JP2012208344A - Electro-optic device and electronic appliance - Google Patents

Abstract

PROBLEM TO BE SOLVED: To suppress stain-like display unevenness in the vicinity of dummy pixel electrodes arranged around a display pixel electrode.SOLUTION: An electro-optic device includes on a substrate: a display pixel portion having pixel electrodes arranged; and dummy pixel electrodes arranged surrounding the display pixel portion in a plan view, to which constant voltage is applied via switching elements and whose distance from the adjacent pixel electrode is longer than the distance between the pixel electrodes. The distance between the dummy pixel electrode and the pixel electrode adjacent thereto is longer than the distance between the pixel electrodes.

Description

  The present invention relates to an electro-optical device and an electronic apparatus.

As this type of electro-optical device, for example, there is a liquid crystal device in which a liquid crystal layer that is an electro-optical material is sandwiched between an element substrate and a counter substrate. The element substrate is provided with a plurality of pixel electrodes arranged in a matrix, and a region where the plurality of pixel electrodes are arranged is a display pixel portion.
On the other hand, among the plurality of pixel electrodes, it is difficult to perform a good electro-optical operation in the pixel electrode arranged at the outermost periphery of the display pixel portion or in the vicinity thereof, like the pixel electrode arranged near the center. There are challenges. For example, at the first stage or the last stage of scanning (rise or fall), the image signal written to the pixel electrode is likely to be affected by noise, timing shift, etc., so that the drive waveform may be disturbed and image quality may be degraded. Because. For this reason, among the plurality of pixel electrodes, those arranged on the outer edge of the display pixel portion may be handled as dummy pixel electrodes that do not contribute to image display (see Patent Document 1).

  More specifically, a plurality of dummy pixel electrodes are arranged in a frame shape around the display pixel portion that contributes to actual display. Although the dummy pixel electrode does not contribute to display, it is driven in the same manner as the pixel electrode in the display pixel portion. For example, an image signal for displaying a black solid image is given to the dummy pixel electrode, and the edge of the display pixel portion contributing to the display is blackened to suppress light leakage from the periphery of the display pixel portion. It is generally done.

  Further, as shown in Patent Document 2, the distance between the dummy pattern and the second wiring pattern (including the data electrode) is within a range of 30 μm to 100 μm, and damage due to static electricity can be prevented. Such a structure is known.

Japanese Patent Laying-Open No. 2005-077636 JP 2005-195944 A

However, when a black solid image is displayed on the dummy pixel electrode, the maximum (or minimum) voltage is continuously applied to the dummy pixel electrode. On the other hand, a halftone voltage is applied to the pixel electrode on average. Therefore, a lateral electric field generated due to a difference in applied voltage is continuously applied between adjacent pixel electrodes and dummy pixel electrodes. This lateral electric field causes the ionic impurities contained in the liquid crystal layer to move and become unevenly distributed, resulting in spot-like display unevenness where display is not properly performed, and reducing the reliability of the electro-optical device. there were.
Further, when the dummy pattern and the data electrode are separated by 30 μm or more, it is difficult to miniaturize, and there is a problem that the aperture ratio is lowered particularly in an application for enlarged projection such as a projection display device.

  The present invention is realized as the following forms or application examples, and further improves the above-described invention.

  Application Example 1 In the electro-optical device according to this application example, a plurality of pixel electrodes are applied to an image display area, a switching element is applied to the periphery of the image display area, and a predetermined potential is applied via the switching element. A dummy pixel electrode, and a gap between the dummy pixel electrode and the pixel electrode is larger than a gap between adjacent pixel electrodes.

  According to this, a dummy pixel electrode is provided in which the distance between adjacent pixel electrodes is larger than the distance between pixel electrodes. By taking a large gap between the dummy pixel electrode and the pixel electrode adjacent to the dummy pixel electrode, the horizontal electric field is alleviated and the occurrence of spot-like display unevenness can be prevented.

  Application Example 2 The electro-optical device according to the application example described above is characterized in that the pixel electrode and the dummy pixel electrode are provided with a capacitance electrode disposed so as to face each other through a dielectric film.

  According to the application example described above, by providing the capacitor electrode, the voltage applied to the pixel electrode is less likely to fluctuate, and the image quality can be improved.

  Application Example 3 In the electro-optical device according to the application example described above, an interval between the pixel electrode and the dummy pixel electrode is 0.8 μm or more and 1.6 μm or less.

  According to the application example described above, the lateral electric field generated by the fringe effect from the capacitor electrode and the lateral electric field generated in the gap between the dummy pixel electrode and the pixel electrode adjacent to the dummy pixel electrode are optimized to be lateral Electric field can be reduced. Therefore, it is possible to prevent the occurrence of spot-like display unevenness.

  Application Example 4 In the electro-optical device according to the application example described above, the size of the dummy pixel electrode is smaller than the size of the pixel electrode.

  According to the application example described above, the size of the dummy pixel electrode is smaller than the size of the pixel electrode. Therefore, the interval between the dummy pixel electrode and the pixel electrode adjacent to the dummy pixel electrode is increased, and the lateral electric field can be reduced. Therefore, it is possible to prevent the occurrence of spot-like display unevenness.

  Application Example 5 In the electro-optical device according to the application example described above, a plurality of the dummy pixel electrodes are arranged, and the shapes and intervals of the plurality of dummy pixel electrodes are aligned.

  According to the application example described above, by aligning the shape of the dummy pixel electrode and the gap, the disturbance of the lateral electric field due to the disturbance of the shape of the dummy pixel electrode and the gap in the region other than the display pixel portion can be suppressed. Since the disturbance of the horizontal electric field received by the display pixel portion due to the disturbance of the horizontal electric field in a region other than the display pixel portion can be suppressed, the occurrence of spot-like display unevenness can be prevented.

  Application Example 6 An electronic apparatus according to this application example includes the above-described electro-optical device.

  According to this, a projection display device, a mobile phone, an electronic notebook, a word processor, a viewfinder type or a monitor direct-view type video tape recorder, a workstation, and a video phone that are excellent in reliability by including the electro-optical device described above. Various electronic devices such as a POS terminal and a touch panel can be realized.

(A) is a schematic plan view which shows the structure of a liquid crystal device, (b) is a schematic sectional drawing which cut (a) by the H-H 'line. (A) is an equivalent circuit diagram showing the electrical configuration of the liquid crystal device, (b) is a plan view showing the arrangement of pixels and dummy pixels. The top view which shows transparently the positional relationship of each layer by the side of the element substrate which comprises a liquid crystal device. The top view which shows transparently the positional relationship of each layer by the side of the element substrate which comprises a liquid crystal device. Sectional drawing which shows the laminated structure which cut the top view shown to FIG.3, 4 by the A-A 'line. FIG. 6 is a plan layout view showing the vicinity of a boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes. FIG. 6 is a plan layout view showing the vicinity of a boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes. FIG. 6 is a plan layout view showing the vicinity of a boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes. The top view of the pixel in an image display part. FIG. 10 is a cross-sectional view taken along line A-A ′ of FIG. 9. The plane layout figure of the boundary vicinity of the pixel provided with a pixel electrode, and the pixel provided with a dummy pixel electrode. The plane layout figure of the boundary vicinity of the pixel provided with a pixel electrode, and the pixel provided with a dummy pixel electrode. The plane layout figure of the pixel provided with a pixel electrode, and the pixel provided with the dummy pixel electrode. Schematic which shows the structure of the projection type display apparatus as an electronic device.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. Note that the drawings to be used are appropriately enlarged or reduced so that the part to be described can be recognized.

