JP2013526045A - 太陽電池 - Google Patents
太陽電池 Download PDFInfo
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- JP2013526045A JP2013526045A JP2013506556A JP2013506556A JP2013526045A JP 2013526045 A JP2013526045 A JP 2013526045A JP 2013506556 A JP2013506556 A JP 2013506556A JP 2013506556 A JP2013506556 A JP 2013506556A JP 2013526045 A JP2013526045 A JP 2013526045A
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 238000002161 passivation Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 239000004065 semiconductor Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 24
- 229910052782 aluminium Inorganic materials 0.000 claims description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052709 silver Inorganic materials 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- 238000009713 electroplating Methods 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 238000007650 screen-printing Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 238000007641 inkjet printing Methods 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 238000000992 sputter etching Methods 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims 2
- 229910001120 nichrome Inorganic materials 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 1
- 230000003014 reinforcing effect Effects 0.000 claims 1
- 238000005496 tempering Methods 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 238000005728 strengthening Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000001465 metallisation Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005496 eutectics Effects 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- 229910018125 Al-Si Inorganic materials 0.000 description 2
- 229910018520 Al—Si Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
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Abstract
・複数の島形の開口部を有しており、開口部内では完全に除去された、第2主表面上のパッシベーション積層体と、
・パッシベーション積層体上と、基板表面上の開口部内とに設けられた、第1金属層と、
・第1規則的パターンの幅狭線形の開放部と、第2規則的パターンの幅広線形または細長島形の開放部とを有し、第1開放部パターンと第2開放部パターンとは互いに角度付けられて配向されている、第1金属層を被覆する薄い誘電性のカバー層と
・第2金属層は、前記第1および第2開放部パターンの開放部内に設けられ、はんだ付け可能である露出した表面を有し、開放部内で第1金属層とコンタクトしている、第2金属層と
を備えることを特徴とする太陽電池。
Description
1)全ての技術概念は、プロセスの最後に、裏面に、はんだ付け可能なパッド領域を使用できない広範囲のアルミニウム層が設けられる点で共通している。
請求項1記載の特徴を有する太陽電池、ならびに、請求項10記載の特徴を有するこのような太陽電池を製造する方法が提案される。各従属請求項には、本発明の基本的の好適な実施形態が記載されている。
1)半導体表面に対する局所的なコンタクトを有する従前から通例の広範囲のアルミニウム層に加えて、本発明の太陽電池はさらに、はんだ可能な領域(バスバーまたははんだパッド)も有する。
Claims (13)
- ・とりわけシリコンから形成され、使用状態にて光入射面として使用される第1主表面と、裏面として使用される第2主表面とを有する、nまたはpドーピングされた半導体基板と、
・複数の島形の開口部を有しており、前記開口部内では完全に除去された、前記第2主表面上のパッシベーション積層体と、
・前記パッシベーション積層体上と、前記基板表面上の前記開口部内とに設けられた、第1金属層と、
・第1規則的パターンの幅狭の線形の開放部と、第2規則的パターンの格段に幅広の線形または細長島形の開放部とを有し、前記第1開放部パターンと前記第2開放部パターンとは互いに角度付けられて配向されている、有利には互いに直角に配向されている、前記第1金属層を被覆する薄い誘電性のカバー層と
・前記第2金属層は、前記第1および第2開放部パターンの開放部内に設けられ、はんだ付け可能である露出した表面を有し、前記開放部内で前記第1金属層とコンタクトしている、第2金属層と
を備えることを特徴とする太陽電池。 - 前記第2金属層は、Pd,Ni,Ag,Cu,Snを含むグループから少なくとも1つの金属を含む、
ことを特徴とする請求項1記載の太陽電池。 - 前記第2金属層は、金属の積層体、とりわけ積層体Pd/Ni/AgまたはNi/Cu/Snを含む、
ことを特徴とする請求項2記載の太陽電池。 - 前記第1金属層は、Al,Ti,Pd,Ag,NiCr,Ni,Agを含むグループから少なくとも1つの金属を含む、
ことを特徴とする請求項1から3のいずれか一項記載の太陽電池。 - 前記第1金属層は、金属の積層体、とりわけ積層体Ti/Pd/AgまたはNiCr/Ni/AgまたはAl/Ni種層を含む、
ことを特徴とする請求項4記載の太陽電池。 - 前記第2金属層は、化学的または電気メッキによって堆積された強化層を含む、
ことを特徴とする請求項1から5のいずれか一項記載の太陽電池。 - 前記薄い誘電性のカバー層は、酸化シリコン、窒化シリコン、酸化アルミニウム、窒化アルミニウム、酸化チタンを含むグループから少なくとも1つの材料を含む、
ことを特徴とする請求項1から6のいずれか一項記載の太陽電池。 - 前記半導体基板は、前記第1主表面上の燐ドーピングされたエミッタを備えるpドーピングされたシリコン基板である、
ことを特徴とする請求項1から7のいずれか一項記載の太陽電池。 - 前記半導体基板は、前記第2主表面上のホウ素またはアルミニウムドーピングされたp+エミッタを備えるnドーピングされたシリコン基板である、
ことを特徴とする請求項1から7のいずれか一項記載の太陽電池。 - 請求項1から9のいずれか一項記載の太陽電池の製造方法において、
前記第1金属層を、真空蒸着法またはスパッタリング法によって形成する、
ことを特徴とする方法。 - 前記第2金属層を、化学的または電気メッキによる強化槽を用いて形成する、
