JP2011233778A - Mobile device, exposure device, device manufacturing method, and method of manufacturing flat panel display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To separate a mobile, whose movement is restricted by a stopper, from the stopper.SOLUTION: A stage recovery device 70 includes an air jack 72 to drive a stage device 20 in a direction to separate the device 20 from a stopper 50. A control of air to be supplied to the air jack 72 is performed by operating a spool 78b of a mechanical valve 73. The spool 78b is operated by a valve operation mechanism 74 including a lever 86 which includes cams 89a and 89b being mechanically engageable with cam followers 90a and 90b held by an X rough-moving stage 23X. Accordingly, an electric sensor or the like for detecting the position of the X rough-moving stage 23X, an electric actuator for operating the mechanical valve 73 and a control system for controlling the sensors, the electric actuator, etc. are not needed. Consequently, the constitution is simplified and the cost is reduced.

Description

  The present invention relates to a moving body apparatus, an exposure apparatus, a device manufacturing method, and a flat panel display manufacturing method, and more specifically, a moving body apparatus including a moving body movable in a predetermined uniaxial direction, and the moving body apparatus. The present invention relates to an exposure apparatus, a device manufacturing method using the exposure apparatus, and a flat panel display manufacturing method using the exposure apparatus.

  Conventionally, in a lithography process for manufacturing an electronic device (microdevice) such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”). Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). An apparatus (so-called scanning stepper (also called a scanner)) or the like is used (for example, see Patent Document 1).

  This type of exposure apparatus includes a stage apparatus that holds a substrate that is an exposure target. The stage device is driven within a predetermined range in the scanning direction by an electromagnetic actuator such as a linear motor. Further, the stage device is mechanically guided straight in the scanning direction by a guide member. The guide member has a stopper device that mechanically limits the movement of the stage device in the scanning direction. The stopper device includes a shock absorber. For example, when the stage drive system (or stage measurement system) has some trouble and the stage device travels beyond the range that can be controlled by the linear motor, It collides and mechanically stops the travel of the stage device.

  Here, the stopper device is provided outside the range in which the position control of the stage device by the linear motor is possible. After the stage device collides with the stopper device and stops, the position control of the stage device by the linear motor is performed. It must be restored to within the possible range. However, the stage device has become larger with the recent increase in size of the substrate, and its weight has become very heavy. Position control of the stage device by a linear motor is performed by the frictional force generated between the stage device and the guide member. However, it was difficult to return to within the possible range.

US Patent Application Publication No. 2010/0018950

  The present invention has been made under the circumstances described above. From a first viewpoint, the present invention is a movable body that is movable in a uniaxial direction within a predetermined two-dimensional plane; and to one side in the uniaxial direction of the movable body. A restriction device that mechanically restricts the movement of the moving body; a drive device that drives the moving body, the movement of which is restricted by the restriction device, in a direction away from the restriction device; and a first engagement provided on the moving body And a second engaging member that is provided on a predetermined fixing member and mechanically engageable with the first engaging member, and the movement of the moving body is restricted by the restriction device. An actuating mechanism that mechanically engages the first and second engaging members to drive at least one of the first and second engaging members to actuate the driving device.

  According to this, the movement of the moving body that moves in one axial direction within a predetermined two-dimensional plane is mechanically restricted by the restriction device. In addition, the moving body whose movement is restricted is driven in a direction away from the restriction device by the driving device. Here, the drive device is operated by an operation mechanism. The operating mechanism is configured to mechanically engage the first and second engaging members when the movement of the moving body is restricted by the restriction device, and to drive at least one of the first and second engaging members. Therefore, for example, without requiring an electrical sensor for detecting the position of the moving body, an electric actuator for operating the driving device, a control system for controlling the sensors, the electric actuator, etc. The moving device can be moved away from the restricting device by operating the driving device. Therefore, the configuration is simple and the cost is low. In addition, the reliability of the apparatus is improved.

  According to a second aspect of the present invention, there is provided an exposure apparatus for exposing an object with an energy beam, wherein the object is held by the moving body; and the object is irradiated with an energy beam. A pattern generating device for generating a pattern on the object.

  From a third aspect, the present invention is a device manufacturing method including: exposing the object using the exposure apparatus of the present invention; and developing the exposed object.

  According to a fourth aspect of the present invention, there is provided a flat panel display manufacturing method comprising: exposing the substrate using the exposure apparatus of the present invention; and developing the exposed substrate.

It is a figure which shows schematic structure of the liquid crystal exposure apparatus which concerns on one Embodiment. It is a side view of the substrate stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. It is a figure which shows typically the structure of the stage return apparatus which a substrate stage apparatus has. FIG. 4 is a diagram (No. 1) for explaining the operation of the stage return device of FIG. 3. FIG. 4 is a diagram (part 2) for explaining the operation of the stage return device of FIG. 3; FIG. 4 is a diagram (No. 3) for explaining the operation of the stage return device of FIG. 3; FIG. 4 is a diagram (No. 4) for explaining the operation of the stage return device in FIG. 3; FIG. 6 is a view (No. 5) for explaining the operation of the stage return apparatus in FIG. 3; 9A to 9C are diagrams illustrating the operation of the mechanical valve included in the stage return device of FIG. It is a figure for demonstrating operation | movement of the stage return apparatus which concerns on a modification.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS. 1 to 9C.

  FIG. 1 shows a schematic configuration of a liquid crystal exposure apparatus 10 according to an embodiment. The liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object. A projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage MST for holding a mask M, a projection optical system PL, a body 30 on which the mask stage MST and the projection optical system PL are mounted, and a substrate stage apparatus PST for holding a substrate P. , And their control system. In the following, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure will be referred to as the X-axis direction, and the directions orthogonal to this in the horizontal plane will be the Y-axis direction, X-axis The direction orthogonal to the Z-axis direction will be described, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis will be described as the θx, θy, and θz directions, respectively.

  The illumination system IOP is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331. That is, the illumination system IOP emits light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. Irradiation light) is applied to the mask M as IL. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used. Further, the wavelength of the illumination light IL can be appropriately switched by a wavelength selection filter, for example, according to the required resolution.

  A mask M having a circuit pattern or the like formed on its pattern surface (the lower surface in FIG. 1) is fixed to the mask stage MST by, for example, vacuum suction (or electrostatic suction). The mask stage MST is mounted in a non-contact state (floating state) via an air bearing (not shown) on a mask stage guide 35 fixed to the upper surface of a lens barrel base plate 33 which is a part of a body 30 described later. ing. The mask stage MST is driven with a predetermined stroke in the scanning direction (X-axis direction) on the mask stage guide 35 by a mask stage drive system (not shown) including a linear motor, for example, and in the Y-axis direction and θz. It is slightly driven in each direction as appropriate. Position information (including rotation information in the θz direction) of the mask stage MST in the XY plane is measured by a mask interferometer system including a laser interferometer (not shown).

