JP2013025251A5 - - Google Patents
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- Publication number
- JP2013025251A5 JP2013025251A5 JP2011162157A JP2011162157A JP2013025251A5 JP 2013025251 A5 JP2013025251 A5 JP 2013025251A5 JP 2011162157 A JP2011162157 A JP 2011162157A JP 2011162157 A JP2011162157 A JP 2011162157A JP 2013025251 A5 JP2013025251 A5 JP 2013025251A5
- Authority
- JP
- Japan
- Prior art keywords
- imaging
- unit
- image pickup
- points
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003384 imaging method Methods 0.000 claims description 38
- 238000001514 detection method Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000001574 biopsy Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011162157A JP5854680B2 (ja) | 2011-07-25 | 2011-07-25 | 撮像装置 |
| US14/234,516 US20140160267A1 (en) | 2011-07-25 | 2012-07-10 | Image Pickup Apparatus |
| CN201280036063.1A CN103688205A (zh) | 2011-07-25 | 2012-07-10 | 摄像装置 |
| PCT/JP2012/068046 WO2013015143A1 (en) | 2011-07-25 | 2012-07-10 | Image pickup apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011162157A JP5854680B2 (ja) | 2011-07-25 | 2011-07-25 | 撮像装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013025251A JP2013025251A (ja) | 2013-02-04 |
| JP2013025251A5 true JP2013025251A5 (enExample) | 2014-07-24 |
| JP5854680B2 JP5854680B2 (ja) | 2016-02-09 |
Family
ID=47600994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011162157A Expired - Fee Related JP5854680B2 (ja) | 2011-07-25 | 2011-07-25 | 撮像装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20140160267A1 (enExample) |
| JP (1) | JP5854680B2 (enExample) |
| CN (1) | CN103688205A (enExample) |
| WO (1) | WO2013015143A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2587313B1 (en) * | 2011-10-20 | 2016-05-11 | Samsung Electronics Co., Ltd | Optical measurement system and method for measuring critical dimension of nanostructure |
| US9322640B2 (en) * | 2012-08-07 | 2016-04-26 | Samsing Electronics Co., Ltd. | Optical measuring system and method of measuring critical size |
| DE102013006994A1 (de) * | 2013-04-19 | 2014-10-23 | Carl Zeiss Microscopy Gmbh | Digitalmikroskop und Verfahren zur Optimierung des Arbeitsablaufes in einem Digitalmikroskop |
| US9842256B2 (en) * | 2013-07-17 | 2017-12-12 | International Business Machines Corporation | Detection of astronomical objects |
| FR3013128B1 (fr) | 2013-11-13 | 2016-01-01 | Univ Aix Marseille | Dispositif et methode de mise au point tridimensionnelle pour microscope |
| CN104198164B (zh) * | 2014-09-19 | 2017-02-15 | 中国科学院光电技术研究所 | 一种基于哈特曼波前检测原理的检焦方法 |
| JP6134348B2 (ja) * | 2015-03-31 | 2017-05-24 | シスメックス株式会社 | 細胞撮像装置及び細胞撮像方法 |
| JP6692660B2 (ja) * | 2016-03-01 | 2020-05-13 | 株式会社Screenホールディングス | 撮像装置 |
| US10341567B2 (en) * | 2016-03-16 | 2019-07-02 | Ricoh Imaging Company, Ltd. | Photographing apparatus |
| GB201610434D0 (en) * | 2016-06-15 | 2016-07-27 | Q-Linea Ab | Image based analysis of samples |
| JP7604354B2 (ja) * | 2021-10-29 | 2024-12-23 | 株式会社ニューフレアテクノロジー | 検査装置及び焦点位置調整方法 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3329018B2 (ja) * | 1993-08-25 | 2002-09-30 | 株式会社島津製作所 | 赤外顕微鏡 |
| US5956141A (en) * | 1996-09-13 | 1999-09-21 | Olympus Optical Co., Ltd. | Focus adjusting method and shape measuring device and interference microscope using said focus adjusting method |
| US6055054A (en) * | 1997-05-05 | 2000-04-25 | Beaty; Elwin M. | Three dimensional inspection system |
| JP4332905B2 (ja) * | 1998-02-12 | 2009-09-16 | 株式会社ニコン | 顕微鏡システム |
| JP4544850B2 (ja) * | 2002-11-29 | 2010-09-15 | オリンパス株式会社 | 顕微鏡画像撮影装置 |