ことを特徴とする請求項10記載の方法。 - 前記薄い誘電性のカバー層に設けられる前記第1および第2開放部を、マスキングされたイオンエッチングによって、とりわけ前記薄い誘導性のカバー層を形成した装置と同一の装置において形成する、
ことを特徴とする請求項10または11記載の方法。 - 前記薄い誘電性のカバー層に設けられる第1および第2開放部を、レーザアプレーションによって、または、シルクスクリーン印刷またはインクジェット印刷を用いて被着されるエッチングペーストを使用したエッチングによって形成する、
ことを特徴とする請求項10または11記載の方法。
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Application Number | Priority Date | Filing Date | Title |
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DE102010028189.1A DE102010028189B4 (de) | 2010-04-26 | 2010-04-26 | Solarzelle |
DE102010028189.1 | 2010-04-26 | ||
PCT/EP2011/052954 WO2011134700A2 (de) | 2010-04-26 | 2011-03-01 | Solarzelle |
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JP2013526045A true JP2013526045A (ja) | 2013-06-20 |
Family
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JP2013506556A Pending JP2013526045A (ja) | 2010-04-26 | 2011-03-01 | 太陽電池 |
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US (1) | US9209321B2 (ja) |
EP (1) | EP2586067A2 (ja) |
JP (1) | JP2013526045A (ja) |
KR (1) | KR20130073900A (ja) |
CN (1) | CN102893406B (ja) |
DE (1) | DE102010028189B4 (ja) |
WO (1) | WO2011134700A2 (ja) |
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JP2017502525A (ja) * | 2014-01-13 | 2017-01-19 | ソーラーシティ コーポレーション | 低抵抗率電極を備えた太陽電池のモジュール製作 |
US9761744B2 (en) | 2015-10-22 | 2017-09-12 | Tesla, Inc. | System and method for manufacturing photovoltaic structures with a metal seed layer |
US9773928B2 (en) | 2010-09-10 | 2017-09-26 | Tesla, Inc. | Solar cell with electroplated metal grid |
US9800053B2 (en) | 2010-10-08 | 2017-10-24 | Tesla, Inc. | Solar panels with integrated cell-level MPPT devices |
US9842956B2 (en) | 2015-12-21 | 2017-12-12 | Tesla, Inc. | System and method for mass-production of high-efficiency photovoltaic structures |
US9865754B2 (en) | 2012-10-10 | 2018-01-09 | Tesla, Inc. | Hole collectors for silicon photovoltaic cells |
US9887306B2 (en) | 2011-06-02 | 2018-02-06 | Tesla, Inc. | Tunneling-junction solar cell with copper grid for concentrated photovoltaic application |
US9899546B2 (en) | 2014-12-05 | 2018-02-20 | Tesla, Inc. | Photovoltaic cells with electrodes adapted to house conductive paste |
US9947822B2 (en) | 2015-02-02 | 2018-04-17 | Tesla, Inc. | Bifacial photovoltaic module using heterojunction solar cells |
US10074755B2 (en) | 2013-01-11 | 2018-09-11 | Tesla, Inc. | High efficiency solar panel |
US10084099B2 (en) | 2009-11-12 | 2018-09-25 | Tesla, Inc. | Aluminum grid as backside conductor on epitaxial silicon thin film solar cells |
US10084107B2 (en) | 2010-06-09 | 2018-09-25 | Tesla, Inc. | Transparent conducting oxide for photovoltaic devices |
US10115838B2 (en) | 2016-04-19 | 2018-10-30 | Tesla, Inc. | Photovoltaic structures with interlocking busbars |
US10164127B2 (en) | 2013-01-11 | 2018-12-25 | Tesla, Inc. | Module fabrication of solar cells with low resistivity electrodes |
WO2019044676A1 (ja) | 2017-08-29 | 2019-03-07 | 京セラ株式会社 | 太陽電池素子および太陽電池モジュール |
US10309012B2 (en) | 2014-07-03 | 2019-06-04 | Tesla, Inc. | Wafer carrier for reducing contamination from carbon particles and outgassing |
US10672919B2 (en) | 2017-09-19 | 2020-06-02 | Tesla, Inc. | Moisture-resistant solar cells for solar roof tiles |
US11190128B2 (en) | 2018-02-27 | 2021-11-30 | Tesla, Inc. | Parallel-connected solar roof tile modules |
Families Citing this family (5)
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EP2654090B1 (en) | 2012-04-17 | 2020-07-08 | LG Electronics, Inc. | Solar cell |
TWI500174B (zh) * | 2013-01-08 | 2015-09-11 | Motech Ind Inc | 太陽能電池及其模組 |
TWI505484B (zh) * | 2013-05-31 | 2015-10-21 | Motech Ind Inc | 太陽能電池及其模組 |
