JP2013084857A5 - - Google Patents
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- Publication number
- JP2013084857A5 JP2013084857A5 JP2011225180A JP2011225180A JP2013084857A5 JP 2013084857 A5 JP2013084857 A5 JP 2013084857A5 JP 2011225180 A JP2011225180 A JP 2011225180A JP 2011225180 A JP2011225180 A JP 2011225180A JP 2013084857 A5 JP2013084857 A5 JP 2013084857A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement tank
- volume
- flow path
- pressure gauge
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 description 11
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 238000012795 verification Methods 0.000 description 2
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011225180A JP5433660B2 (ja) | 2011-10-12 | 2011-10-12 | ガス流量監視システム |
| US13/602,719 US8826935B2 (en) | 2011-10-12 | 2012-09-04 | Gas flow monitoring system |
| TW101133244A TWI460570B (zh) | 2011-10-12 | 2012-09-12 | 氣體流量監視系統 |
| KR1020120113517A KR101442574B1 (ko) | 2011-10-12 | 2012-10-12 | 가스 유량 감시 시스템 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011225180A JP5433660B2 (ja) | 2011-10-12 | 2011-10-12 | ガス流量監視システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013084857A JP2013084857A (ja) | 2013-05-09 |
| JP2013084857A5 true JP2013084857A5 (enExample) | 2013-08-15 |
| JP5433660B2 JP5433660B2 (ja) | 2014-03-05 |
Family
ID=48085173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011225180A Active JP5433660B2 (ja) | 2011-10-12 | 2011-10-12 | ガス流量監視システム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8826935B2 (enExample) |
| JP (1) | JP5433660B2 (enExample) |
| KR (1) | KR101442574B1 (enExample) |
| TW (1) | TWI460570B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013002885A1 (en) * | 2011-06-30 | 2013-01-03 | Applied Materials, Inc. | Method and apparatus for fast gas exchange, fast gas switching and programmable gas delivery |
| US9958302B2 (en) * | 2011-08-20 | 2018-05-01 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
| WO2016110931A1 (ja) * | 2015-01-05 | 2016-07-14 | 株式会社エニイワイヤ | 組立用物品管理システム |
| JP6533740B2 (ja) | 2015-12-15 | 2019-06-19 | Ckd株式会社 | ガス流量監視方法及びガス流量監視装置 |
| US10697848B1 (en) * | 2016-12-12 | 2020-06-30 | Kirk A. Dobbs | Smart building water supply management system with leak detection and flood prevention |
| US10031004B2 (en) | 2016-12-15 | 2018-07-24 | Mks Instruments, Inc. | Methods and apparatus for wide range mass flow verification |
| US10358180B2 (en) | 2017-01-05 | 2019-07-23 | Sram, Llc | Adjustable seatpost |
| US20180348034A1 (en) * | 2017-05-31 | 2018-12-06 | Air Liquide America Specialty Gases Llc | Gas sampling apparatus |
| WO2018235900A1 (ja) * | 2017-06-22 | 2018-12-27 | 株式会社フジキン | 流量制御装置および流量制御装置の流量制御方法 |
| JP6811147B2 (ja) * | 2017-06-23 | 2021-01-13 | 東京エレクトロン株式会社 | ガス供給系を検査する方法 |
| JP6960278B2 (ja) * | 2017-08-31 | 2021-11-05 | 東京エレクトロン株式会社 | 流量測定システムを検査する方法 |
| US11718913B2 (en) | 2018-06-04 | 2023-08-08 | Asm Ip Holding B.V. | Gas distribution system and reactor system including same |
| CN109085812A (zh) * | 2018-08-28 | 2018-12-25 | 武汉华星光电技术有限公司 | 气体流量监测系统及监测和主备用切换方法 |
| JP7358765B2 (ja) * | 2019-04-04 | 2023-10-11 | 株式会社サタケ | 製粉設備の監視システム |
| WO2020217601A1 (ja) * | 2019-04-26 | 2020-10-29 | 株式会社堀場エステック | 流路形成装置 |
| DE102019117543A1 (de) | 2019-06-28 | 2020-12-31 | Aixtron Se | Verfahren zum Kalibrieren/Verifizieren von Massenfluss-Mess/Steuer-Geräten eines Gasmischsystems und Vorrichtung zur Durchführung des Verfahrens |
| JP7680122B2 (ja) * | 2021-02-25 | 2025-05-20 | 東京エレクトロン株式会社 | 異常検出方法及び処理装置 |