  Further, in the following embodiments, for example, when “on the substrate” is described, the substrate is disposed so as to be in contact with the substrate, or is disposed on the substrate via another component, or the substrate. It is assumed that a part is arranged so as to be in contact with each other and a part is arranged via another component.

(First embodiment)
In the present embodiment, an active matrix liquid crystal device as an electro-optical device including a thin film transistor (TFT) as a switching element will be described as an example. This liquid crystal device can be suitably used as, for example, a light modulation element (liquid crystal light valve) of a projection type display device (liquid crystal projector) described later.

<Liquid crystal device>
First, a liquid crystal device as an electro-optical device according to the present embodiment will be described with reference to FIGS. 1A is a schematic plan view showing the configuration of the liquid crystal device, FIG. 1B is a schematic cross-sectional view taken along the line HH ′ of FIG. 1A, and FIG. An equivalent circuit diagram showing a typical configuration and FIG. 5B are plan views showing the arrangement of pixels and dummy pixels.

  As shown in FIGS. 1A and 1B, a liquid crystal device 100 according to the present embodiment includes an element substrate 10 and a counter substrate 20 as substrates disposed to face each other, and a liquid crystal layer 50 sandwiched between the pair of substrates. And have. As the element substrate 10 and the counter substrate 20, a transparent glass substrate such as quartz is used.

  The element substrate 10 is slightly larger than the counter substrate 20, and both substrates are bonded via a seal material 40 arranged in a frame shape, and liquid crystal having positive or negative dielectric anisotropy is sealed in the gap. A liquid crystal layer 50 is formed. As the sealing material 40, for example, an adhesive such as a thermosetting or ultraviolet curable epoxy resin is employed. A spacer (not shown) is mixed in the sealing material 40 to keep the distance between the pair of substrates constant.

  A light shielding film 21 is similarly provided in a frame shape inside the sealing material 40 arranged in a frame shape. The light shielding film 21 is made of, for example, a light shielding metal or metal oxide, and the inside of the light shielding film 21 is a display pixel portion E having a plurality of pixels P. Although not shown in FIG. 1, the display pixel portion E is also provided with a light shielding portion that divides a plurality of pixels P in a plane.

A data line driving circuit 101 is provided between the element substrate 10 and the sealing material 40 along one side. Further, an inspection circuit 103 is provided inside the sealing material 40 along the other one side facing the one side. Further, a scanning line driving circuit 102 is provided inside the sealing material 40 along the other two sides orthogonal to the one side and facing each other. A plurality of wirings 105 that connect the two scanning line driving circuits 102 are provided inside the sealing material 40 on the other side facing the one side. Wirings connected to the data line driving circuit 101 and the scanning line driving circuit 102 are connected to a plurality of external connection terminals 104 arranged along the one side.
Hereinafter, the direction along the one side will be referred to as the X direction, and the direction along the other two sides orthogonal to the one side will be described as the Y direction.
Note that the arrangement of the inspection circuit 103 is not limited to this, and the inspection circuit 103 may be provided at a position along the inner side of the sealant 40 between the data line driving circuit 101 and the display pixel portion E.

  As shown in FIG. 1B, on the surface of the element substrate 10 on the liquid crystal layer 50 side, the light-transmitting pixel electrode 9 and TFT 30 provided for each pixel P, the signal wiring, and the orientation for covering them. A film 18 is formed.

  On the surface of the counter substrate 20 on the liquid crystal layer 50 side, a light shielding film 21, an interlayer film layer 22 formed so as to cover the light shielding film 21, and a common electrode 23 provided so as to cover the interlayer film layer 22 are shared. An alignment film 24 covering the electrode 23 is provided.

  As shown in FIG. 1A, the light shielding film 21 is provided in a frame shape at a position where the data line driving circuit 101, the scanning line driving circuit 102, and the inspection circuit 103 overlap in plan view. Thus, the light incident from the counter substrate 20 side is shielded, and the malfunction of the peripheral circuits including these drive circuits due to the light is prevented. Further, unnecessary stray light is shielded from entering the display pixel portion E, and a high contrast in the display of the display pixel portion E is ensured.

  The interlayer film layer 22 is made of, for example, an inorganic material such as silicon oxide, and is provided so as to cover the light shielding film 21 with optical transparency. Examples of a method for forming such an interlayer film layer 22 include a method of forming a film using a plasma CVD method or the like.

  The common electrode 23 is made of, for example, a transparent conductive film such as ITO, and covers the interlayer film layer 22, and as shown in FIG. 1A, the common electrode 23 is provided on the element substrate 10 side by the vertical conduction portions 106 provided at the four corners of the counter substrate 20. It is electrically connected to the wiring.

  The alignment film 18 covering the pixel electrode 9 and the alignment film 24 covering the common electrode 23 are selected based on the optical design of the liquid crystal device 100. For example, an organic material such as polyimide is formed, and the surface thereof is rubbed so that liquid crystal molecules are subjected to a substantially horizontal alignment treatment, or an inorganic material such as SiOx (silicon oxide) is vapor-phase grown. And a film formed by a method and aligned substantially perpendicularly to liquid crystal molecules.

As illustrated in FIG. 2A, the liquid crystal device 100 is parallel to the plurality of scanning lines 11 and the plurality of data lines 6 that are insulated from each other and orthogonal to each other at least in the display pixel unit E. The capacitor wiring 200 is disposed on the substrate.
Here, the direction in which the scanning line 11 extends is the X direction (first direction), and the direction in which the data line 6 extends is the Y direction (second direction).

  A pixel electrode 9, a TFT 30, and a storage capacitor 70 are provided in a region divided by the scanning line 11, the data line 6, the capacitor wiring 200, and these signal lines, and these constitute a pixel circuit of the pixel P. is doing.

  The scanning line 11 is electrically connected to the gate electrode 30 b of the TFT 30, and the data line 6 is electrically connected to the source part 30 a 1 of the TFT 30. The pixel electrode 9 is electrically connected to the drain portion 30 a 3 of the TFT 30. 2A shows an example in which the dummy pixel electrode 9D is formed only for the start point and the end point of the scanning line 11 and the data line 6, but this is due to the limitation of the dimensions of the drawing. A number of about 12 may be used. FIG. 2B is a plan view showing the positional relationship between the dummy pixel electrode 9 </ b> D and the pixel electrode 9, in which the description of each pixel is simplified. As illustrated in FIG. 2B, the dummy pixel electrode 9 </ b> D is surrounded so as to be adjacent to the display pixel unit E including the pixel electrode 9, for example. For example, a constant voltage for displaying black is applied to the dummy pixel electrode 9D through the TFT 30.

