JP2012148395A - Polishing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce damage to a laminated rubber and enable a mounting structure of a laminated rubber member for an enlarged polishing device, in a support mechanism of a polishing member configured of the laminated rubber member.SOLUTION: The polishing device is configured to support a polishing member so as to rock relative to a machining surface of a member to be machined, and to move the polishing member relatively in a direction horizontal to the machining surface of the member to be machined to polish the machining surface of the member to be machined, in a state where the polishing member is pressed to the member to be machined. The polishing device includes: a rotation transmitting member for transmitting rotating torque from a rotation drive source to the polishing member; and a rotation transmitting mechanism having a laminated rubber member interposed between a first mounting member formed in the rotation transmitting member and a second mounting member formed in the polishing member to apply pressure, for transmitting rotating torque of the rotation transmitting member and deforming in response to the rocking motion of the polishing member.

Description

  The present invention relates to a polishing apparatus.

  A conventional polishing apparatus described in Patent Document 1 is shown in FIGS. As shown in FIG. 11, the polishing apparatus 130 includes a polishing member support mechanism (hereinafter referred to as an RCC mechanism (remote center compliance mechanism)) 134 and a rotational torque transmission means (rotation transmission mechanism) 136.

  The RCC mechanism 134 has four laminated rubber members 137. The lower end portion of the laminated rubber member 137 is fixed to the circumferential surface of the truncated cone 138 with an interval of 90 °, and the truncated cone 138 is formed on the surface of the polishing plate (polishing member) 140.

  As shown in FIG. 12, the laminated rubber members 137, 137,... Are arranged facing upward at a fixed inclination angle, and their upper ends are attached to a support plate 143 (rotation transmission member). Accordingly, the polishing plate 140 is coupled to the support plate 143 via the laminated rubber members 137, 137. In this case, the extended lines of the four laminated rubber members 137 intersect at a virtual center D point on the central axis of the polishing plate 140, and the virtual center D point is located slightly below the polishing surface of the polishing plate 140. .

  Although not shown, the laminated rubber member 137 is formed by embedding a plurality of metal plates in rubber formed in a columnar shape with a slight interval in the axial direction of the laminated rubber member 137. Also, as shown in FIG. 12, attachment portions 137C and 137D are formed at both ends of the laminated rubber member 137 formed in a columnar shape, and the attachment portions 137C and 137D are fixed to the support plate 143 and the polishing plate 140, respectively. Has been.

  The amount of deformation of the laminated rubber member 137 is very small with respect to the vertical load, and when the pressing force P shown in FIG. 12 acts on the support plate 143, the pressing force P is polished through the four laminated rubber members 137. Is transmitted to the plate 140. The laminated rubber member 137 has a large deformation amount with respect to a horizontal load, and when the friction reaction force F1 is generated on the polishing plate 140, the polishing plate 140 is released upward to prevent sticking of the polishing plate 140. Accordingly, the occurrence of uneven polishing on the glass plate 142 is prevented, and the glass plate 142 is uniformly polished.

  As shown in FIG. 11, the rotational torque transmission means 136 has a rectangular frame 146, and attachment portions 146 </ b> A and 146 </ b> A are formed in the center on the left and right sides forming the frame 146. Further, attachment portions 146B and 146B are formed in the center on the upper and lower sides forming the frame body 146. One end of the laminated rubber members 148 and 148 is fixed to the attachment portion 146A, and the other end of the laminated rubber members 148 and 148 is fixed to the end portion of the U-shaped block 150. In this case, the laminated rubber members 148 and 148 are disposed coaxially. Further, the U-shaped blocks 150 and 150 are fixed to the polishing plate 140.

  One end of the laminated rubber members 149 and 149 is fixed to the attachment portion 146B, and the other end of the laminated rubber members 149 and 149 is fixed to the end portion of the U-shaped block 152. In this case, the laminated rubber members 149 and 149 are coaxially arranged, and the upper surface 152A of the U-shaped block 152 is fixed to the support plate 143. Therefore, for example, when the support plate 143 revolves, the rotational force of the support plate 143 is transmitted to the laminated rubber members 149 and 149 via the U-shaped blocks 152 and 152.

