JP2011182113A - Tuning-fork type bending crystal oscillation element - Google Patents

Tuning-fork type bending crystal oscillation element Download PDF

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JP2011182113A
JP2011182113A JP2010042948A JP2010042948A JP2011182113A JP 2011182113 A JP2011182113 A JP 2011182113A JP 2010042948 A JP2010042948 A JP 2010042948A JP 2010042948 A JP2010042948 A JP 2010042948A JP 2011182113 A JP2011182113 A JP 2011182113A
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arm portion
vibrating arm
electrode
vibrating
base
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JP5465041B2 (en
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Ryota Kawai
良太 河合
Shinichi Morishima
真一 森嶋
Ryoji Matsui
良司 松井
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Kyocera Crystal Device Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To easily form an electrode without short-circuiting an exciting electrode arranged on a side face of a vibration arm part. <P>SOLUTION: This tuning-fork type bending crystal oscillation element is equipped with: a base part; a pair of two vibration arm parts extended from the base part; an inner arm part located between the vibration arm parts and extended from the base part; and electrode film cutting arm parts formed on the respective side faces of the inner arm part facing the vibration arm parts by being spaced from the inner arm part at predetermined distances, and the element is structured in the state where: electrode films are formed on side faces of the inner arm part facing the vibration arm parts, and on side faces of the electrode film cutting arm parts facing the vibration arm parts; and the electrode films formed on the side faces of the inner arm part facing the vibration arm parts, and the electrode films formed on the side faces of the electrode film cutting arm parts facing the vibration arm parts, are cut. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、電子機器に用いられる音叉型屈曲水晶振動素子に関する。   The present invention relates to a tuning fork-type bending crystal resonator element used in electronic equipment.

従来、コンピュータ,携帯電話又は小型情報機器等の電子機器には、電子部品の一つとして圧電振動子又は圧電発振器が搭載されている。この圧電振動子又は圧電発振器は、基準信号源やクロック信号源として用いられる。又、圧電振動子や圧電発振器は、その内部に水晶からなる圧電振動素子が搭載されている。
以下、圧電材料に水晶を用いた圧電振動素子について説明する。
図3に示すように、圧電振動素子の一つである音叉型屈曲水晶振動素子400は、水晶振動片410と、その水晶振動片410の表面に設けられた励振用電極と接続用電極と周波数調整用金属膜と導配線パターンとにより概略構成される。
Conventionally, a piezoelectric vibrator or a piezoelectric oscillator is mounted as an electronic component in an electronic device such as a computer, a mobile phone, or a small information device. This piezoelectric vibrator or piezoelectric oscillator is used as a reference signal source or a clock signal source. In addition, piezoelectric vibrators and piezoelectric oscillators are equipped with a piezoelectric vibration element made of quartz.
Hereinafter, a piezoelectric vibration element using quartz as a piezoelectric material will be described.
As shown in FIG. 3, a tuning-fork type bending crystal resonator element 400, which is one of piezoelectric resonator elements, includes a crystal resonator element 410, an excitation electrode, a connection electrode, and a frequency provided on the surface of the crystal resonator element 410. It is roughly constituted by an adjustment metal film and a conductive wiring pattern.

水晶振動片410は、音叉形状となっており、基部411と基部411から延設する2つ一対の振動腕部412と、により概略構成される。この振動腕部412には、対向する平面同士に同極となる励振用電極421が設けられている。
また、基部411は、平面視略四角形の平板となっている。振動腕部412は、第一の振動腕部412a及び第二の振動腕部412bとから成る。第一の振動腕部412a及び第二の振動腕部412bは、基部411の一辺から同一方向に延設されており、第一の振動腕部412a及び第二の振動腕部412bの長さ方向にはそれぞれ溝部GLが設けられている。溝部GLは、第一の振動腕部412a及び第二の振動腕部412bの両主面に、基部411との境界部分から振動腕部412の先端に向って、振動腕部412の長さ方向と平行に所定の長さで2本設けられている。このような水晶振動片410は、基部411と振動腕部412とが一体となって音叉形状を成しており、フォトリソグラフィ技術と化学エッチング技術、成膜技術により製造される。
The quartz crystal vibrating piece 410 has a tuning fork shape, and is roughly constituted by a base portion 411 and two pairs of vibrating arm portions 412 extending from the base portion 411. The vibrating arm portion 412 is provided with an excitation electrode 421 having the same polarity on opposing planes.
The base 411 is a substantially rectangular flat plate in plan view. The vibrating arm portion 412 includes a first vibrating arm portion 412a and a second vibrating arm portion 412b. The first vibrating arm portion 412a and the second vibrating arm portion 412b are extended in the same direction from one side of the base portion 411, and the length direction of the first vibrating arm portion 412a and the second vibrating arm portion 412b. Each is provided with a groove GL. The groove portion GL is formed on both main surfaces of the first vibrating arm portion 412a and the second vibrating arm portion 412b from the boundary portion with the base portion 411 toward the tip of the vibrating arm portion 412 in the longitudinal direction. Are provided in parallel with each other at a predetermined length. In such a quartz crystal vibrating piece 410, the base portion 411 and the vibrating arm portion 412 are integrally formed into a tuning fork shape, and is manufactured by a photolithography technique, a chemical etching technique, and a film forming technique.

第一の振動腕部412aに設けられる電極は、励振用電極421と周波数調整用金属膜423とから成る。励振用電極421は、第一の振動腕部412aの溝部GL内表面を含む一方の主面と、第一の振動腕部412aの溝部GL内表面を含む他方の主面に設けられている。また、励振用電極421は、第二の振動腕部412bに対向する第一の振動腕部412aの内側側面と、この側面に対向する第一の振動腕部412aの外側側面とに異極となるように設けられている。周波数調整用金属膜423は、第一の振動腕部412aの先端部の両主面に設けられている。   The electrode provided on the first vibrating arm portion 412 a is composed of an excitation electrode 421 and a frequency adjusting metal film 423. The excitation electrode 421 is provided on one main surface including the inner surface of the groove portion GL of the first vibrating arm portion 412a and the other main surface including the inner surface of the groove portion GL of the first vibrating arm portion 412a. The excitation electrode 421 has a different polarity between the inner side surface of the first vibrating arm portion 412a facing the second vibrating arm portion 412b and the outer side surface of the first vibrating arm portion 412a facing the side surface. It is provided to become. The frequency adjusting metal film 423 is provided on both main surfaces of the distal end portion of the first vibrating arm portion 412a.