  The data line 6 is connected to the data line driving circuit 101 (see FIG. 1), and supplies image signals D1, D2,..., Dn supplied from the data line driving circuit 101 to the pixels P. The scanning lines 11 are connected to a scanning line driving circuit 102 (see FIG. 1), and supply scanning signals SC1, SC2,..., SCm supplied from the scanning line driving circuit 102 to each pixel P. The image signals D1 to Dn supplied from the data line driving circuit 101 to the data lines 6 may be supplied line-sequentially in this order, or may be supplied for each of a plurality of adjacent data lines 6 for each group. . The scanning line driving circuit 102 supplies the scanning signals SC1 to SCm to the scanning line 11 in a pulse-sequential manner at predetermined timing.

In the liquid crystal device 100, the TFT 30 as a switching element is turned on for a certain period by the input of the scanning signals SC1 to SCm, so that the image signals D1 to Dn supplied from the data line 6 are drained from the TFT 30 at a predetermined timing. Is output from the unit 30a3. The image signal output from the drain portion 30a3 of the TFT 30 is transmitted to the pixel electrode 9 and the dummy pixel electrode 9D.
For example, as shown in FIG. 2B, the dummy pixel PD is assigned to the place where the image signals D1 to Dk and the scanning signals SC1 to SCj are connected, so that the influence of noise, timing shift, and the like can be obtained. It is possible to process without using the signal on the first stage (rising) side of the scan that is easily received. Similarly, it is also preferable to provide the dummy pixel PD on the final stage (falling) side (not shown).

A predetermined level of the image signal D written to the liquid crystal layer 50 via the pixel electrode 9 is held for a certain period between the pixel electrode 9 and the common electrode 23 arranged to face each other via the liquid crystal layer 50.
Here, a storage capacitor 70 is connected in parallel with the liquid crystal capacitor formed between the pixel electrode 9 and the common electrode 23 in order to suppress potential fluctuation caused by leakage of the held image signal.

  Note that the data line 6 is connected to the inspection circuit 103 shown in FIG. 1A, and in the manufacturing process of the liquid crystal device 100, an operation defect or the like of the liquid crystal device 100 is confirmed by detecting the image signal. Although it can be configured, it is omitted in the equivalent circuit of FIG. The inspection circuit 103 includes a sampling circuit that samples the image signal and supplies it to the data line 6, and a precharge circuit that supplies a precharge signal of a predetermined voltage level to the data line 6 prior to the image signal. Also good.

  Such a liquid crystal device 100 is a transmission type, and adopts an optical design of a normally white mode in which the pixel P is brightly displayed when not driven and a normally black mode in which the pixel P is darkly displayed when not driven. Polarizing elements are arranged and used according to the optical design on the light incident side and the light exit side, respectively.

<Details of element substrate structure>
Next, the structure provided on the element substrate 10 of the liquid crystal device 100 will be described with reference to FIGS. Here, as the pixel P, a structure corresponding to the pixel electrode 9 (see FIG. 1) will be described. Subsequently, a structure corresponding to the dummy pixel PD corresponding to the dummy pixel electrode 9D will be described.
3 and 4 are plan views transparently showing the positional relationship between the layers on the element substrate side constituting the liquid crystal device. FIG. 5 is a cross-sectional view showing a laminated structure obtained by cutting the plan view shown in FIGS. 3 and 4 along the line AA ′. 3 shows the layers below the relay layers 91 and 92, and FIG. 4 shows the layers above the relay layers 91 and 92. Further, in FIGS. 3, 4 and 5, the scales of the layers and members are made different from each other in order to make the layers and members recognizable on the drawings. FIG. 5 shows a cross section taken along the line AA ′ in FIGS. 3 and 4, but the scale of each layer and each member is different as described above, so that partly and completely AA ′. There is a part that does not correspond to the line.

  In FIG. 5, a scanning line 11 is disposed on the element substrate 10, and a TFT 30 having a semiconductor layer 30 a and a gate electrode 30 b is disposed above the scanning line 11 via a base insulating film 12. .

The scanning line 11 is formed of a light-shielding conductive material, for example, W (tungsten), Ti (titanium), TiN (titanium nitride), and the like, and includes a semiconductor layer 30a when viewed in plan on the element substrate 10. It has a shape like this. Specifically, as shown in FIG. 3, it has a protrusion provided so as to protrude in the Y direction along the semiconductor layer 30a.
Since the scanning line 11 is arranged on the lower layer side than the semiconductor layer 30a, the combined optical system is emitted from another liquid crystal device by the back surface reflection on the element substrate 10 or a multi-plate projector by having the above-described protrusion. The channel portion 30a2 of the TFT 30 can be almost or completely shielded from the return light such as the light penetrating the light. As a result, during the operation of the liquid crystal device 100, the light leakage current in the TFT 30 is reduced, the contrast ratio can be improved, and high-quality image display is possible.

  As shown in FIG. 3, the TFT 30 has a semiconductor layer 30a and a gate electrode 30b. As shown in FIG. 5, the semiconductor layer 30a is formed to include a source part 30a1, a channel part 30a2, and a drain part 30a3. Here, an LDD (Lightly Doped Drain) portion may be formed at the interface between the channel portion 30a2 and the source portion 30a1, or between the channel portion 30a2 and the drain portion 30a3.

  The gate electrode 30b is formed on an upper layer side of the semiconductor layer 30a via the gate insulating film 13 (see FIG. 5) in a region overlapping the channel portion 30a2 of the semiconductor layer 30a when viewed in plan on the element substrate 10. Yes. The gate electrode 30b is made of, for example, conductive polysilicon.

  The source part 30 a 1 of the TFT 30 is electrically connected to the relay layer 91 formed on the first interlayer insulating film 14 through the contact hole 31. On the other hand, the drain portion 30 a 3 is electrically connected to the relay layer 92 formed in the same layer as the relay layer 91 through the contact hole 32.

  As shown in FIGS. 4 and 5, the relay layer 91 is electrically connected to the data line 6 formed on the second interlayer insulating film 15 (see FIG. 5) via the contact hole 34. On the other hand, the relay layer 92 is electrically connected to the relay layer 7 formed in the same layer as the data line 6 through the contact hole 35.

  The relay layer 7 is further electrically connected through a contact hole 36 to a relay layer 75 provided in the same layer as a capacitor electrode 71 described later. The relay layer 75 is electrically connected to the pixel electrode 9 through the contact hole 37. That is, as shown in FIG. 5, the drain portion 30a3 of the TFT 30 and the pixel electrode 9 are electrically relay-connected through the relay layer 92, the relay layer 7, and the relay layer 75 in this order.