  In this case, since the rotational force acts in the axial direction of the laminated rubber members 149 and 149, the rotational force transmitted to the laminated rubber members 149 and 149 is attached to the attaching portions 146A and 146A via the attaching portions 146B and 146B and the frame 146. Is transmitted to. The rotational force transmitted to the mounting portions 146A and 146A acts in the axial direction of the laminated rubber members 148 and 148 and is transmitted to the polishing plate 140 via the laminated rubber members 148 and 148 and the U-shaped blocks 150 and 150. . Thus, even when a rotational force is applied to the support plate 143, the polishing plate 140 moves following the support plate 143, and the torsional motion of the polishing plate 140 is prevented.

JP 9-57615 A

  In the configuration using the unit having two pairs of laminated rubber members 148, 148 and 149, 149 in the rotation transmission mechanism of the polishing member as in the conventional case, when the polishing object (member to be processed) is enlarged, Depending on the size of the object to be polished, the above unit itself has only to be enlarged.

  However, when increasing the size of the unit as it is, it is difficult to assemble and prepare the cylindrical laminated rubber member so that the end face of the cylindrical laminated rubber member does not wear or rotate around its central axis. There was a problem in the durability of the rotation transmission mechanism, and there was a problem that it was difficult to increase the size.

  The present invention has been made in view of such circumstances, and in the rotation transmission mechanism of the polishing member configured to transmit the rotational torque composed of the laminated rubber member, it is possible to reduce troubles of the laminated rubber and increase the size of the apparatus. It is an object of the present invention to provide a polishing apparatus that enables a corresponding laminated rubber member mounting structure.

  In order to achieve the object, the present invention supports a polishing member so as to be able to swing relative to a processing surface of a workpiece, and presses the polishing member in a state where the polishing member is pressed against the workpiece. In a polishing apparatus that polishes the processed surface of the workpiece by moving relative to the processing surface of the workpiece, the rotation transmitting member that transmits a rotational torque from a rotation drive source to the polishing member, and the rotation Transmitting the rotational torque of the rotation transmitting member interposed between the first mounting member provided on the transmission member and the second mounting member provided on the polishing member so as to apply pressure. And a rotation transmission mechanism having a laminated rubber member that deforms following the swinging motion of the polishing member.

  By applying pressure when the laminated rubber is assembled in this way, no tensile force is generated in the laminated rubber assembled to the rotation transmission mechanism, and the laminated rubber is prevented from being broken. It is possible to improve the durability of the rotation transmission mechanism.

  Further, in the polishing apparatus of the present invention, the natural length of the laminated rubber member of the rotation transmission mechanism before being attached between the first attachment member and the second attachment member is the first attachment member and It is preferable that it is longer than the length between the second mounting member.

  Thereby, it is possible to easily apply a pressure to the laminated rubber after the assembly, and it is possible to improve the durability of the rotation transmission mechanism.

  In the polishing apparatus of the present invention, at least one of the rotation rubber transmission mechanism between the laminated rubber member and the first attachment member and between the lamination rubber member and the second attachment member. It is preferable that a rotation preventing means for preventing the laminated rubber member from rotating about its central axis is provided between the two.

  Thereby, it can prevent that the end surface of laminated rubber wears by friction, and can improve the endurance of a rotation transmission mechanism.

  Further, in the polishing apparatus of the present invention, the rotation preventing means of the rotation transmission mechanism includes an end surface of the laminated rubber member and the first attachment member, and the laminated rubber member and the second attachment member. It is preferable that the two pins are engaged between at least one of the two.

  Thereby, the rotation of the laminated rubber can be easily prevented, and the occurrence of trouble due to wear can be reduced.

  Similarly, in order to achieve the object, the present invention provides the rotation transmission mechanism between the polishing member corresponding to an arbitrary size of the workpiece and the rotation transmission member, and the polishing member. A polishing apparatus in which a predetermined number of polishing apparatuses are arranged in accordance with the size of the apparatus.

  As a result, in response to the increase in the size of the polishing member accompanying the increase in the size of the workpiece, a plurality of rotation transmission mechanisms using small laminated rubber members can be arranged to freely design a polishing device of any size. This makes it easy to increase the size of the polishing apparatus.

