JP2012201695A - Epoxy resin composition for sealing and semiconductor device - Google Patents

Epoxy resin composition for sealing and semiconductor device Download PDF

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JP2012201695A
JP2012201695A JP2011064482A JP2011064482A JP2012201695A JP 2012201695 A JP2012201695 A JP 2012201695A JP 2011064482 A JP2011064482 A JP 2011064482A JP 2011064482 A JP2011064482 A JP 2011064482A JP 2012201695 A JP2012201695 A JP 2012201695A
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epoxy resin
resin composition
sealing
release agent
mass
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JP5547680B2 (en
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Kota Ishikawa
浩太 石川
Tomofumi Kamimura
朋史 上村
Kiyohide Miyamoto
清英 宮本
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Panasonic Corp
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Abstract

PROBLEM TO BE SOLVED: To suppress production of marks and smear on the internal surface of a mold due to transfer of a bleeding mold release agent component and production of smear and voids on a molded package surface, in package molding using an epoxy resin composition for sealing.SOLUTION: An epoxy resin composition for sealing includes an epoxy resin, a curing agent, an inorganic filler and a mold release agent, wherein the mold release agent includes (a) oxidized polyethylene, (b) natural carnauba wax and (c) at least one of hydroxystearic acid amide and montanic acid bisamide and the component (a) accounts for ≤50 mass% of the total mold release agent.

Description

本発明は、封止用エポキシ樹脂組成物、及び、これを用いて封止された半導体装置に関する。   The present invention relates to an epoxy resin composition for sealing, and a semiconductor device sealed using the same.

近年、多くの半導体装置パッケージは、基板へのボンディングが終了した半導体素子を、封止用エポキシ樹脂組成物を用いて封止して製造されている。その際の代表的な製造方法としては、トランスファー成形法がある。   In recent years, many semiconductor device packages are manufactured by sealing a semiconductor element that has been bonded to a substrate using an epoxy resin composition for sealing. A typical manufacturing method in this case is a transfer molding method.

近年、トランスファー成形法で製造される半導体装置パッケージは、電子機器の小型・軽量化の要求に応じて、外形寸法の小さいものが求められるようになっている。それと同時に、パッケージされる半導体素子自体の集積度は大きくなり、チップサイズが大きくなってきている。   In recent years, a semiconductor device package manufactured by a transfer molding method has been required to have a small outer dimension in response to a demand for reduction in size and weight of an electronic device. At the same time, the degree of integration of the packaged semiconductor elements themselves has increased, and the chip size has increased.

このため、封止用エポキシ樹脂組成物には、耐湿性、耐熱性の優れた特性が求められ、無機充填剤が高配合になってきている。ただ、無機充填剤を高配合したエポキシ樹脂組成物は、成形時の硬化収縮率が小さい一方で、金型からの離型性が必ずしも良好ではない。   For this reason, the epoxy resin composition for sealing is required to have excellent properties such as moisture resistance and heat resistance, and inorganic fillers have become highly blended. However, an epoxy resin composition that is highly blended with an inorganic filler has a low cure shrinkage during molding, but does not necessarily have good mold release properties.

そこで、離型剤の添加量を多くしたり、金型表面に滲み出し易い離型剤系を配合することが考慮されている(特許文献1〜5参照)。   Therefore, it is considered to increase the amount of the release agent added or to mix a release agent system that easily oozes onto the mold surface (see Patent Documents 1 to 5).

特開2003−246914号公報JP 2003-246914 A 特開2004−059700号公報JP 2004-059700 A 特開2005−015693号公報Japanese Patent Laid-Open No. 2005-015633 特開平05−259316号公報JP 05-259316 A 特開2010−280805号公報JP 2010-280805 A

しかしながら、離型剤を配合した封止用エポキシ樹脂組成物を用いてのパッケージ成形では、成形金型の内側表面に、滲み出た離型剤成分が転写されてマークや汚れが付き、成形物パッケージ表面にも汚れや空孔(ボイド)ができやすい。
本発明は、このような事情に鑑みてなされたものであり、封止用エポキシ樹脂組成物の成形で発生するパッケージ表面汚れ、パッケージ空孔を低減、抑制することを課題としている。
However, in package molding using a sealing epoxy resin composition containing a mold release agent, the exuded mold release agent component is transferred to the inner surface of the mold, resulting in marks and stains. Dirt and voids are also easily formed on the package surface.
This invention is made | formed in view of such a situation, and makes it a subject to reduce and suppress the package surface stain | pollution | contamination and package hole which generate | occur | produce by shaping | molding of the epoxy resin composition for sealing.

上記の課題を解決するために、本発明の封止用エポキシ樹脂組成物は、エポキシ樹脂、硬化剤、無機充填剤とともに離型剤を含み、前記離型剤は、下記(a)、(b)、(c)成分を含み、成分(a)が離型剤合計に対して50質量%以下であることを特徴としている。
(a)酸化ポリエチレン
(b)天然カルナバ
(c)ヒドロキシステアリン酸アミド及びモンタン酸ビスアミドのうちの少なくとも一種
In order to solve the above-mentioned problems, the epoxy resin composition for sealing of the present invention contains a release agent together with an epoxy resin, a curing agent, and an inorganic filler, and the release agent includes the following (a) and (b ), (C) component, and the component (a) is 50% by mass or less based on the total amount of the release agents.
(A) polyethylene oxide (b) natural carnauba (c) at least one of hydroxystearic acid amide and montanic acid bisamide