  As shown in FIG. 5, a storage capacitor 70 is formed on the data line 6 and the relay layer 7 via the third interlayer insulating film 16. By electrically connecting the storage capacitor 70 to the liquid crystal capacitor in parallel, it is possible to hold the voltage of the pixel electrode 9 for a time that is, for example, three orders of magnitude longer than the time during which the image signal is actually applied. Since the holding characteristics of the liquid crystal element are improved, the liquid crystal device 100 having a high contrast ratio can be realized.

As shown in FIGS. 4 and 5, the capacitor electrode 71 functions as one electrode of the storage capacitor 70 electrically connected in parallel to the liquid crystal capacitor, and is electrically connected to the capacitor wiring 200. It is held at a fixed potential. The capacitive electrode 71 is configured by a transparent electrode such as ITO. For this reason, even if the capacitor electrode 71 is formed so as to overlap with the display pixel portion E (see FIG. 1) including the opening, the light transmittance in the opening hardly decreases or practically does not decrease at all. The capacitor electrode 71 is formed so as to surround the relay layer 75 formed in an island shape. In other words, the relay layer 75 is formed inside the opening of the capacitor electrode 71.
The relay layer 92 has a main body portion that overlaps along the scanning line 11, and a protruding portion that is disposed so as to cover the drain portion 30a3 from at least a part of the channel portion 30a of the TFT 30 that is vertically disposed. The relay layer 7 has an island shape that overlaps along the main body of the relay layer 92.
Further, the relay layer 75 is wider than the relay layer 7 in the vertical direction so as to protrude from the island-shaped relay layer 92 to the pixel electrode side. The opening of the capacitor electrode 71 is opened to provide a contact hole 36 that connects the relay layer 7 and the relay layer 75 and a contact hole 37 that connects the relay layer 75 and the pixel electrode 9. The relay layer 7 is formed of the same light-shielding material as the data line and is provided between the pixels. The relay layer 75 is formed of the same transparent material as the capacitor electrode 71 and protrudes toward the pixel electrode. The aperture ratio of the display pixel portion E (see FIG. 1) is not reduced.
Since the opening of the capacitor electrode 71 is provided across the two pixels in the vertical direction, by providing the transparent relay layer 75 inside the opening, the relay layer 7 of the light shielding material and It is possible to provide a margin for providing the contact hole 36 at a position between the pixel electrodes and providing the contact hole 36 at a position overlapping the relay layer 7.

  A dielectric film 72 is formed on the capacitor electrode 71. The dielectric film 72 is formed in a solid shape so as to cover the capacitor electrode 71. The dielectric film 72 is made of a transparent dielectric material such as silicon nitride. Therefore, even if the dielectric film 72 is widely formed in the display pixel portion E (see FIG. 1) including the opening, the opening There is little or no reduction in the light transmittance in the section. In addition, it is more preferable that the film thickness of the dielectric film 72 is smaller in order to increase the capacitance value of the storage capacitor 70.

On the capacitor electrode 71, a capacitor separation film 80 for separating the storage capacitor 70 between pixels is formed. The capacitance value of the storage capacitor 70 can be adjusted by increasing or decreasing the area of the capacitor separation film 80. Specifically, the storage capacitor 70 is not formed in the portion where the capacitor electrode 71 is not disposed opposite to the pixel electrode 9 through the dielectric film 72 by providing the capacitor separation film 80. As shown in FIG. 4, the capacitor separation film 80 has a capacitor separation film opening provided in a substantially H shape so as to avoid the opening of the capacitor electrode 71 straddling adjacent pixels.
Then, the capacitor electrode 71 and the pixel electrode 9 are arranged to face each other along the shape of the opening of the capacitor separation film 80 to constitute the storage capacitor 70. That is, the opening of the capacitor electrode 71 provided between the adjacent data lines 6 and the opening of the capacitor separation film 80 are also provided between the adjacent data lines 6 to constitute the storage capacitor 70, whereby the pixel The planar area of the storage capacitor portion inside the electrode 9 is secured as much as possible.
Here, if the capacity value of the storage capacitor 70 is small, the image signal can be held for a short time, and the image quality of the display image is not improved so much. On the other hand, when the capacity value of the storage capacitor 70 is large, the image signal can be held for a long period of time, so that improvement in the image quality of the display image can be expected, but the image signal supply circuit, wiring, and the like are increased in size. Therefore, in the actual liquid crystal device 100, the capacitance value of the storage capacitor 70 is adjusted to a suitable value.

  A pixel electrode 9 is formed on the capacitor separation film 80. As shown in FIG. 4, the pixel electrode 9 is formed in an island shape for each pixel divided in a matrix by the data lines 6 and the scanning lines 11. An alignment film 18 (see FIG. 1B) for regulating the alignment state of the liquid crystal molecules contained in the liquid crystal layer 50 (see FIG. 1B) is formed on the pixel electrode 9.

Next, the structure of the dummy pixel PD including the dummy pixel electrode 9D will be described. The main difference between the pixel P and the dummy pixel PD is that the dummy pixel electrode 9D is smaller than the pixel electrode 9, that is, the interval between the dummy pixel electrode 9D and the pixel electrode 9 is smaller than the interval between the pixel electrodes 9. It is also long. When this interval becomes longer, the strength of the lateral electric field between the dummy pixel electrode 9D and the pixel electrode 9 becomes lower. This is because if the potential difference is the same, the strength of the lateral electric field indicated by the potential difference / interval decreases as the interval becomes longer. Therefore, spot-like display unevenness is less likely to occur, and reliability can be improved. The size and layout details of the pixel electrode 9 and the dummy pixel electrode 9D will be described later.
Further, the structure of the dummy pixel PD may be the same as that of the pixel P, and the interval between the dummy pixels PD and the interval between the dummy pixel PD and the pixel P may be longer than the interval between the pixel electrodes 9. Even so, the intensity of the horizontal electric field is lowered, and spot-like display unevenness is less likely to occur. Therefore, reliability can be improved. Also in this case, details of the layout will be described later.
Further, the dummy pixel electrode 9D of the dummy pixel PD can be made smaller, and the interval between the dummy pixels PD and the interval between the dummy pixel electrode 9D and the pixel electrode 9 can be made longer than the interval between the pixel electrodes 9. Even if it does in this way, the intensity | strength of a horizontal electric field will also become low, and it will become difficult to generate | occur | produce a spot-like display nonuniformity. Therefore, reliability can be improved. Also in this case, details of the layout will be described later.

<Layout of Pixel Electrode 9 and Dummy Pixel Electrode 9D>
Hereinafter, the layout of the pixel electrode 9 and the dummy pixel electrode 9D will be described with reference to the drawings. FIG. 6 is a plan layout view showing the vicinity of the boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes. Here, the pixel electrode 9 and the dummy pixel electrode 9D are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9 </ b> D is smaller than the size of the pixel electrode 9. The pitch of the pixel electrodes 9 and the pitch of the dummy pixel electrodes 9D are arranged in the same manner.
As shown in FIG. 6, by reducing the dummy pixel electrode 9D, the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D at the boundary of the display pixel portion E is larger than the distance L between the pixel electrodes 9. Can take a value.
That is, the distance between the pixel electrode 9 and the dummy pixel electrode 9 </ b> D is larger than when the size of the dummy pixel electrode 9 </ b> D is aligned with the pixel electrode 9. Therefore, the horizontal electric field between the dummy pixel electrode 9D and the pixel electrode 9 is smaller than when the size of the dummy pixel electrode 9D is aligned with that of the pixel electrode 9.
Therefore, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by making the dummy pixel electrode 9D small, and the liquid crystal device 100 (see FIG. 1 (a)) can be improved.

