JP2006228764A - Stage device and aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suppress the influence of reaction generated by the travel of a reticle stage, and to suppress the influence of vibration generated in a counter mass. <P>SOLUTION: The counter mass 18 traveling in a direction opposite to the reticle stage by the reaction of the reticle stage RST supported by a reticle stage surface plate 16 having a travel surface due to travel in the direction of one axis in the travel surface has an air pad section 128. A dead weight supporting mechanism 127 for supporting the dead weight of the counter mass is provided between the air pad section and the counter mass, thus extremely preventing reaction generated by the travel of the reticle stage in the direction of one axis from becoming the factor of the vibration of the reticle stage surface plate and that of a change in a posture and suppressing the transmission of vibration in a direction vertical to the travel surface in the counter mass to the reticle stage surface plate by the dead weight supporting mechanism. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a stage apparatus and an exposure apparatus. More specifically, the present invention relates to a stage apparatus that is supported by a base member and includes a stage that can move in at least one axial direction in a horizontal plane, and an exposure apparatus that includes the stage apparatus.

  In recent years, in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, and the like, a mask or a reticle (hereinafter collectively referred to as “reticle”) and a photosensitive object such as a wafer or a glass plate (hereinafter collectively referred to as “wafer”). Is a step-and-scan type scanning exposure apparatus (so-called scanning stepper) that transfers a reticle pattern onto a wafer via a projection optical system while synchronously moving in a predetermined scanning direction (scanning direction). Etc. have come to be used relatively frequently.

  However, in the scanning exposure apparatus, a drive device for driving the reticle is required on the reticle side in addition to the wafer side. In a recent scanning type exposure apparatus, as a reticle side drive device, a reticle stage that is levitated and supported on a reticle surface plate by an air bearing or the like is driven in a predetermined stroke range in a scanning direction by a pair of linear motors, for example. A reticle stage device that is finely driven in a direction and a non-scanning direction is employed. Further, the reticle stage device includes a reticle coarse movement stage that is driven in a predetermined stroke range in the scanning direction by a pair of linear motors arranged on both sides of the non-scanning direction (non-scanning direction) orthogonal to the scanning direction, A coarse / fine movement stage device having a reticle fine movement stage that is finely driven by a voice coil motor or the like in the scanning direction, the non-scanning direction, and the yawing direction is also used for the reticle coarse movement stage.

  In addition, in order to suppress the reaction force generated in the stator of the linear motor according to the driving of the reticle stage from being a factor of vibration of the reticle surface plate and a factor of posture change as much as possible, in response to the reaction force, the law of conservation of momentum is applied. There is also a reticle stage device provided with a counter mass mechanism having a counter mass (weight member) that moves in the opposite direction to the reticle stage.

  However, in the reticle stage apparatus employed by the conventional scanning exposure apparatus, when the reticle stage is driven in the scanning direction by, for example, a linear motor, the positional relationship in the vertical direction between the linear motor stator and the movable element is very small. May be changed to However, sufficient countermeasures have not been taken for the vertical vibration mode of the stator of the linear motor and the counter mass mechanism to which the stator is connected.

  The present invention has been made under the circumstances described above. From a first viewpoint, the stage is supported by a base member (16) having a moving surface and is movable at least in one axial direction within the moving surface. A counter mass (18) which includes a bearing (128) and moves in a direction opposite to the stage by a reaction force caused by movement of the stage in one axial direction; and between the bearing and the counter mass And a self-weight support mechanism (127) that supports the self-weight of the counter mass.

  According to this, even when the counter mass is vibrated in a direction perpendicular to the moving surface, the self-weight support mechanism can serve as a low-pass filter.

According to a second aspect of the present invention, there is provided a stage (RST) supported by a base member (16) having a moving surface and movable in at least one axial direction within the moving surface; A counter mass (18) that moves in a direction opposite to the stage by a reaction force due to movement; and a positioning device (VZ _{1 to} VZ ₃ ) that positions the counter mass in a direction orthogonal to the moving surface. Is a second stage device characterized by

  According to this, the counter mass can be positioned in a direction orthogonal to the moving surface.

  From a third aspect, the present invention is an exposure apparatus that exposes a pattern of a mask (R) placed on a mask stage (RST) onto a substrate (W) placed on a substrate stage (WST). An exposure apparatus comprising the first and second stage apparatuses of the present invention including one of the mask stage and the substrate stage as the stage.

  According to this, the first and second stage devices of the present invention in which the reaction force due to the movement of the stage is suppressed as much as possible are provided as a stage device including one of the mask stage and the substrate stage as the stage. Accurate exposure can be realized.

  In order to explain the present invention in an easy-to-understand manner, the description has been made in association with the reference numerals of the drawings representing one embodiment, but it goes without saying that the present invention is not limited to the embodiment.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 shows a schematic configuration of an exposure apparatus 10 according to an embodiment. The exposure apparatus 10 is a step-and-scan type scanning projection exposure apparatus, that is, a so-called scanning stepper.

  The exposure apparatus 10 drives an illumination unit IOP and a reticle R as a mask with a predetermined stroke in the Y-axis direction, and slightly drives them in the X-axis direction, the Y-axis direction, and the θz direction (rotation direction around the Z axis). Reticle stage device 12, projection optical system PL, wafer stage WST for driving wafer W as a substrate in the XY plane in the XY two-dimensional direction, and a body BD on which these control systems and projection optical system PL are mounted I have.

The illumination unit IOP includes a light source and an illumination optical system, and illumination light as an energy beam in a rectangular or arcuate illumination region defined by a field stop (also referred to as a mask king blade or a reticle blind) disposed therein. IL is irradiated, and the reticle R on which the circuit pattern is formed is illuminated with uniform illuminance. Here, as the illumination light IL, vacuum ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or F ₂ laser light (wavelength 157 nm) is used.

  The reticle stage device 12 is disposed below the illumination unit IOP. As can be seen from FIG. 1 and FIG. 2, which is a perspective view of reticle stage apparatus 12, reticle stage apparatus 12 has a top plate of second column 234, which will be described later, arranged at a predetermined interval below illumination unit IOP. A reticle stage surface plate 16 constituting a part, a reticle stage RST disposed above the reticle stage surface plate 16, a counter mass 18 disposed above the reticle stage surface plate 16 in a state surrounding the reticle stage RST, and A reticle stage drive system for driving the reticle stage RST is provided.

  The reticle stage surface plate 16 is supported substantially horizontally by, for example, four legs 241 (however, the two legs 241 on the back side of the drawing in FIG. 1 are not shown) constituting a second column 234 described later. As shown in FIG. 3, which is an exploded perspective view of FIG. 2, the reticle stage surface plate 16 is composed of a substantially plate-like member, and a convex portion 16a is formed at substantially the center thereof. A rectangular opening 16b whose longitudinal direction is the X-axis direction for allowing the illumination light IL to pass is formed in a substantially communicated state in the Z-axis direction at substantially the center of the convex portion 16a. The upper surface of the convex portion 16a is a moving surface of the reticle stage RST.

