JP2011149193A - Method of installing base isolation device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To increase an axial force applied to base isolation devices to which outer peripheral columns are fixed over an axial force applied to a base isolation device to which an intermediate column is fixed without requiring a jack up step. <P>SOLUTION: The base isolation devices 84, 86 are installed on the upper part of the base 22 of a structure 10 at positions where the outer peripheral columns 24 and the intermediate column 26 are installed. The outer peripheral columns 24 are constructed on the base isolation devices 84, and the outer peripheral columns 24 and the base isolation devices 84 are fixed to each other. Beams 28 are installed between the outer peripheral columns 24 with a camber δ1. The intermediate column 26 is attached to the beams 28 at a position above the base isolation device 86 while being lifted by a height δ2 from the base isolation device 86. An upper frame is constructed on a lower frame, the intermediate column 26 is lowered by the load of the structure, and when the intermediate column 26 is brought into contact with the base isolation device 86, the intermediate column 26 and the base isolation device 86 are fixed to each other. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a seismic isolation device installation method.

Since seismic isolation devices such as laminated rubber have low tensile strength, seismic isolation structures are required to have a structure that does not generate a large pulling force in the seismic isolation device during an earthquake.
For this reason, for example, by adjusting the arrangement of the seismic isolation device and the column, and applying a large long-term axial force to the seismic isolation device at a position where a large pulling force is generated in the event of an earthquake, The pulling force is reduced. However, in such a method for adjusting the seismic isolation device and the arrangement of the columns, the degree of freedom of the seismic isolation device and the arrangement of the columns is limited.

  Therefore, a method has been proposed in which a large long-term axial force is applied in advance to a target seismic isolation device without adjusting the arrangement of the seismic isolation device or the column (Patent Document 1).

  According to Patent Document 1, as shown in FIG. 17, first, a seismic isolation device 84 is installed at the lower part of an outer peripheral column 80 provided on the outer peripheral part of the base isolation structure, and an intermediate column provided inside the building. A seismic isolation device 86 is installed below 82 (FIG. 17A). Next, the jack 90 is attached to the bottom surface of the beam 88 near the outer peripheral column 80, the outer peripheral column 80 is jacked up, and a gap 92 is generated between the lower end of the outer peripheral column 80 and the seismic isolation device 84 (FIG. 17). (B)). Next, the pressure-resistant member 94 is inserted into the gap 92 generated by the jack-up, and the jack-up is released (FIG. 17C).

Thereby, the axial force applied to the seismic isolation device 84 that fixes the outer peripheral column 80 can be made larger than the axial force applied to the seismic isolation device 86 that fixes the intermediate column 82.
However, the method of patent document 1 requires a jack-up process, and an installation process increases.

JP 2006-90078 A

  In view of the above fact, the present invention makes it possible to increase the axial force applied to the seismic isolation device for fixing the outer peripheral column to be greater than the axial force applied to the seismic isolation device for fixing the intermediate column without requiring a jack-up process. Objective.

  The seismic isolation device installation method according to the invention of claim 1 includes a step of installing a seismic isolation device on a foundation of a structure, a step of fixing an outer peripheral column of the structure on the seismic isolation device, A step of laying a beam on the outer peripheral column, a step of providing an intermediate column on the beam in a state of floating above the base isolation device at a position above the base isolation device, the outer peripheral column, the intermediate column, and A step of constructing an upper frame on the lower frame composed of the beams, and fixing the intermediate column and the seismic isolation device after the intermediate column abuts the seismic isolation device with a structure load; It is characterized by having.

In this way, the intermediate column is provided on the beam in a state of floating with respect to the seismic isolation device, and in this state, the upper frame is constructed on the lower frame, so that the beam is deflected by the load of the upper frame and the end of the beam is The structure load applied to the outer peripheral column supporting the part can be made larger than that of the intermediate column. That is, the axial force applied to the seismic isolation device for fixing the outer peripheral column can be made larger than the axial force applied to the seismic isolation device for fixing the intermediate column without requiring a jack-up process.
In addition, as for the outer peripheral pillar, the beam erected on the outer peripheral pillar, and the intermediate pillar provided on the beam, either one of the two built in one piece by precast may be used. You may use what was assembled beforehand and integrated in the place of.
As a result, the pulling force acting on the seismic isolation device that fixes the outer peripheral column can be reduced.

