JP2013047344A - Electroconductive composition, electroconductive film obtained by using the same, and laminate including the electroconductive film - Google Patents
Electroconductive composition, electroconductive film obtained by using the same, and laminate including the electroconductive film Download PDFInfo
- Publication number
- JP2013047344A JP2013047344A JP2012221016A JP2012221016A JP2013047344A JP 2013047344 A JP2013047344 A JP 2013047344A JP 2012221016 A JP2012221016 A JP 2012221016A JP 2012221016 A JP2012221016 A JP 2012221016A JP 2013047344 A JP2013047344 A JP 2013047344A
- Authority
- JP
- Japan
- Prior art keywords
- electroconductive
- acid
- parts
- compound
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 47
- 239000012789 electroconductive film Substances 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 229920000447 polyanionic polymer Polymers 0.000 claims abstract description 27
- 229920000547 conjugated polymer Polymers 0.000 claims abstract description 24
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 21
- 239000003960 organic solvent Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 15
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 12
- 239000012752 auxiliary agent Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 abstract description 31
- 238000000576 coating method Methods 0.000 abstract description 28
- 239000006185 dispersion Substances 0.000 abstract description 14
- 230000000704 physical effect Effects 0.000 abstract description 6
- 238000004090 dissolution Methods 0.000 abstract description 3
- 239000003021 water soluble solvent Substances 0.000 abstract description 3
- 230000004807 localization Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 abstract 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 42
- 239000000178 monomer Substances 0.000 description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 30
- -1 alkyl pyrrolidone Chemical compound 0.000 description 28
- 239000002904 solvent Substances 0.000 description 22
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 21
- 239000002253 acid Substances 0.000 description 19
- 239000004020 conductor Substances 0.000 description 19
- 239000000243 solution Substances 0.000 description 17
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 16
- 229920005989 resin Polymers 0.000 description 13
- 239000011347 resin Substances 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 9
- 125000000542 sulfonic acid group Chemical group 0.000 description 9
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 8
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000010452 phosphate Substances 0.000 description 7
- 238000003847 radiation curing Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 6
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000003995 emulsifying agent Substances 0.000 description 6
- 229920001519 homopolymer Polymers 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000003973 paint Substances 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 6
- XFTALRAZSCGSKN-UHFFFAOYSA-M sodium;4-ethenylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C(C=C)C=C1 XFTALRAZSCGSKN-UHFFFAOYSA-M 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 150000007514 bases Chemical class 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229930192474 thiophene Natural products 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 3
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 3
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 3
- SMNDYUVBFMFKNZ-UHFFFAOYSA-N 2-furoic acid Chemical compound OC(=O)C1=CC=CO1 SMNDYUVBFMFKNZ-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001940 conductive polymer Polymers 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920000767 polyaniline Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000128 polypyrrole Polymers 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229940014800 succinic anhydride Drugs 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 2
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 2
- RBIGKSZIQCTIJF-UHFFFAOYSA-N 3-formylthiophene Chemical compound O=CC=1C=CSC=1 RBIGKSZIQCTIJF-UHFFFAOYSA-N 0.000 description 2
- IHCCAYCGZOLTEU-UHFFFAOYSA-N 3-furoic acid Chemical compound OC(=O)C=1C=COC=1 IHCCAYCGZOLTEU-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000005360 alkyl sulfoxide group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- MMCPOSDMTGQNKG-UJZMCJRSSA-N aniline;hydrochloride Chemical compound Cl.N[14C]1=[14CH][14CH]=[14CH][14CH]=[14CH]1 MMCPOSDMTGQNKG-UJZMCJRSSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- NAPSCFZYZVSQHF-UHFFFAOYSA-N dimantine Chemical compound CCCCCCCCCCCCCCCCCCN(C)C NAPSCFZYZVSQHF-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000009503 electrostatic coating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- NCBZRJODKRCREW-UHFFFAOYSA-N m-anisidine Chemical compound COC1=CC=CC(N)=C1 NCBZRJODKRCREW-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- VMPITZXILSNTON-UHFFFAOYSA-N o-anisidine Chemical compound COC1=CC=CC=C1N VMPITZXILSNTON-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- NEXZVOLIDKSFBH-UHFFFAOYSA-N (1,1-diphenyl-2-phosphonooxyethyl) 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C(COP(O)(O)=O)(OC(=O)C(=C)C)C1=CC=CC=C1 NEXZVOLIDKSFBH-UHFFFAOYSA-N 0.000 description 1
- YRIOTLGRXFJRTJ-UHFFFAOYSA-N (1,1-diphenyl-2-phosphonooxyethyl) prop-2-enoate Chemical compound C=1C=CC=CC=1C(OC(=O)C=C)(COP(O)(=O)O)C1=CC=CC=C1 YRIOTLGRXFJRTJ-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-ZXZARUISSA-N (3s)-3-[(3r)-2,5-dioxooxolan-3-yl]oxolane-2,5-dione Chemical compound O=C1OC(=O)C[C@H]1[C@@H]1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-ZXZARUISSA-N 0.000 description 1
- NRQHBNNTBIDSRK-YRNVUSSQSA-N (4e)-4-[(4-methoxyphenyl)methylidene]-2-methyl-1,3-oxazol-5-one Chemical compound C1=CC(OC)=CC=C1\C=C\1C(=O)OC(C)=N/1 NRQHBNNTBIDSRK-YRNVUSSQSA-N 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- 229940035437 1,3-propanediol Drugs 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- 229940114072 12-hydroxystearic acid Drugs 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- URQQDYIVGXOEDA-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethyl prop-2-enoate Chemical compound C=COCCOCCOC(=O)C=C URQQDYIVGXOEDA-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PRAMZQXXPOLCIY-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethanesulfonic acid Chemical compound CC(=C)C(=O)OCCS(O)(=O)=O PRAMZQXXPOLCIY-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- CMWUSCNTMPWOKZ-UHFFFAOYSA-N 2-(methylamino)propan-2-ol Chemical compound CNC(C)(C)O CMWUSCNTMPWOKZ-UHFFFAOYSA-N 0.000 description 1
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- IZFHMLDRUVYBGK-UHFFFAOYSA-N 2-methylene-3-methylsuccinic acid Chemical compound OC(=O)C(C)C(=C)C(O)=O IZFHMLDRUVYBGK-UHFFFAOYSA-N 0.000 description 1
- XEEYSDHEOQHCDA-UHFFFAOYSA-N 2-methylprop-2-ene-1-sulfonic acid Chemical compound CC(=C)CS(O)(=O)=O XEEYSDHEOQHCDA-UHFFFAOYSA-N 0.000 description 1
- GWZCLMWEJWPFFA-UHFFFAOYSA-N 2-thiophen-3-ylacetonitrile Chemical compound N#CCC=1C=CSC=1 GWZCLMWEJWPFFA-UHFFFAOYSA-N 0.000 description 1
- KEYWOCXIPDAGCS-UHFFFAOYSA-N 2-thiophen-3-ylacetyl chloride Chemical compound ClC(=O)CC=1C=CSC=1 KEYWOCXIPDAGCS-UHFFFAOYSA-N 0.000 description 1
- YYPNNBPPDFTQFX-UHFFFAOYSA-N 2-thiophen-3-ylethanol Chemical compound OCCC=1C=CSC=1 YYPNNBPPDFTQFX-UHFFFAOYSA-N 0.000 description 1
- GCOOGCQWQFRJEK-UHFFFAOYSA-N 2-thiophen-3-ylpropanedioic acid Chemical compound OC(=O)C(C(O)=O)C=1C=CSC=1 GCOOGCQWQFRJEK-UHFFFAOYSA-N 0.000 description 1
- MFRXQRCKOQUENC-UHFFFAOYSA-N 3,4-diethoxythiophene Chemical compound CCOC1=CSC=C1OCC MFRXQRCKOQUENC-UHFFFAOYSA-N 0.000 description 1
- ZUDCKLVMBAXBIF-UHFFFAOYSA-N 3,4-dimethoxythiophene Chemical compound COC1=CSC=C1OC ZUDCKLVMBAXBIF-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- BOWIFWCBNWWZOG-UHFFFAOYSA-N 3-Thiophenemethanol Chemical compound OCC=1C=CSC=1 BOWIFWCBNWWZOG-UHFFFAOYSA-N 0.000 description 1
- ZAJAQTYSTDTMCU-UHFFFAOYSA-N 3-aminobenzenesulfonic acid Chemical compound NC1=CC=CC(S(O)(=O)=O)=C1 ZAJAQTYSTDTMCU-UHFFFAOYSA-N 0.000 description 1
- KPOCSQCZXMATFR-UHFFFAOYSA-N 3-butylthiophene Chemical compound CCCCC=1C=CSC=1 KPOCSQCZXMATFR-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- KRDGZVRRJJYVMU-UHFFFAOYSA-N 3-docosylthiophene Chemical compound CCCCCCCCCCCCCCCCCCCCCCC=1C=CSC=1 KRDGZVRRJJYVMU-UHFFFAOYSA-N 0.000 description 1
- RFKWIEFTBMACPZ-UHFFFAOYSA-N 3-dodecylthiophene Chemical compound CCCCCCCCCCCCC=1C=CSC=1 RFKWIEFTBMACPZ-UHFFFAOYSA-N 0.000 description 1
- JEDHEMYZURJGRQ-UHFFFAOYSA-N 3-hexylthiophene Chemical compound CCCCCCC=1C=CSC=1 JEDHEMYZURJGRQ-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- WQYWXQCOYRZFAV-UHFFFAOYSA-N 3-octylthiophene Chemical compound CCCCCCCCC=1C=CSC=1 WQYWXQCOYRZFAV-UHFFFAOYSA-N 0.000 description 1
- SSMDYRHBKZVGNR-UHFFFAOYSA-N 3-propan-2-ylpyrrole-2,5-dione Chemical compound CC(C)C1=CC(=O)NC1=O SSMDYRHBKZVGNR-UHFFFAOYSA-N 0.000 description 1
- IEEGFBHLLWBJJH-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butane-1-sulfonic acid Chemical compound CC(=C)C(=O)OCCCCS(O)(=O)=O IEEGFBHLLWBJJH-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- ARSRBNBHOADGJU-UHFFFAOYSA-N 7,12-dimethyltetraphene Chemical compound C1=CC2=CC=CC=C2C2=C1C(C)=C(C=CC=C1)C1=C2C ARSRBNBHOADGJU-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- GUBGYTABKSRVRQ-XLOQQCSPSA-N Alpha-Lactose Chemical compound O[C@@H]1[C@@H](O)[C@@H](O)[C@@H](CO)O[C@H]1O[C@@H]1[C@@H](CO)O[C@H](O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-XLOQQCSPSA-N 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- VFZRZRDOXPRTSC-UHFFFAOYSA-N DMBA Natural products COC1=CC(OC)=CC(C=O)=C1 VFZRZRDOXPRTSC-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229930091371 Fructose Natural products 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- 239000005715 Fructose Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- GUBGYTABKSRVRQ-QKKXKWKRSA-N Lactose Natural products OC[C@H]1O[C@@H](O[C@H]2[C@H](O)[C@@H](O)C(O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@H]1O GUBGYTABKSRVRQ-QKKXKWKRSA-N 0.000 description 1
- 229930195725 Mannitol Natural products 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004909 Moisturizer Substances 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WPPOGHDFAVQKLN-UHFFFAOYSA-N N-Octyl-2-pyrrolidone Chemical compound CCCCCCCCN1CCCC1=O WPPOGHDFAVQKLN-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- TVXBFESIOXBWNM-UHFFFAOYSA-N Xylitol Natural products OCCC(O)C(O)C(O)CCO TVXBFESIOXBWNM-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- HIVQCJOGAHNXBO-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] propanoate Chemical compound CCC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C HIVQCJOGAHNXBO-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- MMCPOSDMTGQNKG-UHFFFAOYSA-N anilinium chloride Chemical compound Cl.NC1=CC=CC=C1 MMCPOSDMTGQNKG-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 150000001719 carbohydrate derivatives Chemical class 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- FJBFPHVGVWTDIP-UHFFFAOYSA-N dibromomethane Chemical compound BrCBr FJBFPHVGVWTDIP-UHFFFAOYSA-N 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 229950010007 dimantine Drugs 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- QYUDDCLXBAJUNA-UHFFFAOYSA-L disodium;2-aminobenzene-1,4-disulfonate Chemical compound [Na+].[Na+].NC1=CC(S([O-])(=O)=O)=CC=C1S([O-])(=O)=O QYUDDCLXBAJUNA-UHFFFAOYSA-L 0.000 description 1
- 239000004664 distearyldimethylammonium chloride (DHTDMAC) Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 238000001227 electron beam curing Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002169 ethanolamines Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 239000008101 lactose Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000594 mannitol Substances 0.000 description 1
- 235000010355 mannitol Nutrition 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- HEBKCHPVOIAQTA-UHFFFAOYSA-N meso ribitol Natural products OCC(O)C(O)C(O)CO HEBKCHPVOIAQTA-UHFFFAOYSA-N 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 230000001333 moisturizer Effects 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- SEGJNMCIMOLEDM-UHFFFAOYSA-N n-methyloctan-1-amine Chemical compound CCCCCCCCNC SEGJNMCIMOLEDM-UHFFFAOYSA-N 0.000 description 1
- HKUFIYBZNQSHQS-UHFFFAOYSA-N n-octadecyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC HKUFIYBZNQSHQS-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920001088 polycarbazole Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920000414 polyfuran Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 235000010356 sorbitol Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- YODZTKMDCQEPHD-UHFFFAOYSA-N thiodiglycol Chemical compound OCCSCCO YODZTKMDCQEPHD-UHFFFAOYSA-N 0.000 description 1
- 229950006389 thiodiglycol Drugs 0.000 description 1
- DAUYIKBTMNZABP-UHFFFAOYSA-N thiophene-3-carboxamide Chemical compound NC(=O)C=1C=CSC=1 DAUYIKBTMNZABP-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000000811 xylitol Substances 0.000 description 1
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 description 1
- 235000010447 xylitol Nutrition 0.000 description 1
- 229960002675 xylitol Drugs 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
本発明は、導電性に優れ透明性の高い均一塗膜の形成が可能である導電性組成物に関し、さらに詳しくは、環境に対して負荷のかかるハロゲン系溶剤を使用することなく、工業的に汎用な水溶性の低い溶剤中でも安定に溶解または分散が可能な導電性組成物に関する。 The present invention relates to a conductive composition that is capable of forming a uniform coating film having excellent conductivity and high transparency, and more specifically, industrially without using a halogen-based solvent that is burdensome to the environment. The present invention relates to a conductive composition that can be stably dissolved or dispersed even in a general-purpose solvent with low water solubility.
