JP2012046380A - Method for producing silicon carbide porous body - Google Patents
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 66
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000000843 powder Substances 0.000 claims abstract description 46
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 36
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 36
- 238000002156 mixing Methods 0.000 claims abstract description 30
- 239000007787 solid Substances 0.000 claims abstract description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000012299 nitrogen atmosphere Substances 0.000 claims abstract description 10
- 239000010703 silicon Substances 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 238000010304 firing Methods 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 6
- 239000011812 mixed powder Substances 0.000 claims description 3
- 239000003575 carbonaceous material Substances 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 239000002994 raw material Substances 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 239000012535 impurity Substances 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
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- 239000000463 material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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Abstract
Description
本発明は、導電特性を有する炭化けい素質多孔体の製造方法に関する。 The present invention relates to a method for producing a silicon carbide porous body having conductive properties.
従来より、電気炉などに用いられるセラミックス抵抗発熱体として、炭化けい素質焼結体が広く用いられている(例えば、特許文献1)。炭化けい素は半導体であり、温度上昇に伴って抵抗値が急激に低下するという温度依存性がある。抵抗値は、通電特性及び発熱量に関係するため、加熱制御において、抵抗値を所望の範囲内に収めることは重要な技術課題である。抵抗値の温度依存性が大きいと温度制御が困難となるため、抵抗値とその温度依存性の両方を制御できることが望まれる。 Conventionally, a silicon carbide sintered body has been widely used as a ceramic resistance heating element used in an electric furnace or the like (for example, Patent Document 1). Silicon carbide is a semiconductor and has a temperature dependency in which the resistance value rapidly decreases as the temperature rises. Since the resistance value is related to the energization characteristics and the heat generation amount, it is an important technical problem to keep the resistance value within a desired range in heating control. Since temperature control becomes difficult when the temperature dependence of the resistance value is large, it is desired that both the resistance value and the temperature dependence thereof can be controlled.
一般に、このような半導体特性を有する材料の抵抗値を制御するためは、不純物のドープが行われる。しかし、この方法では微量なドープ量のコントロールが難しく、原料の配合時に微量の不純物を添加し抵抗値を調整しようとする場合、秤量の微小な誤差、焼成中の揮発などにより、最終的に得られる焼結体の抵抗値が目標値から大きくずれるおそれがあるという問題があった。 In general, doping of impurities is performed in order to control the resistance value of a material having such semiconductor characteristics. However, with this method, it is difficult to control the amount of a small amount of doping, and when a resistance value is adjusted by adding a small amount of impurities when blending raw materials, it is finally obtained due to a minute error in weighing, volatilization during firing, etc. There is a problem that the resistance value of the sintered body to be obtained may be greatly deviated from the target value.
そこで、本発明は、所望の導電特性に制御することができる炭化けい素質多孔体の製造方法を実現することを目的とする。 Then, an object of this invention is to implement | achieve the manufacturing method of the silicon carbide porous body which can be controlled to a desired electroconductivity characteristic.
この発明は、上記目的を達成するため、請求項1に記載の発明では、骨材としての炭化けい素粉末50〜95重量%に、窒化けい素中のけい素成分とカーボンのモル比(Si/C)が0.5〜1.5である窒化けい素粉末及び炭素質固体粉末を50〜5重量%混合した混合粉末を成形し、得られた成形体を窒素雰囲気で焼成する炭化けい素質多孔体の製造方法であって、炭化けい素粉末に対する窒化けい素粉末及び炭素質固体粉末の混合比により、炭化けい素質多孔体の導電特性を制御する、という技術的手段を用いる。 In order to achieve the above object, according to the present invention, in the invention described in claim 1, the silicon carbide powder as an aggregate is 50 to 95% by weight, and the molar ratio of silicon component to carbon in silicon nitride (Si / C) Silicon carbide powder in which 50 to 5 wt% mixed powder of silicon nitride powder and carbonaceous solid powder with 0.5 to 1.5 is molded, and the resulting molded body is fired in a nitrogen atmosphere A method for producing a porous body, which uses a technical means for controlling the conductive characteristics of the silicon carbide porous body by the mixing ratio of the silicon nitride powder and the carbonaceous solid powder to the silicon carbide powder.