第二の振動腕部412bに設けられる電極は、励振用電極421と周波数調整用金属膜423とから成る。この励振用電極421は、第二の振動腕部412bの溝部GL内表面を含む一方の主面と、第二の振動腕部412bの溝部GL内表面を含む他方の主面に設けられている。また、励振用電極421は、第一の振動腕部412aに対向する第二の振動腕部412bの内側側面と、この側面に対向する第二の振動腕部412bの外側側面とに異極となるように設けられている。周波数調整用金属膜423は、第二の振動腕部412aの先端部の両主面に設けられている。   The electrode provided on the second vibrating arm portion 412 b is composed of an excitation electrode 421 and a frequency adjusting metal film 423. The excitation electrode 421 is provided on one main surface including the inner surface of the groove portion GL of the second vibrating arm portion 412b and the other main surface including the inner surface of the groove portion GL of the second vibrating arm portion 412b. . The excitation electrode 421 has a different polarity between the inner side surface of the second vibrating arm portion 412b facing the first vibrating arm portion 412a and the outer side surface of the second vibrating arm portion 412b facing the side surface. It is provided to become. The frequency adjusting metal film 423 is provided on both main surfaces of the distal end portion of the second vibrating arm portion 412a.

基部411は、2つ一対の接続用電極422が設けられる。一方の接続用電極422は、基部411の振動腕部412が形成されている辺とは反対側にあたる辺の一方の角端部及び基部411の一方の主面から他方の主面にわたって設けられている。また、他方の接続用電極422は、基部411の振動腕部412が形成されている辺とは反対側にあたる辺の他方の角端部及び基部411の一方の主面から他方の主面にわたって設けられている。
また、基部411及び振動腕部412には、所定の電極間を電気的に接続させるための導配線パターン424が設けられている。
The base 411 is provided with two pairs of connection electrodes 422. One connection electrode 422 is provided from one corner end of the side opposite to the side where the vibrating arm portion 412 of the base 411 is formed and from one main surface of the base 411 to the other main surface. Yes. The other connection electrode 422 is provided from the other corner end of the side opposite to the side where the vibrating arm portion 412 of the base 411 is formed and from one main surface of the base 411 to the other main surface. It has been.
The base portion 411 and the vibrating arm portion 412 are provided with a conductive wiring pattern 424 for electrically connecting predetermined electrodes.

一方の接続用電極422は、基部411の一方の主面に設けられた導配線パターン424により、第一の振動腕部412aの一方の主面に設けられた励振用電極421と電気的に接続し、かつ、第二の振動腕部412bの外側側面に設けられた励振用電極421と電気的に接続している。また、第二の振動腕部412bの外側側面に設けられた励振用電極421は、第二の振動腕部412bの内側側面に設けられた励振用電極421と電気的に接続している。更に、第一の振動腕部412の一方の主面に設けられた励振用電極421は、第一の振動腕部412の内側側面に設けられた導配線パターン424により、第一の振動腕部412aの他方の主面に設けられた励振用電極421と電気的に接続されている。   One connection electrode 422 is electrically connected to an excitation electrode 421 provided on one main surface of the first vibrating arm portion 412a by a conductive wiring pattern 424 provided on one main surface of the base 411. In addition, it is electrically connected to the excitation electrode 421 provided on the outer side surface of the second vibrating arm portion 412b. In addition, the excitation electrode 421 provided on the outer side surface of the second vibrating arm portion 412b is electrically connected to the excitation electrode 421 provided on the inner side surface of the second vibrating arm portion 412b. Furthermore, the excitation electrode 421 provided on one main surface of the first vibrating arm portion 412 is connected to the first vibrating arm portion by the conductive wiring pattern 424 provided on the inner side surface of the first vibrating arm portion 412. It is electrically connected to an excitation electrode 421 provided on the other main surface of 412a.

他方の接続用電極422は、基部411の他方の主面に設けられた導配線パターンにより、第二の振動腕部412bの他方の主面に設けられた励振用電極421と電気的に接続し、かつ、第一の振動腕部412aの外側側面に設けられた励振用電極421と電気的に接続している。また、第一の振動腕部412aの外側側面に設けられた励振用電極421は、第一の振動腕部412aの内側側面に設けられた励振用電極421と電気的に接続している。更に、第二の振動腕部412aの他方の主面に設けられた励振用電極421は、第二の振動腕部412bの内側側面に設けられた導配線パターン424により、第一の振動腕部412aの一方の主面に設けられた励振用電極421aと電気的に接続されている。   The other connection electrode 422 is electrically connected to the excitation electrode 421 provided on the other main surface of the second vibrating arm portion 412b by a conductive wiring pattern provided on the other main surface of the base portion 411. And, it is electrically connected to the excitation electrode 421 provided on the outer side surface of the first vibrating arm portion 412a. In addition, the excitation electrode 421 provided on the outer side surface of the first vibrating arm portion 412a is electrically connected to the excitation electrode 421 provided on the inner side surface of the first vibrating arm portion 412a. Further, the excitation electrode 421 provided on the other main surface of the second vibrating arm portion 412a is connected to the first vibrating arm portion by the conductive wiring pattern 424 provided on the inner side surface of the second vibrating arm portion 412b. It is electrically connected to an excitation electrode 421a provided on one main surface of 412a.

これら励振用電極421、接続用電極422、周波数調整用金属膜423a及び導配線パターン424aは、スパッタ技術、蒸着技術、フォトリソグラフィ技術により形成され、Cr層の上にAu層が設けられた積層構造となっている。   The excitation electrode 421, the connection electrode 422, the frequency adjusting metal film 423a, and the conductive wiring pattern 424a are formed by sputtering, vapor deposition, or photolithography, and a laminated structure in which an Au layer is provided on a Cr layer. It has become.

この水晶振動片410を振動させる場合、接続用電極422に交番電圧を印加する。印加後のある電気的状態を瞬間的にとらえると、第一の振動腕部412aの両主面に設けられた励振用電極421はプラス電位となり、両側面に設けられた励振用電極421はマイナス電位となり、プラスからマイナスに電界が生じる。このときの第二の振動腕部412bの両主面の励振用電極421はマイナス電位となり、両側面に設けられた励振用電極421はプラス電位という第一の振動腕部412の励振用電極421に生じた極性とは反対の極性となり、プラスからマイナスに電界が生じる。この交番電圧により生じた電界によって、第一の振動腕部412a及び第二の振動腕部412bに伸縮現象が生じ、振動腕部412に設定した共振周波数の屈曲振動モードとなる。尚、この共振周波数は、水晶振動片410に設けられた周波数調整用金属膜423を構成する金属の量を増減させて調整することができる(例えば、特許文献1又は2参照)。   When the crystal vibrating piece 410 is vibrated, an alternating voltage is applied to the connection electrode 422. When an electrical state after application is instantaneously captured, the excitation electrodes 421 provided on both main surfaces of the first vibrating arm portion 412a have a positive potential, and the excitation electrodes 421 provided on both side surfaces are negative. An electric field is generated from positive to negative. At this time, the excitation electrodes 421 on both main surfaces of the second vibrating arm portion 412b have a negative potential, and the excitation electrodes 421 provided on both side surfaces have a positive potential, the excitation electrodes 421 of the first vibrating arm portion 412. The polarity is opposite to the polarity generated in, and an electric field is generated from plus to minus. The electric field generated by the alternating voltage causes an expansion / contraction phenomenon in the first vibrating arm portion 412a and the second vibrating arm portion 412b, and a bending vibration mode having a resonance frequency set in the vibrating arm portion 412 is set. The resonance frequency can be adjusted by increasing or decreasing the amount of metal constituting the frequency adjusting metal film 423 provided on the crystal vibrating piece 410 (see, for example, Patent Document 1 or 2).