  Projection optical system PL is supported by lens barrel surface plate 33 which is a part of body 30 below mask stage MST in FIG. The projection optical system PL is configured similarly to the projection optical system disclosed in, for example, US Pat. No. 5,729,331. That is, the projection optical system PL has a plurality of optical systems (lens barrels) including lens modules and the like, and the plurality of optical systems are arranged in a so-called staggered pattern along the Y-axis direction (multi-lens projection). Also called optical system). As each of the plurality of optical systems, for example, a bilateral telecentric equal magnification system that forms an erect image is used. The aforementioned illumination system IOP is configured to irradiate the mask M with a plurality of illumination lights IL corresponding to the plurality of optical systems. Therefore, on the mask M, illumination areas of a plurality of illumination lights IL arranged in a staggered pattern are formed, and on the substrate P arranged below the projection optical system PL, a plurality of optical systems are respectively provided. Corresponding to the above, irradiation regions of a plurality of illumination lights IL arranged in a staggered pattern are formed. In the liquid crystal exposure apparatus 10, the projection optical system PL including a plurality of optical systems arranged in a staggered manner has a Y axis direction as a longitudinal direction by combining a plurality of irradiation regions formed on the substrate P. It functions in the same way as a projection optical system having a single rectangular (band) image field.

  For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, the illumination light IL that has passed through the mask M causes the circuit of the mask M in the illumination area to pass through the projection optical system PL. Irradiation region of illumination light IL conjugate to an illumination region on a substrate P on which a resist (sensitive agent) is coated, on which a projection image (partial upright image) of a pattern is arranged on the image plane side of projection optical system PL It is formed in (exposure area). Then, by synchronous driving of the mask stage MST and the substrate stage apparatus PST, the mask M is moved relative to the illumination area (illumination light IL) in the scanning direction (X-axis direction), and at the exposure area (illumination light IL). On the other hand, when the substrate P is relatively moved in the scanning direction (X-axis direction), scanning exposure of one shot region (partition region) on the substrate P is performed, and the pattern of the mask M is transferred to the shot region. . That is, in the liquid crystal exposure apparatus 10, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the sensitive layer (resist layer) on the substrate P is exposed on the substrate P by the illumination light IL. That pattern is formed.

  The body 30 includes a substrate stage frame 31, a pair of side columns 32, and a lens barrel surface plate 33. The substrate stage pedestal 31 is made of a member extending in the Y-axis direction, and two, for example, are provided at predetermined intervals in the X-axis direction (see FIG. 2. In FIG. 1, the substrate stage pedestal 31 on the −X side is on the + X side. It is hidden behind the paper stage with respect to the substrate stage base 31). Each of the two substrate stage stands 31 is supported at both ends in the Y-axis direction from below by a vibration isolator 34 installed on the floor surface 11, and is vibrationally separated from the floor surface 11. The pair of side columns 32 is made of a member extending in the X-axis direction, and is mounted in a state of being spanned on the + Y side end and the −Y side end of the two substrate stage mounts 31. The lens barrel surface plate 33 is composed of a flat plate-like member parallel to the XY plane, and supports the projection optical system PL as described above. The lens barrel surface plate 33 is supported by the pair of side columns 32 at both ends in the Y-axis direction from below. Thereby, the body 30 and the projection optical system PL supported by the body 30 are vibrationally separated from the floor surface 11.

  The substrate stage apparatus PST includes a surface plate 12, a pair of base frames 14, a substrate stage 20, and the like.

  The surface plate 12 is made of a rectangular plate-like member (for example, viewed from the + Z side) formed of a stone material, and the upper surface thereof is finished with extremely high flatness. The surface plate 12 is mounted on the two substrate stage platforms 31 (see FIG. 2).

  One of the pair of base frames 14 is disposed on the + Y side of the surface plate 12, and the other is disposed on the −Y side of the surface plate 12. As shown in FIG. 2, the base frame 14 supports a main body portion 14a made of a plate-like member parallel to the XZ plane extending in the X-axis direction, and both end portions and a central portion of the main body portion 14a from below. One leg portion 14b is included, and is fixed to the floor surface 11 in a state of straddling the two substrate stage mounts 31. As shown in FIG. 1, X linear guide members 16 extending in parallel with the X-axis direction are fixed to both side surfaces and the upper end surface of the main body portion 14a. Further, magnet units 15a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed to both side surfaces of the main body portion 14a.

  The substrate stage 20 is mounted on the X coarse movement stage 23X and the X coarse movement stage 23X, and together with the X coarse movement stage 23X, a Y coarse movement stage 23Y and a Y coarse movement stage 23Y that constitute a so-called gantry-type XY biaxial stage device. A fine movement stage 25 arranged on the + Z side (upper side) of the substrate, a substrate holder 26 fixed on the fine movement stage 25, and a weight cancellation device 40 for supporting the fine movement stage 25 on the surface plate 12 from below. .

  The X coarse movement stage 23X is composed of a frame member having a rectangular shape in plan view with the Y-axis direction as the longitudinal direction, and an opening (not shown) is formed at the center thereof. A pair of X sliders 21 are fixed to the lower surface of the X coarse movement stage 23 </ b> X at intervals corresponding to the pair of base frames 14. The X slider 21 is composed of a member having an inverted U-shaped YZ cross section, and the base frame 14 is inserted between a pair of opposing surfaces. The slider 19 that is slidably engaged with the X linear guide member 16 is fixed to the pair of opposing surfaces and the ceiling surface of the X slider 21.

  A coil unit 15 b including a coil (not shown) is fixed to each of the pair of opposed surfaces of the X slider 21. The coil unit 15 b is disposed to face the magnet unit 15 a fixed to the base frame 14. The magnet unit 15a and the coil unit 15b constitute an X linear motor 15 of a Lorentz electromagnetic force drive system for driving the X coarse movement stage 23X with a predetermined stroke in the X-axis direction. Therefore, in this embodiment, the X coarse movement stage 23 </ b> X is driven in the X-axis direction by the four X linear motors 15. The four X linear motors 15 are not controlled by a main control (not shown) based on the output of a measurement system (not shown) (including a linear encoder system (or an optical interferometer system)) that measures positional information of the X coarse movement stage 23X. It is controlled synchronously by the device. As a result, the X coarse movement stage 23X is guided by the plurality of X linear guide members 16 and can move linearly with a predetermined stroke in the X-axis direction. Further, as shown in FIG. 2, a pair of Y linear guide members 28 extending in the Y-axis direction are fixed to both ends in the Y-axis direction on the upper surface of the X coarse movement stage 23X. Although not shown, a magnet unit composed of a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction is fixed to the upper surface of the X coarse movement stage 23X.

  The Y coarse movement stage 23Y is made of a frame member having a rectangular shape in plan view with the X-axis direction as the longitudinal direction, and an opening (not shown) is formed at the center thereof. A slider 29 that is slidably engaged with the Y linear guide member 28 is fixed, for example, near the four corners of the lower surface of the Y coarse movement stage 23Y. Although not shown, a coil unit that includes a coil and faces a magnet unit (not shown) fixed to the upper surface of the X coarse movement stage 23X is fixed to the lower surface of the Y coarse movement stage 23Y. A magnet unit and a coil unit (not shown) constitute a Y linear motor of Lorentz electromagnetic force driving system for driving the Y coarse movement stage 23Y on the X coarse movement stage 23X with a predetermined stroke in the Y axis direction. Yes. The Y linear motor is controlled by a main controller (not shown) based on an output of a measurement system (not shown) (including a linear encoder system (or an optical interferometer system)) that measures position information of the Y coarse movement stage 23Y. Is done.

