JP2011131211A - Photocatalytic metal compound, photocatalytic composition, and photocatalytic coating film - Google Patents
Photocatalytic metal compound, photocatalytic composition, and photocatalytic coating film Download PDFInfo
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- JP2011131211A JP2011131211A JP2010262918A JP2010262918A JP2011131211A JP 2011131211 A JP2011131211 A JP 2011131211A JP 2010262918 A JP2010262918 A JP 2010262918A JP 2010262918 A JP2010262918 A JP 2010262918A JP 2011131211 A JP2011131211 A JP 2011131211A
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- photocatalyst
- metal compound
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- coating film
- meth
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Abstract
Description
本発明は、光触媒用金属化合物、光触媒組成物及び光触媒塗膜に関するものである。 The present invention relates to a photocatalyst metal compound, a photocatalyst composition, and a photocatalyst coating film.
近年、住宅及びビルなどの建築外壁に防汚性能を付与するために、光触媒塗料が実用化され、その光触媒塗料を建築外壁に塗布して光触媒塗膜を形成している。この光触媒塗料には、光触媒活性を発揮すべく光触媒活性を有する金属化合物材料が配合されている。そのような化合物のうち最も良く使われるのは二酸化チタン(TiO2)である。この二酸化チタンに光(紫外線)が当たると、励起電子と正孔を生成し、その生成した励起電子と正孔により、触媒表面での酸素と水分の存在下で、・O2 -及び・OH(「・」は不対電子を示し、これを付した化学種がラジカル種であることを意味する。)等の活性酸素種を生成する。これらの活性酸素種が、汚れ分解機能及び窒素酸化物除去機能等の重要な光触媒活性を発現している。しかし、これらの活性酸素種は、光触媒塗料が塗られる基材の塗膜(以下、「下地塗膜」と記述する。)に対してもダメージを与える。そこで、下地塗膜と光触媒塗膜との間に、シリコーン樹脂に代表される保護層を設ける2層コートタイプの光触媒塗料が提案されている(特許文献1参照)。 In recent years, in order to impart antifouling performance to architectural outer walls such as houses and buildings, a photocatalytic coating has been put into practical use, and the photocatalytic coating is applied to the architectural outer wall to form a photocatalytic coating film. This photocatalyst coating material is mixed with a metal compound material having photocatalytic activity so as to exhibit photocatalytic activity. The most commonly used of these compounds is titanium dioxide (TiO 2 ). When light (UV) strikes the titanium dioxide to generate excited electrons and holes by the generated excited electrons and holes, in the presence of oxygen and water at the catalyst surface, · O 2 - and · OH (“·” Indicates an unpaired electron, meaning that the chemical species to which it is attached is a radical species). These active oxygen species express important photocatalytic activities such as a soil decomposition function and a nitrogen oxide removal function. However, these active oxygen species also damage the coating film (hereinafter referred to as “undercoat film”) of the base material to which the photocatalytic coating is applied. Therefore, a two-layer coat type photocatalyst coating in which a protective layer typified by a silicone resin is provided between the base coating and the photocatalytic coating has been proposed (see Patent Document 1).
2層コートタイプの光触媒塗料の保護層として用いられるシリコーン樹脂などの膜は硬くて脆いため、その膜における微小な貫通クラックの発生を完全に防ぐことは不可能である。その結果、前述の活性酸素種がその貫通クラックを経由して下地塗膜にダメージを与えることを防ぐことはできなかった。また、2層コートタイプの光触媒塗料は、現場施工性に難がある。これらのことを改善するために、下地塗膜へのダメージを防止でき、かつ保護層が不要である1層コートタイプの光触媒塗料が待望されている。 Since a film such as a silicone resin used as a protective layer of a two-layer coat type photocatalyst paint is hard and brittle, it is impossible to completely prevent the occurrence of minute through cracks in the film. As a result, it was not possible to prevent the aforementioned active oxygen species from damaging the base coating film through the through cracks. Also, the two-layer coat type photocatalyst paint has difficulty in on-site workability. In order to improve these problems, a one-layer coat type photocatalyst paint that can prevent damage to the base coating film and does not require a protective layer is desired.
本発明は、上記のような1層コートタイプの光触媒塗料を実現するため、下地塗膜を損傷することなく、かつ、必要な光触媒活性を発揮する光触媒用金属化合物、その金属化合物を含む光触媒組成物及び光触媒塗膜を提供することを目的とする。 The present invention realizes such a one-layer coat type photocatalyst coating material as described above, and does not damage the base coating film, and exhibits a necessary photocatalytic activity, and a photocatalyst composition containing the metal compound. It aims at providing a thing and a photocatalyst coating film.