請求項1に記載する発明によれば、骨材としての炭化けい素粉末に、窒化けい素中のけい素成分とカーボンのモル比(Si/C)が0.5〜1.5である窒化けい素粉末及び炭素質固体粉末を所定量混合して成形し、得られた成形体を窒素雰囲気で焼成することにより、けい素源の窒化けい素と炭素源の炭素質固体とが反応して炭化けい素が生成して骨材をつなぐネックが形成された炭化けい素質多孔体を製造することができる。
ここで、窒素雰囲気で焼成することにより、窒化けい素の分解によって生成した窒素が、ネックの炭化けい素、骨材としての炭化けい素に不純物として含有される。これにより、炭化けい素中に含有量を容易に制御して不純物を導入することができ、炭化けい素質多孔体がn型半導体となるため、導電性が向上する。そして、炭化けい素粉末に対する窒化けい素粉末及び炭素質固体粉末の混合比により、窒素の含有量やネック形状、気孔率などの多孔体構造などを制御することができるので、導電特性を制御することができる。
According to the first aspect of the present invention, the silicon carbide powder as the aggregate is nitrided with a silicon component / carbon molar ratio (Si / C) in the silicon nitride of 0.5 to 1.5. A predetermined amount of silicon powder and carbonaceous solid powder are mixed and molded, and the resulting molded body is fired in a nitrogen atmosphere to react silicon source silicon nitride and carbon source carbonaceous solid. It is possible to produce a silicon carbide porous body in which a neck for generating aggregate and connecting aggregates is formed.
Here, by firing in a nitrogen atmosphere, nitrogen generated by decomposition of silicon nitride is contained as impurities in the silicon carbide neck and the silicon carbide as the aggregate. Thereby, impurities can be introduced by easily controlling the content in silicon carbide, and the silicon carbide porous body becomes an n-type semiconductor, so that the conductivity is improved. And, the mixing ratio of the silicon nitride powder and the carbonaceous solid powder to the silicon carbide powder can control the porous structure such as the nitrogen content, neck shape, porosity, etc., so that the conductive characteristics are controlled. be able to.
請求項2に記載の発明では、請求項1に記載の炭化けい素質多孔体の製造方法において、前記窒化けい素粉末及び炭素質固体粉末の混合比を増大させることにより比抵抗を低減させる、という技術的手段を用いる。 According to a second aspect of the invention, in the method for producing a silicon carbide porous body according to the first aspect, the specific resistance is reduced by increasing the mixing ratio of the silicon nitride powder and the carbonaceous solid powder. Use technical means.
請求項2に記載の発明のように、窒化けい素粉末及び炭素質固体粉末の混合比を増大させることにより比抵抗を低減させることができる。 As in the second aspect of the invention, the specific resistance can be reduced by increasing the mixing ratio of the silicon nitride powder and the carbonaceous solid powder.
請求項3に記載の発明では、請求項1または請求項2に記載の炭化けい素質多孔体の製造方法において、前記窒化けい素粉末及び炭素質固体粉末の混合比を増大させることにより比抵抗の温度依存性を小さくさせる、という技術的手段を用いる。 According to a third aspect of the present invention, in the method for producing a silicon carbide porous body according to the first or second aspect, the resistivity is increased by increasing the mixing ratio of the silicon nitride powder and the carbonaceous solid powder. Use technical means to reduce temperature dependence.
請求項3に記載の発明のように、窒化けい素粉末及び炭素質固体粉末の混合比を増大させることにより比抵抗の温度依存性を小さくさせることができる。 As in the third aspect of the invention, the temperature dependency of the specific resistance can be reduced by increasing the mixing ratio of the silicon nitride powder and the carbonaceous solid powder.