US9786800B2 (en) * | 2013-10-15 | 2017-10-10 | Solarworld Americas Inc. | Solar cell contact structure |
CN113306272A (zh) * | 2021-06-21 | 2021-08-27 | 江苏润阳世纪光伏科技有限公司 | 一种丝网印刷生产用的新型网版图形制作方法 |
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2011
- 2011-03-01 JP JP2013506556A patent/JP2013526045A/ja active Pending
- 2011-03-01 US US13/643,648 patent/US9209321B2/en not_active Expired - Fee Related
- 2011-03-01 KR KR1020127030801A patent/KR20130073900A/ko active Search and Examination
- 2011-03-01 CN CN201180020871.4A patent/CN102893406B/zh not_active Expired - Fee Related
- 2011-03-01 EP EP11705887.5A patent/EP2586067A2/de not_active Withdrawn
- 2011-03-01 WO PCT/EP2011/052954 patent/WO2011134700A2/de active Application Filing
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Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10084099B2 (en) | 2009-11-12 | 2018-09-25 | Tesla, Inc. | Aluminum grid as backside conductor on epitaxial silicon thin film solar cells |
US10084107B2 (en) | 2010-06-09 | 2018-09-25 | Tesla, Inc. | Transparent conducting oxide for photovoltaic devices |
US9773928B2 (en) | 2010-09-10 | 2017-09-26 | Tesla, Inc. | Solar cell with electroplated metal grid |
US9800053B2 (en) | 2010-10-08 | 2017-10-24 | Tesla, Inc. | Solar panels with integrated cell-level MPPT devices |
US9887306B2 (en) | 2011-06-02 | 2018-02-06 | Tesla, Inc. | Tunneling-junction solar cell with copper grid for concentrated photovoltaic application |
US9865754B2 (en) | 2012-10-10 | 2018-01-09 | Tesla, Inc. | Hole collectors for silicon photovoltaic cells |
US10115839B2 (en) | 2013-01-11 | 2018-10-30 | Tesla, Inc. | Module fabrication of solar cells with low resistivity electrodes |
US10074755B2 (en) | 2013-01-11 | 2018-09-11 | Tesla, Inc. | High efficiency solar panel |
US10164127B2 (en) | 2013-01-11 | 2018-12-25 | Tesla, Inc. | Module fabrication of solar cells with low resistivity electrodes |
JP2017502525A (ja) * | 2014-01-13 | 2017-01-19 | ソーラーシティ コーポレーション | 低抵抗率電極を備えた太陽電池のモジュール製作 |
US10309012B2 (en) | 2014-07-03 | 2019-06-04 | Tesla, Inc. | Wafer carrier for reducing contamination from carbon particles and outgassing |
US9899546B2 (en) | 2014-12-05 | 2018-02-20 | Tesla, Inc. | Photovoltaic cells with electrodes adapted to house conductive paste |
US9947822B2 (en) | 2015-02-02 | 2018-04-17 | Tesla, Inc. | Bifacial photovoltaic module using heterojunction solar cells |
US9761744B2 (en) | 2015-10-22 | 2017-09-12 | Tesla, Inc. | System and method for manufacturing photovoltaic structures with a metal seed layer |
US10181536B2 (en) | 2015-10-22 | 2019-01-15 | Tesla, Inc. | System and method for manufacturing photovoltaic structures with a metal seed layer |
US9842956B2 (en) | 2015-12-21 | 2017-12-12 | Tesla, Inc. | System and method for mass-production of high-efficiency photovoltaic structures |
US10115838B2 (en) | 2016-04-19 | 2018-10-30 | Tesla, Inc. | Photovoltaic structures with interlocking busbars |
WO2019044676A1 (ja) | 2017-08-29 | 2019-03-07 | 京セラ株式会社 | 太陽電池素子および太陽電池モジュール |
US10672919B2 (en) | 2017-09-19 | 2020-06-02 | Tesla, Inc. | Moisture-resistant solar cells for solar roof tiles |
US11190128B2 (en) | 2018-02-27 | 2021-11-30 | Tesla, Inc. | Parallel-connected solar roof tile modules |
Also Published As
Publication number | Publication date |
---|---|
CN102893406A (zh) | 2013-01-23 |
WO2011134700A2 (de) | 2011-11-03 |
US20130104975A1 (en) | 2013-05-02 |
KR20130073900A (ko) | 2013-07-03 |
DE102010028189B4 (de) | 2018-09-27 |
CN102893406B (zh) | 2016-11-09 |
WO2011134700A3 (de) | 2012-06-07 |
US9209321B2 (en) | 2015-12-08 |
EP2586067A2 (de) | 2013-05-01 |
DE102010028189A1 (de) | 2011-10-27 |
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