本発明者らは上記課題を解決すべく鋭意検討した結果、本発明に到達した。
すなわち、本発明は以下の通りである。
[1]光触媒として用いる金属化合物であって、前記金属化合物を含む所定の懸濁液に波長365nmの紫外光を照射した際に発生する活性酸素種量のうち、〔・O2 -〕の値が15nM以下である光触媒用金属化合物。
[2]光触媒として用いる金属化合物であって、前記金属化合物を含む所定の懸濁液に波長365nmの紫外光を照射した際に発生する活性酸素種量のうち、〔・OH〕の値が400nM以下である光触媒用金属化合物。
[3]光触媒として用いる金属化合物であって、前記金属化合物を含む所定の懸濁液に波長365nmの紫外光を照射した際に発生する活性酸素種量のうち、〔H2O2〕の値が0.4nM以下である光触媒用金属化合物。
[4][1]〜[3]のいずれか一つの光触媒用金属化合物と、バインダーとを含む光触媒組成物。
[5]前記バインダーが、重合体粒子と、前記光触媒用金属化合物以外の金属酸化物の粒子とを含む、[4]に記載の光触媒組成物。
[6][4]又は[5]の光触媒組成物から形成された光触媒塗膜。
[7][6]の光触媒塗膜を備える光触媒塗装製品。
As a result of intensive studies aimed at solving the above problems, the present inventors have reached the present invention.
That is, the present invention is as follows.
[1] A value of [• O 2 − ] among active oxygen species generated when a predetermined suspension containing the metal compound is irradiated with ultraviolet light having a wavelength of 365 nm, which is a metal compound used as a photocatalyst. Is a metal compound for photocatalyst of 15 nM or less.
[2] A metal compound used as a photocatalyst, and among the amount of active oxygen species generated when a predetermined suspension containing the metal compound is irradiated with ultraviolet light having a wavelength of 365 nm, the value of [.OH] is 400 nM The metal compound for photocatalysts is:
[3] A metal compound used as a photocatalyst, the value of [H 2 O 2 ] among active oxygen species generated when a predetermined suspension containing the metal compound is irradiated with ultraviolet light having a wavelength of 365 nm Is a metal compound for photocatalyst of 0.4 nM or less.
[4] A photocatalyst composition comprising the metal compound for photocatalyst according to any one of [1] to [3] and a binder.
[5] The photocatalyst composition according to [4], wherein the binder includes polymer particles and particles of a metal oxide other than the metal compound for photocatalyst.
[6] A photocatalyst coating film formed from the photocatalyst composition of [4] or [5].
[7] A photocatalyst-coated product provided with the photocatalyst coating film of [6].
本発明の光触媒用金属化合物を使用すれば、下地塗膜を損傷することなく、その上に保護層が不要のまま必要な光触媒活性を発揮する光触媒層を設けることができ、現場施工性に優れる1層コートタイプの光触媒塗料を提供することができる。 If the metal compound for photocatalysts of the present invention is used, a photocatalyst layer that exhibits the necessary photocatalytic activity can be provided on the base coating film without damaging the base coating film, and excellent on-site workability A single-layer coating type photocatalytic coating can be provided.
以下、本発明を実施するための形態(以下、単に「本実施形態」という。)について詳細に説明する。なお、本明細書における「(メタ)アクリル」とは「アクリル」及びそれに対応する「メタクリル」を意味し、「(メタ)アクリレート」とは「アクリレート」及びそれに対応する「メタクリレート」を意味し、「(メタ)アクリロイル」とは「アクリロイル」及びそれに対応する「メタクリロイル」を意味する。 Hereinafter, a mode for carrying out the present invention (hereinafter simply referred to as “the present embodiment”) will be described in detail. In the present specification, “(meth) acryl” means “acryl” and “methacryl” corresponding thereto, “(meth) acrylate” means “acrylate” and “methacrylate” corresponding thereto, “(Meth) acryloyl” means “acryloyl” and its corresponding “methacryloyl”.
