JP2013038181A - ダイシング・ダイボンドフィルム - Google Patents
ダイシング・ダイボンドフィルム Download PDFInfo
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- JP2013038181A JP2013038181A JP2011172099A JP2011172099A JP2013038181A JP 2013038181 A JP2013038181 A JP 2013038181A JP 2011172099 A JP2011172099 A JP 2011172099A JP 2011172099 A JP2011172099 A JP 2011172099A JP 2013038181 A JP2013038181 A JP 2013038181A
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- Prior art keywords
- dicing
- film
- weight
- die
- sensitive adhesive
- Prior art date
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Abstract
Description
次に、図1に示すダイシング・ダイボンドフィルム10を用いた半導体装置の製造方法について説明する。
[ダイボンドフィルムの作製]
アクリル酸エチル−メチルメタクリレートを主成分とするアクリル酸エステル系ポリマー(根上工業(株)製、パラクロンW−197CM)100重量部に対して、多官能イソシアネート系架橋剤3重量部、エポキシ樹脂(ジャパンエポキシレジン(株)製、エピコート1004)23重量部、フェノール樹脂(三井化学(株)製、ミレックスXLC−CC)6重量部をメチルエチルケトンに溶解させ、濃度20重量%の接着剤組成物の溶液を調整した。
先ず、放射線硬化型アクリル系粘着剤の調製を行った。即ち、アクリル酸ブチル70重量部、アクリル酸エチル30重量部およびアクリル酸5重量部を酢酸エチル中で常法により共重合させ、重量平均分子量80万であり、濃度30重量%のアクリル系ポリマーの溶液を得た。
前記ダイシングフィルムAにおける粘着剤層上に、前記ダイボンドフィルムAを転写させ、本実施例に係るダイシング・ダイボンドフィルムAを作製した。
[ダイボンドフィルムの作製]
本実施例2に於いては、前記実施例1にて使用したアクリル酸エステル系ポリマーに替えて、ブチルアクリレートを主成分としたポリマー(根上工業(株)製、パラクロンSN−710)を用いたこと以外は、前記実施例1と同様にして、本実施例2に係るダイボンドフィルムB(厚さ50μm)を作製した。
先ず、放射線硬化型アクリル系粘着剤の調製を行った。即ち、アクリル酸エチル50重量部、アクリル酸ブチル50重量部およびアクリル酸2−ヒドロキシエチル16重量部を配合してなる配合組成物を、トルエン溶液中で共重合させ、重量平均分子量50万であり、濃度35重量%のアクリル系ポリマーの溶液を得た。
前記ダイシングフィルムBにおける粘着剤層上に、前記ダイボンドフィルムBを転写させ、本実施例に係るダイシング・ダイボンドフィルムBを作製した。
本比較例に於いては、光重合性化合物をエチレングリコールジアクリレートに変更し、更にその配合量を40重量部にしたこと以外は、前記実施例1と同様にして、本比較例に係るダイシング・ダイボンドフィルムCを作製した。
本比較例に於いては、光重合性化合物をエチレングリコールジフェニルアクリレートに変更し、更にその配合量を30重量部にしたこと以外は、前記実施例1と同様にして、本比較例に係るダイシング・ダイボンドフィルムDを作製した。
実施例および比較例で得られたダイシング・ダイボンドフィルムA〜Dの吸水率を下記に示す方法により測定した。結果を表1に示す。即ち、ダイシング・ダイボンドフィルムA〜Dから20mm×20mmのサンプルを切り出し、これを120℃の真空乾燥機中で、3時間放置して乾燥させた。その後、デシケータ中で放冷し、サンプルの乾燥重量M1を測定した。次に、85℃、85%RHの雰囲気下にある恒温恒湿槽中に120時間放置し、サンプルを吸湿させてから取り出し秤量した。秤量値が一定になったときの重量をM2とした。測定したM1及びM2から、下記式(1)に基づき吸水率を算出した。
各実施例及び比較例で得られたダイシング・ダイボンドフィルムA〜Dのそれぞれを、半導体ウェハにマウントした。半導体ウェハとしては、サイズが8インチであり、厚さが75μmになるまで裏面研削したものを用いた。研削条件及び貼り合わせ条件は下記の通りである。なお、(耐湿半田リフロー性)の評価の手順の間に、(ダイシングフィルム−ダイボンドフィルム間界面への水の浸入)も評価した。
研削装置:ディスコ社製、DGP−8760
半導体ウェハ:8インチ径(厚さ750μmから75μmに裏面研削)
貼り付け装置:日東精機製、DR−3000II
貼り付け速度計:100mm/min
貼り付け圧力:0.3MPa
貼り付け時のステージ温度:23℃
ダイシング装置:ディスコ社製、DFD−6361
ダイシング速度:30mm/秒
ダイシングブレード:ディスコ社製
Z1:205O−HEDD
Z2:205O−HCBB
回転数:4万rpm
Z2のダイシングテープへの切り込み量:20μm
カット方式:ステップカット・Aモード
チップサイズ:10mm角
ダイボンダー:(株)新川製、装置名:SPA−300
内リングに対する外リングの引落し量:3mm
ダイシングリング:2−8−1
ダイシング後に、ダイシングフィルムとダイボンドフィルムとの界面へ水が浸入しているか否かについて、光学顕微鏡(50倍)により確認した。なお、ダイシング直後では、切断面側からダイシングフィルムとダイボンドフィルムとの界面を確認することは困難であるので、エキスパンド後に水浸入の有無を確認した。
ダイボンド装置:(株)新川製、装置名:SPA−300
ニードル本数:9本
ニードル突き上げ量:350μm(0.35mm)
ニードル突き上げ速度:5mm/秒
吸着保持時間:80ms
下記表2から明らかな通り、比較例1及び2に係るダイシング・ダイボンドフィルムC、Dにおいては、ダイボンドフィルムの吸水率が共に1.5重量%以下に抑制されているにも関わらず、リフロー工程後のダイボンドフィルムが半導体チップから剥離していることが確認された。これは、ダイシングフィルムの吸水率が大きいことに起因すると思料される。また、比較例1のダイシング・ダイボンドフィルムCに於いては、ダイシング工程後のダイシングフィルムとダイボンドフィルムの界面に水が浸入していることも確認された。
