JP2012251973A5

JP2012251973A5 -

Info

Publication number: JP2012251973A5
Application number: JP2011127021A
Authority: JP
Filing date: 2011-06-07
Publication date: 2014-06-26
Anticipated expiration: 2031-06-07

Claims

A reaction vessel having a longitudinal direction, filled with a reaction liquid and a liquid having a specific gravity different from that of the reaction liquid and immiscible with the reaction liquid, and including a flow path through which the reaction liquid moves in the longitudinal direction A first mounting portion capable of mounting;
A second mounting portion on which the reaction container can be mounted;
A temperature gradient forming section that forms a temperature gradient in the longitudinal direction with respect to the liquid when the reaction container is mounted on the first or second mounting section;
When the reaction vessel is mounted on the first or second mounting section, the first mounting section, the second mounting section, and the temperature gradient forming section are arranged so that the first portion of the flow path A first arrangement that is below in a direction in which gravity acts from a second part different from the first part of the flow path; and a second part in a direction in which gravity acts from the first part. A drive mechanism that switches between a lower second arrangement;
Including
The temperature gradient forming unit includes a heat source unit that generates heat, and a heat conduction unit that conducts heat generated in the heat source unit to the reaction vessel,
A part of said 1st mounting part and a part of 2nd mounting part comprise the said heat conduction part, and are the thermal cycle apparatuses provided in the position where the distance from the said heat-source part is equal.

Having a longitudinal direction, a reaction solution, different specific gravity from the reaction solution, and the reaction liquid and the liquid immiscible is filled with the reaction of the reaction solution contains a channel to move in the longitudinal direction A first mounting part capable of mounting a container;
A second mounting portion on which the reaction container can be mounted;
A temperature gradient forming section that forms a temperature gradient in the longitudinal direction with respect to the liquid when the reaction container is mounted on the first or second mounting section;
When the reaction container is mounted on the first or second mounting section, the first mounting section, the second mounting section, and the temperature gradient forming section are arranged in the first arrangement and the flow path. A drive mechanism for switching the position of the lowest point in the direction in which the gravity acts in a second arrangement different from the first arrangement;
Including
The temperature gradient forming unit includes:
A heat source part that generates heat, and a heat conduction part that conducts heat generated in the heat source part to the reaction vessel ,
A part of said 1st mounting part and a part of 2nd mounting part comprise the said heat conduction part , and are the thermal cycle apparatuses provided in the position where the distance from the said heat-source part is equal.

In the heat cycle apparatus according to claim 1 or 2 ,
Wherein the longitudinal direction of the reaction vessel first be mounted to the mounting portion, the longitudinal direction of the reaction vessel which is mounted on the second mounting portion, are parallel, the thermal cycler.

In the heat cycle apparatus according to any one of claims 1 to 3 ,
The drive mechanism is
The first and second mounting portions and the temperature gradient forming portion have components perpendicular to the direction in which gravity acts, and the reaction vessel is mounted on the first or second mounting portion. A heat cycle device that rotates about a rotation axis having a component perpendicular to the direction of movement.

The thermal cycle apparatus according to claim 4 , wherein
The first mounting portion and the second mounting portion are thermal cycle apparatuses provided symmetrically with respect to a plane including the rotation axis and parallel to the rotation axis.

In the heat cycle apparatus according to claim 4 or 5 ,
The thermal cycle device, wherein when projected onto a plane perpendicular to the rotation axis, a longest distance from the rotation axis to a point in the flow path is smaller than a longest distance connecting two points in the flow path.

In the heat cycle apparatus according to any one of claims 4 to 6 ,
The thermal cycle device, wherein when projected onto a plane parallel to the rotation axis, the first mounting portion and the second mounting portion are at different positions with respect to the direction of the rotation axis.