電子工学製品および光学製品の様々な性能が、導電性を有するπ共役高分子化合物を含有させることによって高められるという認識が高まっている。そのような物の例には、EMIシールド、電池電極材料、キャパシター、エレクトロクロミック素子、高分子有機EL材料、帯電防止剤、帯電防止塗料、帯電防止光学コート剤、帯電防止粘接着剤、帯電防止繊維、防食塗料、導電性塗料、導電性インキなどが挙げられる。
電子工学製品および光学製品は極めて高い耐水性や平滑性などを要求されるため、汎用有機溶剤系での検討が続けられると予想されるが、π共役高分子化合物の多くが汎用有機溶剤系コーティング剤に対して十分に溶解または分散することができないために、安定性、導電性、透明性が不十分である。さらに、加工条件が非常に制限されるなどの問題を抱えている。
There is a growing recognition that the various performances of electronic and optical products are enhanced by the inclusion of conductive π-conjugated polymer compounds. Examples of such materials include EMI shields, battery electrode materials, capacitors, electrochromic elements, polymeric organic EL materials, antistatic agents, antistatic paints, antistatic optical coating agents, antistatic adhesives, charging Examples thereof include prevention fibers, anticorrosion paints, conductive paints, and conductive inks.
Since electronic products and optical products are required to have extremely high water resistance and smoothness, it is expected that studies with general-purpose organic solvent systems will continue, but most of π-conjugated polymer compounds are general-purpose organic solvent-based coatings. Since it cannot be sufficiently dissolved or dispersed in the agent, the stability, conductivity and transparency are insufficient. Furthermore, there are problems such as extremely limited processing conditions.
例えば、特許文献1に開示されるスルホン酸基および/またはカルボキシ基を有する水溶性アニリン系導電性ポリマーを主成分とする静電塗装用導電性プライマー組成物、および該組成物を用いた静電塗装方法は、簡便な方法で塗工可能であり、導電性に優れ、静電塗装効果の点でも優れている。しかしながら該発明で用いられている導電性ポリマーは水溶性であるため、帯電防止膜として十分な耐水性を有しておらず、上塗りとして水系のベースコートを用いた場合には導電性ポリマーの色がベースコートに混ざってしまい、また汎用有機溶剤系コーティング剤中に配合した場合は、溶解または十分な分散性を得ることができないという問題点を有している。 For example, a conductive primer composition for electrostatic coating mainly composed of a water-soluble aniline-based conductive polymer having a sulfonic acid group and / or a carboxy group disclosed in Patent Document 1, and electrostatic using the composition The coating method can be applied by a simple method, has excellent conductivity, and is excellent in terms of electrostatic coating effect. However, since the conductive polymer used in the present invention is water-soluble, it does not have sufficient water resistance as an antistatic film, and when a water-based base coat is used as an overcoat, the color of the conductive polymer is When mixed with a base coat and blended in a general-purpose organic solvent-based coating agent, there is a problem that dissolution or sufficient dispersibility cannot be obtained.
また、特許文献2や特許文献3では、良好な導電性、透明度、安定性、加水分解抵抗性および加工特性を有する導電性組成物、およびその製造方法が報告されている。ただし、該組成物は、水または低級アルコール等の水と任意の割合で混和する溶剤中で製造されており、酢酸エチル、メチルエチルケトン(MEK)、メチルイソブチルケトン(MIBK)、トルエン、シクロへキサノンなどの、工業的に汎用な溶剤を用いて製造することができず、従って、汎用な溶剤型コーティング剤への適用が困難であった。 Patent Document 2 and Patent Document 3 report a conductive composition having good conductivity, transparency, stability, hydrolysis resistance, and processing characteristics, and a method for producing the same. However, the composition is manufactured in a solvent miscible with water or water such as lower alcohol at an arbitrary ratio, such as ethyl acetate, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), toluene, cyclohexanone, etc. However, it could not be produced using industrially general-purpose solvents, and therefore, it was difficult to apply to general-purpose solvent-type coating agents.
さらに、特許文献4に開示されるチオフェン混合物中の水を置換する溶媒交換法では、チオフェンとしてBaytronTM製剤を用いて水の一部または全てを少なくとも一つの他の溶媒で効率よく置換する方法を提供している。しかしながら、水以外の溶媒として低アルキルアセトアミド、ジオールおよびトリオールを含む低級アルコール、ピロリドン、低アルキルピロリドン、高アルキルピロリドン、低アルキルスルホキシドおよびそれらの混合物や、好ましい低級アルコールとしてグリコールまたはグリセリンを挙げ、適した低アルキルスルホキシドにはジメチルスルホキシド(DMSO)が含まれ、特に好ましい溶媒としてN,N−ジメチルアセトアミド(DMAC)およびN−メチルピロリドン(NMP)が含まれており、さらにアセトニトリル、ベンゾニトリル、メチルアセテート、ジクロロメタン、ジエチルエーテル、ジメトキシエタン、N,N−ジメチルホルムアミド、ニトロベンゼン、ニトロメタン、プロピオニトリルおよびプロピレン炭酸塩、ジクロロメタンとジブロモメタンなどが挙げられている。これらは、親水性が強く、汎用な溶剤型コーティング剤への適用が困難な溶剤、または、乾燥工程で環境に対して負荷のかかるハロゲン系溶剤であり、工業的に汎用な溶剤ではない。すなわち、特許文献4では、チオフェン混合物を酢酸エチル、メチルエチルケトン(MEK)、メチルイソブチルケトン(MIBK)、トルエン、シクロへキサノンなどの、水溶性が低く、工業的に汎用な溶剤中に安定に溶解または分散されているものは開示されていない。 Furthermore, the solvent exchange method for replacing water in a thiophene mixture disclosed in Patent Document 4 provides a method for efficiently replacing part or all of water with at least one other solvent using a Baytron ™ formulation as thiophene. doing. However, low alcohol acetamide, diol and triol-containing lower alcohols, pyrrolidone, low alkyl pyrrolidone, high alkyl pyrrolidone, low alkyl sulfoxide and mixtures thereof as solvents other than water, and preferred lower alcohols include glycols or glycerin. Low alkyl sulfoxides include dimethyl sulfoxide (DMSO), particularly preferred solvents include N, N-dimethylacetamide (DMAC) and N-methylpyrrolidone (NMP), and acetonitrile, benzonitrile, methyl acetate, Dichloromethane, diethyl ether, dimethoxyethane, N, N-dimethylformamide, nitrobenzene, nitromethane, propionitrile and propylene carbonate, dichloro Such Rometan and dibromomethane are mentioned. These are solvents that are highly hydrophilic and difficult to be applied to general-purpose solvent-type coating agents, or are halogen-based solvents that are burdensome to the environment in the drying process, and are not industrially general-purpose solvents. That is, in Patent Document 4, the thiophene mixture is stably dissolved in an industrially general solvent having low water solubility such as ethyl acetate, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), toluene, cyclohexanone, or the like. What is distributed is not disclosed.
また、特許文献2〜5では、ポリスチレンスルホン酸によってドープされたポリ(3,4−エチレンジオキシチオフェン)を用いて、塗膜に導電性を付与しながら、π共役高分子化合物の量を少量に抑える検討の例が記載されている。しかしながら、これらの中で、最も少量である例であっても、塗膜中の15重量%を占めており、塗膜の他の性能を保持するためには、より少量で導電性を発現する必要がある。
本発明は、環境に対して負荷のかかるハロゲン系溶剤を使用することなく、工業的に汎用であり、水溶性の低い溶剤中でも安定に溶解または分散が可能な導電性組成物の提供を目的とする。さらに、均一塗膜の形成が可能であり、形成された塗膜中において、導電性成分が局在化することを利用し、極めて少量の導電性成分の配合により優れた導電性を発現し、塗膜に求められる導電性以外の物性にも優れた導電膜の形成が可能な導電性組成物の提供を目的とする。 An object of the present invention is to provide a conductive composition that is industrially versatile and can be stably dissolved or dispersed even in a low water-soluble solvent without using a halogen-based solvent that is burdensome to the environment. To do. Furthermore, it is possible to form a uniform coating film, and in the formed coating film, utilizing the localization of the conductive component, expresses excellent conductivity by blending a very small amount of the conductive component, It is an object of the present invention to provide a conductive composition capable of forming a conductive film having excellent physical properties other than the conductivity required for a coating film.
本発明者らは、上記問題を解決するため、鋭意検討した結果、本発明に達した。即ち、第1の発明は、ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)と、塩基性有機化合物(A−3)とのイオン対であり、有機溶剤中で溶解または分散可能である導電性材料(A)と、酸無水物(B)とを含んでなる導電性組成物に関する。
また、第2の発明は、さらに導電助剤(D)を含むことを特徴とする第1の発明の導電性組成物に関する。
また、第3の発明は、第1の発明または第2の発明の導電性組成物から形成されてなる導電膜に関する。
また、第4の発明は、基材と第3の発明の導電膜とを有する積層体に関する。
The inventors of the present invention have arrived at the present invention as a result of intensive studies to solve the above problems. That is, the first invention is an ion pair of a π-conjugated polymer compound (A-2) doped with a polyanion (A-1) and a basic organic compound (A-3), in an organic solvent. The present invention relates to a conductive composition comprising a conductive material (A) that can be dissolved or dispersed and an acid anhydride (B).