  The invention according to claim 2 is the method of installing a seismic isolation device according to claim 1, wherein the step of installing the seismic isolation device on the foundation of the structure, the outer peripheral column, and the intermediate column installed on the outer peripheral column A step in which the provided beam is integrated or an integrated member is used, the outer peripheral column is fixed on the seismic isolation device, and the intermediate column is arranged in a floating state with respect to the seismic isolation device; An upper frame is constructed on the lower frame composed of the outer peripheral column, the intermediate column, and the beam, and after the intermediate column abuts against the seismic isolation device with a structure load, the intermediate column and the And a step of fixing the seismic isolation device.

As described above, the outer peripheral column and the beam provided on the outer peripheral column and provided with the intermediate column are integrated with each other, or the intermediate column is floated with respect to the seismic isolation device using the integrated member. Fix the column to the seismic isolation device. After that, by constructing the upper frame on the lower frame, the beam is deflected by the load of the upper frame, and the structure load applied to the outer peripheral column supporting the end of the beam can be made larger than that of the intermediate column.
Here, the member in which the outer peripheral column and the beam provided on the outer peripheral column and provided with the intermediate column are integrated with each other by assembling the respective members in advance at different locations. The integrated member means a case where the respective members are built in advance by precasting and arranged in the integrated state in the seismic isolation device.
As a result, the axial force applied to the seismic isolation device for fixing the outer peripheral column can be made larger than the axial force applied to the seismic isolation device for fixing the intermediate column without requiring a jack-up process.

The invention according to claim 3 is characterized in that, in the seismic isolation device installation method according to claim 1 or 2, the beam is provided with a tear.
That is, the intermediate column side of the beam is raised higher than the outer column side. In this state, the upper frame is constructed on the lower frame, the intermediate column is lowered by the structure load, and the peeling of the beam is reduced and brought into contact with the seismic isolation device.
As a result, stress is generated in the beam, and a larger structure load (axial force) can be applied to the seismic isolation device that fixes the outer peripheral column than the seismic isolation device that fixes the intermediate column.

  The invention according to claim 4 is the seismic isolation device installation method according to any one of claims 1 to 3, wherein the seismic isolation device that fixes the intermediate column fixes the outer peripheral column. It is characterized by being installed at a lower position than the device.

In other words, the seismic isolation device that fixes the intermediate column is installed at a lower position than the seismic isolation device that fixes the outer column, and the upper frame is constructed on the lower frame while the intermediate column floats with respect to the seismic isolation device. To do.
As a result, the intermediate column descends due to the structure load and contacts the seismic isolation device. At this time, stress is generated in the beam. Due to this stress, the axial force applied to the seismic isolation device for fixing the outer peripheral column supporting the end of the beam can be made larger than the axial force applied to the seismic isolation device for fixing the intermediate column.

  Since the present invention is configured as described above, the jackup process is not required, and the axial force applied to the seismic isolation device fixing the outer peripheral column can be made larger than the axial force applied to the seismic isolation device fixing the intermediate column. .