  In the polishing apparatus of the present invention, the laminated rubber member that transmits the rotational torque of the rotation transmission member to the polishing member and the pressing force that presses the workpiece during polishing from the rotation transmission member to the polishing member. A plurality of fluid springs, and the plurality of fluid springs are arranged between the rotation transmission member and the polishing member so that the pressing force against the workpiece is equalized. preferable.

  Thus, it is possible to perform polishing with an appropriate pressing force without causing the polishing member to lift or vibrate.

  As described above, according to the present invention, when the laminated rubber is assembled, a pressure is applied, so that no tensile force is generated in the laminated rubber assembled to the rotation transmission mechanism, and the laminated rubber is broken. It is possible to improve the durability of the rotation transmission mechanism using laminated rubber. In addition, when the anti-rotation means for preventing the laminated rubber member from rotating about its central axis is provided, the end face of the laminated rubber is prevented from being worn by friction, and troubles of damage to the laminated rubber are prevented. Can be reduced. Furthermore, if a plurality of rotation transmission mechanisms using small laminated rubber members are arranged, it becomes possible to easily increase the size of the polishing apparatus corresponding to the increase in the size of the workpiece.

FIG. 1 is a perspective view schematically showing a polishing line of a polishing apparatus according to the present invention. FIG. 2 is a plan view of the polishing unit. FIG. 3 is a cross-sectional view of the polishing unit along line 3A-3A in FIG. 4 (A) and 4 (B) are enlarged plan views of the laminated rubber unit. FIG. 5 is a perspective view showing a laminated rubber member. 6A to 6C are plan views showing an example in which an air spring and a laminated rubber unit are arranged on a rectangular polishing plate. FIG. 7 is a schematic perspective view showing another example of the polishing line of the polishing apparatus according to the present invention. FIG. 8 is a plan view showing an example of an arrangement of air springs and laminated rubber units installed between a support plate and a polishing plate of the polishing unit. FIG. 9 is a plan view showing an example in which an air spring and a laminated rubber unit are arranged on a larger polishing plate. FIG. 10 is a plan view showing an example of a laminated rubber unit installed on an enlarged polishing plate. FIG. 11 is a perspective view schematically showing a conventional polishing apparatus. FIG. 12 is a cross-sectional view showing a polishing pressure applying means using laminated rubber in a conventional polishing apparatus.

  Hereinafter, a polishing apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 is a perspective view schematically showing a polishing line of a polishing apparatus according to the present invention. This polishing line forms a continuous polishing apparatus in which a plurality of polishing units each having a rectangular polishing plate are arranged.

  As shown in FIG. 1, a polishing line 1 of this continuous polishing apparatus is mounted on a polishing table 2 mounted with a glass plate 3 as a workpiece and transferred in a transfer direction indicated by an arrow A, and transferred on the polishing table 2. A plurality of polishing units 4, 4,... Arranged on the glass plate 3 along the transfer direction A.

  As will be described in detail later, each polishing unit 4 has a support plate (rotation transmission member) and a polishing plate (polishing member) which are upper and lower surface plates, and the polishing member is processed between the support plate and the polishing plate. A rotation transmission mechanism that supports the processing surface of the member so as to be relatively swingable and transmits rotational torque from the support plate to the polishing plate, and an air spring that applies polishing pressure to the polishing plate and controls the polishing pressure. Is arranged. Here, a laminated rubber member (laminated rubber unit) is used for the rotation transmission mechanism, and the abrasive member swings when the laminated rubber member is deformed. Further, the laminated rubber member is deformed following the swinging motion of the polishing member.

  In addition, a rotational drive shaft 5 is disposed above the polishing unit 4 in order to transmit a rotational driving force from a drive source (not shown) to the polishing unit 4. The rotary drive shaft 5 rotates the support plate eccentrically via an eccentric rotation mechanism provided in the polishing unit 4 (here, eccentric rotation is the center of mass of the support plate while maintaining a fixed posture). Rotating around a point deviated from (referred to as revolution).

