JP2011176147A5 - - Google Patents

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Publication number
JP2011176147A5
JP2011176147A5 JP2010039386A JP2010039386A JP2011176147A5 JP 2011176147 A5 JP2011176147 A5 JP 2011176147A5 JP 2010039386 A JP2010039386 A JP 2010039386A JP 2010039386 A JP2010039386 A JP 2010039386A JP 2011176147 A5 JP2011176147 A5 JP 2011176147A5
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JP
Japan
Prior art keywords
circular waveguide
plasma processing
plasma
electric field
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010039386A
Other languages
English (en)
Japanese (ja)
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JP5667368B2 (ja
JP2011176147A (ja
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Priority to JP2010039386A priority Critical patent/JP5667368B2/ja
Priority claimed from JP2010039386A external-priority patent/JP5667368B2/ja
Publication of JP2011176147A publication Critical patent/JP2011176147A/ja
Publication of JP2011176147A5 publication Critical patent/JP2011176147A5/ja
Application granted granted Critical
Publication of JP5667368B2 publication Critical patent/JP5667368B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010039386A 2010-02-24 2010-02-24 プラズマ処理装置 Expired - Fee Related JP5667368B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010039386A JP5667368B2 (ja) 2010-02-24 2010-02-24 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010039386A JP5667368B2 (ja) 2010-02-24 2010-02-24 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2011176147A JP2011176147A (ja) 2011-09-08
JP2011176147A5 true JP2011176147A5 (cg-RX-API-DMAC7.html) 2013-04-04
JP5667368B2 JP5667368B2 (ja) 2015-02-12

Family

ID=44688746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010039386A Expired - Fee Related JP5667368B2 (ja) 2010-02-24 2010-02-24 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5667368B2 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7074795B2 (ja) * 2020-04-21 2022-05-24 宏碩系統股▲フン▼有限公司 合成ダイヤモンドの製造装置及びこれに用いられるマイクロ波発射モジュール

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0567586A (ja) * 1991-09-09 1993-03-19 Nec Corp Ｅｃｒプラズマエツチング装置
JPH0673567A (ja) * 1992-08-28 1994-03-15 Hitachi Ltd マイクロ波プラズマ処理装置
JPH07263187A (ja) * 1994-03-18 1995-10-13 Hitachi Ltd プラズマ処理装置

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