It is a flowchart which shows the installation procedure of the seismic isolation apparatus installation method which concerns on the 1st Embodiment of this invention. It is a figure which shows the installation process of the lower frame of the seismic isolation apparatus installation method which concerns on the 1st Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 1st Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 1st Embodiment of this invention. It is a figure which shows the rotational moment which acts on the structure constructed | assembled with the seismic isolation apparatus installation method which concerns on the 1st Embodiment of this invention. It is a figure which shows the installation process of the lower frame of the seismic isolation apparatus installation method which concerns on the 2nd Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 2nd Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 2nd Embodiment of this invention. It is a figure which shows the installation process of the lower frame of the seismic isolation apparatus installation method which concerns on the 3rd Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 3rd Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 3rd Embodiment of this invention. It is a figure which shows the installation process of the lower frame of the seismic isolation apparatus installation method which concerns on the 4th Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 4th Embodiment of this invention. It is a figure which shows the installation process of the upper frame of the seismic isolation apparatus installation method which concerns on the 4th Embodiment of this invention. It is a flowchart which shows the installation procedure of the seismic isolation apparatus installation method which concerns on the 5th Embodiment of this invention. It is a figure which shows the installation process of the lower frame of the seismic isolation apparatus installation method which concerns on the 5th Embodiment of this invention. It is a figure which shows the installation method of the seismic isolation apparatus of a prior art example.

(First embodiment)
The seismic isolation device installation method according to the first embodiment installs the seismic isolation device according to the process shown in FIG.
First, the seismic isolation device installation step 12 is executed. As shown in FIG. 2, the seismic isolation device installation step 12 is a step of installing the seismic isolation devices 84 and 86 on the base portion 22 of the structure 10.

The base portion 22 is made of reinforced concrete, and an installation base (not shown) for fixing the seismic isolation devices 84 and 86 is constructed on the upper surface of the position where the outer peripheral column 24 and the intermediate column 26 are supported.
The seismic isolation device 84 is fixed to an installation base at a position where the outer peripheral column 24 is constructed, and the seismic isolation device 86 is fixed to an installation base at a position where the intermediate column 26 is constructed.

  Next, the outer peripheral column fixing step 14 is executed. As shown in FIG. 2, the outer peripheral column fixing step 14 is a step of fixing the outer peripheral column 24 constructed on the seismic isolation device 84 and the seismic isolation device 84. As a result, the axial force NS applied to the outer peripheral column 24 is transmitted to the base portion 22 via the seismic isolation device 84. An axial force NS at which the base portion 22 supports the seismic isolation device 84 is indicated by an upward arrow NS.

  Next, the beam erection process 16 is executed. As shown in FIG. 2, the beam erection step 16 is a step in which a beam 28 is erected by providing a peeling (raising) between the outer peripheral column 24 and the outer peripheral column 24. That is, the beam 28 spans the inside of the structure 10 in a convex shape, and the central portion of the beam 28 is formed to be higher than the both ends by the dimension δ1.

  Next, the intermediate pillar installation process 18 is performed. As shown in FIG. 2, the intermediate column installation step 18 is a step of attaching the intermediate column 26 to the beam 28 at a position above the seismic isolation device 86. At this time, the intermediate column 26 is attached to the seismic isolation device 86 in a state where it floats by a dimension δ2. Desirably, the dimension δ2 of the intermediate pillar 26 floating from the seismic isolation device 86 is equal to the peel dimension δ1.

  In the state where the intermediate column installation process 18 is completed, the axial force NS from the outer peripheral column 24 acts on the seismic isolation device 84, but the axial force NC from the intermediate column 26 acts on the seismic isolation device 86. Absent. This is because the intermediate column 26 is attached to the seismic isolation device 86 in a floating state.

  Finally, the intermediate column fixing step 20 is executed. As shown in FIG. 3, the intermediate column fixing step 20 is a step of lowering the intermediate column 26 constructed on the seismic isolation device 86, bringing the intermediate column 26 into contact with the seismic isolation device 86, and then fixing it. is there.

  Here, the intermediate column fixing step 20 is a step of constructing the outer peripheral column 24, the intermediate column 29 and the beam 29 constituting the upper frame 30 on the outer peripheral column 24, the intermediate column 26 and the beam 28 constituting the lower frame 32. Done in

  That is, as the construction of the upper frame 30 progresses, the structure load increases and the intermediate column 26 starts to descend. Then, after the intermediate column 26 descends and comes into contact with the seismic isolation device 86, the seismic isolation device 86 and the intermediate column 26 are fixed. At this time, the peeling of the beam 28 is eliminated, and the beam 28 becomes horizontal.