Moreover, 2nd invention is related with the electrically conductive composition of 1st invention characterized by including a conductive support agent (D) further.
Moreover, 3rd invention is related with the electrically conductive film formed from the electrically conductive composition of 1st invention or 2nd invention.
Moreover, 4th invention is related with the laminated body which has a base material and the electrically conductive film of 3rd invention.
本発明により、環境に対して負荷のかかるハロゲン系溶剤を使用することなく、工業的に汎用であり、水溶性の低い溶剤中でも安定に溶解または分散が可能な導電性組成物を提供できた。本発明の導電性組成物は、均一塗膜の形成が可能であり、導電性成分の配合量が極めて少量であるにも関わらず導電性に優れ、その他の物性にも優れる塗膜が形成可能である。 According to the present invention, it is possible to provide a conductive composition that is industrially versatile and can be stably dissolved or dispersed even in a low water-soluble solvent without using a halogen-based solvent that is burdensome to the environment. The conductive composition of the present invention is capable of forming a uniform coating film, and can form a coating film that is excellent in conductivity and excellent in other physical properties even though the blending amount of the conductive component is very small. It is.
本発明の導電性組成物に含まれる各成分について、以下に説明する。
<ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)と、塩基性有機化合物(A−3)とのイオン対であり、有機溶剤中で溶解または分散可能である導電性材料(A)>
まず、本発明に用いるポリアニオン(A−1)について説明する。ポリアニオン(A−1)は、酸基含有単量体を単独で重合したホモポリマー、または酸基含有単量体を含む単量体を重合した共重合体である。ポリアニオン(A−1)を構成する酸基含有単量体としては、例えば、スルホン酸基、リン酸基、カルボキシ基、またはそれらと塩基性化合物とからなる塩形成基などの官能基を含有する単量体であれば、特に限定されないが、スルホン酸基、リン酸基などの強酸基を含有するものが好ましく使用できる。
スルホン酸基を含有する単量体としては、例えば、スチレンスルホン酸、アリルオキシベンゼンスルホン酸、メタリルオキシベンゼンスルホン酸、ビニルスルホン酸、アリルスルホン酸、メタリルスルホン酸、4−スルフォニックアシドブチルメタクリレート、イソプレンスルホン酸、スルホブチルメタクリレート、2−アクリルアミド−2−メチルプロパンスルホン酸、スルホエチルメタクリレートなどが挙げられる。これらの単量体は、単独で、または2種以上を組み合わせて用いることができ、アンモニア、トリエチルアミン、水酸化ナトリウムなどの塩基性化合物で中和した塩形成基の状態で使用することもできる。
Each component contained in the conductive composition of the present invention will be described below.
<Ion pair of π-conjugated polymer compound (A-2) doped with polyanion (A-1) and basic organic compound (A-3), which can be dissolved or dispersed in an organic solvent Material (A)>
First, the polyanion (A-1) used for this invention is demonstrated. The polyanion (A-1) is a homopolymer obtained by polymerizing an acid group-containing monomer alone, or a copolymer obtained by polymerizing a monomer containing an acid group-containing monomer. The acid group-containing monomer constituting the polyanion (A-1) contains, for example, a functional group such as a sulfonic acid group, a phosphoric acid group, a carboxy group, or a salt-forming group composed of these and a basic compound. Although it will not specifically limit if it is a monomer, What contains strong acid groups, such as a sulfonic acid group and a phosphoric acid group, can be used preferably.
Examples of the monomer containing a sulfonic acid group include styrene sulfonic acid, allyloxybenzene sulfonic acid, methallyloxybenzene sulfonic acid, vinyl sulfonic acid, allyl sulfonic acid, methallyl sulfonic acid, and 4-sulfonic acid butyl. Examples include methacrylate, isoprene sulfonic acid, sulfobutyl methacrylate, 2-acrylamido-2-methylpropane sulfonic acid, sulfoethyl methacrylate, and the like. These monomers can be used alone or in combination of two or more, and can also be used in the form of a salt-forming group neutralized with a basic compound such as ammonia, triethylamine, sodium hydroxide or the like.
また、ポリアニオン(A−1)としては、ビニル系樹脂、ポリウレタン、ポリエステルなどの樹脂に、硫酸、発煙硫酸、スルファミン酸、亜硫酸水素ナトリウム等のスルホン化剤を反応させて得ることができるスルホン酸基を有する樹脂であってもよい。
リン酸基を含有する単量体としては、例えば、3−クロロ−2−アシッドホスホキシプロピル(メタ)アクリレート、アシッドホスホキシポリオキシエチレングリコールモノ(メタ)アクリレート、モノ(2−ヒドロキシエチルアクリレート)アシッドホスフェート、モノ(2−ヒドロキシエチルメタクリレート)アシッドホスフェート、モノ(2−ヒドロキシプロピルアクリレート)アシッドホスフェート、モノ(2−ヒドロキシプロピルメタクリレート)アシッドホスフェート、モノ(3−ヒドロキシプロピルアクリレート)アシッドホスフェート、モノ(3−ヒドロキシプロピルメタクリレート)アシッドホスフェート、ジフェニル−2−アクリロイルオキシエチルホスフェート、ジフェニル−2−メタクリロイルオキシエチルホスフェートなどが挙げられる。これらの単量体は、単独で、または2種以上を組み合わせて用いることができ、アンモニア、トリエチルアミン、水酸化ナトリウムなどの塩基性化合物で中和した塩形成基の状態で使用することもできる。
The polyanion (A-1) is a sulfonic acid group that can be obtained by reacting a resin such as vinyl resin, polyurethane, or polyester with a sulfonating agent such as sulfuric acid, fuming sulfuric acid, sulfamic acid, or sodium bisulfite. It may be a resin having
Examples of the monomer containing a phosphoric acid group include 3-chloro-2-acid phosphoxypropyl (meth) acrylate, acid phosphooxypolyoxyethylene glycol mono (meth) acrylate, and mono (2-hydroxyethyl acrylate). Acid phosphate, mono (2-hydroxyethyl methacrylate) acid phosphate, mono (2-hydroxypropyl acrylate) acid phosphate, mono (2-hydroxypropyl methacrylate) acid phosphate, mono (3-hydroxypropyl acrylate) acid phosphate, mono (3 -Hydroxypropyl methacrylate) acid phosphate, diphenyl-2-acryloyloxyethyl phosphate, diphenyl-2-methacryloyloxyethyl phosphate Such as over doors and the like. These monomers can be used alone or in combination of two or more, and can also be used in the form of a salt-forming group neutralized with a basic compound such as ammonia, triethylamine, sodium hydroxide or the like.
カルボキシ基を含有する単量体としては、例えば、アクリル酸、メタクリル酸、クロトン酸等のエチレン性不飽和モノカルボン酸;
マレイン酸、フマル酸、イタコン酸等のエチレン性不飽和多価カルボン酸およびそれらの酸無水物;
マレイン酸メチル、イタコン酸メチル等のエチレン性不飽和多価カルボン酸の部分エステル化物;等を挙げることができる。これらの単量体は、単独で、または2種以上を組み合わせて用いることができ、アンモニア、トリエチルアミン、水酸化ナトリウムなどの塩基性化合物で中和した塩形成基の状態で使用することもできる。
Examples of the monomer containing a carboxy group include ethylenically unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid;
Ethylenically unsaturated polyvalent carboxylic acids such as maleic acid, fumaric acid, itaconic acid and their anhydrides;
Examples thereof include partially esterified products of ethylenically unsaturated polyvalent carboxylic acids such as methyl maleate and methyl itaconate. These monomers can be used alone or in combination of two or more, and can also be used in the form of a salt-forming group neutralized with a basic compound such as ammonia, triethylamine, sodium hydroxide or the like.
ポリアニオン(A−1)は、前記酸基含有単量体と、それ以外の単量体との共重合体であってもよい。酸基含有単量体と共重合可能な他の単量体としては、公知の化合物を何等制限なく使用することができる。例えば、1,3−ブタジエン、イソプレン、2−クロロ−1,3−ブタジエン、2−メチル−1,3−ブタジエン等の共役ジエン単量体;
スチレン、α−メチルスチレン、p−メチルスチレン等の芳香族ビニル単量体;
(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸2−エチルヘキシル等のエチレン性不飽和カルボン酸アルキルエステル単量体;
アクリルアミド、メタクリルアミド、N,N−ジメチルアクリルアミド、N−メチロールアクリルアミド等のエチレン性不飽和カルボン酸アミド単量体;
(メタ)アクリル酸ヒドロキシアルキル、グリセリンジ(メタ)アクリレート等のエチレン性不飽和カルボン酸ヒドロキシアルキルエステル単量体;
酢酸ビニル等のカルボン酸ビニルエステル単量体;
および、(メタ)アクリロニトリル、N−ビニルピロリドン、(メタ)アクリロイルモルホリン、シクロヘキシルマレイミド、イソプロピルマレイミド、(メタ)アクリル酸グリシジル等が挙げられる。これらは単独で、あるいは2種以上を組み合わせて用いることができる。
The polyanion (A-1) may be a copolymer of the acid group-containing monomer and other monomers. As other monomers copolymerizable with the acid group-containing monomer, known compounds can be used without any limitation. For example, conjugated diene monomers such as 1,3-butadiene, isoprene, 2-chloro-1,3-butadiene, 2-methyl-1,3-butadiene;
Aromatic vinyl monomers such as styrene, α-methylstyrene, p-methylstyrene;
Ethylenically unsaturated carboxylic acid alkyl ester monomers such as methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate;
Ethylenically unsaturated carboxylic acid amide monomers such as acrylamide, methacrylamide, N, N-dimethylacrylamide, N-methylolacrylamide;
Ethylenically unsaturated carboxylic acid hydroxyalkyl ester monomers such as hydroxyalkyl (meth) acrylate and glycerin di (meth) acrylate;
Carboxylic acid vinyl ester monomers such as vinyl acetate;
And (meth) acrylonitrile, N-vinylpyrrolidone, (meth) acryloylmorpholine, cyclohexylmaleimide, isopropylmaleimide, glycidyl (meth) acrylate, and the like. These can be used alone or in combination of two or more.
ポリアニオン(A−1)は、上記単量体を、重合開始剤を用いてラジカル重合することで得ることができる。
さらに、本発明に用いるポリアニオン(A−1)は、エポキシ樹脂の末端エポキシ基の少なくとも一部を、リン含有酸でエステル化することにより得られる水溶性リン酸エステル化物であってもよい。
The polyanion (A-1) can be obtained by radical polymerization of the above monomer using a polymerization initiator.
Furthermore, the polyanion (A-1) used in the present invention may be a water-soluble phosphate ester obtained by esterifying at least a part of the terminal epoxy group of the epoxy resin with a phosphorus-containing acid.
ポリアニオン(A−1)の重量平均分子量は、好ましくは1,000〜2,000,000の範囲、より好ましくは2,000〜500,000の範囲である。
次に、π共役高分子化合物(A−2)について説明する。π共役高分子化合物(A−2)とは、単結合と二重結合が交互に結合した高分子化合物である。その具体例としては、例えば、ポリアセチレン、ポリチオフェン、ポリピロール、ポリアニリン、ポリフェニレン、ポリフェニレンビニレン、ポリナフタレン、ポリイソチアナフテン、ポリフラン、ポリセレノフェン、ポリフルオレン、ポリカルバゾール、およびこれらの誘導体が挙げられる。
The weight average molecular weight of the polyanion (A-1) is preferably in the range of 1,000 to 2,000,000, more preferably in the range of 2,000 to 500,000.
Next, the π-conjugated polymer compound (A-2) will be described. The π-conjugated polymer compound (A-2) is a polymer compound in which single bonds and double bonds are alternately bonded. Specific examples thereof include polyacetylene, polythiophene, polypyrrole, polyaniline, polyphenylene, polyphenylene vinylene, polynaphthalene, polyisothianaphthene, polyfuran, polyselenophene, polyfluorene, polycarbazole, and derivatives thereof.