  The reticle stage RST is levitated and supported above the upper surface (moving surface) of the reticle stage surface plate 16 via a clearance of about several μm, for example. On reticle stage RST, reticle R is fixed by, for example, vacuum suction (or electrostatic suction). The reticle stage RST is two-dimensionally (around the Z axis perpendicular to the X axis direction, the Y axis direction, and the XY plane) in an XY plane perpendicular to the optical axis AX of the projection optical system PL by a reticle stage drive system described later. It can be driven minutely (in the rotation direction (θz direction)) and can be driven on the reticle stage surface plate 16 at a scanning speed specified in the Y-axis direction. The detailed configuration of reticle stage device 12 will be described in detail later.

  The projection optical system PL is held by a first column 232 constituting the body BD below the reticle stage RST in FIG. Here, the configuration of the body BD will be described.

  The body BD includes a first column 232 installed on the floor F of the clean room and a second column 234 installed on the upper surface of the first column 232. The first column 232 has four leg portions 237 (however, the two leg portions 237 on the back side in FIG. 1 are not shown) and the upper end surfaces of these leg portions 237 are connected to the lower end surfaces thereof, respectively. And a lens barrel surface plate 238 that constitutes the ceiling of the first column 232.

  Each of the leg portions 237 includes a support column 240 installed on the floor surface and a vibration isolation unit 239 provided on the upper portion of the support column 240. By each vibration isolation unit 239, the slight vibration from the floor surface F is insulated at the micro G level and hardly transmitted to the lens barrel surface plate 238. The lens barrel surface plate 238 is formed with a circular opening (not shown) at substantially the center thereof, and the projection optical system PL is inserted into the opening from above with the optical axis AX direction as the Z-axis direction.

  A flange FLG is provided at substantially the center in the height direction of the lens barrel of the projection optical system PL, and the projection optical system PL is supported by the lens barrel base plate 238 via the flange FLG. The lower end of the above-mentioned four legs 241 (however, the two legs 241 on the back side in FIG. 1 are not shown) is fixed to the upper surface of the lens barrel surface plate 238 at a position surrounding the projection optical system PL. The above-described reticle stage surface plate 16 is placed on the upper portions of these legs 241 and supported horizontally. That is, the second column 234 is configured by the reticle stage surface plate 16 and the four legs 241 that support the reticle stage surface plate 16.

  Here, as the projection optical system PL, a bilateral telecentric reduction system and a refractive optical system including a plurality of lens elements having a common optical axis in the Z-axis direction are used. The projection magnification β of the projection optical system PL is, for example, 1/4 or 1/5. Therefore, as described above, when the reticle R is illuminated by the illumination light IL from the illumination unit IOP, the circuit pattern in the illumination area formed on the reticle R is illuminated on the wafer W by the projection optical system PL. Is reduced and projected onto the irradiation area (exposure area) of the illumination light IL conjugate with the light, and a reduced image (partial equality image) of the circuit pattern is transferred and formed.

  Wafer stage WST holds wafer W by vacuum suction or the like through wafer holder 25, and is freely driven in the XY two-dimensional direction along the upper surface of stage base BS by a wafer drive system (not shown) including a linear motor, for example. It has come to be. The stage base BS is supported substantially horizontally via a plurality of vibration isolation units 86, and the vibration (dark vibration) transmitted from the floor surface F to the stage base BS by the vibration isolation unit 86 is, for example, a micro G level. Insulated with. As the vibration isolation unit 86, a so-called active vibration isolation device that actively suppresses the stage base BS based on the output of a vibration sensor such as a semiconductor accelerometer attached to a part of the stage base BS may be used. Is possible.

  At the end of the wafer holder 25 on the -Y side, a Y moving mirror 56Y made of a plane mirror extends in the X-axis direction. A length measurement beam from the Y-axis laser interferometer 57Y is projected almost perpendicularly to the Y moving mirror 56Y, and the reflected light is received by a detector inside the Y-axis laser interferometer 57Y. The position of the Y movable mirror 56Y, that is, the Y position of the wafer W is detected with reference to the mirror position.

  Similarly, although not shown, an X moving mirror composed of a plane mirror extends in the Y-axis direction at the end of the wafer holder 25 on the + X side. Then, the position of the X movable mirror, that is, the X position of the wafer W is detected by the X axis laser interferometer through the X movable mirror in the same manner as described above. The detection values (measurement values) of the two laser interferometers are supplied to the main control device 70, which monitors the detection values of the two laser interferometers through the wafer drive system and the wafer stage WST. The position control is performed.

  Next, the reticle stage device 12 will be described in detail.

  The reticle stage RST includes a reticle stage main body 22 having a special shape as shown in FIG. 4A, various magnetic pole units fixed to the reticle stage main body 22 (which will be described later), and the like.

The reticle stage main body 22 includes a plate-like portion 24A that is substantially rectangular in plan view (viewed from above), a mirror portion 24B provided at the −X end of the plate-like portion 24A, and the Y-axis direction of the plate-like portion 24A. And a pair of extending portions 24C ₁ , 24C ₂ , 24D ₁ , 24D ₂ projecting in the Y-axis direction from the end portions on one side and the other side.

  The plate-like portion 24A has a stepped opening 22a in which an opening serving as a passage for the illumination light IL is formed at the center (inner bottom surface) in the substantially central portion, and the stepped portion (one step) of the stepped opening 22a is formed. A plurality of (for example, three) reticle support members 34 that support the reticle R at a plurality of points (for example, three points) from the lower side are provided in the portion dug down.

  In the present embodiment, the reticle R is supported by the plurality of support members 34 in a state where the pattern surface (lower surface) thereof substantially coincides with the neutral surface CT of the reticle stage main body 22 (reticle stage RST). ing. That is, the mounting surface of the reticle R substantially coincides with the neutral plane CT of the reticle stage RST (see FIG. 4B).

  A plurality of (for example, three) reticle fixing mechanisms 36 are provided in the vicinity of the reticle support member 34 of the plate-like portion 24 </ b> A corresponding to each reticle support member 34. Each reticle fixing mechanism 36 has an L-shaped XZ cross section, and includes a fixing member attached to the plate-like portion 24A so as to be rotatable up and down around an axis provided at an L-shaped corner. ing. Each fixing member is driven to rotate in a predetermined direction via a drive mechanism (not shown) that is driven by the main controller 70 of FIG. 1 when the reticle R is placed on the reticle support member 34. Thus, the reticle R is mechanically fixed by sandwiching the reticle R with the reticle support member 34. In this case, a configuration in which the fixing member is constantly urged in a direction of pressing the reticle R toward the support member 34 by an urging means (not shown) may be employed.

  Various chucks such as a vacuum chuck and an electrostatic chuck can be used in place of or together with the reticle support member 34 and the reticle fixing mechanism 36.

  As can be seen from FIG. 4A, the mirror portion 24B has a substantially prismatic shape with the Y-axis direction as the longitudinal direction, and a hollow portion CH having a circular cross section for reducing the weight at the center. Is formed. The end surface on the −X side of the mirror portion 24B is a reflective surface that has been mirror-finished.