この封止用エポキシ樹脂組成物においては、離型剤の合計の配合量は、封止用エポキシ樹脂組成物の全体に対して0.03〜3質量%であることが好ましい。
また、この封止用エポキシ樹脂組成物においては、離型剤は、予め(a)、(b)、(c)の3成分を加熱により溶融、混合後常温まで冷却した固化物として配合されていることが好ましい。
さらに、この封止用エポキシ樹脂組成物は、カップリング剤を含むことが好ましい。
また、本発明の半導体装置は、上記の封止用エポキシ樹脂組成物により封止されていることを特徴とする。
In this sealing epoxy resin composition, the total compounding amount of the release agent is preferably 0.03 to 3% by mass with respect to the entire sealing epoxy resin composition.
In this sealing epoxy resin composition, the release agent is blended in advance as a solidified product obtained by melting the three components (a), (b) and (c) by heating, mixing and cooling to room temperature. Preferably it is.
Furthermore, the epoxy resin composition for sealing preferably contains a coupling agent.
The semiconductor device of the present invention is sealed with the above-described sealing epoxy resin composition.

本発明の封止用エポキシ樹脂組成物を用いた半導体装置のパッケージ成形では、成形金型の内側表面への離型剤の滲み出しが抑制され、成形物パッケージ表面の汚れや空孔(ボイド)の生成を低減、抑制することができる。   In the semiconductor device package molding using the sealing epoxy resin composition of the present invention, the exudation of the release agent to the inner surface of the molding die is suppressed, and dirt and voids on the surface of the molded product package (void) Generation can be reduced or suppressed.

[エポキシ樹脂]
本発明の封止用エポキシ樹脂組成物のエポキシ樹脂としては、その種類は特に制限されず、公知のものをはじめとする各種のものを全て使用することができる。
たとえば、O-クレゾールノボラック型エポキシ、ビフェニル型エポキシ、ジシクロペンタジエン型エポキシ、ビスフェノール型エポキシ、ナフトール型エポキシ、ブロム含有エポキシ等のエポキシ樹脂が挙げられる。これらは、1種単独でも2種以上を組み合わせても使用することができる。
[Epoxy resin]
The epoxy resin of the epoxy resin composition for sealing of the present invention is not particularly limited, and any of various types including known ones can be used.
Examples thereof include epoxy resins such as O-cresol novolac type epoxy, biphenyl type epoxy, dicyclopentadiene type epoxy, bisphenol type epoxy, naphthol type epoxy, and bromine-containing epoxy. These can be used singly or in combination of two or more.

本発明の封止用エポキシ樹脂組成物におけるエポキシ樹脂の配合量は、エポキシ樹脂組成物の全量に対して好ましくは5〜45質量%の範囲内とすることが考慮される。このような範囲で用いると封止用樹脂組成物の流動成形性や成形品の物性が良好である。   It is considered that the compounding amount of the epoxy resin in the epoxy resin composition for sealing of the present invention is preferably in the range of 5 to 45% by mass with respect to the total amount of the epoxy resin composition. When used in such a range, the flow molding property of the sealing resin composition and the physical properties of the molded product are good.

[硬化剤]
本発明の封止用エポキシ樹脂組成物の硬化剤としては、その種類は特に制限されず、公知のもの、たとえば、フェノール樹脂系硬化剤、酸無水物系硬化剤、アミン系硬化剤等各種のものを使用することができる。
[Curing agent]
The kind of the curing agent for the epoxy resin composition for sealing of the present invention is not particularly limited, and various kinds of known ones such as a phenol resin curing agent, an acid anhydride curing agent, an amine curing agent, and the like. Things can be used.

硬化性や硬化物の物性などを考慮すると、フェノール樹脂系硬化剤が好ましい。たとえば、フェノールノボラック、クレゾールノボラック、フェノールアラルキル、ビフェニルアラルキル、ナフトールアラルキル等、各種多価フェノール化合物や、ナフトール化合物が挙げられる。これらの硬化剤は、1種単独でも2種以上を組み合わせても使用することができる。   In view of curability and physical properties of the cured product, a phenol resin curing agent is preferable. Examples thereof include various polyphenol compounds such as phenol novolak, cresol novolak, phenol aralkyl, biphenyl aralkyl, naphthol aralkyl, and naphthol compounds. These curing agents can be used singly or in combination of two or more.

エポキシ樹脂組成物におけるフェノール樹脂系硬化剤の配合量は、好ましくは、フェノール性水酸基とエポキシ基との当量比(OH基当量/エポキシ基当量)が0.5〜1.5の範囲内となる量とすることが考慮される。より好ましくは、当量比が0.8〜1.2の範囲内となる量である。当量比がこのような範囲内であると、エポキシ樹脂組成物の硬化性を高め、ガラス転移温度の低下を抑制し、耐湿信頼性を高めることができる。他の硬化剤を用いる場合も、その硬化剤の反応基とエポキシ樹脂のエポキシ基との化学当量比が同様の範囲内となるように考慮される。   The compounding amount of the phenol resin-based curing agent in the epoxy resin composition is preferably such that the equivalent ratio of the phenolic hydroxyl group to the epoxy group (OH group equivalent / epoxy group equivalent) is in the range of 0.5 to 1.5. Considering the amount. More preferably, the amount is such that the equivalent ratio falls within the range of 0.8 to 1.2. When the equivalent ratio is within such a range, the curability of the epoxy resin composition can be increased, the glass transition temperature can be suppressed from decreasing, and the moisture resistance reliability can be increased. When other curing agents are used, it is considered that the chemical equivalent ratio between the reactive group of the curing agent and the epoxy group of the epoxy resin falls within the same range.