上記のπ共役高分子化合物(A−2)を得るために用いられる単量体として、好ましくは、アセチレン、チオフェン、3−チオフェンカルボキシアミド、3−チオフェンマロン酸、3−チオフェンメタノール、3−チオフェンエタノール、3,4−ジメトキシチオフェン、3,4−ジエトキシチオフェン、3,4−エチレンジオキシチオフェン、3−チオフェンアルデヒド、3−ヘキシルチオフェン、3−オクチルチオフェン、3−ブチルチオフェン、3−ドデシルチオフェン、3−ドコシルチオフェン、3−チオフェンカルボン酸、3−チオフェンアセトニトリル、3−チオフェンカルボキシアルデヒド、3−チオフェンアセチルクロライド、3−チオフェンホウ酸、3−チオフェンカルボキシルクロライド、3−チオフェンエタンスルフォネート、3−チオフェンブタンスルフォネート、ピロール、アニリン、アニリン−2,5−ジスルホン酸ナトリウム、アミノベンゼンスルホン酸、オルト−アニシジン、メタ−アニシジン、オルト−アニシジン塩酸塩、メタ−アニシジン塩酸塩、カルバゾール、3−(N−カルバゾイル)プロピン等を使用することができる。π共役高分子化合物(A−2)は、これらの単量体から選ばれる1種類のみからなる単独重合体であってもよく、2種類以上からなる共重合体であってもよい。 As the monomer used to obtain the above π-conjugated polymer compound (A-2), preferably acetylene, thiophene, 3-thiophenecarboxamide, 3-thiophenmalonic acid, 3-thiophenmethanol, 3-thiophene Ethanol, 3,4-dimethoxythiophene, 3,4-diethoxythiophene, 3,4-ethylenedioxythiophene, 3-thiophene aldehyde, 3-hexylthiophene, 3-octylthiophene, 3-butylthiophene, 3-dodecylthiophene , 3-docosylthiophene, 3-thiophenecarboxylic acid, 3-thiopheneacetonitrile, 3-thiophenecarboxaldehyde, 3-thiopheneacetyl chloride, 3-thiopheneboric acid, 3-thiophenecarboxyl chloride, 3-thiopheneethanesulfur , 3-thiophene butane sulfonate, pyrrole, aniline, sodium aniline-2,5-disulfonate, aminobenzene sulfonic acid, ortho-anisidine, meta-anisidine, ortho-anisidine hydrochloride, meta-anisidine hydrochloride, carbazole , 3- (N-carbazoyl) propyne and the like can be used. The π-conjugated polymer compound (A-2) may be a homopolymer composed of only one kind selected from these monomers, or may be a copolymer composed of two or more kinds.
π共役高分子化合物(A−2)は、上記の単量体を酸化剤および/または酸素もしくは空気を用い、溶剤中で−20〜100℃の温度で酸化重合することで得ることができる。特に、ポリアニオン(A−1)の存在下、水もしくは水性媒体中で酸化重合を行うことで、ポリアニオン(A−1)によりドープされたπ共役高分子化合物(A−2)を1段階で得ることができるため、より好ましい。前記酸化重合を行うにあたっては、単量体1モルに対してポリアニオン(A−1)中の酸基、および酸基と塩基性化合物とからなる塩形成基の合計が1〜80モルであることが好ましく、さらに2〜40モルであることがより好ましい。1モル未満であるとポリアニオン(A−1)とπ共役高分子化合物(A−2)が水もしくは水性溶媒中に溶解または分散することができない場合がある。80モルを超えると、相対的にπ共役高分子化合物(A−2)の量が少なくなり、導電性が発現できない場合がある。 The π-conjugated polymer compound (A-2) can be obtained by oxidative polymerization of the above monomer at a temperature of -20 to 100 ° C. in a solvent using an oxidizing agent and / or oxygen or air. In particular, by performing oxidative polymerization in water or an aqueous medium in the presence of the polyanion (A-1), the π-conjugated polymer compound (A-2) doped with the polyanion (A-1) is obtained in one step. More preferable. In performing the oxidative polymerization, the total of the acid group in the polyanion (A-1) and the salt-forming group composed of the acid group and the basic compound is 1 to 80 mol with respect to 1 mol of the monomer. Is more preferable, and it is more preferable that it is 2-40 mol. If it is less than 1 mol, the polyanion (A-1) and the π-conjugated polymer compound (A-2) may not be dissolved or dispersed in water or an aqueous solvent. When it exceeds 80 mol, the amount of the π-conjugated polymer compound (A-2) is relatively small, and the conductivity may not be exhibited.
本発明による導電性組成物において、極めて高い透過度と導電性が必要とされる場合は、ポリアニオン(A−1)としてスチレンスルホン酸の単独重合体または他の単量体との共重合体、π共役高分子化合物(A−2)として3,4−エチレンジオキシチオフェンの単独重合体または他の単量体との共重合体をそれぞれ用いることが好ましい。
次に、塩基性有機化合物(A−3)について説明する。ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)は、通常ポリアニオン(A−1)が過剰に含まれており、水または極性の高い有機溶剤にしか溶解または分散しない。塩基性有機化合物(A−3)を添加することで、この過剰の酸基をキャップし、イオン対である導電性材料(A)が形成され、より極性の低い有機溶剤に溶解または分散できる。
In the conductive composition according to the present invention, when extremely high permeability and conductivity are required, a homopolymer of styrene sulfonic acid or a copolymer with another monomer as the polyanion (A-1), It is preferable to use a 3,4-ethylenedioxythiophene homopolymer or a copolymer with another monomer as the π-conjugated polymer compound (A-2).
Next, the basic organic compound (A-3) will be described. The π-conjugated polymer compound (A-2) doped with the polyanion (A-1) usually contains an excess of the polyanion (A-1) and is dissolved or dispersed only in water or a highly polar organic solvent. . By adding the basic organic compound (A-3), this excess acid group is capped, and the conductive material (A) which is an ion pair is formed, which can be dissolved or dispersed in a less polar organic solvent.
塩基性有機化合物(A−3)としては、公知のアミン化合物(A−3a)、カチオン性乳化剤(A−3b)、もしくは塩基性樹脂(A−3c)などが使用できる。
本発明で用いるアミン化合物(A−3a)としては、例えば、N−メチルオクチルアミン、メチルベンジルアミン、N−メチルアニリン、ジメチルアミン、ジエチルアミン、ジエタノールアミン、N−メチルエタノールアミン、ジ−n−プロピルアミン、ジイソプロピルアミン、メチル−イソプロパノールアミン、ジブチルアミン、ジ−2−エチルヘキシルアミン、アミノエチルエタノールアミン、3−アミノ−1−プロパノール、イソプロピルアミン、モノエチルアミン、2−エチルヘキシルアミン、t−ブチルアミン、N−(2−アミノエチル)−3−アミノプロピルメチルジメトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリメトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、N−フェニル−3−アミノプロピルトリメトキシシラン等が挙げられる。
As the basic organic compound (A-3), a known amine compound (A-3a), a cationic emulsifier (A-3b), a basic resin (A-3c), or the like can be used.
Examples of the amine compound (A-3a) used in the present invention include N-methyloctylamine, methylbenzylamine, N-methylaniline, dimethylamine, diethylamine, diethanolamine, N-methylethanolamine, and di-n-propylamine. , Diisopropylamine, methyl-isopropanolamine, dibutylamine, di-2-ethylhexylamine, aminoethylethanolamine, 3-amino-1-propanol, isopropylamine, monoethylamine, 2-ethylhexylamine, t-butylamine, N- ( 2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltriethoxysilane, - aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N- phenyl-3-aminopropyltrimethoxysilane, and the like.
さらに本発明で用いる前記カチオン性乳化剤(A−3b)としては、例えば、モノメチルアミン、モノエチルアミン、ステアリルアミン等の1級アミンの塩酸塩、ジメチルアミン、ジエチルアミン、ジステアリルアミン等の2級アミンの塩酸塩、トリメチルアミン、トリエチルアミン、ステアリルジメチルアミン等の3級アミンの塩酸塩、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等のエタノールアミン類の塩酸塩、エチレンジアミン、ジエチレントリアミン等のポリアミン類の塩酸塩、ステアリルトリメチルアンモニウムクロリド、ジステアリルジメチルアンモニウムクロリド、ステアリルジメチルアンモニウムクロリド等の4級アンモニウム塩等が挙げられ、単独使用または併用することができる。 Furthermore, examples of the cationic emulsifier (A-3b) used in the present invention include primary amine hydrochlorides such as monomethylamine, monoethylamine and stearylamine, and secondary amines such as dimethylamine, diethylamine and distearylamine. Hydrochloride, tertiary amine hydrochloride such as trimethylamine, triethylamine, stearyldimethylamine, hydrochloride of ethanolamines such as monoethanolamine, diethanolamine, triethanolamine, hydrochloride of polyamines such as ethylenediamine, diethylenetriamine, stearyltrimethyl Quaternary ammonium salts such as ammonium chloride, distearyldimethylammonium chloride, stearyldimethylammonium chloride and the like can be mentioned, and these can be used alone or in combination.
アミン化合物(A−3a)およびカチオン性乳化剤(A−3b)の使用量に制限はないが、π共役高分子化合物(A−2)とポリアニオン(A−1)との合計100重量部に対して、1〜100,000重量部、好ましくは10〜10,000重量部の範囲で用いられることが好ましい。
さらに本発明で用いる前記塩基性樹脂(A−3c)の一例としては、下記特許文献6〜9に開示されている、アミノ基(1級、2級、3級、4級塩)を含有するポリエステル系、アクリル系、ウレタン系等の高分子共重合物からなるものを挙げることができる。このような塩基性樹脂(A−3c)の市販品としては、例えば、Solsperse24000(ゼネカ株式会社製)、Disperbyk−160、Disperbyk−161、Disperbyk−162、Disperbyk−163、Disperbyk−170(ビックケミー社製)、アジスパーPB711、アジスパーPB821、アジスパーPB822、アジスパーPB824(味の素株式会社製)等が挙げられ、単独使用または併用することができる。塩基性樹脂(A−3c)の使用量に制限はないが、π共役系高分子化合物(A−2)とポリアニオン(A−1)との合計100重量部に対して、1〜100,000重量部が好ましく、さらには、10〜10,000重量部の範囲で用いられることがより好ましい。
Although there is no restriction | limiting in the usage-amount of an amine compound (A-3a) and a cationic emulsifier (A-3b), with respect to a total of 100 weight part of (pi) conjugated polymer compound (A-2) and a polyanion (A-1). Thus, it is preferably used in the range of 1 to 100,000 parts by weight, preferably 10 to 10,000 parts by weight.
Furthermore, as an example of the basic resin (A-3c) used in the present invention, an amino group (primary, secondary, tertiary, quaternary salt) disclosed in the following Patent Documents 6 to 9 is contained. Examples thereof include polyesters, acrylics, urethanes, and other polymer copolymers. Examples of commercially available products of such basic resins (A-3c) include Solsperse 24000 (manufactured by Zeneca Corporation), Disperbyk-160, Disperbyk-161, Disperbyk-162, Disperbyk-163, Disperbyk-170 (manufactured by Big Chemie). ), Addisper PB711, Addisper PB821, Addisper PB822, Addisper PB824 (manufactured by Ajinomoto Co., Inc.) and the like can be used alone or in combination. Although there is no restriction | limiting in the usage-amount of basic resin (A-3c), it is 1-100,000 with respect to a total of 100 weight part of (pi) conjugated polymer compound (A-2) and a polyanion (A-1). Parts by weight are preferred, and more preferably in the range of 10 to 10,000 parts by weight.