As shown in FIG. 4A, two concave portions 24g ₁ and 24g ₂ are formed at the −Y side end of the plate-like portion 24A of the reticle stage body 22, and the concave portions 24g ₁ and 24g ₂ are respectively formed. Are provided with retro-reflectors 32 ₁ and 32 ₂ , respectively.

As shown in FIG. 4A, the four extending portions 24C ₁ , 24C ₂ , 24D ₁ , and 24D ₂ have a substantially plate shape, and each extending portion has a structure for improving strength. A reinforcing portion having a triangular cross section is provided. The bottom surface of the reticle stage main body 22, a first static gas bearing over the entire area in the Y axis direction extending from the extended portion 24C ₁ to the extending portion 24D ₁ is formed, extending portion 24D from the extending portion 24C _{2 A second} hydrostatic bearing is formed across the entire area in the Y-axis direction up to ₂ . As these bearings, for example, a platen air supply type differential exhaust gas static pressure bearing disclosed in JP-A-2002-15985 is used.

  In the present embodiment, the static pressure of pressurized gas sprayed from the surface throttle groove of the first and second differential exhaust type gas static pressure bearings through the upper surface of the reticle stage surface plate 16 and the entire reticle stage RST. Due to its own weight, the reticle stage RST is levitated and supported in a non-contact manner above the upper surface of the reticle stage surface plate 16 via a clearance of about several microns.

  As shown in FIG. 2, the reticle stage drive system includes a pair of stator units 36 and 38 installed in the Y-axis direction inside the counter mass 18, and the reticle stage RST is connected to the Y-axis. And a first drive mechanism that drives minutely in the θz direction (rotational direction around the Z axis), and a fixed construction that extends in the Y axis direction on the −X side of one stator unit 38 inside the counter mass 18 And a second drive mechanism that includes the slave unit 40 and finely drives the reticle stage RST in the X-axis direction.

As shown in the exploded perspective view of FIG. 3, the one stator unit 36 includes Y-axis stators 136 ₁ and 136 _{2 including} a pair of armature units whose longitudinal direction is the Y-axis direction, and Y A pair of fixing members 152 that hold the shaft stators 136 ₁ and 136 ₂ at one end and the other end in the Y-axis direction (longitudinal direction) are provided. In this case, the Y-axis stators 136 ₁ and 136 ₂ are held by the pair of fixing members 152 so as to face each other at a predetermined interval in the Z-axis direction (vertical direction) and to be parallel to the XY plane. . Each of the pair of fixing members 152 is fixed to the inner wall surface of the counter mass 18 described above.

The other stator unit 38 is configured in the same manner as the one stator 36. That is, the stator unit 38 includes Y-axis stators 138 ₁ and 138 ₂ and a pair of fixing members 154, and each of the pair of fixing members 152 is fixed to the inner wall surface of the counter mass 18 described above. ing.

Reticle stage RST is arranged between Y-axis stators 136 ₁ , 138 ₁ and Y-axis stators 136 ₂ , 138 ₂ via predetermined clearances. A pair of magnetic pole units 26 ₁ and 26 ₂ (see FIG. 4B) are respectively embedded in the upper and lower surfaces of the reticle stage RST so as to face the Y-axis stators 136 ₁ and 136 ₂ , respectively. A pair of magnetic pole units 28 ₁ and 28 ₂ (see FIG. 4 (B)) are embedded in the upper and lower surfaces of the reticle stage RST so as to face the children 138 ₁ and 138 ₂ , respectively.

As shown in FIG. 4B, each of the magnetic pole units 26 ₁ , 26 ₂ is located in the reticle stage body 22 on the −X side of the stepped opening 22a of the plate-like portion 24A of the reticle stage body 22 described above. They are disposed symmetrically elevation CT as a reference vertical plane recess 24e ₁ formed respectively on the side, 24e _2.

Similarly, as shown in FIG. 4B, each of the pair of magnetic pole units 28 ₁ and 28 ₂ has a reticle on the + X side of the stepped opening 22a of the plate-like portion 24A of the reticle stage main body 22 described above. The stage body 22 is disposed in the recesses 24f ₁ and 24f ₂ formed symmetrically on the upper and lower surface sides with respect to the neutral plane CT. Further, ₁ pair of magnetic pole units 28, 28 _2, with respect to the Z-axis passing through the center position in the X-axis direction of the stepped opening 22a (substantially coincides with the X-axis direction position of the center of gravity of the reticle stage RST), the magnetic pole unit 26 _1, 26 ₂ is almost symmetrical.

Further, the Y-axis stators 136 ₁ and 136 ₂ are positioned at almost symmetrical positions with respect to the neutral plane CT, and the Y-axis stators 138 ₁ and 138 ₂ are also substantially set with reference to the neutral plane CT. It is located in a symmetrical position.

Thus, the magnetic pole units 26 ₁ and 26 ₂ , 28 ₁ and 28 ₂ , and the Y-axis stators 136 ₁ and 136 ₂ , 138 ₁ and 138 ₂ are arranged symmetrically with respect to the neutral plane CT of the reticle stage RST. Therefore, by supplying the same current to the armature coils of the Y-axis stators 136 ₁ , 136 ₂ , 138 ₁ , and 138 ₂ , the magnetic pole units 26 ₁ , 26 ₂ , 28 ₁ , and 28 ₂ , respectively. Are applied to the neutral plane CT of the reticle stage RST (see FIG. 4B), the driving force in the Y-axis direction (the resultant force of the magnetic pole units 26 ₁ and 26 ₂₎ , (The resultant force of the driving forces of the magnetic pole units 28 ₁ , 28 ₂ ) can be applied, so that the pitching moment does not act on the reticle stage RST as much as possible.

In the present embodiment, the magnetic pole units 26 ₁ and 26 ₂ and the magnetic pole units 28 ₁ and 28 ₂ are arranged substantially symmetrically with respect to the position near the center of gravity of the reticle stage RST in the X-axis direction. Since the driving force in the Y-axis direction acts at two locations equidistant from the center of gravity of the stage RST, the driving force in the Y-axis direction is generated near the center of gravity of the reticle stage RST by generating the same force at the two locations. It is possible to apply the resultant force. Therefore, the yawing moment does not act on the reticle stage RST as much as possible.

  Contrary to the above, yawing of reticle stage RST can be controlled by varying the driving forces in the left and right Y-axis directions.

As apparent from the above description, the magnetic pole units 26 ₁ and 26 ₂ and the corresponding stators 136 ₁ and 136 ₂ constitute a pair of Y-axis linear motors that drive the reticle stage RST in the Y-axis direction. The magnetic pole units 28 ₁ and 28 ₂ and the corresponding Y-axis stators 138 ₁ and 138 ₂ constitute a pair of moving magnet type Y-axis linear motors that drive the reticle stage RST in the Y-axis direction. In the following, these Y-axis linear motors are also referred to as “Y-axis linear motors 136 ₁ , 136 ₂ , 138 ₁ , 138 ₂ ” using the same reference numerals as the stators that make up each Y-axis linear motor. Shall. The pair of left and right Y-axis linear motors 136 ₁ , 136 ₂ and 138 ₁ , 138 ₂ constitute the first drive mechanism described above.