本実施形態の光触媒用金属化合物は、光触媒として用いる金属化合物であって、その金属化合物を含む所定の懸濁液に波長365nmの紫外光(以下、「特定紫外光」という。)を照射した際に発生する活性酸素種量のうち、〔・O2 -〕の値が15nM以下である。本明細書において、「所定の懸濁液」とは、石英セル(光路(長さ)1cm×幅1cm)に、3.5mLの0.01M NaOH水溶液を注入し、そこに更に15mgの金属化合物の粉末を投入し攪拌して得られる懸濁液を指す。下地塗膜を損傷しないようにするために、所定の懸濁液に特定紫外光を照射した際に発生する活性酸素種量のうち、〔・O2 -〕、すなわちスーパーオキサイドラジカルの濃度の値が15nM以下であることが好ましく、10nM以下であることがより好ましく、5nM以下であることが更に好ましい。ここで、紫外光とは400nm以下の波長領域のことをいう。また、nMはナノモーラーを表し、1nM=10-9M=10-9mol/Lである。 The metal compound for photocatalyst of this embodiment is a metal compound used as a photocatalyst, and when a predetermined suspension containing the metal compound is irradiated with ultraviolet light having a wavelength of 365 nm (hereinafter referred to as “specific ultraviolet light”). The amount of [.O 2 − ] is 15 nM or less in the amount of active oxygen species generated in In the present specification, the “predetermined suspension” means that 3.5 mL of 0.01 M NaOH aqueous solution is injected into a quartz cell (optical path (length) 1 cm × width 1 cm), and further 15 mg of a metal compound is added thereto. Is a suspension obtained by adding and stirring the powder. In order not to damage the underlying coating film, among the amount of active oxygen species generated when a specific suspension is irradiated with specific ultraviolet light, [· O 2 − ], that is, the value of superoxide radical concentration Is preferably 15 nM or less, more preferably 10 nM or less, and even more preferably 5 nM or less. Here, the ultraviolet light means a wavelength region of 400 nm or less. NM represents nanomolar, and 1 nM = 10 −9 M = 10 −9 mol / L.
活性酸素種のうち、・O2 -は、塗膜を痛める作用があるラジカル種であり、更に水と反応して過酸化水素を生じる。この過酸化水素も下地塗膜を傷めてしまう。すなわち、〔・O2 -〕の値が15nM以下ということは、・O2 -の発生量が少なく、下地塗膜が痛まない光触媒用金属化合物であることを意味する。一方、〔・O2 -〕の値が15nMより大きい光触媒用金属化合物は、・O2 -の発生量が多く、下地塗膜を痛めてしまう。 Of the active oxygen species, · O 2 - is a radical species has the effect of damaging the coating film, resulting in hydrogen peroxide reacts further with water. This hydrogen peroxide also damages the undercoat. That is, the value of [• O 2 − ] of 15 nM or less means a metal compound for photocatalyst in which the amount of generated • O 2 − is small and the underlying coating does not hurt. On the other hand, a metal compound for photocatalyst having a value of [.O 2 − ] of more than 15 nM has a large amount of • O 2 − and damages the base coating film.
本実施形態の光触媒用金属化合物は、下地塗膜を傷めないために、特定紫外光を照射した際に発生する上記活性酸素種量のうち、〔・OH〕、すなわちヒドロキシルラジカルの値が400nM以下であることが好ましく、200nM以下であることがより好ましく、150nM以下であることが更に好ましい。ここで、紫外光とは400nm以下の波長領域のことをいう。また、nMはナノモーラーを表し、1nM=10-9M=10-9mol/Lのことである。 The metal compound for photocatalyst of the present embodiment has [· OH], that is, a value of hydroxyl radical of 400 nM or less, among the above active oxygen species generated when irradiated with specific ultraviolet light so as not to damage the underlying coating film. It is preferable that it is 200 nM or less, and it is still more preferable that it is 150 nM or less. Here, the ultraviolet light means a wavelength region of 400 nm or less. NM represents nanomolar, and 1 nM = 10 −9 M = 10 −9 mol / L.
活性酸素種のうち、・OHは、塗膜を痛める作用があるラジカル種である。すなわち、〔・OH〕の値が400nM以下ということは、・OHの発生量が少なく、下地塗膜が痛まない光触媒用金属化合物であることを意味する。一方、〔・OH〕の値が400nMより大きい光触媒用金属化合物は、・OHの発生量が多く、下地塗膜を痛めてしまう。 Of the active oxygen species, .OH is a radical species that acts to damage the coating film. That is, a value of [.OH] of 400 nM or less means that the amount of .OH generated is small and the metal film for photocatalyst does not hurt the base coating film. On the other hand, a metal compound for photocatalyst having a value of [.OH] of more than 400 nM has a large amount of .OH generation, and damages the base coating film.
