JP2013248582A - Device and method for cleaning article such as substrate for electronic materials - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device and method for cleaning an article, such as a substrate for electronic materials, which can be applied to electronic materials such as silicon substrates for semiconductors, glass substrates for liquid crystals and wafers, requiring high cleaning degree, without using an organic solvent and can remove contaminants of fine particles and glass resists.SOLUTION: A device for cleaning an article, such as a substrate for electronic materials, includes: a reservoir tank 6 for storing a liquid used for spraying, cleaning and the like; a nanobubble generator 7 for generating nanobubbles in the liquid from the reservoir tank; and a device body. At one side of the device body, a supply port Z1 for an article Y to be cleaned is provided; and at the other side, a delivery port Z2 for delivering the article which has been cleaned is provided. Inside of the device, a spraying mechanism 1, a brushing mechanism 2 and a jetting mechanism 3 are provided. A delivery mechanism 4 for delivering the article which has been cleaned with the liquid from the delivery port, and an air jetting mechanism 5 facing the delivery mechanism at the delivery port side are provided. A method for cleaning the article is also provided.

Description

  The present invention relates to a cleaning apparatus and a cleaning method for an object to be cleaned such as a substrate to be cleaned, and particularly to a semiconductor silicon substrate, a liquid crystal glass substrate, a wafer and the like.

  2. Description of the Related Art Conventionally, in a semiconductor manufacturing process and a liquid crystal panel manufacturing process, steps such as a shower nozzle and high pressure injection are provided in a cleaning process of an object to be cleaned to remove foreign matters from the object to be cleaned.

  On the other hand, the droplets adhering to the object to be cleaned are drained by an air nozzle in a subsequent process.

  The reason is that particles such as cuttings and burrs are generated in the cutting process of the liquid crystal panel substrate, and if these particles are left as they are, a short circuit occurs between the photoelectric conversion cells, and the output characteristics and insulation of the substrate. It becomes a cause by which a characteristic and a withstand voltage characteristic are reduced.

  Substrate cleaning methods and substrate cleaning apparatuses exist. For example, as in Patent Document 1.

  However, this technique is to selectively remove the adhesive facing from the boundary of the substrate element, and cleans by reciprocating the nozzle arrangement part 5 times with respect to the substrate that is the object to be cleaned. The substrate is tilted or rocked, and the cleaning liquid uses an organic or inorganic alkaline solution.

JP 2006-10947 A

  Therefore, this invention is applied to the cleaning of electronic materials that require high cleanliness such as silicon substrates for semiconductors, glass substrates for liquid crystals, and wafers, and removes particulate contamination, glass resists, etc. without using organic solvents. It is an object of the present invention to provide a cleaning device for an object to be cleaned such as an electronic material substrate and a cleaning method thereof.

  Therefore, as a result of intensive research to solve the above-described problems, the present invention provides a gas / liquid mixed liquid containing micro-nano bubbles (fine bubbles) to the object to be cleaned. By contacting the surface of the object to be cleaned, the micro / nano bubbles adhere to the foreign matter, and the liquid film is efficiently formed by the wettability of the gas / liquid mixed liquid on the surface of the object to be cleaned. An object of the present invention is to provide an apparatus for cleaning an object to be cleaned, such as an electronic material substrate, which physically removes foreign matters by spraying or the like and a cleaning method therefor.

  The gas / liquid mixed liquid described above is supplied to the object to be cleaned in a mist form by the spray nozzle, thereby supplying the gas / liquid mixed liquid uniformly to the foreign matter adhering to the object to be cleaned. And

  According to the present invention, when cleaning, the gas / liquid mixed liquid containing micro-nano bubbles (fine bubbles) is brought into contact with the surface of the object to be cleaned, so that the micro-nano bubbles adhere to the foreign matter, In addition, the liquid film can be formed efficiently by the wettability of the gas / liquid mixed liquid on the surface of the object to be cleaned, and the foreign matter can be physically removed by high-pressure jet in the subsequent process. It plays.