また、このような音叉型屈曲水晶振動素子400は、音叉型に水晶振動片410を形成した後に電極の形成が行われる。
例えば、水晶ウェハ(図示せず)の表裏に例えば、Cr、Cr+Auなどの耐食膜(図示せず)をスパッタリングにて成膜する。
Further, in such a tuning fork type bending quartz crystal vibrating element 400, electrodes are formed after the crystal vibrating piece 410 is formed in a tuning fork type.
For example, a corrosion resistant film (not shown) such as Cr or Cr + Au is formed on the front and back of a quartz wafer (not shown) by sputtering.

次に耐食膜上に感光性レジスト(ポジ型)を両面に形成し、乾燥後表裏の両面に音叉形状の耐食膜が残るように露光、現像、乾燥(以下パターン化)と音叉形状以外の耐食膜のエッチングを行う。   Next, a photosensitive resist (positive type) is formed on both sides of the anticorrosion film, and after drying, exposure, development, drying (patterning) and anticorrosion other than the tuning fork shape so that the anticorrosion film on the front and back sides remains. Etch the film.

次に前記表裏の耐食膜上に電極の形状を決定するために感光性レジスト(ポジ型)をパターン化する。ここで、この感光性レジストの一部は、振動腕部と基部との接続部分を覆うように設けられている。   Next, a photosensitive resist (positive type) is patterned on the front and back corrosion-resistant films in order to determine the shape of the electrodes. Here, a part of the photosensitive resist is provided so as to cover a connection portion between the vibrating arm portion and the base portion.

次に露出する水晶部分をエッチングする。このとき、溝部の形状と水晶振動片410の形状とが同時に形成される。なお、振動腕部412と基部411との接続部分を覆う感光性レジストは、エッチングされることなく残る。そのため、この感光性レジストを残した状態で、基部411と振動腕部412とが形成される。したがって、この感光性レジストは、2つの振動腕部412を跨いだ状態で残されている。   Next, the exposed crystal portion is etched. At this time, the shape of the groove and the shape of the crystal vibrating piece 410 are formed simultaneously. Note that the photosensitive resist covering the connection portion between the vibrating arm portion 412 and the base portion 411 remains without being etched. Therefore, the base portion 411 and the vibrating arm portion 412 are formed with the photosensitive resist remaining. Therefore, this photosensitive resist is left in a state of straddling the two vibrating arm portions 412.

次に裏面に露出した耐食膜をエッチングし水晶表面を得る。次に全面に電極膜を蒸着技術により形成する。このとき、振動腕部412と基部411との接続部分を覆う感光性レジストにより、振動腕部412が接続している側の基部411の側面に電極膜が形成されずに、振動腕部412の側面のみに電極膜が形成される。
次に表裏に形成した感光性レジストとその上に形成された電極膜を剥離する。これは感光性レジストを溶解する液に浸すことで容易に除去できる。しかし、その下部に有する耐食膜は残る。次に前記の残りである耐食膜をエッチングする。
このようにして、水晶振動片410に電極が形成される(例えば、特許文献1参照)。
Next, the corrosion-resistant film exposed on the back surface is etched to obtain a crystal surface. Next, an electrode film is formed on the entire surface by a vapor deposition technique. At this time, an electrode film is not formed on the side surface of the base portion 411 to which the vibrating arm portion 412 is connected by the photosensitive resist that covers the connection portion between the vibrating arm portion 412 and the base portion 411, and the vibrating arm portion 412 An electrode film is formed only on the side surface.
Next, the photosensitive resist formed on the front and back and the electrode film formed thereon are peeled off. This can be easily removed by immersing it in a solution for dissolving the photosensitive resist. However, the anticorrosion film that remains in the lower portion remains. Next, the remaining corrosion-resistant film is etched.
In this way, electrodes are formed on the crystal vibrating piece 410 (see, for example, Patent Document 1).

なお、音叉型屈曲水晶振動素子の他の構造として、この音叉型屈曲水晶振動素子に用いられる圧電片が、平面視略四角形の平板である基部と、この基部の一辺から同一方向に延出した振動腕部と、さらにこの基部から延出しつつ2つの振動腕部の間に設けられる支持腕部とにより構成される構造が提案されている(例えば、特許文献3参照)。
このような音叉型屈曲振動素子の場合、支持腕部に2つ一対の接続用電極が設けられる。これにより、支持腕部には、
2つ一対の接続用電極と励振用電極とを接続するために、引回しのための導配線パターンが設けられる。
In addition, as another structure of the tuning fork type bending crystal resonator element, a piezoelectric piece used in the tuning fork type bending crystal resonator element is extended in the same direction from one side of this base portion and a base portion that is a substantially rectangular flat plate in plan view. There has been proposed a structure including a vibrating arm portion and a support arm portion provided between the two vibrating arm portions while extending from the base portion (see, for example, Patent Document 3).
In the case of such a tuning fork type bending vibration element, two pairs of connection electrodes are provided on the support arm portion. This allows the support arm to
In order to connect the pair of connection electrodes and the excitation electrode, a conductive wiring pattern for routing is provided.

