JP2013510290A - ウェハ面上に製造された液体クロマトグラフィー用のチップ並びにその製造方法 - Google Patents
ウェハ面上に製造された液体クロマトグラフィー用のチップ並びにその製造方法 Download PDFInfo
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Abstract
Description
(a)シリコン、ガラス、セラミック又はガラスセラミックからなる平坦な基板を準備する工程、
(b)前記平坦な基板中に1つ又は複数の(横型の)通路構造体をエッチングする工程、
(c)前記通路構造体の少なくとも一部に、固定相用のまだ多孔性ではない前駆体材料を導入する工程、
(d)前記前駆体材料から、多孔性の三次元的な網状構造を形成する工程及び
(e)前記平坦な基板の上面側で通路構造体を液密にカバーする工程
を有する、多孔性の固定相を有する微細化された分離カラムの製造方法が提供される。
−特に高圧液体クロマトグラフィーのために特に重要である著しい機械的安定性;
−二酸化ケイ素が標準カラム材料であるため、典型的なカラムのために存在する全ての被覆材料/機能性材料を受け入れることができる;
−二酸化アルミニウムも、同様に多数の分離のための標準材料である;
−金は、場合により電位を印加することができかつこのカラムは電気的な移動又は分子の検出のために利用することができるという利点を有する;
−親水性から疎水性までの大きな表面バンド領域を調節可能であるため、極めて大きな分析スペクトルを取り扱うことができる;
−全てのプロセスは、Si技術(6/8zoll ウェハレベル)に適合し、つまり多数の製品個数で低コストの再現可能な製品を提供する。
固定相としてのエアロゲルの製造
シリコンウェハのエッチングされたか又は鋸引きされた凹設部中に、次のように製造された粘性の溶液をブレード塗布した:
固定相としてのエアロゲルの製造
TMOS(テトラメトキシシラン)1ml、メタノール0.5ml、シュウ酸(0.001M)1mlを、閉鎖可能なプラスチック容器(5mlの試験管)中に入れ、室温で30分間ゆっくりと振盪させた(TMOSの加水分解)。次いで水酸化アンモニウム溶液(0.5M)0.5mlを添加した。
固定相としての多孔性金
シリコンウェハをリソグラフィーにより構造化し、通路及びコンタクト面を作成した。この構造化は、シリコンウェハの高速エッチング(直線的なエッチング縁部が生じる)又は湿式エッチング(異方性=傾いたエッチング縁部)と、KOH(80℃で30%の水酸化カリウム溶液)又はTMAH(80℃で25%のテトラメチル水酸化アンモニウム)とを組み合わせて行った。引き続き、この通路底部及びコンタクト面に電気メッキ開始層(金)を蒸着させた。
固定相の形成後の基板のカバー
例1〜3により処理されたウェハをPECVD炉中に導入する。250〜450℃で、2μmの厚さの窒化ケイ素層を堆積させ、この窒化ケイ素層は、ウェハの全表面を覆い、それにより通路はコンフォーマルに液密に閉鎖される。
Claims (15)
- カラム中に固定された多孔性の固定相を備えた、クロマトグラフィーのための微細化された分離カラムの製造方法において、次の工程:
(a)シリコン、ガラス、ガラスセラミック又はセラミックからなる平坦な基板を準備する工程、
(b)前記平坦な基板中に少なくとも1つの通路構造体をエッチングする工程、
(c)前記通路構造体の少なくとも一部に、多孔性の固定相用のまだ多孔性ではない前駆体材料を導入する工程、
(d)前記前駆体材料から、多孔性の三次元的な網状構造を作製する工程及び
(e)前記平坦な基板の上面側の通路構造体を液密にカバーする工程
を有する、微細化された分離カラムの製造方法。 - 前記のまだ多孔性でない前駆体材料が通路構造体に化学的に結合するか又は物理的に固着するように、前記前駆体材料を前記通路構造体内へ導入する、請求項1に記載の方法。
- 前記平坦な基板はウェハであり、この基板中に複数の通路構造体がエッチングされる、請求項1又は2に記載の方法。
- 前記ウェハを工程(e)により液密にカバーした後に、個々の素子又はチップを個別化し、特にダイシングする、請求項3に記載の方法。
