JP2013203800A - Heat-peelable adhesive sheet for cutting electronic component, and method for processing electronic component - Google Patents
Heat-peelable adhesive sheet for cutting electronic component, and method for processing electronic component Download PDFInfo
- Publication number
- JP2013203800A JP2013203800A JP2012071957A JP2012071957A JP2013203800A JP 2013203800 A JP2013203800 A JP 2013203800A JP 2012071957 A JP2012071957 A JP 2012071957A JP 2012071957 A JP2012071957 A JP 2012071957A JP 2013203800 A JP2013203800 A JP 2013203800A
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- JP
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- Prior art keywords
- heat
- sensitive adhesive
- energy ray
- layer
- peelable pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000853 adhesive Substances 0.000 title abstract description 61
- 230000001070 adhesive effect Effects 0.000 title abstract description 61
- 238000000034 method Methods 0.000 title description 43
- 238000012545 processing Methods 0.000 title description 20
- 238000005520 cutting process Methods 0.000 title description 17
- 239000010410 layer Substances 0.000 claims abstract description 233
- 239000000463 material Substances 0.000 claims abstract description 88
- 239000011247 coating layer Substances 0.000 claims abstract description 80
- 229920000103 Expandable microsphere Polymers 0.000 claims abstract description 51
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 226
- 239000000758 substrate Substances 0.000 claims description 62
- 229920002635 polyurethane Polymers 0.000 claims description 23
- 239000004814 polyurethane Substances 0.000 claims description 23
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 19
- 229920001577 copolymer Polymers 0.000 claims description 14
- 229920000728 polyester Polymers 0.000 claims description 13
- 239000002243 precursor Substances 0.000 claims description 5
- 238000003672 processing method Methods 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 abstract description 13
- -1 acrylic compound Chemical class 0.000 description 34
- 239000000178 monomer Substances 0.000 description 27
- 229920005989 resin Polymers 0.000 description 25
- 239000011347 resin Substances 0.000 description 25
- 206010040844 Skin exfoliation Diseases 0.000 description 24
- 125000000524 functional group Chemical group 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 16
- 229920002799 BoPET Polymers 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 235000012431 wafers Nutrition 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 11
- 229920000058 polyacrylate Polymers 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000003505 polymerization initiator Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- 229920001971 elastomer Polymers 0.000 description 7
- 239000005060 rubber Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000976 ink Substances 0.000 description 6
- 239000012948 isocyanate Substances 0.000 description 6
- 239000004005 microsphere Substances 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 239000003431 cross linking reagent Substances 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 238000000227 grinding Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 229920000915 polyvinyl chloride Polymers 0.000 description 4
- 239000004800 polyvinyl chloride Substances 0.000 description 4
- 230000003405 preventing effect Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 229920002050 silicone resin Polymers 0.000 description 4
- 229920003051 synthetic elastomer Polymers 0.000 description 4
- 239000005061 synthetic rubber Substances 0.000 description 4
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000005062 Polybutadiene Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 230000003712 anti-aging effect Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000005038 ethylene vinyl acetate Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 2
- FJZUEFWBFXGJQE-UHFFFAOYSA-N 2-ethylhexyl prop-2-enoate;ethyl prop-2-enoate;2-hydroxyethyl prop-2-enoate Chemical compound CCOC(=O)C=C.OCCOC(=O)C=C.CCCCC(CC)COC(=O)C=C FJZUEFWBFXGJQE-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- NPSJHQMIVNJLNN-UHFFFAOYSA-N 2-ethylhexyl 4-nitrobenzoate Chemical compound CCCCC(CC)COC(=O)C1=CC=C([N+]([O-])=O)C=C1 NPSJHQMIVNJLNN-UHFFFAOYSA-N 0.000 description 1
- 239000004808 2-ethylhexylester Substances 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- VHFGGWSXGDWGOY-UHFFFAOYSA-N 2-isocyanatoethyl 2-methylprop-2-enoate 5-isocyanato-2-methylpent-2-enoic acid Chemical compound N(=C=O)CCC=C(C(=O)O)C.C(C(=C)C)(=O)OCCN=C=O VHFGGWSXGDWGOY-UHFFFAOYSA-N 0.000 description 1
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- XVZXOLOFWKSDSR-UHFFFAOYSA-N Cc1cc(C)c([C]=O)c(C)c1 Chemical group Cc1cc(C)c([C]=O)c(C)c1 XVZXOLOFWKSDSR-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical group C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- NYXVMNRGBMOSIY-UHFFFAOYSA-N OCCC=CC(=O)OP(O)(O)=O Chemical compound OCCC=CC(=O)OP(O)(O)=O NYXVMNRGBMOSIY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- KQNZLOUWXSAZGD-UHFFFAOYSA-N benzylperoxymethylbenzene Chemical compound C=1C=CC=CC=1COOCC1=CC=CC=C1 KQNZLOUWXSAZGD-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000005354 coacervation Methods 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- RDOXTESZEPMUJZ-UHFFFAOYSA-N methyl phenyl ether Natural products COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- VDQIULUXBLYBSU-UHFFFAOYSA-N morpholin-4-yl prop-2-enoate Chemical compound C=CC(=O)ON1CCOCC1 VDQIULUXBLYBSU-UHFFFAOYSA-N 0.000 description 1
- DASJFYAPNPUBGG-UHFFFAOYSA-N naphthalene-1-sulfonyl chloride Chemical compound C1=CC=C2C(S(=O)(=O)Cl)=CC=CC2=C1 DASJFYAPNPUBGG-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006264 polyurethane film Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000003190 viscoelastic substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/29—Laminated material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/50—Adhesives in the form of films or foils characterised by a primer layer between the carrier and the adhesive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/51—Elastic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/748—Releasability
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/412—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of microspheres
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/50—Additional features of adhesives in the form of films or foils characterized by process specific features
- C09J2301/502—Additional features of adhesives in the form of films or foils characterized by process specific features process for debonding adherents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2475/00—Presence of polyurethane
- C09J2475/006—Presence of polyurethane in the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Adhesive Tapes (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本発明は、加熱処理にて接着力を低減して被着体より簡単に剥離でき、電子部品等への加工工程に好適な加熱剥離型粘着シートに関する。
また、産業の利用分野として電子部品(例えば半導体ウエハ・積層セラミック部品・フィルム状半導体部品)などの加工用(研磨用・ダイシング用・回路形成用など)に関する。
The present invention relates to a heat-peelable pressure-sensitive adhesive sheet that can be easily peeled off from an adherend by reducing the adhesive force by heat treatment, and is suitable for a processing step to an electronic component or the like.
In addition, as an industrial application field, the present invention relates to processing of electronic parts (for example, semiconductor wafers, multilayer ceramic parts, film-like semiconductor parts) (for polishing, dicing, circuit formation, etc.).
積層セラミックコンデンサや半導体ウエハ、フィルム状半導体などの電子部品の製造工程には、該電子部品を粘着シート等に貼着した状態で加工する工程(例えば、基板のダイシング工程など)が含まれ、該粘着シートとして、加熱処理により剥離可能な熱剥離性粘着シートが多く使用されている。前記熱剥離性粘着シートは、熱剥離性微小球を含有する熱膨張性粘着層を有しているため、該熱膨張性粘着層の表面に電子部品(被着体)を貼着、固定することにより該被着体に所望の加工を施すことができるとともに、加工後には、加熱により熱膨張性粘着層中の熱膨張性微小球を膨張させて粘着力を低下又は消失させることにより被着体から容易に剥離できるという特徴がある。 The manufacturing process of an electronic component such as a multilayer ceramic capacitor, a semiconductor wafer, or a film-like semiconductor includes a step of processing the electronic component in a state of being attached to an adhesive sheet (for example, a substrate dicing step). As the pressure-sensitive adhesive sheet, many heat-peelable pressure-sensitive adhesive sheets that can be peeled off by heat treatment are used. Since the heat-peelable pressure-sensitive adhesive sheet has a heat-expandable pressure-sensitive adhesive layer containing heat-peelable microspheres, an electronic component (adhered body) is adhered and fixed to the surface of the heat-expandable pressure-sensitive adhesive layer. Thus, the adherend can be subjected to desired processing, and after processing, the heat-expandable microspheres in the heat-expandable adhesive layer are expanded by heating to reduce or eliminate the adhesive force. It is characterized by being easily peelable from the body.
しかしながら、該粘着シートを用いて電子部品などを加工する場合、例えば、半導体ウエハ製造工程に含まれるバックグラインド工程においては、熱膨張性粘着層に接した被着体に大きな面応力がかかることによって、熱膨張性粘着層中の熱膨張性微小球の凹凸形状が被着体表面に転写したり、転写された凹凸によって被着体の厚さにバラツキが生じて加工精度が低下するなどの問題がある。 However, when an electronic component or the like is processed using the pressure-sensitive adhesive sheet, for example, in the back grinding process included in the semiconductor wafer manufacturing process, a large surface stress is applied to the adherend in contact with the thermally expandable pressure-sensitive adhesive layer. The problem is that the uneven shape of the thermally expandable microspheres in the thermally expandable adhesive layer is transferred to the surface of the adherend, and the thickness of the adherend varies due to the transferred unevenness, resulting in a decrease in processing accuracy. There is.
また、該粘着シートの熱膨張性粘着層表面に貼着した被着体又は該被着体を内部に有する型内にシリコーン樹脂やエポキシ樹脂などの液状樹脂を流し込み、加熱、硬化させる工程においては、樹脂硬化時に熱膨張性微小球の凹凸が熱膨張性粘着層に接する被着体表面に形状転写したり、該樹脂の硬化温度により部分的に低温膨張した熱膨張性微小球の凹凸が形状転写する場合がある。 In the process of pouring a liquid resin such as a silicone resin or an epoxy resin into an adherend adhered to the surface of the heat-expandable adhesive layer of the adhesive sheet or a mold having the adherend inside, and heating and curing the resin. When the resin is cured, the irregularities of the thermally expandable microspheres are transferred to the surface of the adherend contacting the thermally expandable adhesive layer, or the irregularities of the thermally expandable microspheres partially expanded at a low temperature due to the curing temperature of the resin. There is a case to transfer.
また、加工後の被着体が脆弱である場合や被着体自体の反りを防ぐために、これまで、被着体を貼着した粘着シートに支持体を貼り合わせて加工する、いわゆる台座方式が採用されている。例えば、前記半導体ウエハのバックグラインド工程において、熱剥離性両面粘着シートの熱膨張性粘着層表面に研削加工を施すウエハを貼着し、熱膨張性粘着層の反対面(例えば基材面)に支持体として台座ウエハを貼り合わせて加工を施す方法が行われている。しかし、このような場合には、加熱剥離後の被着体(ウエハ)に、熱膨張性微小球が熱膨張した粘着剤の凝集破壊に起因する多量の有機物汚染が認められ、この汚染が、後工程において不具合を引き起こす原因となる場合がある。
この課題に対して特許文献1に記載されているように、基材の片面に熱膨張性微小球を含む熱膨張性粘着層、他面に感圧性接着剤又はエネルギー線硬化型粘着剤からなる粘着層を設けた熱剥離性両面粘着シートを用いて加工することで加工後の被着体を損傷なく容易に回収する方法が知られていた。
Moreover, in order to prevent the adherend after processing or the adherend itself from warping, there is a so-called pedestal method in which a support is pasted to an adhesive sheet to which the adherend is attached. It has been adopted. For example, in the back grinding process of the semiconductor wafer, a wafer to be ground is attached to the surface of the heat-expandable double-sided pressure-sensitive adhesive sheet, and the opposite surface (for example, the substrate surface) of the heat-expandable pressure-sensitive adhesive layer is attached. A method of performing processing by bonding a pedestal wafer as a support is performed. However, in such a case, a large amount of organic contamination due to the cohesive failure of the pressure-sensitive adhesive in which the thermally expandable microspheres are thermally expanded is observed on the adherend (wafer) after heat separation, In some cases, this may cause problems in the subsequent process.
As described in Patent Document 1 for this problem, the base material is composed of a heat-expandable pressure-sensitive adhesive layer containing heat-expandable microspheres on one side, and a pressure-sensitive adhesive or an energy ray-curable pressure-sensitive adhesive on the other side. There has been known a method of easily recovering a processed adherend without damage by processing using a heat-peelable double-sided pressure-sensitive adhesive sheet provided with an adhesive layer.
しかしながら、この方法にて使用する従来のエネルギー線硬化型熱剥離性粘着シートは、硬化後のエネルギー線硬化型弾性層と基材との密着性が十分ではなく、エネルギー線硬化型弾性層と基材との間で部分的に剥離(投錨破壊)が生じることがあり、被着体に糊残りが生じることがあったため、このような支障を解消することが必要であった。 However, the conventional energy ray curable heat-peelable pressure-sensitive adhesive sheet used in this method does not have sufficient adhesion between the cured energy ray curable elastic layer and the substrate, and the energy ray curable elastic layer Since peeling (throwing destruction) may partially occur between the materials and adhesive residue may be generated on the adherend, it is necessary to eliminate such troubles.
本発明者らは、従来のエネルギー線硬化型熱剥離性粘着シートの投錨剥離について鋭意研究を行った結果、粘着剤層と基材との間で化学的に親和性を高める方法及び基材表面に微細な凹凸を形成して両者の接触面積を増大する方法など、通常の粘着シートで利用されている方法によっては、上述した投錨剥離を有効に防止し得ないこと等を新たに見出した。そして、この種の粘着シートについての投錨破壊を効果的に抑制することができる熱剥離性粘着シートの構成についての試行錯誤を繰り返し、以下の本発明の完成に至った。 As a result of earnest research on the throwing and peeling of the conventional energy ray curable heat-peelable pressure-sensitive adhesive sheet, the inventors of the present invention have revealed that a method for chemically increasing the affinity between the pressure-sensitive adhesive layer and the substrate and the surface of the substrate The present inventors have newly found that the above-described throwing-off cannot be effectively prevented by a method used in a normal pressure-sensitive adhesive sheet, such as a method of forming fine irregularities on the surface to increase the contact area between the two. And the trial and error about the structure of the heat-peelable adhesive sheet which can suppress the throwing destruction about this kind of adhesive sheet effectively was repeated, and it came to completion of the following this invention.
1.基材の一方の面に、熱膨張性微小球を含有する熱剥離型粘着剤層を設けてなる加熱剥離型粘着シートであって、他方の面に有機コーティング層を介してエネルギー線硬化型弾性層が配置されていることを特徴とする加熱剥離型粘着シート。
2.前記有機コーティング層が、ポリウレタン、ウレタン変性酢酸ビニル−塩化ビニルコポリマー、ポリアクリルウレタン、又はポリウレタンポリエステルもしくはそれらの前駆物質を用いて形成されてなる1に記載の加熱剥離型粘着シート。
3.エネルギー線硬化型弾性層の厚みが3〜300μmであることを特徴とする1又は2に記載の加熱剥離型粘着シート。
4.基材の一方の面に、熱膨張性微小球を含有する熱剥離型粘着剤層を設けてなる加熱剥離型粘着シートであって、熱剥離型粘着剤層がエネルギー線硬化型弾性層又は有機コーティング層とエネルギー線硬化型弾性層を介して設けられ、他方の面に有機コーティング層を介してエネルギー線硬化型弾性層が配置されていることを特徴とする加熱剥離型粘着シート。
5.前記有機コーティング層が、ポリウレタン、ウレタン変性酢酸ビニル−塩化ビニルコポリマー、ポリアクリルウレタン、又はポリウレタンポリエステルもしくはそれらの前駆物質を用いて形成されてなる4に記載の加熱剥離型粘着シート。
6.エネルギー線硬化型弾性層の厚みが3〜300μmであることを特徴とする4又は5に記載の加熱剥離型粘着シート。
7.1〜6のいずれかに記載の加熱剥離型粘着シートに被加工物を貼付した状態において該被加工物を加工することを特徴とする被加工物の加工方法。
1. A heat-peelable pressure-sensitive adhesive sheet comprising a heat-peelable pressure-sensitive adhesive layer containing thermally expandable microspheres on one surface of a base material, and energy ray-curable elasticity via an organic coating layer on the other surface A heat-peelable pressure-sensitive adhesive sheet comprising a layer.