  The fine movement stage 25 is formed of a rectangular parallelepiped member having a substantially square shape in plan view, and is disposed above the Y coarse movement stage 23Y. Although not shown, fine movement stage 25 is a fine movement stage including a plurality of voice coil motors (or linear motors) each having a stator fixed to Y coarse movement stage 23Y and a movable element fixed to fine movement stage 25. The drive system slightly drives in the direction of six degrees of freedom (X axis, Y axis, Z axis, θx, θy, θz directions) on the Y coarse movement stage 23Y. The fine movement stage 25 is guided to the Y coarse movement stage 23Y via the voice coil motor, so that the fine movement stage 25 and the Y coarse movement stage 23Y are predetermined along the XY plane in the X axis direction and / or the Y axis direction. Move with the stroke. The position information of the fine movement stage 25 in the XY plane is a moving mirror (not shown) fixed to the fine movement stage 25 (Y movement mirror having a reflection surface orthogonal to the Y axis and X movement having a reflection surface orthogonal to the X axis). An interferometer (not shown) that irradiates a measuring beam to a mirror (including a mirror) (a Y interferometer that measures the Y position of the fine movement stage 25 using a Y moving mirror and an X position of the fine movement stage 25 using an X movable mirror) And an interferometer system including an X interferometer that measures the intensity of the light is constantly detected with a resolution of, for example, about 0.5 to 1 nm. The configurations of the fine movement stage drive system and the interferometer system are disclosed in, for example, US Patent Application Publication No. 2010/0018950.

  The substrate holder 26 is formed of a rectangular parallelepiped member having a substantially square shape in plan view, and is fixed on the upper surface of the fine movement stage 25. The substrate holder 26 has a suction holding device (not shown) (for example, a vacuum suction device) on its upper surface, and holds the substrate P by suction.

  The weight canceling device 40 is composed of a single columnar member extending in the Z-axis direction, and the fine movement stage 25 can be tilted with respect to a horizontal plane via a device called a leveling device 42 (around an axis parallel to the XY plane). In a state where it can be rotated at a slight angle). The weight canceling device 40 is inserted into each opening of the X coarse movement stage 23X and the Y coarse movement stage 23Y. The weight canceling device 40 has a plurality of air bearings (base pads) 41 on its lower surface, and is levitated and supported on the surface plate 12 via a minute clearance. The weight cancellation device 40 is connected to the Y coarse movement stage 23Y via a plurality of coupling devices (not shown) at the height of the center of gravity with respect to the Z axis direction, and is integrated with the Y coarse movement stage 23Y in the Y axis direction. And / or move on the surface plate 12 in the X-axis direction.

  The weight canceling device 40 has an air spring (not shown), and the weight (vertical downward force) of the fine movement stage 25, the leveling device 42, the substrate holder 26, and the like by a vertical upward force generated by the air spring. Thus, the load on the voice coil motor of the fine movement stage drive system is reduced. The detailed configuration and operation of the weight canceling device 40 including the leveling device 42 and a coupling device (not shown) are disclosed in, for example, US Patent Application Publication No. 2010/0018950.

  With the configuration described above, the substrate stage 20 (the X coarse movement stage 23X, the Y coarse movement stage 23Y, the fine movement stage 25, the substrate holder 26, and the weight canceling device 40) is driven by the X linear motor 15, thereby The frame 14 is guided by a plurality of X linear guide members 16 and moves integrally in the X-axis direction with a predetermined stroke (hereinafter referred to as an effective stroke). The movement stroke (hereinafter referred to as an effective stroke) of the substrate stage 20 in the X-axis direction in a normal use state such as an exposure operation or substrate replacement is referred to as a main controller for controlling the X linear motor 15 (see FIG. 1). Defined by program (software).

  Here, as shown in FIG. 2, a pair of limit switches 60 are attached to the side surface of the base frame 14 (not shown in FIG. 1). The pair of limit switches 60 are disposed outside the effective stroke of the substrate stage 20, specifically, in the + X region and the −X side region from the magnet unit 15a. Hereinafter, the limit switch 60 disposed on the + X side of the base frame 14 will be described.

  As shown in FIG. 3, the limit switch 60 includes a base 61, a plunger 62, a lever 63, and the like. The plunger 62 can move up and down with respect to the upper surface while protruding upward from the upper surface of the base 61, and is biased in the + Z direction by, for example, an elastic member (not shown). For example, when the protrusion amount of the plunger 62 with respect to the upper surface of the base 61 shown in FIG. 3 is a predetermined amount or more, electric power is supplied to the coil unit 15b (not shown in FIG. 3; see FIG. 1) of the X linear motor 15. When the protruding amount is less than the predetermined amount shown in FIG. 6, the power supply to the coil unit 15b of the X linear motor 15 is stopped. One end of the lever 63 is supported so as to be rotatable about the Y axis (θy direction) at a position on the −X side of the plunger 62 on the base 61, and an intermediate portion thereof contacts the plunger 62 from above. ing. A roller 64 is supported at the other end of the lever 63 so as to be rotatable in the θy direction. 3 to 8, illustration of the fine movement stage 25, the Y coarse movement stage 23Y, the base frame 14 and the like is omitted in order to avoid complication of the drawings (see FIG. 1 or FIG. 2 respectively). 3 to 8 are schematic diagrams for explaining the positional relationship between the limit switch 60 and a stage return device 70 described later, including an X coarse movement stage 23X (including the X slider 21), a limit switch 60, The positional relationship of the stage return device 70 and the like includes a portion different from the actual one.

  On the other hand, a contact member 68 is fixed to the lower end portion of the X slider 21 at substantially the same Z position as the roller 64 of the limit switch 60. The contact member 68 is made of a member having an approximately isosceles trapezoidal XZ cross-sectional shape, and the longer side portion of the opposite side portions parallel to each other is fixed to the X slider 21. The + X end surface (inclined surface) of the contact member 68 is at a height that makes contact with the outer peripheral surface of the roller 64. Then, when the X coarse movement stage 23X moves in the + X direction from the state shown in FIG. 3 (the state where electric power is supplied to the X linear motor 15), the roller 64 of the contact member 68 is moved as shown in FIG. It abuts against the + X end surface (inclined surface) and is pushed downward. Thereby, the protrusion amount of the plunger 62 with respect to the upper surface of the base 61 becomes less than a predetermined amount, and the power supply to the X linear motor 15 (not shown in FIG. 6, refer to FIG. 2) is stopped. When the X coarse movement stage 23X moves in the −X direction from the state shown in FIG. 6, the lever 63 returns to the position shown in FIG. 3, and the X linear motor 15 (not shown in FIG. 3, see FIG. 1). ) Can be supplied with power. Therefore, the substrate stage 20 can be stopped even when the substrate stage 20 has moved beyond the above-described effective stroke (movable range defined by software) due to, for example, a measurement system trouble. As described above, the limit switch 60 electrically defines the movable range of the substrate stage 20 with respect to the X-axis direction by the X linear motor 15. Hereinafter, the movable range of the substrate stage 20 defined by the pair of limit switches 60 will be referred to as an electrically movable range.

