 | Tauchreaktor |
DE102010027840.8 | 2010-04-16 | ||
PCT/EP2011/052334 WO2011128137A2 (de) | 2010-04-16 | 2011-02-17 | Tauchreaktor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013527028A true JP2013527028A (ja) | 2013-06-27 |
JP5850913B2 JP5850913B2 (ja) | 2016-02-03 |
Family
ID=44584131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013504180A Expired - Fee Related JP5850913B2 (ja) | 2010-04-16 | 2011-02-17 | 浸漬型反応器 |
Country Status (12)
Country | Link |
---|---|
US (1) | US9206063B2 (ja) |
EP (1) | EP2558192B1 (ja) |
JP (1) | JP5850913B2 (ja) |
BR (1) | BR112012026300A2 (ja) |
CA (1) | CA2795979A1 (ja) |
DE (2) | DE202010017479U1 (ja) |
DK (1) | DK2558192T3 (ja) |
ES (1) | ES2870586T3 (ja) |
PL (1) | PL2558192T3 (ja) |
PT (1) | PT2558192T (ja) |
SG (2) | SG10201700650TA (ja) |
WO (1) | WO2011128137A2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
HUE033261T2 (en) | 2011-10-14 | 2017-11-28 | Evonik Degussa Gmbh | An improved method of treating water with chlorine dioxide |
MX2019010144A (es) | 2017-02-27 | 2019-10-02 | Ecolab Usa Inc | Metodo para la produccion en sitio de dioxido de cloro. |
WO2018175732A1 (en) * | 2017-03-24 | 2018-09-27 | Ecolab USA, Inc. | Low risk chlorine dioxide onsite generation system |
US10501345B2 (en) | 2017-08-17 | 2019-12-10 | Ecolab Usa Inc. | Low risk chlorine dioxide onsite generation system |
US11970393B2 (en) | 2018-07-05 | 2024-04-30 | Ecolab Usa Inc. | Decomposition mediation in chlorine dioxide generation systems through sound detection and control |
DE102022110015B3 (de) | 2022-04-26 | 2023-08-03 | Matthias Weber | Vorrichtung und Verfahren zur Herstellung von Chlordioxid |
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2011
- 2011-02-17 US US13/641,576 patent/US9206063B2/en active Active
- 2011-02-17 PT PT117049692T patent/PT2558192T/pt unknown
- 2011-02-17 DK DK11704969.2T patent/DK2558192T3/da active
- 2011-02-17 BR BR112012026300A patent/BR112012026300A2/pt active Search and Examination
- 2011-02-17 CA CA2795979A patent/CA2795979A1/en not_active Abandoned
- 2011-02-17 JP JP2013504180A patent/JP5850913B2/ja not_active Expired - Fee Related
- 2011-02-17 SG SG10201700650TA patent/SG10201700650TA/en unknown
- 2011-02-17 WO PCT/EP2011/052334 patent/WO2011128137A2/de active Application Filing
- 2011-02-17 EP EP11704969.2A patent/EP2558192B1/de active Active
- 2011-02-17 SG SG2012075453A patent/SG184548A1/en unknown
- 2011-02-17 ES ES11704969T patent/ES2870586T3/es active Active
- 2011-02-17 PL PL11704969T patent/PL2558192T3/pl unknown
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Also Published As
Publication number | Publication date |
---|---|
PL2558192T3 (pl) | 2021-10-04 |
BR112012026300A2 (pt) | 2016-07-12 |
EP2558192B1 (de) | 2021-04-07 |
WO2011128137A2 (de) | 2011-10-20 |
DE202010017479U1 (de) | 2012-02-16 |
EP2558192A2 (de) | 2013-02-20 |
US9206063B2 (en) | 2015-12-08 |
DE102010027840A1 (de) | 2011-10-20 |
SG10201700650TA (en) | 2017-03-30 |
PT2558192T (pt) | 2021-05-25 |
DK2558192T3 (da) | 2021-07-05 |
WO2011128137A3 (de) | 2011-12-15 |
ES2870586T3 (es) | 2021-10-27 |
US20130106003A1 (en) | 2013-05-02 |
SG184548A1 (en) | 2012-11-29 |
CA2795979A1 (en) | 2011-10-20 |
JP5850913B2 (ja) | 2016-02-03 |
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