本実施形態の光触媒用金属化合物は、下地塗膜を傷めないために、特定紫外光を照射した際に発生する上記活性酸素種量のうち、〔H2O2〕、すなわちオキシドール(過酸化水素)の値が0.4nM以下であることが好ましく、0.3nM以下であることがより好ましく、0.2nM以下であることが更に好ましい。ここで、紫外光とは400nm以下の波長領域のことをいう。また、nMはナノモーラーを表し、1nM=10-9M=10-9mol/Lのことである。 The metal compound for photocatalyst of this embodiment is [H 2 O 2 ], that is, oxydol (hydrogen peroxide) among the above-mentioned active oxygen species generated when irradiated with specific ultraviolet light so as not to damage the undercoat. ) Is preferably 0.4 nM or less, more preferably 0.3 nM or less, and still more preferably 0.2 nM or less. Here, the ultraviolet light means a wavelength region of 400 nm or less. NM represents nanomolar, and 1 nM = 10 −9 M = 10 −9 mol / L.
活性酸素種のうち、H2O2は、・O2 -のようなラジカル種に比べて、安定な物質であり、ラジカル種の寿命(1秒以下)に比べて長寿命であり、遠距離まで移動して下地塗膜を傷めてしまう。そこで、〔H2O2〕は、上記各ラジカル種よりも小さいことが好ましい。すなわち、〔H2O2〕の値が0.4nM以下ということは、H2O2の発生量が少なく、下地塗膜が痛まない光触媒用金属化合物であることを意味する。一方、〔H2O2〕の値が0.4nMより大きい光触媒用金属化合物は、H2O2の発生量が多く、下地塗膜を痛めてしまう。 Of the active oxygen species, H 2 O 2 is, · O 2 - as compared with radical species, such as a stable substance, a longer life as compared with the radical species life (less than 1 second), long distance It will move and will damage the undercoat. Therefore, [H 2 O 2 ] is preferably smaller than the above radical species. That is, the value of [H 2 O 2 ] being 0.4 nM or less means that the amount of H 2 O 2 generated is small and the metal compound for photocatalyst does not hurt the base coating film. On the other hand, a metal compound for photocatalyst having a value of [H 2 O 2 ] larger than 0.4 nM has a large amount of H 2 O 2 generated, and damages the underlying coating film.
本実施形態の光触媒用金属化合物は、本発明による効果をより有効かつ確実に奏する観点から、上記3種の活性酸素種のうち少なくとも2種が上述の活性酸素種量の条件を満足することが好ましく、3種全てが上述の活性酸素種量の条件を満足することがより好ましい。 The metal compound for photocatalyst of the present embodiment is such that at least two of the three kinds of active oxygen species satisfy the above-mentioned condition of the amount of active oxygen species from the viewpoint of more effectively and reliably achieving the effects of the present invention. Preferably, it is more preferable that all three types satisfy the above-mentioned conditions for the amount of active oxygen species.
・O2 -の定量は、ルミノール化学発光を用いて行うことができる。暗箱内のマグネティックスターラ上に設置した石英セル(光路(長さ)1cm×幅1cm)に、3.5mLの0.01M NaOH水溶液を入れ、そこに更に15mgの金属化合物(光触媒)粉末(例えば、ゾルを乾燥して得られたもの。以下同様。)を投入し懸濁して懸濁液を得る。次いで、LED(Hamamatsu Photonics(浜松ホトニクス)社製、型番「LC−L2」、波長:365nm)を光源として、懸濁液が入った上記セルに10秒間の紫外光照射を行う。照射後、7mMのルミノール溶液を50μL添加し、・O2 -によって生じた化学発光をバンドパスフィルターに通した後、電子冷却光電子増倍管で検出する。 Quantification of O 2 − can be performed using luminol chemiluminescence. A quartz cell (optical path (length) 1 cm × width 1 cm) placed on a magnetic stirrer in a dark box is charged with 3.5 mL of 0.01 M NaOH aqueous solution, and further 15 mg of a metal compound (photocatalyst) powder (for example, A product obtained by drying a sol (the same applies hereinafter) is added and suspended to obtain a suspension. Next, using the LED (Hamamatsu Photonics, model number “LC-L2”, wavelength: 365 nm) as a light source, the cell containing the suspension is irradiated with ultraviolet light for 10 seconds. After irradiation, 50 μL of a 7 mM luminol solution is added, and chemiluminescence generated by • O 2 − is passed through a band-pass filter and then detected with an electron-cooled photomultiplier tube.