| US12061103B2 (en) * | 2021-05-10 | 2024-08-13 | Applied Materials, Inc. | Packaging design for a flow sensor and methods of manufacturing thereof |
| CN114429870B (zh) * | 2022-02-24 | 2023-03-24 | 江苏振华新云电子有限公司 | 一种片式钽电解电容器蒸汽流量稳定输出调节装置 |
| CN115755158B (zh) * | 2022-11-29 | 2025-07-29 | 上海新漫传感科技有限公司 | 探测器的保护系统、方法及计算机可读介质 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI73315C (fi) * | 1984-06-15 | 1987-09-10 | Nokia Oy Ab | Kalibreringssystem foer kalibrering av massastroemreglerare. |
| US5233861A (en) * | 1990-12-03 | 1993-08-10 | Motorola, Inc. | Apparatus and method for in situ calibration of a metering device |
| JP2692770B2 (ja) * | 1992-09-30 | 1997-12-17 | シーケーディ株式会社 | マスフローコントローラ流量検定システム |
| JP3367811B2 (ja) | 1996-01-05 | 2003-01-20 | シーケーディ株式会社 | ガス配管系の検定システム |
| JP2002535122A (ja) * | 1999-01-20 | 2002-10-22 | マイクロリス・コーポレーション | 流れコントローラ |
| US6363958B1 (en) * | 1999-05-10 | 2002-04-02 | Parker-Hannifin Corporation | Flow control of process gas in semiconductor manufacturing |
| US6439253B1 (en) * | 2000-12-28 | 2002-08-27 | International Business Machines Corporation | System for and method of monitoring the flow of semiconductor process gases from a gas delivery system |
| JP4502590B2 (ja) * | 2002-11-15 | 2010-07-14 | 株式会社ルネサステクノロジ | 半導体製造装置 |
| US6955072B2 (en) * | 2003-06-25 | 2005-10-18 | Mks Instruments, Inc. | System and method for in-situ flow verification and calibration |
| US7740024B2 (en) * | 2004-02-12 | 2010-06-22 | Entegris, Inc. | System and method for flow monitoring and control |
| US6973375B2 (en) | 2004-02-12 | 2005-12-06 | Mykrolis Corporation | System and method for flow monitoring and control |
| US7412986B2 (en) * | 2004-07-09 | 2008-08-19 | Celerity, Inc. | Method and system for flow measurement and validation of a mass flow controller |
| US7376520B2 (en) * | 2005-03-16 | 2008-05-20 | Lam Research Corporation | System and method for gas flow verification |
| US7174263B2 (en) * | 2005-03-25 | 2007-02-06 | Mks Instruments, Inc. | External volume insensitive flow verification |
| US7716993B2 (en) * | 2006-03-07 | 2010-05-18 | Ckd Corporation | Gas flow rate verification unit |
| JP4788920B2 (ja) * | 2006-03-20 | 2011-10-05 | 日立金属株式会社 | 質量流量制御装置、その検定方法及び半導体製造装置 |
| US7743670B2 (en) * | 2006-08-14 | 2010-06-29 | Applied Materials, Inc. | Method and apparatus for gas flow measurement |
| US7881886B1 (en) * | 2006-11-17 | 2011-02-01 | Lam Research Corporation | Methods for performing transient flow prediction and verification using discharge coefficients |
| JP5002602B2 (ja) * | 2006-12-05 | 2012-08-15 | 株式会社堀場エステック | 流量制御装置の検定方法 |
| US8074677B2 (en) * | 2007-02-26 | 2011-12-13 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
| JP5134841B2 (ja) * | 2007-03-16 | 2013-01-30 | Ckd株式会社 | ガス供給ユニット |
| WO2009091935A1 (en) * | 2008-01-18 | 2009-07-23 | Pivotal Systems Corporation | Method and apparatus for in situ testing of gas flow controllers |
| US8205629B2 (en) * | 2008-04-25 | 2012-06-26 | Applied Materials, Inc. | Real time lead-line characterization for MFC flow verification |
| JP5346628B2 (ja) * | 2009-03-11 | 2013-11-20 | 株式会社堀場エステック | マスフローコントローラの検定システム、検定方法、検定用プログラム |
| US9846074B2 (en) * | 2012-01-20 | 2017-12-19 | Mks Instruments, Inc. | System for and method of monitoring flow through mass flow controllers in real time |
-
2011
- 2011-10-12 JP JP2011225180A patent/JP5433660B2/ja active Active
-
2012
- 2012-09-04 US US13/602,719 patent/US8826935B2/en active Active
- 2012-09-12 TW TW101133244A patent/TWI460570B/zh active
- 2012-10-12 KR KR1020120113517A patent/KR101442574B1/ko active Active
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