  When the support plate rotates eccentrically, the polishing plate is also rotated eccentrically in the same manner as the support plate via the rotation transmission mechanism (laminated rubber unit) using the laminated rubber member. Thereby, the surface (processed surface) of the glass plate 3 is grind | polished by the polishing plate supported so that rocking | fluctuation with respect to the glass plate 3 and rotating eccentrically.

  FIG. 2 shows a plan view of the polishing unit 4. However, in FIG. 2, a support plate which is an upper surface plate is omitted, and a state in which a laminated rubber unit 12 constituting an air spring 10 and a rotation transmission mechanism is arranged on the polishing plate 7 is shown.

  As shown in FIG. 2, air springs 10 and laminated rubber units 12 are arranged in a row along a longitudinal direction on a rectangular polishing plate 7. In addition, the polishing plate 7 rotates (revolves) around a point other than the center of mass of the polishing plate 7 while maintaining its posture (in the drawing, it is arranged in a horizontally long direction). In order to transmit the rotational torque to the polishing plate 7, the laminated rubber unit 12 is arranged facing two directions, the vertical direction and the horizontal direction.

  FIG. 3 shows a cross-sectional view of the polishing unit 4 along line 3A-3A in FIG. However, FIG. 3 also shows the support plate 6 omitted in FIG.

  As shown in FIG. 3, in the polishing unit 4, an air spring 10 and a laminated rubber unit 12 are disposed between the support plate 6 and the polishing plate 7, and the pressing force (when the glass plate 3 is polished ( The polishing pressures P1 and P2 are applied to the polishing plate 7 by the air spring 10 and the rotational driving torque from the support plate 6 is transmitted to the polishing plate 7 by the laminated rubber unit 12. The air spring is a fluid spring using the elasticity of air and has a function of absorbing vibration. A fluid spring using a gas other than air may be used.

  A polishing pad 8 made of urethane foam, for example, is attached to the lower surface (glass plate 3 side) of the polishing plate 7, and the surface (processed surface) of the glass plate 3 (not shown here) by the polishing pad 8. Is polished.

  Each of the polishing units 4, 4... Configured as described above is eccentrically rotated (revolved), and the glass plate 3 is transferred to the polishing table 2 below the polishing unit 4. Polished continuously.

  The laminated rubber unit 12 includes a U-shaped block 13 (second mounting member) fixed to the polishing plate 7 and a mounting portion 14 (fixed to the support plate 6 at the center of the opening of the U-shaped block 13. The laminated rubber members 15 and 15 are arranged between the U-shaped blocks 13 on both sides of the attachment portion 14.

  FIG. 4 shows the laminated rubber unit 12 in an enlarged manner.

  As shown in FIG. 4, the laminated rubber unit 12 includes a U-shaped block 13, and a projecting mounting portion 14 disposed substantially at the center of the opening of the U-shaped block 13. The laminated rubber members 15 and 15 are respectively arranged in two gaps between the two.

  Conversely, when the laminated rubber members 15 and 15 are attached, a pressure is applied to the laminated rubber members 15 and 15 so as not to generate a tensile force. For this purpose, for example, the laminated rubber members 15, 15 having a natural length in the axial direction larger than each gap may be compressed and contracted and fitted into the gap.

  For example, as shown in FIG. 4A, the width of the opening of the U-shaped block 13 is L1, the width of the protrusion of the mounting portion 14 is L2, and the gap between the mounting portion 14 and the U-shaped block 13 is set. Are L3 and L4, respectively. At this time, the gaps L3 and L4 can be guided as L1−L2 = L3 + L4 from the width L1 of the opening of the U-shaped block 13 and the width L2 of the protrusion of the attachment portion 14. Next, a laminated rubber member 15 having a natural length that exceeds the width of L3 and L4 is prepared. As shown in FIG. 4B, the widths of L3 and L4 always change during polishing.

  Therefore, the preferable natural length (minimum shortened length) of the laminated rubber member 15 can be obtained as follows.

  For example, when FIG. 4B represents the case where the laminated rubber member 15 provided in L3 is most contracted (when it is the shortest length), the natural length L0 of the laminated rubber member 15 provided in L4 is greater than L4. That is, the selection is made so as to satisfy L4 <L0.