H2O2の定量は、ルミノール化学発光を用いて行うことができる。H2O2の定量では、紫外線照射まで・O2 -の定量におけるものと同様の操作を行った後、30分間、・O2 -の消失を待ち、その後、7mMのルミノール溶液を50μL添加する。更に10分後、6.2μMのヘモグロビン溶液を50μL添加し、H2O2によって生じた化学発光を検出する。 H 2 O 2 can be quantified using luminol chemiluminescence. In the determination of H 2 O 2 , the same operation as in the determination of • O 2 − was performed until ultraviolet irradiation, and then the disappearance of • O 2 − was waited for 30 minutes, and then 50 μL of a 7 mM luminol solution was added. . After another 10 minutes, 50 μL of 6.2 μM hemoglobin solution is added and chemiluminescence generated by H 2 O 2 is detected.
・OHの定量法は下記の通りである。まず、0.1mMのクマリン水溶液を調製し、上記と同じ寸法の石英セル中に15mgのTiO2などの金属化合物(光触媒)粉末とクマリン水溶液35mLとを懸濁させて懸濁液を得る。この懸濁液に波長365nm、強度32mW/cm2のLED光を120秒照射する。次に、懸濁液からTiO2などの金属化合物(光触媒)粉末を分離するために、照射終了後の懸濁液にKClを0.5g添加し、24時間暗所に静置する。その後、上澄み液をとりサンプルとし、Fluorescence spectrophotometer(型番「RF−5300PC」、SHIMADZU社製)で蛍光の測定をする(この時、KCl添加による蛍光測定時の光散乱は影響しないことを確認している。)。既知濃度のクマリンの蛍光強度を、上記サンプルの蛍光強度と比較することで・OHを定量する。 -The quantitative method of OH is as follows. First, a 0.1 mM aqueous solution of coumarin is prepared, and a suspension is obtained by suspending 15 mg of a metal compound (photocatalyst) powder such as TiO 2 and 35 mL of an aqueous solution of coumarin in a quartz cell having the same dimensions as described above. This suspension is irradiated with LED light having a wavelength of 365 nm and an intensity of 32 mW / cm 2 for 120 seconds. Next, in order to separate a metal compound (photocatalyst) powder such as TiO 2 from the suspension, 0.5 g of KCl is added to the suspension after the irradiation and left in a dark place for 24 hours. Thereafter, the supernatant is taken as a sample, and fluorescence is measured with a Fluorescence spectrophotometer (model number “RF-5300PC”, manufactured by SHIMADZU). At this time, it is confirmed that light scattering during the fluorescence measurement due to the addition of KCl has no effect. Yes.) OH is quantified by comparing the fluorescence intensity of a known concentration of coumarin with the fluorescence intensity of the sample.
上述の各活性酸素種量を上記範囲内に調整する方法としては、例えば、光触媒用金属酸化物の粒子径(結晶径)を小さくしたり、光触媒用金属酸化物に表面処理を施したりして、活性酸素種量を少なくする方法が挙げられる。ただし、各活性酸素種量の調整方法はこれらに限定されない。 As a method for adjusting the amount of each active oxygen species within the above range, for example, the particle diameter (crystal diameter) of the photocatalyst metal oxide is reduced, or the photocatalyst metal oxide is subjected to surface treatment. And a method of reducing the amount of active oxygen species. However, the method for adjusting the amount of each active oxygen species is not limited to these.
光触媒用金属化合物としては、例えば、TiO2、ZnO、SrTiO3、CdS、GaP、InP、GaAs、BaTiO3、BaTiO4、BaTi4O9、K2NbO3、Nb2O5、Fe2O3、Ta2O5、K3Ta3Si2O3、WO3、SnO2、Bi2O3、BiVO4、NiO、Cu2O、SiC、MoS2、InPb、RuO2、及びCeO2が挙げられる。これらの中では、光触媒活性がより良好である観点から、金属酸化物が好ましい。また、分散性向上や耐候性向上の観点から、上記光触媒用金属化合物粒子表面にシリカ、アルミナなどに代表される金属酸化物を被着させたものを本発明の光触媒用金属化合物として用いてもよい。 The photocatalytic metal compound, for example, TiO 2, ZnO, SrTiO 3 , CdS, GaP, InP, GaAs, BaTiO 3, BaTiO 4, BaTi 4 O 9, K 2 NbO 3, Nb 2 O 5, Fe 2 O 3 , Ta 2 O 5, K 3 Ta 3 Si 2 O 3, WO 3, SnO 2, Bi 2 O 3, BiVO 4, NiO, Cu 2 O, SiC, MoS 2, InPb, RuO 2, and CeO 2 can be mentioned It is done. Among these, metal oxides are preferable from the viewpoint of better photocatalytic activity. In addition, from the viewpoint of improving dispersibility and improving weather resistance, the photocatalyst metal compound particle surface may be used as the photocatalyst metal compound of the present invention in which a metal oxide typified by silica, alumina or the like is deposited. Good.