本発明に係る炭化けい素質多孔体の製造方法について説明する。 The method for producing a silicon carbide porous body according to the present invention will be described.
出発原料として、骨材としての炭化けい素粉末50〜95重量%に、窒化けい素中のけい素成分とカーボンのモル比(Si/C)が0.5〜1.5である窒化けい素粉末及び炭素質固体粉末の混合物(以下、ネック原料、という)を50〜5重量%を配合する。 Silicon nitride having 50 to 95% by weight of silicon carbide powder as aggregate as a starting material and a molar ratio (Si / C) of silicon component to carbon in silicon nitride of 0.5 to 1.5 A mixture of powder and carbonaceous solid powder (hereinafter referred to as neck material) is blended in an amount of 50 to 5% by weight.
炭化けい素粉末は、平均粒径が50μm以下が好ましく、粒度分布が異なる複数の粉末を混合することもできる。
窒化けい素粉末は、ネックを形成する炭素質固体粉末との反応を促進するために平均粒径が100μm以下が好ましい。
炭素質固体粉末として、カーボンブラック、アセチレンブラックなどを用いることができる。窒化けい素粉末との反応を促進させるために平均粒径が10μm以下であることが好ましい。炭素質固体粉末として、フェノール、フラン、ポリイミドなどの熱分解し炭素源となる有機系樹脂などを使用することもできる。
The silicon carbide powder preferably has an average particle size of 50 μm or less, and a plurality of powders having different particle size distributions can be mixed.
The silicon nitride powder preferably has an average particle size of 100 μm or less in order to promote the reaction with the carbonaceous solid powder forming the neck.
Carbon black, acetylene black, etc. can be used as the carbonaceous solid powder. In order to promote the reaction with the silicon nitride powder, the average particle size is preferably 10 μm or less. As the carbonaceous solid powder, an organic resin such as phenol, furan or polyimide which is thermally decomposed to become a carbon source can be used.
上述の原料粉末を所定の割合で配合し、メチルセルロース等の有機バインダーや水分等の添加剤を添加し、混合・混錬した混錬物を押出成形、鋳込成形、プレス成形、射出成形などにより所望の形状に成形する。 The above raw material powder is blended at a predetermined ratio, an organic binder such as methylcellulose and additives such as moisture are added, and the mixed and kneaded kneaded product is extruded, cast, press molded, injection molded, etc. Mold into a desired shape.
作製された成形体を窒素雰囲気において1600〜2300℃で焼成する。焼成工程では、窒化けい素と炭素質固体とが反応して炭化けい素が生成し、骨材としての炭化けい素をつなぐネックを形成して反応焼結するとともに、気孔が形成され、炭化けい素質多孔体が形成される。 The produced molded body is fired at 1600 to 2300 ° C. in a nitrogen atmosphere. In the firing process, silicon nitride reacts with carbonaceous solids to form silicon carbide, which forms a neck that connects the silicon carbide as an aggregate and reacts and sinters, and pores are formed and silicon carbide is formed. A porous material is formed.
ここで、窒素雰囲気で焼成することにより、窒化けい素の分解によって生成した窒素が、ネックの炭化けい素、骨材としての炭化けい素に不純物として含有される。これにより、炭化けい素中に含有量を容易に制御して不純物を導入することができ、炭化けい素質多孔体がn型半導体となるため、導電性が向上する。なお、窒素は、炭化けい素に固溶するのみならず、炭化けい素との反応によって化合物として存在することもある。 Here, by firing in a nitrogen atmosphere, nitrogen generated by decomposition of silicon nitride is contained as impurities in the silicon carbide neck and the silicon carbide as the aggregate. Thereby, impurities can be introduced by easily controlling the content in silicon carbide, and the silicon carbide porous body becomes an n-type semiconductor, so that the conductivity is improved. Nitrogen not only dissolves in silicon carbide, but also may exist as a compound by reaction with silicon carbide.
