JP2013101134A5 - - Google Patents

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Publication number
JP2013101134A5
JP2013101134A5 JP2013000923A JP2013000923A JP2013101134A5 JP 2013101134 A5 JP2013101134 A5 JP 2013101134A5 JP 2013000923 A JP2013000923 A JP 2013000923A JP 2013000923 A JP2013000923 A JP 2013000923A JP 2013101134 A5 JP2013101134 A5 JP 2013101134A5
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Japan
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coil
plasma
applying
voltage
wires
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JP2013000923A
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Japanese (ja)
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JP5717206B2 (ja
JP2013101134A (ja
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JP2013000923A 2005-03-07 2013-01-08 プラズマ生成システム、プラズマ生成方法、プラズマ閉じ込め方法 Expired - Fee Related JP5717206B2 (ja)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US65952505P 2005-03-07 2005-03-07
US65954905P 2005-03-07 2005-03-07
US65973805P 2005-03-07 2005-03-07
US65976705P 2005-03-07 2005-03-07
US60/659,549 2005-03-07
US60/659,738 2005-03-07
US60/659,525 2005-03-07
US60/659,767 2005-03-07

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2008500874A Division JP5319273B2 (ja) 2005-03-07 2006-03-07 Ｆｒｃ磁場においてイオンおよび電子を駆動するシステムおよび方法

Publications (3)

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JP2013101134A JP2013101134A (ja) 2013-05-23
JP2013101134A5 true JP2013101134A5 (cg-RX-API-DMAC7.html) 2013-11-07
JP5717206B2 JP5717206B2 (ja) 2015-05-13

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JP2008500874A Expired - Fee Related JP5319273B2 (ja) 2005-03-07 2006-03-07 Ｆｒｃ磁場においてイオンおよび電子を駆動するシステムおよび方法
JP2010138797A Pending JP2010237222A (ja) 2005-03-07 2010-06-17 プラズマ電子生成システム
JP2013000923A Expired - Fee Related JP5717206B2 (ja) 2005-03-07 2013-01-08 プラズマ生成システム、プラズマ生成方法、プラズマ閉じ込め方法

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JP2008500874A Expired - Fee Related JP5319273B2 (ja) 2005-03-07 2006-03-07 Ｆｒｃ磁場においてイオンおよび電子を駆動するシステムおよび方法
JP2010138797A Pending JP2010237222A (ja) 2005-03-07 2010-06-17 プラズマ電子生成システム

Country Status (18)

Country Link
EP (2) EP2389048A2 (cg-RX-API-DMAC7.html)
JP (3) JP5319273B2 (cg-RX-API-DMAC7.html)
KR (2) KR101052579B1 (cg-RX-API-DMAC7.html)
CN (1) CN102291925A (cg-RX-API-DMAC7.html)
AU (1) AU2006220546B2 (cg-RX-API-DMAC7.html)
BR (2) BRPI0622299B1 (cg-RX-API-DMAC7.html)
CA (1) CA2600421C (cg-RX-API-DMAC7.html)
CY (1) CY1113150T1 (cg-RX-API-DMAC7.html)
DK (1) DK1856702T3 (cg-RX-API-DMAC7.html)
EA (2) EA013826B1 (cg-RX-API-DMAC7.html)
ES (1) ES2390786T3 (cg-RX-API-DMAC7.html)
IL (1) IL185168A (cg-RX-API-DMAC7.html)
MX (1) MX2007010891A (cg-RX-API-DMAC7.html)
NZ (1) NZ560659A (cg-RX-API-DMAC7.html)
PL (1) PL1856702T3 (cg-RX-API-DMAC7.html)
PT (1) PT1856702E (cg-RX-API-DMAC7.html)
SG (1) SG157369A1 (cg-RX-API-DMAC7.html)
WO (1) WO2006096772A2 (cg-RX-API-DMAC7.html)

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PL3295459T3 (pl) 2015-05-12 2021-06-28 Tae Technologies, Inc. Systemy i sposoby redukcji niepożądanych prądów wirowych
IL259313B2 (en) * 2015-11-13 2023-11-01 Tae Tech Inc Systems and methods for positioning stability of FRC plasma
CN107768217A (zh) * 2016-08-18 2018-03-06 孙保胜 自分离离子源
MY194606A (en) 2016-10-28 2022-12-06 Tae Tech Inc Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies
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CN106772162B (zh) * 2016-12-26 2020-01-14 中国科学院长春光学精密机械与物理研究所 用于磁共振成像系统的非缠绕形式梯度线圈及其设计方法
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