(特許文献6)特開昭61−174939号公報
(特許文献7)特開昭46−7294号公報
(特許文献8)特開平09−169821号公報
(特許文献9)特開昭60−166318号公報
(Patent Document 6) JP-A 61-174939 (Patent Document 7) JP-A 46-7294 (Patent Document 8) JP-A 09-169821 (Patent Document 9) JP 60-166318 Gazette
本発明に用いる塩基性有機化合物(A−3)としては、GPC測定におけるポリスチレン換算の重量平均分子量が、500〜1,000,000であるものが好ましく、1,000〜500,000であるものが特に好ましい。重量平均分子量が、500未満では十分な立体障害効果が得られず、分散効果が低下する場合があり、重量平均分子量が1,000,000より大きくても逆に凝集作用を生じる場合があり、好ましくない。また、化合物(A−3)のアミン価は、5〜200mgKOH/gが好ましく、さらには5〜50mgKOH/gが特に好ましい。アミン価が5mgKOH/g未満では、ポリアニオン(A−1)との相互作用が不十分になり、十分な分散効果が得られない場合がある。また、アミン価が200mgKOH/gより大きい場合は、π共役系高分子化合物(A−2)にドープしたポリアニオン(A−1)への親和部に比べ、立体障害層が小さくなり、分散効果が不十分になる場合がある。上記の理由から塩基性有機化合物(A−3)としては、塩基性樹脂(A−3c)が好ましい。 The basic organic compound (A-3) used in the present invention preferably has a polystyrene-equivalent weight average molecular weight of 500 to 1,000,000 in GPC measurement, and preferably 1,000 to 500,000. Is particularly preferred. When the weight average molecular weight is less than 500, a sufficient steric hindrance effect may not be obtained, and the dispersion effect may be reduced. It is not preferable. The amine value of compound (A-3) is preferably 5 to 200 mgKOH / g, more preferably 5 to 50 mgKOH / g. When the amine value is less than 5 mgKOH / g, the interaction with the polyanion (A-1) becomes insufficient, and a sufficient dispersion effect may not be obtained. In addition, when the amine value is larger than 200 mgKOH / g, the steric hindrance layer is smaller than the affinity part for the polyanion (A-1) doped in the π-conjugated polymer compound (A-2), and the dispersion effect is improved. It may be insufficient. For the above reason, the basic organic compound (A-3) is preferably a basic resin (A-3c).
本発明における導電性材料(A)は、ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)と、塩基性有機化合物(A−3)とのイオン対であり、有機溶剤中で溶解または分散可能であることを特徴とする。そして、導電性材料(A)は、有機溶剤を媒体とする溶液または分散体の態様にて使用に供されることが好ましい。さらには、これを含んでなる本発明の導電性組成物についても同様に、有機溶剤中に溶解または分散された態様にて使用されることが好ましい。 The conductive material (A) in the present invention is an ion pair of a π-conjugated polymer compound (A-2) doped with a polyanion (A-1) and a basic organic compound (A-3), and is organic. It can be dissolved or dispersed in a solvent. The conductive material (A) is preferably used in the form of a solution or dispersion using an organic solvent as a medium. Furthermore, it is preferable that the electroconductive composition of the present invention comprising the same be used in the form of being dissolved or dispersed in an organic solvent.
本発明に用いる有機溶剤は、アルコール類、ケトン類、エステル類、エーテル類、セロソルブ類、芳香族炭化水素類、脂肪族炭化水素類等の種々の液状媒体であり、単独使用または併用することができる。導電性材料(A)を溶解または分散するために用いる有機溶剤としては、水に対する溶解度が有限であり、かつ、乾燥工程のコスト面から沸点が200℃以下であり、環境に対する影響を考慮すると非ハロゲン系の有機溶剤であることが好ましく、具体的には、例えばシクロヘキサノン、メチルエチルケトン、メチルイソブチルケトン、トルエン、酢酸エチル、酢酸ブチル、キシレン、プロピレングリコールモノメチルエーテルアセテート、イソオクタン等が好ましい。水に対する溶解度が無限である溶剤を用いると、導電性材料(A)を溶解または分散することができず、汎用溶剤に樹脂が溶解している樹脂溶液や、顔料を汎用溶剤に分散した顔料分散体に添加した場合ショックが起こり、塗膜にした場合に透過度の低い塗膜となる場合がある。 The organic solvent used in the present invention is various liquid media such as alcohols, ketones, esters, ethers, cellosolves, aromatic hydrocarbons, aliphatic hydrocarbons, etc., which can be used alone or in combination. it can. As an organic solvent used for dissolving or dispersing the conductive material (A), the solubility in water is finite, and the boiling point is 200 ° C. or less from the cost of the drying process. A halogen-based organic solvent is preferable, and specifically, for example, cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, toluene, ethyl acetate, butyl acetate, xylene, propylene glycol monomethyl ether acetate, isooctane, and the like are preferable. If a solvent with infinite solubility in water is used, the conductive material (A) cannot be dissolved or dispersed, and a resin solution in which a resin is dissolved in a general-purpose solvent or a pigment dispersion in which a pigment is dispersed in a general-purpose solvent When added to the body, a shock occurs, and when it is used as a coating film, a coating film with low permeability may be formed.
導電性材料(A)の溶液または分散体は、ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)と、塩基性有機化合物(A−3)とを、有機溶剤を含む媒体中で混合、攪拌することにより得ることができる。導電性材料(A)を、有機溶剤を含む溶媒中に分散する際には、乳化機を使用してもよい。本発明で使用する乳化機は、導電性材料(A)粒子の平均粒径を10μm以下、好ましくは5μm以下とすることができるものであれば、どの様な機種でもよい。本発明で使用できる乳化機の例としては、超音波ホモジナイザー、ホモミキサー、マイルダー、アトライター、(超)高圧ホモジナイザー及びコロイドミルを挙げることができる。 The solution or dispersion of the conductive material (A) comprises a π-conjugated polymer compound (A-2) doped with a polyanion (A-1), a basic organic compound (A-3), an organic solvent. It can be obtained by mixing and stirring in a medium. When dispersing the conductive material (A) in a solvent containing an organic solvent, an emulsifier may be used. The emulsifier used in the present invention may be any model as long as the average particle size of the conductive material (A) particles can be 10 μm or less, preferably 5 μm or less. Examples of the emulsifier that can be used in the present invention include an ultrasonic homogenizer, a homomixer, a milder, an attritor, a (ultra) high pressure homogenizer, and a colloid mill.
ここで、本発明でいう平均粒径とは、動的光散乱法で測定した場合の、累積体積平均径で、例えば、MALBERN INSTRUMENTS社製ゼータサイザーNano−ZS粒子径測定装置で測定された値のことを示す。
次に、酸無水物(B)について詳細に説明をする。本発明の導電性組成物は、上記で説明した導電性材料(A)と、酸無水物(B)とを含むことを特徴とする。導電性材料(A)と、酸無水物(B)とを組み合わせることにより、形成された塗膜中において、導電性成分が局在化すると推察される。従って、極めて少量の導電性成分の配合により優れた導電性を発現し、塗膜に求められる導電性以外の物性にも優れた導電膜の形成が可能となる。
Here, the average particle diameter referred to in the present invention is an accumulated volume average diameter when measured by a dynamic light scattering method, for example, a value measured with a Zetasizer Nano-ZS particle diameter measuring apparatus manufactured by MALBERN INSTRUMENTS. It shows that.
Next, the acid anhydride (B) will be described in detail. The conductive composition of the present invention comprises the conductive material (A) described above and an acid anhydride (B). By combining the conductive material (A) and the acid anhydride (B), it is presumed that the conductive component is localized in the formed coating film. Therefore, it is possible to form a conductive film that exhibits excellent conductivity by blending a very small amount of conductive component and that has excellent physical properties other than the conductivity required for the coating film.
<酸無水物(B)>
本発明に用いる酸無水物(B)としては、例えば、無水酢酸、無水プロピオン酸、無水アクリル酸、無水メタクリル酸、無水安息香酸などの、モノカルボキシ化合物2分子から1つの水分子が脱水縮合したもの、無水コハク酸、無水マレイン酸、無水イタコン酸、無水グルタル酸、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸(別名:シクロヘキサン−1,2−ジカルボン酸無水物)、無水トリメリット酸、ヘキサヒドロ無水トリメリット酸、無水ピロメリット酸、無水ハイミック酸、ビフェニルテトラカルボン酸無水物、1,2,3,4−ブタンテトラカルボン酸無水物、ナフタレンテトラカルボン酸無水物、9,9−フルオレニリデンビス無水フタル酸などの、分子内に2つ以上のカルボキシ基を有する化合物から水分子を1つ以上脱水したもの、スチレン−無水マレイン酸コポリマー、エチレン−無水マレイン酸コポリマー、イソブチレン−無水マレイン酸コポリマー、アルキルビニルエーテル−無水マレイン酸コポリマーなどの、無水マレイン酸と他のビニルモノマーとを共重合したコポリマーなどが挙げられる。
<Acid anhydride (B)>
As the acid anhydride (B) used in the present invention, one water molecule is dehydrated and condensed from two monocarboxy compounds such as acetic anhydride, propionic anhydride, acrylic anhydride, methacrylic anhydride, benzoic anhydride and the like. Succinic anhydride, maleic anhydride, itaconic anhydride, glutaric anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride (also known as cyclohexane-1,2-dicarboxylic anhydride), trimellitic anhydride , Hexahydrotrimellitic anhydride, pyromellitic anhydride, hymic anhydride, biphenyltetracarboxylic anhydride, 1,2,3,4-butanetetracarboxylic anhydride, naphthalenetetracarboxylic anhydride, 9,9-full Compounds having two or more carboxy groups in the molecule, such as olenylidenebisphthalic anhydride Maleic anhydride and other vinyl monomers, such as dehydrated one or more water molecules, styrene-maleic anhydride copolymer, ethylene-maleic anhydride copolymer, isobutylene-maleic anhydride copolymer, alkyl vinyl ether-maleic anhydride copolymer, etc. And the like.
本発明における導電性組成物は、導電性材料(A)100重量部に対して、酸無水物(B)を0.1〜200重量部含むことが好ましい。酸無水物(B)が0.1重量部よりも少ない場合、導電性を十分に発現できない場合があり、200重量部よりも多い場合、膜物性に悪影響を及ぼすことが多い。 The conductive composition in the present invention preferably contains 0.1 to 200 parts by weight of the acid anhydride (B) with respect to 100 parts by weight of the conductive material (A). When the amount of the acid anhydride (B) is less than 0.1 parts by weight, the conductivity may not be sufficiently developed. When the amount is more than 200 parts by weight, the physical properties of the film are often adversely affected.
<導電助剤(D)>
導電助剤(D)は、本発明の導電性組成物を用いて形成される導電膜の導電性をさらに向上する目的で加えているものであり、具体的にはラクタム、糖類および糖類誘導体、アルキレンジオール類、ポリアルキレンレングリコール類、フランカルボン酸、ハロゲン置換酢酸などが挙げられる。それらの具体例としては、例えば、N−メチルピロリドン、ピロリドン、カプロラクタム、N−メチルカプロラクタム、N−オクチルピロリドン、ショ糖、グルコース、フルクトース、ラクトース、ソルビトール、マンニトール、キシリトール、グリセリン、エチレングリコール、1,3−プロパンジオール、1,4−ブタンジオール、ジエチレングリコール、トリエチレングリコール、ジエタノールアミン、トリエタノールアミン、2−フランカルボン酸、3−フランカルボン酸、ジクロロ酢酸、トリフルオロ酢酸、トリフルオロエタノール、m−クレゾール、チオジグリコールなどが挙げられる。導電助剤(D)は導電性組成物中に0.1〜30重量%含まれることが好ましい。0.1重量%より少ない場合は導電助剤(D)による導電性の向上が期待できない。また、30重量%よりも多い場合は膜物性に悪影響を及ぼす場合が多い。
<Conductive auxiliary agent (D)>
The conductive auxiliary agent (D) is added for the purpose of further improving the conductivity of the conductive film formed using the conductive composition of the present invention, specifically, lactam, saccharide and saccharide derivative, Examples include alkylene diols, polyalkylene glycols, furan carboxylic acid, and halogen-substituted acetic acid. Specific examples thereof include, for example, N-methylpyrrolidone, pyrrolidone, caprolactam, N-methylcaprolactam, N-octylpyrrolidone, sucrose, glucose, fructose, lactose, sorbitol, mannitol, xylitol, glycerin, ethylene glycol, 1, 3-propanediol, 1,4-butanediol, diethylene glycol, triethylene glycol, diethanolamine, triethanolamine, 2-furancarboxylic acid, 3-furancarboxylic acid, dichloroacetic acid, trifluoroacetic acid, trifluoroethanol, m-cresol And thiodiglycol. It is preferable that 0.1-30 weight% of conductive support agents (D) are contained in a conductive composition. When the amount is less than 0.1% by weight, improvement in conductivity by the conductive auxiliary agent (D) cannot be expected. On the other hand, if it exceeds 30% by weight, the physical properties of the film are often adversely affected.