- 前記のまだ多孔性でない前駆体材料は、金属、特に金又はアルミニウム、酸化物、特に酸化ケイ素又は酸化アルミニウム、及びガラスから選択される、請求項1〜4のいずれかに記載の方法。
- 前記多孔性の三次元的な網状構造を有機基で変性する、請求項1〜5のいずれかに記載の方法。
- 前記変性を、前記通路構造体のカバーの前又は後に行う、請求項6に記載の方法。
- 前記液密のカバーを、カバープレートを用いて行うか又は有利に気相からのコンフォーマルな析出によって行うことを特徴とする、請求項1〜7のいずれかに記載の方法。
- クロマトグラフィー用の微細化された分離カラムにおいて、前記分離カラムの側壁部が、
−平坦なシリコン基板、ガラス基板、ガラスセラミック基板又はセラミック基板の平面内に延在する1つ以上の凹設部、及び
−前記凹設部の1つ以上のカバーにより形成されていて、
前記凹設部は、カラム壁部の少なくとも一部の領域と化学的に又は物理的に結合している、三次元的な網状構造を形成する多孔性の固定相で充填されていて、前記固定相は、金属、セラミック、場合により有機変性された酸化物並びに有機ポリマーから選択される、無機材料又は有機変性された無機材料又は有機材料からなる、分離カラム。 - 前記固定相が、金、アルミニウム、二酸化ケイ素、酸化アルミニウム、ケイ酸塩ガラス又はこれらの材料の組み合わせから形成されていることを特徴とする、請求項9に記載の分離カラム。
- 前記固定相の表面が疎水化されていることを特徴とする、請求項10に記載の分離カラム。
- 前記1つ又は複数のカバーは、コンフォーマルな1つ又は複数のカバーであることを特徴とする、請求項9〜11のいずれかに記載の分離カラム。
- 多数の微細化された分離通路を備えたウェハにおいて、前記分離通路の側壁部が、
−平坦なシリコン基板、ガラス基板、ガラスセラミック基板又はセラミック基板の平面内に延在する1つ以上の凹設部、及び
−前記凹設部の1つ以上のカバーにより形成されていて、前記分離通路の複数又は全ては、通路壁部の少なくとも一部の領域と化学的に又は物理的に結合している、三次元的な網状構造を形成する多孔性の固定相で充填されていて、前記固定相は、金属、セラミック、場合により有機変性された酸化物並びに有機ポリマーから選択される、無機材料又は有機変性された無機材料又は有機材料からなり、前記複数の分離通路は、前記ウェハの切り分けの際に、請求項9〜12のいずれかに記載の、固定相で充填された1つ又は複数の微細化された分離カラムをそれぞれ備えた複数の基板が生じるように配置されている、多数の微細化された分離通路を備えたウェハ。 - さらに、試料投入用ユニット、マイクロポンプ、マイクロバルブ、電気化学的検出のための電極、前記分離通路の熱処理のための装置及びコンタクト、温度センサ、電気的コンタクト、液体供給路及び排出路、溶剤勾配を用いるクロマトグラフィーの実施のための電子的プログラミングエレメント及びデータメモリから選択される複数の構成要素を有する、請求項13に記載のウェハ。
- 請求項9〜12のいずれかに記載の微細化された少なくとも1つの分離カラム、並びに試料投入用ユニット、マイクロポンプ、マイクロバルブ、電気化学的検出のための電極、前記分離通路又はチップ全体の熱処理のための装置及びコンタクト、温度センサ、電気的コンタクト、液体供給路及び排出路、溶剤勾配を用いるクロマトグラフィーの実施のための電子的プログラミングエレメント及びデータメモリから選択される1つ又は複数の構成要素を備えたチップ。
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US20160018365A1 (en) | 2014-06-13 | 2016-01-21 | Masoud Agah | Functionalized Metal Oxides As A Stationary Phase And A Surface Template For Micro Gas Chromatography Separation Columns |
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A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20160617 |