[硬化促進剤]
本発明の封止用エポキシ樹脂組成物においては、硬化剤として、あるいは硬化剤との併用として、いわゆる硬化促進剤と呼ばれるものを使用することができる。このような硬化促進剤としては、特に制限されず、公知のものをはじめとする各種のものを使用することができる。
[Curing accelerator]
In the sealing epoxy resin composition of the present invention, what is called a curing accelerator can be used as a curing agent or in combination with a curing agent. Such a curing accelerator is not particularly limited, and various types including a known one can be used.

たとえば、テトラフェニルホスホニウム・テトラフェニルボレートとトリフェニルホスフィン、あるいは他の有機ホスフィン類、ジアザビシクロウンデセン等の三級アミン類、2−メチルイミダゾール、2−フェニルイミダゾール等のイミダゾール類が挙げられる。   Examples include tetraphenylphosphonium / tetraphenylborate and triphenylphosphine, other organic phosphines, tertiary amines such as diazabicycloundecene, and imidazoles such as 2-methylimidazole and 2-phenylimidazole.

これらは、1種単独でも2種以上を組み合わせても使用することができる。
エポキシ樹脂組成物における硬化促進剤の配合量は、有効量であれば特にその範囲は制限されないが、エポキシ樹脂組成物の全量に対して通常、0.1〜5質量%の範囲内、好ましくは0.5〜2質量%の範囲内とすることが考慮される。
These can be used singly or in combination of two or more.
The range of the blending amount of the curing accelerator in the epoxy resin composition is not particularly limited as long as it is an effective amount, but is usually within the range of 0.1 to 5% by mass, preferably within the range of the total amount of the epoxy resin composition. It is considered to be in the range of 0.5 to 2% by mass.

[無機充填剤]
本発明の封止用エポキシ樹脂組成物の無機充填剤としては、その種類は特に制限されず、公知のものをはじめとする各種のものを使用することができる。たとえば、溶融シリカ、結晶シリカ、アルミナ、窒化珪素などが挙げられ、これらは、1種単独でも2種以上を組み合わせても使用することができる。無機充填剤の配合量は、エポキシ樹脂組成物の全量に対して好ましくは70〜90質量%の範囲内とすることが考慮される。
[Inorganic filler]
As the inorganic filler of the epoxy resin composition for sealing of the present invention, the kind thereof is not particularly limited, and various types including known ones can be used. Examples thereof include fused silica, crystalline silica, alumina, silicon nitride and the like, and these can be used alone or in combination of two or more. It is considered that the blending amount of the inorganic filler is preferably in the range of 70 to 90% by mass with respect to the total amount of the epoxy resin composition.

無機充填剤のシリカは、得られる硬化成形物の線膨張係数を低減することができ、好ましい。シリカのうちでも、溶融シリカを用いることが、高充填性、高流動性の点で好ましい。   Silica as an inorganic filler is preferable because it can reduce the coefficient of linear expansion of the obtained cured molded product. Among silicas, it is preferable to use fused silica in terms of high filling properties and high fluidity.

溶融シリカとしては、球状溶融シリカ、破砕溶融シリカを用いることができる。中でも、流動性を考慮すると、球状溶融シリカを用いることが特に好ましい。溶融シリカの粒子サイズとしては、平均粒径が5〜70μmの範囲のものを用いることが好ましい。さらに、平均粒径が0.5〜2μmの範囲の細かいシリカを併用すると、流動性が向上するので特に好ましい。   As the fused silica, spherical fused silica or crushed fused silica can be used. Among them, it is particularly preferable to use spherical fused silica in consideration of fluidity. As the particle size of the fused silica, it is preferable to use one having an average particle size in the range of 5 to 70 μm. Furthermore, it is particularly preferable to use fine silica having an average particle size in the range of 0.5 to 2 μm because the fluidity is improved.

[離型剤]
本発明の封止用エポキシ樹脂組成物では、
(a)離型剤として金型界面に介在して離型性を高める性能の優れた酸化ポリエチレン、
(b)性能バランスの良い天然カルナバ、
(c)樹脂成分との相溶性の良いヒドロキシステアリン酸アミド、モンタン酸ビスアミド
の3成分を同時に含む。
そして、(a)酸化ポリエチレンが、離型剤合計に対して50質量%以下である。
[Release agent]
In the epoxy resin composition for sealing of the present invention,
(A) a polyethylene oxide having an excellent performance to increase the releasability by interposing at the mold interface as a release agent;
(B) Natural carnava with good performance balance,
(C) Three components of hydroxystearic acid amide and montanic acid bisamide having good compatibility with the resin component are included at the same time.
And (a) polyethylene oxide is 50 mass% or less with respect to a mold release agent total.

併用された各離型剤は、封止用エポキシ樹脂組成物のなかに細かく分散する。そして、成形時の流動性、金型からの離型性が優れると共に、離型剤全体のブリードアウト、金型への離型剤の転写、成形品表面の汚れ、ボイド発生等が低減、抑制される。   Each release agent used in combination is finely dispersed in the epoxy resin composition for sealing. In addition to excellent fluidity and mold release from molding, bleeding out of the entire mold release agent, transfer of the mold release agent to the mold, contamination of the molded product surface, generation of voids, etc. are reduced or suppressed. Is done.