  Further, in the substrate stage apparatus PST, as shown in FIG. 2, a pair of stoppers 50 (not shown in FIG. 1) are provided on the upper end surface of the base frame 14 in the vicinity of both ends in the longitudinal direction of the X linear guide member 16. It is attached. Hereinafter, the stopper 50 disposed on the + X side of the base frame 14 will be described. As shown in FIG. 3, the stopper 50 is made of a member having an inverted U-shaped YZ cross section and straddles the X linear guide member 16 (not shown in FIG. 3, see FIG. 2). (Refer to FIG. 2.) A base 51 attached to the base 51, a shock absorber 52 inserted between a pair of opposing surfaces of the base 51, a coil spring 53 attached to the shock absorber 52, and the like. The shock absorber 52 includes a cylinder 54 formed of a cylindrical member fixed to the base 51, a piston rod 55 inserted through the coil spring 53 and inserted at one end into the cylinder 54, and the other end (− And a pad 56 fixed to the X end). When the piston rod 55 enters the cylinder 54 most, the pad 56 is accommodated between a pair of opposing surfaces of the base 51 (see FIG. 10). The shock absorber 52 mechanically stops the substrate stage 20 by converting the kinetic energy of the substrate stage 20 into thermal energy and absorbing the shock when it collides with the X slider 21. As shown in FIG. 2, each of the pair of stoppers 50 is disposed outside the pair of limit switches 60 in the X-axis direction with respect to the substrate stage 20, and the stoppers 50 are power to the X linear motor 15. The movement due to the inertia of the substrate stage 20 after the supply is stopped is mechanically limited. As described above, the stopper 50 defines a mechanical movable range in the X-axis direction of the substrate stage 20.

  As shown in FIG. 2, the substrate stage apparatus PST is configured to return the substrate stage 20 to an electrically movable range after the movement of the substrate stage 20 is mechanically limited by the pair of stoppers 50. The stage return device 70 is provided.

  The pair of stage return devices 70 are arranged in the vicinity of each of the pair of stoppers 50. Hereinafter, the stage return device 70 disposed on the + X side of the base frame 14 will be described. As shown in FIG. 3, the stage return device 70 includes a support frame 71, an air jack 72, a mechanical valve 73, a valve operation mechanism 74, and the like.

  The support frame 71 supports the air jack 72, the mechanical valve 73, the valve operation mechanism 74, and the like, and is supported by the base frame 14 via a support member (not shown). The support frame 71 includes a bottom member 71a made of a plate-like member parallel to the XY plane, and a wall member 71b made of a plate-like member parallel to the YZ plane fixed to the + X end portion of the bottom member 71a. The bottom member 71a is disposed such that the upper surface thereof is lower than the lower surface of the X coarse movement stage 23X. The upper surface of the base 51 of the stopper 50 is fixed to the lower surface of the bottom member 71a. The X position of the −X side end of the base 51 is substantially the same as the X position of the −X side end of the bottom member 71a, and the piston rod 55 of the shock absorber 52 is connected to the −X side end of the bottom member 71a. It protrudes to the -X side rather than the part. A blocking member 71c that prevents the rotation of a lever 86 (described later) protrudes from the −X end surface of the wall member 71b.

  The air jack 72 is formed of a bellows-like member (bellows) including an air spring. The air jack 72 is placed on the upper surface of the bottom member 71a so as to be expandable and contractible in the X-axis direction. The -X side end of the air jack 72 faces the + X side side surface of the X coarse movement stage 23X, and the + X side end of the air jack 72 is parallel to the YZ plane fixed on the bottom member 71a. It is in contact with a pressing member 75 made of a plate-like member. One end of a pipe 77 having a speed controller (gas flow rate control device) 76 in the middle thereof is connected to the air jack 72 in a state of being inserted through an opening 75 a formed in the pressing member 75. Note that the force generated by the air jack 72, the expansion / contraction stroke of the air jack 72, and the X position of the pressing member 75 are such that when the X coarse movement stage 23X collides with the stopper 50, the X coarse movement stage 23X is moved to a pair of limit switches 60. It is set so that it can return to the inside of the electrically movable range defined by.

  The mechanical valve 73 is a so-called three-way valve, and includes a body 78a, a spool 78b, a valve body 78c, and the like. The lower surface of the body 78a is fixed to the + X side of the air jack 72 on the upper surface of the bottom member 71a. A support member 79 that supports a lever 86 described later is fixed to the body 78a.

  Here, the configuration and operation of the mechanical valve 73 will be described. As shown in FIGS. 9A to 9C, the body 78a is formed with an internal space 82 communicating with the pipe 77, the gas exhaust pipe 80, and the gas supply pipe 81 (see FIG. 3). . A spool 78b is inserted into the upper portion of the internal space 82 so as to be vertically movable with respect to the body 78a in a state where the spool 78b protrudes from the upper surface of the body 78a and is biased upward by the compression coil spring 83. A valve body 78c is accommodated in the internal space 82 directly below the spool 78b so as to be movable up and down with respect to the body 78a while being urged upward by the compression coil spring 84. When the valve body 78c is not pressed downward, the valve body 78c is at a movement upper limit position defined by the stopper 84d, and the communication between the pipe 77 and the gas supply pipe 81 is shut off (the position of the valve body 78c at this time is cut off). Called).

  In the state shown in FIG. 9B, the spool 78b and the valve body 78c are separated from each other, and the pipe 77 and the gas exhaust pipe 80 communicate with each other through the through hole 85 formed in the spool 78b (at this time). The position of the spool 78b is referred to as a communication position), and the gas in the air jack 72 passes through the pipe 77, the internal space 82, and the gas discharge pipe 80 to form particles (dust) in the liquid crystal exposure apparatus 10 (see FIG. 1). Is discharged to a place where it does not soar (for example, outside the liquid crystal exposure apparatus 10). Here, the speed controller 76 (not shown in FIG. 9A, see FIG. 3) is appropriately operated and set by an operator or the like, thereby adjusting the flow rate of the gas discharged from the gas discharge pipe 80. Thus, the speed at which the air jack 72 contracts is adjusted to a desired speed.

  When the spool 78b moves downward by a predetermined amount from the state shown in FIG. 9A and shifts to the state shown in FIG. 9B, the spool 78b and the valve body 78c come into contact with each other to close the through hole 85. As a result, the communication between the pipe 77 and the gas exhaust pipe 80 is blocked (the position of the spool 78b at this time is referred to as a blocking position). At this time, the valve body 78c is still in the blocking position, and the communication between the pipe 77 and the gas supply pipe 81 is blocked.

  When the spool 78b further moves downward from the state shown in FIG. 9B and shifts to the state shown in FIG. 9C, the valve body 78c is shut off while maintaining contact with the spool 78b. The pipe 77 and the gas supply pipe 81 communicate with each other, and compressed gas is supplied into the air jack 72 via the gas supply pipe 81, the internal space 82, and the pipe 77 (the valve at this time). The position of the body 78c is referred to as a communication position). The gas supply pipe 81 is branched and connected to a supply pipe (not shown) for supplying compressed gas to the base pad 41, the air spring (not shown), etc., which the weight cancellation device 40 shown in FIG. Is always filled with compressed fluid. Here, as shown in FIG. 3, a speed controller 81a (gas flow rate control device) is connected to an intermediate portion of the gas supply pipe 81, and this speed controller 81a is appropriately operated and set by an operator or the like. As a result, the flow rate of the compressed gas supplied to the internal space 82 is adjusted, whereby the speed at which the air jack 72 expands (extends) is adjusted to a desired speed.