  When the construction of the upper frame 30 is further advanced and the structure load is increased, the axial force NC of the intermediate column 26 is transmitted to the base portion 22 via the seismic isolation device 86. An axial force NC at which the base 22 supports the seismic isolation device 86 is indicated by an upward arrow NC.

  As the construction of the upper frame 30 progresses, not only the axial force NC of the intermediate column 26 but also the axial force NS of the outer peripheral column 24 increases in the same manner. At this time, the stress caused by the peeling of the beam 28 is maintained, and the axial force NS of the outer peripheral column 24 is maintained to be larger than the axial force NC of the intermediate column 26. Therefore, similarly to the stage of constructing the lower frame 32, the state in which the axial force NS of the outer peripheral column 24 is greater than the axial force NC of the intermediate column 26 is maintained even when the upper frame 30 is constructed.

As shown in FIG. 4, even in the stage where the frame construction of the structure 10 is completed, the state where the axial force NS of the outer peripheral column 24 is larger than the axial force NC of the intermediate column 26 is maintained.
The outer peripheral column 24, the beam 28 installed on the outer peripheral column 24, and the intermediate column 26 provided on the beam 28 have been described as independent members, but for example, the outer peripheral column 24 and the beam 28, and the beam 28 and the intermediate A structure in which any two of the pillars 26 or the like are integrally constructed in advance by precast may be used. Furthermore, you may use what was assembled | assembled and integrated any two in another place beforehand. At this time, some of the above steps are performed simultaneously.

Next, the effect of making the axial force NS of the outer peripheral column 24 greater than the axial force NC of the intermediate column 26 will be described.
As shown in FIG. 5, when a horizontal force P acts on the structure 10, a falling moment M <b> 1 is generated in the structure 10. Due to this overturning moment M1, a vertical axially varying axial force NE is generated in the left outer peripheral column 24. When this fluctuating axial force NE becomes larger than the long-term axial force NS that always acts vertically downward, a pulling force acts on the seismic isolation device 84.
As described in the present embodiment, the pulling force acting on the seismic isolation device 84 at the time of an earthquake can be reduced by providing the beam in the beam and increasing the axial force NS of the outer peripheral column 24.

  Thus, according to the present embodiment, the axial force NS applied to the seismic isolation device 84 that fixes the outer peripheral column 24 is applied to the seismic isolation device 86 that fixes the intermediate column 26 without requiring a jack-up process. The applied axial force NC can be made larger.

  Although detailed description is omitted, the stress generated in the beam 28 can be adjusted by increasing or decreasing the amount of peeling δ1, and the magnitude of the axial force NS acting on the seismic isolation device 84 to which the outer peripheral column 24 is fixed. Can be adjusted.

  In the present embodiment, the case where only one intermediate column 26 is provided between the outer peripheral columns 24 has been described. However, the present invention is not limited to this, and a plurality of intermediate columns 26 are provided between the outer peripheral columns 24. It may be provided. Moreover, although the foundation part 22 was demonstrated as a product made from reinforced concrete, it is not limited to this, A structure which functions as a foundation of a structure, that is, a structure type such as an S structure, an SRC structure, a CFT structure, an unreinforced concrete structure, etc. Can be adopted.

(Second Embodiment)
In the seismic isolation device installation method according to the second embodiment, the seismic isolation device is installed by the same procedure as the process of FIG. 1 described in the first embodiment. A description will be given centering on differences from the first embodiment in accordance with the steps of FIG.

  First, the seismic isolation device installation step 12 is executed. As shown in FIG. 6, the seismic isolation devices 84 and 86 are installed on the base portion 22 of the structure 40 in the seismic isolation device installation step 12. The upper surfaces of the seismic isolation devices 84 and 86 in the state of being installed on the base portion 22 are all set to the same height.