また、3成分の離型剤を、予め溶融混合して冷却した固化物を調製し、その粉砕物を他の配合材料と共にブレンドして封止用エポキシ樹脂組成物を調製すれば、各離型剤が封止用エポキシ樹脂組成物のなかに更に細かく分散する。これにより3成分で上述の協働作用を奏するので、作用効果がより顕著となる。   In addition, if a three-component release agent is melted and mixed in advance to prepare a solidified product, and the pulverized product is blended with other compounding materials to prepare an epoxy resin composition for sealing, each mold release The agent is further finely dispersed in the sealing epoxy resin composition. Thereby, since the above-described cooperative action is achieved with three components, the action and effect become more remarkable.

(a)酸化ポリエチレンの配合については、前記のとおり離型剤合計量の1〜50質量%の範囲内とするが、好ましくは、10〜35質量%、より好ましくは15〜30質量%の範囲内とすることが考慮される。   (A) About the mixing | blending of polyethylene oxide, as mentioned above, although it shall be in the range of 1-50 mass% of mold release agent total amount, Preferably, it is 10-35 mass%, More preferably, it is the range of 15-30 mass%. It is considered to be within.

また、離型剤の(b)成分、(c)成分については、各々、離型剤合計量に対して10〜60質量%の範囲内、より好ましくは15〜50質量%の範囲内とすることが考慮される。
そして、(a)(b)(c)3成分を含む離型剤の合計量は、エポキシ樹脂組成物の全量に対して、好ましくは、0.03〜3質量%の範囲内とすること、より好ましくは、0.1〜1質量%の範囲内とすることが考慮される。成形作業性などを考慮すると、3成分を含む離型剤の合計量は、エポキシ樹脂組成物の全量に対して、0.03質量%以上が好ましい。また、成形物表面の滑らかさなどを考慮すると、エポキシ樹脂組成物の全量に対して、3質量%以下が好ましい。
In addition, the component (b) and the component (c) of the release agent are each in the range of 10 to 60% by mass, more preferably in the range of 15 to 50% by mass with respect to the total amount of the release agent. It is considered.
And the total amount of the release agent containing the three components (a), (b) and (c) is preferably within a range of 0.03 to 3% by mass with respect to the total amount of the epoxy resin composition, More preferably, it is considered to be in the range of 0.1 to 1% by mass. Considering molding workability and the like, the total amount of the release agent containing the three components is preferably 0.03% by mass or more based on the total amount of the epoxy resin composition. In consideration of the smoothness of the surface of the molded product, 3% by mass or less is preferable with respect to the total amount of the epoxy resin composition.

[酸化ポリエチレン]
酸化ポリエチレン(酸化PE)としては、滴点、酸価、数平均分子量、密度、平均粒径等の数値を適宜選定して用いることが好ましい。滴点としては、100〜130℃、酸価としては10〜70mgKOH/g、数平均分子量としては、800〜3000、密度としては、0.8〜1.1g/立方cmが好ましい範囲である。本発明の封止用エポキシ樹脂組成物の連続成形性を高めるなどの効果を奏する。
[Polyethylene oxide]
As the oxidized polyethylene (oxidized PE), it is preferable to appropriately select and use numerical values such as a dropping point, an acid value, a number average molecular weight, a density, and an average particle diameter. The dropping point is preferably 100 to 130 ° C., the acid value is 10 to 70 mgKOH / g, the number average molecular weight is 800 to 3000, and the density is 0.8 to 1.1 g / cubic cm. The effect of improving the continuous moldability of the epoxy resin composition for sealing of the present invention is exhibited.

[天然カルナバ]
天然カルナバとしては、好ましくは、数平均分子量:340〜820、融点:82〜86℃、比重:0.99〜1.00程度のものが用いられる。
[Natural carnauba]
As the natural carnauba, those having a number average molecular weight of 340 to 820, a melting point of 82 to 86 ° C., and a specific gravity of about 0.99 to 1.00 are preferably used.

[ヒドロキシステアリン酸アミド]
本発明の封止用エポキシ樹脂組成物においては、脂肪族アミド系離型剤の中でも、ヒドロキシステアリン酸アミドが特に好ましく用いられる。ヒドロキシステアリン酸アミドは、いわゆる離型剤として金型界面に介在して離型性を高めるほか、組成物中の樹脂成分と相溶性が良く、樹脂組成物の流動性を高める。
このため、上記した酸化ポリエチレンワックス、天然カルナバとの併用で、それら他の離型剤と親和性を持ち、離型剤全体のブリードアウトや金型への転写が抑制される。
[Hydroxystearic acid amide]
In the epoxy resin composition for sealing of the present invention, hydroxystearic acid amide is particularly preferably used among the aliphatic amide release agents. Hydroxystearic acid amide is a so-called mold release agent, intervening at the mold interface to improve the mold release property, and has good compatibility with the resin component in the composition, thereby improving the fluidity of the resin composition.
For this reason, when used in combination with the above-described oxidized polyethylene wax and natural carnauba, it has an affinity with other mold release agents, and bleed-out of the entire mold release agent and transfer to the mold are suppressed.

特に、水酸基が脂肪族鎖の中央付近にある12−ヒドロキシステアリン酸の酸アミド化物である、12−ヒドロキシステアリン酸アミドは、脂肪族アルコールの部位をもつ分子構造から、樹脂成分との相溶性が特に優れ、樹脂組成物の流動性を高める作用も高いので、酸化ポリエチレンワックス、天然カルナバと併用された場合に、さらに優れた効果を奏する。   In particular, 12-hydroxystearic acid amide, which is an acid amidation product of 12-hydroxystearic acid having a hydroxyl group near the center of the aliphatic chain, has compatibility with a resin component due to the molecular structure having an aliphatic alcohol moiety. Since the resin composition is particularly excellent and has a high effect of increasing the fluidity of the resin composition, it has a further excellent effect when used in combination with oxidized polyethylene wax and natural carnauba.