Here, on almost the entire surface including the lower side of the dummy pixel electrode 9D and the pixel electrode 9, a capacitor electrode 71 is provided via a dielectric film 72 as shown in FIG.
Therefore, when the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D is widened, a fringe effect of the pixel electrode 9 generates a horizontal electric field with the capacitor electrode 71, resulting in spot-like display unevenness. Since this may occur, the reliability of the liquid crystal device 100 decreases.
The generation of the lateral electric field due to the fringe effect and the lateral electric field relaxation effect between the pixel electrode 9 and the dummy pixel electrode 9D are contradictory, and the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D is An optimal value exists. When the interval between the pixel electrodes 9 is 0.6 μm, the preferable interval between the pixel electrode 9 and the dummy pixel electrode 9D is 0.8 μm or more and 1.6 μm or less. Within this range, the lateral electric field received by the pixel electrode 9 can be relaxed. More desirably, by setting the distance between the pixel electrode 9 and the dummy pixel electrode 9D to 1.0 μm or more and 1.4 μm or less, it is possible to suppress a decrease in reliability due to a lateral electric field. In the present embodiment, a case will be described in which the distance between the pixel electrode 9 and the dummy pixel electrode 9D is set to a value of about 1.2 μm.

  Here, the interval between the dummy pixel electrodes 9D will be described. This interval may be non-uniform, but if it takes a non-uniform value, distribution occurs in the strength of the transverse electric field, so it is preferable that they are aligned. For example, if the alignment is 1.3 μm or more and 1.7 μm or less, occurrence of unexpected adverse effects due to variations in the lateral electric field can be suppressed in advance. In the present embodiment, a case where the distance between the dummy pixel electrodes 9D is set to a value of about 1.5 μm will be described. Also, the shape of the dummy pixel electrode 9D can take an arbitrary value, but it is preferable that the shape of the dummy pixel electrode 9D is also aligned. For example, in application to a projection display device, it is also preferable to align it to a square. It is.

FIG. 7 is a plan layout view showing the vicinity of the boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes, as in FIG. 6. Here, the pixel P and the dummy pixel PD are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9D is the same as the size of the pixel electrode 9. The pitch of the pixel electrodes 9 is different from the pitch of the dummy pixel electrodes 9D, and the dummy pixel electrodes 9D are arranged so that the pitch is large.
As shown in FIG. 7, by increasing the pitch of the dummy pixel electrodes 9D, the interval LD between the pixel electrode 9 and the dummy pixel electrode 9D at the boundary of the display pixel portion E is compared with the interval L between the pixel electrodes 9. Taking a big value.
Also in this case, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by increasing the distance between the dummy pixel electrode 9D and the pixel electrode 9, and the uneven display unevenness is caused. Since generation | occurrence | production can be prevented, the reliability of the liquid crystal device 100 (refer Fig.1 (a)) can be improved. Here, the interval between the pixel electrode 9 and the dummy pixel electrode 9 </ b> D and the interval between the dummy pixel electrodes 9 </ b> D have the same optimal values and appropriate numerical ranges as those described above. In this relation, the interval between the dummy pixel electrodes 9D is determined with respect to the normal direction of the boundary line of the display pixel unit E, and is the same as that of the pixel electrode 9 in the direction parallel to the boundary line of the display pixel unit E. Designed at intervals.

FIG. 8 is a plan layout diagram showing the vicinity of the boundary between a display pixel portion provided with pixels including pixel electrodes and a dummy pixel including dummy pixel electrodes, as in FIGS. 6 and 7. Here, the pixel P and the dummy pixel PD are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9 </ b> D is smaller than the size of the pixel electrode 9. Further, the pitch of the pixel electrodes 9 and the pitch of the dummy pixel electrodes 9 </ b> D are different, and the dummy pixel electrodes 9 </ b> D are arranged so that the pitch is large.
Also in this case, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by increasing the distance between the dummy pixel electrode 9D and the pixel electrode 9, and the uneven display unevenness is caused. Since generation | occurrence | production can be prevented, the reliability of the liquid crystal device 100 (refer Fig.1 (a)) can be improved. Here, the interval between the pixel electrode 9 and the dummy pixel electrode 9 </ b> D and the interval between the dummy pixel electrodes 9 </ b> D have the same optimal values and appropriate numerical ranges as those described above.

  The electro-optical device according to this embodiment has the following effects.

  Compared with the pixel electrode 9, the area of the dummy pixel electrode 9 </ b> D is reduced so that the distance LD between the dummy pixel PD and the pixel P is longer than the distance L between the pixel electrodes 9, thereby reducing the lateral electric field. Therefore, spot-like display unevenness hardly occurs. Therefore, reliability can be improved.

  The structure of the dummy pixel PD is the same as that of the pixel P, and the distance between the dummy pixels PD and the distance LD between the dummy pixel PD and the pixel P are set longer than the distance L between the pixel electrodes 9, thereby generating a lateral electric field. Can be relaxed. Therefore, spot-like display unevenness hardly occurs. Therefore, reliability can be improved.

  The dummy pixel electrode 9D of the dummy pixel PD is made smaller, and in addition, the distance between the dummy pixels PD and the distance LD between the dummy pixel PD and the pixel P are made longer than the distance between the pixel electrodes 9 to thereby increase the lateral electric field. Can be relaxed. Therefore, spot-like display unevenness is less likely to occur. Therefore, reliability can be improved.

  By electrically connecting the storage capacitor 70 to the liquid crystal capacitor in parallel, it is possible to hold the voltage of the pixel electrode 9 for a time that is, for example, three orders of magnitude longer than the time during which the image signal is actually applied. Since the holding characteristics of the liquid crystal element are improved, the liquid crystal device 100 having a high contrast ratio can be realized.

  Since the dummy pixel PD is configured only by changing the area and pitch of the pixel electrode 9 of the pixel P, the load on the TFT 30 does not change much between the pixel P and the dummy pixel PD. Therefore, it is possible to process without disturbing the drive signal to the dummy pixel PD given from the scanning line 11 and the data line 6. Therefore, the drive signal given to the pixel P can be transmitted without being distorted.

  Since the dummy pixel PD is configured only by changing the area and pitch of the pixel electrode 9 of the pixel P, a photomask having a pattern in which the area and pitch of the pixel electrode 9 and the dummy pixel electrode 9D are changed is prepared. Thus, since the dummy pixel PD can be formed without changing the manufacturing process, it can be manufactured without adding or changing the manufacturing process.