  As described above, the mechanical valve 73 has a state in which the air jack 72 communicates with the gas discharge pipe 80 (the state shown in FIG. 9A), the air jack 72, according to the positions of the spool 78b and the valve body 78c. A state in which the inside communicates with the gas supply pipe 81 (state shown in FIG. 9C), and a state in which the inside of the air jack 72 does not communicate with either the gas discharge pipe 80 or the gas supply pipe 81 (FIG. 9B). Can be set to any one of three states.

  Returning to FIG. 3, the valve operating mechanism 74 is a mechanism that mechanically engages the X coarse movement stage 23X to operate the mechanical valve 73. The lever 86 that contacts the spool 78b, and the lever 86 on the spool 78b side. And an urging device 87 capable of urging. The lever 86, the urging device 87, and the mechanical valve 73 described above are disposed on the −Y side of the −Y side end surface of the X coarse movement stage 23X.

  The lever 86 includes a main body member 88, a pair of cams 89a and 89b, and the like. The main body member 88 is formed of an elongated member, and an intermediate portion in the longitudinal direction is rotatably supported by the support member 79 via an axis 79a parallel to the Y axis. Hereinafter, for convenience of explanation, a portion on the -X side with respect to the shaft 79a of the main body member 88 is referred to as a -X side portion 88a, and a portion on the + X side with respect to the shaft 79a of the main body member 88 is referred to as a + X side portion 88b. The dimension in the longitudinal direction of the −X side portion 88a is set to be longer (for example, about 1.5 times) than that of the + X side portion 88b. In the state shown in FIG. 3, the intermediate portion of the + X side portion 88b is pressed against the upper end of the spool 78b from above, and the + X end portion of the + X side portion 88b is fixed to the upper surface of the + X end portion. Via a clamping bolt 93, which will be described later, it is urged to the −Z side from above. In the main body member 88, the moment around the shaft 79a by the spool 78b and the moment around the shaft 79a by the clamping bolt 93 are balanced, and the main body member 88 is kept horizontal. In this state, the spool 78b is in the blocking position where it is pushed down by a predetermined amount with respect to the body 78a shown in FIG. 9B, and the valve body 78c is also in the blocking position. Hereinafter, the posture of the main body member 88 shown in FIG. 3 is referred to as a reference posture.

  In addition, a pair of cam followers 90a and 90b that mechanically engage with the pair of cams 89a and 89b, respectively, on the side surface on the −Y side of the X coarse movement stage 23X are vertically spaced with a Y axis. It is attached to the surroundings in a freely rotatable manner. The outer peripheral surfaces of the pair of cam followers 90a and 90b are formed of a material having a high coefficient of friction such as rubber and having a buffer property. In FIG. 3, a pair of cam followers 90a and 90b arranged at the + X end of the −Y side surface of the X coarse movement stage 23X are representatively shown. However, the X coarse movement stage 23X is shown on the −Y side. Similarly, a pair of cam followers 90a and 90b are respectively provided at the −X end of the side surface, the + X end of the side surface of the + Y side, and the −X end (not shown). Hereinafter, for convenience of explanation, each of the pair of cam followers 90a and 90b is also referred to as an upper cam follower 90a and a lower cam follower 90b.

  The cam 89a is made of a member having a substantially isosceles trapezoidal shape in the XZ section, and the longer side portion of the pair of parallel side portions is fixed to the upper surface of the −X end portion of the −X side portion 88a. The −X end surface of the cam 89 a is located on the −X side with respect to the pad 56. The cam 89b is made of a member having a substantially isosceles trapezoidal shape in the XZ section, and the longer side portion of the pair of side portions parallel to each other is located at the position on the + X side of the cam 89a on the lower surface of the −X side portion 88a. It is fixed. Hereinafter, for convenience of explanation, the pair of cams 89a and 89b are also referred to as an upper cam 89a and a lower cam 89b, respectively. The distance between the upper surface of the upper cam 89a and the lower surface of the −X side portion 88a and the distance between the lower surface of the lower cam 89b and the upper surface of the −X side portion 88a are larger than the distance between the pair of cam followers 90a and 90b. It is set slightly short. Further, when the main body member 88 is in the reference posture, the upper cam 89a is positioned at a height at which the −X end surface can contact the upper cam follower 90a, and the lower cam 89b has the −X end surface of the lower cam follower 90b. It is located at a height where it can abut.

  The biasing device 87 includes a holding member 92, a clamping bolt 93, a compression coil spring 94, and the like. The holding member 92 is composed of a plate-like member parallel to the XY plane, and the + X end portion thereof is fixed to the wall member 71b. The holding member 92 is formed with a through hole 92a penetrating in the Z-axis direction. The clamping bolt 93 includes a shaft member 93a having a thread formed on the outer periphery and extending in the Z-axis direction, and a ball 93b rotatably provided at the lower end of the shaft member 93a. The shaft member 93a is inserted into the through hole 92a, and an upper nut 96 that is locked to the holding member 92 is screwed into a portion of the shaft member 93a that protrudes upward from the through hole 92a. Thereby, the lower limit position of the lower end of the ball 93b is defined. The shaft member 93 a is inserted through the compression coil spring 94 below the holding member 92. A lower nut 95 is screwed into a lower end portion (a portion above the ball 93b) of the shaft member 93a, and is pressed against the compression coil spring 94 from below. That is, the compression coil spring 94 is sandwiched between the lower nut 95 and the holding member 92 in a contracted state. The ball 93b is in point contact with the contact member 91 fixed to the + X end portion of the + X side portion 88b from above. Here, by adjusting the position (screwing amount) of the upper nut 96 relative to the shaft member 93a, the downward feeding amount of the shaft member 93a with respect to the holding member 92, that is, the lower limit position of the lower end of the ball 93b can be adjusted. Further, by adjusting the position (screwing amount) of the lower nut 95 with respect to the shaft member 93a, the elastic force of the compression coil spring 94 can be changed, and the downward biasing force of the clamping bolt 93 can be adjusted. Thereby, the inclination with respect to the horizontal surface of the main body member 88, that is, the reference posture of the main body member 88 can be adjusted.

