JP2012251973A5 - - Google Patents

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Publication number
JP2012251973A5
JP2012251973A5 JP2011127021A JP2011127021A JP2012251973A5 JP 2012251973 A5 JP2012251973 A5 JP 2012251973A5 JP 2011127021 A JP2011127021 A JP 2011127021A JP 2011127021 A JP2011127021 A JP 2011127021A JP 2012251973 A5 JP2012251973 A5 JP 2012251973A5
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JP
Japan
Prior art keywords
mounting
heat
reaction
temperature gradient
mounting portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011127021A
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English (en)
Japanese (ja)
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JP2012251973A (ja
JP5842391B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2011127021A priority Critical patent/JP5842391B2/ja
Priority claimed from JP2011127021A external-priority patent/JP5842391B2/ja
Publication of JP2012251973A publication Critical patent/JP2012251973A/ja
Publication of JP2012251973A5 publication Critical patent/JP2012251973A5/ja
Application granted granted Critical
Publication of JP5842391B2 publication Critical patent/JP5842391B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011127021A 2011-06-07 2011-06-07 熱サイクル装置 Expired - Fee Related JP5842391B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011127021A JP5842391B2 (ja) 2011-06-07 2011-06-07 熱サイクル装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011127021A JP5842391B2 (ja) 2011-06-07 2011-06-07 熱サイクル装置

Publications (3)

Publication Number Publication Date
JP2012251973A JP2012251973A (ja) 2012-12-20
JP2012251973A5 true JP2012251973A5 (enExample) 2014-06-26
JP5842391B2 JP5842391B2 (ja) 2016-01-13

Family

ID=47524901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011127021A Expired - Fee Related JP5842391B2 (ja) 2011-06-07 2011-06-07 熱サイクル装置

Country Status (1)

Country Link
JP (1) JP5842391B2 (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0612821Y2 (ja) * 1989-01-26 1994-04-06 東亜医用電子株式会社 試料撹拌装置
EP1415113B1 (en) * 2001-07-16 2011-08-31 Idaho Technology, Inc. Thermal cycling system and method of use
KR100488281B1 (ko) * 2001-09-15 2005-05-10 아람 바이오시스템 주식회사 열 대류를 이용한 염기서열 증폭 방법 및 장치
JP3557419B2 (ja) * 2002-05-24 2004-08-25 株式会社日立製作所 ハイブリダイゼーション方法および装置
JP2006526406A (ja) * 2003-06-05 2006-11-24 バイオプロセッサーズ コーポレイション 基材を操作するための装置および方法
JP2006110523A (ja) * 2004-10-18 2006-04-27 Hitachi Software Eng Co Ltd 化学反応装置
JP5196126B2 (ja) * 2007-12-10 2013-05-15 セイコーエプソン株式会社 生体試料反応装置および生体試料反応方法

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