焼成温度が1600℃より低いと、窒化けい素の炭化反応が十分でなく、骨材の炭化けい素をつなぐネックに窒化けい素が残存するため比抵抗が高くなる。また、焼成温度が2300℃を越えると昇華が始まり、ネック部が細くなり、同様に比抵抗が高くなる。 When the firing temperature is lower than 1600 ° C., the carbonization reaction of silicon nitride is not sufficient, and the silicon nitride remains in the neck connecting the silicon carbide of the aggregate, so that the specific resistance increases. Further, when the firing temperature exceeds 2300 ° C., sublimation starts, the neck portion becomes thin, and the specific resistance similarly increases.
骨材としての炭化けい素粉末が50重量%より少ない場合は、炭化けい素質多孔体の機械的強度が低下する。95重量%より多い場合は、ネック原料が少ないためネックの量が不足して焼結が不充分となる。 When the silicon carbide powder as the aggregate is less than 50% by weight, the mechanical strength of the silicon carbide porous body is lowered. When the amount is more than 95% by weight, the neck raw material is small, so that the amount of neck is insufficient and sintering becomes insufficient.
ネック原料のSi/Cが0.5より小さい場合は、窒化けい素の炭化反応に寄与せずに残存する炭素分が多くなり、粗大気孔が生じる原因となるとともに、ネックとして生成した炭化けい素の粒成長が阻害される。Si/Cが1.5より大きい場合は、ネックの炭化けい素の生成量が少なくなるため、焼結が不充分となる。 When the neck raw material Si / C is smaller than 0.5, the carbon content remaining without contributing to the carbonization reaction of silicon nitride increases, which causes rough atmospheric pores and silicon carbide produced as a neck. Grain growth is inhibited. If Si / C is greater than 1.5, the amount of neck silicon carbide produced is reduced, resulting in insufficient sintering.
本製造方法によれば、ネック原料の混合比により、窒素の含有量や炭化けい素質多孔体のネック形状、気孔率などの多孔体構造などを制御することができる。
ネック原料の混合比が増大すると、炭化けい素に含有される窒素量は増大するため、比抵抗が低減すると考えられる。また、炭化けい素質多孔体の気孔率は高くなり、ネック形状は太くなる傾向が認められる。
以下の実施例にも示すように、ネック原料の混合比が増大するほど、比抵抗が低下するとともにその温度依存性が小さくなる。これにより、ネック原料の混合比により、所望の比抵抗及びその温度依存性に制御することができる。
According to this production method, the content of nitrogen, the neck shape of the silicon carbide porous body, the porous structure such as the porosity, and the like can be controlled by the mixing ratio of the neck raw material.
It is considered that when the mixing ratio of the neck raw material increases, the amount of nitrogen contained in silicon carbide increases, so that the specific resistance decreases. Moreover, the porosity of the silicon carbide porous body is increased, and the neck shape tends to be thickened.
As shown in the following examples, as the mixing ratio of the neck raw material increases, the specific resistance decreases and the temperature dependency thereof decreases. Thereby, it can control to a desired specific resistance and its temperature dependence by the mixing ratio of a neck raw material.
また、導電特性が異なる炭化けい素粉末を用いる、例えば、粒径、結晶相を適宜選択することにより、更にワイドレンジで比抵抗を制御することが可能である。 In addition, the specific resistance can be controlled in a wider range by using silicon carbide powders having different conductive characteristics, for example, by appropriately selecting the grain size and the crystal phase.