  Next, in the outer peripheral column fixing step 14, as shown in FIG. 6, the outer peripheral column 24 is constructed on the seismic isolation device 84, and the outer peripheral column 24 and the seismic isolation device 84 are fixed. As a result, the axial force NS applied to the outer peripheral column 24 is transmitted to the base portion 22 via the seismic isolation device 84. An axial force NS at which the base portion 22 supports the seismic isolation device 84 is indicated by an upward arrow NS.

  Next, in the beam erection step 16, a beam 38 is erected between the outer peripheral columns 24 as shown in FIG. At this time, the beam 38 is not peeled.

  Next, in the intermediate column installation step 18, the intermediate column 26 is attached to the beam 38 at a position above the seismic isolation device 86 as shown in FIG. At this time, the intermediate column 26 is attached to the seismic isolation device 86 in a state where it is floated by the dimension δ2.

Finally, in the intermediate column fixing step 20, as shown in FIG. 7, the upper frame 30 is constructed on the lower frame 32, and the intermediate column 26 constructed on the seismic isolation device 86 is lowered. After the intermediate column 26 contacts the seismic isolation device 86, the intermediate column 26 and the seismic isolation device 86 are fixed.
At this time, due to the lowering of the intermediate column 26, the center of the beam 28 is pulled down from the both ends by the dimension δ1, and stress is generated in the beam 28.

  When the construction of the upper frame 30 further progresses and the structure load increases, the axial force NC of the intermediate column 26 is transmitted to the base portion 22 via the seismic isolation device 86. Further, as the construction of the upper frame 30 proceeds, not only the axial force NC of the intermediate column 26 but also the axial force NS of the outer peripheral column 24 increases in the same manner. At this time, the stress of the beam 28 is maintained, and the axial force NS of the outer peripheral column 24 is maintained larger than the axial force NC of the intermediate column 26. Therefore, similarly to the stage of constructing the lower frame 32, the state in which the axial force NS of the outer peripheral column 24 is greater than the axial force NC of the intermediate column 26 is maintained even when the upper frame 30 is constructed.

  As shown in FIG. 8, even when the frame construction of the structure 40 is completed, the state in which the axial force NS of the outer peripheral column 24 is larger than the axial force NC of the intermediate column 26 is maintained, and the seismic isolation device 84 is maintained during an earthquake. The pulling force that acts can be reduced.

(Third embodiment)
The seismic isolation device installation method according to the third embodiment installs the seismic isolation device in the same procedure as the process of FIG. 1 described in the first embodiment. A description will be given centering on differences from the first embodiment in accordance with the steps of FIG.

  First, in the seismic isolation device installation step 12, as shown in FIG. 9, the seismic isolation devices 84 and 86 are installed on the base portion 34 of the structure 10. The base portion 34 has a concave shape with a low central portion, and an installation base (not shown) provided at the lower portion of the intermediate column 36 is formed to be lower than the installation base provided at the lower portion of the outer peripheral column 36 by a dimension δ3. Yes.

  As a result, the seismic isolation device 86 under the intermediate column 36 is installed at a position lower than the seismic isolation device 84 under the outer peripheral column 24 by δ3.

  Next, in the outer peripheral column fixing step 14, as shown in FIG. 9, the outer peripheral column 24 and the seismic isolation device 84 constructed on the seismic isolation device 84 are fixed. Thereby, the axial force NS applied to the outer peripheral column 24 can be transmitted to the base portion 34 via the seismic isolation device 84.

  Next, in the beam erection step 16, as shown in FIG. 9, a beam 28 provided with peeling (raising) is erected between the outer peripheral columns 24. It is desirable that the peeling dimension δ1 is equal to the dimension δ3 where the seismic isolation device 86 is installed low.

  Next, in the intermediate column installation step 18, as shown in FIG. 9, the intermediate column 36 is attached to the beam 28 with the dimension δ2 floating above the seismic isolation device 86 above the seismic isolation device 86.

