JP2013170181A5 - - Google Patents

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Publication number
JP2013170181A5
JP2013170181A5 JP2012033055A JP2012033055A JP2013170181A5 JP 2013170181 A5 JP2013170181 A5 JP 2013170181A5 JP 2012033055 A JP2012033055 A JP 2012033055A JP 2012033055 A JP2012033055 A JP 2012033055A JP 2013170181 A5 JP2013170181 A5 JP 2013170181A5
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JP
Japan
Prior art keywords
group
formula
carbon atoms
antistatic film
integer
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JP2012033055A
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English (en)
Japanese (ja)
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JP2013170181A (ja
JP5831845B2 (ja
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Priority to JP2012033055A priority Critical patent/JP5831845B2/ja
Priority claimed from JP2012033055A external-priority patent/JP5831845B2/ja
Publication of JP2013170181A publication Critical patent/JP2013170181A/ja
Publication of JP2013170181A5 publication Critical patent/JP2013170181A5/ja
Application granted granted Critical
Publication of JP5831845B2 publication Critical patent/JP5831845B2/ja
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JP2012033055A 2012-02-17 2012-02-17 帯電防止膜形成組成物 Active JP5831845B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012033055A JP5831845B2 (ja) 2012-02-17 2012-02-17 帯電防止膜形成組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012033055A JP5831845B2 (ja) 2012-02-17 2012-02-17 帯電防止膜形成組成物

Publications (3)

Publication Number Publication Date
JP2013170181A JP2013170181A (ja) 2013-09-02
JP2013170181A5 true JP2013170181A5 (enrdf_load_stackoverflow) 2014-11-27
JP5831845B2 JP5831845B2 (ja) 2015-12-09

Family

ID=49264346

Family Applications (1)

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JP2012033055A Active JP5831845B2 (ja) 2012-02-17 2012-02-17 帯電防止膜形成組成物

Country Status (1)

Country Link
JP (1) JP5831845B2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020100775A (ja) * 2018-12-25 2020-07-02 三菱ケミカル株式会社 導電性組成物
JP7108565B2 (ja) * 2019-03-11 2022-07-28 信越化学工業株式会社 導電性高分子組成物、被覆品、及びパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3349843B2 (ja) * 1994-10-12 2002-11-25 富士通株式会社 電離放射線照射用組成物及び電離放射線照射方法
EP0921147B1 (en) * 1997-12-03 2005-01-12 Nissan Chemical Industries, Limited Transparent conducting polymers
TW200619301A (en) * 2004-09-22 2006-06-16 Showa Denko Kk The water-soluable composition of antistatic agent, the antistatic agent, the method of forming antistatic film, coated products and pattern by using the same the agent
TW200902592A (en) * 2007-03-29 2009-01-16 Mitsui Chemicals Inc Polymers containing sulfo group and intermediate thereof, and organic electroluminescent element containing the polymer
JP5288108B2 (ja) * 2008-07-10 2013-09-11 日産化学工業株式会社 電子線レジスト上層用帯電防止膜形成組成物

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