As shown in FIG. 3, the stator unit 40 includes a pair of armature units 140 ₁ and 140 ₂ having a longitudinal direction in the Y-axis direction, and these armature units 140 ₁ and 140 ₂ in the Y-axis direction ( A pair of fixing members 156 held at one end and the other end in the longitudinal direction. In this case, the armature units 140 ₁ and 140 ₂ are held by the pair of fixing members 156 so as to face each other at a predetermined interval in the Z-axis direction (vertical direction) and to be parallel to the XY plane. Each of the pair of fixing members 156 is fixed to the inner wall surface of the counter mass 18 described above.

Between the armature units 140 ₁ and 140 ₂ , a plate-shaped permanent magnet 30 having a rectangular cross section (rectangular shape) fixed to the end of the reticle stage RST in the X-axis direction via a predetermined clearance (see FIG. 4). (See (B)). Instead of the permanent magnet 30, a magnetic pole unit including a magnetic member and a pair of flat permanent magnets fixed to the upper and lower surfaces thereof may be used.

Therefore, the electromagnetic force in the X-axis direction is generated by electromagnetic interaction between the magnetic field in the Z-axis direction formed by the permanent magnet 30 and the current flowing in the Y-axis direction through the armature coils 140 ₁ and 140 _2. A force (Lorentz force) is generated, and a reaction force of the Lorentz force becomes a driving force for driving the permanent magnet 30 (reticle stage RST) in the X-axis direction.

In this case, the permanent magnet 30 has a substantially symmetrical shape with respect to the neutral plane CT, and the armature units 140 ₁ and 140 ₂ have a substantially symmetrical arrangement with respect to the neutral plane CT. (See FIG. 4B), by supplying the same current to the armature coils constituting the armature units 140 ₁ and 140 ₂ , the neutral plane CT of the reticle stage RST (see FIG. 4B). ) A driving force in the X-axis direction can be applied to the upper position, so that a rolling moment does not act on the reticle stage RST as much as possible.

As described above, the armature units 140 ₁ and 140 ₂ and the permanent magnet 30 constitute a moving magnet type voice coil motor capable of minutely driving the reticle stage RST in the X-axis direction. In the following, this voice coil motor is also referred to as a voice coil motor 30 by using a reference numeral of a mover constituting the voice coil motor, that is, a permanent magnet.

  FIG. 5 is a perspective view of the counter mass 18 turned upside down. As shown in FIG. 5, two self-weight cancellers 120 are provided at each of the four corners of the bottom surface of the counter mass 18.

  Here, the self-weight canceller 120 will be described in more detail. 6A is a perspective view showing a part of the self-weight canceller 120 in cross-section, and FIG. 6B is a vertical cross-sectional view of the self-weight canceller 120.

  The self-weight canceller 120 includes a cylinder part 122 fixed to the bottom surface of the counter mass 18, a piston part 126 engaged with the cylinder part 122, as can be understood from FIGS. 6 (A) and 6 (B). A self-weight support mechanism 127 including: an air pad portion 128 including a bearing fixed to the bottom surface of the piston portion 126.

  The cylinder portion 122 includes a cylindrical portion 122a whose upper end surface is closed, and a flange portion 122b provided over the entire periphery of the lower end portion (−Z side end portion) of the cylindrical portion 122a. Yes. The cylinder portion 122 is fixed to the bottom surface of the counter mass 18 at the upper end surface of the cylindrical portion 122a.

  The piston 126 includes a columnar piston 124c, a disk-shaped member 124a fixed to the bottom surface of the piston 124c, and a ring-shaped member having a substantially L-shaped cross section provided at an outer edge portion of the upper surface of the disk-shaped member 124a. And a stopper member 124b. The cylinder portion 122 described above is relatively movable in the Z-axis direction along the outer peripheral surface of the piston 124c of the piston portion 126, and a space 80 is formed above the piston 124c inside the cylinder portion 122 (see FIG. 6 (B)).

  An annular groove 129 is formed along the outer periphery of the piston 124c. An O-ring 130 is provided in the annular groove 129, and the air-tightness of the space 80 is maintained by the O-ring 130.

  The stopper member 124b serves to prevent the engagement between the cylinder part 122 and the piston part 126 from being released.

  The air pad portion 128 is fixed to the lower surface of the disk-shaped member 124 a that constitutes the piston portion 126. A groove 128 a is formed on the bottom surface of the air pad portion 128. Actually, the groove 128a has a shape in which a circle and a cross are combined as shown in FIG. As shown in FIG. 6B, the groove 128a is formed with one end portion of a through hole 129a formed in a vertically penetrating manner near the central axis of the piston portion 126 and the air pad portion 128.

  One end of an air supply pipe 132 is connected to the space 80 through an opening 122c formed in a part of the cylinder portion 122, and the other end of the air supply pipe 132 is connected to a gas supply device (not shown). ing. From this gas supply device, for example, a gas such as air is supplied into the space 80 via the supply pipe 132, so that the space 80 is made a positive pressure space having a higher atmospheric pressure than the outside of the cylinder portion 122. Yes. Therefore, in the following, the space 80 is also referred to as a “positive pressure space 80”.

  In the self-weight canceller 120 configured as described above, when the counter mass 18 is supported at its upper end, the self-weight is supported by the positive pressure in the positive pressure space 80 of the self-weight support mechanism 127 (the counter mass 18 is It is supported with low rigidity by positive pressure). Further, since the space 80 is a positive pressure space, a downward gas flow is generated in the through hole 129a. This gas is ejected from the lower end of the through hole 129a, and a gas flow toward the outside is generated in the groove 128a. Then, the gas spreads over the entire region of the groove 128a and is ejected from the entire groove toward the upper surface of the reticle stage surface plate 16. Thereby, due to the static pressure of the gas between the bottom surface of the air pad portion 128 and the top surface of the reticle stage surface plate 16 (pressure in the gap), between the bottom surface of the air pad portion 128 and the top surface of the reticle stage surface plate 16, A predetermined clearance is formed. That is, a kind of gas hydrostatic bearing is substantially formed on the bottom surface of the air pad portion 128, and the counter mass 18 and the self-weight canceller 120 are levitated and supported above the reticle stage surface plate 16 in a non-contact manner. .

  In the present embodiment, the reticle stage surface plate 16 is provided with three laser displacement meters 110 as shown in FIG. The laser displacement meter 110 includes, for example, a light emitting element and a position detection element (PSD) as a set. When light is output from the light emitting element toward the counter mass 18, the position of the reflected light is detected. The displacement of the distance to the counter mass 18 can be measured by the output from the position detection element received by the element (PSD). Therefore, by using the measurement results of the three laser displacement meters 110, the position of the counter mass 18 with respect to the reticle stage surface plate 16 in the Z-axis direction and the attitude with respect to the XY plane can be measured.