  Next, in the intermediate column fixing step 20, the upper frame 30 is constructed on the lower frame 32 as shown in FIG. According to the construction of the construction of the upper frame 30, the structure load increases and the intermediate pillar 36 decreases. When the intermediate pillar 36 is lowered and comes into contact with the seismic isolation device 86, the intermediate pillar 36 and the seismic isolation device 86 are fixed.

  Thereby, the axial force NC from the intermediate pillar 36 is applied to the seismic isolation device 86. As the peeling dimension δ1 of the beam 28 decreases, stress is generated in the beam 28, and the axial force NS applied to the seismic isolation device 84 becomes larger than the axial force NC applied to the seismic isolation device 86.

  As shown in FIG. 11, even when the structure 10 is completed, the stress generated in the beam 28 due to the peeling of the beam 28 is maintained, and the seismic isolation device 84 is more than the axial force NC applied to the seismic isolation device 86. A state where the applied axial force NS is large is maintained.

  That is, the axial force NS applied to the seismic isolation device 84 for fixing the outer peripheral column 24 can be made larger than the axial force NC applied to the seismic isolation device 86 for fixing the intermediate column 36, and acts on the seismic isolation device 84 during an earthquake. The pulling force can be reduced.

(Fourth embodiment)
The seismic isolation device installation method according to the fourth embodiment installs the seismic isolation device in the same procedure as the process of FIG. 1 described in the first embodiment. A description will be given centering on differences from the first embodiment in accordance with the steps of FIG.

  First, the seismic isolation device installation step 12 is executed. As shown in FIG. 12, the seismic isolation devices 84 and 86 are installed on the foundation 34 of the structure 40 in the seismic isolation device installation step 12. The base portion 34 has a concave shape with a low central portion, and the base isolation device 86 under the intermediate column 36 is installed at a position lower than the base isolation device 84 under the outer peripheral column 24 by δ3.

  Next, in the outer peripheral column fixing step 14, as shown in FIG. 12, the outer peripheral column 24 constructed on the seismic isolation device 84 and the seismic isolation device 84 are fixed. As a result, the axial force NS applied to the outer peripheral column 24 is transmitted to the base portion 22 via the seismic isolation device 84. An axial force NS at which the base portion 22 supports the seismic isolation device 84 is indicated by an upward arrow NS.

  Next, in the beam erection step 16, a beam 38 is erected between the outer peripheral columns 24 as shown in FIG. At this time, the beam 38 is not peeled.

  Next, in the intermediate column installation step 18, the intermediate column 36 is attached to the beam 38 at a position above the seismic isolation device 86 as shown in FIG. At this time, the intermediate pillar 36 is attached to the seismic isolation device 86 in a state where it floats by the dimension δ2.

  Finally, in the intermediate column fixing step 20, as shown in FIG. 13, the intermediate column 36 constructed on the seismic isolation device 86 is lowered as the upper frame 30 is constructed. After the intermediate column 26 contacts the seismic isolation device 86, the intermediate column 26 and the seismic isolation device 86 are fixed.

  At this time, due to the lowering of the intermediate column 26, the center of the beam 38 is pulled down from the both ends by the dimension δ1, and stress accompanying deformation is generated in the beam 38.

  As the construction of the upper frame 30 further progresses and the structure load increases, the axial force NC of the intermediate column 36 is transmitted to the foundation 22 via the seismic isolation device 86. Further, as the construction of the upper frame 30 progresses, not only the axial force NC of the intermediate column 36 but also the axial force NS of the outer peripheral column 24 increases in the same manner. At this time, the stress of the beam 38 is maintained, and the axial force NS of the outer peripheral column 24 is maintained larger than the axial force NC of the intermediate column 36. Therefore, similarly to the stage of constructing the lower frame 32, the state in which the axial force NS of the outer peripheral column 24 is greater than the axial force NC of the intermediate column 36 is maintained even when the upper frame 30 is constructed.

  As shown in FIG. 14, even when the frame construction of the structure 40 is completed, the state in which the axial force NS of the outer peripheral column 24 is larger than the axial force NC of the intermediate column 36 is maintained. The pulling force that acts can be reduced.