2. 2. The heat-peelable pressure-sensitive adhesive sheet according to 1, wherein the organic coating layer is formed using polyurethane, urethane-modified vinyl acetate-vinyl chloride copolymer, polyacryl urethane, polyurethane polyester, or a precursor thereof.
3. The heat-peelable pressure-sensitive adhesive sheet according to 1 or 2, wherein the energy ray-curable elastic layer has a thickness of 3 to 300 µm.
4). A heat-peelable pressure-sensitive adhesive sheet comprising a heat-peelable pressure-sensitive adhesive layer containing thermally expandable microspheres on one surface of a substrate, wherein the heat-peelable pressure-sensitive adhesive layer is an energy ray-curable elastic layer or organic A heat-peelable pressure-sensitive adhesive sheet, which is provided via a coating layer and an energy ray-curable elastic layer, and has an energy ray-curable elastic layer disposed on the other surface via an organic coating layer.
5. 5. The heat-peelable pressure-sensitive adhesive sheet according to 4, wherein the organic coating layer is formed using polyurethane, urethane-modified vinyl acetate-vinyl chloride copolymer, polyacryl urethane, polyurethane polyester, or a precursor thereof.
6). The heat-peelable pressure-sensitive adhesive sheet according to 4 or 5, wherein the energy ray-curable elastic layer has a thickness of 3 to 300 µm.
The processing method of a workpiece characterized by processing the workpiece in a state in which the workpiece is attached to the heat-peelable pressure-sensitive adhesive sheet according to any one of 7.1 to 6.
本発明によれば、硬化後のエネルギー線硬化型弾性層と基材との密着性が十分では無いことによる、エネルギー線硬化型弾性層と基材との間での部分的な剥離(投錨破壊)の発生に起因する、被着体への糊残りの発生を防止することができる。 According to the present invention, partial peeling between the energy ray curable elastic layer and the substrate due to insufficient adhesion between the energy ray curable elastic layer after curing and the substrate (throwing failure). ), It is possible to prevent occurrence of adhesive residue on the adherend.
上記課題を解決するために鋭意研究を行った結果、これらの課題に対して、まず、基材とエネルギー線硬化型弾性層との間に有機コーティング層を設けることで該エネルギー線硬化型弾性層の基材への密着性を向上させることにより、剥離時において糊残りを生じないようにすることが可能となることを見出し、本発明に至った。 As a result of diligent research to solve the above problems, in response to these problems, first, an organic coating layer is provided between the base material and the energy ray curable elastic layer to thereby provide the energy ray curable elastic layer. It has been found that it is possible to prevent adhesive residue from being produced at the time of peeling by improving the adhesion to the substrate.
以下に本発明の加熱剥離型粘着シートの構造について、まず図1に基づき説明する。
上記のように、本発明の加熱剥離性シートは、基材の一方の面に、熱膨張性微小球を含有する熱剥離型粘着剤層を設けてなる加熱剥離型粘着シートであって、他方の面に有機コーティング層を介して硬化されるエネルギー線硬化型弾性層が配置されていることを特徴とする加熱剥離型粘着シートである。
この加熱剥離型粘着シートのエネルギー線硬化型弾性層は粘着性を備えており、そのエネルギー線硬化型弾性層がデバイス等の被加工物に接着し、熱剥離型粘着剤層は支持体等に接着されることによって、該支持体上に本発明の加熱剥離型粘着シートによって被加工物を固定する。その後、被加工物に対して、切断、研磨等の各種機械的加工、あるいは光線照射等の物理的加工、あるいは特定のガス雰囲気下に晒す等の化学的加工等の任意の加工を1種以上施す。
続いて、本発明の加熱剥離型粘着シートを加熱して、熱膨張性微小球を発泡させることにより、支持体から被加工物及び本発明の加熱剥離型粘着シートを剥離する。次いで、本発明の加熱剥離型粘着シートのエネルギー線硬化型弾性層から被加工物を剥離する。
このような方法により本発明の加熱剥離型粘着シートは使用される。
Hereinafter, the structure of the heat-peelable pressure-sensitive adhesive sheet of the present invention will be described with reference to FIG.
As described above, the heat-peelable sheet of the present invention is a heat-peelable pressure-sensitive adhesive sheet in which a heat-peelable pressure-sensitive adhesive layer containing thermally expandable microspheres is provided on one surface of a substrate, The heat-peelable pressure-sensitive adhesive sheet is characterized in that an energy ray-curable elastic layer that is cured via an organic coating layer is disposed on the surface.
The energy ray-curable elastic layer of the heat-peelable pressure-sensitive adhesive sheet has adhesiveness, the energy ray-curable elastic layer adheres to a workpiece such as a device, and the heat-peelable pressure-sensitive adhesive layer is attached to a support or the like. By being bonded, the workpiece is fixed on the support by the heat-peelable pressure-sensitive adhesive sheet of the present invention. Thereafter, the workpiece is subjected to one or more kinds of arbitrary processing such as various mechanical processing such as cutting and polishing, physical processing such as light irradiation, and chemical processing such as exposure to a specific gas atmosphere. Apply.
Subsequently, the heat-peelable pressure-sensitive adhesive sheet of the present invention is heated to foam thermally expandable microspheres, whereby the workpiece and the heat-peelable pressure-sensitive adhesive sheet of the present invention are peeled from the support. Next, the workpiece is peeled from the energy ray-curable elastic layer of the heat-peelable pressure-sensitive adhesive sheet of the present invention.
By such a method, the heat-peelable pressure-sensitive adhesive sheet of the present invention is used.
次に本発明の加熱剥離型粘着シートを構成する各層について述べる。
[基材]
基材1は有機コーティング層2、エネルギー線硬化型弾性層3及び熱剥離型粘着剤層4等の支持母体となるもので、熱剥離型粘着剤層4の加熱処理により機械的物性を損なわない程度の耐熱性を有するものが使用される。
このような基材1としては、例えば、ポリエステル、オレフィン系樹脂、ポリ塩化ビニルなどのプラスチックフィルムやシートが挙げられるが、これらに限定されるものではない。
基材1は被加工物の切断の際に用いるカッターなどの切断手段に対して切断性を有しているのが好ましい。また、基材1として軟質ポリオレフィンフィルム若しくはシート等の耐熱性と伸縮性とを具備する基材を使用すると、被加工物の切断工程の際、基材途中まで切断刃が入れば、後に基材を伸張することができるので、切断片間に隙間を生じさせることが必要な切断片回収方式に好適となる。
Next, each layer constituting the heat-peelable pressure-sensitive adhesive sheet of the present invention will be described.
[Base material]
The base material 1 serves as a support base for the organic coating layer 2, the energy ray curable elastic layer 3, the heat-peelable pressure-sensitive adhesive layer 4 and the like, and the mechanical properties are not impaired by the heat treatment of the heat-peelable pressure-sensitive adhesive layer 4. Those having a degree of heat resistance are used.
Examples of such a substrate 1 include, but are not limited to, plastic films and sheets such as polyester, olefin resin, and polyvinyl chloride.
The substrate 1 preferably has a cutting property with respect to a cutting means such as a cutter used for cutting the workpiece. In addition, when a base material having heat resistance and stretchability such as a flexible polyolefin film or sheet is used as the base material 1, if the cutting blade enters the base material partway during the process of cutting the workpiece, the base material is later Therefore, it is suitable for a cut piece collection method that requires a gap between the cut pieces.
さらに、基材1側からエネルギー線硬化型弾性層3を硬化させる際には、エネルギー線を用いるために基材1、有機コーティング層2(及び熱剥離型粘着剤層4等)は、エネルギー線硬化型弾性層を硬化させる程度の所定量以上のエネルギー線を透過しうる材料で構成される必要がある。また、仮にセパレータ6上にエネルギー線硬化型弾性層3を設け、セパレータ6を通じてこれを硬化するにはセパレータ6をエネルギー線透過性とする必要がある。
また、基材1は単層であってもよく多層からなってもよい。
Further, when the energy beam curable elastic layer 3 is cured from the substrate 1 side, the energy beam is used so that the substrate 1 and the organic coating layer 2 (and the heat-peelable pressure-sensitive adhesive layer 4) are energy beams. It is necessary to be made of a material that can transmit a predetermined amount or more of energy rays enough to cure the curable elastic layer. Further, if the energy ray curable elastic layer 3 is provided on the separator 6 and is cured through the separator 6, it is necessary to make the separator 6 energy ray permeable.
The substrate 1 may be a single layer or a multilayer.
基材1の厚さは、被加工物の貼り合わせ、被加工物の切断、切断片の剥離、回収などの各工程における操作性や作業性を損なわない範囲で適宜選択できるが、通常500μm以下、好ましくは3〜300μm程度、さらに好ましくは5〜250μm程度である。
基材1の表面は、隣接する層との密着性、保持性などを高めるため、慣用の表面処理、例えば、クロム酸処理、オゾン暴露、火炎暴露、高圧電撃暴露、イオン化放射線処理等の化学的又は物理的処理、下塗り剤(例えば、後述する粘着物質)によるコーティング処理等が施されていてもよい。
The thickness of the substrate 1 can be appropriately selected within a range that does not impair the operability and workability in each process such as bonding of workpieces, cutting of workpieces, peeling of cut pieces, and recovery, but is usually 500 μm or less. The thickness is preferably about 3 to 300 μm, more preferably about 5 to 250 μm.
The surface of the substrate 1 is chemically treated by conventional surface treatments such as chromic acid treatment, ozone exposure, flame exposure, high piezoelectric impact exposure, ionizing radiation treatment, etc. in order to improve adhesion and retention with adjacent layers. Alternatively, a physical treatment, a coating treatment with an undercoat (for example, an adhesive substance described later), or the like may be performed.
[有機コーティング層]
有機コーティング層には、基材に良好に密着し、加熱剥離後にエネルギー線硬化型弾性層が投錨破壊しないことを目的として使用する。
投錨破壊が生じるか否かは、例えば、下記の実施例に記載の方法で評価することができる。有機コーティング層はプライマー層としての機能を有し、有機コーティング層を介して基材とエネルギー線硬化型弾性層とがより強く接着されることにより投錨破壊を防止できるので、本発明の加熱剥離型粘着シートを使用した際に加熱剥離性が良好で、糊剥がれ、つまり糊残りを生じないという効果を発揮することができる。
[Organic coating layer]
The organic coating layer is used for the purpose of satisfactorily adhering to the base material and preventing the energy ray curable elastic layer from being thrown and destroyed after heat peeling.
Whether or not the throwing destruction occurs can be evaluated by, for example, the method described in the following examples. The organic coating layer has a function as a primer layer, and since the substrate and the energy ray curable elastic layer are more strongly bonded to each other through the organic coating layer, it is possible to prevent throwing breakage. When the pressure-sensitive adhesive sheet is used, the heat peelability is good, and it is possible to exert the effect that the adhesive peels off, that is, the adhesive residue does not occur.
有機コーティング層2は、これらの特性を有する限り、どのような材料を用いてもよい。
例えば、文献(プラスチックハードコート材料II、CMC出版、(2004))に示されるような各種のコーティング材料を用いることが可能である。なかでも、ウレタン系ポリマー等のウレタン結合を有するポリマーが好ましい。基材に対して優れた密着性を示し、かつ、エネルギー線硬化型弾性層(特に硬化後)に対して優れた投錨性を示すからである。特に、ポリアクリルウレタン及びポリエステルポリウレタン、これらの前駆物質がより好ましい。これらの材料は、基材への塗工・塗布が簡便であるなど、実用的であり、工業的に多種のものが選択でき、安価に入手できる。
As long as the organic coating layer 2 has these characteristics, any material may be used.
For example, various coating materials as shown in the literature (Plastic Hard Coat Material II, CMC Publishing, (2004)) can be used. Especially, the polymer which has urethane bonds, such as a urethane type polymer, is preferable. This is because it exhibits excellent adhesion to the substrate and excellent anchoring properties for the energy ray curable elastic layer (particularly after curing). In particular, polyacryl urethane and polyester polyurethane and their precursors are more preferable. These materials are practical, such as being easy to apply and apply to the substrate, and various industrial materials can be selected and are available at low cost.
ポリアクリルウレタン及びポリエステルポリウレタンとしては、文献(プラスチックハードコート材料II、P17−21、CMC出版、(2004))及び文献(最新ポリウレタン材料と応用技術、CMC出版、(2005))に示されるいずれをも用いることができる。これらは、イソシアナートモノマーとアルコール性水酸基含有モノマー(例えば、水酸基含有アクリル化合物又は水酸基含有エステル化合物)との反応混合物からなるポリマーである。さらなる成分として、ポリアミンなどの鎖延長剤、老化防止剤、酸化安定剤などを含んでいてもよい。
ポリアクリルウレタン及びポリエステルポリウレタンは、上述したモノマーを反応させることにより調製したものを用いてもよいし、コーティング材料又はインキ、塗料のバインダー樹脂として多く市販又は使用されているものを用いてもよい(文献:最新ポリウレタン材料と応用技術、P190、CMC出版 (2005)参照)。このようなポリウレタンとしては、大日精化製の「NB300」、ADEKA製の「アデカボンタイター(登録商標)」、三井化学製の「タケラック(登録商標)A/タケネート(登録商標)A」、DICグラフィックス製の「UCシーラー」等の市販品が挙げられる。
このようなポリマーに色素を添加するなどして、インキとしてフィルム層に印刷して用いてもよい。このときに例えばポリウレタン系酢酸ビニル−塩化ビニルコポリマー(大日精化社NB300)等のポリウレタン変性樹脂を使用することができ、このような印刷により粘着シートの意匠性を高めることも可能となる。
As polyacryl urethane and polyester polyurethane, any of those described in the literature (Plastic Hard Coat Material II, P17-21, CMC Publishing, (2004)) and the literature (Latest Polyurethane Material and Applied Technology, CMC Publishing, (2005)) Can also be used. These are polymers composed of a reaction mixture of an isocyanate monomer and an alcoholic hydroxyl group-containing monomer (for example, a hydroxyl group-containing acrylic compound or a hydroxyl group-containing ester compound). As further components, chain extenders such as polyamines, anti-aging agents, oxidation stabilizers and the like may be included.
As polyacryl urethane and polyester polyurethane, those prepared by reacting the above-described monomers may be used, or those commercially available or used as a binder material for coating materials, inks, and paints may be used ( Literature: Latest polyurethane materials and applied technology, see P190, CMC Publishing (2005)). As such a polyurethane, “NB300” manufactured by Dainichi Seika, “Adekabon titer (registered trademark)” manufactured by ADEKA, “Takelac® A / Takenate® A” manufactured by Mitsui Chemicals, DIC Commercial products such as “UC Sealer” manufactured by Graphics are listed.
A pigment may be added to such a polymer, and the ink may be printed on the film layer as an ink. At this time, for example, a polyurethane-modified resin such as polyurethane-based vinyl acetate-vinyl chloride copolymer (Daiichi Seika Co., Ltd. NB300) can be used, and the design of the pressure-sensitive adhesive sheet can be enhanced by such printing.
ここで特に、ポリアクリルウレタン及びポリエステルウレタンが基材に対して良好な密着性を示す理由としては、モノマーとして含まれるイソシアナート成分が基材表面に存在する水酸基やカルボキシル基などの極性官能基と反応して強固な結合を形成するからと考えられる。
また、特に、エネルギー線硬化後において、エネルギー線硬化型弾性層との投錨性が高まる理由としては、紫外線等照射時においてウレタン結合近傍に生成するラジカル種とエネルギー線硬化型弾性層に生成するラジカル種とが反応して強固な結合を形成するためと推測される(文献:ポリウレタンの構造・物性と高機能化および応用展開、p191−194、技術情報協会(1999))。
Here, in particular, the reason that polyacryl urethane and polyester urethane exhibit good adhesion to the substrate is that the isocyanate component contained as a monomer is a polar functional group such as a hydroxyl group or a carboxyl group present on the substrate surface. It is thought that it forms a strong bond by reacting.