In the present embodiment, the counter mass 18 further includes a magnetic pole unit having a concave portion in its entirety and a generally U-shaped shape on the + X side surface and the + Y side surface of the counter mass 18 as shown in FIG. The movable elements 60a ₁ , 60a ₂ , 60a ₃ are provided. Further, the movable element 60a _1, 60a _2, 60a ₃ each bottom has the same shape as the movable element 60a ₁ ~60a _3, the movable element 61a ₁ to the direction of the recesses are different, 61a _2, 61a ₃ Is provided.

Corresponding to these movers 60a _{1 to} 60a ₃ and 61a _{1 to} 61a ₃ , support members 62 ₁ and 62 ₂ are provided on a support base 66 shown in FIG. 2 provided near the reticle stage surface plate 16. , 62 ₃ are provided with stators 60b ₁ , 60b ₂ , 60b ₃ and stators 61b ₁ , 60b ₂ , 60b ₃ made of armature units.

Among these, the mover 60a ₁ and the stator 60b ₁ constitute a trim motor TX ₁ for driving in the X-axis direction composed of a moving magnet type voice coil motor, and the mover 60a ₂ and the stator 60b ₂ move. A trim motor TX ₂ for driving in the X-axis direction, which is a magnet type voice coil motor, is configured. Further, the mover 60a ₃ and the stator 62b ₃ constitute a trim motor TY for driving in the Y-axis direction. By these three trim motors TX ₁ , TX ₂ , TY, the counter mass 18 can be driven in three degrees of freedom in the X-axis direction, the Y-axis direction, and the θz direction.

In addition, the moving magnet type three voice coil motors for driving in the Z-axis direction (hereinafter, referred to as “moving magnet type”) (hereinafter referred to as “moving magnet type”) are constituted by the mover 61a ₁ and the stator 61b ₁ , the mover 61a ₂ and the stator 61b ₂ , and the mover 61a ₃ and the stator 61b _3. VZ ₁ , VZ ₂ , and VZ ₃ are configured as “Z voice coil motor”. By these three Z voice coil motors VZ _{1 to} VZ ₃ , the counter mass 18 can be driven in the Z-axis direction, the θx direction, and the θy direction with three degrees of freedom.

  The support table 66 includes a support surface plate 69 that is substantially L-shaped in plan view (viewed from above) and support columns 68 a to 68 c that support the support surface plate 69. The support base 66 is in a state of being vibrationally separated from the body BD of FIG.

  As shown in FIG. 3, a concave portion 18 a is formed in the approximate center of the side wall on the −X side of the counter mass 18. A rectangular opening 18b that communicates the inside and the outside of the counter mass 18 is formed in the concave portion 18a. In addition, a rectangular opening 18 c that communicates the inside and the outside of the counter mass 18 is formed on the −Y side wall of the counter mass 18.

  An X-axis laser interferometer is provided on the outer side (−X side) of the rectangular opening 18a so as to face the reflecting surface of the mirror portion 24B of the reticle stage RST. The measurement beam from the X-axis laser interferometer is projected onto the reflecting surface of the mirror portion 24B through the rectangular opening 18b, and the reflected light returns to the X-axis laser interferometer through the rectangular opening 18b. As a result, the Y-axis laser interferometer always detects the position of the reticle stage RST in the X-axis direction with a resolution of, for example, about 0.5 to 1 nm. In this case, the position of the optical path of the length measuring beam in the Z-axis direction coincides with the position of the neutral plane CT.

On the outside (−Y side) of the rectangular opening 18c, a Y-axis laser interferometer is provided so as to face the reflecting surfaces of the retroreflectors 32 ₁ and 32 ₂ provided on the reticle stage body 22. In this case, a pair of Y-axis laser interferometers are provided corresponding to the retroreflectors 32 ₁ and 32 ₂ , respectively. The measurement beams from the Y-axis laser interferometers are respectively projected onto the reflecting surfaces of the retroreflectors 32 ₁ and 32 ₂ through the rectangular openings 18c, and the respective reflected lights are respectively projected through the rectangular openings 18c to the Y-axis lasers. Return to the interferometer. Thereby, the X-axis laser interferometer constantly detects the position of the reticle stage RST in the Y-axis direction with a resolution of, for example, about 0.5 to 1 nm. In this case, it is also possible to detect the amount of rotation of reticle stage RST about the Z axis by a pair of Y axis laser interferometers. Note that the position of the measurement beam irradiation point in the Z-axis direction substantially coincides with the position of the neutral plane CT.

In the present embodiment, as shown in FIG. 2, the mirror portion 24B is disposed outside the Y-axis linear motors 136 ₁ and 136 ₂ . Therefore, since it is never measurement axes of X-axis laser interferometer passes above the Y axis linear motors 136 _1, 136 ₂ of the stator, through the Y axis linear motors 136 _1, 136 ₂ of the stator Even if air fluctuations occur in the vicinity of the Y-axis linear motors 136 ₁ , 136 ₂ due to heat generated by the current, the air fluctuations do not affect the measurement value of the X-axis laser interferometer. Therefore, the reticle stage RST and consequently the reticle R The position in the X-axis direction can be detected with high accuracy. In this case, as described above, the position of the optical path of the measurement beam of the X-axis laser interferometer in the Z-axis direction coincides with the position of the neutral plane CT, and the mounting surface of the reticle R is also the neutral plane. Since it coincides with CT, the X-axis direction position of reticle stage RST and thus reticle R can be accurately measured without so-called Abbe error. Also in the pair of Y-axis interferometers, for the same reason, the position of the reticle stage RST and thus the reticle R in the Y-axis direction can be accurately measured without so-called Abbe error.

  As described above, the laser interferometer is actually provided with an X-axis laser interferometer and a pair of Y-axis laser interferometers, but these are typically shown as a reticle interferometer system 69 in FIG. ing.

  In the following description, it is assumed that the position (including θz rotation) of reticle stage RST in the XY plane is measured by reticle interferometer system 69. Position information (or speed information) of reticle stage RST from reticle interferometer system 69 is sent to main controller 70 in FIG. 1, and main controller 70 is based on position information (or speed information) of reticle stage RST. To control the driving of reticle stage RST.

  According to the exposure apparatus 10 of the present embodiment configured as described above, in the same manner as a normal scanning stepper, reticle alignment, baseline measurement of an alignment system (not shown), and EGA (Enhanced Global Alignment) method are used. After a predetermined preparatory work such as wafer alignment is performed, a step-and-scan exposure operation is performed as follows.

  First, wafer stage WST is moved so that the XY position of wafer W becomes the scan start position (acceleration start position) for exposure of the first shot region (first shot) on wafer W. At the same time, the reticle stage RST is moved so that the position of the reticle R becomes the scanning start position. Then, based on the position information of the reticle R measured by the reticle interferometer system 69 and the position information of the wafer W measured by the Y-axis laser interferometer 57Y and the X-axis laser interferometer on the wafer side, the reticle R (reticle stage) Scan exposure is performed by synchronously moving RST) and wafer W (wafer stage WST).