  With the above configuration, when a moment of external force in the direction of arrow L (counterclockwise when viewed from the −Y direction) acts on the main body member 88 from the state shown in FIG. 3, the main body member 88 is moved to the arrow L as shown in FIG. 4. And the spool 78b moves up following the + X side portion 88b by the action of the compression coil spring 84 (see FIG. 9A), and moves from the shut-off position to the communication position shown in FIG. 9A. To do. At the same time, the lower end portion (ball 93 b) of the clamping bolt 93 is pressed upward against the elastic force of the compression coil spring 94 by the + X side portion 88 b and moves upward with respect to the holding member 92. On the other hand, when a moment of external force in the direction of arrow R acts on the main body member 88 from the state shown in FIG. 3, the main body member 88 rotates in the direction of arrow R as shown in FIG. 6, and the spool 78b and the valve body 78c. Is pushed downward by the + X side portion 88b against the elastic force of the compression coil springs 83 and 84 (see FIG. 9C), and the valve body 78c is moved from the blocking position shown in FIG. 9B. Then, it moves to the communication position shown in FIG. At this time, as shown in FIG. 6, the clamping bolt 93 and the contact member 91 are separated from each other, and the urging by the clamping bolt 93 to the main body member 88 is released. When the main body member 88 rotates a predetermined amount in the arrow R direction, the + X side portion 88b abuts against the blocking member 71c, and the rotation in the arrow R direction is blocked.

  As described above, in the valve operation mechanism 74, the lever 86 is rotated by using the cam mechanism, and the lever 78 is used to operate the spool 78b of the mechanical valve 73 according to the lever principle, whereby the valve element 78c. Adjust the position.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage MST by the mask loader (not shown) and is not controlled under the control of the main controller (not shown). The substrate P is loaded onto the substrate stage device PST by the illustrated substrate loader. Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its detailed description is omitted.

  During a normal operation such as the exposure operation, the alignment operation, or the substrate replacement operation, the substrate stage 20 moves in the X-axis direction within an effective stroke (a movable range of the substrate stage 20 defined by software). . At this time, the X linear guide member 16 that guides the X coarse movement stage 23X in the X-axis direction is loaded with the weight of the Y coarse movement stage 23Y in addition to the weight of the X coarse movement stage 23X.

  Here, when the X coarse movement stage 23X runs away due to, for example, inability to control the X linear motor 15 and moves in the + X direction beyond the effective stroke (see FIG. 4), first, the outer peripheral surface of the upper cam follower 90a And the -X end surface (inclined surface) of the upper cam 89a come into contact with each other, and a moment in the arrow L direction (counterclockwise when viewed from the -Y direction) acts on the lever 86, and the lever 86 rotates in the arrow L direction. At this time, the upper cam follower 90a is kept in contact with the upper cam 89a while rotating in the arrow R direction (clockwise as viewed from the -Y direction). At the same time, the spool 78b moves from the shut-off position to the communication position, the gas in the air jack 72 begins to be discharged from the gas discharge pipe 80, and the air jack 72 is gradually contracted in the X-axis direction. The outer peripheral surface of the upper cam follower 90a and the upper surface of the upper cam 89a come into contact with each other, and the upper cam 89a and the −X side portion 88a are guided between the upper cam follower 90a and the lower cam follower 90b.

  As shown in FIG. 5, when the X coarse movement stage 23X further moves in the + X direction, the upper cam follower 90a and the upper cam 89a are separated from each other, and the lever 86 is rotated in the arrow R direction and becomes horizontal. Accordingly, the spool 78b moves from the communication position to the blocking position, and the discharge of gas from the air jack 72 is completed.

  When the X coarse movement stage 23X further moves in the + X direction, the outer peripheral surface of the lower cam follower 90b and the -X end surface (inclined surface) of the lower cam 89b come into contact with each other as shown in FIG. A moment in the direction acts, and the lever 86 rotates in the arrow R direction. At this time, the lower cam follower 90b is kept in contact with the lower cam 89b while rotating in the arrow L direction. On the other hand, at the same time, the valve body 78c moves from the blocking position to the communication position. Thereby, supply of compressed gas from the gas supply pipe 81 into the air jack 72 is started, and the air jack 72 gradually extends in the X-axis direction (see FIG. 6). The outer peripheral surface of the lower cam follower 90b and the lower surface of the lower cam 89b come into contact with each other, and the lower cam 89b and the −X side portion 88a are guided between the upper cam follower 90a and the lower cam follower 90b.

  At about the same time, the X slider 21 collides with the pad 56 of the shock absorber 52, and the X coarse movement stage is caused by the elastic force of the coil spring 53 in the -X direction and the damping force of the shock absorber 52 in the -X direction. 23X is decelerated. Further, the contact member 68 and the roller 64 come into contact with each other, and the current supply to the X linear motor is stopped. Then, when the X coarse movement stage 23X further moves in the + X direction due to its inertia, the X coarse movement stage 23X collides with the air jack 72 (at this time, the air jack 72 has the X coarse movement stage 23X and the holding member 75). The coil spring 53 is fully contracted, and the X slider 21 collides with the base 51. Thereby, the movement of the X coarse movement stage 23X is mechanically limited (hereinafter, the position of the X coarse movement stage 23X at this time is referred to as a mechanical restriction position). Then, as shown in FIG. 7, the X coarse movement stage 23 </ b> X, in addition to the elastic force in the −X direction of the coil spring 53 and the damping force in the −X direction of the shock absorber 52, Friction force acting in the + X direction (X linear guide member 16 shown in FIG. 1 and slider 19 engaged with the friction force) acting in the + X direction by receiving force (impact force) and -X direction pressing force from the air jack 72 The movement starts in the -X direction against the frictional force generated between the two. Here, the pressing force generated by the air jack 72 is set in advance so as to exceed the frictional resistance acting on the X coarse movement stage 23X. The force generated by the air jack 72 is obtained by the product of the effective sectional area (pressure receiving area) of the air spring and the difference between the internal pressure of the air jack 72 and the atmospheric pressure, and based on this, the above pressing force is calculated. Has been.

  When the length of the air jack 72 in the X-axis direction reaches a predetermined length, the X coarse movement stage 23X moves from the mechanical limit position in the −X direction by a predetermined distance, and the roller 64 moves to the contact member 68. The power supply to the X linear motor is started (the X coarse movement stage 23X reaches within the electrically movable range). At this time, the lower cam follower 90b and the lower cam 90b are separated from each other, the lever 86 rotates in the direction of the arrow L, the main body member 88 becomes horizontal, and the valve body 78c moves from the communication position to the blocking position. Thereby, supply of the compressed gas into the air jack 72 is stopped, and the extension of the air jack 72 in the X-axis direction is stopped. The expansion / contraction stroke in the X-axis direction of the air jack 72 and the X position of the pressing member 75 are set in advance so that the X coarse movement stage 23X can be returned from the mechanical limit position to the + X end of the electrically movable range. ing.

  Next, as shown in FIG. 8, the X coarse movement stage 23X is driven in the −X direction by the X linear motor 15 (not shown in FIG. 8, refer to FIG. 2), and returns to the soft movable range. At this time, the upper cam follower 90a and the + X end surface (inclined surface) of the upper cam 89a come into contact with each other, and a moment in the arrow L direction acts on the lever 86, and the lever 86 rotates in the arrow L direction. At this time, the upper cam follower 90a is kept in contact with the upper cam 89a while rotating in the arrow L direction. At the same time, the spool 78b moves from the blocking position to the communication position, and the gas remaining in the air jack 72 begins to be discharged from the gas discharge pipe 80. Thereby, since the internal pressure of the air jack 72 can be lowered, when the X coarse movement stage 23X collides with the air jack 72 again, an excessive impact is applied to the X coarse movement stage 23X by the internal pressure of the air jack 72. Is suppressed. The outer peripheral surface of the upper cam follower 90a and the upper surface of the upper cam 89a come into contact with each other, and the upper cam 89a and the −X side portion 88a of the main body member 88 are guided between the upper cam follower 90a and the lower cam follower 90b. When the X coarse movement stage 23X further moves in the −X direction, the upper cam follower 90a and the upper cam 89a are separated from each other, the lever 86 rotates in the direction of the arrow R and becomes horizontal, and the spool 78b is moved from the communication position to the blocking position. The gas discharge from the gas discharge pipe 80 is completed. Thereafter, the X coarse movement stage 23X performs a normal operation such as an exposure operation within a soft movable range.

