JP2012251972A5 - - Google Patents
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- JP2012251972A5 JP2012251972A5 JP2011127020A JP2011127020A JP2012251972A5 JP 2012251972 A5 JP2012251972 A5 JP 2012251972A5 JP 2011127020 A JP2011127020 A JP 2011127020A JP 2011127020 A JP2011127020 A JP 2011127020A JP 2012251972 A5 JP2012251972 A5 JP 2012251972A5
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- mounting portion
- mounting
- arrangement
- rotation axis
- thermal cycle
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Claims (5)
前記反応容器を装着可能な第２の装着部と、
前記第１又は第２の装着部に前記反応容器を装着した場合に、前記液体に対して、前記長手方向に温度勾配を形成する温度勾配形成部と、
前記第１の装着部及び第２の装着部並びに前記温度勾配形成部を、重力の作用する方向に対して垂直な成分を有し、かつ、前記第１の装着部又は第２の装着部に前記反応容器を装着した場合に前記移動方向に対して垂直な成分を有する回転軸で回転させる駆動機構と、
を含み、
前記回転軸に平行な平面に投影した場合に、前記回転軸の方向を基準として前記第１の装着部と前記第２の装着部とが異なる位置にあり、
前記回転軸に垂直な平面に投影した場合に、前記回転軸から前記流路内の点までの最長距離が、前記流路内の２点間を結ぶ最長距離よりも小さい、熱サイクル装置。 Having a longitudinal direction, a reaction solution, different specific gravity from the reaction solution, and the the reaction liquid is filled with a liquid immiscible is, a reaction vessel containing a flow channel wherein the reaction solution to move mountable A first mounting portion;
A second mounting portion on which the reaction container can be mounted;
A temperature gradient forming section that forms a temperature gradient in the longitudinal direction with respect to the liquid when the reaction container is mounted on the first or second mounting section;
The first mounting unit, the second mounting unit, and the temperature gradient forming unit have a component perpendicular to the direction in which gravity acts, and the first mounting unit or the second mounting unit. A drive mechanism that rotates a rotating shaft having a component perpendicular to the moving direction when the reaction vessel is mounted;
Including
When projected onto a plane parallel to the rotation axis, the first mounting portion and the second mounting portion are at different positions with respect to the direction of the rotation axis,
The thermal cycle device, wherein when projected onto a plane perpendicular to the rotation axis, a longest distance from the rotation axis to a point in the flow path is smaller than a longest distance connecting two points in the flow path.
前記駆動機構は、
前記第１の装着部又は第２の装着部に前記反応容器を装着した場合に、前記第１及び第２の装着部並びに前記温度勾配形成部を、第１の配置と、前記流路内において重力の作用する方向における最下点の位置が前記第１の配置とは異なる第２の配置と、の間で回転させ、
前記第１の配置から前記第２の配置へは、前記第１の装着部及び第２の装着部並びに前記温度勾配形成部を第１の回転方向に回転させ、
前記第２の配置から前記第１の配置へは、前記第１の装着部及び第２の装着部並びに前記温度勾配形成部を前記第１の回転方向とは異なる第２の回転方向に回転させる、熱サイクル装置。 The thermal cycle apparatus according to claim 1, wherein
The drive mechanism is
When the reaction vessel is attached to the first attachment part or the second attachment part, the first and second attachment parts and the temperature gradient forming part are arranged in the first arrangement and the flow path. position of the lowest point in the direction gravity is rotated between the different second arrangement is the first arrangement,
From the first arrangement to the second arrangement , the first mounting part, the second mounting part, and the temperature gradient forming part are rotated in a first rotation direction ,
From the second arrangement to the first arrangement , the first attachment portion, the second attachment portion, and the temperature gradient forming portion are rotated in a second rotation direction different from the first rotation direction . , Thermal cycle equipment.
前記第１の装着部に装着される前記反応容器における前記長手方向と、前記第２の装着部に装着される前記反応容器における前記長手方向とが平行である、熱サイクル装置。 The thermal cycle apparatus according to claim 1 or 2,
Wherein the longitudinal direction of the reaction vessel first be mounted to the mounting portion, the longitudinal direction of the reaction vessel which is mounted on the second mounting portion are parallel, the thermal cycler.
前記回転軸に垂直な平面に投影した場合に、前記第１の装着部と前記第２の装着部とが異なる位置にある、熱サイクル装置。 In the heat cycle apparatus according to any one of claims 1 to 3,
The thermal cycle device, wherein the first mounting portion and the second mounting portion are at different positions when projected onto a plane perpendicular to the rotation axis.
前記回転軸に垂直な平面に投影した場合に、前記回転軸が、前記第１の装着部と前記第２の装着部とに挟まれる領域にある、熱サイクル装置。 The thermal cycle apparatus according to claim 4, wherein
The thermal cycle device, wherein when projected onto a plane perpendicular to the rotation axis, the rotation axis is in a region sandwiched between the first mounting portion and the second mounting portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011127020A JP5849443B2 (en) | 2011-06-07 | 2011-06-07 | Heat cycle equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011127020A JP5849443B2 (en) | 2011-06-07 | 2011-06-07 | Heat cycle equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012251972A JP2012251972A (en) | 2012-12-20 |
| JP2012251972A5 true JP2012251972A5 (en) | 2014-06-26 |
| JP5849443B2 JP5849443B2 (en) | 2016-01-27 |
Family
ID=47524900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011127020A Active JP5849443B2 (en) | 2011-06-07 | 2011-06-07 | Heat cycle equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5849443B2 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0612821Y2 (en) * | 1989-01-26 | 1994-04-06 | 東亜医用電子株式会社 | Sample agitator |
| EP1415113B1 (en) * | 2001-07-16 | 2011-08-31 | Idaho Technology, Inc. | Thermal cycling system and method of use |
| JP3557419B2 (en) * | 2002-05-24 | 2004-08-25 | 株式会社日立製作所 | Hybridization method and apparatus |
| WO2004108269A2 (en) * | 2003-06-05 | 2004-12-16 | Bioprocessors Corp. | Apparatus and method for manipulating substrates |
| JP2006110523A (en) * | 2004-10-18 | 2006-04-27 | Hitachi Software Eng Co Ltd | Chemical reaction device |
| JP5196126B2 (en) * | 2007-12-10 | 2013-05-15 | セイコーエプソン株式会社 | Biological sample reaction apparatus and biological sample reaction method |
-
2011
- 2011-06-07 JP JP2011127020A patent/JP5849443B2/en active Active
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