特開2007−329879号公報JP 2007-329879 A 特開2004−248237号公報JP 2004-248237 A 特開2006−345519号公報JP 2006-345519 A

しかしながら、このような音叉型屈曲水晶振動素子400は、電極を形成する際、蒸着技術を用いると、溝部などの狭い空間に金属材料が入り込みにくいため電極膜が形成されない場合がある。
これを解決するために、蒸着技術に代えてスパッタ技術を用いて電極を形成する場合、振動腕部412と基部411との接続部分を覆う感光性レジストがマスクの役割を果たすことができず、振動腕部412の側面と基部411の側面とに電極膜が形成されてしまい、励振用電極421が振動腕部412aと振動腕部412bとが向かい合う側面部の電極間においてショートした状態で形成されてしまうことがあった。
また、振動腕部の間に支持腕部が設けられた構造の音叉型屈曲振動素子では、支持腕部に2つ一対の接続用電極が設けられるため、導電性接着剤や金属バンプ等の接合材で音叉型屈曲振動素子の気密封止に用いるパッケージへの搭載が、2つ一対の接続用電極のみとなる。
したがって、支持腕部に設けられる2つ一対の接続用電極の表面積が、基部に設けた場合の表面積と比較して小さくなり、搭載に用いる導電性接着剤や金属バンプ等の接合材の量が少なくなる。これにより、一対の接続用電極が設けられた支持腕部を有する音叉型屈曲振動素子は、パッケージと蓋とで気密封止された後において落下衝撃に耐えられず、接合材がパッケージから剥離するという恐れがあった。
However, in such a tuning fork-type bending crystal resonator element 400, when an electrode is formed, if an evaporation technique is used, an electrode film may not be formed because a metal material hardly enters a narrow space such as a groove.
In order to solve this, when forming an electrode using a sputtering technique instead of the vapor deposition technique, the photosensitive resist covering the connection portion between the vibrating arm portion 412 and the base portion 411 cannot serve as a mask, An electrode film is formed on the side surface of the vibrating arm portion 412 and the side surface of the base portion 411, and the excitation electrode 421 is formed in a short state between the electrodes on the side surface where the vibrating arm portion 412a and the vibrating arm portion 412b face each other. There was a case.
In addition, in a tuning fork type bending vibration element having a structure in which a support arm is provided between the vibrating arms, two pairs of connection electrodes are provided on the support arm, so that bonding of a conductive adhesive, a metal bump or the like is possible. The mounting of the tuning fork type bending vibration element on the package used for hermetic sealing with the material is only two pairs of connection electrodes.
Therefore, the surface area of the pair of connection electrodes provided on the support arm portion is smaller than the surface area when the connection electrode is provided on the base portion, and the amount of bonding material such as a conductive adhesive or metal bump used for mounting is reduced. Less. As a result, the tuning fork-type bending vibration element having a support arm portion provided with a pair of connection electrodes cannot withstand a drop impact after being hermetically sealed between the package and the lid, and the bonding material peels from the package. There was a fear.

そこで、本発明では、前記した問題を解決し、振動腕部の側面に設けられる励振用電極がショートするのを防ぐ音叉型屈曲水晶振動素子を提供することを課題とする。   Therefore, an object of the present invention is to provide a tuning fork-type bending crystal resonator element that solves the above-described problems and prevents the excitation electrode provided on the side surface of the vibrating arm portion from being short-circuited.

前記課題を解決するため、本発明は、音叉型屈曲水晶振動素子であって、基部と、基部から延設する2つ一対の振動腕部と、前記振動腕部の間であって前記基部から延設する内側腕部と、前記振動腕部と向かい合うそれぞれの前記内側腕部の側面に前記内側腕部から所定の間隔をあけて設けられる電極膜切断用腕部と、を備えて構成されていることを特徴とする。   In order to solve the above-described problem, the present invention provides a tuning fork-type bending quartz crystal resonator element, which includes a base, a pair of vibrating arms extending from the base, and the vibrating arms between the base and the base. An inner arm portion that extends, and an electrode film cutting arm portion that is provided on a side surface of each inner arm portion facing the vibrating arm portion at a predetermined interval from the inner arm portion. It is characterized by being.

また、本発明は、前記一対の振動腕部のそれぞれに、延設方向に沿って溝部が設けられていても良い。   In the present invention, a groove portion may be provided in each of the pair of vibrating arm portions along the extending direction.

また、このような本発明の音叉型屈曲水晶振動素子によれば、電極膜切断用腕部が内側腕部から所定の間隔をあけてその内側腕部に設けられているので、スパッタ技術を用いて電極膜を設けても、電極膜切断用腕部により電極膜が切断されて振動腕部の側面に設けられる励振用電極がショートするのを防ぐことができる。これにより、振動腕部の側面に設けられる励振用電極の形成するのが容易となる。   Further, according to the tuning fork-type bending crystal resonator element of the present invention as described above, the electrode film cutting arm portion is provided on the inner arm portion at a predetermined interval from the inner arm portion. Even if the electrode film is provided, it is possible to prevent the excitation film provided on the side surface of the vibrating arm part from being short-circuited by the electrode film cutting arm part from being short-circuited. Thereby, it becomes easy to form the excitation electrode provided on the side surface of the vibrating arm portion.

また、本発明の音叉型屈曲水晶振動素子が、前記一対の振動腕部のそれぞれに、延設方向に沿って溝部を設けたので、それぞれの振動腕部に生じる電界効率を向上させることができる。   Moreover, since the tuning fork-type bending quartz crystal resonator element according to the present invention is provided with the groove portion along the extending direction in each of the pair of vibrating arm portions, the electric field efficiency generated in each vibrating arm portion can be improved. .

本発明の実施形態に係る音叉型屈曲水晶振動素子の一例を示す斜視図である。It is a perspective view which shows an example of the tuning fork type bending crystal vibration element which concerns on embodiment of this invention. 本発明の実施形態に係る音叉型屈曲水晶振動素子の一例を示す平面図である。It is a top view which shows an example of the tuning fork type bending crystal vibration element which concerns on embodiment of this invention. 従来の音叉型屈曲水晶振動素子の一例を示す斜視図である。It is a perspective view which shows an example of the conventional tuning fork type bending crystal vibration element.

本発明を実施するための最良の形態(以下、「実施形態」という。)について、適宜図面を参照しながら詳細に説明する。なお、各構成要素について、状態をわかりやすくするために、誇張して図示している。なお、音叉型屈曲水晶振動素子の2つの振動腕部が並ぶ方向、つまり基部の幅方向をX軸、振動腕部の長さ方向をY´軸、振動腕部の厚み方向をZ軸とする。   The best mode for carrying out the present invention (hereinafter referred to as “embodiment”) will be described in detail with reference to the drawings as appropriate. Note that each component is exaggerated for easy understanding of the state. The direction in which the two vibrating arms of the tuning-fork-type bending crystal resonator are arranged, that is, the width direction of the base is the X axis, the length direction of the vibrating arm is the Y ′ axis, and the thickness direction of the vibrating arm is the Z axis. .

図1及び図2に示すように、本発明の実施形態に係る音叉型屈曲水晶振動素子100は、水晶振動片110と、その水晶振動片110に設けられた励振用電極121と接続用電極122a,122bと、周波数調整用金属膜123と、導配線パターン124とから主に構成されている。   As shown in FIGS. 1 and 2, a tuning-fork type bending crystal resonator element 100 according to an embodiment of the present invention includes a crystal resonator element 110, an excitation electrode 121 and a connection electrode 122a provided on the crystal resonator element 110. , 122b, a frequency adjusting metal film 123, and a conductive wiring pattern 124.

