JP2013030709A5 - - Google Patents
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- JP2013030709A5 JP2013030709A5 JP2011167612A JP2011167612A JP2013030709A5 JP 2013030709 A5 JP2013030709 A5 JP 2013030709A5 JP 2011167612 A JP2011167612 A JP 2011167612A JP 2011167612 A JP2011167612 A JP 2011167612A JP 2013030709 A5 JP2013030709 A5 JP 2013030709A5
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- processing liquid
- storage tank
- intermediate storage
- liquid supply
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Description
前記の目的を達成するため、本発明は、基板に対して処理液を供給する供給ノズルに、処理液供給源から処理液供給管を通じて処理液を供給する処理液供給装置であって、前記処理液供給管における前記処理液供給源と前記供給ノズルとの間に設けられ、前記処理液供給源から供給された処理液を一旦貯留する中間貯槽を有し、前記中間貯槽は、当該中間貯槽の内部に貯留された処理液に直流電圧を印加する電極と、前記電極に対して、極性反転自在に直流電圧を印加する電源ユニットと、前記中間貯槽へ洗浄液を供給する洗浄液供給管と、を有していることを特徴としている。
To achieve the above object, the present invention provides a processing liquid supply apparatus for supplying a processing liquid from a processing liquid supply source to a supply nozzle for supplying a processing liquid to a substrate through a processing liquid supply pipe. Provided between the processing liquid supply source and the supply nozzle in the liquid supply pipe, and having an intermediate storage tank for temporarily storing the processing liquid supplied from the processing liquid supply source; Yes an electrode for applying a DC voltage to the processing liquid stored therein, with respect to the electrode, and a power supply unit for applying a polarity inversion freely DC voltage, and a cleaning liquid supply pipe for supplying a cleaning liquid to said intermediate reservoir It is characterized by that.
一般に、処理液中のパーティクルは正か負のいずれかの電荷を帯電している。そして、本発明によれば、中間貯槽内に電極が設けられているので、当該電極に直流電圧を印加することで、従来のフィルタでは除去することが困難であった処理液中の微小パーティクルを電極により捕集することができる。また、洗浄液供給源から中間貯槽に洗浄液を供給するための洗浄液供給管を有し、電極に電圧を印加する電源ユニットが極性反転自在であるため、中間貯槽に洗浄液を供給する際に電極に印加する直流電圧の極性を反転させることで電極に捕集されていたパーティクルを放出することができる。したがって、本発明によれば、従来のフィルタでは除去することが困難であった処理液中の微小なパーティクルを除去し、且つ従来のフィルタのように目詰まりによる交換作業が発生しないのでメンテナンスも容易となるため、効率のよいパーティクルの除去が可能となる。
In general, particles in the treatment liquid are charged with either positive or negative charge. And according to this invention, since the electrode is provided in the intermediate | middle storage tank, by applying a DC voltage to the said electrode, the fine particle in the process liquid which was difficult to remove with the conventional filter is removed. It can be collected by the electrode. Also, it has a cleaning liquid supply pipe for supplying cleaning liquid from the cleaning liquid supply source to the intermediate storage tank, and the power supply unit that applies a voltage to the electrode is freely reversible, so it is applied to the electrode when supplying the cleaning liquid to the intermediate storage tank. the inverting the polarity of the DC voltage to be particles which have collected on the electrodes Rukoto can Rukoto issue release. Therefore, according to the present invention, to remove fine particles in the treatment liquid is difficult to remove with conventional filters, and so replacement due to clogging as in the conventional filter is not generated maintenance Therefore, it is possible to efficiently remove particles.
前記中間貯槽から洗浄液を排出する廃液管を有していてもよい。
You may have the waste liquid pipe which discharges cleaning fluid from the above-mentioned intermediate storage tank .