本発明の導電性組成物には目的を損なわない範囲で、その他バインダー、溶剤、染料、顔料、酸化防止剤、重合禁止剤、光重合開始剤、硬化剤、レベリング剤、保湿剤、粘度調整剤、防腐剤、抗菌剤、アンチブロッキング剤、紫外線吸収剤、赤外線吸収剤、電磁波シールド剤、フィラーなどを添加することができる。 In the conductive composition of the present invention, other binders, solvents, dyes, pigments, antioxidants, polymerization inhibitors, photopolymerization initiators, curing agents, leveling agents, moisturizers, viscosity modifiers, etc. Preservatives, antibacterial agents, antiblocking agents, ultraviolet absorbers, infrared absorbers, electromagnetic shielding agents, fillers, and the like can be added.
本発明の導電性組成物が感光性樹脂を含まない場合は、基材に塗工後、自然または強制乾燥によって透明導電膜を得られる。本発明の導電性組成物が感光性樹脂を含む場合は、ラジエーション硬化をおこなうことにより、硬化した導電膜を得ることができる。ラジエーション硬化のタイミングとしては、塗工と同時であってもよく、また、塗工後であってもよい。塗工後にラジエーション硬化をおこなう場合には、基材に塗工後、自然または強制乾燥の後にラジエーション硬化を行っても良いし、塗工に続いてラジエーション硬化させた後に自然または強制乾燥しても構わないが、自然または強制乾燥後にラジエーション硬化した方が好ましい。公知のラジエーション硬化方法により塗膜を硬化させ、導電膜を得ることができ、活性エネルギー線としては、電子線、紫外線、波長が400〜500nmの可視光を使用することができる。なお、電子線で硬化させる場合は、水による硬化阻害または有機溶剤の残留による塗膜の強度低下を防ぐため、自然または強制乾燥後に電子線硬化を行うのが好ましい。 When the conductive composition of the present invention does not contain a photosensitive resin, a transparent conductive film can be obtained by natural or forced drying after coating on a substrate. When the conductive composition of the present invention contains a photosensitive resin, a cured conductive film can be obtained by performing radiation curing. The radiation curing timing may be simultaneous with coating or may be after coating. When performing radiation curing after coating, after coating on the base material, you may perform radiation curing after natural or forced drying, or you may perform natural or forced drying after radiation curing following coating. Although it does not matter, it is preferable to perform radiation curing after natural or forced drying. The coating film can be cured by a known radiation curing method to obtain a conductive film. As the active energy ray, an electron beam, ultraviolet rays, or visible light having a wavelength of 400 to 500 nm can be used. In the case of curing with an electron beam, it is preferable to perform electron beam curing after natural or forced drying in order to prevent curing inhibition by water or reduction of the strength of the coating film due to the remaining organic solvent.
照射する電子線の線源には熱電子放射銃、電界放射銃等が使用できる。また、紫外線および波長が400〜500nmの可視光の線源(光源)には、例えば、高圧水銀ランプ、超高圧水銀ランプ、メタルハライドランプ、ガリウムランプ、キセノンランプ、カーボンアークランプ等を使用することができる。具体的には、点光源であること、輝度の安定性から、超高圧水銀ランプ、キセノン水銀ランプが用いられることが多い。照射する活性エネルギー線量は、5〜2000mJの範囲で任意に設定できるが、工程上管理しやすい50〜1000mJの範囲であることが好ましい。
また、これら紫外線または電子線と、赤外線、遠赤外線、熱風、高周波加熱等による熱の併用も可能である。
A thermionic emission gun, a field emission gun, or the like can be used as the electron beam source to be irradiated. For example, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a gallium lamp, a xenon lamp, or a carbon arc lamp may be used as a visible light source (light source) having a wavelength of 400 to 500 nm. it can. Specifically, an ultra-high pressure mercury lamp or a xenon mercury lamp is often used because of the point light source and the stability of luminance. The active energy dose to be irradiated can be arbitrarily set in the range of 5 to 2000 mJ, but is preferably in the range of 50 to 1000 mJ that can be easily managed in the process.
Further, these ultraviolet rays or electron beams can be used in combination with heat by infrared rays, far infrared rays, hot air, high frequency heating or the like.
本発明の導電性組成物から得られた導電膜は、低い表面抵抗値を示し、様々な用途で使用できる。さらに得られた塗膜は、ヘイズが低くかつ透明性に優れる。帯電防止用途においては、表面抵抗値で1014(Ω/□)以下が好ましく、1012(Ω/□)以下、さらには1010(Ω/□)以下であることが特に好ましい。 The electrically conductive film obtained from the electrically conductive composition of this invention shows a low surface resistance value, and can be used for various uses. Furthermore, the obtained coating film has low haze and excellent transparency. In antistatic applications, the surface resistance value is preferably 10 14 (Ω / □) or less, more preferably 10 12 (Ω / □) or less, and even more preferably 10 10 (Ω / □) or less.
本発明の導電性組成物は、有機または無機基材に塗布し、必要に応じて乾燥および硬化させることにより、積層体を得ることができる。用いられる無機基材の例としては、ガラス、酸化物または酸化性もしくは非酸化性セラミック(例えば、酸化アルミニウム、窒化ケイ素等)などからなる基材が挙げられる。有機基材の例としては、有機単独重合体、共重合体またはそれらの混合物からなる基材が挙げられ、有機単独重合体ないし共重合体の具体例としては、例えば、ポリスチレン、ポリカーボネート、ポリアクリレート、ポリエステル(例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンテレフタレート)、ポリアミド、ポリイミド、ガラス繊維強化されたエポキシ樹脂、セルロース誘導体(例えば、三酢酸セルロース)、ポリオレフィン(例えば、ポリエチレン、ポリプロピレン)等が挙げられる。 The conductive composition of the present invention can be applied to an organic or inorganic substrate, and dried and cured as necessary to obtain a laminate. Examples of the inorganic base material used include base materials made of glass, oxides, or oxidizing or non-oxidizing ceramics (for example, aluminum oxide, silicon nitride, etc.). Examples of the organic base material include base materials made of organic homopolymers, copolymers or mixtures thereof. Specific examples of organic homopolymers or copolymers include, for example, polystyrene, polycarbonate, polyacrylate. , Polyester (for example, polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate), polyamide, polyimide, glass fiber reinforced epoxy resin, cellulose derivative (for example, cellulose triacetate), polyolefin (for example, polyethylene, polypropylene) and the like. It is done.
本発明の導電性組成物は、均一塗膜の形成が可能であり、形成される塗膜は、高い透過度および導電性を有しており、各種帯電防止剤、帯電防止塗料、帯電防止光学コート剤、帯電防止粘接着剤、帯電防止繊維、防食塗料、導電性塗料、導電性インキ、電池電極材料、EMIシールド、化学センサー、表示素子、非線形材料、メッキプライマー等の用途に使用することができる。 The conductive composition of the present invention can form a uniform coating film, and the formed coating film has high transmittance and conductivity, and various antistatic agents, antistatic paints, and antistatic optics. Use for applications such as coating agents, antistatic adhesives, antistatic fibers, anticorrosive paints, conductive paints, conductive inks, battery electrode materials, EMI shields, chemical sensors, display elements, nonlinear materials, plating primers, etc. Can do.
以下に実施例をもって本発明を具体的に説明するが、本発明はこれらに限定されるものではない。なお、特に断りのない限り「%」は「重量%」を、「部」は「重量部」を意味する。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. Unless otherwise specified, “%” means “% by weight” and “parts” means “parts by weight”.
製造例、実施例中にある略称は以下の通りである。
M−402:ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートとの混合物(東亞合成株式会社製:アロニックスM−402、水酸基価37.4mgKOH/g)
PET30:ペンタエリスリトールトリアクリレートとペンタエリスリトールテトラアクリレートとの混合物(日本化薬株式会社製:KAYARAD PET30、水酸基価127.6mgKOH/g)
SA:無水コハク酸(新日本理化株式会社製:リカシッドSA)
THPA:テトラヒドロ無水フタル酸(新日本理化株式会社製:リカシッドTH)
PA:無水フタル酸(新日本理化株式会社製:リカシッドPA)
DBU:1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(サンアプロ株式会社:DBU)
DMBA:N,N−ジメチルベンジルアミン(和光純薬株式会社製)
DPHA:ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートとの混合物(日本化薬株式会社製:KAYARAD DPHA、水酸基価48.1mgKOH/g)
BPDA:3,3’,4,4’−ビフェニルテトラカルボン酸二無水物(三菱化学株式会社製)
BT−100:1,2,3,4−ブタンテトラカルボン酸二無水物(新日本理化株式会社:リカシッドBT−100)
GMA:グリシジルメタクリレート(日油株式会社:ブレンマーG)
VEEA:2−[2−(ビニルオキシ)エトキシ]エチルアクリレート(日本触媒株式会社:FX−VEEA)
Irg184:イルガキュア184(チバスペシャリティケミカル株式会社製)の20%酢酸エチル溶液
EG:エチレングリコール
EtAc:酢酸エチル
SMA:スチレンマレイン酸樹脂(SARTOMER社製:SMA−1000)
TMA:無水トリメリット酸(三菱ガス化学株式会社製)
PMA:無水ピロメリット酸(ダイセル化学株式会社製:PMDA)
D−310:ジペンタエリスリトールペンタアクリレートモノアシレート(日本化薬株式会社製:KAYARAD D−310)
UA306H:ウレタンアクリレート(共栄社化学株式会社製:UA306H)
Abbreviations in production examples and examples are as follows.
M-402: Mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (manufactured by Toagosei Co., Ltd .: Aronix M-402, hydroxyl value 37.4 mgKOH / g)
PET30: Mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (manufactured by Nippon Kayaku Co., Ltd .: KAYARAD PET30, hydroxyl value 127.6 mgKOH / g)
SA: Succinic anhydride (manufactured by Shin Nippon Rika Co., Ltd .: Ricacid SA)
THPA: Tetrahydrophthalic anhydride (manufactured by Nippon Chemical Co., Ltd .: Ricacid TH)
PA: phthalic anhydride (manufactured by Shin Nippon Rika Co., Ltd .: Ricacid PA)
DBU: 1,8-diazabicyclo [5.4.0] -7-undecene (San Apro Co., Ltd .: DBU)
DMBA: N, N-dimethylbenzylamine (manufactured by Wako Pure Chemical Industries, Ltd.)
DPHA: A mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd .: KAYARAD DPHA, hydroxyl value 48.1 mgKOH / g)
BPDA: 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (Mitsubishi Chemical Corporation)
BT-100: 1,2,3,4-butanetetracarboxylic dianhydride (Shin Nippon Rika Co., Ltd .: Ricacid BT-100)
GMA: Glycidyl methacrylate (NOF Corporation: Bremer G)
VEEA: 2- [2- (vinyloxy) ethoxy] ethyl acrylate (Nippon Shokubai Co., Ltd .: FX-VEEA)
Irg 184: 20% ethyl acetate solution of Irgacure 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.) EG: ethylene glycol EtAc: ethyl acetate SMA: styrene maleic acid resin (manufactured by SARTOMER: SMA-1000)
TMA: trimellitic anhydride (Mitsubishi Gas Chemical Co., Ltd.)
