JP2013519228A5 - - Google Patents

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Publication number
JP2013519228A5
JP2013519228A5 JP2012551980A JP2012551980A JP2013519228A5 JP 2013519228 A5 JP2013519228 A5 JP 2013519228A5 JP 2012551980 A JP2012551980 A JP 2012551980A JP 2012551980 A JP2012551980 A JP 2012551980A JP 2013519228 A5 JP2013519228 A5 JP 2013519228A5
Authority
JP
Japan
Prior art keywords
barrier
imprint head
substrate
chuck
template
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012551980A
Other languages
English (en)
Japanese (ja)
Other versions
JP5848263B2 (ja
JP2013519228A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2011/000227 external-priority patent/WO2011100050A2/en
Publication of JP2013519228A publication Critical patent/JP2013519228A/ja
Publication of JP2013519228A5 publication Critical patent/JP2013519228A5/ja
Application granted granted Critical
Publication of JP5848263B2 publication Critical patent/JP5848263B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012551980A 2010-02-09 2011-02-08 ナノインプリントのためのプロセスガス閉じ込め Active JP5848263B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30273810P 2010-02-09 2010-02-09
US61/302,738 2010-02-09
PCT/US2011/000227 WO2011100050A2 (en) 2010-02-09 2011-02-08 Process gas confinement for nano-imprinting

Publications (3)

Publication Number Publication Date
JP2013519228A JP2013519228A (ja) 2013-05-23
JP2013519228A5 true JP2013519228A5 (OSRAM) 2014-03-20
JP5848263B2 JP5848263B2 (ja) 2016-01-27

Family

ID=44353067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012551980A Active JP5848263B2 (ja) 2010-02-09 2011-02-08 ナノインプリントのためのプロセスガス閉じ込め

Country Status (5)

Country Link
US (1) US20110193251A1 (OSRAM)
EP (1) EP2534536A2 (OSRAM)
JP (1) JP5848263B2 (OSRAM)
TW (1) TWI620982B (OSRAM)
WO (1) WO2011100050A2 (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722801B2 (ja) 1987-03-18 1995-03-15 石川島播磨重工業株式会社 中空管の鍛造方法
JP3333115B2 (ja) 1997-07-22 2002-10-07 株式会社神戸製鋼所 大径リングの鍛造装置
JP5787691B2 (ja) * 2011-09-21 2015-09-30 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
WO2013048577A1 (en) * 2011-09-26 2013-04-04 Solarity, Inc. Substrate and superstrate design and process for nano-imprinting lithography of light and carrier collection management devices
JP6064466B2 (ja) * 2012-09-11 2017-01-25 大日本印刷株式会社 インプリント方法およびそれを実施するためのインプリント装置
JP6230041B2 (ja) 2013-04-18 2017-11-15 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2015056548A (ja) * 2013-09-12 2015-03-23 大日本印刷株式会社 インプリント装置及びインプリント方法
CN103758153A (zh) * 2014-01-17 2014-04-30 国家电网公司 一种具有警示功能的井盖
JP6525567B2 (ja) * 2014-12-02 2019-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
JP7064310B2 (ja) * 2017-10-24 2022-05-10 キヤノン株式会社 インプリント装置、および物品製造方法
JP7210155B2 (ja) * 2018-04-16 2023-01-23 キヤノン株式会社 装置、方法、および物品製造方法
US11590687B2 (en) 2020-06-30 2023-02-28 Canon Kabushiki Kaisha Systems and methods for reducing pressure while shaping a film

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
US6764386B2 (en) * 2002-01-11 2004-07-20 Applied Materials, Inc. Air bearing-sealed micro-processing chamber
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7670534B2 (en) * 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US7462028B2 (en) 2006-04-03 2008-12-09 Molecular Imprints, Inc. Partial vacuum environment imprinting
US20090056575A1 (en) * 2007-08-31 2009-03-05 Bartman Jon A Pattern transfer apparatus
NL2005435A (en) * 2009-11-30 2011-05-31 Asml Netherlands Bv Imprint lithography apparatus and method.

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