  By doing in this way, even if the attachment part 14 moves to right and left greatly at the time of grinding | polishing, the lamination | stacking rubber member 15 does not deform | transform into the length exceeding natural length, and can damage the lamination | stacking rubber member 15. .

  By satisfying such a condition, the laminated rubber members 15 and 15 are contracted and fitted into the gap between the opening of the U-shaped block 13 and the mounting portion 14, thereby giving the laminated rubber members 15 and 15. Pressure is applied. As a result, no tensile force is generated in the laminated rubber members 15 and 15, and the durability of the laminated rubber members 15 and 15 can be improved.

  FIG. 5 shows a perspective view of the laminated rubber member 15.

  The conventional laminated rubber member rotates around the central axis (is slightly displaced in the circumferential direction), so that the end face of the laminated rubber member may be worn out and deteriorated. Then, as shown in FIG. 5, in addition to the central shaft 16, another pin 17 (rotation preventing means) is provided. By engaging the pin 17 with at least one of the U-shaped block 13 or the attachment portion 14, it is possible to prevent the laminated rubber member 15 from turning around the central axis 16. That is, the laminated rubber member 15 is centered between at least one of the laminated rubber member 15 and the mounting portion 14 of the laminated rubber unit 12 and between the laminated rubber member 15 and the U-shaped block 13. It is preferable to provide a pin 17 that prevents rotation about the axis.

  In addition to the configuration in which the central shaft 16 and another pin 17 are installed in this way, two pins may be provided in addition to the central shaft 16. Even in this case, the laminated rubber member does not rotate and wear of the end face can be prevented.

  The example of the polishing unit 4 shown in FIG. 2 described above has two air springs 10 and three laminated rubber units 12, but an example of a larger polishing unit 4 is shown in FIG. 6.

  In each of the examples shown in FIG. 6, the air spring 10 and the laminated rubber unit 12 are arranged on the rectangular polishing plate 7 of the polishing unit 4. In both figures, the air spring 10 is shown in a round shape, and the laminated rubber unit 12 is shown in a rectangular shape.

  The example shown in FIG. 6 (A) has three air springs 10 and four laminated rubber units 12. In the example shown in FIG. 6B, the polishing plate 7 is larger and has seven air springs 10 and four laminated rubber units 12. In the example shown in FIG. 6C, the polishing plate 7 is further enlarged and has ten air springs 10 and eight laminated rubber units.

  Thus, in this embodiment, it is possible to cope with various sizes of polishing apparatuses (polishing units) by using a plurality of laminated rubber units. Further, in each laminated rubber unit 12, pressure is applied to the small laminated rubber and rotation around the central axis is prevented, so that the durability of the polishing unit can be improved.

  The example of the polishing apparatus described above uses a rectangular polishing plate. Next, an example using a circular polishing plate will be described.

  FIG. 7 shows a schematic configuration of a polishing line provided with a polishing unit having a circular polishing plate.

  As shown in FIG. 7, the polishing line 100 is similar to the polishing line 1 shown in FIG. 1. The polishing table 2 is mounted with a glass plate 3 and transferred in the transfer direction indicated by the arrow A, and on the polishing table 2. A plurality of polishing units 104 (only one is shown in FIG. 7) arranged along the transfer direction A on the glass plate 3 to be transferred.

  Here, the polishing unit 104 includes a support plate and a polishing plate (not shown) therein, and an eccentric rotation mechanism 106 is disposed on the upper portion thereof. The eccentric rotation mechanism 106 rotates (spins) the polishing plate around its central axis as indicated by an arrow B via a support plate in the polishing unit 104, and rotates the polishing plate while rotating the polishing plate. Rotation (eccentric rotation, so-called revolution) as shown by a broken line and an arrow C around a point deviated from. Although not shown, a polishing pad is provided on the lower surface of the polishing plate.

  Although not shown, an air spring for applying a polishing pressure from the support plate to the polishing plate is also provided between the support plate and the polishing plate in the polishing unit 104, as shown in FIG. A plurality of laminated rubber units are provided for transmitting rotational driving torque to the polishing plate. Further, the plurality of air springs are arranged at positions where the pressing force against the glass plate is equal between the support plate and the polishing plate.

