JP2012054426A5 - - Google Patents

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Publication number
JP2012054426A5
JP2012054426A5 JP2010196093A JP2010196093A JP2012054426A5 JP 2012054426 A5 JP2012054426 A5 JP 2012054426A5 JP 2010196093 A JP2010196093 A JP 2010196093A JP 2010196093 A JP2010196093 A JP 2010196093A JP 2012054426 A5 JP2012054426 A5 JP 2012054426A5
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JP
Japan
Prior art keywords
image
mask
pattern
optical system
illumination optical
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JP2010196093A
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English (en)
Japanese (ja)
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JP5513325B2 (ja
JP2012054426A (ja
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Priority to JP2010196093A priority Critical patent/JP5513325B2/ja
Priority claimed from JP2010196093A external-priority patent/JP5513325B2/ja
Priority to KR1020110084767A priority patent/KR101351215B1/ko
Priority to US13/222,628 priority patent/US8450031B2/en
Priority to TW100131280A priority patent/TWI428711B/zh
Publication of JP2012054426A publication Critical patent/JP2012054426A/ja
Publication of JP2012054426A5 publication Critical patent/JP2012054426A5/ja
Application granted granted Critical
Publication of JP5513325B2 publication Critical patent/JP5513325B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010196093A 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム Expired - Fee Related JP5513325B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010196093A JP5513325B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム
KR1020110084767A KR101351215B1 (ko) 2010-09-01 2011-08-24 결정 방법, 노광 방법 및 기억 매체
US13/222,628 US8450031B2 (en) 2010-09-01 2011-08-31 Determination method, exposure method and storage medium
TW100131280A TWI428711B (zh) 2010-09-01 2011-08-31 決定方法、曝光方法、和儲存媒介

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010196093A JP5513325B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム

Publications (3)

Publication Number Publication Date
JP2012054426A JP2012054426A (ja) 2012-03-15
JP2012054426A5 true JP2012054426A5 (cg-RX-API-DMAC7.html) 2013-10-17
JP5513325B2 JP5513325B2 (ja) 2014-06-04

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JP2010196093A Expired - Fee Related JP5513325B2 (ja) 2010-09-01 2010-09-01 決定方法、露光方法及びプログラム

Country Status (4)

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US (1) US8450031B2 (cg-RX-API-DMAC7.html)
JP (1) JP5513325B2 (cg-RX-API-DMAC7.html)
KR (1) KR101351215B1 (cg-RX-API-DMAC7.html)
TW (1) TWI428711B (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5513324B2 (ja) * 2010-09-01 2014-06-04 キヤノン株式会社 決定方法、露光方法及びプログラム
JP5539140B2 (ja) * 2010-09-28 2014-07-02 キヤノン株式会社 決定方法、露光方法、プログラム及びコンピュータ
JP5627394B2 (ja) * 2010-10-29 2014-11-19 キヤノン株式会社 マスクのデータ及び露光条件を決定するためのプログラム、決定方法、マスク製造方法、露光方法及びデバイス製造方法
JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
WO2014042044A1 (ja) * 2012-09-11 2014-03-20 株式会社ニコン 瞳輝度分布の設定方法
US9870784B2 (en) 2013-09-06 2018-01-16 Nuance Communications, Inc. Method for voicemail quality detection
US9685173B2 (en) 2013-09-06 2017-06-20 Nuance Communications, Inc. Method for non-intrusive acoustic parameter estimation
JP5681309B2 (ja) * 2014-03-18 2015-03-04 キヤノン株式会社 決定方法、露光方法及びプログラム
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system
CN107438163B (zh) * 2017-07-31 2020-07-07 努比亚技术有限公司 一种拍照方法、终端及计算机可读存储介质
JP7390804B2 (ja) * 2019-05-17 2023-12-04 キヤノン株式会社 露光装置、露光方法、決定方法および物品製造方法
CN110426831B (zh) * 2019-06-17 2021-08-03 华南师范大学 一种聚焦照明系统及方法
CN119916654B (zh) * 2025-04-02 2025-08-01 全智芯(上海)技术有限公司 用于光源掩模优化的方法、设备、存储介质及程序产品

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5680588A (en) * 1995-06-06 1997-10-21 International Business Machines Corporation Method and system for optimizing illumination in an optical photolithography projection imaging system
US6563566B2 (en) 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
US7057709B2 (en) 2003-12-04 2006-06-06 International Business Machines Corporation Printing a mask with maximum possible process window through adjustment of the source distribution

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