When the distance LD between the pixel P and the dummy pixel PD is, for example, about the same as the distance L between the pixels P, a horizontal electric field is generated between the capacitor electrode 71 due to the fringe effect of the pixel electrode 9, Since spot-like display unevenness may occur, the reliability of the liquid crystal device 100 decreases.
The fringe effect and the lateral electric field relaxation effect between the pixel electrode 9 and the dummy pixel electrode 9D are contradictory effects, and there is an optimum value for the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D. When the interval between the pixel electrodes 9 is 0.6 μm, the preferable interval LD between the pixel electrode 9 and the dummy pixel electrode 9D is 0.8 μm or more and 1.6 μm or less. Within this range, the lateral electric field received by the pixel electrode 9 can be relaxed. More desirably, by setting the interval LD between the pixel electrode 9 and the dummy pixel electrode 9D to be 1.0 μm or more and 1.4 μm or less, it is possible to suppress a decrease in reliability due to a lateral electric field. Further, when the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D is set to a value in the vicinity of 1.2 μm, the lateral electric field can be reduced more effectively.

(Second Embodiment)
Next, with reference to FIG. 9 and FIG. 10, a detailed configuration when the pixel structure is different will be described. 9 is a plan view of a pixel in the image display unit, and FIG. 10 is a cross-sectional view taken along the line AA ′ of FIG. The main difference from the cross-sectional view described in FIG. 5 is that the capacitor electrode 71 is separated from the pixel electrode 9 in the thickness direction as compared with the case of FIG. For this reason, even if the pixel electrode 9 and the dummy pixel electrode 9D are separated from each other, the capacitor electrode 71 is hardly affected.

  In FIG. 9, the pixel P on the element substrate 10 includes a plurality of transparent pixel electrodes 9 arranged in a matrix, and the data lines 6 and the scanning lines 11 extend along the vertical and horizontal boundaries of the pixel electrode 9. Is provided. The scanning line 11 extends along the X direction in FIG. 9, and the data line 6 extends along the Y direction in FIG. 9 so as to intersect the scanning line 11. A pixel switching TFT 30 is provided at each of the locations where the scanning line 11 and the data line 6 intersect each other.

  In FIG. 9 or FIG. 10, the scanning line 11 is arranged on the lower layer side than the semiconductor layer 30a with the base insulating film 12 interposed therebetween. For example, the scanning line 11 is made of tungsten (W), titanium (Ti), titanium nitride (TiN) or the like. It is made of a light-shielding conductive material such as a melting point metal material. As shown in FIG. 9, the scanning lines 11 extend along the X direction and are arranged in stripes on the display pixel portion E. Further, the scanning line 11 functions as a lower light-shielding film, and returns light such as light reflected from the back surface of the element substrate 10 or light emitted from another liquid crystal device by a multi-plate projector or the like and penetrating the composite optical system. Of these, the light traveling to the TFT 30 can be shielded.

  The base insulating film 12 is made of, for example, a silicon oxide film. The base insulating film 12 is formed on the entire surface of the element substrate 10, thereby preventing a change in characteristics of the pixel switching TFT 30 due to roughness during surface polishing of the element substrate 10, dirt remaining after cleaning, and the like.

  9 or 10, the TFT 30 includes a semiconductor layer 30a and a gate electrode 30b.

  The semiconductor layer 30a is made of, for example, polysilicon, and has a channel portion 1a ′ having a channel length along the Y direction in FIG. 9, a data line side LDD portion 1b, a pixel electrode side LDD portion 1c, and a data line side source. It comprises a drain portion 1d and a source / drain portion 1e on the pixel electrode side. That is, the TFT 30 has an LDD structure. The TFT 30 preferably has an LDD structure. However, the TFT 30 may have an offset structure in which no impurity is implanted into the LDD portion 1b on the data line side and the LDD portion 1c on the pixel electrode side, and the gate electrode 30b is used as a mask. A self-aligned type in which impurities are implanted at a high concentration to form a source / drain portion on the data line side and a source / drain portion on the pixel electrode side may be used.

  Here, the gate electrode 30b is disposed on the channel portion 1a ′ via the gate insulating film 13, and is formed on the lowermost layer via the contact hole 3c opened through the base insulating film 12 on the side of the semiconductor layer 30a. The scanning line 11 is electrically connected.

  9 and 10, the data line 6 is provided on the upper layer side of the TFT 30 on the element substrate 10 via the first interlayer insulating film 14.

  The data line 6 is electrically connected to the source / drain portion 1d on the data line side of the semiconductor layer 30a through a contact hole 81 penetrating the gate insulating film 13 and the first interlayer insulating film. Further, the data line 6 and the inside of the contact hole 81 are made of, for example, an Al (aluminum) -containing material such as Al—Si—Cu or Al—Cu, Al alone, or a multilayer film including an Al layer and a TiN layer. The data line 6 also has a function of shielding the TFT 30 from light.

  In FIG. 10, a storage capacitor 70 is provided above the data line 6 via the second interlayer insulating film 15 on the element substrate 10. The storage capacitor 70 is formed by disposing the capacitor electrode 71 and the capacitor wiring 200 to face each other with the dielectric film 72 interposed therebetween. The capacitor electrode 71 is formed as a part of the capacitor wiring 200. As described above, the capacitor wiring 200 extends from the display pixel portion E where the pixel electrode 9 is disposed to the periphery thereof, and is electrically connected to a constant potential source. Thereby, the capacitor wiring 200 is maintained at a fixed potential, and can function as a fixed potential side capacitor electrode. The capacitor wiring 200 is formed of a non-transparent metal film containing a metal or alloy such as Al (aluminum) or Ag (silver), for example, and also functions as an upper light shielding film (built-in light shielding film) that shields the TFT 30. .

  9 or 10, the capacitor electrode 71 is electrically connected to the source / drain portion 1 e on the pixel electrode side via the contact hole 83 and is also electrically connected to the pixel electrode 9 via the contact hole 85. ing. That is, the capacitor electrode 71 relays an electrical connection between the source / drain portion 1e on the pixel electrode side and the pixel electrode 9. Similar to the capacitor wiring 200 (functioning as a capacitor electrode), the capacitor electrode 71 is formed of a non-transparent metal film containing a metal such as Al (aluminum) or an alloy. The contact hole 83 is opened through the first interlayer insulating film 14 and the second interlayer insulating film 15. In the data line 6, the contact hole 83 is opened in the data line 6 when viewed in plan. It arrange | positions in the hole 6h.

  Here, the capacitor electrode 71 preferably has a function as a light absorption layer or a light shielding film disposed between the capacitor wiring 200 as the upper light shielding film and the TFT 30 in addition to the function as the pixel potential side capacitance electrode. . Therefore, the light incident on the TFT 30 from the upper layer side can also be shielded by each of the capacitor wiring 200 and the capacitor electrode 71.

  The dielectric film 72 has a single layer structure or a multilayer structure composed of, for example, a silicon oxide film or a silicon nitride film.