In particular, the reason why the anchoring property with the energy ray curable elastic layer is improved after energy ray curing is that the radical species generated in the vicinity of the urethane bond and the radical generated in the energy ray curable elastic layer upon irradiation with ultraviolet rays or the like This is presumed to be due to the reaction between the seeds to form a strong bond (Reference: Structure / physical properties and high functionality of polyurethane and its application development, p191-194, Technical Information Association (1999)).
有機コーティング層の厚みは特に限定されないが、例えば、0.1〜10μm程度が適しており、0.1〜5μm程度が好ましく、0.5〜5μm程度がより好ましい。
0.1〜10μmの範囲であれば、基材とエネルギー線硬化型弾性層との間で十分な密着性を発揮することで糊残り防止効果を示すことができ、かつ、加熱剥離型粘着シートの物性を大きく損ねることがない。
Although the thickness of an organic coating layer is not specifically limited, For example, about 0.1-10 micrometers is suitable, About 0.1-5 micrometers is preferable, About 0.5-5 micrometers is more preferable.
If it is in the range of 0.1 to 10 μm, it can exhibit an adhesive residue preventing effect by exhibiting sufficient adhesion between the substrate and the energy ray curable elastic layer, and is a heat-peelable pressure-sensitive adhesive sheet. There is no significant loss of physical properties.
[エネルギー線硬化型弾性層]
エネルギー線硬化型弾性層はエネルギー線による硬化によって粘着力が低下し、硬化後の粘着力は被加工物から剥がすことができる程度の粘着力を有する層である。
エネルギー線硬化型弾性層3は、エネルギー線硬化性を付与するためのエネルギー線硬化性化合物(又はエネルギー線硬化性樹脂)を含有する。また、エネルギー線硬化型弾性層3は、エネルギー線照射後には弾性体となるのが好ましい。このような観点から、エネルギー線硬化型弾性層3は、エネルギー線反応性官能基で化学的に修飾された母剤(粘着剤)を用いるか、エネルギー線硬化性化合物(又はエネルギー線硬化性樹脂)を弾性を有する母剤中に配合した組成物により構成するのが好ましい。
また、図2に示すように、基材の熱剥離型粘着剤層4を設けた側において、基材1と熱剥離型粘着剤層4との間に基材1側から順に有機コーティング層2及びエネルギー線硬化型弾性層3を形成した場合、又はエネルギー線硬化型弾性層3を設けた場合には、いずれの場合においても、エネルギー線硬化型弾性層3は熱剥離型粘着剤層4が圧着される際に熱膨張性微小球の凹凸を緩和できる程度の粘弾性を有している。
またその時にはエネルギー線硬化型弾性層3に熱剥離型粘着剤層4に含有される熱膨張性微小球の一部が埋め込まれた状態となるようにすることもできる(図2の拡大図参照)。
[Energy ray curable elastic layer]
The energy ray curable elastic layer is a layer having an adhesive strength that can be peeled off from the work piece, and the adhesive strength is reduced by curing with energy rays.
The energy ray curable elastic layer 3 contains an energy ray curable compound (or energy ray curable resin) for imparting energy ray curable properties. The energy ray curable elastic layer 3 is preferably an elastic body after irradiation with energy rays. From this point of view, the energy ray curable elastic layer 3 uses a base material (adhesive) chemically modified with an energy ray reactive functional group, or an energy ray curable compound (or energy ray curable resin). ) Is preferably composed of a composition blended in an elastic base material.
In addition, as shown in FIG. 2, the organic coating layer 2 is arranged in order from the substrate 1 side between the substrate 1 and the heat-peelable pressure-sensitive adhesive layer 4 on the side where the heat-peelable pressure-sensitive adhesive layer 4 is provided. When the energy ray curable elastic layer 3 is formed, or when the energy ray curable elastic layer 3 is provided, the energy ray curable elastic layer 3 includes the heat-peelable pressure-sensitive adhesive layer 4 in any case. It has viscoelasticity to such an extent that the unevenness of the heat-expandable microspheres can be relaxed when being pressed.
At that time, a part of the thermally expandable microspheres contained in the heat-peelable pressure-sensitive adhesive layer 4 can be embedded in the energy ray-curable elastic layer 3 (see the enlarged view of FIG. 2). ).
前記母剤としては、例えば、天然ゴムや合成ゴムあるいはそれらを用いたゴム系粘着剤、シリコーンゴムあるいはその粘着剤、(メタ)アクリル酸アルキルエステル[例えば、(メタ)アクリル酸のメチルエステル、エチルエステル、プロピルエステル、イソプロピルエステル、ブチルエステル、イソブチルエステル、ヘキシルエステル、オクチルエステル、2−エチルヘキシルエステル、イソオクチルエステル、イソデシルエステル、ドデシルエステルなどのC1-20アルキルエステルなど]の単独又は共重合体や該(メタ)アクリル酸アルキルエステルと他のモノマー[例えば、アクリル酸、メタクリル酸、イタコン酸、マレイン酸、フマル酸、無水マレイン酸などのカルボキシル基若しくは酸無水物基含有モノマー;(メタ)アクリル酸2−ヒドロキシエチルなどのヒドロキシル基含有モノマー;スチレンスルホン酸などのスルホン酸基含有モノマー;2−ヒドロキシエチルアクリロイルホスフェートなどのリン酸基含有モノマー;(メタ)アクリルアミドなどのアミド基含有モノマー;(メタ)アクリル酸アミノエチルなどのアミノ基含有モノマー;(メタ)アクリル酸メトキシエチルなどのアルコキシ基含有モノマー;N−シクロヘキシルマレイミドなどのイミド基含有モノマー;酢酸ビニルなどのビニルエステル類;N−ビニルピロリドンなどのビニル基含有複素環化合物;スチレン、α−メチルスチレンなどのスチレン系モノマー;アクリロニトリルなどのシアノ基含有モノマー;(メタ)アクリル酸グリシジルなどのエポキシ基含有アクリル系モノマー;ビニルエーテルなどのビニルエーテル系モノマー等]との共重合体からなるアクリル系樹脂あるいはその粘着剤、ポリウレタン系樹脂やその粘着剤、エチレン−酢酸ビニル共重合体など、適宜な粘弾性を有する有機粘弾性体を用いうる。なお、該母剤として、後述の熱剥離型粘着剤層4を構成する粘着剤と同一又は同種の成分を用いることにより、エネルギー線硬化型弾性層3と熱剥離型粘着剤層4とを密着性よく積層できる。好ましい母剤にはアクリル系粘着剤などの粘着物質が含まれる。母剤は1種の成分で構成してもよく、2種以上の成分で構成してもよい。 Examples of the base material include natural rubber and synthetic rubber or rubber-based pressure-sensitive adhesives using them, silicone rubber or pressure-sensitive adhesives thereof, (meth) acrylic acid alkyl esters [for example, (meth) acrylic acid methyl ester, ethyl Ester, propyl ester, isopropyl ester, butyl ester, isobutyl ester, hexyl ester, octyl ester, 2-ethylhexyl ester, isooctyl ester, isodecyl ester, C1-20 alkyl ester such as dodecyl ester, etc.] alone or in combination Combined or alkyl (meth) acrylic acid ester and other monomer [for example, monomer containing carboxyl group or acid anhydride group such as acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, maleic anhydride; (meth) Acrylic acid A hydroxyl group-containing monomer such as hydroxyethyl; a sulfonic acid group-containing monomer such as styrenesulfonic acid; a phosphoric acid group-containing monomer such as 2-hydroxyethylacryloyl phosphate; an amide group-containing monomer such as (meth) acrylamide; Amino group-containing monomers such as aminoethyl acid; alkoxy group-containing monomers such as methoxyethyl (meth) acrylate; imide group-containing monomers such as N-cyclohexylmaleimide; vinyl esters such as vinyl acetate; vinyl such as N-vinylpyrrolidone Group-containing heterocyclic compounds; Styrene monomers such as styrene and α-methylstyrene; Cyano group-containing monomers such as acrylonitrile; Epoxy group-containing acrylic monomers such as glycidyl (meth) acrylate; Vinyl ether An organic viscoelastic material having an appropriate viscoelasticity, such as an acrylic resin or a pressure-sensitive adhesive thereof, a polyurethane resin or a pressure-sensitive adhesive thereof, and an ethylene-vinyl acetate copolymer. Can be used. In addition, the energy ray curable elastic layer 3 and the heat-peelable pressure-sensitive adhesive layer 4 are adhered to each other by using the same or the same kind of component as the pressure-sensitive adhesive constituting the heat-peelable pressure-sensitive adhesive layer 4 described later as the base material. Can be laminated with good performance. A preferred base material includes an adhesive substance such as an acrylic adhesive. The base material may be composed of one component, or may be composed of two or more components.
化学的な修飾に用いられるエネルギー線反応性官能基としては、例えば、アクリロイル基、メタクリロイル基、ビニル基、アリル基、アセチレン基等の炭素−炭素多重結合を有する官能基等が挙げられる。これらは単独で又は2種以上を組み合わせて用いてもよい。これらの官能基は、エネルギー線の照射により炭素−炭素多重結合が開裂してラジカルを生成し、このラジカルが架橋点となって3次元網目構造を形成することができる。
なかでも、(メタ)アクリロイル基は、エネルギー線に対して比較的高反応性を示し、多様なアクリル系粘着剤から選択して組み合わせて使用できる等、反応性、作業性の観点で好ましい。
Examples of the energy ray-reactive functional group used for chemical modification include functional groups having a carbon-carbon multiple bond such as acryloyl group, methacryloyl group, vinyl group, allyl group, and acetylene group. You may use these individually or in combination of 2 or more types. These functional groups can generate a radical by cleavage of a carbon-carbon multiple bond upon irradiation with energy rays, and this radical can be a crosslinking point to form a three-dimensional network structure.
Among them, the (meth) acryloyl group is preferable from the viewpoints of reactivity and workability, such as being relatively highly reactive to energy rays and being able to be selected and used in combination from various acrylic pressure-sensitive adhesives.
このように、エネルギー線反応性官能基で化学的に修飾された母剤の代表的な例としては、ヒドロキシル基及び/又はカルボキシル基等の反応性官能基を含む単量体[例えば、(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸等]を(メタ)アクリル酸アルキルエステルと共重合させた反応性官能基含有アクリル系重合体に、分子内に前記反応性官能基と反応する基(イソシアネート基、エポキシ基等)及びエネルギー線反応性官能基(アクリロイル基、メタクリロイル基等)を有する化合物[例えば、(メタ)アクリロイルオキシエチレンイソシアネート等]を反応させて得られる重合体が挙げられる。
前記反応性官能基含有アクリル系重合体における反応性官能基を含む単量体の割合は、全単量体に対して、例えば5〜40重量%、好ましくは10〜30重量%である。
Thus, as a typical example of a matrix chemically modified with an energy ray-reactive functional group, a monomer containing a reactive functional group such as a hydroxyl group and / or a carboxyl group [for example, (meta Reactive functional group-containing acrylic polymer obtained by copolymerization of () 2-hydroxyethyl acrylate, (meth) acrylic acid, etc.] with (meth) acrylic acid alkyl ester reacts with the reactive functional group in the molecule. And a polymer obtained by reacting a compound having a group (isocyanate group, epoxy group, etc.) and an energy ray-reactive functional group (acryloyl group, methacryloyl group, etc.) [for example, (meth) acryloyloxyethylene isocyanate etc.]. .
The ratio of the monomer containing the reactive functional group in the reactive functional group-containing acrylic polymer is, for example, 5 to 40% by weight, preferably 10 to 30% by weight, based on the total monomers.
分子内に前記反応性官能基と反応する基及びエネルギー線反応性官能基を有する化合物の使用量は、前記反応性官能基含有アクリル系重合体と反応させる際、反応性官能基含有アクリル系重合体中の反応性官能基(ヒドロキシル基、カルボキシル基等)に対して、例えば、20〜100モル%、好ましくは40〜95モル%である。また、分子内に前記反応性官能基と反応する基及びエネルギー線反応性官能基を有する化合物と反応性官能基含有アクリル系重合体中の反応性官能基との(付加)反応を促進するために、有機スズ、有機ジルコニウムなどの有機金属系化合物やアミン系化合物などの触媒を配合してもよい。 The amount of the compound having a group that reacts with the reactive functional group and an energy ray reactive functional group in the molecule is such that when the reactive functional group-containing acrylic polymer is reacted with the reactive functional group-containing acrylic polymer. It is 20-100 mol% with respect to the reactive functional group (hydroxyl group, carboxyl group, etc.) in coalescence, Preferably it is 40-95 mol%. In addition, in order to promote (addition) reaction between the reactive functional group in the reactive functional group-containing acrylic polymer and the compound having an energy ray reactive functional group and a reactive functional group in the molecule In addition, a catalyst such as an organometallic compound such as organotin or organozirconium or an amine compound may be blended.
エネルギー線硬化型弾性層3をエネルギー線硬化させるためのエネルギー線硬化性化合物としては、可視光線、紫外線、電子線などのエネルギー線により硬化可能なものであれば特に限定されないが、エネルギー線照射後のエネルギー線硬化型弾性層3の3次元網状化が効率よくなされるものが好ましい。エネルギー線硬化性化合物は1種を単独で又は2種以上を組み合わせて使用できる。 The energy ray-curable elastic layer 3 for curing the energy ray-curable elastic layer 3 is not particularly limited as long as it can be cured by energy rays such as visible light, ultraviolet rays, and electron beams. It is preferable that the energy beam curable elastic layer 3 is efficiently three-dimensionally reticulated. The energy ray-curable compound can be used alone or in combination of two or more.
エネルギー線硬化性化合物を母剤に配合する場合のエネルギー線硬化性化合物の具体的な例として、例えば、トリメチロールプロパントリアクリレート、テトラメチロールメタンテトラアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレート、ジペンタエリスリトールヘキサアクリレート、1,4−ブチレングリコールジアクリレート、1,6−ヘキサンジオールジアクリレート、ポリエチレングリコールジアクリレート等が挙げられる。 Specific examples of the energy ray curable compound when the energy ray curable compound is blended with the base material include, for example, trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, diester. Examples include pentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, and the like.
エネルギー線硬化性化合物としてエネルギー線硬化性樹脂を用いてもよく、エネルギー線硬化性樹脂として、例えば、分子末端に(メタ)アクリロイル基を有するエステル(メタ)アクリレート、ウレタン(メタ)アクリレート、エポキシ(メタ)アクリレート、メラミン(メタ)アクリレート、アクリル樹脂(メタ)アクリレート、分子末端にアリル基を有するチオール−エン付加型樹脂や光カチオン重合型樹脂、ポリビニルシンナマート等のシンナモイル基含有ポリマー、ジアゾ化したアミノノボラック樹脂やアクリルアミド型ポリマーなど、感光性反応基含有ポリマーあるいは感光性反応基含有オリゴマーなどが挙げられる。さらに高エネルギー線で反応するポリマーとしては、エポキシ化ポリブタジエン、不飽和ポリエステル、ポリグリシジルメタクリレート、ポリアクリルアミド、ポリビニルシロキサンなどが挙げられる。なお、エネルギー線硬化性樹脂を使用する場合には、前記母剤は必ずしも必要でない。 An energy ray curable resin may be used as the energy ray curable compound. Examples of the energy ray curable resin include an ester (meth) acrylate having a (meth) acryloyl group at a molecular end, a urethane (meth) acrylate, an epoxy ( Meth) acrylate, melamine (meth) acrylate, acrylic resin (meth) acrylate, thiol-ene addition type resin having an allyl group at the molecular end, photocationic polymerization type resin, cinnamoyl group-containing polymer such as polyvinyl cinnamate, diazotized Examples thereof include photosensitive reactive group-containing polymers and photosensitive reactive group-containing oligomers such as amino novolac resins and acrylamide type polymers. Furthermore, examples of the polymer that reacts with high energy rays include epoxidized polybutadiene, unsaturated polyester, polyglycidyl methacrylate, polyacrylamide, and polyvinylsiloxane. In addition, when using energy-beam curable resin, the said base material is not necessarily required.
