JP2012011685A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012011685A5 JP2012011685A5 JP2010151024A JP2010151024A JP2012011685A5 JP 2012011685 A5 JP2012011685 A5 JP 2012011685A5 JP 2010151024 A JP2010151024 A JP 2010151024A JP 2010151024 A JP2010151024 A JP 2010151024A JP 2012011685 A5 JP2012011685 A5 JP 2012011685A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- oxide film
- active energy
- pore
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 claims description 9
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 239000008151 electrolyte solution Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 238000007743 anodising Methods 0.000 claims 1
- 239000005871 repellent Substances 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010151024A JP5630104B2 (ja) | 2010-07-01 | 2010-07-01 | 成形体とその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010151024A JP5630104B2 (ja) | 2010-07-01 | 2010-07-01 | 成形体とその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012011685A JP2012011685A (ja) | 2012-01-19 |
JP2012011685A5 true JP2012011685A5 (enrdf_load_stackoverflow) | 2013-08-01 |
JP5630104B2 JP5630104B2 (ja) | 2014-11-26 |
Family
ID=45598685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010151024A Active JP5630104B2 (ja) | 2010-07-01 | 2010-07-01 | 成形体とその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5630104B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014087695A1 (ja) * | 2012-12-07 | 2014-06-12 | 電気化学工業株式会社 | 撥水性を備えた熱可塑性樹脂シート及び成形品 |
JP6131034B2 (ja) * | 2012-12-07 | 2017-05-17 | デンカ株式会社 | 撥水性を付与した積層シート及びラミネート用フィルム |
JP6045068B2 (ja) * | 2013-04-29 | 2016-12-14 | リケンテクノス株式会社 | 高鮮鋭性加飾シート |
JP6232242B2 (ja) * | 2013-10-08 | 2017-11-15 | 株式会社フジワラテクノアート | 加熱処理装置 |
JP6865520B2 (ja) * | 2014-06-24 | 2021-04-28 | 三菱ケミカル株式会社 | 菌体付着対策方法 |
JP2017002268A (ja) * | 2015-06-15 | 2017-01-05 | パナソニックIpマネジメント株式会社 | 成形体 |
JP2017001380A (ja) * | 2015-06-15 | 2017-01-05 | パナソニックIpマネジメント株式会社 | 成形体 |
JPWO2023013789A1 (enrdf_load_stackoverflow) * | 2021-08-06 | 2023-02-09 | ||
JP7371995B1 (ja) * | 2023-08-03 | 2023-10-31 | 株式会社フジワラテクノアート | 粉粒体の加熱又は殺菌処理装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007053242A2 (en) * | 2005-09-19 | 2007-05-10 | Wayne State University | Transparent hydrophobic article having self-cleaning and liquid repellant features and method of fabricating same |
US8939752B2 (en) * | 2006-06-30 | 2015-01-27 | Mitsubishi Rayon Co., Ltd. | Mold, process for producing mold, and process for producing sheet |
JP2009042714A (ja) * | 2006-11-08 | 2009-02-26 | Nissan Motor Co Ltd | 撥水性反射防止構造及びその製造方法 |
JP2008158293A (ja) * | 2006-12-25 | 2008-07-10 | Nissan Motor Co Ltd | 親水性反射防止構造 |
TWI504500B (zh) * | 2007-10-25 | 2015-10-21 | Mitsubishi Rayon Co | 壓模及其製造方法、成形體的製造方法以及壓模的鋁原型 |
JP2009258487A (ja) * | 2008-04-18 | 2009-11-05 | Mitsubishi Rayon Co Ltd | 交通安全施設 |
JP2009269237A (ja) * | 2008-05-01 | 2009-11-19 | Mitsubishi Rayon Co Ltd | ラミネート用フィルムおよび積層体 |
-
2010
- 2010-07-01 JP JP2010151024A patent/JP5630104B2/ja active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2012011685A5 (enrdf_load_stackoverflow) | ||
US20210213651A1 (en) | Mold, Method for the Production and Use Thereof, Plastic Film and Plastic Component | |
JP2012512045A5 (enrdf_load_stackoverflow) | ||
JP5276830B2 (ja) | インプリント用モールドの製造方法 | |
JP2014523382A5 (enrdf_load_stackoverflow) | ||
JP2012037875A5 (enrdf_load_stackoverflow) | ||
Tsuchiya et al. | Formation of self-organized pores on type 316 stainless steel in organic solvents | |
JP2011507792A5 (enrdf_load_stackoverflow) | ||
JP2008516083A5 (enrdf_load_stackoverflow) | ||
KR20150078976A (ko) | 리소그래피와 양극산화법으로 제조한 초발수용 몰드와 이 몰드로 제조한 초발수 재료 | |
JP2014049520A5 (enrdf_load_stackoverflow) | ||
TW201210852A (en) | Apparatus for manufacturing mold for nanoimprinting and method of manufacturing mold for nanoimprinting | |
Huang et al. | Optimal processing for hydrophobic nanopillar polymer surfaces using nanoporous alumina template | |
TW201912611A (zh) | 陶瓷塑料複合體及其製造方法 | |
Zaraska et al. | Effect of Al polishing conditions on the growth and morphology of porous anodic alumina films | |
CN105908241A (zh) | 一种三维形貌可控的TiO2纳米管阵列制备方法 | |
JP2012128416A5 (enrdf_load_stackoverflow) | ||
JP2007247070A5 (ja) | 陽極酸化ポーラスアルミナの製造方法および陽極酸化ポーラスアルミナ | |
JP6760640B2 (ja) | 陽極酸化ポーラスアルミナの製造方法 | |
JP2005173120A (ja) | 低反射構造体および低反射構造体の作製方法 | |
TW200701354A (en) | Process of forming a curved profile on a semiconductor substrate | |
JP5677876B2 (ja) | 成形型の製造方法 | |
JP2008198681A5 (enrdf_load_stackoverflow) | ||
KR101010336B1 (ko) | 동공직경이 규칙적으로 변형된 나노다공성 알루미나의 경제적 제작 공정 | |
Gong et al. | Tailoring morphology in free-standing anodic aluminium oxide: Control of barrier layer opening down to the sub-10 nm diameter |