  When the transfer of the reticle pattern to the first shot area is thus completed, wafer stage WST is stepped by one shot area in the non-scanning direction (X-axis direction), and then scanning exposure is performed on the next shot area. It is. In this way, the stepping operation between shots and the scanning exposure are sequentially repeated, and the pattern of the reticle R is transferred onto the wafer W to a plurality of shot areas.

  At the time of the above scanning exposure, the main controller 70 controls the tracking of the reticle stage RST with respect to the wafer stage WST. At this time, the reaction force accompanying the movement of the reticle stage RST is canceled by the movement of the counter mass 18. Yes. Hereinafter, this point will be described.

That is, in the follow-up control, when the reticle stage RST is driven in the X-axis direction, the mover of the voice coil motor 30 is driven in the X-axis direction integrally with the reticle stage RST. The reaction force acts on the stator (armature units 140 ₁ and 140 ₂ ) of the voice coil motor 30 and the counter mass 18 to which the stator is fixed. In this case, since the counter mass 18 is not in contact with the reticle stage surface plate 16 through a predetermined clearance, the counter mass 18 has a distance according to the law of conservation of momentum due to the action of the reaction force. Only move in the direction according to the reaction force. The reaction force is absorbed by the movement of the counter mass 18. At this time, depending on the position of the reticle stage RST in the Y-axis direction, a yawing moment due to the reaction force of the driving force in the X-axis direction may act on the counter mass 18. In this case, the counter mass 18 performs free motion with θz rotation so as to absorb the reaction force according to the law of conservation of momentum by the action of the yawing moment and the reaction force in the X-axis direction.

On the other hand, when the reticle stage RST is driven in the Y-axis direction in order to synchronize with the wafer stage WST, the movers of the Y-axis linear motors 136 ₁ , 136 ₂ , 138 ₁ , and 138 ₂ are moved to the reticle stage. The Y-axis linear motors 136 ₁ , 136 ₂ , 138 ₁ , 138 ₂ and the counter mass to which these stators are fixed are driven in the Y-axis direction integrally with the RST. 18 acts on. Also in this case, due to the action of the reaction force, the counter mass 18 moves in a direction corresponding to the reaction force by a distance that absorbs the reaction force according to the law of conservation of momentum.

Further, the driving force (thrust) generated by the Y-axis linear motors 136 ₁ , 136 ₂ and the Y-axis linear motors 138 ₁ , 138 ₂ is made different to rotate the reticle stage RST by θz. In such a case, the counter mass 18 is also rotated by θz so as to absorb the reaction force according to the law of conservation of momentum by the action of the yawing moment and the reaction force in the Y-axis direction. Free movement.

  In any case, since the center of gravity of the system including the counter mass 18 and the reticle stage RST does not move, no offset load acts on the reticle stage surface plate 16.

  Therefore, in the present embodiment, when the reticle stage RST is driven, the reaction force (reaction force in the X-axis direction and the Y-axis direction) generated by driving the reticle stage RST and the yawing moment generated by the reaction force are surely canceled. Thus, it is possible to suppress vibration associated with driving of the reticle stage RST. In addition, since the occurrence of an offset load can be prevented as described above, a change in the posture of the reticle stage surface plate 16 due to this can also be prevented.

In the present embodiment, because of the above reaction force cancellation, when the counter mass 18 moves above the reticle stage surface plate 16, the deviation amount from the reference position does not exceed the allowable value (ie, for example, In order to prevent the voice coil motor 30 from being disabled due to the movement of the counter mass 18, the main controller 70 controls the above-described three trim motors TX ₁ and TX ₂ when appropriate so as not to affect the exposure. , TY are used to return the counter mass 18 to a predetermined reference position.

In the present embodiment, with the movement of the reticle stage RST, vibrations in the Z-axis direction are generated in the Y-axis linear motors 136 ₁ , 136 ₂ , 138 ₁ , 138 ₂ and the voice coil motor 30, and are generated in the counter mass 18. In this embodiment, since the self-weight canceller 120 described above is provided on the bottom surface of the counter mass 18, the self-weight canceller 120 serves as a low-pass filter, and vibration (particularly high frequency) It is possible to suppress the transmission of vibration) to the reticle stage surface plate 16, and thus to the lens barrel surface plate 238 and the projection optical system PL as much as possible.

Further, in order for the counter mass 18 to maintain the predetermined Z position and posture, the main controller 70 uses the Z voice coil motor VZ ₁ based on the measurement value of the laser displacement meter 110 (see FIG. 6B). The position of the counter mass 18 in the Z-axis direction and the orientation in the θx and θy directions are controlled using ˜VZ ₃ . That is, at least a part of the positioning device of the present invention is configured by the laser displacement meter 110 and the Z voice coil motors VZ _{1 to} VZ ₃ of the present embodiment.

In this case, since the trim motors TX ₁ , TX ₂ , TY and the Z voice coil motors VZ _{1 to} VZ ₃ are supported by a support base 66 that is vibrationally separated from the body BD, they are generated in the stator of each motor. The generated vibration is released to the floor surface F, and transmission of the vibration to the projection optical system PL or the like is prevented.

  As described above in detail, according to the reticle stage device 12 of the present embodiment, the counter mass 18 that moves in the direction opposite to the reticle stage RST due to the reaction force caused by the movement of the reticle stage RST in the Y-axis direction is the air pad. Since the self-weight support mechanism 127 for supporting the self-weight of the counter mass 18 is provided between the air pad portion 128 and the counter mass 18, the reticle stage is moved by moving the reticle stage in the Y-axis direction. It is possible to suppress the generated reaction force from causing the reticle stage surface plate 16 to vibrate or cause a change in posture as much as possible, and to support the self-weight even when the counter mass 18 is vibrated in a direction perpendicular to the moving surface. The mechanism 127 can suppress the transmission of the vibration to the reticle stage surface plate 16 as much as possible.

Further, according to the reticle stage device 12 of the present embodiment, the counter stage 18 includes a counter mass 18 that moves in the opposite direction to the reticle stage due to a reaction force caused by the movement of the reticle stage RST in the Y-axis direction. Positioning in the Z-axis direction by the voice coil motors VZ _{1 to} VZ ₃ , the reaction force generated by the movement of the stage in the Y-axis direction can be a cause of vibration of the reticle stage surface plate 16 and a change in posture as much as possible. In addition to being able to suppress, it is possible to position the counter mass 18 in the Z-axis direction and in the tilt direction with respect to the horizontal plane.

  Also, according to the exposure apparatus 10 of the present embodiment, the reticle stage apparatus 12 of the present embodiment in which the reaction force due to the movement of the reticle stage RST is suppressed as much as possible to cause the vibration factor and the attitude change of the reticle stage surface plate 16. Therefore, highly accurate exposure can be realized.

In this case, even if the reticle stage surface plate 16 is supported on the lens barrel surface plate 238 as in the present embodiment, vibrations occur in the projection optical system PL via the lens tube surface plate 238. Since this is not transmitted, it is possible to realize highly accurate exposure from this point. Even when the counter mass 18 is supported by a support member separated from the reticle stage surface plate 16, the above-described self-weight support mechanism 127 and the Z voice coil motors VZ _{1 to} VZ ₃ may be used as appropriate.