本製造方法により製造された炭化けい素質多孔体は、比抵抗及びその温度依存性を所望の特性に制御することができるので、加熱制御が容易となり、ディーゼルエンジンから排出される微粒子を捕集し燃焼焼却するヒーター性能を有する通電加熱型ディーゼルパティキュレートフィルタや加熱ガス分解用途(自動車用排ガス、VOC)として、好適に用いることができる。また、発熱面積が大きく熱効率を高められるので、ダクトヒーター、大型ドライヤーの熱源に使用される熱風発生機用ヒーターとして好適に用いることができる。更に、暖房機器、調理機器、乾燥機器、焼成炉等に使用されるヒーターとしても好適に用いることができる。 Since the silicon carbide porous body manufactured by this manufacturing method can control the specific resistance and its temperature dependence to desired characteristics, heating control is facilitated and particulates discharged from the diesel engine are collected. It can be suitably used as an electric heating type diesel particulate filter having a heater performance for combustion and incineration or a heated gas decomposition application (exhaust gas for automobile, VOC). Moreover, since the heat generation area is large and the thermal efficiency can be increased, it can be suitably used as a heater for hot air generators used as a heat source for duct heaters and large dryers. Furthermore, it can also be suitably used as a heater used in heating equipment, cooking equipment, drying equipment, firing furnaces, and the like.
骨材原料として平均粒径11μmの粗粒原料と平均粒径1μmの微粒原料とを65:35の割合で混合してなる炭化けい素粉末と、ネック原料としてカーボンに対する金属けい素のモル比を1.0:1.1に調整した窒化けい素粉末及びカーボンブラックの混合粉末を表1に示す割合で配合した原料100重量部に対して、有機バインダーを10重量部、水を20重量部添加し、混合・混練した後、押出成形により、外径6mm、内径4mmの円管状に成形し、窒素雰囲気中で2200℃、5時間焼成した。 A silicon carbide powder obtained by mixing a coarse raw material with an average particle diameter of 11 μm as an aggregate raw material and a fine raw material with an average particle diameter of 1 μm in a ratio of 65:35, and a molar ratio of metal silicon to carbon as a neck raw material. 10 parts by weight of organic binder and 20 parts by weight of water are added to 100 parts by weight of raw materials in which a mixed powder of silicon nitride powder and carbon black adjusted to 1.0: 1.1 is blended in the ratio shown in Table 1. Then, after mixing and kneading, it was formed into a circular tube having an outer diameter of 6 mm and an inner diameter of 4 mm by extrusion molding, and fired in a nitrogen atmosphere at 2200 ° C. for 5 hours.
得られた焼結体について、比抵抗及び気孔率を測定した。比抵抗は、測定温度50℃から350℃以下の範囲で、交流を用いて、4端子法により測定した。気孔率はアルキメデス法により測定した。 About the obtained sintered compact, the specific resistance and the porosity were measured. The specific resistance was measured by a four-terminal method using alternating current at a measurement temperature in the range of 50 ° C. to 350 ° C. or less. The porosity was measured by Archimedes method.
図1に、ネック原料の混合比毎に比抵抗及びその温度依存性を示す。図1に示すように、ネック原料の混合比が増大すると比抵抗が低下した。特に、低温側においてその傾向が顕著であり、例えば、50℃における比抵抗は、ネック原料の混合比5%での68Ω・cmに対し、混合比50%では28Ω・cmであり半分以下の値であった。
また、ネック原料の混合比が増大すると、温度上昇に伴う比抵抗の低下割合が小さくなり、温度依存性が小さくなった。
これにより、ネック原料の混合比により、炭化けい素質多孔体の比抵抗及びその温度依存性を制御できることが確認された。
FIG. 1 shows the specific resistance and its temperature dependence for each mixing ratio of the neck material. As shown in FIG. 1, the specific resistance decreased as the mixing ratio of the neck material increased. In particular, the tendency is remarkable on the low temperature side. For example, the specific resistance at 50 ° C. is 68 Ω · cm at a mixing ratio of 5% of the neck material, and is 28 Ω · cm at a mixing ratio of 50%, which is less than half. Met.
Further, when the mixing ratio of the neck raw material was increased, the decrease rate of the specific resistance accompanying the temperature rise was reduced, and the temperature dependency was reduced.
Thereby, it was confirmed that the specific resistance of the silicon carbide porous body and its temperature dependency can be controlled by the mixing ratio of the neck raw material.