水晶振動片110は、音叉形状となっており、基部111と基部111から延設する2つ一対の振動腕部112と2本の振動腕部112の間であって基部111から延設する内側腕部113とにより概略構成される。この振動腕部112には、対向する平面同士に同極となる励振用電極121が設けられている。
また、基部111は、平面視略四角形の平板となっている。振動腕部112は、第一の振動腕部112a及び第二の振動腕部112bとから成る。第一の振動腕部112a及び第二の振動腕部112bは、基部111の一辺から同一方向に延設されており、第一の振動腕部112a及び第二の振動腕部112bの長さ方向にそれぞれ溝部GLが設けられている。溝部GLは、第一の振動腕部112a及び第二の振動腕部112bの両主面に、基部111との境界部分から振動腕部112の先端に向って、振動腕部112の長さ方向と平行に所定の長さで例えば2本設けられている。このような水晶振動片110は、基部111と振動腕部112と内側腕部113とが一体となって音叉形状を成しており、フォトリソグラフィ技術と化学エッチング技術、成膜技術により製造される。
The quartz crystal vibrating piece 110 has a tuning fork shape, and is located between the base 111, the pair of two vibrating arms 112 extending from the base 111, and the two vibrating arms 112 and extending from the base 111. The arm portion 113 is generally configured. The vibrating arm portion 112 is provided with excitation electrodes 121 having the same polarity on opposing planes.
The base 111 is a flat plate having a substantially rectangular shape in plan view. The vibrating arm portion 112 includes a first vibrating arm portion 112a and a second vibrating arm portion 112b. The first vibrating arm portion 112a and the second vibrating arm portion 112b extend in the same direction from one side of the base 111, and the length direction of the first vibrating arm portion 112a and the second vibrating arm portion 112b. Each is provided with a groove GL. The groove portion GL is formed on both main surfaces of the first vibrating arm portion 112a and the second vibrating arm portion 112b in the length direction of the vibrating arm portion 112 from the boundary portion with the base 111 toward the tip of the vibrating arm portion 112. For example, two are provided in parallel with each other at a predetermined length. Such a quartz crystal vibrating piece 110 has a base 111, a vibrating arm portion 112, and an inner arm portion 113 integrally formed into a tuning fork shape, and is manufactured by a photolithography technique, a chemical etching technique, and a film forming technique. .

第一の振動腕部112aに設けられる電極は、励振用電極121と周波数調整用金属膜123とから成る。第一の振動腕部112aに設けられる励振用電極121は、第一の振動腕部112aの溝部GL内表面を含む一方の主面と、第一の振動腕部112aの溝部GL内表面を含む他方の主面に設けられている。また、第一の振動腕部112aに設けられる励振用電極121は、第二の振動腕部112bに対向する第一の振動腕部112aの内側側面と、この側面に対向する第一の振動腕部112aの外側側面とに設けられ、第一の振動腕部112aの両主面に設けられる励振用電極121と異極となるように設けられている。第一の振動腕部112aに設けられる周波数調整用金属膜123は、第一の振動腕部112aの先端部の両主面に設けられている。なお、周波数調整用金属膜123は、すくなくとも一方の主面に設ける構成としても良い。   The electrode provided on the first vibrating arm portion 112 a is composed of an excitation electrode 121 and a frequency adjusting metal film 123. The excitation electrode 121 provided on the first vibrating arm portion 112a includes one main surface including the inner surface of the groove portion GL of the first vibrating arm portion 112a and the inner surface of the groove portion GL of the first vibrating arm portion 112a. It is provided on the other main surface. The excitation electrode 121 provided on the first vibrating arm portion 112a includes an inner side surface of the first vibrating arm portion 112a facing the second vibrating arm portion 112b and a first vibrating arm facing the side surface. It is provided on the outer side surface of the portion 112a and is provided so as to have a different polarity from the excitation electrode 121 provided on both main surfaces of the first vibrating arm portion 112a. The frequency adjusting metal film 123 provided on the first vibrating arm portion 112a is provided on both main surfaces of the distal end portion of the first vibrating arm portion 112a. The frequency adjusting metal film 123 may be provided on at least one main surface.

第二の振動腕部112bに設けられる電極は、励振用電極121と周波数調整用金属膜123とから成る。第二の振動腕部112bに設けられる励振用電極121は、第二の振動腕部112bの溝部GL内表面を含む一方の主面と、第二の振動腕部112bの溝部GL内表面を含む他方の主面に設けられている。また、第二の振動腕部112bに設けられる励振用電極121は、第一の振動腕部112aに対向する第二の振動腕部112bの内側側面と、この側面に対向する第二の振動腕部112bの外側側面とに設けられ、第二の振動腕部112bの両主面に設けられる励振用電極121と異極となるように設けられている。第二の振動腕部112bに設けられる周波数調整用金属膜123は、第二の振動腕部112aの先端部の両主面に設けられている。なお、周波数調整用金属膜123は、すくなくとも一方の主面に設ける構成としても良い。   The electrode provided on the second vibrating arm portion 112 b is composed of an excitation electrode 121 and a frequency adjusting metal film 123. The excitation electrode 121 provided on the second vibrating arm portion 112b includes one main surface including the inner surface of the groove portion GL of the second vibrating arm portion 112b and the inner surface of the groove portion GL of the second vibrating arm portion 112b. It is provided on the other main surface. The excitation electrode 121 provided on the second vibrating arm portion 112b includes an inner side surface of the second vibrating arm portion 112b facing the first vibrating arm portion 112a and a second vibrating arm facing the side surface. It is provided on the outer side surface of the portion 112b and is provided so as to have a different polarity from the excitation electrode 121 provided on both main surfaces of the second vibrating arm portion 112b. The frequency adjusting metal film 123 provided on the second vibrating arm portion 112b is provided on both main surfaces of the distal end portion of the second vibrating arm portion 112a. The frequency adjusting metal film 123 may be provided on at least one main surface.

基部111には、接続用電極122a及び122bが設けられる。接続用電極122aは、基部111の振動腕部112が形成されている辺とは反対側にあたる辺の一方の角端部及び基部111の一方の主面から他方の主面にわたって設けられている。また、接続用電極122bは、基部111の振動腕部112が形成されている辺とは反対側にあたる辺の他方の角端部及び基部111の一方の主面から他方の主面にわたって設けられている。
また、基部111及び振動腕部112には、所定の電極間を電気的に接続させるための導配線パターン124が設けられている。
The base 111 is provided with connection electrodes 122a and 122b. The connection electrode 122 a is provided from one corner end of the side opposite to the side where the vibrating arm portion 112 of the base 111 is formed and from one main surface of the base 111 to the other main surface. The connection electrode 122b is provided from the other corner end of the side opposite to the side on which the vibrating arm portion 112 of the base 111 is formed and from one main surface of the base 111 to the other main surface. Yes.
Further, the base portion 111 and the vibrating arm portion 112 are provided with a conductive wiring pattern 124 for electrically connecting predetermined electrodes.