PMA: pyromellitic anhydride (manufactured by Daicel Chemical Industries, Ltd .: PMDA)
D-310: Dipentaerythritol pentaacrylate monoacylate (Nippon Kayaku Co., Ltd. product: KAYARAD D-310)
UA306H: urethane acrylate (manufactured by Kyoeisha Chemical Co., Ltd .: UA306H)
<導電性材料(A)の作製>
(製造例1)
ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)として、ポリスチレンスルホン酸水溶液存在下で、単量体として3,4−エチレンジオキシチオフェンを用いてポリ(3,4−エチレンジオキシチオフェン)を合成したH.C.Starck社製のBAYTRON P AGを用いた。BAYTRON P AGは溶媒が水で不揮発分が1.2%であり、前記ポリスチレンスルホン酸中のスルホン酸基と、合成に用いた単量体である3,4−エチレンジオキシチオフェンとのモル比は、スルホン酸基/3,4−エチレンジオキシチオフェン=2.5:1.0であった。
酢酸エチル54.51部に塩基性有機化合物(A−3)としてアジスパーPB−821(味の素ファインテクノ社製:アミン価10.75mgKOH/g)を8.37部溶解させた溶液にBAYTRON P AGを52.51部加えて、ディスパーを用いて室温で1時間攪拌し、乳化物を得た。ロータリーエバポレーターを用いて、この乳化物から水を取り除いた。必要に応じて適宜酢酸エチルを加えた。最終的に不揮発分15%の導電性材料(A)の酢酸エチル分散体を60.00部得た。
<Preparation of conductive material (A)>
(Production Example 1)
As the π-conjugated polymer compound (A-2) doped with the polyanion (A-1), poly (3,4) using 3,4-ethylenedioxythiophene as a monomer in the presence of an aqueous polystyrene sulfonic acid solution. -Ethylenedioxythiophene) synthesized H. C. BAYTRON PAG manufactured by Starck was used. BAYTRON P AG has a solvent of water and a non-volatile content of 1.2%, and a molar ratio of the sulfonic acid group in the polystyrene sulfonic acid to 3,4-ethylenedioxythiophene, which is a monomer used for synthesis. Was sulfonic acid group / 3,4-ethylenedioxythiophene = 2.5: 1.0.
BAYTRON P AG was dissolved in a solution prepared by dissolving 8.37 parts of Ajisper PB-821 (Ajinomoto Fine Techno Co., Ltd .: amine value 10.75 mgKOH / g) as a basic organic compound (A-3) in 54.51 parts of ethyl acetate. 52.51 parts was added and stirred at room temperature for 1 hour using a disper to obtain an emulsion. Water was removed from the emulsion using a rotary evaporator. If necessary, ethyl acetate was added appropriately. Finally, 60.00 parts of an ethyl acetate dispersion of a conductive material (A) having a nonvolatile content of 15% was obtained.
(製造例2)
攪拌機、温度計、還流冷却器、窒素導入管を備えた4口フラスコにp−スチレンスルホン酸ナトリウム500部、水1000部、過硫酸アンモニウム0.5部を仕込み、この反応容器内の空気を窒素ガスで置換した後、窒素ガスを吹き込みながら80℃で8時間反応させた。反応終了後、水を250部添加して、不揮発分濃度40%で重量平均分子量が25,000のポリ(p−スチレンスルホン酸ナトリウム)水溶液を得た。
攪拌機、温度計、冷却装置、滴下装置を備えた反応容器にピロール2.6部、水100部、上記ポリ(p−スチレンスルホン酸ナトリウム)水溶液50部を仕込み、この反応溶液を5℃に保ちながら、10%の塩化第二銅水溶液43.5部を2時間かけて滴下し、トータルで8時間反応させた。反応終了後、水を68.5部添加して、不揮発分濃度10%である、ポリ(p−スチレンスルホン酸)によってドープされたポリピロール水溶液を得た。前記ポリ(p−スチレンスルホン酸ナトリウム)中のスルホン酸ナトリウム基と、合成に用いた単量体であるピロールとのモル比は、スルホン酸ナトリウム基/ピロール=2.5/1.0であった。
MEK100部にアジスパーPB−821を16部溶解させた溶液に上記のポリ(p−スチレンスルホン酸)にドープされたポリピロール水溶液を12部加えて、ディスパーを用いて室温で1時間攪拌して、不揮発分13.4%の導電性材料(A)のMEK分散体を128部得た。
(Production Example 2)
A 4-necked flask equipped with a stirrer, thermometer, reflux condenser, and nitrogen inlet tube is charged with 500 parts of sodium p-styrenesulfonate, 1000 parts of water, and 0.5 part of ammonium persulfate, and the air in the reaction vessel is nitrogen gas. Then, the mixture was reacted at 80 ° C. for 8 hours while blowing nitrogen gas. After completion of the reaction, 250 parts of water was added to obtain a poly (sodium p-styrenesulfonate) aqueous solution having a nonvolatile content of 40% and a weight average molecular weight of 25,000.
A reaction vessel equipped with a stirrer, a thermometer, a cooling device, and a dropping device was charged with 2.6 parts of pyrrole, 100 parts of water, and 50 parts of the aqueous poly (p-sodium styrenesulfonate) solution, and the reaction solution was kept at 5 ° C. However, 43.5 parts of a 10% cupric chloride aqueous solution was dropped over 2 hours, and the reaction was performed for a total of 8 hours. After completion of the reaction, 68.5 parts of water was added to obtain an aqueous polypyrrole solution doped with poly (p-styrenesulfonic acid) having a nonvolatile content concentration of 10%. The molar ratio between the sodium sulfonate group in the poly (sodium p-styrenesulfonate) and the pyrrole monomer used in the synthesis was sodium sulfonate group / pyrrole = 2.5 / 1.0. It was.
12 parts of the polypyrrole aqueous solution doped with the above poly (p-styrenesulfonic acid) was added to a solution obtained by dissolving 16 parts of Ajisper PB-821 in 100 parts of MEK, and stirred at room temperature for 1 hour using a disper. 128 parts of MEK dispersion of conductive material (A) with a fraction of 13.4% were obtained.
(製造例3)
攪拌機、温度計、還流冷却器、窒素導入管を備えた4口フラスコにp−スチレンスルホン酸ナトリウム500部、水1000部、過硫酸アンモニウム0.3部を仕込み、この反応容器内の空気を窒素ガスで置換した後、窒素ガスを吹き込みながら80℃で8時間反応させた。反応終了後、水を250部添加して、不揮発分濃度40%で重量平均分子量が50,000のポリ(p−スチレンスルホン酸ナトリウム)水溶液を得た。
攪拌機、温度計、冷却装置、滴下装置を備えた反応容器にアニリン塩酸塩5.8部、水100部、上記ポリ(p−スチレンスルホン酸ナトリウム)水溶液50部を仕込み、この反応溶液を5℃に保ちながら、5%の過硫酸アンモニウム水溶液44.2部を2時間かけて滴下し、トータルで8時間反応させた。反応終了後、水を64部添加して、不揮発分濃度10%である、ポリ(p−スチレンスルホン酸)によってドープされたポリアニリン水溶液を得た。前記ポリ(p−スチレンスルホン酸ナトリウム)中のスルホン酸ナトリウム基と、合成に用いた単量体であるアニリン塩酸塩とのモル比は、スルホン酸ナトリウム基/アニリン塩酸塩=2.0/1.0であった。
シクロヘキサノン100部にアジスパーPB−821を16部溶解させた溶液に上記のポリ(p−スチレンスルホン酸)によってドープされたポリアニリン水溶液を12部加えて、ディスパーを用いて室温で1時間攪拌して、不揮発分13.4%の導電性材料(A)のシクロヘキサノン分散体を128部得た。
(Production Example 3)
A 4-neck flask equipped with a stirrer, thermometer, reflux condenser, and nitrogen inlet tube is charged with 500 parts of sodium p-styrenesulfonate, 1000 parts of water, and 0.3 part of ammonium persulfate, and the air in the reaction vessel is nitrogen gas. Then, the mixture was reacted at 80 ° C. for 8 hours while blowing nitrogen gas. After completion of the reaction, 250 parts of water was added to obtain a poly (sodium p-styrenesulfonate) aqueous solution having a nonvolatile content of 40% and a weight average molecular weight of 50,000.
A reaction vessel equipped with a stirrer, a thermometer, a cooling device, and a dropping device was charged with 5.8 parts of aniline hydrochloride, 100 parts of water, and 50 parts of the aqueous poly (p-sodium styrenesulfonate) solution. 44.2 parts of 5% aqueous ammonium persulfate solution was added dropwise over 2 hours, and the reaction was performed for a total of 8 hours. After completion of the reaction, 64 parts of water was added to obtain an aqueous polyaniline solution doped with poly (p-styrenesulfonic acid) having a nonvolatile content concentration of 10%. The molar ratio between the sodium sulfonate group in the poly (sodium p-styrenesulfonate) and the aniline hydrochloride, which is the monomer used in the synthesis, was sodium sulfonate group / aniline hydrochloride = 2.0 / 1. 0.0.
12 parts of the polyaniline aqueous solution doped with the above poly (p-styrenesulfonic acid) was added to a solution obtained by dissolving 16 parts of Azisper PB-821 in 100 parts of cyclohexanone, and stirred at room temperature for 1 hour using a disper. 128 parts of a cyclohexanone dispersion of the conductive material (A) having a nonvolatile content of 13.4% was obtained.
(製造例4)
撹拌機、還流冷却管、窒素導入管、温度計を備えた4口フラスコに、12−ヒドロキシステアリン酸(伊藤製油株式会社製)12.16部、カプロラクトン(ダイセル化学株式会社製:プラクセルM)87.72部、テトラブチルチタネート(松本製薬工業株式会社製:オルガチックスTA−25)0.088部を仕込み、窒素ガスを吹き込みながら160℃に昇温し、5時間反応させた。その後、100℃まで冷却し、ポリアリルアミンの20%水溶液30.00部加え、昇温して、反応液中の水を取り除いた。120℃まで昇温し、2時間反応させた。次いで、シクロヘキサノン105.97部を加え、塩基性有機化合物(A−3)のシクロヘキサノン溶液を得た。固形分50%、重量平均分子量6,609、アミン価8.907mgKOH/gであった。
酢酸エチル46.14部に塩基性有機化合物(A−3)として上記塩基性有機化合物のシクロヘキサン溶液を16.74部混合した溶液にBAYTRON P AGを52.50部加えて、ディスパーを用いて室温で1時間攪拌し、乳化物を得た。ロータリーエバポレーターを用いて、この乳化物から水を取り除いた。必要に応じて適宜酢酸エチルを加えた。最終的に不揮発分15%の導電性材料(A)の酢酸エチル/シクロヘキサノン分散体を60.00部得た。製造例1と同様、ポリスチレンスルホン酸中のスルホン酸基と、3,4−エチレンジオキシチオフェンとのモル比は、スルホン酸基/3,4−エチレンジオキシチオフェン=2.5:1.0である。
(Production Example 4)
In a four-necked flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, and a thermometer, 12.16 parts of 12-hydroxystearic acid (manufactured by Ito Oil Co., Ltd.), caprolactone (manufactured by Daicel Chemical Industries, Ltd .: Plaxel M) 87 .72 parts, 0.088 part of tetrabutyl titanate (manufactured by Matsumoto Pharmaceutical Co., Ltd .: Orgatics TA-25) was charged, the temperature was raised to 160 ° C. while blowing nitrogen gas, and the reaction was allowed to proceed for 5 hours. Then, it cooled to 100 degreeC, 30.00 parts of 20% aqueous solution of polyallylamine was added, and it heated up, and removed the water in a reaction liquid. The temperature was raised to 120 ° C. and reacted for 2 hours. Next, 105.97 parts of cyclohexanone was added to obtain a cyclohexanone solution of the basic organic compound (A-3). The solid content was 50%, the weight average molecular weight was 6,609, and the amine value was 8.907 mgKOH / g.