  As described above, in the substrate stage apparatus PST of the present embodiment, the X coarse movement stage 23X performing the normal operation such as the exposure operation is stopped beyond its electrically movable range due to trouble such as uncontrollability. When colliding with 50, the stage return device 70 pushes the X coarse movement stage 23X away from the stopper 50 (in the -X direction in FIGS. 3 to 8) to push it back to the electrically movable range. As a result, the X coarse movement stage 23X can be returned to a normal operation such as an exposure operation.

  Further, in the present embodiment, a mechanical valve 73 that is mechanically operated is used to communicate and block the inside of the air jack 72 and the gas supply pipe 81 and the gas discharge pipe 80 respectively. Therefore, the reliability regarding valve | bulb operation | movement is high compared with the case where the valve | bulb which electrically operates, such as a solenoid valve, is used (when operating a valve | bulb using an electric system). That is, when a solenoid valve or the like is used, the valve may become inoperable due to a trouble in the electric system, a power failure, or the like, but in this embodiment, the valve can always be reliably operated. Further, in the present embodiment, it is not necessary to provide a dedicated power supply system and control system as compared with the case where a solenoid valve or the like is used, and the cost can be reduced.

  Further, in the present embodiment, the lever 86 is mechanically engaged with the X coarse movement stage 23X, and the mechanical valve 73 is operated using the cam mechanism and the lever principle. Therefore, for example, the position of the X coarse movement stage 23X Compared to the case where information is measured by a measurement system including an optical sensor and the electromagnetic valve is driven based on the measurement value, there is no possibility of trouble in the measurement system, so the mechanical valve 73 is operated reliably. Can do.

  In this embodiment, compressed air is supplied from the air spring (not shown) of the weight canceling device 40 or the gas supply device that supplies compressed air to the base pad 41 to the air jack 72 of the stage return device 70. A dedicated gas supply device for supplying compressed gas to the jack 72 is not required, and in this respect as well, cost increases can be suppressed.

  Before the X coarse movement stage 23X exceeds the electric movement range and collides with the stopper 50, the gas is discharged from the air jack 72 and the air jack 72 is contracted in the X-axis direction. It is possible to earn a stroke in the extending direction of the air jack 72 for pressing.

  After the X coarse movement stage 23X exceeds the electric movement range and collides with the shock absorber 52 and is decelerated, the X coarse movement stage 23X is caused to collide with the air jack 72. Can do.

The configuration of the substrate stage apparatus PST according to the above embodiment is an example, and the present invention is not limited to this. For example, in the above embodiment, the X coarse movement stage 23X is pressed by the air jack 72 before the X slider 21 collides with the base 51. Instead, the stage return device shown in FIG. As in 170, the X coarse movement stage 23 </ b> X may be pressed by the air jack 72 after the X slider 21 collides with the base 51. Thus, the X coarse movement stage 23X is pressed by the air jack 72 in a state where it does not have a momentum in the + X direction (direction toward the air jack 72). Can be prevented. Thereby, for example, it is possible to suppress displacement of the movable mirror, the substrate holder 26 and the like provided on the fine movement stage 25. Specifically, for example, at least one of the following ac may be performed.
a, The air jack 72 and the pressing member 75 are arranged so as to be shifted in the + X direction (the direction away from the X coarse movement stage 23X) from the above embodiment.
b. The speed at which the air jack 72 expands (extends) in the X-axis direction by the speed controller 81a is set to be slower than that in the above embodiment.
c. The speed at which the air jack 72 is contracted in the X-axis direction by the speed controller 76 is made faster than that in the above embodiment, and the air jack 72 is contracted as much as possible before the air jack 72 collides with the X coarse movement stage 23X.
The gas flow velocity is set by the speed controllers 76 and 81a in consideration of the time from when the current supply to the X linear motor is stopped until the X coarse movement stage 23X is stopped by the stopper 50.

  In the above embodiment, the stage return device 70 is supported by the base frame 14 and each of the pair of cam followers 90a and 90b is provided in the X coarse movement stage 23X. The pair of cam followers 90a and 90b may be provided on a fixing member fixed to the base frame 14 and provided on the coarse movement stage 23X. In this case, the air jack 72 is pressed against the pressing member 75 and the fixed member to press the X coarse movement stage 23X. In this case, the stopper 50 and the stage return device 70 are configured separately.

  In the above embodiment, the air jack 72 is installed on the support frame 71, for example. Instead, for example, the air jack 72 is attached to the end surface of the X coarse movement stage 23X so as to face the pressing member 75. Also good. In this case, if, for example, a flexible pipe such as a flexible tube is used as the pipe connecting the air jack 72 and the mechanical valve 73, the pipe can follow the movement of the X coarse movement stage 23X.

  In the above embodiment, the pair of cams 89a and 89b are fixed to the main body member 88, and the pair of cam followers 90a and 90b are provided on the X coarse movement stage 23X. 90a and 90b may be provided, and a pair of cams 89a and 89b may be fixed to the X coarse movement stage 23X.

  In the above embodiment, the air jack 72 is used as a member that presses the X coarse movement stage 23X. However, the present invention is not limited to this, and for example, it is used to rescue a person who has become a rubble or a vehicle underlay in a disaster. Such a rescue air mat or an air cylinder may be used.

  In the above embodiment, the air jack 72 is used as a member that presses the X coarse movement stage 23X, and compressed gas is supplied thereto. Instead, for example, an oil cylinder is used, and a compressed liquid (oil ) May be supplied. In this case, however, it is necessary to provide an oil tank for discharging the oil or a circulator for circulating the oil.

  In the above embodiment, the clamping bolt 93 is used to bias the lever 86 toward the spool 78b. However, the invention is not limited to this. For example, a weight is attached to the end of the lever 86 or a tension spring is attached to the end of the lever 86. Alternatively, the lever 86 may be biased toward the spool 78b by attaching a compression spring or the like.

  The mechanical valve is not limited to the configuration described in the above embodiment, and mechanically interlocks with the movement of the X coarse movement stage 23X to supply compressed gas to the air jack 72 and discharge gas from the air jack 72. Any configuration may be used as long as the configuration can be switched. For example, the mechanical valve may not have a neutral state that does not communicate with either the gas supply pipe or the gas discharge pipe. Specifically, when the cam and the cam follower are not engaged, the inside of the air jack is communicated with the gas discharge pipe, and when the cam and the cam follower are engaged, the inside of the air jack is communicated with the gas supply pipe. You may comprise as follows. In this case, it is sufficient that the lever is provided with one cam and one cam follower that engages with the cam.