  Furthermore, in the above-described embodiment, the case where the stage apparatus of the present invention is employed in a reticle stage apparatus including a reticle stage that is movable while holding a reticle has been described, but the present invention is not limited thereto, It can also be employed in a wafer stage device. Further, it can be employed in both the reticle stage apparatus and the wafer stage apparatus. As a wafer stage in this case, a wafer stage described in Japanese Patent Application No. 2004-164841 previously filed by the applicant of the present application may be used.

  In the above-described embodiment, the positive pressure space is formed by a combination of the piston part 126 and the cylinder part 122 constituting at least a part of the urging means as shown in FIG. However, the present invention is not limited to this. For example, a configuration in which a positive pressure space is formed by the bellows 112 as shown in FIG. 7 may be adopted. The positive pressure space in the bellows 112 is supplied with a gas from a gas supply device (not shown) via an air supply pipe 132 connected to the bellows 112.

  In the above embodiment, the air pad portion adopts a configuration that uses the force when the gas in the positive pressure space flows out. However, the present invention is not limited to this, and is, for example, usually commercially available. It is also possible to adopt an air pad as it is. In this case, gas is supplied to the air pad using piping or the like different from the positive pressure space.

  In the above embodiment, the measurement of the position of the counter mass 18 in the Z direction and the tilt direction in the horizontal plane is performed using the laser displacement meter 110, but the same laser interference as that used for the stage position measurement is used. It is possible to employ a meter and other various measuring devices.

  In the above embodiment, the case where both the self-weight canceller and the Z voice coil motor are employed for the counter mass 18 has been described. However, the present invention is not limited to this, and only one of them may be employed.

  In the above-described embodiment, the case where eight self-weight cancellers 120 are provided on the bottom surface side of the counter mass 18 is described. However, the present invention is not limited to this, and it is only necessary to have one or more self-weight cancellers 120. In this case, it is desirable that the total supporting force of one or more self-weight cancellers acts on the center of gravity of the counter mass 18. When one self-weight canceller is used, the counter mass made of the frame member as in the above embodiment is not used as the counter mass, and the reticle stage RST is driven in the Y-axis direction. A bar-shaped counter mass that can move in the direction opposite to the reticle stage RST is employed, and one self-weight canceller may be disposed at the center of gravity of the bar-shaped counter mass.

  In the above embodiment, the surface plate supply type static air bearing is used, but the present invention is not limited to this, and a commercially available air pad may be provided on the reticle stage RST. The reticle stage RST may be provided with a self-weight canceller configured to include the same air pad portion and self-weight support mechanism as in the above embodiment.

  Further, as reticle stage RST, a coarse / fine movement structure reticle stage having a coarse reticle movement stage capable of coarse movement in the Y-axis direction and a fine reticle movement stage capable of being finely driven in the X-axis direction on the reticle coarse movement stage is employed. In this case, a self-weight canceller similar to that in the above embodiment may be provided on the reticle coarse movement stage side.

  In the above embodiment, the case where two trim motors for adjusting the position of the counter mass 18 are provided for adjusting the position in the X-axis direction and one for adjusting the position in the Y-axis direction has been described. However, the present invention is not limited to this, and one for adjusting the position in the X-axis direction and two for adjusting the position in the Y-axis direction may be provided. Two or more trim motors for position adjustment in both directions may be provided. In the present embodiment, the case where the counter mass 18 is provided with three Z voice coil motors has been described. However, the present invention is not limited to this. One or more coil motors may be provided. Of course, four or more Z voice coil motors may be provided.

  In the above embodiment, the drive mechanism for driving the reticle stage RST in the Y-axis direction is constituted by a pair of left and right Y-axis linear motors, and the drive mechanism for driving the reticle stage RST in the X-axis direction is constituted by a voice coil motor. Of course, the present invention is not limited to this.

  Moreover, although the said embodiment demonstrated when the cavity part CH was formed in the mirror part 24B, it is not necessary to form a hollow part in the mirror part 24B. Moreover, although the mirror part 24B and the plate-like part 24A have been described as being integrally formed, the present invention is not limited thereto, and the mirror part 24B and the plate-like part 24A may be configured by separate members and connected between each part by an elastic hinge.

  In the above embodiment, reticle stage RST is configured by integral molding. However, the present invention is not limited to this, and each unit may be configured separately.

  In the above embodiment, the case where the second column 234 is supported on the lens barrel surface plate 238 (on the first column 232) has been described, but the present invention is not limited to this, and the second column 234 is not limited thereto. The first column 232 and the second column 234 may be separated in a vibrational manner so that the first column 232 and the second column 234 are supported directly from above the floor surface F. Even in this case, since the vibration is not transmitted to the reticle stage surface plate 16 by employing the reticle stage device of the present embodiment, it is possible to realize highly accurate driving of the reticle stage RST.

《Reference example》
FIG. 8 is a perspective view showing a reticle stage device 12 ′ as a reference example of the embodiment. 8 differs from the reticle stage apparatus 12 in FIG. 2 in that a dynamic damper 350 is provided on a part of the counter mass 18 ′. The self-weight canceller 120 and the Z voice coil motors VZ _{1 to} VZ ₃ employed in the above embodiment are not provided, and the counter mass 18 ′ is levitated and supported on the reticle stage surface plate 16 by a commercially available air pad or the like. It shall be.

  A plurality of the dynamic dampers 350 are arranged along the Y-axis direction on the + X side side and the −X side side of the counter mass 18 ′. As shown in the perspective view of FIG. 9, each dynamic damper 350 includes a base 351, vibration-proof members (elastic bodies) 352a and 352b, and mass bodies 353a and 353b.

  The base 351 has a substantially U-shape (U-shape) when viewed from the + Y side (or -Y side), which includes a flat plate portion having an XY plane and two leg portions extending in the Z-axis direction. The two legs are fixed to the upper end surface of the counter mass 18 ′ (see FIG. 8).

  The vibration isolation members 352a and 352b are respectively attached to the upper and lower surfaces of the flat plate portion of the base portion 351. The anti-vibration members 352a and 352b are rectangular in plan view (viewed from above) and are relatively thick in the Z-axis direction and have a uniform thickness. As the vibration isolation members 352a and 352b, a material having a relatively large viscosity coefficient, such as rubber, can be used.

  The mass bodies 353a and 353b are attached to the top and bottom of the flat plate portion of the base portion 351 with the vibration-proof members 352a and 352b interposed therebetween, respectively. The mass bodies 353a and 353b are formed of a plate-like member having a rectangular shape in plan view (viewed from above) and a uniform thickness in the Z direction. Four spacers 354 that connect both of the mass bodies 353a and 353b are installed, and the mass body 355 includes the mass bodies 353a and 353b and the spacer 354. The base 351 is formed with a notch 351c so as not to interfere with the spacer 354.

  In the dynamic damper 350 configured as described above, the natural frequency of vibration in the Z-axis direction of the drive system composed of the vibration isolation members 352a and 352b and the mass portion 355 has a counter mass 18 ′ when the reticle stage RST is driven. Is set to be substantially equal to the frequency of vibration in the Z-axis direction.