エネルギー線硬化性化合物の配合量は、例えば、母剤100重量部に対して、5〜500重量部程度、好ましくは15〜300重量部、さらに好ましくは20〜150重量部程度の範囲である。また、エネルギー線硬化型弾性層3のエネルギー線照射後における動的弾性率が、20℃において、せん断貯蔵弾性率5×106〜1×1010Pa(周波数:1Hz、サンプル:厚さ1.5mmフィルム状)であると、優れた切断作業性と加熱剥離性との両立が可能となる。この貯蔵弾性率は、エネルギー線硬化性化合物の種類や配合量、エネルギー線照射条件などを適宜選択することにより調整できる。
なお、必要に応じてエネルギー線重合開始剤とともにエネルギー線重合促進剤を併用してもよい。
The amount of the energy ray-curable compound is, for example, in the range of about 5 to 500 parts by weight, preferably 15 to 300 parts by weight, and more preferably about 20 to 150 parts by weight with respect to 100 parts by weight of the base material. Moreover, the dynamic elastic modulus after energy beam irradiation of the energy ray curable elastic layer 3 is 20 × 10 6 to 1 × 10 10 Pa (frequency: 1 Hz, sample: thickness 1. When the thickness is 5 mm, it is possible to achieve both excellent cutting workability and heat peelability. This storage elastic modulus can be adjusted by appropriately selecting the type and blending amount of the energy ray-curable compound, energy ray irradiation conditions, and the like.
In addition, you may use an energy beam polymerization accelerator together with an energy beam polymerization initiator as needed.
エネルギー線硬化型弾性層3には、上記成分のほか、エネルギー線硬化性化合物を硬化させるためのエネルギー線重合開始剤、及びエネルギー線硬化前後に適切な粘弾性を得るために、熱重合開始剤、架橋剤、粘着付与剤、加硫剤等の適宜な添加剤、さらに充填剤、老化防止剤、酸化防止剤、着色剤を必要に応じて配合できる。 In addition to the above components, the energy beam curable elastic layer 3 includes an energy beam polymerization initiator for curing the energy beam curable compound, and a thermal polymerization initiator for obtaining appropriate viscoelasticity before and after the energy beam curing. In addition, an appropriate additive such as a crosslinking agent, a tackifier, a vulcanizing agent, a filler, an anti-aging agent, an antioxidant, and a coloring agent can be added as necessary.
エネルギー線重合開始剤としては、用いるエネルギー線の種類に応じて公知乃至慣用の重合開始剤を適宜選択できる。
エネルギー線として紫外線を用いて重合・硬化を行う場合には、硬化するために光重合開始剤が含まれる。光重合開始剤としては特に限定されないが、たとえば、ベンゾインメチルエーテル、ベンゾインイソプロピルエーテル、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オンなどのベンゾインエーテル;アニソールメチルエーテルなどの置換ベンゾインエーテル;2,2−ジエトキシアセトフェノン、2,2−ジメトキシ−2−フェニルアセトフェノン、1−ヒドロキシ−シクロヘキシル−フェニルケトンなどの置換アセトフェノン;2−メチル−2−ヒドロキシプロピオフェノンなどの置換アルファーケトール;2−ナフタレンスルフォニルクロライドなどの芳香族スルフォニルクロライド;1−フェニル−1,1−プロパンジオン−2−(o−エトキシカルボニル)−オキシムなどの光活性オキシム;2,4,6−トリメチルベンゾイル−ジフェニル−フォスフィンオキサイド、ビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイドなどのアシルフォスフィンオキサイドなどがあげられる。
As the energy beam polymerization initiator, a known or commonly used polymerization initiator can be appropriately selected according to the type of energy beam used.
When polymerization / curing is performed using ultraviolet rays as energy rays, a photopolymerization initiator is included for curing. Although it does not specifically limit as a photoinitiator, For example, benzoin ethers, such as benzoin methyl ether, benzoin isopropyl ether, 2,2-dimethoxy-1,2-diphenylethane-1-one; Substituted benzoin ethers, such as anisole methyl ether Substituted acetophenones such as 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1-hydroxy-cyclohexyl-phenyl ketone; substituted alpha-ketols such as 2-methyl-2-hydroxypropiophenone; 2 -Aromatic sulfonyl chlorides such as naphthalenesulfonyl chloride; photoactive oximes such as 1-phenyl-1,1-propanedione-2- (o-ethoxycarbonyl) -oxime; 2,4,6-trimethylben Yl - diphenyl - phosphine oxide, bis (2,4,6-trimethylbenzoyl) - such as acylphosphine oxide, such as triphenylphosphine oxide.
エネルギー線硬化型弾性層3は、例えば、エネルギー線硬化性樹脂、あるいは母剤、エネルギー線重合性化合物、及びエネルギー線重合開始剤、さらに必要に応じて添加剤、溶媒等を含むコーティング液を基材1上に塗布する方式、適当なセパレータ(剥離紙など)上に前記コーティング液を塗布してエネルギー線硬化型弾性層3を形成し、これを基材1上に転写(移着)する方法など、慣用の方法により形成できる。
該エネルギー線硬化型弾性層を硬化するに際して、酸素による重合阻害の発生が懸念される場合には、セパレータ上に塗布したウレタンポリマーとラジカル重合性モノマーとの混合物の上に、剥離処理したシートをのせて酸素を遮断してもよいし、不活性ガスを充填した容器内に基材を入れて、酸素濃度を下げてもよい。
エネルギー線等の種類や照射により使用されるランプの種類等は適宜選択することができ、蛍光ケミカルランプ、ブラックライト、殺菌ランプ等の低圧ランプや、メタルハライドランプ、高圧水銀ランプ等の高圧ランプ等を用いることができる。さらに紫外線などの照射量は、要求されるエネルギー線硬化型弾性層の特性に応じて、任意に設定することができる。
The energy ray curable elastic layer 3 is based on, for example, an energy ray curable resin or a coating liquid containing a base material, an energy ray polymerizable compound, an energy ray polymerization initiator, and, if necessary, an additive, a solvent and the like. A method of applying on the material 1, a method of applying the coating liquid on an appropriate separator (such as release paper) to form the energy ray curable elastic layer 3, and transferring (transferring) the energy layer onto the substrate 1. It can be formed by a conventional method.
When there is a concern about the occurrence of polymerization inhibition due to oxygen at the time of curing the energy ray curable elastic layer, a release-treated sheet is placed on a mixture of a urethane polymer and a radical polymerizable monomer coated on a separator. Oxygen may be blocked by placing it, or the substrate may be placed in a container filled with an inert gas to lower the oxygen concentration.
The type of energy beam and the type of lamp used by irradiation can be selected as appropriate. Low pressure lamps such as fluorescent chemical lamps, black lights and sterilization lamps, high pressure lamps such as metal halide lamps and high pressure mercury lamps, etc. Can be used. Further, the irradiation amount of ultraviolet rays or the like can be arbitrarily set according to the required characteristics of the energy ray curable elastic layer.
エネルギー線硬化型弾性層3の厚さは、熱剥離型粘着剤層4に含まれる熱膨張性微小球の凹凸の緩和、被加工物を切断する際の回転刃による振動防止等の観点から、3〜300μm程度、好ましくは10〜150μm程度、さらに好ましくは15〜100μm程度である。 The thickness of the energy ray curable elastic layer 3 is selected from the viewpoints of relaxation of unevenness of the heat-expandable microspheres contained in the heat-peelable pressure-sensitive adhesive layer 4, prevention of vibration by a rotary blade when cutting a workpiece, and the like. It is about 3-300 micrometers, Preferably it is about 10-150 micrometers, More preferably, it is about 15-100 micrometers.
[熱剥離型粘着剤層]
熱剥離型粘着剤層4は、粘着性を付与するための粘着剤、及び熱膨張性を付与するための熱膨張性微小球を含有する。
熱剥離型粘着剤層4は、熱による熱膨張性微小球の発泡により、接着面積が減少して剥離が容易になる層である。熱膨張性微小球は単独で又は2種以上組み合わせて使用することができる。
熱膨張性微小球としては、公知の熱膨張性微小球から適宜選択することができる。マイクロカプセル化していない熱膨張性微小球では、良好な剥離性を安定して発現させることができない場合があるので、マイクロカプセル化されている熱膨張性微小球を好適に用いることができる。
そして、図2の右の図に示す拡大図のように、図1の加熱剥離型粘着シートも、熱剥離型粘着剤層4の表面は含有する熱膨張性微小球の形状を反映した凹凸を有することがなく平滑であることが望ましい。
[Heat peelable adhesive layer]
The heat-peelable pressure-sensitive adhesive layer 4 contains a pressure-sensitive adhesive for imparting tackiness and a heat-expandable microsphere for imparting thermal expansibility.
The heat-peelable pressure-sensitive adhesive layer 4 is a layer that can be easily peeled off by reducing the bonding area due to foaming of thermally expandable microspheres caused by heat. Thermally expandable microspheres can be used alone or in combination of two or more.
The heat-expandable microsphere can be appropriately selected from known heat-expandable microspheres. Thermally expandable microspheres that are not microencapsulated may not be able to stably exhibit good peelability, and therefore, microencapsulated thermally expandable microspheres can be suitably used.
As shown in the enlarged view on the right side of FIG. 2, the heat-peelable pressure-sensitive adhesive sheet of FIG. 1 also has irregularities reflecting the shape of the thermally expandable microspheres contained on the surface of the heat-peelable pressure-sensitive adhesive layer 4. It is desirable to have smoothness without having.
前記粘着性物質としては加熱時に熱膨張性微小球の発泡及び/又は膨張を許容し、拘束しない程度の弾性を有するものを使用する。このため、従来公知の感圧接着剤(粘着剤)等を使用することができる。感圧接着剤として、例えば、天然ゴムや各種の合成ゴム等のゴム系感圧接着剤;シリコーン系感圧接着剤;(メタ)アクリル酸アルキルエステルとこのエステルに対して共重合可能な他の不飽和単量体との共重合体等のアクリル系感圧接着剤(例えば、前記エネルギー線硬化型弾性層3の母剤として記載したアクリル系粘着剤など)等が例示される。また、熱剥離型粘着剤層4には、エネルギー線硬化型粘着剤を使用することもできる。その場合、エネルギー線照射後の動的弾性率が、熱膨張性微小球の膨張を開始する温度範囲において、せん断貯蔵弾性率1×105〜5×107Pa(周波数:1Hz、サンプル:厚さ1.5mmフィルム状)であると、良好な剥離性を得ることができる。 As the adhesive material, a material having elasticity that allows foaming and / or expansion of the heat-expandable microspheres during heating and does not restrain them is used. For this reason, a conventionally well-known pressure sensitive adhesive (adhesive) etc. can be used. Examples of pressure-sensitive adhesives include rubber-based pressure-sensitive adhesives such as natural rubber and various synthetic rubbers; silicone-based pressure-sensitive adhesives; (meth) acrylic acid alkyl ester and other copolymerizable with this ester Examples thereof include acrylic pressure-sensitive adhesives such as copolymers with unsaturated monomers (for example, acrylic pressure-sensitive adhesives described as a base material of the energy ray-curable elastic layer 3) and the like. Further, an energy ray curable pressure sensitive adhesive can be used for the heat-peelable pressure sensitive adhesive layer 4. In that case, the shear elastic modulus of elasticity is 1 × 10 5 to 5 × 10 7 Pa (frequency: 1 Hz, sample: thickness) in the temperature range where the dynamic elastic modulus after irradiation with energy rays starts expansion of the thermally expandable microspheres. Good peelability can be obtained when the thickness is 1.5 mm.
熱膨張性微小球としては、例えば、イソブタン、プロパン、ペンタンなどの加熱により容易にガス化して膨張する物質を、弾性を有する殻内に内包させた微小球であればよい。前記殻は、通常、熱可塑性物質、熱溶融性物質、熱膨張により破裂する物質などで形成される。前記殻を形成する物質として、例えば、塩化ビニリデン−アクリロニトリル共重合体、ポリビニルアルコール、ポリビニルブチラール、ポリメチルメタクリレート、ポリアクリロニトリル、ポリ塩化ビニリデン、ポリスルホンなどが挙げられる。熱膨張性微小球は慣用の方法、例えば、コアセルベーション法、界面重合法などにより製造できる。熱膨張性微小球として、例えば、マツモトマイクロスフェア[F-100D、松本油脂製薬(株)製]などの市販品を利用することもできる。 The heat-expandable microsphere may be a microsphere in which a substance that easily expands by gasification by heating, such as isobutane, propane, or pentane, is encapsulated in an elastic shell. The shell is usually formed of a thermoplastic material, a hot-melt material, a material that bursts due to thermal expansion, or the like. Examples of the substance forming the shell include vinylidene chloride-acrylonitrile copolymer, polyvinyl alcohol, polyvinyl butyral, polymethyl methacrylate, polyacrylonitrile, polyvinylidene chloride, and polysulfone. Thermally expandable microspheres can be produced by a conventional method such as a coacervation method or an interfacial polymerization method. As the thermally expandable microsphere, for example, a commercially available product such as Matsumoto Microsphere [F-100D, manufactured by Matsumoto Yushi Seiyaku Co., Ltd.] can be used.
熱膨張性微小球の平均粒子径は、分散性や薄層形成性などの点から、一般に1〜80μm程度、好ましくは3〜50μm程度、より好ましくは5μm〜15μmである。また、熱膨張性微小球としては、加熱処理により粘着剤を含む熱剥離型粘着剤層の粘着力を効率よく低下させるため、体積膨張率が5倍以上、特に10倍以上となるまで破裂しない適度な強度を有するものが好ましい。なお、低い膨張率で破裂する熱膨張性微小球を用いた場合や、マイクロカプセル化されていない熱膨張剤を用いた場合には、熱剥離型粘着剤層4と被加工物との粘着面積が十分には低減されず、良好な剥離性が得られにくい。 The average particle diameter of the thermally expandable microspheres is generally about 1 to 80 μm, preferably about 3 to 50 μm, more preferably 5 to 15 μm, from the viewpoint of dispersibility and thin layer formation. In addition, the thermally expandable microspheres are not ruptured until the volume expansion coefficient is 5 times or more, particularly 10 times or more in order to efficiently reduce the adhesive strength of the heat-peelable adhesive layer containing the adhesive by heat treatment. What has moderate intensity | strength is preferable. In the case of using thermally expandable microspheres that burst at a low expansion rate, or when using a thermal expansion agent that is not microencapsulated, the adhesive area between the heat-peelable pressure-sensitive adhesive layer 4 and the workpiece. Is not sufficiently reduced, and good peelability is difficult to obtain.
熱膨張性微小球の使用量は、その種類によっても異なるが、熱剥離型粘着剤層4を構成する粘着剤ベースポリマー100重量部に対して、例えば10〜200重量部、好ましくは20〜125重量部程度である。10〜200重量部であれば、加熱処理後には粘着力は十分に低下でき、かつ、熱剥離型粘着剤層4の凝集破壊や、エネルギー線硬化型弾性層3と支持体との界面破壊が生じることがない。 The amount of the heat-expandable microspheres varies depending on the type thereof, but is, for example, 10 to 200 parts by weight, preferably 20 to 125 parts per 100 parts by weight of the pressure-sensitive adhesive base polymer constituting the heat-peelable pressure-sensitive adhesive layer 4. About parts by weight. If it is 10 to 200 parts by weight, the adhesive strength can be sufficiently reduced after heat treatment, and cohesive failure of the heat-peelable pressure-sensitive adhesive layer 4 and interfacial failure between the energy ray-curable elastic layer 3 and the support can occur. It does not occur.