(Fifth embodiment)
In the seismic isolation device installation method according to the fifth embodiment, the seismic isolation device is installed according to the process shown in FIG. In the fifth embodiment, many parts are the same as those in the first embodiment, and differences will be mainly described.
First, the seismic isolation device installation process 12 described in the first embodiment is executed, and the seismic isolation devices 84 and 86 are installed on the base portion 22 of the structure 44. Subsequently, the installation of the integrated member and the outer peripheral column fixing step 42 are executed.

As shown in FIG. 16, the installation of the integrated member and the outer peripheral column fixing step 42 are attached to the outer peripheral column 48, the beam 52 installed on the outer peripheral column 48, and the beam 52 on the seismic isolation devices 84 and 86. This is a step of installing an integrated member 46 in which the intermediate pillar 50 is integrated.
After positioning the integrated member 46, the outer peripheral column 48 and the seismic isolation device 84 are fixed. At this time, the intermediate pillar 50 is arranged in a state of floating with respect to the seismic isolation device 86.

  The integrated member 46 includes not only a member in which the outer peripheral column 48, the intermediate column 50, and the beam 52 are assembled in advance in another place, but the outer peripheral column 48, the intermediate column 50, and the beam 52 are precast. An integrally constructed member is also included.

  Subsequently, as described in the first embodiment, an upper frame (not shown) is constructed on the integrated member 46. At the stage of constructing the upper frame, the intermediate column 50 abuts against the seismic isolation device 86 by the structure load. Waiting for the intermediate column 50 and the seismic isolation device 86 to contact each other, the intermediate column 50 and the seismic isolation device 86 are fixed.

Thus, by using the integrated member 46, the effect demonstrated in 1st Embodiment can be acquired, and the efficiency of field work can be achieved.
In the second to fourth embodiments, an integrated lower frame (the outer peripheral column 48, the beam 52 installed on the outer peripheral column 48, and the intermediate column 50 attached to the beam 52). Can be used. As a result, the efficiency of field work can be improved.

10 Structure 12 Seismic isolation device installation process (process to install the seismic isolation device)
14 Peripheral column fixing step (step of fixing outer column)
16 Beam installation process (process of installing a beam)
18 Intermediate pillar installation process (process to provide intermediate pillar)
20 Intermediate pillar fixing process (Process to fix the intermediate pillar)
22 foundation part 24 outer peripheral pillar 26 intermediate pillar 28 beam 30 upper frame 32 lower frame 34 foundation part 46 integrated member (integrated or integrated member)
48 Peripheral column 50 Intermediate column 52 Beam 84 Seismic isolation device 86 Seismic isolation device

Claims (4)

A process of installing seismic isolation devices at the base of the structure;
Fixing the outer peripheral column of the structure on the seismic isolation device;
Laying a beam on the outer peripheral column;
Providing an intermediate column on the beam in a state of floating with respect to the seismic isolation device at a position above the seismic isolation device;
An upper frame is constructed on the lower frame composed of the outer peripheral column, the intermediate column, and the beam, and after the intermediate column abuts the seismic isolation device with a structure load, Fixing the seismic device;
Seismic isolation device installation method. A process of installing seismic isolation devices at the base of the structure;
An outer peripheral column and a beam provided on the outer peripheral column and provided with an intermediate column are integrated, or using an integrated member, the outer peripheral column is fixed on the seismic isolation device, and the intermediate column is A step of placing the base isolation device in a floating state;
An upper frame is constructed on the lower frame composed of the outer peripheral column, the intermediate column, and the beam, and after the intermediate column abuts the seismic isolation device with a structure load, Fixing the seismic device;
Seismic isolation device installation method. The seismic isolation device installation method according to claim 1, wherein the beam is provided with a peeling.   The seismic isolation device installation method according to any one of claims 1 to 3, wherein the seismic isolation device for fixing the intermediate column is installed at a position lower than the seismic isolation device for fixing the outer peripheral column.

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