接続用電極122aは、基部111の一方の主面に設けられた導配線パターン124により、第一の振動腕部112aの一方の主面に設けられた励振用電極121と電気的に接続し、かつ、第二の振動腕部112bの外側側面に設けられた励振用電極121と電気的に接続している。また、第二の振動腕部112bの外側側面に設けられた励振用電極121は、第二の振動腕部112bの内側側面に設けられた励振用電極121と電気的に接続している。更に、第一の振動腕部112aの一方の主面に設けられた励振用電極121は、基部111の側面に設けられた導配線パターンにより、第一の振動腕部112aの他方の主面に設けられた励振用電極121と電気的に接続されている。   The connection electrode 122a is electrically connected to the excitation electrode 121 provided on one main surface of the first vibrating arm portion 112a by the conductive wiring pattern 124 provided on one main surface of the base 111, And it is electrically connected to the excitation electrode 121 provided on the outer side surface of the second vibrating arm portion 112b. Further, the excitation electrode 121 provided on the outer side surface of the second vibrating arm portion 112b is electrically connected to the excitation electrode 121 provided on the inner side surface of the second vibrating arm portion 112b. Further, the excitation electrode 121 provided on one main surface of the first vibrating arm portion 112a is formed on the other main surface of the first vibrating arm portion 112a by a conductive wiring pattern provided on the side surface of the base 111. It is electrically connected to the provided excitation electrode 121.

接続用電極122bは、基部111の他方の主面に設けられた導配線パターンにより、第二の振動腕部112bの他方の主面に設けられた励振用電極と電気的に接続し、かつ、第一の振動腕部112aの外側側面に設けられた励振用電極と電気的に接続している。また、第一の振動腕部112aの外側側面に設けられた励振用電極は、第一の振動腕部112aの内側側面に設けられた励振用電極121と電気的に接続している。更に、第二の振動腕部112aの他方の主面に設けられた励振用電極121は、基部111の内側側面に設けられた導配線パターンにより、第二の振動腕部112bの一方の主面に設けられた励振用電極121と電気的に接続されている。   The connection electrode 122b is electrically connected to the excitation electrode provided on the other main surface of the second vibrating arm portion 112b by a conductive wiring pattern provided on the other main surface of the base 111, and It is electrically connected to an excitation electrode provided on the outer side surface of the first vibrating arm portion 112a. In addition, the excitation electrode provided on the outer side surface of the first vibrating arm portion 112a is electrically connected to the excitation electrode 121 provided on the inner side surface of the first vibrating arm portion 112a. Furthermore, the excitation electrode 121 provided on the other main surface of the second vibrating arm portion 112a is connected to one main surface of the second vibrating arm portion 112b by a conductive wiring pattern provided on the inner side surface of the base portion 111. Is electrically connected to the excitation electrode 121 provided on the substrate.

これら励振用電極121、接続用電極122a,122b及び導配線パターン124は、フォトリソグラフィ技術により形成され、Ti層の上にPd又はAu層が設けられた積層構造となっている。   The excitation electrode 121, the connection electrodes 122a and 122b, and the conductive wiring pattern 124 are formed by a photolithography technique and have a laminated structure in which a Pd or Au layer is provided on a Ti layer.

この音叉型の水晶振動片110を振動させる場合、接続用電極122a及び122bに交番電圧を印加する。印加後のある電気的状態を瞬間的にとらえると、第一の振動腕部112aの両主面に設けられた励振用電極121はプラス電位となり、両側面に設けられた励振用電極121はマイナス電位となり、プラスからマイナスに電界が生じる。このときの第二の振動腕部112bの両主面の励振用電極121はマイナス電位となり、両側面に設けられた励振用電極121はプラス電位という第一の振動腕部112aの励振用電極121に生じた極性とは反対の極性となってプラスからマイナスに電界が生じる。この交番電圧により生じた電界によって、第一の振動腕部112a及び第二の振動腕部112bに伸縮現象が生じ、振動腕部112に設定した共振周波数の屈曲振動モードとなる。尚、この共振周波数は、音叉型の水晶振動片110に設けられた周波数調整用金属膜123を構成する金属の量を増減させて調整することができる。   When this tuning-fork type crystal vibrating piece 110 is vibrated, an alternating voltage is applied to the connection electrodes 122a and 122b. When an electrical state after application is instantaneously captured, the excitation electrodes 121 provided on both main surfaces of the first vibrating arm portion 112a have a positive potential, and the excitation electrodes 121 provided on both side surfaces are negative. An electric field is generated from positive to negative. At this time, the excitation electrodes 121 on both main surfaces of the second vibrating arm portion 112b have a negative potential, and the excitation electrodes 121 provided on both side surfaces have a positive potential, the exciting electrodes 121 of the first vibrating arm portion 112a. The electric field is generated from positive to negative with a polarity opposite to the polarity generated in. The electric field generated by the alternating voltage causes an expansion / contraction phenomenon in the first vibrating arm portion 112a and the second vibrating arm portion 112b, and a bending vibration mode having a resonance frequency set in the vibrating arm portion 112 is set. The resonance frequency can be adjusted by increasing or decreasing the amount of metal constituting the frequency adjusting metal film 123 provided on the tuning-fork type crystal vibrating piece 110.

内側腕部113は、2つ一対の振動腕部112の中間であって、振動腕部112に沿って基部111から延設されている。
また、内側腕部113は、振動腕部112よりも短く設けられており、自由端側の幅を振動腕部112よりも大きく設けられる。
内側腕部113の基部111側の両側面のそれぞれに、電極膜切断用腕部113a,113bが設けられており、振動腕部112と向かい合うそれぞれの内側腕部113の側面に内側腕部113から所定の間隔をあけて設けられる。
言い換えれば、電極膜切断用腕部113a,113bの自由端部は、内側腕部113と平行となっており、電極膜切断用腕部113a,113bの固定端部が直角に曲がって内側腕部113と繋がっている。
The inner arm 113 is intermediate between the pair of vibrating arms 112 and extends from the base 111 along the vibrating arms 112.
In addition, the inner arm portion 113 is provided shorter than the vibrating arm portion 112, and the free end side is provided wider than the vibrating arm portion 112.
Electrode film cutting arm portions 113a and 113b are provided on both side surfaces of the inner arm portion 113 on the base 111 side, and the inner arm portion 113 faces the side surface of each inner arm portion 113 facing the vibrating arm portion 112. It is provided with a predetermined interval.
In other words, the free end portions of the electrode film cutting arm portions 113a and 113b are parallel to the inner arm portion 113, and the fixed end portions of the electrode film cutting arm portions 113a and 113b are bent at a right angle to form the inner arm portion. 113 is connected.

