JP2012108168A5 - - Google Patents
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- Publication number
- JP2012108168A5 JP2012108168A5 JP2010254586A JP2010254586A JP2012108168A5 JP 2012108168 A5 JP2012108168 A5 JP 2012108168A5 JP 2010254586 A JP2010254586 A JP 2010254586A JP 2010254586 A JP2010254586 A JP 2010254586A JP 2012108168 A5 JP2012108168 A5 JP 2012108168A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- electro
- insulating
- optical device
- substrate body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 24
- 230000001681 protective effect Effects 0.000 claims description 23
- 239000011229 interlayer Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 6
- 229910052796 boron Inorganic materials 0.000 claims 6
- 229910052698 phosphorus Inorganic materials 0.000 claims 6
- 239000011574 phosphorus Substances 0.000 claims 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 239000010410 layer Substances 0.000 claims 3
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 150000003377 silicon compounds Chemical class 0.000 claims 2
- 239000002344 surface layer Substances 0.000 claims 2
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010254586A JP5621531B2 (ja) | 2010-11-15 | 2010-11-15 | 電気光学装置及び投射型表示装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010254586A JP5621531B2 (ja) | 2010-11-15 | 2010-11-15 | 電気光学装置及び投射型表示装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012108168A JP2012108168A (ja) | 2012-06-07 |
| JP2012108168A5 true JP2012108168A5 (enExample) | 2013-11-21 |
| JP5621531B2 JP5621531B2 (ja) | 2014-11-12 |
Family
ID=46493887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010254586A Active JP5621531B2 (ja) | 2010-11-15 | 2010-11-15 | 電気光学装置及び投射型表示装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5621531B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6171308B2 (ja) * | 2012-10-31 | 2017-08-02 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、及び電子機器 |
| CN103700674B (zh) * | 2013-12-27 | 2017-02-15 | 京东方科技集团股份有限公司 | 阵列基板及其制备方法、显示装置 |
| CN107340934B (zh) * | 2016-04-29 | 2020-10-20 | 瀚宇彩晶股份有限公司 | 电容式触控显示面板 |
| JP2019134009A (ja) * | 2018-01-30 | 2019-08-08 | シャープ株式会社 | アクティブマトリクス基板、及びそれを備えたｘ線撮像パネル |
| JP6703160B2 (ja) * | 2019-03-27 | 2020-06-03 | 日鉄ケミカル＆マテリアル株式会社 | フレキシブル電子デバイスの製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH112707A (ja) * | 1997-06-13 | 1999-01-06 | Sharp Corp | 銀の増反射膜及びそれを用いた反射型液晶表示装置 |
| JPH1164872A (ja) * | 1997-08-22 | 1999-03-05 | Sharp Corp | 反射型液晶表示素子及びその製造方法 |
| WO2000037248A1 (en) * | 1998-12-23 | 2000-06-29 | Aurora Systems, Inc. | Planar reflective light valve backplane and method for manufacturing the same |
| JP2007206212A (ja) * | 2006-01-31 | 2007-08-16 | Canon Inc | 反射型液晶表示装置及びその製造方法 |
| JP2010139920A (ja) * | 2008-12-15 | 2010-06-24 | Seiko Epson Corp | 電気的固体装置、電気光学装置、電気的固体装置の製造方法、および電子機器 |
-
2010
- 2010-11-15 JP JP2010254586A patent/JP5621531B2/ja active Active
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