JP2012154920A - トモグラフィ装置及び電磁波パルス出射装置 - Google Patents

トモグラフィ装置及び電磁波パルス出射装置 Download PDF

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Publication number
JP2012154920A
JP2012154920A JP2011287918A JP2011287918A JP2012154920A JP 2012154920 A JP2012154920 A JP 2012154920A JP 2011287918 A JP2011287918 A JP 2011287918A JP 2011287918 A JP2011287918 A JP 2011287918A JP 2012154920 A JP2012154920 A JP 2012154920A
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Prior art keywords
electromagnetic wave
wave pulse
region
pulse
tomography apparatus
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JP2011287918A
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Japanese (ja)
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JP2012154920A5 (enExample
Inventor
Kosuke Kajiki
康介 加治木
Toshihiko Onouchi
敏彦 尾内
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Canon Inc
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Canon Inc
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Priority to JP2011287918A priority Critical patent/JP2012154920A/ja
Publication of JP2012154920A publication Critical patent/JP2012154920A/ja
Publication of JP2012154920A5 publication Critical patent/JP2012154920A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/178—Methods for obtaining spatial resolution of the property being measured
    • G01N2021/1782—In-depth resolution
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/178—Methods for obtaining spatial resolution of the property being measured
    • G01N2021/1785—Three dimensional
    • G01N2021/1787—Tomographic, i.e. computerised reconstruction from projective measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N2021/558—Measuring reflectivity and transmission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S1/00—Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range
    • H01S1/02—Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range solid

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2011287918A 2011-01-08 2011-12-28 トモグラフィ装置及び電磁波パルス出射装置 Pending JP2012154920A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011287918A JP2012154920A (ja) 2011-01-08 2011-12-28 トモグラフィ装置及び電磁波パルス出射装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011002584 2011-01-08
JP2011002584 2011-01-08
JP2011287918A JP2012154920A (ja) 2011-01-08 2011-12-28 トモグラフィ装置及び電磁波パルス出射装置

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JP2012154920A true JP2012154920A (ja) 2012-08-16
JP2012154920A5 JP2012154920A5 (enExample) 2015-02-12

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JP2011287918A Pending JP2012154920A (ja) 2011-01-08 2011-12-28 トモグラフィ装置及び電磁波パルス出射装置

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US (1) US9035258B2 (enExample)
JP (1) JP2012154920A (enExample)
WO (1) WO2012093615A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017173533A1 (en) * 2016-04-04 2017-10-12 Tetechs Inc. Methods and systems for thickness measurement of multi-layer structures
US11060859B2 (en) 2016-04-04 2021-07-13 Tetechs Inc. Methods and systems for thickness measurement of multi-layer structures
CN106936054B (zh) * 2017-05-12 2019-06-14 南开大学 一种基于亚波长波导的窄带太赫兹波产生及检测的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0333717A (ja) * 1989-06-29 1991-02-14 Fujitsu Ltd 光パルス発生器
JP2002098634A (ja) * 2000-03-27 2002-04-05 Tochigi Nikon Corp 半導体の電気特性評価装置および電気特性評価方法
JP2003272892A (ja) * 2002-03-15 2003-09-26 Kawasaki Heavy Ind Ltd Ｘ線発生方法およびｘ線発生装置
JP2006516722A (ja) * 2003-01-10 2006-07-06 テラビュー リミテッド イメージング方法及びその関連装置
JP2008145506A (ja) * 2006-12-06 2008-06-26 Institute Of National Colleges Of Technology Japan 圧電素子による光学素子とその作成方法
JP2012014155A (ja) * 2010-06-03 2012-01-19 Canon Inc テラヘルツ波発生素子、テラヘルツ波検出素子、及びテラヘルツ時間領域分光装置

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US4256962A (en) * 1977-12-19 1981-03-17 Jersey Nuclear-Avco Isotopes, Inc. Laser pulse superimposing
EP1405450A2 (en) * 2001-07-12 2004-04-07 Textron Systems Corporation Optical pulse train generator
US6795199B2 (en) * 2001-07-18 2004-09-21 Avraham Suhami Method and apparatus for dispersion compensated reflected time-of-flight tomography
WO2005088783A1 (en) * 2002-01-28 2005-09-22 Board Of Trustees Operating Michigan State University Laser system using ultra-short laser pulses
JP4154388B2 (ja) 2004-12-27 2008-09-24 キヤノン株式会社 被対象物を透過した電磁波の状態を検出するための検出装置
JP5006642B2 (ja) 2006-05-31 2012-08-22 キヤノン株式会社 テラヘルツ波発振器
JP4963640B2 (ja) 2006-10-10 2012-06-27 キヤノン株式会社 物体情報取得装置及び方法
JP5035618B2 (ja) 2006-12-05 2012-09-26 独立行政法人理化学研究所 電磁波を用いた検出方法、及び検出装置
JP5037929B2 (ja) 2006-12-18 2012-10-03 キヤノン株式会社 テラヘルツ波を用いた対象物の情報取得装置及び方法
JP5127360B2 (ja) 2007-08-20 2013-01-23 キヤノン株式会社 発振素子、及び検査装置
CN102027386B (zh) * 2008-01-09 2016-05-25 海浪科技有限公司 利用双频弹性脉冲复合体的非线性弹性成像
JP4834718B2 (ja) * 2008-01-29 2011-12-14 キヤノン株式会社 パルスレーザ装置、テラヘルツ発生装置、テラヘルツ計測装置及びテラヘルツトモグラフィー装置
US20090281736A1 (en) * 2008-05-12 2009-11-12 Hyeung-Yun Kim Method and apparatus for concurrent positive and negative actuation in structural health monitoring systems

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0333717A (ja) * 1989-06-29 1991-02-14 Fujitsu Ltd 光パルス発生器
JP2002098634A (ja) * 2000-03-27 2002-04-05 Tochigi Nikon Corp 半導体の電気特性評価装置および電気特性評価方法
JP2003272892A (ja) * 2002-03-15 2003-09-26 Kawasaki Heavy Ind Ltd Ｘ線発生方法およびｘ線発生装置
JP2006516722A (ja) * 2003-01-10 2006-07-06 テラビュー リミテッド イメージング方法及びその関連装置
JP2008145506A (ja) * 2006-12-06 2008-06-26 Institute Of National Colleges Of Technology Japan 圧電素子による光学素子とその作成方法
JP2012014155A (ja) * 2010-06-03 2012-01-19 Canon Inc テラヘルツ波発生素子、テラヘルツ波検出素子、及びテラヘルツ時間領域分光装置

Non-Patent Citations (1)

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Title
JPN6015042768; Ｚ．Ｌｉ，　ｅｔ　ａｌ: 'Ｕｌｔｒａｆａｓｔ　ｏｐｔｉｃａｌ　ｄｉｆｆｅｒｅｎｔｉａｔｏｒｓ　ｂａｓｅｄ　ｏｎ　ａｓｙｍｍｅｔｒｉｃ　Ｍａｃｈ-Ｚｅｈｎｄｅｒ　ｉｎｔｅｒｆｅｒｏｍｅｔｅｒ' Ｐｒｏｃｅｅｄｉｎｇｓ　Ｓｙｍｐｏｓｉｕｍ　ＩＥＥＥ／ＬＥＯＳ　Ｂｅｎｅｌｕｘ　Ｃｈａｐｔｅｒ，　２００６，　Ｅｉｎｄｈｏｖｅｎ , 200601, ｐａｇｅｓ　１７３-１７６ *

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US20140264038A1 (en) 2014-09-18

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