内側腕部113に設けられた電極膜切断用腕部113a,113bは、第一の振動腕部112aと第二の振動腕部112bとからなる振動腕部112の側面に励振用電極をスパッタ技術及びフォトリソグラフィ技術にて形成する際に、第一の振動腕部112aの側面の励振用電極121と第二の振動腕部112bの側面の励振用電極121とのショートした状態を切断する役割を果たす。   The electrode film cutting arm portions 113a and 113b provided on the inner arm portion 113 are formed by sputtering an excitation electrode on the side surface of the vibrating arm portion 112 including the first vibrating arm portion 112a and the second vibrating arm portion 112b. And when forming by the photolithography technique, the role of cutting the short-circuited state between the excitation electrode 121 on the side surface of the first vibrating arm portion 112a and the excitation electrode 121 on the side surface of the second vibrating arm portion 112b is cut. Fulfill.

また、電極膜切断用腕部113a,113bは、所定の長さを有しており、内側腕部113との間隔がウェットエッチングで厚み方向に貫通できる程度となっている。   Further, the electrode film cutting arm portions 113a and 113b have a predetermined length, and the distance from the inner arm portion 113 can be penetrated in the thickness direction by wet etching.

このとき、電極膜切断用腕部113a,113bの振動腕部112側を向く側面には電極膜が設けられている。また、内側腕部113の電極膜切断用腕部113a,113bと対向する側面を除き、振動腕部112側を向く側面に電極膜が設けられている。
これら電極膜切断用腕部113a,113bの側面に設けられた電極膜と、内側腕部の側面に設けられた電極膜とは切断されており、第一の振動腕部112aの側面の励振用電極121と第二の振動腕部112bの側面の励振用電極121とがショートしていない状態となっている。
At this time, the electrode film is provided on the side surface of the electrode film cutting arm portions 113a and 113b facing the vibrating arm portion 112 side. In addition, an electrode film is provided on the side surface facing the vibrating arm portion 112 side except for the side surface of the inner arm portion 113 facing the electrode film cutting arm portions 113a and 113b.
The electrode films provided on the side surfaces of the electrode film cutting arm portions 113a and 113b and the electrode films provided on the side surfaces of the inner arm portions are cut, and are used for exciting the side surfaces of the first vibrating arm portion 112a. The electrode 121 and the excitation electrode 121 on the side surface of the second vibrating arm portion 112b are not short-circuited.

この電極膜切断用腕部113a,113bは、以下のように用いられる。この電極膜切断用腕部113a,113bの役割を説明するために、本発明の実施形態に係る音叉型屈曲水晶振動素子100の製造方法を説明する。   The electrode film cutting arms 113a and 113b are used as follows. In order to explain the role of the electrode film cutting arm portions 113a and 113b, a method of manufacturing the tuning fork-type bending crystal resonator element 100 according to the embodiment of the present invention will be described.

例えば、本発明の実施形態に係る音叉型屈曲水晶振動素子100は、本発明の実施形態に係る音叉型屈曲水晶振動素子100に用いられる水晶振動片110を形成した後に電極の形成が行われる。なお、水晶振動片110の形成の前に電極の形状を形成するためのパターンを予め設ける。
例えば、水晶ウェハ(図示せず)の表裏に例えば、Cr、Cr+Auなどの耐食膜(図示せず)をスパッタリングにて成膜する。
For example, in the tuning fork type bending crystal resonator element 100 according to the embodiment of the present invention, the electrodes are formed after the crystal vibrating piece 110 used in the tuning fork type bending crystal resonator element 100 according to the embodiment of the present invention is formed. A pattern for forming the shape of the electrode is provided in advance before the formation of the crystal vibrating piece 110.
For example, a corrosion resistant film (not shown) such as Cr or Cr + Au is formed on the front and back of a quartz wafer (not shown) by sputtering.

次に耐食膜上に感光性レジスト(ポジ型)を両面に形成し、乾燥後表裏の両面に水晶振動片110となる形状の耐食膜が残るように露光、現像、乾燥(以下パターン化)と水晶振動片110となる形状以外の耐食膜のエッチングを行う。   Next, a photosensitive resist (positive type) is formed on both surfaces of the anticorrosion film, and after drying, exposure, development, and drying (hereinafter referred to as patterning) are performed so that the anticorrosion film in the shape of the crystal vibrating piece 110 remains on both the front and back surfaces. Etching of a corrosion-resistant film other than the shape to be the crystal vibrating piece 110 is performed.

次に前記表裏の耐食膜上に電極の形状を決定するために感光性レジスト(ポジ型)をパターン化する。ここで、この感光性レジストの一部は、電極膜切断用腕部113a,113bと内側腕部113と振動腕部112の一部と基部111の一部とを連続させて覆うように設けられている。なお、電極が設けられる部分には、感光性レジストを設けていない。   Next, a photosensitive resist (positive type) is patterned on the front and back corrosion-resistant films in order to determine the shape of the electrodes. Here, a part of the photosensitive resist is provided so as to continuously cover the electrode film cutting arms 113a and 113b, the inner arm 113, a part of the vibrating arm 112, and a part of the base 111. ing. In addition, the photosensitive resist is not provided in the part in which an electrode is provided.

次に露出する水晶部分をエッチングする。このとき、溝部GLの形状と水晶振動片110の形状とが同時に形成される。なお、電極膜切断用腕部113a,113bと内側腕部113と振動腕部112と基部111とを覆う感光性レジストは、エッチングされることなく残る。そのため、この感光性レジストを残した状態で、電極膜切断用腕部113a,113bと内側腕部113と振動腕部112と基部111とが形成される。   Next, the exposed crystal portion is etched. At this time, the shape of the groove GL and the shape of the quartz crystal vibrating piece 110 are formed simultaneously. The photosensitive resist covering the electrode film cutting arm portions 113a and 113b, the inner arm portion 113, the vibrating arm portion 112, and the base portion 111 remains without being etched. Therefore, the electrode film cutting arm portions 113a and 113b, the inner arm portion 113, the vibrating arm portion 112, and the base portion 111 are formed with the photosensitive resist remaining.