| US7064824B2 (en) * | 2003-04-13 | 2006-06-20 | Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. | High spatial resoulution imaging and modification of structures |
| JP2006039315A (ja) * | 2004-07-28 | 2006-02-09 | Hamamatsu Photonics Kk | 自動焦点装置及びそれを用いた顕微鏡装置 |
| JP4582406B2 (ja) * | 2004-12-28 | 2010-11-17 | ソニー株式会社 | 生体撮像装置 |
| JP4577126B2 (ja) * | 2005-07-08 | 2010-11-10 | オムロン株式会社 | ステレオ対応づけのための投光パターンの生成装置及び生成方法 |
| US20070031056A1 (en) * | 2005-08-02 | 2007-02-08 | Perz Cynthia B | System for and method of focusing in automated microscope systems |
| FR2889774B1 (fr) * | 2005-08-12 | 2009-10-16 | Thales Sa | Source laser a recombinaison coherente de faisceaux |
| JP4773198B2 (ja) * | 2005-12-22 | 2011-09-14 | シスメックス株式会社 | 標本撮像装置及びこれを備える標本分析装置 |
| CA2648305C (en) * | 2006-04-07 | 2012-10-16 | Amo Wavefront Sciences, Llc | Geometric measurement system and method of measuring a geometric characteristic of an object |
| US7768654B2 (en) * | 2006-05-02 | 2010-08-03 | California Institute Of Technology | On-chip phase microscope/beam profiler based on differential interference contrast and/or surface plasmon assisted interference |
| WO2008010417A1 (en) * | 2006-07-20 | 2008-01-24 | Nikon Corporation | Optical fiber amplifier, light source device, exposure device, object inspection device, and treatment device |
| JPWO2008069220A1 (ja) * | 2006-11-30 | 2010-03-18 | 株式会社ニコン | 結像装置及び顕微鏡 |
| WO2008126647A1 (ja) * | 2007-04-05 | 2008-10-23 | Nikon Corporation | 形状測定装置及び形状測定方法 |
| US8059336B2 (en) * | 2007-05-04 | 2011-11-15 | Aperio Technologies, Inc. | Rapid microscope scanner for volume image acquisition |
| CN201050978Y (zh) * | 2007-06-15 | 2008-04-23 | 西安普瑞光学仪器有限公司 | 白光干涉测量样品表面形状精细分布的装置 |
| WO2009089387A1 (en) * | 2008-01-08 | 2009-07-16 | Amo Wavefront Sciences Llc | Systems and methods for measuring surface shape |
| US8325349B2 (en) * | 2008-03-04 | 2012-12-04 | California Institute Of Technology | Focal plane adjustment by back propagation in optofluidic microscope devices |
| US8294903B2 (en) * | 2008-09-30 | 2012-10-23 | Panasonic Corporation | Surface shape measurement apparatus and method |
| JP5368261B2 (ja) * | 2008-11-06 | 2013-12-18 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法 |
| JP5712342B2 (ja) * | 2008-11-27 | 2015-05-07 | ナノフォトン株式会社 | 光学顕微鏡、及びスペクトル測定方法 |
| JP5395507B2 (ja) * | 2009-05-21 | 2014-01-22 | キヤノン株式会社 | 三次元形状測定装置、三次元形状測定方法及びコンピュータプログラム |
| CN201540400U (zh) * | 2009-11-19 | 2010-08-04 | 福州福特科光电有限公司 | 光纤熔接机的显微成像光路的调节结构 |
| EP2353736A1 (en) * | 2010-01-29 | 2011-08-10 | 3M Innovative Properties Company | Continuous process for forming a multilayer film and multilayer film prepared by such method |
| FR2967791B1 (fr) * | 2010-11-22 | 2012-11-16 | Ecole Polytech | Procede et systeme de calibration d'un modulateur optique spatial dans un microscope optique |
| JP5829030B2 (ja) * | 2011-03-23 | 2015-12-09 | オリンパス株式会社 | 顕微鏡 |
| JP6195830B2 (ja) * | 2011-07-14 | 2017-09-13 | ホワルド フグヘス メドイクアル インストイトウテ | 適応光学系を有する顕微鏡検査法 |
| US8593622B1 (en) * | 2012-06-22 | 2013-11-26 | Raytheon Company | Serially addressed sub-pupil screen for in situ electro-optical sensor wavefront measurement |
-
2011
- 2011-07-25 JP JP2011162157A patent/JP5854680B2/ja not_active Expired - Fee Related
-
2012
- 2012-07-10 WO PCT/JP2012/068046 patent/WO2013015143A1/en not_active Ceased
- 2012-07-10 CN CN201280036063.1A patent/CN103688205A/zh active Pending
- 2012-07-10 US US14/234,516 patent/US20140160267A1/en not_active Abandoned
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