It is explanatory drawing which shows one Example of the washing | cleaning apparatus used for this invention. It is explanatory drawing which shows the other Example of the washing | cleaning apparatus used for this invention.

  Hereinafter, the present invention will be described in detail. It should be noted that the present invention is not limited to the following description, and can be appropriately changed without departing from the gist of the present invention.

  Therefore, one embodiment of the invention of the apparatus will be described in detail with reference to FIG. 1. For example, in the clean room (A), the apparatus main body (X) has an object to be cleaned (Y) on one end side. It has a carry-in port (Z1) and a carry-out port (Z2) for carrying out the object to be cleaned (Y) on the other end side. Inside the apparatus main body (X), there are a spray mechanism (1) and a brush mechanism. (2) an unloading mechanism (4) having an injection mechanism (3) and carrying out the object (Y) to be cleaned from the unloading port (Z2), and carrying on the unloading port (Z2) side An electronic material provided with an air injection mechanism (5) provided to face the mechanism (4) and blows off water droplets remaining on the surface of the object to be cleaned (Y) which has been cleaned. It is composed of a cleaning device for an object to be cleaned such as an industrial substrate.

  Furthermore, the configuration of the apparatus main body used in the present invention includes a storage tank (6) for storing liquid used for spraying, cleaning, and the like, and generating nanobubbles in the liquid from the storage tank (6). A nanobubble generator (7) sprays a liquid containing fine bubbles in which nanobubbles are generated.

  As an example of the spray mechanism (1), a spray nozzle that sprays the liquid containing fine bubbles in which nano bubbles are generated is used. As an example of the brush mechanism (2), a cleaning brush for performing physical cleaning is used. In some cases, the brush mechanism (2) may be unnecessary. As an example of the injection mechanism (3), an injection nozzle for high-pressure injection is used. (3) is provided at two locations in the drawing, but is not limited to this, and the installation of the injection mechanism (3) can be increased or decreased.

  Furthermore, an air brush is used as an example of the air injection mechanism (5) for removing the droplets remaining on the object to be cleaned (Y).

  The liquid to be sprayed is a fine bubble-containing liquid in which nanobubbles are generated in the liquid, and the gas that generates nanobubbles can use air, nitrogen, hydrogen, etc., and the liquid is pure water or other liquid It is possible. The liquid to be sprayed is basically pure water, but it can be changed to alkaline electrolyzed water, and a gas / liquid mixed liquid containing micro / nano bubbles can also be used.

  Next, the invention of the method of the present invention will be described in detail with reference to FIG. 2. For example, in the clean room (A), the inlet ( Z1) has a carry-out port (Z2) for carrying out the object to be cleaned (Y) on the other end side, and has a spray mechanism (1), a brush mechanism (2), and an injection mechanism (3) inside. In the cleaning apparatus having the carry-out mechanism (4) for carrying out the object to be cleaned (Y) that has been cleaned from the carry-out port (Z2), the cleaning device is provided relative to the transfer mechanism (4) on the carry-out port (Z2) side. A method for cleaning an object to be cleaned such as a substrate for electronic materials, characterized in that water droplets remaining on the surface of the object to be cleaned (Y) which has been cleaned are blown off by an air injection mechanism (5) and drained. Consists of

  However, the present invention may be used in places other than the clean room (A), and the structure of the apparatus main body (X) is a water storage tank (6) for storing liquid used for spraying, cleaning, etc., a water storage tank Nanobubble generator (7) for generating nanobubbles in liquid from (6), spray mechanism (3) for spraying liquid containing fine bubbles generated by nanobubbles, cleaning brush (2) for performing physical cleaning, storage What is used to remove liquid droplets remaining on the object to be cleaned (Y) by the air injection mechanism (5) which is injected from the tank (6) by the injection mechanism (3) by the pump (8) and is injected at high pressure. Is an airbrush.