熱剥離型粘着剤層4には、粘着性物質、熱膨張性微小球の他に、架橋剤(例えば、イソシアネート系架橋剤、エポキシ系架橋剤など)、粘着付与剤(例えば、多官能性エポキシ化合物、または、イソシアネート化合物、アジリジン化合物、メラミン樹脂、尿素樹脂、無水化合物、ポリアミン、カルボキシル基含有ポリマー等)、可塑剤、顔料、充填剤、老化防止剤、界面活性剤、帯電防止剤などの適宜な添加剤を配合してもよい。 In addition to the adhesive substance and the thermally expandable microsphere, the heat-peelable adhesive layer 4 includes a crosslinking agent (for example, an isocyanate-based crosslinking agent, an epoxy-based crosslinking agent), a tackifier (for example, a polyfunctional epoxy). Compound, or isocyanate compound, aziridine compound, melamine resin, urea resin, anhydrous compound, polyamine, carboxyl group-containing polymer, etc.), plasticizer, pigment, filler, anti-aging agent, surfactant, antistatic agent, etc. Various additives may be blended.
熱剥離型粘着剤層4の厚さは、粘着シートの使用目的や加熱による粘着力の低減性などに応じて適宜に決定しうるが、被加工物の加工性を向上するためには、薄い方が好ましい。このため、熱剥離型粘着剤層4の厚さは、50μm以下、好ましくは25μm以下、さらに好ましくは10μm以下である。熱剥離型粘着剤層4の厚さが50μm以下であれば、被加工物を保持するために十分な粘着力が得られる。さらに、電子部品を加工する際に押圧力やせん断力が該電子部品に加わることを通じて、熱剥離型粘着剤層4へもこれらの力が伝わることになるが、熱剥離型粘着剤層4の厚さが薄いので、この加わる力に抗して本発明の加熱剥離型粘着シートが該電子部品を確実に保持できる。 The thickness of the heat-peelable pressure-sensitive adhesive layer 4 can be appropriately determined according to the purpose of use of the pressure-sensitive adhesive sheet, the ability to reduce the pressure-sensitive adhesive force by heating, etc., but is thin in order to improve the workability of the workpiece. Is preferred. For this reason, the thickness of the heat-peelable pressure-sensitive adhesive layer 4 is 50 μm or less, preferably 25 μm or less, and more preferably 10 μm or less. If the thickness of the heat-peelable pressure-sensitive adhesive layer 4 is 50 μm or less, sufficient adhesive force can be obtained to hold the workpiece. Furthermore, when pressing or shearing force is applied to the electronic component when the electronic component is processed, these forces are transmitted to the heat-peelable pressure-sensitive adhesive layer 4. Since the thickness is thin, the heat-peelable pressure-sensitive adhesive sheet of the present invention can reliably hold the electronic component against this applied force.
なお、加熱処理時の熱剥離型粘着剤層4の凹凸変形に伴う被接着物との接着界面での微細な凝集破壊を防止するために、該熱剥離型粘着剤層4上にさらに粘着層を設けてもよい。
該粘着層の粘着物質としては、前述の熱剥離型粘着剤層4で記載した粘着剤を使用できる。該粘着層の厚さは、被加工物に対する粘着力の低減乃至消失の観点から、好ましくは0.1〜8μm、特に1〜5μmであり、熱膨張性粘着層4に準じた方法により形成することができる。
In addition, in order to prevent the fine cohesive failure in the adhesion interface with the adherend accompanying the uneven deformation of the heat-peelable pressure-sensitive adhesive layer 4 during the heat treatment, a pressure-sensitive adhesive layer is further provided on the heat-peelable pressure-sensitive adhesive layer 4. May be provided.
As the pressure-sensitive adhesive material of the pressure-sensitive adhesive layer, the pressure-sensitive adhesive described in the aforementioned heat-peelable pressure-sensitive adhesive layer 4 can be used. The thickness of the pressure-sensitive adhesive layer is preferably 0.1 to 8 μm, particularly 1 to 5 μm from the viewpoint of reduction or disappearance of the adhesive force to the workpiece, and is formed by a method according to the thermally expandable pressure-sensitive adhesive layer 4. be able to.
[ゴム状有機弾性層]
熱剥離型粘着剤層4は直接、又はゴム状有機弾性層などの他の層を介して基材1上に設けられても良い。ゴム状有機弾性層は、加熱剥離型粘着シートを被着体に接着する際に、前記粘着シートの表面を被着体の表面形状に良好に追従させて、接着面積を大きくするという機能と、前記粘着シートを被着体から加熱剥離する際に、熱膨張性層の加熱膨張を高度に(精度よく)コントロールし、熱膨張性層を厚さ方向へ優先的に且つ均一に膨張させるという機能とを有する。
[Rubber organic elastic layer]
The heat-peelable pressure-sensitive adhesive layer 4 may be provided on the substrate 1 directly or via another layer such as a rubbery organic elastic layer. The rubbery organic elastic layer has a function of increasing the adhesion area by causing the surface of the pressure-sensitive adhesive sheet to follow the surface shape of the adherend well when bonding the heat-peelable pressure-sensitive adhesive sheet to the adherend, A function of controlling the heat expansion of the heat-expandable layer to a high degree (accurately) and expanding the heat-expandable layer preferentially and uniformly in the thickness direction when the pressure-sensitive adhesive sheet is peeled off from the adherend. And have.
前記合成ゴム又はゴム弾性を有する合成樹脂としては、例えば、ニトリル系、ジエン系、アクリル系などの合成ゴム;ポリオレフィン系、ポリエステル系などの熱可塑性エラストマー;エチレン−酢酸ビニル共重合体、ポリウレタン、ポリブタジエン、軟質ポリ塩化ビニルなどのゴム弾性を有する合成樹脂などが挙げられる。なお、ポリ塩化ビニルなどのように本質的には硬質系ポリマーであっても、可塑剤や柔軟剤等の配合剤との組み合わせによりゴム弾性が発現しうる。このような組成物も、前記ゴム状有機弾性層の構成材料として使用できる。また、後述の粘着層(又は、熱膨張性粘着層)を構成する粘着剤等の粘着性物質を、ゴム状有機弾性層の構成材料として使用することもできる。ゴム状有機弾性層の厚さは、一般的には500μm以下(例えば、1〜500μm)、好ましくは3〜300μm、さらに好ましくは5〜150μm程度である。 Examples of the synthetic rubber or the synthetic resin having rubber elasticity include nitrile-based, diene-based, and acrylic-based synthetic rubbers; polyolefin-based and polyester-based thermoplastic elastomers; ethylene-vinyl acetate copolymer, polyurethane, polybutadiene, and the like. And a synthetic resin having rubber elasticity such as soft polyvinyl chloride. Even if it is essentially a hard polymer such as polyvinyl chloride, rubber elasticity can be manifested in combination with compounding agents such as plasticizers and softeners. Such a composition can also be used as a constituent material of the rubbery organic elastic layer. Moreover, an adhesive substance such as an adhesive constituting an adhesive layer (or a thermally expandable adhesive layer) described later can also be used as a constituent material of the rubber-like organic elastic layer. The thickness of the rubbery organic elastic layer is generally 500 μm or less (for example, 1 to 500 μm), preferably 3 to 300 μm, and more preferably about 5 to 150 μm.
[セパレータ]
セパレータ5は、基材フィルムの片面に必要により剥離剤層を形成してなるシートであり、本発明の加熱剥離型粘着シートの表面層を保護しておき、使用する前に露出させるために剥離されるシート、又は熱剥離型粘着剤層4を形成する際の土台となるシートでもある。
セパレータ5としては、例えば、シリコーン系樹脂、長鎖アルキルアクリレート系樹脂、フッ素系樹脂などで代表される剥離剤により表面コートしたプラスチックフィルムや紙等からなる基材、あるいはポリエチレンやポリプロピレンなどの無極性ポリマーからなる粘着性の小さい基材などを使用できる。
[Separator]
Separator 5 is a sheet in which a release agent layer is formed on one side of a base film as necessary, and the surface layer of the heat-peelable pressure-sensitive adhesive sheet of the present invention is protected and peeled off to be exposed before use. It is a sheet | seat used as the foundation at the time of forming the sheet | seat or the heat-peelable adhesive layer 4 to be formed.
As the separator 5, for example, a base material made of a plastic film or paper coated with a release agent typified by a silicone resin, a long-chain alkyl acrylate resin, a fluorine resin, or the like, or a nonpolar material such as polyethylene or polypropylene A low-viscosity base material made of a polymer can be used.
セパレータ5の基材フィルムとしては公知のものを使用でき、例えばポリエーテルエーテルケトン、ポリエーテルイミド、ポリアリレート、ポリエチレンナフタレート、ポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリメチルペンテンフィルム、ポリ塩化ビニルフィルム、塩化ビニル共重合体フィルム、ポリエチレンテレフタレートフィルム、ポリブチレンテレフタレートフィルム、ポリウレタンフィルム、エチレン−酢酸ビニル共重合体フィルム、アイオノマー樹脂フィルム、エチレン−(メタ)アクリル酸共重合体フィルム、エチレン−(メタ)アクリル酸エステル共重合体フィルム、ポリスチレンフィルム、及びポリカーボネートフィルム等のプラスチックフィルム等から選択することが可能である。
使用できる剥離剤層は、フッ素化されたシリコーン樹脂系剥離剤、フッ素樹脂系剥離剤、シリコーン樹脂系剥離剤、ポリビニルアルコール系樹脂、ポリプロピレン系樹脂、長鎖アルキル化合物等の公知の剥離剤を、粘着剤層の樹脂に応じて選択して含有させてなる層である。
As the substrate film of the separator 5, known ones can be used, for example, polyetheretherketone, polyetherimide, polyarylate, polyethylene naphthalate, polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, poly Vinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, ethylene-vinyl acetate copolymer film, ionomer resin film, ethylene- (meth) acrylic acid copolymer film, ethylene- Select from (meth) acrylic acid ester copolymer film, polystyrene film, and plastic film such as polycarbonate film It is possible.
The release agent layer that can be used is a known release agent such as a fluorinated silicone resin release agent, a fluorine resin release agent, a silicone resin release agent, a polyvinyl alcohol resin, a polypropylene resin, a long chain alkyl compound, It is a layer selected and contained according to the resin of the pressure-sensitive adhesive layer.
[図1にて示す加熱剥離型粘着シートの製造例]
図1は本発明の加熱剥離型粘着シートの例を示す概略断面図である。基材1の一方の面に、有機コーティング層2、エネルギー線硬化型弾性層3及びセパレータ6がこの順に積層されているとともに、基材1の他方の面に熱剥離型粘着剤層4及びセパレータ5がこの順に積層されている。
基材の片面に有機コーティング層2を設け、その上に上記のエネルギー線硬化型弾性層3を構成する硬化前の組成物を、任意の手段により均一に塗布する。そして、得られた基材の片面に形成された上記のエネルギー線硬化型弾性層3が反応性溶媒以外の溶媒を含有する場合には、一旦、塗布後に溶媒が乾燥により除去された状態とした後に、その上にセパレータ6を被覆して、基材1、有機コーティング層2及びエネルギー線硬化型粘着剤層3、セパレータ6を積層する。
別途、用意したセパレータ5上に塗布乾燥された熱剥離型粘着剤層4を形成する。その後、熱膨張性微小球が熱剥離性粘着剤層4表面から突出しない状態において、該熱剥離型粘着剤層4表面を基材1のエネルギー線硬化型粘着剤層が設けられていない側の面に接着させるようにして積層させる。なお、有機コーティング層2を予め基材の両面に設けるようにしても良い。
[Example of production of heat-peelable pressure-sensitive adhesive sheet shown in FIG. 1]
FIG. 1 is a schematic sectional view showing an example of the heat-peelable pressure-sensitive adhesive sheet of the present invention. The organic coating layer 2, the energy ray curable elastic layer 3 and the separator 6 are laminated in this order on one surface of the substrate 1, and the heat-peelable pressure-sensitive adhesive layer 4 and the separator are laminated on the other surface of the substrate 1. 5 are stacked in this order.
The organic coating layer 2 is provided on one side of the base material, and the composition before curing constituting the energy ray curable elastic layer 3 is uniformly applied thereon by any means. And when said energy ray hardening-type elastic layer 3 formed in the single side | surface of the obtained base material contains solvents other than a reactive solvent, it was set as the state from which the solvent was once removed by drying after application | coating. Later, the separator 6 is coated thereon, and the substrate 1, the organic coating layer 2, the energy ray curable pressure-sensitive adhesive layer 3, and the separator 6 are laminated.
Separately, the heat-peelable pressure-sensitive adhesive layer 4 applied and dried is formed on the prepared separator 5. Thereafter, in the state where the heat-expandable microspheres do not protrude from the surface of the heat-peelable pressure-sensitive adhesive layer 4, the surface of the heat-peelable pressure-sensitive adhesive layer 4 on the side where the energy ray-curable pressure-sensitive adhesive layer of the substrate 1 is not provided. Laminate to adhere to the surface. In addition, you may make it provide the organic coating layer 2 in advance on both surfaces of a base material.
以下に図2に示す本発明の加熱剥離型粘着シートの構造について説明する。
図2に示す加熱剥離型粘着シートを構成する各層の材料は図1に示す材料と同じである。
熱剥離型粘着剤層4の形成は、例えば、粘着剤、熱膨張性微小球、及び必要に応じて添加剤、溶媒等を含むコーティング液をエネルギー線硬化型弾性層3上に直接塗布し、セパレータ5を介して圧着する方法、適当なセパレータ(剥離紙など)5上に前記コーティング液を塗布して熱剥離型粘着剤層4を形成し、これを基材1上に任意に有機コーティング層を介して設けられたエネルギー線硬化型弾性層3上に圧着転写(移着)する方法など適宜な方法にて行うことができる。
The structure of the heat-peelable pressure-sensitive adhesive sheet of the present invention shown in FIG. 2 will be described below.
The material of each layer constituting the heat-peelable pressure-sensitive adhesive sheet shown in FIG. 2 is the same as the material shown in FIG.
For example, the heat-peelable pressure-sensitive adhesive layer 4 is formed by directly applying a coating liquid containing pressure-sensitive adhesives, thermally expandable microspheres, and additives, solvents, and the like onto the energy ray-curable elastic layer 3, for example. A method of pressure bonding through a separator 5, the coating liquid is applied on an appropriate separator (such as release paper) 5 to form a heat-peelable pressure-sensitive adhesive layer 4, and this is optionally coated on a substrate 1 with an organic coating layer It can carry out by appropriate methods, such as the method of carrying out pressure bonding transfer (transfer) on the energy ray hardening-type elastic layer 3 provided through this.
このとき、図2の右の図に示す拡大図のように、この例の加熱剥離型粘着シートも、熱剥離型粘着剤層4の表面は含有する熱膨張性微小球の形状を反映した凹凸を有することがなく平滑であることが望ましい。
そのため、大きい熱膨張性微小球が存在することにより熱剥離型粘着剤層4の層の厚さ内に熱膨張性微小球が収まらない場合であっても、エネルギー線硬化型弾性層の層内にその熱膨張性微小球の凸部を嵌入させることにより、熱剥離型粘着層4の表面を平滑にすることが望ましい。
At this time, as shown in the enlarged view on the right side of FIG. 2, the heat-peelable pressure-sensitive adhesive sheet of this example also has irregularities reflecting the shape of the heat-expandable microspheres contained in the surface of the heat-peelable pressure-sensitive adhesive layer 4 It is desirable to be smooth without having any.
Therefore, even if the heat-expandable microsphere does not fit within the thickness of the heat-peelable pressure-sensitive adhesive layer 4 due to the presence of large heat-expandable microspheres, It is desirable to make the surface of the heat-peelable pressure-sensitive adhesive layer 4 smooth by inserting the convex portions of the thermally expandable microspheres.
セパレータ5は、上記のように、エネルギー線硬化型弾性層3上に熱剥離型粘着剤層4を圧着転写(移着)する際の仮支持体として、また、実用に供するまで熱剥離型粘着剤層4を保護する保護材として用いられる。 As described above, the separator 5 is used as a temporary support when the heat-peelable pressure-sensitive adhesive layer 4 is pressure-transferred (transferred) onto the energy ray-curable elastic layer 3 as described above. Used as a protective material for protecting the agent layer 4.