別な観点による本発明は、基板に対して処理液を供給する供給ノズルに、処理液供給源から処理液供給管を通じて処理液を供給する処理液供給方法であって、前記処理液供給源から供給された処理液を、前記処理液供給管における、前記処理液供給源と前記供給ノズルとの間に設けられた中間貯槽に一旦貯留し、その後、前記中間貯槽に設けられた電極を介して、前記中間貯槽中の処理液に直流電圧を印加して処理液中の異物を電極に捕集し、その後、異物が除去された前記中間貯槽内の処理液を前記供給ノズルに供給し、前記供給ノズルへの処理液の供給を停止した後に、前記電極に印加した直流電圧の極性を反転又は前記電極への電圧の印加を停止し、その後、前記中間貯槽に洗浄液を供給して前記中間貯槽内を洗浄することを特徴としている。
According to another aspect of the present invention, there is provided a processing liquid supply method for supplying a processing liquid from a processing liquid supply source to a supply nozzle for supplying a processing liquid to a substrate through a processing liquid supply pipe, from the processing liquid supply source. The supplied processing liquid is temporarily stored in an intermediate storage tank provided between the processing liquid supply source and the supply nozzle in the processing liquid supply pipe, and then, via an electrode provided in the intermediate storage tank. Then, a DC voltage is applied to the treatment liquid in the intermediate storage tank to collect foreign matter in the treatment liquid on the electrode, and then the treatment liquid in the intermediate storage tank from which the foreign matter has been removed is supplied to the supply nozzle, After stopping the supply of the processing liquid to the supply nozzle, the polarity of the DC voltage applied to the electrode is reversed or the application of the voltage to the electrode is stopped, and then the cleaning liquid is supplied to the intermediate storage tank and the intermediate storage tank washing the inner characterized There.
別な観点による本発明によれば、前記処理液供給方法を処理液供給装置によって実行させるように、当該処理液供給システムを制御する制御装置のコンピュータ上で動作するプログラムが提供される。
According to another aspect of the present invention, there is provided a program that runs on a computer of a control device that controls the processing liquid supply system so that the processing liquid supply method is executed by the processing liquid supply apparatus.
Claims (11)
前記処理液供給管における前記処理液供給源と前記供給ノズルとの間に設けられ、前記処理液供給源から供給された処理液を一旦貯留する中間貯槽を有し、
前記中間貯槽は、当該中間貯槽の内部に貯留された処理液に直流電圧を印加する電極と、
前記電極に対して、極性反転自在に直流電圧を印加する電源ユニットと、
前記中間貯槽へ洗浄液を供給する洗浄液供給管と、を有することを特徴とする、処理液供給装置。 A processing liquid supply device for supplying a processing liquid from a processing liquid supply source to a supply nozzle for supplying a processing liquid to a substrate through a processing liquid supply pipe,
An intermediate storage tank that is provided between the processing liquid supply source and the supply nozzle in the processing liquid supply pipe and temporarily stores the processing liquid supplied from the processing liquid supply source;
The intermediate storage tank, an electrode for applying a DC voltage to the processing liquid stored in the intermediate storage tank,
A power supply unit that applies a DC voltage to the electrode so as to freely reverse the polarity;
And having a cleaning liquid supply tube for supplying cleaning liquid to the intermediate storage tank, the processing solution supplying device.
他方の極は、前記中間貯槽の外側に設けられ、
前記撹拌機構は、前記中間貯槽の内部に設けられた方の極を上下方向に昇降させる昇降機構であることを特徴とする、請求項２に記載の処理液供給装置。 Either one of the positive electrode and the negative electrode of the electrode is formed in a mesh plate shape parallel to the bottom surface of the intermediate storage tank, and is provided inside the intermediate storage tank.
The other pole is provided outside the intermediate storage tank,
The processing liquid supply apparatus according to claim 2, wherein the agitation mechanism is an elevating mechanism that elevates and lowers one of the poles provided in the intermediate storage tank in the vertical direction.
他方の極は、前記中間貯槽の外側に設けられ、
前記撹拌機構は、前記回転軸を回転させる回転機構であることを特徴とする請求項２に記載の処理液供給装置。 Either one of the positive electrode and the negative electrode of the electrode is formed in a mesh plate shape, and is provided along the rotation axis provided to extend in the vertical direction inside the intermediate storage tank,
The other pole is provided outside the intermediate storage tank,
The processing liquid supply apparatus according to claim 2, wherein the stirring mechanism is a rotating mechanism that rotates the rotating shaft.