次に表裏面に露出した耐食膜をエッチングし水晶表面を得る。次に全面に電極膜をスパッタ技術により形成する。このとき、電極膜切断用腕部113a,113bと内側腕部113を覆う感光性レジストにより、電極膜切断用腕部113a,113bと内側腕部113の側面に電極膜が形成される。なお、このとき、電極膜切断用腕部113a,113bと内側腕部113とが対向するそれぞれの側面には電極膜が形成されず、また、電極膜切断用腕部113a,113bの側面に形成される電極膜と内側腕部113の側面に形成される電極膜とが繋がらない状態となっている。
次に表裏に形成した感光性レジストとその上に形成された電極膜を剥離する。これは感光性レジストを溶解する液に浸すことで容易に除去できる。しかし、その下部に有する耐食膜は残る。電極膜切断用腕部113a,113bと内側腕部113と振動腕部112と基部111とを覆う感光性レジストも除去されるため、第一の振動腕部112aの側面の電極と第二の振動腕部112bの側面の電極とが切断した状態となる。次に前記の残りである耐食膜をエッチングする。
このようにして、水晶振動片110に電極が形成されるので、スパッタ技術を用いても、第一の振動腕部112aの側面の電極と第二の振動腕部112bの側面の電極とがショートした状態から切断した状態にすることができる。
Next, the corrosion-resistant film exposed on the front and back surfaces is etched to obtain a crystal surface. Next, an electrode film is formed on the entire surface by sputtering. At this time, an electrode film is formed on the side surfaces of the electrode film cutting arm portions 113 a and 113 b and the inner arm portion 113 by the photosensitive resist covering the electrode film cutting arm portions 113 a and 113 b and the inner arm portion 113. At this time, the electrode film is not formed on the side surfaces of the electrode film cutting arm portions 113a and 113b and the inner arm portion 113 facing each other, and is formed on the side surfaces of the electrode film cutting arm portions 113a and 113b. Thus, the electrode film formed on the side surface of the inner arm 113 is not connected.
Next, the photosensitive resist formed on the front and back and the electrode film formed thereon are peeled off. This can be easily removed by immersing it in a solution for dissolving the photosensitive resist. However, the anticorrosion film that remains in the lower portion remains. Since the photosensitive resist covering the electrode film cutting arm portions 113a and 113b, the inner arm portion 113, the vibrating arm portion 112, and the base portion 111 is also removed, the electrode on the side surface of the first vibrating arm portion 112a and the second vibration are removed. The electrode on the side surface of the arm portion 112b is cut off. Next, the remaining corrosion-resistant film is etched.
In this way, since the electrodes are formed on the crystal vibrating piece 110, the electrodes on the side surface of the first vibrating arm portion 112a and the electrodes on the side surface of the second vibrating arm portion 112b are short-circuited even when sputtering is used. The cut state can be changed to the cut state.

なお、本発明の実施形態について説明したが、本発明は、適宜、変更可能である。
例えば、周波数調整用金属膜には、別途、Ag(銀)、Au(金)等の金属材料を用いて、厚みを厚くしても良い。
また、本発明の音叉型屈曲水晶振動素子は、所定のパッケージに封入して圧電振動子に用いることができ、また、この状態で発振回路を備えた集積回路素子と接続する構成にして圧電発振器に用いても良い。
In addition, although embodiment of this invention was described, this invention can be changed suitably.
For example, the metal film for frequency adjustment may be separately thickened using a metal material such as Ag (silver) or Au (gold).
Further, the tuning fork-type bending crystal resonator element of the present invention can be used in a piezoelectric vibrator by being enclosed in a predetermined package. In this state, the piezoelectric oscillator is configured to be connected to an integrated circuit element including an oscillation circuit. You may use for.

100 音叉型屈曲水晶振動素子
110a 水晶振動片
111 基部
112 振動腕部
112a 第一の振動腕部
112b 第二の振動腕部
121 励振用電極
122a,122b 接続用電極
123 周波数調整用金属膜
124 導配線パターン
113 内側腕部
113a、113b 電極膜切断用腕部
GL 溝部
DESCRIPTION OF SYMBOLS 100 Tuning fork type bending crystal vibrating element 110a Quartz vibrating piece 111 Base 112 Vibrating arm part 112a First vibrating arm part 112b Second vibrating arm part 121 Excitation electrode 122a, 122b Connection electrode 123 Frequency adjusting metal film 124 Conductive wiring Pattern 113 Inner arm 113a, 113b Electrode film cutting arm GL Groove

Claims (2)

基部と、
基部から延設する2つ一対の振動腕部と、
前記振動腕部の間であって前記基部から延設する内側腕部と、
前記振動腕部と向かい合うそれぞれの前記内側腕部の側面に前記内側腕部から所定の間隔をあけて設けられる電極膜切断用腕部と、
を備えて構成されていることを特徴とする音叉型屈曲水晶振動素子。
The base,
Two pairs of vibrating arms extending from the base,
An inner arm extending between the vibrating arms and extending from the base;
An electrode film cutting arm portion provided on the side surface of each inner arm portion facing the vibrating arm portion at a predetermined interval from the inner arm portion;
A tuning fork-type bending quartz crystal vibrating element characterized by comprising:
前記一対の振動腕部のそれぞれに、延設方向に沿って溝部が設けられていることを特徴とする請求項1に記載の音叉型屈曲水晶振動素子。   The tuning fork-type bending crystal resonator element according to claim 1, wherein a groove portion is provided in each of the pair of vibrating arm portions along the extending direction.
JP2010042948A 2010-02-26 2010-02-26 Tuning fork type bending crystal resonator element Expired - Fee Related JP5465041B2 (en)

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Publication number Priority date Publication date Assignee Title
JP2017011674A (en) * 2015-06-25 2017-01-12 京セラクリスタルデバイス株式会社 Crystal device
JP2017069733A (en) * 2015-09-30 2017-04-06 京セラクリスタルデバイス株式会社 Tuning-fork type crystal element and crystal device

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Publication number Priority date Publication date Assignee Title
JPS5221790A (en) * 1975-08-11 1977-02-18 Seiko Instr & Electronics Ltd Piezo-electric vibrator
JPH11160074A (en) * 1997-11-28 1999-06-18 Kinseki Ltd Piezoelectric vibrator-type angular velocity sensor
JP2006345519A (en) * 2005-06-09 2006-12-21 Eta Sa Manufacture Horlogere Suisse Small-sized piezoelectric resonator

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221790A (en) * 1975-08-11 1977-02-18 Seiko Instr & Electronics Ltd Piezo-electric vibrator
JPH11160074A (en) * 1997-11-28 1999-06-18 Kinseki Ltd Piezoelectric vibrator-type angular velocity sensor
JP2006345519A (en) * 2005-06-09 2006-12-21 Eta Sa Manufacture Horlogere Suisse Small-sized piezoelectric resonator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017011674A (en) * 2015-06-25 2017-01-12 京セラクリスタルデバイス株式会社 Crystal device
JP2017069733A (en) * 2015-09-30 2017-04-06 京セラクリスタルデバイス株式会社 Tuning-fork type crystal element and crystal device

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