[図2に示す加熱剥離型粘着シートの製造例]
図2は本発明の加熱剥離型粘着シートの他の例を示す概略断面図である。この例では、基材1の一方の面に、有機コーティング層2、エネルギー線硬化型弾性層3及びセパレータ6がこの順に積層されているとともに、基材1の他方の面に有機コーティング層2、エネルギー線硬化型弾性層3、熱剥離型粘着剤層4及びセパレータ5がこの順に積層されている。この粘着シートは、基材1の他方の面に有機コーティング層2、エネルギー線硬化型弾性層3、熱剥離型粘着剤層4及びセパレータ5が設けられている点で、図1の粘着シートとは別である。
上記加熱剥離型粘着シート1の製造方法の途中段階である基材1、有機コーティング層2及びエネルギー線硬化型粘着剤層3、セパレータ6を積層した直後において、該基材1の未だ有機コーティング層2を設けていない面に有機コーティング層2を設け、その上に上記のエネルギー線硬化型弾性層3を構成する硬化前の組成物を、任意の手段により均一に塗布する。そして、得られた基材の片面に形成された上記のエネルギー線硬化型弾性層3が反応性溶媒以外の溶媒を含有する場合には、そのような溶媒が乾燥により除去された状態であり、該エネルギー線硬化型弾性層3をエネルギー線による硬化前としておく。但し十分な流動性を備える限りにおいて、部分硬化させてもよい。
別途、用意したセパレータ5上に塗布乾燥された熱剥離型粘着剤層4を形成する。この熱剥離型粘着剤層4はその表面、つまりセパレータ5側ではない面は、熱剥離型粘着剤層4の厚さによっては、含有する熱膨張性微小球が該熱剥離型粘着剤層4に完全に埋め込まれることがないために、その熱膨張性微小球の一部が表面に突出して凸部を形成している。
[Example of production of heat-peelable pressure-sensitive adhesive sheet shown in FIG. 2]
FIG. 2 is a schematic cross-sectional view showing another example of the heat-peelable pressure-sensitive adhesive sheet of the present invention. In this example, the organic coating layer 2, the energy ray curable elastic layer 3 and the separator 6 are laminated in this order on one surface of the substrate 1, and the organic coating layer 2 on the other surface of the substrate 1, The energy ray curable elastic layer 3, the heat-peelable pressure-sensitive adhesive layer 4, and the separator 5 are laminated in this order. This pressure-sensitive adhesive sheet is different from the pressure-sensitive adhesive sheet of FIG. 1 in that an organic coating layer 2, an energy ray-curable elastic layer 3, a heat-peelable pressure-sensitive adhesive layer 4 and a separator 5 are provided on the other surface of the substrate 1. Is different.
Immediately after laminating the base material 1, the organic coating layer 2, the energy ray curable pressure sensitive adhesive layer 3, and the separator 6 that are in the middle of the manufacturing method of the heat-peelable pressure-sensitive adhesive sheet 1, the organic coating layer of the base material 1 is still present. The organic coating layer 2 is provided on the surface not provided with 2, and the composition before curing constituting the energy ray-curable elastic layer 3 is uniformly applied thereon by any means. And when said energy ray hardening-type elastic layer 3 formed in the single side | surface of the obtained base material contains solvents other than a reactive solvent, it is the state by which such a solvent was removed by drying, The energy ray curable elastic layer 3 is set before being cured with energy rays. However, it may be partially cured as long as it has sufficient fluidity.
Separately, the heat-peelable pressure-sensitive adhesive layer 4 applied and dried is formed on the prepared separator 5. Depending on the thickness of the heat-peelable pressure-sensitive adhesive layer 4, the surface of the heat-peelable pressure-sensitive adhesive layer 4 that is not on the separator 5 side may contain thermally expandable microspheres contained therein. Therefore, a part of the thermally expandable microsphere protrudes from the surface to form a convex portion.
具体的には、上記の硬化前の該エネルギー線硬化型弾性層3の表面に、上記のセパレータ上に形成された該熱剥離型粘着剤層4をその凸部が形成された表面を合わせるようにして積層し、該基材及び該セパレータ側から、該エネルギー線硬化型弾性層3と該熱剥離型粘着剤層4を互いに押圧することによって、硬化されていない該エネルギー線硬化型弾性層3の内部に該凸部を埋め込むようにする。
この結果、セパレータ6、エネルギー線硬化型弾性層3、有機コーティング層2、基材1、有機コーティング層2、未硬化の該エネルギー線硬化型弾性層3、該熱剥離型粘着剤層4及びセパレータ5を、この順で積層してなるシートを得ることができる。
さらに、この未硬化の該エネルギー線硬化型弾性層3に対して、基材1側及び/又はセパレータ5側からエネルギー線を照射することによって未硬化の該エネルギー線硬化型弾性層3を硬化することによって、本発明の加熱剥離型粘着シートを得ることができる。
Specifically, the heat-peelable pressure-sensitive adhesive layer 4 formed on the separator is aligned with the surface on which the convex portions are formed on the surface of the energy ray-curable elastic layer 3 before curing. The energy beam curable elastic layer 3 that is not cured is pressed by pressing the energy beam curable elastic layer 3 and the heat-peelable pressure-sensitive adhesive layer 4 from the substrate and the separator side. The convex portion is embedded in the inside of.
As a result, the separator 6, the energy ray curable elastic layer 3, the organic coating layer 2, the substrate 1, the organic coating layer 2, the uncured energy ray curable elastic layer 3, the heat-peelable pressure-sensitive adhesive layer 4, and the separator 5 can be obtained by laminating 5 in this order.
Further, the uncured energy beam curable elastic layer 3 is cured by irradiating the uncured energy beam curable elastic layer 3 from the substrate 1 side and / or the separator 5 side. Thus, the heat-peelable pressure-sensitive adhesive sheet of the present invention can be obtained.
なお、これらの加熱剥離型粘着シートの製造方法において、各層を積層する手順はこれらの順に限定されるものではなく、本発明の目的を達成する限り、任意の手段を採用することができる。そして、上記2種の加熱剥離型粘着シートを製造する場合において、各面への各層の形成をいずれの順によっても行うことができる。 In addition, in the manufacturing method of these heat peeling type adhesive sheets, the procedure which laminates | stacks each layer is not limited to these order, As long as the objective of this invention is achieved, arbitrary means can be employ | adopted. And when manufacturing the said 2 types of heat peeling type adhesive sheet, formation of each layer to each surface can be performed by any order.
[加熱剥離型粘着シートの使用方法]
図3は本発明の図1に示す加熱剥離型粘着シートを使用した被加工物7の製造方法の一例を示す概略工程図である。より詳細には、図3は、図1の加熱剥離型粘着シート(セパレータ5及び6を剥がした状態のもの)のエネルギー線硬化型弾性層3の表面に被加工物7を圧着して貼り合わせ、かつ、熱剥離型粘着剤層4を支持体10に貼り合わせて、加熱剥離型粘着シートと被加工物を支持体10に固定する。
そしてエネルギー線硬化型弾性層3として硬化後においても十分な接着力を示すものを使用した場合、エネルギー線8の照射によりエネルギー線硬化型弾性層3を硬化させた後、中央の図に示すように、切断線9に沿って所定寸法に切断して切断片とする。なお、エネルギー線硬化型弾性層3として硬化後において接着力が低下するものを使用した場合には、エネルギー線の照射は切断工程後となる。
次いで加熱処理により支持体10上の熱剥離型粘着剤層4中の熱膨張性微小球を膨張および発泡させて、加熱剥離型粘着シートを被加工物ごと支持体10から剥離する。
次いで、右の図に示すように切断された被加工物7をピックアップして、加熱剥離型粘着シートのエネルギー線硬化型弾性層3から剥離し分離する。
[How to use heat-peelable adhesive sheet]
FIG. 3 is a schematic process diagram showing an example of a method for manufacturing the workpiece 7 using the heat-peelable pressure-sensitive adhesive sheet shown in FIG. 1 of the present invention. More specifically, FIG. 3 shows that the work piece 7 is pressure-bonded to the surface of the energy ray-curable elastic layer 3 of the heat-peelable pressure-sensitive adhesive sheet (with the separators 5 and 6 peeled off) in FIG. The heat-peelable pressure-sensitive adhesive layer 4 is bonded to the support 10 and the heat-peelable pressure-sensitive adhesive sheet and the workpiece are fixed to the support 10.
When an energy ray curable elastic layer 3 that exhibits sufficient adhesion even after curing is used, the energy ray curable elastic layer 3 is cured by irradiation of the energy rays 8 and then shown in the center diagram. Next, it cut | disconnects to a predetermined dimension along the cutting line 9, and is set as a cut piece. In addition, when the thing which adhesive force falls after hardening is used as the energy ray hardening-type elastic layer 3, irradiation of an energy ray will be after a cutting process.
Next, the heat-expandable microspheres in the heat-peelable pressure-sensitive adhesive layer 4 on the support 10 are expanded and foamed by heat treatment, and the heat-peelable pressure-sensitive adhesive sheet is peeled from the support 10 together with the workpiece.
Next, the workpiece 7 cut as shown in the right figure is picked up, and peeled off from the energy ray-curable elastic layer 3 of the heat-peelable pressure-sensitive adhesive sheet and separated.
図4は本発明の図2に示す加熱剥離型粘着シートを使用した被加工物の製造方法の一例を示す概略工程図である。
使用する加熱剥離型粘着シートの層構成が異なるのみで、使用方法自体は上記の図3による場合と変わらない。必要により有機コーティング層2上にエネルギー線硬化型弾性層3を介して、熱剥離型粘着剤層4が形成されているので、特に熱剥離性粘着剤層4の表面は熱膨張性微小球に由来する凹凸がなく、被加工物7を支持体10上により正確に固定することが可能となる。
FIG. 4 is a schematic process diagram showing an example of a method for producing a workpiece using the heat-peelable pressure-sensitive adhesive sheet shown in FIG. 2 of the present invention.
Only the layer structure of the heat-peelable pressure-sensitive adhesive sheet used is different, and the method of use itself is the same as in the case of FIG. Since the heat-peelable pressure-sensitive adhesive layer 4 is formed on the organic coating layer 2 via the energy ray-curable elastic layer 3 as necessary, the surface of the heat-peelable pressure-sensitive adhesive layer 4 is particularly made of thermally expandable microspheres. There is no unevenness derived from it, and the workpiece 7 can be more accurately fixed on the support 10.
これらの加熱剥離型粘着シートの使用方法において、エネルギー線硬化型熱剥離性粘着シートの熱剥離型粘着剤層4と支持体10との圧着は、例えば、ゴムローラ、ラミネートロール、プレス装置などの適宜な押圧手段で加熱剥離型粘着シートを圧着処理する方式などにより行うことができる。なお、圧着処理の際、必要ならば、粘着性物質のタイプに応じて、熱膨張性微小球が膨張しない温度範囲で加熱したり、水や有機溶剤を塗布して粘着性物質を賦活させたりすることもできる。 In these methods of using the heat-peelable pressure-sensitive adhesive sheet, the heat-peelable pressure-sensitive adhesive layer 4 of the energy ray-curable heat-peelable pressure-sensitive adhesive sheet and the support 10 are appropriately bonded by, for example, a rubber roller, a laminate roll, or a press device. It can be performed by a method of pressure-bonding the heat-peelable pressure-sensitive adhesive sheet with a simple pressing means. During the crimping process, if necessary, depending on the type of adhesive substance, heat the heat-expandable microspheres in a temperature range that does not expand, or apply water or an organic solvent to activate the adhesive substance. You can also
エネルギー線8としては可視光線や紫外線、電子線などを使用できる。エネルギー線8の照射は適宜な方法で行うことができる。ただし、エネルギー線8の照射熱により熱膨張性微小球が膨張を開始することがあるため、できるだけ短時間の照射にとどめるか、あるいは加熱剥離型粘着シートを風冷するなどして熱膨張性微小球が膨張を開始しない温度に保つことが望ましい。そして支持体10は熱剥離型粘着剤層4の膨張により、該熱剥離型粘着剤層4との接着力が低下する材料であれば良く、被加工物7の加工時に係る力等によってずれたり変形することがなく、必要により該エネルギー線が透過する材料からなり、例えばガラスや台座ウエハ等を好適に使用できる。 As the energy beam 8, visible light, ultraviolet light, electron beam, or the like can be used. Irradiation of the energy beam 8 can be performed by an appropriate method. However, since the heat-expandable microspheres may start to expand due to the heat of irradiation of the energy beam 8, the heat-expandable microspheres are limited to irradiation as short as possible, or the heat-peelable pressure-sensitive adhesive sheet is air-cooled. It is desirable to maintain a temperature at which the sphere does not begin to expand. The support 10 only needs to be a material whose adhesive force with the heat-peelable pressure-sensitive adhesive layer 4 is reduced due to the expansion of the heat-peelable pressure-sensitive adhesive layer 4. It is made of a material that does not deform and allows the energy rays to pass therethrough. For example, glass or a pedestal wafer can be suitably used.
被加工物7の切断はダイシング等の慣用の切断手段により行うことができ、例えば図3に切断線9で示すように切断部が形成される。また加工として研削等も行い得る。
加熱条件は、被加工物7(又は切断された被加工物7)の表面状態や耐熱性、熱膨張性微小球の種類、粘着シートの耐熱性、被加工物7の熱容量などにより適宜設定できるが、一般的な条件は、温度350℃以下、処理時間30分以下であり、特に温度80〜200℃、処理時間1秒〜15分程度が好ましい。また、加熱方式としては、熱風加熱方式、熱板接触方式、赤外線加熱方式などが挙げられるが、特に限定されない。
The workpiece 7 can be cut by a conventional cutting means such as dicing. For example, as shown by a cutting line 9 in FIG. Moreover, grinding etc. can also be performed as a process.
The heating conditions can be appropriately set depending on the surface state of the workpiece 7 (or the cut workpiece 7), the heat resistance, the type of thermally expandable microsphere, the heat resistance of the adhesive sheet, the heat capacity of the workpiece 7, and the like. However, general conditions are a temperature of 350 ° C. or less and a treatment time of 30 minutes or less, and a temperature of 80 to 200 ° C. and a treatment time of about 1 second to 15 minutes are particularly preferable. Moreover, as a heating system, although a hot-air heating system, a hot plate contact system, an infrared heating system, etc. are mentioned, it is not specifically limited.
また、加熱剥離型粘着シートの基材1に伸縮性を有するものを使用した場合、伸張処理は例えば、シート類を二次元的に伸張させる際に用いる慣用の伸張手段を使用することにより行うことができる。 When the base material 1 of the heat-peelable pressure-sensitive adhesive sheet is stretchable, the stretching process is performed, for example, by using a conventional stretching means used when stretching the sheets two-dimensionally. Can do.
これらの加熱剥離型粘着シートに共通する性質としては、エネルギー線硬化型粘着剤層を有機コーティング層を介して基材上に設けたので、加熱剥離型粘着シートの該エネルギー線硬化型粘着剤層上に設けた被加工物を加工後に、該被加工物をエネルギー線硬化型粘着剤層から剥離するときに、該エネルギー線硬化型粘着剤層が基材から剥がれて被加工物表面に糊残りを生じて汚染することがない。
これはエネルギー線硬化型粘着剤層が有機コーティング層によって基材上に強く接着することによって、被加工物を剥離する際にエネルギー線硬化型粘着剤層が凝集破壊を起こすことがないためである。
As a property common to these heat-peelable pressure-sensitive adhesive sheets, an energy ray-curable pressure-sensitive adhesive layer is provided on a substrate via an organic coating layer. When the workpiece is peeled off from the energy ray curable pressure-sensitive adhesive layer after processing the workpiece provided thereon, the energy ray curable pressure-sensitive adhesive layer is peeled off from the base material and remains on the surface of the workpiece. Will not cause contamination.
This is because the energy ray curable pressure-sensitive adhesive layer does not cause cohesive failure when the workpiece is peeled off, because the energy ray curable pressure sensitive adhesive layer strongly adheres to the substrate by the organic coating layer. .
