JP2013157359A5 - - Google Patents

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Publication number
JP2013157359A5
JP2013157359A5 JP2012014566A JP2012014566A JP2013157359A5 JP 2013157359 A5 JP2013157359 A5 JP 2013157359A5 JP 2012014566 A JP2012014566 A JP 2012014566A JP 2012014566 A JP2012014566 A JP 2012014566A JP 2013157359 A5 JP2013157359 A5 JP 2013157359A5
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JP
Japan
Prior art keywords
crystal
oxide semiconductor
semiconductor film
oxygen introduction
manufacturing
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Application number
JP2012014566A
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English (en)
Japanese (ja)
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JP2013157359A (ja
JP5939812B2 (ja
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Priority to JP2012014566A priority Critical patent/JP5939812B2/ja
Priority claimed from JP2012014566A external-priority patent/JP5939812B2/ja
Publication of JP2013157359A publication Critical patent/JP2013157359A/ja
Publication of JP2013157359A5 publication Critical patent/JP2013157359A5/ja
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Publication of JP5939812B2 publication Critical patent/JP5939812B2/ja
Active legal-status Critical Current
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JP2012014566A 2012-01-26 2012-01-26 半導体装置の作製方法 Active JP5939812B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012014566A JP5939812B2 (ja) 2012-01-26 2012-01-26 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012014566A JP5939812B2 (ja) 2012-01-26 2012-01-26 半導体装置の作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016098751A Division JP6283710B2 (ja) 2016-05-17 2016-05-17 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2013157359A JP2013157359A (ja) 2013-08-15
JP2013157359A5 true JP2013157359A5 (enrdf_load_stackoverflow) 2014-11-13
JP5939812B2 JP5939812B2 (ja) 2016-06-22

Family

ID=49052286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012014566A Active JP5939812B2 (ja) 2012-01-26 2012-01-26 半導体装置の作製方法

Country Status (1)

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JP (1) JP5939812B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI642186B (zh) * 2013-12-18 2018-11-21 日商半導體能源研究所股份有限公司 半導體裝置
US10096489B2 (en) * 2014-03-06 2018-10-09 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US9887291B2 (en) * 2014-03-19 2018-02-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic device including the semiconductor device, the display device, or the display module
KR102775945B1 (ko) * 2015-02-12 2025-03-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 산화물 반도체막 및 반도체 장치
CN118872076A (zh) * 2022-03-30 2024-10-29 株式会社日本显示器 半导体装置及半导体装置的制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230173233A (ko) * 2009-11-13 2023-12-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치 및 이 표시 장치를 구비한 전자 기기
CN105140101B (zh) * 2009-11-28 2018-11-16 株式会社半导体能源研究所 层叠的氧化物材料、半导体器件、以及用于制造该半导体器件的方法
KR101945171B1 (ko) * 2009-12-08 2019-02-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
WO2011132590A1 (en) * 2010-04-23 2011-10-27 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
WO2011135987A1 (en) * 2010-04-28 2011-11-03 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
WO2011145468A1 (en) * 2010-05-21 2011-11-24 Semiconductor Energy Laboratory Co., Ltd. Memory device and semiconductor device

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