JP2012501831A - 新規の固体物質及びガスストリームからのco2の除去法 - Google Patents
新規の固体物質及びガスストリームからのco2の除去法 Download PDFInfo
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Abstract
Description
A)多孔性物質、溶媒及び結合剤のスラリーを形成する工程、
B)前記スラリーを基材上に塗布し、乾燥し、ついで、温度200−1000℃でか焼する工程、
C)多孔性物質に、少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒を含浸させる工程、及び
D)前記基材を乾燥して、前記吸収剤物質を得る工程
を含んでなる。任意に、工程D)に続いて、工程E)を含むことができ、工程E)は、多孔性物質上に塗布された触媒及びアミンをもつ基材を、温度200−1000℃においてか焼することを含む。任意に、工程B)における乾燥を温度20−150℃において行うことができる。任意に、工程D)における乾燥を温度20−150℃において行うことができる。
A)多孔性物質に、少なくとも1つの二酸化炭素活性化触媒を湿式含浸する工程、
B)多孔性物質を乾燥する工程、
C)前記多孔性物質、溶媒及び結合剤のスラリーを形成する工程、
D)前記スラリーを基材上に塗布する工程、
E)前記基材を乾燥し、ついで、温度200−1000℃でか焼して、基材上に多孔性物質を不動化させる工程、
F)基材上に不動化された多孔性物質上に、少なくとも1つのアミンを湿式含浸する工程、及び
G)前記基材を乾燥して、前記吸収剤物質を得る工程
を含んでなる。任意に、この方法の工程B)は、さらに、多孔性物質の乾燥工程に続いて、多孔性物質を温度200−1000℃においてか焼する工程を含むことができる。任意に、工程B)における乾燥を温度20−150℃において行うことができる。任意に、工程E)における前記基材の乾燥を温度20−150℃において行うことができる。任意に、工程G)における前記基材の乾燥を温度20−200℃において行うことができる。
1)大きい比表面積を有する多抗生物質;
2)アミン;及び
3)アミンの二酸化炭素との相互作用を促進することができる触媒
を含んでなり、アミン及び触媒は、好ましくは、多孔性物質上に共−不動化される。
Claims (23)
- 燃料の燃焼の間に発生したプロセスガスから二酸化炭素を除去するシステムであって、前記システムは、少なくとも1つの吸収容器を含んでなり、前記プロセスガスは、この吸収容器を通って送給され、前記吸収容器は、吸収物質を具備しており、前記吸収物質は、当該吸収物質を通って送給されるプロセスガスから二酸化炭素を可逆的に収集するように作動するものであり、前記吸収物質は、少なくとも1つのアミン、少なくとも1つの二酸化炭素活性化触媒、及び前記少なくとも1つのアミン及び前記少なくとも1つの触媒を支持する少なくとも1つの多孔性物質を含んでなるものである、二酸化炭素の除去システム。
- 少なくとも1つの二酸化炭素活性化触媒が、有機金属錯体触媒、無機金属錯体触媒、金属酸化物、及び金属ハロゲン化物からなる触媒群から選ばれる触媒を含んでなるものである、請求項1記載のシステム。
- 少なくとも1つの二酸化炭素活性化触媒が、有機遷移金属錯体触媒、及び無機遷移金属錯体触媒からなる触媒群から選ばれる触媒を含んでなるものである、請求項2記載のシステム。
- 少なくとも1つのアミンが、第2級アミンを含んでなるものである、請求項1記載のシステム。
- 少なくとも1つのアミンが、少なくとも1つのヒドロキシル基を有するアミンを含んでなるものである、請求項1記載のシステム。
- 少なくとも1つのアミンが、少なくとも2つのヒドロキシル基を有する第2級アミンを含んでなるものである、請求項1記載のシステム。
- 少なくとも1つのアミン及び少なくとも1つの触媒を支持する少なくとも1つの多孔性物質が、少なくとも50m2/gのBET比表面積を有するものである、請求項1記載のシステム。
- 少なくとも1つの多孔性物質が、100−1000 m2/gのBET比表面積を有するものである、請求項7記載のシステム。
- 少なくとも1つの二酸化炭素活性化触媒が、少なくとも1つのアミンを支持する多孔性物質としても機能するものである、請求項1記載のシステム。
- 少なくとも1つの二酸化炭素活性化触媒及び少なくとも1つのアミンを支持する多孔性物質が、基材上に吸収剤層として提供されている、請求項1記載のシステム。
- 基材が、プロセスガスの流れの少なくとも一部を受け取るように機能する少なくとも1つの通路の少なくとも一部を形成する、請求項10記載のシステム。
- 基材がモノリシックユニットを形成している、請求項11記載のシステム。
- モノリシックユニットが、フロースルーモノリシックユニットである、請求項12記載のシステム。
- モノリシックユニットが、壁流モノリシックユニットである、請求項12記載のシステム。
- 基材が、少なくとも1つの乱流促進手段を含んでなる構造充填物である、請求項11記載のシステム。
- 燃料の燃焼の間に発生したプロセスガスが通過する吸収容器における二酸化炭素の可逆的な吸収のために採用される吸収剤物質を製造する方法であって、少なくとも1つの多孔性物質上に、少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒を不動化させることによって前記吸収剤物質を形成することを含んでなる吸収剤物質の製法。