  By arranging a plurality of polishing units 104 configured in this way along the polishing line 100, the polishing plates of each polishing unit 104 rotate and revolve, respectively, and the glass plate 3 is transferred onto the polishing table 2 underneath. The glass plate 3 is continuously polished.

  FIG. 8 shows an example of the arrangement of air springs and laminated rubber units installed between the support plate and the polishing plate of the polishing unit 104.

  As shown in FIG. 8, eight air springs 110 and four laminated rubber units 120 are arranged on the polishing plate 107 at positions that are uniform on the circular polishing plate 107.

  FIG. 9 shows an example in which the air spring 110 and the laminated rubber unit 120 are arranged on the polishing plate 107 when the polishing unit 104 is further enlarged.

  In the example shown in FIG. 9, 16 air springs 110 and four laminated rubber units 120 are arranged on the polishing plate 107 so as to be uniform.

  Further, when the polishing unit 104 is increased in size in this way, the laminated rubber unit 120 that transmits the rotational driving torque from the support plate to the polishing plate must also transmit a large torque, so the number of laminated rubbers can be increased. Correspond.

  FIG. 10 shows an example of the laminated rubber unit 120 in such a case.

  The laminated rubber unit 120 includes a quadrangular frame body 122 coupled to the polishing plate 107, an attachment portion 124 coupled to a support plate (not shown), and a laminated rubber member 126.

  The attachment portion 124 is disposed in the central opening of the quadrangular frame body 122, and two laminated rubber members 126 are disposed between the attachment portion 124 and the frame body 122 on each of the left and right sides.

  As a result, the rotational torque from the support plate driven by the eccentric rotation mechanism 106 is transmitted from the attachment portion 124 to the polishing plate 107 (not shown here) via the laminated rubber member 126 and the frame body 122, and the polishing plate 107. Rotates and rotates eccentrically (revolves).

  Also, in this laminated rubber unit 120, similarly to the above-described example, when the laminated rubber member 126 is assembled to the laminated rubber unit 120, the laminated rubber unit 126 is attached so as to be pressurized so that no tensile force is generated in the laminated rubber member 126. . This is because, for example, a laminated rubber having a natural length longer in the axial direction than the gap between the attachment portion 124 and the frame body 122 is prepared, and the gap between the attachment portion 124 and the frame body 122 is contracted. It should just fit in.

  Further, for example, a detent member is provided between the end surface of the laminated rubber member 126 and the frame body 122 so that the laminated rubber member 126 does not rotate around the central axis. As the anti-rotation member, for example, two pins may be driven between the end face of the laminated rubber member 126 and the frame body 122. Specifically, another pin may be installed in addition to the central axis.

  As described above, even when the workpiece (polishing object) becomes large and the polishing plate is enlarged so as to correspond to this, the laminated rubber unit itself is enlarged in accordance with the enlarged polishing plate. Instead, it is easy to increase the size of the polishing unit by preparing a plurality of small laminated rubber units and air springs and arranging them between the support plate and the polishing plate. Thus, when the polishing unit is enlarged in order to polish a large glass plate, it is preferable to use a plurality of units using small laminated rubber.

  Here, when a large laminated rubber unit corresponding to the rotational torque generated with the increase in the size of the polishing apparatus is used as in the prior art, the polishing apparatus itself becomes large and the structure becomes complicated, making it difficult to design the equipment.

  However, in this embodiment, since the laminated rubber unit itself is not enlarged, a plurality of units using small laminated rubber are used, so the area of the polishing unit can be changed without changing the size of the polishing unit in the height direction. Can be increased. Therefore, since the virtual center of the polishing unit can be increased in size without being far away from the material to be polished, variations in the polishing pressure with respect to the workpiece can be reduced, and uniform polishing can be achieved.

  In addition, in the conventional laminated rubber assembly structure, if there is a gap that causes friction or wear at the assembly part, if it is used, there is a possibility that the laminated rubber will be pulled and broken. It was. However, in the present embodiment, when the laminated rubber is attached to the laminated rubber unit, a pressure is applied to the laminated rubber and a member for preventing rotation around the central axis of the laminated rubber is provided. The wear of the sliding surface of the rubber mounting portion can be prevented, and the durability of the polishing unit can be improved.