前記処理液供給源から供給された処理液を、前記処理液供給管における、前記処理液供給源と前記供給ノズルとの間に設けられた中間貯槽に一旦貯留し、
その後、前記中間貯槽に設けられた電極を介して、前記中間貯槽中の処理液に直流電圧を印加して処理液中の異物を電極に捕集し、
その後、異物が除去された前記中間貯槽内の処理液を前記供給ノズルに供給し、
前記供給ノズルへの処理液の供給を停止した後に、前記電極に印加した直流電圧の極性を反転又は前記電極への電圧の印加を停止し、
その後、前記中間貯槽に洗浄液を供給して前記中間貯槽内を洗浄することを特徴とする、処理液供給方法。 A processing liquid supply method for supplying a processing liquid from a processing liquid supply source to a supply nozzle for supplying a processing liquid to a substrate through a processing liquid supply pipe,
The processing liquid supplied from the processing liquid supply source is temporarily stored in an intermediate storage tank provided between the processing liquid supply source and the supply nozzle in the processing liquid supply pipe,
Then, through the electrode provided in the intermediate storage tank, to apply a DC voltage to the processing liquid in the intermediate storage tank to collect the foreign matter in the processing liquid to the electrode,
Thereafter, the processing liquid in the intermediate storage tank from which the foreign matter has been removed is supplied to the supply nozzle,
After stopping the supply of the treatment liquid to the supply nozzle, the polarity of the DC voltage applied to the electrode is reversed or the application of the voltage to the electrode is stopped,
Thereafter, a cleaning liquid is supplied to the intermediate storage tank to clean the inside of the intermediate storage tank.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011167612A JP5503602B2 (en) | 2011-07-29 | 2011-07-29 | Processing liquid supply apparatus, processing liquid supply method, program, and computer storage medium |
| US14/233,007 US9308542B2 (en) | 2011-07-29 | 2012-05-15 | Treatment solution supply apparatus, treatment solution supply method, and computer storage medium |
| PCT/JP2012/062394 WO2013018414A1 (en) | 2011-07-29 | 2012-05-15 | Treatment liquid supply device, treatment liquid supply method and computer storage medium |
| KR1020147001117A KR101945566B1 (en) | 2011-07-29 | 2012-05-15 | Treatment liquid supply device, treatment liquid supply method and computer storage medium |
| TW101119348A TWI524454B (en) | 2011-07-29 | 2012-05-30 | Processing liquid supplying apparatus, processing liquid supplying method and storage medium for computer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011167612A JP5503602B2 (en) | 2011-07-29 | 2011-07-29 | Processing liquid supply apparatus, processing liquid supply method, program, and computer storage medium |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013030709A JP2013030709A (en) | 2013-02-07 |
| JP2013030709A5 true JP2013030709A5 (en) | 2013-11-14 |
| JP5503602B2 JP5503602B2 (en) | 2014-05-28 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011167612A Active JP5503602B2 (en) | 2011-07-29 | 2011-07-29 | Processing liquid supply apparatus, processing liquid supply method, program, and computer storage medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5503602B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6159651B2 (en) * | 2013-11-25 | 2017-07-05 | 東京エレクトロン株式会社 | Filter cleaning method, liquid processing apparatus, and storage medium |
| KR20160053142A (en) * | 2014-10-31 | 2016-05-13 | 세메스 주식회사 | Apparatus for treating substrate |
| KR102296277B1 (en) * | 2014-12-30 | 2021-09-02 | 세메스 주식회사 | Substrate treating apparatus |
| JP6619773B2 (en) * | 2017-06-12 | 2019-12-11 | 武蔵 絵美理 | Solar panel installation base using the basic components used on the top plate of the International Organization for Standardization standard container |
| JP6850701B2 (en) * | 2017-08-10 | 2021-03-31 | 東京エレクトロン株式会社 | Cleaning method of treatment liquid supply device, coating treatment device and supply pipe of treatment liquid supply device |
-
2011
- 2011-07-29 JP JP2011167612A patent/JP5503602B2/en active Active
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