さらに、上記図4に示す加熱剥離型粘着シートによれば、加熱剥離型粘着シートの熱剥離型粘着剤層4は薄く形成可能であり、且つエネルギー線硬化型弾性層3の硬化後においても十分な接着力を有するものを使用した場合、切断工程の前にエネルギー線を照射することによりエネルギー線硬化型弾性層3を硬化させるため、切断工程時において切断刃による接着剤層の巻き上げや接着剤層等のぶれに伴うチッピング等を従来の熱膨張性粘着シートに比べて大幅に低減しつつ所定の寸法に切断できる。
さらに、熱剥離型粘着剤層4は熱膨張性微小球を含み、熱膨張性を有するので、切断工程後の加熱処理により、熱膨張性微小球が速やかに発泡又は膨張し、その結果、前記熱剥離型粘着剤層4が体積変化して表面に凹凸状の三次元構造が形成され、支持体10との接着面積ひいては接着強度が大幅に低下若しくは消失する。
その後、公知の手段により切断された被加工物がピックアップされる。
Furthermore, according to the heat-peelable pressure-sensitive adhesive sheet shown in FIG. 4, the heat-peelable pressure-sensitive adhesive layer 4 of the heat-peelable pressure-sensitive adhesive sheet can be formed thin and is sufficient even after the energy ray-curable elastic layer 3 is cured. When a material having a strong adhesive force is used, the energy ray curable elastic layer 3 is cured by irradiating energy rays before the cutting step. Chipping and the like associated with the shaking of the layer can be cut to a predetermined size while being greatly reduced as compared with a conventional thermally expandable pressure-sensitive adhesive sheet.
Furthermore, since the heat-peelable pressure-sensitive adhesive layer 4 includes thermally expandable microspheres and has thermal expandability, the thermally expandable microspheres are rapidly foamed or expanded by the heat treatment after the cutting step. The volume of the heat-peelable pressure-sensitive adhesive layer 4 changes to form an uneven three-dimensional structure on the surface, and the adhesion area with respect to the support 10 and thus the adhesion strength is significantly reduced or disappears.
Thereafter, the workpiece cut by a known means is picked up.
図5に示す加熱剥離型粘着シートも図1に示す加熱剥離型粘着シートと同じ構成であり、本発明の加熱剥離型粘着シートはダイシングのみならず、研削、研磨、エッチング、旋盤加工、樹脂封止等の他の加工にも使用することができる。 The heat-peelable pressure-sensitive adhesive sheet shown in FIG. 5 has the same structure as the heat-peelable pressure-sensitive adhesive sheet shown in FIG. 1, and the heat-peelable pressure-sensitive adhesive sheet of the present invention is not only dicing but also grinding, polishing, etching, lathe processing, resin sealing It can also be used for other processes such as stopping.
図6にて、研削等の被加工物表面の加工方法を示す。
まず、加熱剥離型粘着シートの両面に設けられたセパレータを剥がし、エネルギー線硬化型弾性層側の面には被加工物を接着し、反対側の熱剥離型粘着剤層4側の面により被加工物を支持体10に固定して該被加工物表面を加工する。
その後加熱することにより熱剥離型粘着剤層4に含有された熱膨張性微小球を膨張させて支持体10から加熱剥離型粘着シート及び被加工物を剥がす。
さらにエネルギー線8の照射によりエネルギー線硬化型弾性層3を硬化させることにより、エネルギー線硬化型弾性層3の凝集力を増加させて被加工物7との接着力を低下させる。
次いで該被加工物7をエネルギー線硬化型弾性層3から剥がして加工された被加工物を得る。
In FIG. 6, the processing method of the workpiece surface, such as grinding, is shown.
First, the separators provided on both sides of the heat-peelable pressure-sensitive adhesive sheet are peeled off, the work piece is adhered to the surface on the energy ray curable elastic layer side, and the surface is covered with the surface on the opposite side of the heat-peelable pressure-sensitive adhesive layer 4 side. The workpiece is fixed to the support 10 and the workpiece surface is processed.
Thereafter, the heat-expandable microspheres contained in the heat-peelable pressure-sensitive adhesive layer 4 are expanded by heating to peel off the heat-peelable pressure-sensitive adhesive sheet and the workpiece from the support 10.
Further, the energy beam curable elastic layer 3 is cured by irradiation of the energy beam 8, thereby increasing the cohesive force of the energy beam curable elastic layer 3 and reducing the adhesive force with the workpiece 7.
Next, the workpiece 7 is peeled from the energy ray curable elastic layer 3 to obtain a processed workpiece.
上記の方法の他に被加工物が折り曲げ可能なフィルム状物である場合には、支持体上に本発明の加熱剥離型粘着シートを介して被加工物を固定した後、該被加工物表面を目的とする任意の手段により処理を施し、その後該被加工物表面側又は支持体側からエネルギー線を照射することにより、該エネルギー線硬化型弾性層を硬化させて、被加工物を硬化された該エネルギー線硬化型弾性層から剥離することもできる。その場合には、被加工物の剥離後に加熱剥離型粘着シートの特に熱剥離型粘着剤層を加熱することによって、該支持体から加熱剥離型粘着シートを剥離する方法を採用することもできる。 In addition to the above method, when the workpiece is a foldable film, the workpiece is fixed on the support via the heat-peelable pressure-sensitive adhesive sheet of the present invention, and then the workpiece surface Then, the energy ray-curable elastic layer was cured by irradiating energy rays from the workpiece surface side or the support side to cure the workpiece. It can also peel from this energy ray hardening-type elastic layer. In that case, it is also possible to employ a method of peeling the heat-peelable pressure-sensitive adhesive sheet from the support by heating the heat-peelable pressure-sensitive adhesive layer of the heat-peelable pressure-sensitive adhesive sheet after the workpiece is peeled off.
このように、剥離時のエネルギー線硬化型弾性層の剥離防止、エネルギー線照射によるエネルギー線硬化型弾性層3の硬化、および加熱処理による接着強度の著しい低下若しくは消失により、被加工物への糊残り発生防止、被加工物7の加工工程、加工された被加工物の剥離、回収工程における操作性及び作業性が大幅に改善され、生産効率も大きく向上できる。 Thus, the adhesive to the work piece is prevented by preventing the peeling of the energy ray curable elastic layer at the time of peeling, hardening of the energy ray curable elastic layer 3 by energy ray irradiation, and significant decrease or disappearance of the adhesive strength by heat treatment. It is possible to significantly improve the operability and workability in the remaining generation prevention, the processing step of the workpiece 7, the separation of the processed workpiece, and the recovery step, and the production efficiency can be greatly improved.
本発明のエネルギー線硬化型熱剥離性粘着シートは、被加工物を永久的に接着させる用途にも使用できるが、被加工物を所定期間接着すると共に、接着目的を達成した後には、その接着状態を解除することが要求若しくは望まれる用途にも適している。このような用途の具体例として、半導体ウエハやセラミック積層シートの固定材のほか、各種の電気装置、電子装置、ディスプレイ装置等の組立工程における部品搬送用、仮止め用等のキャリアテープ、仮止め材又は固定材、金属板、プラスチック板、ガラス板等の汚染損傷防止を目的とした表面保護材又はマスキング材などが挙げられる。特に、電子部品の製造工程において、小さな若しくは薄層の半導体チップや積層コンデンサチップなどの製造工程等に好適に使用できる。 The energy ray curable heat-peelable pressure-sensitive adhesive sheet of the present invention can be used for the purpose of permanently bonding a workpiece, but after bonding the workpiece for a predetermined period and after achieving the bonding purpose, the bonding is performed. It is also suitable for applications where it is required or desired to release the state. Specific examples of such applications include fixing tapes for semiconductor wafers and ceramic laminated sheets, carrier tapes for parts transport and temporary fixing, etc., for temporary fixing in assembly processes of various electrical devices, electronic devices, display devices, etc. Examples thereof include a surface protective material or a masking material for the purpose of preventing contamination damage such as a material or a fixing material, a metal plate, a plastic plate, and a glass plate. In particular, in the manufacturing process of electronic components, it can be suitably used for manufacturing processes such as small or thin semiconductor chips and multilayer capacitor chips.
次に本発明を実施例に基づき更に詳細に説明する。なお本発明はこれらの例によってなんら限定されるものではない。 Next, the present invention will be described in more detail based on examples. The present invention is not limited to these examples.
有機コーティング層付の基材1の作製
基材として、東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)のPETフィルムを用いた。この基材のコロナ処理面側に、有機コーティング層を、乾燥膜厚が1〜2μmとなるように、グラビアコーターで塗布し、乾燥し、有機コーティング層付の基材1を得た。この有機コーティング層には、薄青色印刷インクNB300(大日精化社)を用いた。なお、NB300にはバインダー樹脂としてポリウレタン系酢酸ビニル−塩化ビニルコポリマーが含まれており、IRによってウレタンと考えられる強度ピークを確認した。
Production of Substrate 1 with Organic Coating Layer As a substrate, a PET film made by Toray Co., Ltd., one-side corona-treated, Lumirror S105 (thickness 50 μm) was used. On the corona-treated surface side of this base material, the organic coating layer was applied with a gravure coater so as to have a dry film thickness of 1 to 2 μm and dried to obtain a base material 1 with an organic coating layer. For this organic coating layer, a light blue printing ink NB300 (Daiichi Seika Co., Ltd.) was used. NB300 contained a polyurethane-based vinyl acetate-vinyl chloride copolymer as a binder resin, and an intensity peak considered to be urethane was confirmed by IR.
有機コーティング層付の基材2の作製
基材として、東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)のPETフィルムを用いた。この基材のコロナ処理面側に、有機コーティング層を、乾燥膜厚が1〜2μmとなるように、グラビアコーターで塗布し、乾燥し、有機コーティング層付の基材2を得た。この有機コーティング層には、薄青色の色素を含まない印刷インクNB300(大日精化社)を用いた。なお、NB300にはバインダー樹脂としてポリウレタン系酢酸ビニル−塩化ビニルコポリマーが含まれており、IRによってウレタンと考えられる強度ピークを確認した。
Production of Substrate 2 with Organic Coating Layer As a substrate, a PET film made by Toray Industries Inc., treated with a single-sided corona treatment and Lumirror S105 (thickness 50 μm) was used. On the corona-treated surface side of this substrate, the organic coating layer was applied with a gravure coater so as to have a dry film thickness of 1 to 2 μm and dried to obtain a substrate 2 with an organic coating layer. For this organic coating layer, printing ink NB300 (Daiichi Seika Co., Ltd.) containing no light blue pigment was used. NB300 contained a polyurethane-based vinyl acetate-vinyl chloride copolymer as a binder resin, and an intensity peak considered to be urethane was confirmed by IR.
有機コーティング層付の基材3の作製
基材として、東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)のPETフィルムを用いた。この基材のコロナ処理面側に、有機コーティング層を、乾燥膜厚が1〜2μmとなるように、グラビアコーターで塗布し、乾燥し、有機コーティング層付の基材3を得た。この有機コーティング層には、ポリウレタン系プライマー剤であるアデカボンタイターU500(ADEKA製)71重量部とイソシアネート樹脂であるコロネートHL(日本ポリウレタン工業製)28重量部の酢酸エチル溶液を用いた。
Production of Substrate 3 with Organic Coating Layer As a substrate, a PET film made by Toray Industries, single-sided corona treatment, Lumirror S105 (thickness 50 μm) was used. On the corona-treated surface side of this substrate, the organic coating layer was applied with a gravure coater so that the dry film thickness was 1 to 2 μm and dried to obtain a substrate 3 with an organic coating layer. For this organic coating layer, an ethyl acetate solution of 71 parts by weight of Adekabon titer U500 (manufactured by ADEKA) as a polyurethane primer and 28 parts by weight of coronate HL (manufactured by Nippon Polyurethane Industry) as an isocyanate resin was used.
有機コーティング層付の基材4の作製
アクリル系モノマーとして、アクリル酸t−ブチル50.0部、アクリル酸30.0部、アクリル酸ブチル20.0部と、多官能モノマーとしてトリメチロールプロパントリアクリレート1.0部と、光重合開始剤として、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(商品名「イルガキュア2959」、チバ・スペシャルティ・ケミカルズ(株)製)0.1部と、ポリオールとして、ポリオキシテトラメチレングリコール(分子量650、三菱化学(株)製)73.4部と、ウレタン反応触媒として、ジブチル錫ジラウレート0.05部とを投入し、攪拌しながら、キシリレンジイソシアネート26.6部を滴下し、65℃で2時間反応させて、ウレタンポリマー−アクリル系モノマー混合物を得た。ポリイソシアネート成分とポリオール成分の使用量は、NCO/OH(当量比)=1.25であった。
得られたウレタンポリマー−アクリル系モノマー混合物を、厚さ38μmのポリエチレンテレフタレートフィルム(東レ社製、商品名「S−10」)上に、硬化後の厚みが3〜4μmになるように塗布した。この上に、剥離処理したPETフィルム(厚み38μm)を重ねて被覆し、この被覆したPETフィルム面に、高圧水銀ランプを用いて紫外線(照度163mW/cm2、光量2100mJ/cm2)を照射して硬化させて、ポリエチレンテレフタレート/アクリル・ウレタン積層シートを得た。
Preparation of base material 4 with organic coating layer As acrylic monomers, 50.0 parts of t-butyl acrylate, 30.0 parts of acrylic acid, 20.0 parts of butyl acrylate, and trimethylolpropane triacrylate as a polyfunctional monomer 1.0 part and 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one (trade name “Irgacure 2959”, Ciba Specialty Chemicals Co., Ltd.) 0.1 parts, polyol as polyoxytetramethylene glycol (molecular weight 650, Mitsubishi Chemical Co., Ltd.) 73.4 parts, urethane reaction catalyst as dibutyltin dilaurate 0 Then, 26.6 parts of xylylene diisocyanate are added dropwise with stirring and the mixture is stirred at 65 ° C. for 2 hours. Accordingly, a urethane polymer-acrylic monomer mixture was obtained. The amount of polyisocyanate component and polyol component used was NCO / OH (equivalent ratio) = 1.25.
The obtained urethane polymer-acrylic monomer mixture was applied on a 38 μm thick polyethylene terephthalate film (trade name “S-10” manufactured by Toray Industries, Inc.) so that the thickness after curing would be 3 to 4 μm. A PET film (thickness: 38 μm) that has been subjected to peeling treatment is overlaid thereon, and the surface of the coated PET film is irradiated with ultraviolet rays (illuminance 163 mW / cm 2 , light amount 2100 mJ / cm 2 ) using a high-pressure mercury lamp. And cured to obtain a polyethylene terephthalate / acrylic urethane laminate sheet.
有機コーティング層付の基材5の作製
基材として、PETフィルムを準備した。東レ社製、片面コロナ処理済み、ルミラーS105(厚み38μm)をこのPETフィルムとして用いた。この剛直フィルム層のコロナ処理面側に、有機コーティング層を、乾燥膜厚が1〜2μmとなるように、グラビアコーターで塗布し、乾燥し、有機コーティング層付の基材5を得た。この有機コーティング層には、青色印刷インクCVL−PR(DICグラフィックス社製)を用いた。CVL−PRにはバインダー樹脂として水酸基含有酢酸ビニル−塩化ビニル共重合体が含まれており、IRではウレタンと考えられる強度ピークは確認できなかった。
Preparation of the base material 5 with an organic coating layer A PET film was prepared as a base material. Toray Industries, Inc., single-sided corona-treated, Lumirror S105 (thickness 38 μm) was used as this PET film. On the corona-treated surface side of this rigid film layer, the organic coating layer was applied with a gravure coater so as to have a dry film thickness of 1 to 2 μm and dried to obtain a substrate 5 with an organic coating layer. For this organic coating layer, blue printing ink CVL-PR (manufactured by DIC Graphics) was used. CVL-PR contains a hydroxyl group-containing vinyl acetate-vinyl chloride copolymer as a binder resin, and an intensity peak considered to be urethane could not be confirmed by IR.