本実施形態の光触媒用金属化合物としては、安全性及びコストの観点から酸化チタンが好ましい。酸化チタンにはアナターゼ型、ルチル型、ブルッカイト型の結晶構造があるが、いずれも使用できる。 As a metal compound for photocatalysts of this embodiment, titanium oxide is preferable from the viewpoint of safety and cost. Titanium oxide has anatase, rutile and brookite crystal structures, any of which can be used.
本実施形態に係る光触媒用金属化合物は、光触媒としての性能を向上させる観点及び良好な分散性を示す観点から、その一次粒子径が平均(相加平均)で1〜400nmの範囲にあることが好ましく、1〜100nmの範囲にあることがより好ましく、5〜50nmの範囲であることが更に好ましい。なお、光触媒用金属化合物の粒子形状がロッド形状等の長径と短径とを有する場合、その長径及び短径の相加平均が上記範囲内にあると好ましい。光触媒用金属化合物の一次粒子径は、任意に選択された50個の粒子を電子顕微鏡観察により測定し、それらの相加平均として導出される。 The metal compound for photocatalyst according to the present embodiment may have an average (arithmetic average) primary particle diameter in the range of 1 to 400 nm from the viewpoint of improving the performance as a photocatalyst and exhibiting good dispersibility. Preferably, it is in the range of 1 to 100 nm, more preferably in the range of 5 to 50 nm. In addition, when the particle shape of the metal compound for photocatalysts has a major axis and a minor axis such as a rod shape, the arithmetic average of the major axis and minor axis is preferably within the above range. The primary particle diameter of the metal compound for photocatalyst is derived as an arithmetic average of 50 arbitrarily selected particles measured by electron microscope observation.
本実施形態の光触媒塗膜は、上述の光触媒用金属化合物とバインダー(B)とを含む光触媒組成物を用いて造膜することにより得られる。ここで、「バインダー」とは、実質的に溶媒を分散媒とするバインダー樹脂溶液又はバインダー樹脂の分散体に含まれる固形成分のことをいい、バインダー樹脂溶液又はバインダー樹脂の分散体にはバインダー樹脂以外の固形分が含まれてもよい。バインダーに含まれるバインダー樹脂としては、例えば、ポリビニルアルコール、カチオン変性ポリビニルアルコール、シラノール変性ポリビニルアルコールに代表されるポリビニルアルコール誘導体;ポリビニルピロリドン、ポリアクリルアミド類、デンプン及びデンプン誘導体;カルボキシメチルセルロース、ヒドロキシエチルセルロースに代表されるセルロース誘導体;カゼイン;ゼラチン;溶媒体中でのラジカル重合、アニオン重合、カチオン重合などによって得られる従来公知のポリ(メタ)アクリレート系、ポリビニルアセテート系、酢酸ビニル−アクリル系、エチレン酢酸ビニル系、シリコーン系、フッ素系、ポリブタジエン系、スチレンブタジエン系、NBR系、ポリ塩化ビニル系、塩素化ポリプロピレン系、ポリエチレン系、ポリスチレン系、塩化ビニリデン系、ポリスチレン−(メタ)アクリレート系、スチレン−無水マレイン酸系等の共重合体;シリコーン変性アクリル系、フッ素−アクリル系、アクリルシリコン系、エポキシ−アクリル系等の変性共重合体;が挙げられる。ここで、「(メタ)アクリレート」とは、メタクリレート及びそれに対応するアクリレートを意味する。バインダー(B)は、光触媒塗膜の全質量に対して、30質量%〜99.9質量%含まれることが好ましく、50質量%〜99質量%含まれることがより好ましい。当該範囲でバインダーを含むことで、光触媒塗膜は、造膜性に一層優れると共に、その造膜性と光触媒の活性とを更にバランス良く両立させることができる。バインダー(B)は、バインダー樹脂が有する官能基と反応する官能基を有する化合物を更に含んでもよい。そのような化合物としては、例えば、(ポリ)イソシアネート化合物、(ポリ)エポキシ化合物、アミノ化合物、(ポリ)カルボキシ化合物、(ポリ)ヒドロキシ化合物、グリコール化合物、シラノール化合物、シリル化合物、アルコキシ化合物、(メタ)アクリレート類が挙げられる。 The photocatalyst coating film of this embodiment is obtained by forming a film using the photocatalyst composition containing the above-described metal compound for photocatalyst and the binder (B). Here, the “binder” refers to a solid component contained in a binder resin solution or binder resin dispersion substantially using a solvent as a dispersion medium, and the binder resin solution or binder resin dispersion includes a binder resin. Solid content other than may be contained. Examples of the binder resin contained in the binder include polyvinyl alcohol derivatives represented by polyvinyl alcohol, cation-modified polyvinyl alcohol, and silanol-modified polyvinyl alcohol; polyvinyl pyrrolidone, polyacrylamides, starch