  In the above-described embodiment, the lever 86 can be rotated around the horizontal axis 79a. Alternatively, for example, the lever 86 may be rotatable about the vertical axis. In this case, each of the pair of cam followers 90a and 90b is rotatable about the vertical axis, and the mechanical valve 73 and the urging device so that the spool 78b, the valve body 78c, the clamping bolt 93 and the like can be moved in the horizontal direction. 87 and the like need to be arranged.

  In the above embodiment, the pair of cam followers 90a and 90b are rotatably provided on the X coarse movement stage 23X. Alternatively, the pair of cam followers 90a and 90b may be fixed to the X coarse movement stage 23X. In this case, the frictional contact is made so that the inclination angle of the oblique sides of the pair of cams 89a and 89b is reduced and the frictional resistance at the time of contact between the pair of cam followers 90a and 90b and the pair of cams 89a and 89b is reduced. It is desirable to perform at least one of making at least one of the materials smooth.

  In the above embodiment, the stage return device 70 and the pair of cam followers 90a and 90b are used to press the X coarse movement stage 23X when it reaches the mechanical stroke end. The pair of cam followers may be used to press the Y coarse movement stage 23Y, the mask stage MST, or the like when the mechanical stroke end is reached.

  In the above embodiment, the case where the X coarse movement stage 23X collides with the stopper 50 when the X linear motor cannot be controlled has been described as an example. However, the present invention is not limited to this, and for example, interference for measuring position information of the fine movement stage 25 Even when the X coarse movement stage 23X collides with the stopper 50 due to inertial motion after the current supply to the X linear motor is cut by an emergency stop command from the main controller when an error occurs in the measuring system or the like The present invention is applicable.

  Further, in the above embodiment, the mechanical valve 73 is operated using the lever 86 that is driven by the cam mechanism and uses the lever principle. However, the mechanism for operating the mechanical valve 73 is not limited to this, for example, a gear. Other mechanisms such as a mechanism (rack and pinion, etc.), a feed screw mechanism, a link mechanism, a force transmission mechanism using a belt, a chain, a wire, or the like may be used.

The illumination light used in the exposure apparatus is ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). May be. As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  In the above-described embodiment and its modification, the case where the projection optical system PL is a multi-lens projection optical system including a plurality of optical systems has been described. However, the number of projection optical systems is not limited thereto. One or more is enough. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, although the case where the projection magnification of the same magnification system is used has been described, the present invention is not limited to this, and the projection optical system may be either an enlargement system or a reduction system.

  In the above-described embodiment and its modifications, the case where the present invention is applied to a projection exposure apparatus that performs scanning-type exposure with a step-and-scan operation of a plate has been described. The present invention can also be applied to a proximity type exposure apparatus that does not use a projection optical system. The present invention can also be applied to a step-and-repeat type exposure apparatus (so-called stepper) or a step-and-stitch type exposure apparatus. In addition, the mobile device may be a device other than the exposure device, for example, an element manufacturing device provided with an ink jet type functional liquid application device, a substrate inspection device used for substrate inspection, or the like.

  Further, the use of the exposure apparatus is not limited to an exposure apparatus for liquid crystal that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for manufacturing a semiconductor, a thin film magnetic head, a micromachine, a DNA chip, etc. The present invention can also be widely applied to an exposure apparatus for manufacturing. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks.

  In addition, when the object to be exposed is a substrate for a flat panel display, the size and thickness of the substrate are not particularly limited, and the substrate may be, for example, a film (a flexible sheet-like member). Also included. The present invention is particularly effective when a rectangular substrate having a side of 500 mm or more is a conveyance object (or an exposure object).

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

  As described above, the mobile device of the present invention is suitable for moving a mobile body in a predetermined uniaxial direction. The exposure apparatus of the present invention is suitable for forming a pattern on an object with high accuracy. The device manufacturing method of the present invention is suitable for the production of micro devices. The manufacturing method of the flat panel display of this invention is suitable for manufacture of a flat panel display.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 12 ... Surface plate, 14 ... Base frame, 15 ... X linear motor, 20 ... Substrate stage, 23X ... X coarse movement stage, 23Y ... Y coarse movement stage, 50 ... Stopper, 60 ... Limit switch, DESCRIPTION OF SYMBOLS 70 ... Stage return device, 72 ... Air jack, 73 ... Mechanical valve, 89a ... Upper cam, 89b ... Lower cam, 90a ... Upper cam follower, 90b ... Lower cam follower, P ... Substrate, PST ... Substrate stage device

Claims (12)

A movable body movable in one axial direction within a predetermined two-dimensional plane;
A limiting device that mechanically limits movement of the movable body to one side in the uniaxial direction;
A driving device that drives the moving body, the movement of which is restricted by the restriction device, in a direction away from the restriction device;
A first engagement member provided on the movable body; and a second engagement member provided on a predetermined fixing member and mechanically engageable with the first engagement member, wherein the movement is performed by the restriction device. When the movement of the body is restricted, the first and second engaging members are mechanically engaged to drive at least one of the first and second engaging members to operate the driving device. A mobile device comprising: a mechanism; The movable body is driven by an electric actuator to control the position in the uniaxial direction, and in a state restricted by the restriction device, the movable body leaves a region where position control by the electric actuator is possible,
The moving body device according to claim 1, wherein the driving device returns the moving body to an area in which position control by the electric actuator is possible by separating the moving body from the limiting device. The first engagement member is a cam follower;
The second engagement member includes a cam mechanically engageable with the cam follower, and is driven in a direction intersecting the uniaxial direction by the uniaxial force transmitted from the movable body via the cam follower. Cam member,
The moving body device according to claim 1, wherein the operating mechanism operates the driving device using the cam member. The driving device includes a fluid actuator that generates a driving force for moving the moving body using a fluid,
The movable body according to claim 3, wherein the operating mechanism includes a mechanical valve device that controls a flow of the fluid, and operates the mechanical valve device using the cam member when movement of the movable body is restricted. apparatus.   The movable body device according to claim 4, wherein the cam member operates the mechanical valve device by amplifying a force in a direction intersecting the uniaxial direction using a lever principle.   The mobile device according to claim 1, wherein the limiting device, the driving device, and the operating mechanism are provided on the predetermined fixing member.   The said restriction | limiting apparatus impacts with this moving body when restrict | limiting the movement of the said moving body, The shock absorbing device which converts the kinetic energy at the time of this collision into heat energy is contained. Mobile device. An exposure apparatus that exposes an object with an energy beam,
The moving body device according to claim 1, wherein the object is held by the moving body;
An exposure apparatus comprising: a pattern generation device configured to generate a pattern on the object by irradiating the object with an energy beam. Exposing the object using the exposure apparatus according to claim 8;
Developing the exposed object. A device manufacturing method comprising:   The exposure apparatus according to claim 8, wherein the object is a substrate used for a flat panel display.   The exposure apparatus according to claim 10, wherein the substrate has a length of at least one side of 500 mm or more. Using the exposure apparatus according to claim 10 or 11, exposing the substrate;
Developing the exposed substrate. A method of manufacturing a flat panel display.

Images