有機コーティング層付の基材6の作製
基材として、PETフィルムを準備した。東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)をこのPETフィルムとして用いた。この基材のコロナ処理面側に、有機コーティング層を、乾燥膜厚が1〜2μmとなるように、グラビアコーターで塗布し、乾燥し、有機コーティング層付の基材6を得た。この有機コーティング層には、非晶性飽和共重合ポリエステル樹脂(商品名「バイロン200」、東洋紡績(株)製)を用いた。
Production of substrate 6 with organic coating layer A PET film was prepared as a substrate. Toray Industries, Inc., single-sided corona-treated, Lumirror S105 (thickness 50 μm) was used as this PET film. On the corona-treated surface side of this substrate, the organic coating layer was applied with a gravure coater so that the dry film thickness was 1 to 2 μm, and dried to obtain a substrate 6 with an organic coating layer. For this organic coating layer, an amorphous saturated copolyester resin (trade name “Byron 200”, manufactured by Toyobo Co., Ltd.) was used.
エネルギー線硬化型粘着剤層1の作製
2−エチルヘキシルアクリレート:モルホリルアクリレート:2−ヒドロキシエチルアクリレート=75:25:20(モル比)混合物100重量部に重合開始剤ベンジルパーオキサイド0.2重量部を加えたトルエン溶液から共重合してアクリル系重合体(重量平均分子量70万)を得た。得られた前記アクリル系重合体に2−ヒドロキシエチルアクリレート由来の水酸基の50モル%のメタクリロイルオキシエチルイソシアナート(2−イソシアナトエチルメタクリレート)と前記アクリル系重合体100重量部に対して、付加反応触媒ジブチル錫ジラウレート0.03重量部とを配合し、空気雰囲気下、50℃で24時間反応させて、側鎖にメタクリレート基を有するアクリル系重合体を製造した。得られたアクリル系重合体100重量部に対して、3官能アクリル系光重合性モノマー(トリメチロールプロパントリアクリレート(商品名:アロニクスM320、東亜合成(株)製))15重量部、ラジカル系光重合開始剤(イルガキュア651、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、チバガイギー社製)1重量部、イソシアネート化合物(日本ポリウレタン工業(株)製、 商品名コロネートL)1重量部を加え、混合物を得た。
得られた混合物を、ダイコーターを用いて、剥離処理済みPETフィルムMRF38(三菱ポリエステル社製)の剥離処理面に、乾燥膜厚が30μmとなるように塗布し、エネルギー線硬化型粘着剤層1を得た。なお、剥離処理済みPETフィルムMRF38は、セパレータとして用いた。
Preparation of energy ray curable pressure-sensitive adhesive layer 1 2-ethylhexyl acrylate: morpholyl acrylate: 2-hydroxyethyl acrylate = 75: 25: 20 (molar ratio) 100 parts by weight of a mixture, polymerization initiator benzyl peroxide 0.2 weight Acrylic polymer (weight average molecular weight 700,000) was obtained by copolymerization from a toluene solution to which parts were added. The resulting acrylic polymer is subjected to an addition reaction with respect to 50 parts by weight of methacryloyloxyethyl isocyanate (2-isocyanatoethyl methacrylate) of hydroxyl group derived from 2-hydroxyethyl acrylate and 100 parts by weight of the acrylic polymer. 0.03 part by weight of catalyst dibutyltin dilaurate was blended and reacted in an air atmosphere at 50 ° C. for 24 hours to produce an acrylic polymer having a methacrylate group in the side chain. 15 parts by weight of trifunctional acrylic photopolymerizable monomer (trimethylolpropane triacrylate (trade name: Aronics M320, manufactured by Toagosei Co., Ltd.)), radical light based on 100 parts by weight of the obtained acrylic polymer 1 part by weight of a polymerization initiator (Irgacure 651,2,2-dimethoxy-1,2-diphenylethane-1-one, manufactured by Ciba-Geigy), 1 weight of isocyanate compound (trade name Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.) Part was added to obtain a mixture.
The obtained mixture was applied to the release-treated surface of a release-treated PET film MRF38 (manufactured by Mitsubishi Polyester) using a die coater so that the dry film thickness was 30 μm, and the energy ray-curable pressure-sensitive adhesive layer 1 Got. The peel-treated PET film MRF38 was used as a separator.
エネルギー線硬化型粘着剤層2の作製
エチルアクリレート−2−エチルヘキシルアクリレート−2−ヒドロキシエチルアクリレート (80部-20部-5部)からなる共重合体ポリマー100部に対し、6官能アクリル系光重合性モノマー(ジペンタエリスリトールヘキサアクリレート(商品名:A−DPH、新中村化学(株)製))70重量部、イルガキュア651を1重量部、コロネートLを0.8重量部を加え、混合物を得た。得られた混合物を、ダイコーターを用いて、剥離処理済みPETフィルムMRF38(三菱ポリエステル社製)の剥離処理面に、乾燥膜厚が30μmとなるように塗布し、エネルギー線硬化型粘着剤層2を得た。
Preparation of energy ray curable pressure-sensitive adhesive layer 2 Hexafunctional acrylic photopolymerization is performed on 100 parts of a copolymer polymer composed of ethyl acrylate-2-ethylhexyl acrylate-2-hydroxyethyl acrylate (80 parts-20 parts-5 parts). 70 parts by weight of a functional monomer (dipentaerythritol hexaacrylate (trade name: A-DPH, manufactured by Shin-Nakamura Chemical Co., Ltd.)), 1 part by weight of Irgacure 651, and 0.8 part by weight of Coronate L were added to obtain a mixture. It was. The obtained mixture was applied to the release-treated surface of a release-treated PET film MRF38 (manufactured by Mitsubishi Polyester) using a die coater so that the dry film thickness was 30 μm, and the energy ray-curable pressure-sensitive adhesive layer 2 Got.
熱剥離型粘着剤層の作製
エチルアクリレート−2−エチルヘキシルアクリレート−2−ヒドロキシエチルアクリレート (80部-20部-5部)からなる共重合体ポリマー100部に対し、「コロネートL」(架橋剤、日本ポリウレタン工業社製)を1部、170℃発泡膨張タイプの熱膨張性微小球「マツモトマイクロスフェアF−100D」(熱膨張性微小球、松本油脂製)30部を配合して混合液を調整した。この混合液を剥離処理済みPETフィルムMRF38(三菱ポリエステル社製)の剥離処理面に上に塗工し乾燥させ50μmの熱剥離型粘着剤層を得た。
Preparation of heat-peelable pressure-sensitive adhesive layer For 100 parts of copolymer polymer consisting of ethyl acrylate-2-ethylhexyl acrylate-2-hydroxyethyl acrylate (80 parts-20 parts-5 parts), “Coronate L” (crosslinking agent, Prepare 1 part of Nippon Polyurethane Industry Co., Ltd. and 30 parts of 170 ° C foam expansion type thermal expansion microsphere "Matsumoto Microsphere F-100D" (thermal expansion microsphere, made by Matsumoto Yushi) did. This mixed solution was applied onto a release-treated surface of a release-treated PET film MRF38 (manufactured by Mitsubishi Polyester) and dried to obtain a 50-μm heat-peelable pressure-sensitive adhesive layer.
実施例1
有機コーティング層付の基材1の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
実施例2
有機コーティング層付の基材2の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
実施例3
有機コーティング層付の基材3の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
実施例4
有機コーティング層付の基材4の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
実施例5
有機コーティング層付の基材1の有機コーティング層側に上記エネルギー線硬化型粘着剤層2を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
実施例6
有機コーティング層付の基材2の有機コーティング層側に上記エネルギー線硬化型粘着剤層2を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
Example 1
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 1 with the organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type. An adhesive sheet was prepared.
Example 2
The energy ray-curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 2 with the organic coating layer, and then the heat-peelable pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type An adhesive sheet was prepared.
Example 3
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 3 with the organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type. An adhesive sheet was prepared.
Example 4
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 4 with an organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type. An adhesive sheet was prepared.
Example 5
The energy ray curable pressure-sensitive adhesive layer 2 is bonded to the organic coating layer side of the base material 1 with an organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat release type. An adhesive sheet was prepared.
Example 6
The energy ray-curable pressure-sensitive adhesive layer 2 is bonded to the organic coating layer side of the base material 2 with the organic coating layer, and then the heat-peelable pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type An adhesive sheet was prepared.
比較例1
東レ社製PETフィルム、ルミラーS10(厚み50μm)に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
比較例2
東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
比較例3
東レ社製PETフィルム、ルミラーS10(厚み50μm)に上記エネルギー線硬化型粘着剤層2を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
比較例4
東レ社製、片面コロナ処理済み、ルミラーS105(厚み50μm)に上記エネルギー線硬化型粘着剤層2を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
参考例1
有機コーティング層付の基材5の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
参考例2
有機コーティング層付の基材6の有機コーティング層側に上記エネルギー線硬化型粘着剤層1を貼り合せ、次いで基材の他方の面上に上記熱剥離型粘着剤層を貼り合せて加熱剥離型粘着シートを作製した。
Comparative Example 1
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to Toray Co., Ltd. PET film, Lumirror S10 (thickness 50 μm), and then the heat-peelable pressure-sensitive adhesive layer is bonded to the other surface of the substrate. A sheet was produced.
Comparative Example 2
Toray Industries, one-side corona-treated, Lumirror S105 (thickness 50 μm) is bonded with the energy ray curable pressure-sensitive adhesive layer 1, and then the heat-peelable pressure-sensitive adhesive layer is bonded onto the other surface of the substrate and heated. A peelable pressure-sensitive adhesive sheet was produced.
Comparative Example 3
The energy ray-curable pressure-sensitive adhesive layer 2 is bonded to Toray's PET film, Lumirror S10 (thickness 50 μm), and then the heat-peelable pressure-sensitive adhesive layer is bonded to the other surface of the substrate to heat-peel the pressure-sensitive adhesive. A sheet was produced.
Comparative Example 4
Toray Industries, one-side corona-treated, Lumirror S105 (thickness 50 μm) is bonded with the energy ray curable pressure-sensitive adhesive layer 2, and then the heat-peelable pressure-sensitive adhesive layer is bonded onto the other surface of the substrate and heated. A peelable pressure-sensitive adhesive sheet was produced.
Reference example 1
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 5 with the organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type. An adhesive sheet was prepared.
Reference example 2
The energy ray curable pressure-sensitive adhesive layer 1 is bonded to the organic coating layer side of the base material 6 with the organic coating layer, and then the heat-peeling pressure-sensitive adhesive layer is bonded to the other surface of the base material to heat-release type. An adhesive sheet was prepared.
上記加熱剥離型粘着シートの熱剥離型粘着剤表面にウエハA(厚さ725μm、6インチ:支持体)を、エネルギー線硬化型粘着剤表面に縦10mm、横10mm間隔で賽の目状に5μmの切り込みを入れたウエハB(厚さ725μm、6インチ:被加工物)を貼り合せた。次いでウエハBの裏面を100μmまで機械研削加工した。その後、日東精機社製UV照射機NEL UM810(高圧水銀灯光源、20mW/cm2)を用いて300mJ/cm2の紫外線照射を行い、エネルギー線硬化粘着剤層を硬化させた。次いで170℃まで昇温させることにより熱膨張させウエハAを回収した後、ウエハB上に残った加熱剥離型粘着シートを1m/分の速度でピールにより剥離した。 Wafer A (thickness: 725 μm, 6 inches: support) is cut on the surface of the heat-peelable pressure-sensitive adhesive sheet of the heat-peelable pressure-sensitive adhesive sheet, and the surface of the energy ray-curable pressure-sensitive adhesive is 10 mm long and 10 μm wide, with a 5 μm cut in a grid pattern. Wafer B (thickness: 725 μm, 6 inches: work piece) was bonded. Next, the back surface of the wafer B was mechanically ground to 100 μm. Thereafter, UV irradiation of 300 mJ / cm 2 was performed using a UV irradiator NEL UM810 (high pressure mercury lamp light source, 20 mW / cm 2 ) manufactured by Nitto Seiki Co., Ltd. to cure the energy ray curable adhesive layer. Subsequently, the wafer A was recovered by thermal expansion by raising the temperature to 170 ° C., and then the heat-peelable pressure-sensitive adhesive sheet remaining on the wafer B was peeled off with a peel at a speed of 1 m / min.
糊残り性評価
剥離後のウエハ表面における賽の目にした100区画中の糊残りの発生した数を光学顕微鏡により観察した。
Evaluation of adhesive residue The number of adhesive residues in 100 sections in the shape of creases on the wafer surface after peeling was observed with an optical microscope.
上記の各実施例及び比較例とその結果を以下の表1に示す。
実施例1〜6に示す例は、いずれも有機コーティング層を設けてなる本発明に沿った例である。これらの例によれば、糊残り(糊剥がれ)個数が0個又は30個と極めて優れた結果となった。
しかしながら、有機コーティング層を設けなかった比較例1〜4によると糊残り(糊剥がれ)が多く発生しており、被加工物を剥離した後に該被加工物表面が汚染される結果になった。
また、参考例1及び2に示すように、有機コーティング層を設けるものの、ウレタン結合を有しない共重合体をバインダーとした場合には、33個又は28個の糊剥がれを生じた。参考例1及び2によれば、明らかに有機コーティング層を設けない場合よりは糊剥がれ個数が少なく、その分、被加工物表面の汚染の程度が小さいことがわかる。
Examples shown in Examples 1 to 6 are examples according to the present invention in which an organic coating layer is provided. According to these examples, the number of adhesive residues (adhesive peeling) was 0 or 30 and the result was extremely excellent.
However, according to Comparative Examples 1 to 4 in which the organic coating layer was not provided, a large amount of adhesive residue (peel peeling) occurred, and the surface of the workpiece was contaminated after the workpiece was peeled off.
Further, as shown in Reference Examples 1 and 2, when an organic coating layer was provided, but a copolymer having no urethane bond was used as a binder, 33 or 28 pieces of glue were peeled off. According to Reference Examples 1 and 2, it is apparent that the number of pieces peeled off is obviously smaller than that in the case where no organic coating layer is provided, and the degree of contamination on the workpiece surface is correspondingly reduced.
1 基材
2 有機コーティング層
3 エネルギー線硬化型弾性層
4 熱剥離型粘着剤層
5 セパレータ
6 セパレータ
7 被加工物(被切断体)
8 エネルギー線
9 切断線
10 支持体
DESCRIPTION OF SYMBOLS 1 Base material 2 Organic coating layer 3 Energy ray hardening-type elastic layer 4 Thermally peelable adhesive layer 5 Separator 6 Separator 7 Work piece (to-be-cut object)
8 Energy line 9 Cutting line 10 Support
Claims (7)
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JP2012071957A JP6000595B2 (en) | 2012-03-27 | 2012-03-27 | Heat-peelable pressure-sensitive adhesive sheet for electronic component cutting and electronic component processing method |
CN201380015951.XA CN104185665B (en) | 2012-03-27 | 2013-03-25 | Electronic unit cut-out heat-peelable pressure-sensitive adhesive sheet and electronic unit processing method |
PCT/JP2013/058637 WO2013146707A1 (en) | 2012-03-27 | 2013-03-25 | Heat releasable adhesive sheet for cutting electronic component, and method for machining electronic component |
KR1020147025809A KR102022140B1 (en) | 2012-03-27 | 2013-03-25 | Heat releasable adhesive sheet for cutting electronic component, and method for machining electronic component |
TW102111008A TWI586785B (en) | 2012-03-27 | 2013-03-27 | Heet peelable adhesive sheet for use in cutting electronic component and method for processing electronic component |
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Also Published As
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CN104185665A (en) | 2014-12-03 |
TW201348393A (en) | 2013-12-01 |
KR102022140B1 (en) | 2019-09-17 |
JP6000595B2 (en) | 2016-09-28 |
WO2013146707A1 (en) | 2013-10-03 |
KR20140142243A (en) | 2014-12-11 |
CN104185665B (en) | 2016-09-14 |
TWI586785B (en) | 2017-06-11 |
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