- 少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒を、多孔性物質の上に共−不動化させる、請求項16記載の方法。
- 少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒が不動化されている多孔性物質を、基材上に被覆して、前記基材上に吸収剤層を形成する、請求項16記載の方法。
- 少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒を不動化させる前に、多孔性物質を、基材上に被覆する、請求項16記載の方法。
- さらに、
A)多孔性物質、溶媒及び結合剤のスラリーを形成し、
B)前記スラリーを基材上に塗布し、続いて、乾燥し、ついで、温度200−1000℃でか焼し、
C)多孔性物質に、少なくとも1つのアミン及び少なくとも1つの二酸化炭素活性化触媒を含浸させ、及び
D)前記基材を乾燥して、前記吸収剤物質を得る
ことを含んでなる、請求項16記載の方法。 - A)多孔性物質に、少なくとも1つの二酸化炭素活性化触媒を湿式含浸する工程、
B)多孔性物質を乾燥する工程、
C)前記多孔性物質、溶媒及び結合剤のスラリーを形成する工程、
D)前記スラリーを基材上に塗布する工程、
E)前記基材を乾燥し、続いて、温度200−1000℃でか焼して、基材上に多孔性物質を不動化させる工程、
F)基材上に不動化された多孔性物質上に、少なくとも1つのアミンを湿式含浸する工程、及び
G)前記基材を乾燥して、前記吸収剤物質を得る工程
を含んでなる、請求項16記載の方法。 - 燃料の燃焼の間に発生したプロセスガスが通過する吸収容器における二酸化炭素の可逆的な吸収のために採用される吸収剤物質を製造する方法であって、二酸化炭素活性化触媒を含んでなる少なくとも1つの多孔性物質上に、少なくとも1つのアミンを不動化させることによって前記吸収剤物質を形成することを含んでなる吸収剤物質の製法。
- 燃料の燃焼の間に発生したプロセスガスから二酸化炭素を除去する方法であって、前記方法は、
プロセスガスを、プロセスガスから二酸化炭素を可逆的に収集するように作動する吸収剤物質と接触させ;及び
前記プロセスガスを、少なくとも1つのアミン、少なくとも1つの二酸化炭素活性化触媒、及び前記少なくとも1つのアミン及び前記少なくとも1つの触媒を支持する少なくとも1つの多孔性物質を含んでなる吸収剤物質と接触させて、前記少なくとも1つの二酸化炭素活性化触媒の影響下において、二酸化炭素を前記少なくとも1つのアミンによって吸収させる
ことを含んでなる、二酸化炭素の除去法。
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US12/537,666 | 2009-08-07 | ||
PCT/US2009/055474 WO2010027929A1 (en) | 2008-09-05 | 2009-08-31 | Novel solid materials and method for co2 removal from gas stream |
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KR (1) | KR101303189B1 (ja) |
CN (1) | CN102143792B (ja) |
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CA (1) | CA2736214C (ja) |
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JP2000502289A (ja) * | 1996-10-22 | 2000-02-29 | ユナイテッド テクノロジーズ コーポレイション | 再生可能な固体アミン吸収剤 |
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WO2010027929A1 (en) | 2010-03-11 |
JP5550649B2 (ja) | 2014-07-16 |
MX2011002010A (es) | 2011-04-26 |
US20100154636A1 (en) | 2010-06-24 |
ZA201101394B (en) | 2012-05-30 |
CN102143792A (zh) | 2011-08-03 |
AU2009288208A1 (en) | 2010-03-11 |
KR101303189B1 (ko) | 2013-09-09 |
KR20110063815A (ko) | 2011-06-14 |
CA2736214A1 (en) | 2010-03-11 |
RU2535696C2 (ru) | 2014-12-20 |
EP2331234A1 (en) | 2011-06-15 |
US8118914B2 (en) | 2012-02-21 |
CA2736214C (en) | 2013-10-01 |
RU2011112920A (ru) | 2012-10-10 |
CN102143792B (zh) | 2014-03-12 |
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