JP2013029786A5 - - Google Patents

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Publication number
JP2013029786A5
JP2013029786A5 JP2011167657A JP2011167657A JP2013029786A5 JP 2013029786 A5 JP2013029786 A5 JP 2013029786A5 JP 2011167657 A JP2011167657 A JP 2011167657A JP 2011167657 A JP2011167657 A JP 2011167657A JP 2013029786 A5 JP2013029786 A5 JP 2013029786A5
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JP
Japan
Prior art keywords
shows
manufacturing process
light shielding
provided below
shielding film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011167657A
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English (en)
Japanese (ja)
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JP2013029786A (ja
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Publication date
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Priority to JP2011167657A priority Critical patent/JP2013029786A/ja
Priority claimed from JP2011167657A external-priority patent/JP2013029786A/ja
Publication of JP2013029786A publication Critical patent/JP2013029786A/ja
Publication of JP2013029786A5 publication Critical patent/JP2013029786A5/ja
Pending legal-status Critical Current

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JP2011167657A 2011-07-29 2011-07-29 位相シフトマスクの製造方法及びパターン転写方法 Pending JP2013029786A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011167657A JP2013029786A (ja) 2011-07-29 2011-07-29 位相シフトマスクの製造方法及びパターン転写方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011167657A JP2013029786A (ja) 2011-07-29 2011-07-29 位相シフトマスクの製造方法及びパターン転写方法

Publications (2)

Publication Number Publication Date
JP2013029786A JP2013029786A (ja) 2013-02-07
JP2013029786A5 true JP2013029786A5 (enrdf_load_stackoverflow) 2014-01-16

Family

ID=47786850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011167657A Pending JP2013029786A (ja) 2011-07-29 2011-07-29 位相シフトマスクの製造方法及びパターン転写方法

Country Status (1)

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JP (1) JP2013029786A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI541590B (zh) * 2013-12-26 2016-07-11 Ｈｏｙａ股份有限公司 光罩之製造方法、光罩及圖案轉印方法
JP6540278B2 (ja) * 2015-06-29 2019-07-10 大日本印刷株式会社 光学素子の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3228354B2 (ja) * 1992-09-11 2001-11-12 凸版印刷株式会社 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクブランクの製造方法
JPH10333316A (ja) * 1997-05-29 1998-12-18 Hitachi Ltd 位相シフトマスク及びその製造方法
JP2002268197A (ja) * 2001-03-08 2002-09-18 Dainippon Printing Co Ltd 位相シフトマスクの製造方法および位相シフトマスク
KR100468735B1 (ko) * 2002-06-12 2005-01-29 삼성전자주식회사 얼터네이팅 위상 반전 마스크의 제조방법
JP4562419B2 (ja) * 2004-05-10 2010-10-13 シャープ株式会社 位相シフトマスク及びその製造方法
US7862960B2 (en) * 2004-06-22 2011-01-04 Hoya Corporation Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
JP4005622B1 (ja) * 2006-09-04 2007-11-07 ジオマテック株式会社 フォトマスク用基板及びフォトマスク並びにその製造方法

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