[モンタン酸ビスアミド]
本発明の封止用エポキシ樹脂組成物において、ヒドロキシステアリン酸アミドと同様に好適な脂肪族アミド系離型剤として、モンタン酸ビスアミドのメチレンビスモンタン酸アミド、エチレンビスモンタン酸アミドが挙げられる。
モンタン酸ビスアミドは、脂肪酸アミドがメチレン鎖で繋がって2量化したアルキレン脂肪酸アミドの構造を持ち、100℃以上の高融点で、樹脂成分と相溶性が優れ、樹脂組成物の流動性を高める作用も高い。このため、酸化ポリエチレンワックス、天然カルナバと併用の場合、離型剤全体のブリードアウトや金型への転写が低減、抑制される。
[Montannic acid bisamide]
In the epoxy resin composition for sealing of the present invention, examples of suitable aliphatic amide release agents similar to hydroxystearic acid amide include methylene bis-montanic acid amide of montanic acid bisamide and ethylene bis-montanic acid amide.
Montanic acid bisamide has a structure of an alkylene fatty acid amide in which fatty acid amides are dimerized by a methylene chain, has a high melting point of 100 ° C. or higher, has excellent compatibility with resin components, and has an effect of increasing the fluidity of the resin composition. high. For this reason, when used in combination with polyethylene oxide wax and natural carnauba, bleeding out of the entire release agent and transfer to the mold are reduced or suppressed.

[カップリング剤]
カップリング剤として、シランカップリング剤、チタネートカップリング剤、アルミニウムカップリング剤、ジルコニウムカップリング剤等を更に配合することが考慮される。
シリカ系の無機充填剤を配合する場合は、シランカップリング剤が好適である。γ−メルカプトプロピルトリメトキシシラン等のメルカプトシラン、γ−グリシドキシプロピルトリメトキシシラン等のグリシドキシシラン、アミノシラン等が挙げられる。これらは単独で使用しても、2種類以上の併用でもよい。
[Coupling agent]
As a coupling agent, it is considered that a silane coupling agent, a titanate coupling agent, an aluminum coupling agent, a zirconium coupling agent or the like is further blended.
When a silica-based inorganic filler is blended, a silane coupling agent is suitable. Examples include mercaptosilane such as γ-mercaptopropyltrimethoxysilane, glycidoxysilane such as γ-glycidoxypropyltrimethoxysilane, and aminosilane. These may be used alone or in combination of two or more.

カップリング剤の配合により、無機充填剤の分散性、耐熱性や、樹脂成形物の耐トラッキング性をより高めることができる。
なお、カップリング剤は、封止用エポキシ樹脂組成物の調製時に配合しても良いが、予め無機充填剤の表面処理に適用すれば、より効果的である。
By blending the coupling agent, the dispersibility and heat resistance of the inorganic filler and the tracking resistance of the resin molded product can be further enhanced.
In addition, although a coupling agent may be mix | blended at the time of preparation of the epoxy resin composition for sealing, if it applies beforehand to the surface treatment of an inorganic filler, it will be more effective.

[その他配合成分]
本発明の封止用エポキシ樹脂組成物には、本発明の効果を損なわない範囲内において、さらに他の成分を配合することができる。例えば、水酸化マグネシウム、水酸化アルミニウム、赤リンなどの難燃剤、カーボンブラックなどの着色剤、シリコーンエラストマーなどの低応力化剤、無機イオントラップ剤等である。これらは単独で使用しても、2種類以上の併用でもよい。
[Other ingredients]
The sealing epoxy resin composition of the present invention can further contain other components within a range not impairing the effects of the present invention. Examples thereof include flame retardants such as magnesium hydroxide, aluminum hydroxide and red phosphorus, colorants such as carbon black, low stress agents such as silicone elastomers, inorganic ion trapping agents and the like. These may be used alone or in combination of two or more.

[封止用エポキシ樹脂組成物の製造]
本発明の封止用エポキシ樹脂組成物の製造では、まず、上記のエポキシ樹脂をはじめとする各成分をミキサー、ブレンダー等を用いて十分均一になるまで混合する。その後、熱ロールやニーダー等の混練機により加熱状態で溶融混合し、これを室温に冷却した後、公知の手段により粉砕する。
[Manufacture of epoxy resin composition for sealing]
In the production of the epoxy resin composition for sealing of the present invention, first, each component including the above epoxy resin is mixed using a mixer, a blender or the like until it becomes sufficiently uniform. Thereafter, the mixture is melt-mixed in a heated state by a kneader such as a hot roll or a kneader, cooled to room temperature, and then pulverized by a known means.

なお、本発明の封止用エポキシ樹脂組成物は、粉末状であっても良いが、取扱いを容易にするために、成形条件に合うような寸法と質量に打錠したタブレットとしてもよい。
本発明の封止用エポキシ樹脂組成物では、良好な成形性、離型性を備え、且つ、成形物表面への離型剤滲みだしが少ないので、成形物表面上の汚れを低減、抑制することができる。
また、半導体装置のパッケージ成形において、成形物が滑らかに成形金型から離型し、成形作業性に優れると共に、金型側に離型剤の残留や転写が起こりにくいので、それら離型剤による金型の汚染も起こりにくい。
In addition, although the epoxy resin composition for sealing of this invention may be a powder form, in order to handle easily, it is good also as a tablet compressed into the dimension and mass which match | combine with molding conditions.
The sealing epoxy resin composition of the present invention has good moldability and releasability, and has little exudation of the release agent on the surface of the molded product, thereby reducing and suppressing contamination on the surface of the molded product. be able to.
Also, in the molding of semiconductor device packages, the molded product is smoothly released from the molding die, and is excellent in molding workability, and it is difficult for the mold release agent to remain or transfer on the mold side. Mold contamination is less likely to occur.

