JP2013232531A5 - - Google Patents

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Publication number
JP2013232531A5
JP2013232531A5 JP2012103832A JP2012103832A JP2013232531A5 JP 2013232531 A5 JP2013232531 A5 JP 2013232531A5 JP 2012103832 A JP2012103832 A JP 2012103832A JP 2012103832 A JP2012103832 A JP 2012103832A JP 2013232531 A5 JP2013232531 A5 JP 2013232531A5
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JP
Japan
Prior art keywords
charged particle
region
substrate
data
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012103832A
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English (en)
Japanese (ja)
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JP2013232531A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012103832A priority Critical patent/JP2013232531A/ja
Priority claimed from JP2012103832A external-priority patent/JP2013232531A/ja
Priority to US13/869,483 priority patent/US20130288181A1/en
Publication of JP2013232531A publication Critical patent/JP2013232531A/ja
Publication of JP2013232531A5 publication Critical patent/JP2013232531A5/ja
Abandoned legal-status Critical Current

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JP2012103832A 2012-04-27 2012-04-27 描画装置及び物品の製造方法 Abandoned JP2013232531A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012103832A JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法
US13/869,483 US20130288181A1 (en) 2012-04-27 2013-04-24 Drawing apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012103832A JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2013232531A JP2013232531A (ja) 2013-11-14
JP2013232531A5 true JP2013232531A5 (https=) 2015-06-18

Family

ID=49477603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012103832A Abandoned JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法

Country Status (2)

Country Link
US (1) US20130288181A1 (https=)
JP (1) JP2013232531A (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015126246A1 (en) * 2014-02-21 2015-08-27 Mapper Lithography Ip B.V. Proximity effect correction in a charged particle lithography system
JP6316052B2 (ja) * 2014-03-26 2018-04-25 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP6892214B2 (ja) * 2014-07-10 2021-06-23 アイエムエス ナノファブリケーション ゲーエムベーハー 畳み込みカーネルを使用する粒子ビーム描画機のカスタマイズ化
KR102179130B1 (ko) * 2015-07-17 2020-11-18 아이엠에스 나노패브릭케이션 게엠베하 하전 입자 멀티빔 노출 툴의 결함 빔렛 보상
JP6755764B2 (ja) * 2016-09-27 2020-09-16 株式会社Ｓｃｒｅｅｎホールディングス 位置計測装置および位置計測方法
JP7206830B2 (ja) * 2018-11-15 2023-01-18 大日本印刷株式会社 荷電マルチビーム描画装置の描画データ作成方法
US10748744B1 (en) * 2019-05-24 2020-08-18 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density
US20230124768A1 (en) 2019-05-24 2023-04-20 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density
US11756765B2 (en) 2019-05-24 2023-09-12 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6035113A (en) * 1998-01-05 2000-03-07 International Business Machines Corporation Electron beam proximity correction method for hierarchical design data
US6610989B1 (en) * 1999-05-31 2003-08-26 Fujitsu Limited Proximity effect correction method for charged particle beam exposure
JP4017935B2 (ja) * 2002-07-30 2007-12-05 株式会社日立ハイテクノロジーズ マルチビーム型電子線描画方法及び装置

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