and starch derivatives; typified by carboxymethyl cellulose and hydroxyethyl cellulose. Cellulose derivatives; casein; gelatin; conventionally known poly (meth) acrylates, polyvinyl acetates, vinyl acetate-acrylic, ethylene vinyl acetates obtained by radical polymerization, anion polymerization, cationic polymerization, etc. , Silicone, fluorine, polybutadiene, styrene butadiene, NBR, polyvinyl chloride, chlorinated polypropylene, polyethylene , Polystyrene-based, vinylidene chloride-based, polystyrene- (meth) acrylate-based, styrene-maleic anhydride-based copolymers; silicone-modified acrylic, fluorine-acrylic, acrylic silicon-based, epoxy-acrylic modified copolymers A polymer; Here, “(meth) acrylate” means methacrylate and its corresponding acrylate. It is preferable that 30 mass%-99.9 mass% is contained with respect to the total mass of a photocatalyst coating film, and it is more preferable that a binder (B) is contained 50 mass%-99 mass%. By including a binder in the range, the photocatalyst coating film is further excellent in film forming property, and the film forming property and the activity of the photocatalyst can be further balanced. The binder (B) may further contain a compound having a functional group that reacts with the functional group of the binder resin. Examples of such compounds include (poly) isocyanate compounds, (poly) epoxy compounds, amino compounds, (poly) carboxy compounds, (poly) hydroxy compounds, glycol compounds, silanol compounds, silyl compounds, alkoxy compounds, (meta ) Acrylates.
本実施形態の光触媒塗膜におけるバインダー(B)は、重合体粒子(B1)と、光触媒活性を示さない金属酸化物粒子、すなわち上記光触媒用金属化合物以外の金属酸化物粒子(B2)とから形成されることが好ましい。 The binder (B) in the photocatalyst coating film of the present embodiment is formed from polymer particles (B1) and metal oxide particles that do not exhibit photocatalytic activity, that is, metal oxide particles (B2) other than the metal compound for photocatalyst. It is preferred that
本実施形態に係る重合体粒子(B1)を構成するポリマーとしては、例えば、媒体中でのラジカル重合、アニオン重合、カチオン重合などによって得られる従来公知のポリ(メタ)アクリレート系、ポリビニルアセテート系、酢酸ビニル−アクリル系、エチレン酢酸ビニル系、シリコーン系、フッ素系、ポリブタジエン系、スチレンブタジエン系、NBR系、ポリ塩化ビニル系、塩素化ポリプロピレン系、ポリエチレン系、ポリスチレン系、塩化ビニリデン系、ポリスチレン−(メタ)アクリレート系、スチレン−無水マレイン酸系に代表される単重合体又は共重合体、シリコーン変性アクリル系、フッ素−アクリル系、アクリルシリコン系、エポキシ−アクリル系に代表される変性共重合体が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いられる。 As the polymer constituting the polymer particles (B1) according to the present embodiment, for example, conventionally known poly (meth) acrylate-based, polyvinyl acetate-based obtained by radical polymerization, anionic polymerization, cationic polymerization, etc. in a medium, Vinyl acetate-acrylic, ethylene vinyl acetate, silicone, fluorine, polybutadiene, styrene butadiene, NBR, polyvinyl chloride, chlorinated polypropylene, polyethylene, polystyrene, vinylidene chloride, polystyrene- ( Mono- or copolymer represented by (meth) acrylate, styrene-maleic anhydride, modified copolymer represented by silicone-modified acrylic, fluorine-acrylic, acrylic silicon, and epoxy-acrylic. Can be mentioned. These are used singly or in combination of two or more.