  The liquid to be sprayed is a fine bubble-containing liquid in which nanobubbles are generated in the liquid, and the gas that generates nanobubbles can use air, nitrogen, hydrogen, etc., and the liquid is pure water or other liquid In addition, pure water can be used at an elevated temperature when used for jetting and spraying.

  The liquid sprayed from the spray mechanism is a gas / liquid mixed liquid containing micro / nano bubbles, and the gas / liquid mixed liquid containing micro / nano bubbles is a micro / nano bubble generating device (for example, the applicant of the present application) provided in a cleaning device. Is produced and sprayed according to the patent No. 4556396 (patented invention).

  According to the present invention, a technology for a cleaning apparatus and a cleaning method for an object to be cleaned such as an electronic material substrate is established, and manufacturing and sales are performed based on the established technology, and thus there is industrial applicability. Is.

DESCRIPTION OF SYMBOLS 1 Spraying mechanism 2 Brush mechanism 3 Injecting mechanism 4 Unloading / conveying mechanism 5 Air injecting mechanism 6 Storage tank 7 Nano bubble generator 8 Pump A Clean room X Apparatus body Y To-be-cleaned object Z1 Inlet Z2 Inlet

The liquid sprayed from the spray mechanism is a gas / liquid mixed liquid containing micro / nano bubbles, and the gas / liquid mixed liquid containing micro / nano bubbles is a micro / nano bubble device (for example, the inventor of the present application). And is sprayed on according to the patent No. 4556396 (patented invention).

Claims (7)

  It consists of a storage tank that stores liquid used for spraying, cleaning, etc., a nanobubble generator that generates nanobubbles from the storage tank to the liquid, and an apparatus main body. There is a carry-out port for carrying out the object to be cleaned on the end side, and the apparatus main body has a spray mechanism, a brush mechanism, and an ejection mechanism, and the object to be cleaned has been cleaned using liquid. An apparatus for cleaning an object to be cleaned such as a substrate for electronic material, which includes an unloading mechanism for unloading the substrate from an unloading port and an air injection mechanism opposite to the transfer mechanism on the unloading port side.   The apparatus for cleaning an object to be cleaned such as an electronic material substrate according to claim 1, wherein the internal structure of the apparatus main body omits the brush mechanism and increases or decreases the number of injection mechanisms.   2. The apparatus for cleaning an object to be cleaned such as an electronic material substrate according to claim 1, wherein the liquid sprayed by the spray mechanism is pure water or alkaline electrolyzed water.   4. The apparatus for cleaning an object to be cleaned such as a substrate for electronic material according to claim 3, wherein the pure water is sprayed or sprayed with a temperature increased.   The apparatus for cleaning an object to be cleaned such as an electronic material substrate according to claim 1, wherein the liquid sprayed from the spray mechanism is a gas / liquid mixed liquid containing micro / nano bubbles.   6. The cleaning of an object to be cleaned such as a substrate for electronic materials according to claim 5, wherein the gas / liquid mixed liquid containing the micro / nano bubbles is generated and sprayed by a micro / nano bubble generating device provided in a cleaning device. apparatus.   In a storage tank for storing a liquid to be used for spraying, cleaning, etc., a nanobubble generator for generating nanobubbles in the liquid from the storage tank, and a cleaning apparatus for an object to be cleaned such as a substrate for electronic material comprising the apparatus main body, the apparatus main body There is a carry-in port for the object to be cleaned on one end side and an exit for carrying out the object to be cleaned on the other end side, and the object to be cleaned that has been cleaned by the spray mechanism, brush mechanism, and spray mechanism is carried inside. In the cleaning apparatus having a carry-out mechanism for carrying out from the outlet, water drops remaining on the surface of the object to be cleaned, which is provided relative to the carrying mechanism on the carry-out side, are blown off by the air jet mechanism to drain the water. A method for cleaning an object to be cleaned such as a substrate for electronic materials.

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