また、炭化けい素質多孔体の気孔率は、ネック原料の混合比15%では47%、混合比50%では58%であり、ネック原料の混合比が高い方が気孔率は大きくなる傾向が認められた。 The porosity of the silicon carbide porous material is 47% when the mixing ratio of the neck raw material is 15% and 58% when the mixing ratio is 50%. The higher the mixing ratio of the neck raw material, the higher the porosity tends to be. It was.
[実施形態の効果]
本発明の炭化けい素質多孔体の製造方法によれば、骨材としての炭化けい素粉末に、窒化けい素中のけい素成分とカーボンのモル比(Si/C)が0.5〜1.5である窒化けい素粉末及び炭素質固体粉末を所定量混合して成形し、得られた成形体を窒素雰囲気で焼成することにより、けい素源の窒化けい素と炭素源の炭素質固体とが反応して炭化けい素が生成して骨材をつなぐネックが形成された炭化けい素質多孔体を製造することができる。
ここで、窒素雰囲気で焼成することにより、窒化けい素の分解によって生成した窒素が、ネックの炭化けい素、骨材としての炭化けい素に不純物として含有される。これにより、炭化けい素中に含有量を容易に制御して不純物を導入することができ、炭化けい素質多孔体がn型半導体となるため、導電性が向上する。そして、炭化けい素粉末に対する窒化けい素粉末及び炭素質固体粉末の混合比により、窒素の含有量やネック形状、気孔率などの多孔体構造などを制御することができるので、導電特性を制御することができる。
窒化けい素粉末及び炭素質固体粉末の混合比を増大させることにより比抵抗を低減させることができるとともに、温度依存性を小さくさせることができる。
[Effect of the embodiment]
According to the method for producing a silicon carbide porous body of the present invention, the silicon carbide powder as an aggregate has a silicon component to carbon molar ratio (Si / C) of 0.5 to 1. 5 by mixing a predetermined amount of silicon nitride powder and carbonaceous solid powder 5 and firing the resulting molded body in a nitrogen atmosphere, so that the silicon source silicon nitride and the carbon source carbonaceous solid Can produce a silicon carbide porous body in which a silicon carbide is formed by the reaction to form a neck for connecting the aggregates.
Here, by firing in a nitrogen atmosphere, nitrogen generated by decomposition of silicon nitride is contained as impurities in the silicon carbide neck and the silicon carbide as the aggregate. Thereby, impurities can be introduced by easily controlling the content in silicon carbide, and the silicon carbide porous body becomes an n-type semiconductor, so that the conductivity is improved. And, the mixing ratio of the silicon nitride powder and the carbonaceous solid powder to the silicon carbide powder can control the porous structure such as the nitrogen content, neck shape, porosity, etc., so that the conductive characteristics are controlled. be able to.
By increasing the mixing ratio of the silicon nitride powder and the carbonaceous solid powder, the specific resistance can be reduced and the temperature dependence can be reduced.
Claims (3)
炭化けい素粉末に対する窒化けい素粉末及び炭素質固体粉末の混合比により、炭化けい素質多孔体の導電特性を制御することを特徴とする炭化けい素質多孔体の製造方法。 Silicon nitride powder and carbonaceous material in which the silicon carbide powder as an aggregate is 50 to 95% by weight and the molar ratio (Si / C) of silicon component to carbon in silicon nitride is 0.5 to 1.5 A method for producing a silicon carbide porous body, comprising molding a mixed powder in which 50 to 5% by weight of a solid powder is mixed, and firing the obtained molded body in a nitrogen atmosphere,
A method for producing a silicon carbide porous material, wherein the conductive characteristics of the silicon carbide porous material are controlled by a mixing ratio of the silicon nitride powder and the carbonaceous solid powder to the silicon carbide powder.
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CN110698215A (en) * | 2019-10-29 | 2020-01-17 | 中国科学院上海硅酸盐研究所苏州研究院 | High-temperature-resistant corrosion-resistant reaction-sintered silicon carbide film support and preparation method thereof |
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