  9 and 10, the pixel electrode 9 is formed on the upper layer side of the third interlayer insulating film 16 with respect to the storage capacitor 70 via the third interlayer insulating film 16. The pixel electrode 9 is electrically connected to the source / drain portion 1e on the pixel electrode side of the semiconductor layer 30a through the capacitor electrode 71 and the contact holes 83 and 85. The contact hole 85 is formed by depositing a conductive material constituting the pixel electrode 9 such as ITO on the inner wall of a hole formed so as to penetrate the third interlayer insulating film 16. On the upper surface of the pixel electrode 9, an alignment film 18 (see FIG. 1B) subjected to a predetermined alignment process such as a rubbing process is provided.

  Next, the structure of the dummy pixel PD including the dummy pixel electrode 9D will be described. The main difference between the pixel P and the dummy pixel PD is that the area of the dummy pixel electrode 9D is smaller than that of the pixel electrode 9, that is, the interval between the dummy pixel electrode 9D and the pixel electrode 9 is larger than the interval between the pixel electrodes 9. It is also long. When this interval becomes longer, the strength of the lateral electric field between the dummy pixel electrode 9D and the pixel electrode 9 becomes lower. This is because if the potential difference is the same, the strength of the lateral electric field indicated by the potential difference / interval decreases as the interval becomes longer. As a result, spot-like display unevenness is less likely to occur and reliability can be improved. The size and layout details of the pixel electrode 9 and the dummy pixel electrode 9D will be described later. Here, the main difference from the first embodiment is that the capacitor electrode 71 is shielded unlike the case shown in FIG. For this reason, there is no upper limit to the size of the dummy pixel electrode 9D and the interval LD between the pixel electrode 9 and the dummy pixel electrode 9D, and in an extreme case, the dummy pixel electrode 9D may be eliminated. Even in this case, since the configuration other than the dummy pixel electrode 9D remains in the dummy pixel PD, an electrical function as the dummy pixel PD can be achieved.

The structure of the dummy pixel PD may be the same as that of the pixel P, and the interval between the dummy pixels PD and the interval LD between the dummy pixel PD and the pixel P may be longer than the interval between the pixel electrodes 9. Even if it does in this way, the intensity | strength of a horizontal direction electric field will also become low and will become difficult to generate | occur | produce a spot-like display nonuniformity. Therefore, reliability can be improved. Also in this case, details of the layout will be described later.
Further, the dummy pixel electrode 9D of the dummy pixel PD may be reduced, and in addition, the interval between the dummy pixels PD and the interval between the dummy pixel PD and the pixel P may be longer than the interval between the pixel electrodes 9. Even if it does in this way, the intensity | strength of a horizontal direction electric field will also become low and will become difficult to generate | occur | produce a spot-like display nonuniformity. Therefore, reliability can be improved. Also in this case, details of the layout will be described later.

<Layout of Pixel P and Dummy Pixel PD>
Hereinafter, the layout of the pixel P and the dummy pixel PD will be described with reference to the drawings. FIG. 11 is a plan layout view showing the vicinity of the boundary between a display pixel portion provided with a pixel including a pixel electrode and a dummy pixel including a dummy pixel electrode. Here, the pixel P and the dummy pixel PD are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9 </ b> D is smaller than the size of the pixel electrode 9. The pitch of the pixel electrodes 9 and the pitch of the dummy pixel electrodes 9D are arranged in the same manner.
As shown in FIG. 11, by reducing the dummy pixel electrode 9D, the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D at the boundary of the display pixel portion E is larger than the distance L between the pixel electrodes 9. Taking value.
That is, the distance between the pixel electrode 9 and the dummy pixel electrode 9 </ b> D is larger than when the size of the dummy pixel electrode 9 </ b> D is aligned with the pixel electrode 9. Therefore, the horizontal electric field between the dummy pixel electrode 9D and the pixel electrode 9 is smaller than when the size of the dummy pixel electrode 9D is aligned with that of the pixel electrode 9.
Therefore, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by making the dummy pixel electrode 9D small, and the liquid crystal device 100 (see FIG. 1 (a)) can be improved.

  Here, the interval between the dummy pixel electrodes 9D will be described. This interval may be non-uniform, but if it takes a non-uniform value, distribution occurs in the strength of the transverse electric field, so it is preferable that they are aligned. For example, if the distance between the dummy pixel electrodes 9D is set to 1.3 μm or more, it is possible to suppress the occurrence of unexpected adverse effects due to variations in the lateral electric field. In the present embodiment, a case where the distance between the dummy pixel electrodes 9D is set to a value of about 1.5 μm will be described.

FIG. 12 is a plan layout view showing the vicinity of the boundary between the display pixel portion E provided with pixels including pixel electrodes and the dummy pixel including dummy pixel electrodes 9D, as in FIG. Here, the pixel P and the dummy pixel PD are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9D is the same as the size of the pixel electrode 9. The pitch of the pixel electrodes 9 is different from the pitch of the dummy pixel electrodes 9D, and the dummy pixel electrodes 9D are arranged so that the pitch is large.
As shown in FIG. 12, by increasing the pitch of the dummy pixel electrodes 9D, the interval LD between the pixel electrode 9 and the dummy pixel electrode 9D at the boundary of the display pixel portion E is compared with the interval L between the pixel electrodes 9. Taking a big value.
Also in this case, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by increasing the distance between the dummy pixel electrode 9D and the pixel electrode 9, and the uneven display unevenness is caused. Since generation | occurrence | production can be prevented, the reliability of the liquid crystal device 100 (refer Fig.1 (a)) can be improved. Here, the interval between the pixel electrode 9 and the dummy pixel electrode 9D and the interval between the dummy pixel electrodes 9D have the same relationship as described above. In this relation, the interval between the dummy pixel electrodes 9D is determined with respect to the normal direction of the boundary line of the display pixel unit E, and is the same as that of the pixel electrode 9 in the direction parallel to the boundary line of the display pixel unit E. Designed at intervals.

FIG. 13 is a plan layout diagram showing the vicinity of the boundary between the display pixel portion E provided with pixels including pixel electrodes and the dummy pixel including dummy pixel electrodes 9D, as in FIGS. 11 and 12. Here, the pixel P and the dummy pixel PD are shown in the vicinity of the boundary of the display pixel portion E.
In this case, the size of the dummy pixel electrode 9 </ b> D is smaller than the size of the pixel electrode 9. Further, the pitch of the pixel electrodes 9 and the pitch of the dummy pixel electrodes 9 </ b> D are different, and the dummy pixel electrodes 9 </ b> D are arranged so that the pitch is large.
Also in this case, the horizontal electric field between the pixel electrode 9 and the dummy pixel electrode 9D is alleviated by increasing the distance between the dummy pixel electrode 9D and the pixel electrode 9, and the uneven display unevenness is caused. Since generation | occurrence | production can be prevented, the reliability of the liquid crystal device 100 (refer Fig.1 (a)) can be improved. Here, the interval between the pixel electrode 9 and the dummy pixel electrode 9D and the interval between the dummy pixel electrodes 9D have the above-described relationship.