[半導体装置]
本発明の半導体装置は、上記のようにして得られた封止用エポキシ樹脂組成物を用いて封止することにより製造することができる。
半導体素子としては、例えば、集積回路、大規模集積回路、トランジスタ、サイリスタ、ダイオード、固体撮像素子等を用いることができる。
[Semiconductor device]
The semiconductor device of the present invention can be manufactured by sealing using the sealing epoxy resin composition obtained as described above.
As the semiconductor element, for example, an integrated circuit, a large-scale integrated circuit, a transistor, a thyristor, a diode, a solid-state imaging element, or the like can be used.

本発明の半導体装置のパッケージ形態としては、例えば、プラスチック・リード付きチップ・キャリア(PLCC)、クワッド・フラット・パッケージ(QFP)、薄型クワッド・フラット・パッケージ(TQFP)、スモール・アウトライン・パッケージ(SOP)、スモール・アウトライン・Jリード・パッケージ(SOJ)、薄型スモール・アウトライン・パッケージ(TSOP)、テープ・キャリア・パッケージ(TCP)等の表面実装型パッケージを挙げることができる。
また、本発明の半導体装置のパッケージ形態としては、ボール・グリッド・アレイ(BGA)等のエリア実装型のパッケージや、デュアル・インライン・パッケージ(DIP)等の挿入型パッケージを挙げることもできる。
As a package form of the semiconductor device of the present invention, for example, a chip carrier with plastic lead (PLCC), a quad flat package (QFP), a thin quad flat package (TQFP), a small outline package (SOP) ), A small outline J-lead package (SOJ), a thin small outline package (TSOP), a surface mount package such as a tape carrier package (TCP).
Further, examples of the package form of the semiconductor device of the present invention include an area mounting type package such as a ball grid array (BGA) and an insertion type package such as a dual inline package (DIP).

本発明の半導体装置パッケージの具体的な製造方法を、代表的なトランスファー成形法で例示、説明する。
まず、半導体素子を搭載したリードフレーム、回路基板等を金型キャビティ内に設置し、その後、このキャビティ内に溶融状態の封止用エポキシ樹脂組成物を所定の圧力で注入し、溶融したエポキシ樹脂組成物で半導体素子を包み込みながら充満する。
このときの注入圧力は、エポキシ樹脂組成物や半導体装置の種類等に応じて適宜設定することができるが、例えば4〜7MPa、金型温度は、例えば、160〜190℃、成形時間は、例えば30〜300秒等に設定することができる。
A specific method for manufacturing the semiconductor device package of the present invention will be illustrated and described by a typical transfer molding method.
First, a lead frame on which a semiconductor element is mounted, a circuit board, and the like are installed in a mold cavity, and then a molten epoxy resin composition in a molten state is injected into the cavity at a predetermined pressure to melt the epoxy resin The semiconductor element is filled with the composition while being wrapped.
The injection pressure at this time can be appropriately set according to the epoxy resin composition, the type of the semiconductor device, and the like. For example, the mold temperature is, for example, 160 to 190 ° C., and the molding time is, for example, It can be set to 30 to 300 seconds or the like.

次に、金型を閉じたまま後硬化(ポストキュア)を行った後、型開きして、成形物の半導体装置パッケージを取り出す。後硬化条件は、例えば、160〜190℃、2〜8時間に設定することができる。
本発明の半導体装置の成形品パッケージは、表面のボイド生成が抑制された滑らかな成形表面を持ち、高充填で緻密に成形されているので、耐湿性、耐熱性も高く、物理的な諸特性も安定しており、信頼性が高い。併せて、成形作業性も優れたものとなる。
Next, after performing post-curing (post-cure) with the mold closed, the mold is opened to take out the molded semiconductor device package. Post-curing conditions can be set to 160 to 190 ° C. and 2 to 8 hours, for example.
The molded product package of the semiconductor device of the present invention has a smooth molding surface with suppressed void formation on the surface, and is densely molded with high filling, so it has high moisture resistance and heat resistance, and various physical properties Is stable and highly reliable. In addition, the molding workability is also excellent.

さらに、本発明の封止用エポキシ樹脂組成物により封止された半導体装置は、成形されたパッケージ表面に離型剤の滲みだしや汚染が極めて少なく、成形物表面が滑らかできれいなため、その後のリフロー半田付け、表面実装などの工程でも不具合を発生しにくく、性能が高く安定している。   Furthermore, the semiconductor device sealed with the sealing epoxy resin composition of the present invention has very little bleeding and contamination of the release agent on the molded package surface, and the molded product surface is smooth and clean. Even in processes such as reflow soldering and surface mounting, it is less likely to cause defects and has high performance and stability.

以下に実施例および比較例を示す。
〈実施例1〉
下記の各材料を表1の配合処方で調整し、ブレンダーで30分間混合し均一化した後、80℃に加熱した2本ロールで混練溶融させて押し出し、冷却後、粉砕機で所定粒度に粉砕して、粒状の封止用エポキシ樹脂組成物を得た。
Examples and comparative examples are shown below.
<Example 1>
The following materials are adjusted according to the formulation shown in Table 1, mixed for 30 minutes with a blender, homogenized, kneaded and melted with two rolls heated to 80 ° C, extruded, cooled, and then pulverized to a predetermined particle size with a pulverizer Thus, a granular sealing epoxy resin composition was obtained.

(エポキシ樹脂)
O−クレゾールノボラック型エポキシ樹脂:住友化学(株)製の「ESCN 195XL」エポキシ当量195
(硬化剤)
フェノールノボラック樹脂:荒川化学(株)製の「タマノール752」水酸基当量104
(無機充填剤)
結晶シリカ:龍森製の「3K」平均粒径30μm
(Epoxy resin)
O-cresol novolac type epoxy resin: “ESCN 195XL” epoxy equivalent 195 manufactured by Sumitomo Chemical Co., Ltd.
(Curing agent)
Phenol novolac resin: “Tamanol 752” hydroxyl equivalent 104 manufactured by Arakawa Chemical Co., Ltd.
(Inorganic filler)
Crystalline silica: “3K” average particle size 30 μm made by Tatsumori

(酸化ポリエチレン)
酸化ポリエチレンワックス:クラリアント社製の「PED−136」
(天然カルナバ)
天然カルナバワックス:大日化学工業(株)製の「F1−100」
(ヒドロキシステアリン酸アミド)
12−ヒドロキシステアリン酸アミド:大日化学工業(株)製
(モンタン酸ビスアミド)
メチレンビスモンタン酸アミド:大日化学工業(株)製
(Polyethylene oxide)
Oxidized polyethylene wax: “PED-136” manufactured by Clariant
(Natural carnauba)
Natural carnauba wax: “F1-100” manufactured by Dainichi Chemical Co., Ltd.
(Hydroxystearic acid amide)
12-hydroxystearic acid amide: manufactured by Dainichi Chemical Industry Co., Ltd. (montanic acid bisamide)
Methylenebismontanamide: manufactured by Dainichi Chemical Co., Ltd.

(カップリング剤)
γ−グリシドキシプロピルトリメトキシシラン:信越化学工業(株)製の「KBM403」
(着色剤)
カーボンブラック:三菱化学(株)製の「MA600MJ」
〈実施例2、比較例1〜6〉
上記の各材料を表1の配合処方で調整し、〈実施例1〉と同様にして粒状の封止用エポキシ樹脂組成物を得た。
(Coupling agent)
γ-glycidoxypropyltrimethoxysilane: “KBM403” manufactured by Shin-Etsu Chemical Co., Ltd.
(Coloring agent)
Carbon black: “MA600MJ” manufactured by Mitsubishi Chemical Corporation
<Example 2, Comparative Examples 1-6>
Each of the above materials was adjusted according to the formulation of Table 1, and a granular sealing epoxy resin composition was obtained in the same manner as in Example 1.

〈実施例3〉
実施例3では、実施例1と同じ量比の離型剤3種(酸化ポリエチレン25質量%、天然カルナバ25質量%、モンタン酸ビスアミド50質量%)について、予め、120℃で融解し、ディスパーで15分間溶融混合した後、常温まで冷却して溶融混合固化物を調製した。その粉砕物を他の配合材料と共に実施例1と同じ配合量比でブレンダーに投入して30分間混合し均一化した後、80℃に加熱した2本ロールで混練溶融させて押し出し、冷却後、粉砕機で所定粒度に粉砕して、粒状の封止用エポキシ樹脂組成物を得た。
<Example 3>
In Example 3, three types of release agents (25% by mass of polyethylene oxide, 25% by mass of natural carnauba, 50% by mass of tan montanoic acid) having the same quantitative ratio as in Example 1 were previously melted at 120 ° C. After melt mixing for 15 minutes, the mixture was cooled to room temperature to prepare a melt-mixed solidified product. The pulverized product was added to a blender at the same blending ratio as in Example 1 together with other blended materials, mixed and homogenized for 30 minutes, then kneaded and melted with two rolls heated to 80 ° C., cooled, It grind | pulverized to the predetermined particle size with the grinder, and obtained the granular epoxy resin composition for sealing.

以上の実施例1〜3、比較例1〜6の各々の封止用エポキシ樹脂組成物を用いて次の評価を行った。
〈評価〉
[スパイラルフロー]
ASTM D3123Aに準じたスパイラルフロー測定金型を用いて、金型温度:175℃、注入圧力:70kgf/平方cm、成形時間:90秒、後硬化:175℃/6hの条件で、封止用エポキシ樹脂組成物のトランスファー成形を行い、流動距離(cm)を測定した。
The following evaluation was performed using the epoxy resin compositions for sealing in Examples 1 to 3 and Comparative Examples 1 to 6 described above.
<Evaluation>
[Spiral flow]
Using a spiral flow measurement mold in accordance with ASTM D3123A, mold temperature: 175 ° C., injection pressure: 70 kgf / square cm, molding time: 90 seconds, post-curing: 175 ° C./6 h, sealing epoxy The resin composition was transfer molded and the flow distance (cm) was measured.

スパイラルフローは、成形性の目安となる値であり、流動距離(cm)が長いほど流動性の良い成形材料であることを示す。
[ゲルタイム]
キュラストメータを用いて、160℃に保持した封止用エポキシ樹脂組成物の硬化トルクを経時的に測定し、硬化トルク値が0.1kgfになるまでの時間(s)をゲルタイムとして測定した。この値が小さい方が硬化性が早いことを示す。
Spiral flow is a value that is a measure of moldability, and a longer flow distance (cm) indicates a molding material with better flowability.
[Geltime]
Using a curast meter, the curing torque of the sealing epoxy resin composition maintained at 160 ° C. was measured over time, and the time (s) until the curing torque value reached 0.1 kgf was measured as the gel time. A smaller value indicates faster curability.

[パッケージ表面汚れ]
ガラス基材エポキシ樹脂基板(寸法140×50×0.5mmt)に、寸法4×4×0.4mmtの評価用チップを、マトリックス状に30個銀ペーストを用いて搭載した、外形寸法138×38×0.8mmtの一括封止型BGA(Ball Grid Array)パッケージを上記のスパイラルフロー試験と同じ条件でトランスファー成形し、目視にてパッケージ表面の汚れ具合を確認した。
○:汚れ有 ×:汚れ無
[Package surface contamination]
An external dimension of 138 × 38, in which 30 evaluation chips of a size of 4 × 4 × 0.4 mmt are mounted on a glass base epoxy resin substrate (size of 140 × 50 × 0.5 mmt) in a matrix using silver paste. A 0.8 mmt batch sealed BGA (Ball Grid Array) package was transfer molded under the same conditions as in the spiral flow test, and the contamination of the package surface was visually confirmed.
○: Dirt is present ×: Dirt is absent

[評価結果]
表1の評価結果をみると、酸化ポリエチレンを含まない2成分の離型剤のエポキシ樹脂組成物(比較例3〜4)、天然カルナバを含まない2成分の離型剤のエポキシ樹脂組成物(比較例5)、 ヒドロキシステアリン酸アミド、モンタン酸ビスアミドのいずれも含まない2成分の離型剤のエポキシ樹脂組成物(比較例6)では、どれも、パッケージ表面汚れが見られる。
[Evaluation results]
When the evaluation result of Table 1 is seen, the epoxy resin composition (comparative examples 3-4) of the 2 component mold release agent which does not contain polyethylene oxide, the epoxy resin composition of the 2 component mold release agent which does not contain natural carnauba ( In Comparative Example 5), the epoxy resin composition (Comparative Example 6), which is a two-component release agent containing neither hydroxystearic acid amide nor montanic acid bisamide, shows package surface contamination.

また、酸化ポリエチレンが50質量%を越えた過剰の事例(比較例1〜2)では、3成分の離型剤を同時に含むエポキシ樹脂組成物であっても、やはり、パッケージ表面汚れが見られる。
実施例1、実施例2、並びに、実施例1と同じ量比の離型剤3種を予め、溶融混合し固化物を調製し、その粉砕物を配合したエポキシ樹脂組成物の実施例3では、パッケージ表面汚れが全く見られず、スパイラルフロー値も高く成形時の流動性も優れていることが確認された。特に、実施例3では、パッケージ表面汚れの抑制、スパイラルフロー値、ゲルタイムのいずれも優れていた。また、パッケージ表面を精査すると、離型剤の溶け残りに由来する細かな凹凸が認められなかった。
Moreover, in the excess case (Comparative Examples 1-2) in which the oxidized polyethylene exceeds 50% by mass, the package surface contamination is still seen even with the epoxy resin composition containing the three-component release agent at the same time.
In Example 3, Example 2, and Example 3 of an epoxy resin composition in which three kinds of release agents having the same amount ratio as in Example 1 were previously melt-mixed to prepare a solidified product and the pulverized product was blended. It was confirmed that no package surface contamination was observed, the spiral flow value was high, and the fluidity during molding was excellent. In particular, in Example 3, all of the suppression of package surface contamination, the spiral flow value, and the gel time were excellent. Further, when the package surface was scrutinized, fine irregularities derived from the undissolved part of the release agent were not observed.

Figure 2012201695
Figure 2012201695

Claims (5)

エポキシ樹脂、硬化剤、無機充填剤とともに離型剤を含む封止用エポキシ樹脂組成物であって、前記離型剤は、下記(a)、(b)、(c)成分を含み、成分(a)が離型剤合計に対して50質量%以下であることを特徴とする封止用エポキシ樹脂組成物。
(a)酸化ポリエチレン
(b)天然カルナバ
(c)ヒドロキシステアリン酸アミド及びモンタン酸ビスアミドのうちの少なくとも一種
An epoxy resin composition for sealing containing a release agent together with an epoxy resin, a curing agent, and an inorganic filler, wherein the release agent includes the following components (a), (b), and (c): An epoxy resin composition for sealing, wherein a) is 50% by mass or less based on the total amount of release agents.
(A) polyethylene oxide (b) natural carnauba (c) at least one of hydroxystearic acid amide and montanic acid bisamide
離型剤の合計の配合量は、封止用エポキシ樹脂組成物の全体に対して0.03〜3質量%であることを特徴とする請求項1に記載の封止用エポキシ樹脂組成物。   2. The sealing epoxy resin composition according to claim 1, wherein a total amount of the release agent is 0.03 to 3% by mass with respect to the entire sealing epoxy resin composition. 離型剤は、予め前記(a)、(b)、(c)の3成分を加熱により溶融、混合後常温まで冷却した固化物として配合されていることを特徴とする請求項1または2に記載の封止用エポキシ樹脂組成物。   The release agent is blended in advance as a solidified product obtained by melting and mixing the three components (a), (b), and (c) in advance and cooling them to room temperature. The epoxy resin composition for sealing as described. さらに、カップリング剤を含むことを特徴とする請求項1から3のいずれかに記載の封止用エポキシ樹脂組成物。   The sealing epoxy resin composition according to claim 1, further comprising a coupling agent. 請求項1から4のいずれかに記載の封止用エポキシ樹脂組成物により封止されたことを特徴とする半導体装置。   A semiconductor device sealed with the sealing epoxy resin composition according to claim 1.
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