2 粘着剤層
3、3’ ダイボンドフィルム
4 半導体ウェハ
5 半導体チップ
6 被着体
8 封止樹脂
10、11 ダイシング・ダイボンドフィルム
13 ダイシングブレード
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JP2011172099A JP2013038181A (ja) | 2011-08-05 | 2011-08-05 | ダイシング・ダイボンドフィルム |
US13/564,920 US20130034935A1 (en) | 2011-08-05 | 2012-08-02 | Dicing die-bonding film |
TW101128076A TW201313869A (zh) | 2011-08-05 | 2012-08-03 | 切割/晶片接合薄膜 |
KR1020120085292A KR20130016123A (ko) | 2011-08-05 | 2012-08-03 | 다이싱 다이 본드 필름 |
CN2012102761417A CN102911617A (zh) | 2011-08-05 | 2012-08-03 | 切割/芯片接合薄膜 |
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JP (1) | JP2013038181A (ja) |
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US10290531B2 (en) * | 2013-04-30 | 2019-05-14 | John Cleaon Moore | Release layer for subsequent manufacture of flexible substrates in microelectronic applications |
CN103589348A (zh) * | 2013-11-11 | 2014-02-19 | 美特科技(苏州)有限公司 | 一种紫外光固化胶黏剂及其应用 |
JP6312498B2 (ja) * | 2014-03-31 | 2018-04-18 | 日東電工株式会社 | ダイシングフィルム、ダイシング・ダイボンドフィルム及び半導体装置の製造方法 |
JP6393582B2 (ja) * | 2014-10-30 | 2018-09-19 | 株式会社オートネットワーク技術研究所 | ワイヤーハーネス |
KR101799499B1 (ko) | 2014-12-24 | 2017-12-20 | 주식회사 엘지화학 | 반도체 접착용 수지 조성물, 접착 필름, 다이싱 다이본딩 필름 및 반도체 장치 |
KR101953774B1 (ko) | 2015-07-10 | 2019-05-17 | 주식회사 엘지화학 | 반도체 접착용 수지 조성물 및 다이싱 다이본딩 필름 |
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JP2001060601A (ja) * | 1999-08-19 | 2001-03-06 | Sony Chem Corp | 接着材料及び回路接続方法 |
JP2004051970A (ja) * | 2002-05-30 | 2004-02-19 | Mitsui Chemicals Inc | 接着剤樹脂組成物及びそれを用いたフィルム状接着剤 |
JP2010275509A (ja) * | 2009-06-01 | 2010-12-09 | Furukawa Electric Co Ltd:The | 粘着フィルム及び半導体ウエハ加工用テープ |
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US20100099240A1 (en) * | 2006-07-19 | 2010-04-22 | Kouji Watanabe | Dicing/die-bonding tape and method for manufacturing semiconductor chip |
WO2008108131A1 (ja) * | 2007-03-01 | 2008-09-12 | Nitto Denko Corporation | 熱硬化型ダイボンドフィルム |
JP4430085B2 (ja) * | 2007-03-01 | 2010-03-10 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
CN101669194A (zh) * | 2007-04-19 | 2010-03-10 | 积水化学工业株式会社 | 切片及芯片接合带和半导体芯片的制造方法 |
JP2010129699A (ja) * | 2008-11-26 | 2010-06-10 | Nitto Denko Corp | ダイシング・ダイボンドフィルム及び半導体装置の製造方法 |
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JP2001060601A (ja) * | 1999-08-19 | 2001-03-06 | Sony Chem Corp | 接着材料及び回路接続方法 |
JP2004051970A (ja) * | 2002-05-30 | 2004-02-19 | Mitsui Chemicals Inc | 接着剤樹脂組成物及びそれを用いたフィルム状接着剤 |
JP2010275509A (ja) * | 2009-06-01 | 2010-12-09 | Furukawa Electric Co Ltd:The | 粘着フィルム及び半導体ウエハ加工用テープ |
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JP2015198107A (ja) * | 2014-03-31 | 2015-11-09 | 住友ベークライト株式会社 | 半導体用ウエハ加工用粘着テープ |
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KR20130016123A (ko) | 2013-02-14 |
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