  As a member for preventing rotation around the central axis of the laminated rubber, as described above, two pins may be inserted between the end face of the laminated rubber and a fixing member such as a frame to prevent rotation. Without being limited to this, for example, it may be fixed with an adhesive to prevent rotation.

  In the example described above, an air spring is used as a means for applying a polishing pressure to the polishing plate and controlling the polishing pressure. However, the means for applying and controlling the polishing pressure is not limited to the air spring. . For example, as described with reference to FIGS. 11 and 12, a plurality of laminated rubber members 137 may be disposed obliquely, or a fluid cylinder or other means may be used.

  In addition, in the conventional polishing apparatus described in FIG. 11, it is possible to apply a pressure to the laminated rubber described in the present embodiment or attach a member that prevents rotation around the central axis of the laminated rubber. The present invention may be applied to the laminated rubber members 148 and 149. Thereby, durability of the laminated rubber member of the conventional polishing apparatus can be improved.

  Although the polishing apparatus according to the present invention has been described in detail above, the present invention is not limited to the above examples, and various improvements and modifications may be made without departing from the scope of the present invention. Of course.

  Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various modifications and variations can be made without departing from the scope and spirit of the invention.

  DESCRIPTION OF SYMBOLS 1 ... Polishing line (with a rectangular polishing board), 2 ... Polishing table, 3 ... Glass plate, 4 ... Polishing unit, 5 ... Rotation drive shaft, 6 ... Supporting plate, 7 ... Polishing plate, 8 ... Polishing pad, DESCRIPTION OF SYMBOLS 10 ... Air spring, 12 ... Laminated rubber unit (rotation transmission mechanism), 13 ... U-shaped block, 14 ... Mounting part, 15 ... Laminated rubber member, 16 ... Center axis, 17 ... Pin, 100 ... (Circular polishing plate) ) Polishing line, 104 ... polishing unit, 106 ... eccentric rotation mechanism, 107 ... polishing plate, 110 ... air spring, 120 ... laminated rubber unit (rotation transmission mechanism), 122 ... frame body, 124 ... attachment portion, 126 ... lamination Rubber member

Claims (6)

A polishing member is supported so as to be able to swing relative to the processing surface of the workpiece, and the polishing member is relatively moved in a horizontal direction with respect to the processing surface of the workpiece while the polishing member is pressed against the processing member. In a polishing apparatus that moves and polishes the processing surface of the workpiece,
A rotation transmitting member that transmits a rotational torque from a rotational drive source to the polishing member;
The rotational torque of the rotation transmission member interposed between the first attachment member provided on the rotation transmission member and the second attachment member provided on the polishing member so as to apply a pressure. A rotation transmission mechanism having a laminated rubber member that transmits and deforms following the swinging motion of the polishing member;
A polishing apparatus comprising:   The natural length of the laminated rubber member of the rotation transmission mechanism before being attached between the first attachment member and the second attachment member is between the first attachment member and the second attachment member. The polishing apparatus according to claim 1, wherein the polishing apparatus is longer than the length.   The laminated rubber member between at least one of the laminated rubber member and the first attachment member of the rotation transmission mechanism and between the laminated rubber member and the second attachment member. The polishing apparatus according to claim 1, further comprising a rotation preventing means for preventing the rotation of the metal around the central axis.   The rotation preventing means of the rotation transmission mechanism is at least one of an end surface of the laminated rubber member and the first attachment member, and between the laminated rubber member and the second attachment member. The polishing apparatus according to claim 3, wherein the two pins are engaged with each other.   A predetermined plurality of rotation transmission mechanisms are arranged between the polishing member corresponding to an arbitrary size of the workpiece and the rotation transmission member according to the size of the polishing member. 5. The polishing apparatus according to any one of 4 above.   Along with the laminated rubber member that transmits the rotational torque of the rotation transmitting member to the polishing member, a plurality of fluid springs are provided to apply a pressing force that presses the workpiece during polishing from the rotation transmitting member to the polishing member. The plurality of fluid springs according to any one of claims 1 to 5, wherein the fluid springs are arranged at positions between the rotation transmission member and the polishing member such that the pressing force against the workpiece is equalized. The polishing apparatus as described.

Images