Accordingly, when vibration occurs in the counter mass 18 ′ when the reticle stage RST is driven, a vibration system including the vibration isolation members 352a and 352b and the mass portion 355 is excited in the Z-axis direction, and this vibration system is excited. As a result, the vibration energy of the counter mass 18 ′ is absorbed by the dynamic damper 350, and the vibration energy of the counter mass 18 ′ is reduced, thereby suppressing the vibration. In addition, in the present reference example, since the plurality of dynamic dampers 350 are provided within the drive range of the reticle stage RST in the Y-axis direction, the counter regardless of which position of the reticle stage RST is driven in the Y-axis direction. Vibration generated in the mass 18 'can be effectively suppressed. The dynamic damper 350 and the above-described self-weight canceller 120 and Z voice coil motors VZ _{1 to} VZ ₃ may be used in appropriate combination.

  In the above embodiment and the reference example, the case where the stage apparatus according to the present invention is applied to the reticle stage apparatus of the scanning VUV exposure apparatus is described. However, the present invention is not limited to this, and the stage apparatus according to the present invention includes: Mask stage device such as a proximity type aligner mask stage device that transfers the mask pattern to the substrate by closely contacting the mask and the substrate without using a projection optical system, or a batch transfer type scanning exposure device for liquid crystal It can be suitably applied to a plate stage device or the like. In addition, the stage apparatus according to the present invention can also be applied to an EBPS electron beam exposure apparatus and an exposure apparatus such as a so-called EUVL that uses light in a soft X-ray region having a wavelength of about 5 to 30 nm as exposure light.

  In addition, the moving body on which the object (sample) is placed can be driven in a predetermined first axis direction, and the apparatus needs to be finely driven in the second axis direction and the rotation direction orthogonal to the first axis direction. For example, the stage apparatus according to the present invention can be suitably applied not only to the exposure apparatus but also to other precision machines.

  In the embodiment and the reference example, the case where the reduction system is used as the projection optical system PL has been described. However, the projection optical system may be an equal magnification system or an enlargement system. Further, a so-called catadioptric system (catadioptric system) or a reflective system composed only of a reflective optical element may be used.

  In the above-described embodiment and reference examples, the case where the present invention is applied to an exposure apparatus for manufacturing a semiconductor has been described. However, the present invention is not limited thereto. For example, a liquid crystal that transfers a liquid crystal display element pattern to a square glass plate. The present invention can be widely applied to an exposure apparatus for manufacturing a thin film magnetic head, an imaging device, an organic EL, a micromachine, a DNA chip, and the like.

  Further, in order to manufacture reticles or masks used in not only microdevices such as semiconductor elements but also light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates or silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern.

  Note that the present invention may be applied to an immersion exposure apparatus disclosed in, for example, International Publication WO99 / 49504 and the like in which a liquid is filled between the projection optical system PL and the wafer.

  As described above, the stage apparatus of the present invention is suitable for driving a stage that can move in one axial direction. The exposure apparatus of the present invention is suitable for exposing a mask pattern placed on a mask stage onto a substrate placed on a substrate stage.

It is a figure which shows schematically the structure of the exposure apparatus which concerns on one Embodiment. It is a perspective view which shows the reticle stage apparatus of FIG. FIG. 3 is an exploded perspective view of the reticle stage device of FIG. 2. FIG. 4A is a perspective view of the reticle stage, and FIG. 4B is a cross-sectional view of the reticle stage. It is a figure for demonstrating the lower surface side of a counter mass. FIG. 6A is a perspective view illustrating a part of the self-weight canceller, and FIG. 6B is a vertical cross-sectional view of the self-weight canceller. It is a modification of a self-weight canceller. It is a perspective view of the reticle stage which concerns on a reference example. It is a perspective view which takes out and expands the dynamic damper of FIG.

Explanation of symbols

10 ... exposure apparatus, 12 ... reticle stage apparatus (stage apparatus), 16 ... reticle stage surface plate (base member), 18 ... countermass, 61a ₁ ~61a ₃ ... mover, 61b ₁ ~61b ₃ ... stator, 110 ... Laser displacement meter (detection device, part of positioning device), 122 ... cylinder part (part of biasing device), 126 ... piston part (part of biasing device), 127 ... self-weight support mechanism, 128 ... air pad Part (bearing), 132... Air supply pipe (part of the biasing device), R... Reticle (mask), RST... Reticle stage (stage, mask stage), VZ _{1 to} VZ ₃ . Part of positioning device), W ... wafer (substrate), WST ... wafer stage (substrate stage).

Claims (13)

A stage supported by a base member having a moving surface and movable in at least one axial direction within the moving surface;
A counter mass that includes a bearing and moves in a direction opposite to the stage by a reaction force caused by movement of the stage in one axial direction;
A stage apparatus comprising: a self-weight support mechanism provided between the bearing and the counter mass and supporting a self-weight of the counter mass. Including one or more self-weight support mechanisms;
The stage apparatus according to claim 1, wherein a total supporting force of the one or more self-weight supporting mechanisms acts on a center of gravity of the counter mass.   The self-weight support mechanism has a biasing device that biases the counter mass in a direction perpendicular to the moving surface by using a positive pressure gas. Stage device.   The stage apparatus according to claim 1, wherein the self-weight support mechanism includes a bellows and a gas supply device that supplies a positive pressure gas to the bellows.   The stage apparatus according to any one of claims 1 to 4, further comprising a driving mechanism that applies a driving force in a direction orthogonal to the moving surface to the counter mass.   The stage according to claim 5, wherein the drive mechanism includes a mover connected to the counter mass, and a stator installed so as to be separated from the base member in a vibrational manner. apparatus.   The stage device according to any one of claims 1 to 6, wherein the bearing is an air bearing. A bearing for movably supporting the stage on the base member;
The stage apparatus according to claim 1, further comprising a self-weight support mechanism provided between the bearing and the stage and supporting a self-weight of the stage. A stage supported by a base member having a moving surface and movable in at least one axial direction within the moving surface;
A counter mass that moves in a direction opposite to the stage by a reaction force caused by movement of the stage in one axial direction;
And a positioning device for positioning the counter mass in a direction orthogonal to the moving surface. The positioning device has a drive device that drives the counter mass in a direction orthogonal to the moving surface,
10. The stage according to claim 9, wherein the driving device includes a mover connected to the counter mass, and a stator installed so as to be vibrationally separated from the base member. apparatus.   The stage device according to claim 10, wherein the driving device drives the counter mass at at least three locations that are not in a straight line.   The said positioning apparatus has a detection apparatus which detects the position of at least one of the direction orthogonal to the said movement surface of the said counter mass, and the inclination amount with respect to the said movement surface. The stage apparatus as described in any one of. An exposure apparatus that exposes a pattern of a mask placed on a mask stage to a substrate placed on a substrate stage,
An exposure apparatus comprising the stage apparatus according to claim 1, wherein one of the mask stage and the substrate stage is included as the stage.

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