JP2011176322A5 - - Google Patents

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Publication number
JP2011176322A5
JP2011176322A5 JP2011054514A JP2011054514A JP2011176322A5 JP 2011176322 A5 JP2011176322 A5 JP 2011176322A5 JP 2011054514 A JP2011054514 A JP 2011054514A JP 2011054514 A JP2011054514 A JP 2011054514A JP 2011176322 A5 JP2011176322 A5 JP 2011176322A5
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gan substrate
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JP2011176322A (ja
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Publication of JP2011176322A5 publication Critical patent/JP2011176322A5/ja
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JP2011054514A 2011-03-11 2011-03-11 GaN基板およびその製造方法、GaN層接合基板の製造方法、ならびに半導体デバイスの製造方法 Withdrawn JP2011176322A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011054514A JP2011176322A (ja) 2011-03-11 2011-03-11 GaN基板およびその製造方法、GaN層接合基板の製造方法、ならびに半導体デバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011054514A JP2011176322A (ja) 2011-03-11 2011-03-11 GaN基板およびその製造方法、GaN層接合基板の製造方法、ならびに半導体デバイスの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2009023775A Division JP2010180081A (ja) 2009-02-04 2009-02-04 GaN基板およびその製造方法、GaN層接合基板の製造方法、ならびに半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2011176322A JP2011176322A (ja) 2011-09-08
JP2011176322A5 true JP2011176322A5 (OSRAM) 2012-03-01

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JP2011054514A Withdrawn JP2011176322A (ja) 2011-03-11 2011-03-11 GaN基板およびその製造方法、GaN層接合基板の製造方法、ならびに半導体デバイスの製造方法

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JP (1) JP2011176322A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI679320B (zh) 2013-08-08 2019-12-11 日商三菱化學股份有限公司 自立GaN基板、GaN結晶、GaN單結晶之製造方法及半導體裝置之製造方法
JP6477501B2 (ja) 2014-01-17 2019-03-06 三菱ケミカル株式会社 GaN基板、GaN基板の製造方法、GaN結晶の製造方法および半導体デバイスの製造方法
US10304739B2 (en) * 2015-01-16 2019-05-28 Sumitomo Electric Industries, Ltd. Method for manufacturing semiconductor substrate, semiconductor substrate, method for manufacturing combined semiconductor substrate, combined semiconductor substrate, and semiconductor-joined substrate

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