  The electro-optical device according to this embodiment has the following effects in addition to the effects of the above-described embodiments.

  Even in this case, the lateral electric field is alleviated by giving a larger value to the distance LD between the pixel electrode 9 and the dummy pixel electrode 9D at the boundary of the display pixel portion E than the distance L between the pixels P. Therefore, the movement of ionic impurities contained in the liquid crystal layer 50 (see FIG. 1B) is prevented, and the occurrence of spot-like display unevenness where display is not properly performed can be prevented, so that the liquid crystal device 100 (FIG. 1A ))) Can be improved.

  The storage capacitor 70 is formed by disposing the capacitor electrode 71 and the capacitor wiring 200 to face each other through the dielectric film 72. In this case, since the capacitor electrode 71 is shielded, the larger the distance LD between the pixel electrode 9 and the dummy pixel electrode PD, the more the lateral electric field can be relaxed, thereby improving the degree of freedom in design. Is possible.

(Third embodiment)
<Electronic equipment>
FIG. 14 is a schematic diagram illustrating a configuration of a projection display device as an electronic apparatus. As shown in FIG. 14, a projection display apparatus 1000 as an electronic apparatus according to the present embodiment includes a polarization illumination apparatus 1100 arranged along the system optical axis L, and two dichroic mirrors 1104 and 1105 as light separation elements. Three reflection mirrors 1106, 1107, 1108, five relay lenses 1201, 1202, 1203, 1204, 1205, three transmissive liquid crystal lightvalves 1210, 1220, 1230 as light modulation means, and a light combining element The cross dichroic prism 1206 and a projection lens 1207 are provided.

  The polarized light illumination device 1100 is generally composed of a lamp unit 1101 composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

  The dichroic mirror 1104 reflects red light (R) and transmits green light (G) and blue light (B) among the polarized light beams emitted from the polarization illumination device 1100. Another dichroic mirror 1105 reflects the green light (G) transmitted through the dichroic mirror 1104 and transmits the blue light (B).

The red light (R) reflected by the dichroic mirror 1104 is reflected by the reflection mirror 1106 and then enters the liquid crystal light valve 1210 via the relay lens 1205.
Green light (G) reflected by the dichroic mirror 1105 enters the liquid crystal light valve 1220 via the relay lens 1204.
The blue light (B) transmitted through the dichroic mirror 1105 enters the liquid crystal light valve 1230 via a light guide system including three relay lenses 1201, 1202, 1203 and two reflection mirrors 1107, 1108.

  The liquid crystal light valves 1210, 1220, and 1230 are disposed to face the incident surfaces of the cross dichroic prism 1206 for each color light. The color light incident on the liquid crystal light valves 1210, 1220, and 1230 is modulated based on video information (video signal) and emitted toward the cross dichroic prism 1206. In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. The three color lights are synthesized by these dielectric multilayer films, and the light representing the color image is synthesized. The synthesized light is projected on the screen 1300 by the projection lens 1207 which is a projection optical system, and the image is enlarged and displayed.

  The liquid crystal light valve 1210 is the one to which the liquid crystal device 100 described above is applied. The liquid crystal device 100 is arranged with a gap between a pair of polarizing elements arranged in crossed Nicols on the incident side and the emission side of colored light. The same applies to the other liquid crystal light valves 1220 and 1230.

  According to such a projection type display device 1000, the liquid crystal device 100 that can obtain stable operation quality even if the pixels are high definition is provided, and high reliability can be ensured.

  E ... display pixel part, P ... pixel, PD ... dummy pixel, 1a '... channel region, 1b ... LDD part, 1c ... LDD part, 1d ... source / drain part, 1e ... source / drain part, 3c ... contact hole, 6 ... Data line, 6h ... opening, 7 ... relay layer, 9 ... pixel electrode, 9D ... dummy pixel electrode, 10 ... element substrate, 11 ... scan line, 12 ... underlying insulating film, 13 ... gate insulating film, 14 ... first Interlayer insulating film, 15 ... second interlayer insulating film, 16 ... third interlayer insulating film, 18 ... alignment film, 20 ... counter substrate, 21 ... light shielding film, 22 ... interlayer film layer, 23 ... common electrode, 24 ... alignment film 30 ... TFT, 30a ... semiconductor layer, 30a1 ... source part, 30a2 ... channel part, 30a3 ... drain part, 30b ... gate electrode, 31 ... contact hole, 32 ... contact hole, 34 ... contact hole, 35 ... con 36 ... Contact hole, 37 ... Contact hole, 40 ... Sealing material, 50 ... Liquid crystal layer, 70 ... Storage capacitor, 71 ... Capacitance electrode, 72 ... Dielectric film, 75 ... Relay layer, 80 ... Capacitor separation film, 81 DESCRIPTION OF SYMBOLS ... Contact hole, 83 ... Contact hole, 85 ... Contact hole, 91 ... Relay layer, 92 ... Relay layer, 100 ... Liquid crystal device, 101 ... Data line drive circuit, 102 ... Scan line drive circuit, 103 ... Inspection circuit, 104 ... External connection terminals, 105 ... wiring, 106 ... vertical conduction part, 200 ... capacitive wiring, 1000 ... projection display device, 1100 ... polarization illumination device, 1101 ... lamp unit, 1102 ... integrator lens, 1103 ... polarization conversion element, 1104 ... Dichroic mirror, 1105 ... Dichroic mirror, 1106 ... Reflection mirror, 1107 ... Reflection , 1108: reflection mirror, 1201 ... relay lens, 1202 ... relay lens, 1203 ... relay lens, 1204 ... relay lens, 1205 ... relay lens, 1206 ... cross dichroic prism, 1207 ... projection lens, 1210 ... liquid crystal light valve, 1220 ... liquid crystal light valve, 1230 ... liquid crystal light valve, 1300 ... screen.

Claims (6)

In the image display area, a plurality of pixel electrodes,
A switching element and a dummy pixel electrode to which a predetermined potential is applied via the switching element are provided around the image display area,
The electro-optical device, wherein an interval between the dummy pixel electrode and the pixel electrode is larger than an interval between adjacent pixel electrodes. The electro-optical device according to claim 1,
An electro-optical device comprising: a capacitor electrode disposed opposite to the pixel electrode and the dummy pixel electrode via a dielectric film. The electro-optical device according to claim 2,
An electro-optical device, wherein an interval between the pixel electrode and the dummy pixel electrode is 0.8 μm or more and 1.6 μm or less. The electro-optical device according to claim 1,
An electro-optical device, wherein the size of the dummy pixel electrode is smaller than the size of the pixel electrode. The electro-optical device according to any one of claims 1 to 4,
An electro-optical device, wherein a plurality of the dummy pixel electrodes are arranged, and the shapes and intervals of the plurality of dummy pixel electrodes are aligned.   An electronic apparatus comprising the electro-optical device according to claim 1.

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