52.50 parts of BAYTRON P AG was added to a solution obtained by mixing 16.74 parts of the above basic organic compound in cyclohexane as the basic organic compound (A-3) with 46.14 parts of ethyl acetate, and using a disper at room temperature. And stirred for 1 hour to obtain an emulsion. Water was removed from the emulsion using a rotary evaporator. If necessary, ethyl acetate was added appropriately. Finally, 60.00 parts of an ethyl acetate / cyclohexanone dispersion of a conductive material (A) having a nonvolatile content of 15% was obtained. Similar to Production Example 1, the molar ratio of the sulfonic acid group in polystyrene sulfonic acid to 3,4-ethylenedioxythiophene was sulfonic acid group / 3,4-ethylenedioxythiophene = 2.5: 1.0. It is.
(実施例1)
製造例1で作製した導電性材料(A)の酢酸エチル分散体2.857部、酸無水物(B)として無水コハク酸(新日本理化株式会社:リカシッドSA)0.257部、バインダーとしてアロニックスM−402(東亜合成株式会社製)2.314部、導電助剤(D)としてエチレングリコール0.700部、光重合開始剤としてイルガキュア184(チバスペシャリティケミカル製)の20%酢酸エチル溶液を0.750部、酢酸エチル3.271部を配合し、固形分30%の分散体を得た。これをバーコーター#14を用いて厚さ100μmのPETフィルム上に塗布し、100℃のオーブンで2分間乾燥した。これにメタルハライドランプを用いて、400mJ/cm2の紫外線を照射して導電膜を作製した。この導電膜について表面抵抗、ヘイズ、透過率を測定した。表面抵抗の測定には株式会社Advantest製のデジタル超高抵抗/微小電流計(R8340A)を使用した。なお、表中の「over」とは、測定値が測定可能上限を超えたことを表す。ヘイズおよび透過率の測定には、ヘイズメーター[「NDH2000」、日本電色工業(株)製]を使用した。
Example 1
2.857 parts of the ethyl acetate dispersion of the conductive material (A) produced in Production Example 1, 0.257 parts of succinic anhydride (Shin Nippon Rika Co., Ltd .: Ricacid SA) as the acid anhydride (B), and Aronix as the binder M-402 (manufactured by Toa Gosei Co., Ltd.) 2.314 parts, ethylene glycol 0.700 part as a conductive auxiliary agent (D), and 20% ethyl acetate solution of Irgacure 184 (manufactured by Ciba Specialty Chemical) as a photopolymerization initiator .750 parts and ethyl acetate 3.271 parts were blended to obtain a dispersion having a solid content of 30%. This was coated on a 100 μm thick PET film using a bar coater # 14 and dried in an oven at 100 ° C. for 2 minutes. A metal halide lamp was used for this to irradiate with 400 mJ / cm 2 of ultraviolet rays to produce a conductive film. The surface resistance, haze, and transmittance of this conductive film were measured. For measurement of the surface resistance, a digital ultrahigh resistance / microammeter (R8340A) manufactured by Advantest Co., Ltd. was used. Note that “over” in the table indicates that the measured value exceeds the measurable upper limit. A haze meter [“NDH2000”, manufactured by Nippon Denshoku Industries Co., Ltd.] was used for the measurement of haze and transmittance.
(実施例2〜7、比較例1〜2)
実施例2〜7、比較例1〜2は、下記表3に示したように配合した以外は、実施例1と同様の操作にて、配合、塗布、評価を行った。評価結果についても表3に示した。
(Examples 2-7, Comparative Examples 1-2)
Examples 2-7 and Comparative Examples 1-2 were blended, applied and evaluated in the same manner as in Example 1 except that they were blended as shown in Table 3 below. The evaluation results are also shown in Table 3.
表3に示すように、実施例1〜7は、導電性、透明性がともに良好であったのに対し、比較例1〜2は、導電性が得られなかった。
As shown in Table 3, Examples 1 to 7 had good conductivity and transparency, whereas Comparative Examples 1 and 2 did not have conductivity.
本発明者らは、上記問題を解決するため、鋭意検討した結果、本発明に達した。
即ち、第1の発明は、ポリアニオン(A−1)によってドープされたπ共役高分子化合物(A−2)と、塩基性有機化合物(A−3)とのイオン対であり、有機溶剤中で溶解または分散可能である導電性材料(A)と、酸無水物(B)とを含んでなる導電性組成物(ただし、下記(C−1)〜(C−4)から選ばれる少なくとも1つの化合物を含む場合を除く)に関する。
(C−1):ヒドロキシ基を有する化合物(c1)と環状酸無水物基を有する化合物(c2)とを反応させて得られる化合物。
(C−2):ヒドロキシ基を有する化合物(c1)と環状酸無水物基を有する化合物(c2)とを反応させて得られるカルボキシ基含有化合物と、カルボキシ基と反応しエステル結合を形成し得る官能基を有する化合物(c3)と、を反応させて得られる化合物。
(C−3):2つ以上のカルボキシ基を有する化合物(c4)と、カルボキシ基と反応しエステル結合を形成し得る官能基を有する化合物(c3)と、を反応させて得られる化合物。
(C−4):2つ以上のカルボキシ基を有する化合物のエステル化合物(c5)と、ヒドロキシ基を有する化合物(c1)と、をエステル交換反応させて得られる化合物。
また、第2の発明は、さらに導電助剤(D)を含むことを特徴とする第1の発明の導電性組成物に関する。
また、第3の発明は、第1の発明または第2の発明の導電性組成物から形成されてなる導電膜に関する。
また、第4の発明は、基材と第3の発明の導電膜とを有する積層体に関する。
The inventors of the present invention have arrived at the present invention as a result of intensive studies to solve the above problems.
That is, the first invention is an ion pair of a π-conjugated polymer compound (A-2) doped with a polyanion (A-1) and a basic organic compound (A-3), in an organic solvent. A conductive composition comprising a conductive material (A) that can be dissolved or dispersed and an acid anhydride (B) (however, at least one selected from the following (C-1) to (C-4)) Except when it contains a compound).
(C-1): A compound obtained by reacting a compound (c1) having a hydroxy group with a compound (c2) having a cyclic acid anhydride group.
(C-2): A carboxy group-containing compound obtained by reacting a compound (c1) having a hydroxy group with a compound (c2) having a cyclic acid anhydride group, and reacting with the carboxy group can form an ester bond. A compound obtained by reacting a compound (c3) having a functional group.
(C-3): A compound obtained by reacting a compound (c4) having two or more carboxy groups with a compound (c3) having a functional group capable of reacting with a carboxy group to form an ester bond.
(C-4): A compound obtained by transesterifying an ester compound (c5) of a compound having two or more carboxy groups with a compound (c1) having a hydroxy group.
Moreover, 2nd invention is related with the electrically conductive composition of 1st invention characterized by including a conductive support agent (D) further.
Moreover, 3rd invention is related with the electrically conductive film formed from the electrically conductive composition of 1st invention or 2nd invention.
Moreover, 4th invention is related with the laminated body which has a base material and the electrically conductive film of 3rd invention.
Claims (4)
The laminated body which has a base material and the electrically conductive film of Claim 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012221016A JP5516685B2 (en) | 2012-10-03 | 2012-10-03 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012221016A JP5516685B2 (en) | 2012-10-03 | 2012-10-03 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008126555A Division JP5136195B2 (en) | 2008-05-14 | 2008-05-14 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013047344A true JP2013047344A (en) | 2013-03-07 |
JP5516685B2 JP5516685B2 (en) | 2014-06-11 |
Family
ID=48010493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012221016A Active JP5516685B2 (en) | 2012-10-03 | 2012-10-03 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5516685B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015042715A (en) * | 2013-08-26 | 2015-03-05 | 東亞合成株式会社 | (meth)acrylate mixture and curable composition comprising the same |
JP5757664B2 (en) * | 2009-06-17 | 2015-07-29 | 日本化薬株式会社 | Urethane (meth) acrylate compound and resin composition containing the same |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002060736A (en) * | 2000-08-24 | 2002-02-26 | Nagase Chemtex Corp | Antistatic coating composition |
JP2006143922A (en) * | 2004-09-22 | 2006-06-08 | Shin Etsu Polymer Co Ltd | Antistatic paint, antistatic membrane and antistatic film, optical filter, and optical information recording medium |
JP2006291133A (en) * | 2005-04-14 | 2006-10-26 | Shin Etsu Polymer Co Ltd | Conductive polymeric coating material and its production method, and conductive crosslinked article |
WO2007091656A1 (en) * | 2006-02-09 | 2007-08-16 | Shin-Etsu Polymer Co., Ltd. | Conductive polymer solution, conductive coating, capacitor and process for manufacturing capacitor |
JP2007254730A (en) * | 2006-02-24 | 2007-10-04 | Toyo Ink Mfg Co Ltd | Electroconductive composition |
-
2012
- 2012-10-03 JP JP2012221016A patent/JP5516685B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002060736A (en) * | 2000-08-24 | 2002-02-26 | Nagase Chemtex Corp | Antistatic coating composition |
JP2006143922A (en) * | 2004-09-22 | 2006-06-08 | Shin Etsu Polymer Co Ltd | Antistatic paint, antistatic membrane and antistatic film, optical filter, and optical information recording medium |
JP2006291133A (en) * | 2005-04-14 | 2006-10-26 | Shin Etsu Polymer Co Ltd | Conductive polymeric coating material and its production method, and conductive crosslinked article |
WO2007091656A1 (en) * | 2006-02-09 | 2007-08-16 | Shin-Etsu Polymer Co., Ltd. | Conductive polymer solution, conductive coating, capacitor and process for manufacturing capacitor |
JP2007254730A (en) * | 2006-02-24 | 2007-10-04 | Toyo Ink Mfg Co Ltd | Electroconductive composition |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5757664B2 (en) * | 2009-06-17 | 2015-07-29 | 日本化薬株式会社 | Urethane (meth) acrylate compound and resin composition containing the same |
JP2015042715A (en) * | 2013-08-26 | 2015-03-05 | 東亞合成株式会社 | (meth)acrylate mixture and curable composition comprising the same |
Also Published As
Publication number | Publication date |
---|---|
JP5516685B2 (en) | 2014-06-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5380778B2 (en) | Conductive composition | |
JP5136195B2 (en) | Conductive composition, conductive film using the same, and laminate having the conductive film | |
JP5316000B2 (en) | Conductive polymer / dopant organic solvent dispersion and composition containing the dispersion | |
JP4947759B2 (en) | Carbon nanotube-containing curable composition and composite having the cured coating film | |
JP5402777B2 (en) | Conductive polymer / dopant dispersion, conductive composition, and conductive film | |
JP5680323B2 (en) | Transparent electrode, conductive laminate and conductive resin film | |
Lu et al. | Synthesis of Conjugated− Acidic Block Copolymers by Atom Transfer Radical Polymerization | |
JP2015117367A (en) | Conductive resin composition and transparent conductive laminate | |
JP2009155570A (en) | Composition containing carbon nanotube, complex with coating film comprising the same, and its manufacturing method | |
JP2020163362A (en) | Dispersion agent, dispersion body, electrode and resin composition | |
JP2008214587A (en) | Carbon nanotube-containing composition, and composite formed from the same | |
JP2008037919A (en) | Composition comprising carbon nanotube and composite composed of the same | |
JP2009530657A (en) | Antistatic coating composition for polarizing film and antistatic polarizing film using the same | |
WO2016021670A1 (en) | Transparent conductor, liquid crystal display device and method for producing transparent conductor | |
JP2008169308A (en) | Conductive composition | |
US9382381B2 (en) | Aromatic polyamide and film-forming composition containing same | |
JP2015117364A (en) | Conductive resin composition and transparent conductive laminate | |
JP2008056765A (en) | Carbon nanotube-containing structure and its manufacturing method | |
JP5516685B2 (en) | Conductive composition, conductive film using the same, and laminate having the conductive film | |
JP2005170996A (en) | Radiation curable conductive composition | |
JP6617949B2 (en) | Conductive laminate | |
KR102632651B1 (en) | carbon material dispersion | |
JP2006028439A (en) | Electroconductive polymer solution and electroconductive coated film | |
JP2005298624A (en) | Conductive hard coat composition | |
JP2011094009A (en) | Antireflection coating composition and antireflection film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130107 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131129 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140304 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140317 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5516685 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |