JP2012186156A - 照明装置 - Google Patents
照明装置 Download PDFInfo
- Publication number
- JP2012186156A JP2012186156A JP2012027024A JP2012027024A JP2012186156A JP 2012186156 A JP2012186156 A JP 2012186156A JP 2012027024 A JP2012027024 A JP 2012027024A JP 2012027024 A JP2012027024 A JP 2012027024A JP 2012186156 A JP2012186156 A JP 2012186156A
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- substrate
- lighting device
- light emitting
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002184 metal Substances 0.000 claims abstract description 196
- 239000000758 substrate Substances 0.000 claims abstract description 94
- 239000000126 substance Substances 0.000 claims abstract description 60
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 20
- 238000000926 separation method Methods 0.000 claims description 15
- 239000004020 conductor Substances 0.000 claims description 10
- 238000005498 polishing Methods 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000009413 insulation Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 250
- 230000006866 deterioration Effects 0.000 description 22
- 238000002347 injection Methods 0.000 description 20
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- 230000005525 hole transport Effects 0.000 description 18
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- 230000000694 effects Effects 0.000 description 15
- 238000005286 illumination Methods 0.000 description 15
- 239000007789 gas Substances 0.000 description 13
- 230000004888 barrier function Effects 0.000 description 12
- 230000017525 heat dissipation Effects 0.000 description 12
- AZFHXIBNMPIGOD-UHFFFAOYSA-N 4-hydroxypent-3-en-2-one iridium Chemical compound [Ir].CC(O)=CC(C)=O.CC(O)=CC(C)=O.CC(O)=CC(C)=O AZFHXIBNMPIGOD-UHFFFAOYSA-N 0.000 description 8
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 8
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
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- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 3
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- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 3
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- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 3
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical group C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 2
- XOYZGLGJSAZOAG-UHFFFAOYSA-N 1-n,1-n,4-n-triphenyl-4-n-[4-[4-(n-[4-(n-phenylanilino)phenyl]anilino)phenyl]phenyl]benzene-1,4-diamine Chemical group C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 XOYZGLGJSAZOAG-UHFFFAOYSA-N 0.000 description 2
- IYZMXHQDXZKNCY-UHFFFAOYSA-N 1-n,1-n-diphenyl-4-n,4-n-bis[4-(n-phenylanilino)phenyl]benzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 IYZMXHQDXZKNCY-UHFFFAOYSA-N 0.000 description 2
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- 238000003980 solgel method Methods 0.000 description 2
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- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
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- 238000005553 drilling Methods 0.000 description 1
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- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
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- 239000011159 matrix material Substances 0.000 description 1
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- 229910000484 niobium oxide Inorganic materials 0.000 description 1
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- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
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- VLRICFVOGGIMKK-UHFFFAOYSA-N pyrazol-1-yloxyboronic acid Chemical compound OB(O)ON1C=CC=N1 VLRICFVOGGIMKK-UHFFFAOYSA-N 0.000 description 1
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- 230000005855 radiation Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
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- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
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- 229910052712 strontium Inorganic materials 0.000 description 1
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- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
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Images
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
- H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/87—Arrangements for heating or cooling
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8794—Arrangements for heating and cooling
Abstract
【解決手段】基板と、基板の一方の面に形成された発光素子と、当該基板の発光素子が形成された面と反対側の面に形成された裏面金属層を有し、発光素子は一対の電極間に発光物質を含む有機化合物層挟んで構成されており、基板は、内部に内部金属層を1層以上有する有機絶縁層と金属層の積層構造を有し、内部金属層が有機絶縁層に設けられた貫通孔を介して裏面金属層に熱的に結合されており、貫通孔は、当該貫通孔を介さずに熱的に結合した場合と比較して熱抵抗が小さくなるような構造を有している照明装置を提供する。
【選択図】図1
Description
また、本発明の照明装置は、製造コスト的に有利であり、且つ信頼性の高い照明装置である。
図1は本発明の一態様である照明装置の断面図の模式図である。なおここでは、本発明の照明装置の一部を抜き出して図示している。図1(A)においては、基板100の表面にEL素子101が形成されている。EL素子101は、第1の電極102と第2の電極104との間に発光物質を含む有機化合物層103を挟んで構成されており、第1の電極102と第2の電極104との間に電流を流すことによって発光する。照明装置は複数のEL素子で構成されていても、一つのEL素子で構成されていても良い。複数のEL素子によって照明装置が構成されている場合、図のように直列に接続されていてもよいが、並列に接続されていてもよいし、両方を組み合わせて接続されていても良い。また、一つ一つのEL素子が独立していても良い。
裏面金属層は熱伝導性の高い材料で形成されているため、図5に示したように、熱伝導性の部材500はEL素子ごとに分離されている裏面金属層の一部にでも重なっていれば(絶縁層を介している場合も含むものとする)、有効に放熱効果を得ることができる。そのため、図5のように、熱伝導性の部材500を形成していない部分に外部接続端子や集積回路を設けることが可能となる。ヒートシンクはその面積が大きいほど放熱効果を発揮するため、外部接続端子や集積回路の上にまで形成することによって、照明装置の面積を最大限に利用して大きな放熱効果も得ることができる。
また、この際、各EL素子に接続している裏面金属層を一箇所に集めることによって、一部に熱伝導性の部材を形成すれば、集まった分のEL素子の熱を有効にヒートシンクに伝えることができる。すなわち、一箇所に放熱部分を集めることによって、その他の部分を自由に使えるようになり、さらに回路構成や配置の自由度が向上する。この場合、一箇所に裏面金属層が集中することから、接続するEL素子によって裏面金属層の大きさが異なる場合もある。
このように裏面金属層を用いて放熱効果を得ることによって、放熱構造の自由度も向上させることが可能となる。
第2の電極104を陽極として用いる場合には、透光性を有する程度に薄く形成する、前述の透光性を有する金属酸化物をもちるなどすればよい。
なお、有機化合物層103の陽極と接する面に後述の複合材料を用いることによって、仕事関数の大小にかかわらず、電極材料を選択することができるようになる。
第2の電極104を陰極として用いる場合には、充分な透光性を有する程度にこれら材料を薄く形成することによって透明導電膜として用いることができる。また、これらの材料を透光性を有する程度に薄く形成したのち、上述の透光性を有する金属酸化物と積層することによって第2の電極104を形成しても良い。
なお、有機化合物層103の陰極に、アルカリ金属又はアルカリ土類金属又はそれらの化合物、又は電子輸送性物質に、当該電子輸送性物質に対して電子供与性を示す物質を添加した材料(以下ドナー準位を有する材料と称する)を用いることによって、仕事関数の大小にかかわらず電極材料を選択することができるようになる。すなわち、ITOに代表される酸化物透明導電膜を陰極の材料として用いることができる。また、複合材料からなる層とドナー準位を有する材料からなる層との積層体からなる電荷発生層を用いても同様の効果を得ることができる(但し、この場合は複合材料からなる層が陰極と接することとする)。
図6(B)においては、二つの発光ユニット(第1の発光ユニット800及び第2の発光ユニット801)が積層されている構成を例示したが、3層以上の発光ユニットを積層することも可能である。この際も各発光ユニットの間には電荷発生層が設けられていることが好ましい。
これらの層の詳しい説明は上述したとおりであるので繰り返しとなる説明を省略する。図6(A)における有機化合物層103の説明を参照されたい。
本実施の形態では、本発明の一態様により形成された発光装置を用いた照明装置について図7及び図8を用いて説明する。
101 EL素子
102 第1の電極
103 有機化合物層
104 第2の電極
106 裏面金属層
107 内部金属層
108 有機絶縁層
109 貫通孔
110 貫通孔
111 貫通孔
112 貫通孔
114 分離エリア
120 凹凸構造
130 絶縁膜
131 熱伝導性の接着剤やシート
132 ヒートシンク
200 貫通孔
201 第1の電極
301 絶縁膜
302 隔壁
303 有機化合物層
304 第2の電極
400 領域
401 シール材
402 封止基板
404 集積回路
405 ヒートシンク
410 有機絶縁層
411 内部金属層
412 シール材
420 領域
500 熱伝導性の部材
501 ヒートシンク
502 集積回路
702 陽極
704 陰極
711 正孔注入層
712 正孔輸送層
713 発光層
714 電子輸送層
715 電子注入層
800 第1の発光ユニット
801 第2の発光ユニット
803 電荷発生層
3000 卓上照明装置
3001 天井固定型照明装置
3002 壁掛け型照明装置
7501 照明部
7502 傘
7503 可変アーム
7504 支柱
7505 台
7506 電源スイッチ
Claims (22)
- 基板と、
前記基板の一方の面に形成された発光素子と、
前記基板における、前記発光素子が形成された面の反対側の面に形成された裏面金属層を有し、
前記発光素子は一対の電極間に発光物質を含む有機化合物層を挟んで構成されており、
前記基板は、内部に内部金属層を1層以上有する有機絶縁層と金属層の積層構造を有し、
前記内部金属層は前記有機絶縁層に設けられた貫通孔を介して前記裏面金属層に熱的に結合されており、
前記貫通孔は、上記構成において前記貫通孔を介さずに前記内部金属層と前記裏面金属層が熱的に結合された場合と比較して熱抵抗が小さくなるような構造を有している照明装置。 - 基板と、
前記基板の一方の面に形成された発光素子と、
前記基板における、前記発光素子が形成された面の反対側の面に形成された裏面金属層を有し、
前記発光素子は一対の電極間に発光物質を含む有機化合物層を挟んで構成されており、
前記基板は、内部に内部金属層を1層以上有する有機絶縁層と金属層の積層構造を有し、
前記内部金属層は前記発光素子の一方の電極と電気的に接続されており、また、前記内部金属層は前記有機絶縁層に設けられた貫通孔を介して前記裏面金属層に熱的に結合されており、
前記貫通孔は、上記構成において前記貫通孔を介さずに前記内部金属層と前記裏面金属層が熱的に結合された場合と比較して熱抵抗が小さくなるような構造を有している照明装置。 - 基板と、
前記基板の一方の面に形成された複数の発光素子と、
前記基板における、前記複数の発光素子が形成された面の反対側の面に形成された裏面金属層を有し、
前記複数の発光素子は一対の電極間に発光物質を含む有機化合物層挟んで構成されており、
前記基板は、内部に内部金属層を1層以上有する有機絶縁層と金属層の積層構造を有し、
前記内部金属層は前記発光素子の一方の電極と電気的に接続されており、また、前記内部金属層は前記有機絶縁層に設けられた貫通孔を介して前記裏面金属層に電気的に接続されており、
前記内部金属層及び前記裏面金属層は、少なくとも各々接続する前記発光素子の電極の電圧ごとに電気的に独立している照明装置。 - 基板と、
前記基板の一方の面に形成された複数の発光素子と、
前記基板における、前記複数の発光素子が形成された面の反対側の面に形成された裏面金属層を有し、
前記複数の発光素子は一対の電極間に発光物質を含む有機化合物層挟んで構成されており、
前記基板は、内部に内部金属層を1層以上有する有機絶縁層と金属層の積層構造を有し、
前記内部金属層は前記発光素子の一方の電極と電気的に接続されており、また、前記内部金属層は前記有機絶縁層に設けられた貫通孔を介して前記裏面金属層に電気的に接続されており、
前記内部金属層及び前記裏面金属層は、各々接続する前記発光素子ごとに分離している照明装置。 - 請求項4において、前記基板はその厚さ方向に貫く方向において1層以上の前記内部金属層又は前記裏面金属層が存在する照明装置。
- 請求項4又は請求項5において、隣り合う前記内部金属層と前記裏面金属層又は前記内部金属層同士の分離エリアは、前記基板を積層膜から垂直な方向からみた場合、概略直交する方向に重なっていることを特徴とする照明装置。
- 請求項1乃至請求項6のいずれか一項において、前記貫通孔の側面および底面もしくは上面が有機絶縁膜より熱伝導率の大きい材料によって覆われていることを特徴とする照明装置。
- 請求項1乃至請求項6のいずれか一項において、前記貫通孔は有機絶縁膜より熱伝導率の大きい材料によって満たされていることを特徴とする照明装置。
- 請求項1乃至請求項8のいずれか一項において、前記内部金属層と前記発光素子の一方の電極とは貫通孔を介して電気的に接続されており、前記基板の前記発光素子が形成される面は平坦であることを特徴とする照明装置。
- 請求項1乃至請求項8のいずれか一項において、前記内部金属層と前記発光素子の一方の電極とは貫通孔を介して電気的に接続されており、前記発光素子の一方の電極は前記基板の表面に対して平行且つ平坦であることを特徴とする照明装置。
- 請求項9又は請求項10において、前記平坦な面は機械的研磨により形成されることを特徴とする照明装置。
- 請求項1乃至請求項11のいずれか一項において、前記裏面金属層の表面には凹凸が形成されていることを特徴とする照明装置。
- 請求項1乃至請求項12のいずれか一項において、前記裏面金属層により外部接続端子が形成されることを特徴とする照明装置。
- 請求項4乃至請求項13のいずれか一項において、前記裏面金属層は前記分離エリアにより接続する発光素子ごとに複数の島状に分離されており、前記複数の島状に分離された裏面金属層の面積は、場所ごとに異なることを特徴とする照明装置。
- 請求項1乃至請求項14のいずれか一項において、前記裏面金属層の一部にヒートシンクが設けられていることを特徴とする照明装置。
- 請求項15において、前記ヒートシンクは、導電体を介して前記裏面金属層に熱的に結合していることを特徴とする照明装置。
- 請求項15において、前記ヒートシンクは電気絶縁性の熱伝導体を介して前記裏面金属層に熱的に結合していることを特徴とする照明装置。
- 請求項14ないし請求項17のいずれか一項において、前記島状に分離された裏面金属層が密に集まっている部分に絶縁性の熱伝導体を介して、ヒートシンクが設けられていることを特徴とする照明装置。
- 請求項15乃至請求項18のいずれか一項において、前記基板を積層膜から垂直な方向から見た際、前記ヒートシンクと重なり、且つ前記絶縁性の熱伝導体が設けられていない部分に集積回路が設けられている照明装置。
- 請求項1乃至請求項19のいずれか一項において、前記裏面金属層を覆って絶縁膜が形成されていることを特徴とする照明装置。
- 請求項1乃至請求項20のいずれか一項において、少なくとも前記内部金属層又は前記裏面金属層の一部が発光素子に電流を流すための経路の一部となっている照明装置。
- 請求項1乃至請求項21のいずれか一項において、
前記基板はプリント配線板であることを特徴とする照明装置。
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