本実施形態に係る重合体粒子としては、乳化重合等の方法で得られた重合体エマルジョン粒子を用いることができる。その好ましい例としては、乳化重合等の方法で得られたアクリルエマルジョン粒子、アクリルシリコンエマルジョン粒子が挙げられる。なかでも、水及び乳化剤の存在下に、加水分解性珪素化合物及びビニル単量体を重合して得られる粒子径が10〜800nmである重合体エマルジョン粒子を用いると、得られる光触媒塗膜が耐候性に優れるので好ましい。 As the polymer particles according to the present embodiment, polymer emulsion particles obtained by a method such as emulsion polymerization can be used. Preferable examples thereof include acrylic emulsion particles and acrylic silicon emulsion particles obtained by a method such as emulsion polymerization. In particular, when polymer emulsion particles having a particle diameter of 10 to 800 nm obtained by polymerizing a hydrolyzable silicon compound and a vinyl monomer in the presence of water and an emulsifier are used, the resulting photocatalytic coating film is weather resistant. Since it is excellent in property, it is preferable.
本実施形態の重合体エマルジョン粒子を製造するのに用いる上記加水分解性珪素化合物としては、下記一般式(1)で表される化合物やその縮合生成物、シランカップリング剤を例示することができる。
SiWxRy (1)
(式中、Wは炭素数1〜20のアルコキシ基、水酸基、炭素数1〜20のアセトキシ基、ハロゲン原子、水素原子、炭素数1〜20のオキシム基、エノキシ基、アミノキシ基、及びアミド基から選ばれる少なくとも1種の基又は原子を表す。Rは、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び、置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種の基を表す。xは1以上4以下の整数であり、yは0以上3以下の整数である。また、x+y=4である。)
Examples of the hydrolyzable silicon compound used for producing the polymer emulsion particles of this embodiment include compounds represented by the following general formula (1), condensation products thereof, and silane coupling agents. .
SiW x R y (1)
Wherein W is an alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, an acetoxy group having 1 to 20 carbon atoms, a halogen atom, a hydrogen atom, an oxime group having 1 to 20 carbon atoms, an enoxy group, an aminoxy group, and an amide group. R represents at least one group or atom selected from: R is a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and unsubstituted. Or at least one group selected from an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, x is 1 or more. (It is an integer of 4 or less, and y is an integer of 0 to 3. Further, x + y = 4.)
ここでシランカップリング剤とは、ビニル重合性基、エポキシ基、アミノ基、メタクリル基、メルカプト基、イソシアネート基等の有機物と反応性を有する官能基が分子内に存在する、加水分解性珪素化合物を表す。 Here, the silane coupling agent is a hydrolyzable silicon compound in which a functional group having reactivity with an organic substance such as a vinyl polymerizable group, an epoxy group, an amino group, a methacryl group, a mercapto group, or an isocyanate group exists in the molecule. Represents.
上記珪素アルコキシド(上記一般式(1)で表される化合物やその縮合生成物のうちWがアルコキシ基のもの)及びシランカップリング剤の具体例としては、例えばテトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン、テトライソプロポキシシラン、テトラ−n−ブトキシシラン等のテトラアルコキシシラン類;メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、イソプロピルトリメトキシシラン、イソプロピルトリエトキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ペンチルトリメトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘプチルトリメトキシシラン、n−オクチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、シクロヘキシルトリメトキシシラン、シクロヘキシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3,3,3−トリフロロプロピルトリメトキシシラン、3,3,3−トリフロロプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、2−ヒドロキシエチルトリメトキシシラン、2−ヒドロキシエチルトリエトキシシラン、2−ヒドロキシプロピルトリメトキシシラン、2−ヒドロキシプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−イソシアナートプロピルトリメトキシシラン、3−イソシアナートプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−(メタ)アクリロイルオキシプロピルトリn−プロポキシシラン、3−(メタ)アクリロイルオキシプロピルトリイソプロポキシシラン、3−ウレイドプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシラン等のトリアルコキシシラン類;ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジイソプロピルジメトキシシラン、ジイソプロピルジエトキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ペンチルジメトキシシラン、ジ−n−ペンチルジエトキシシラン、ジ−n−ヘキシルジメトキシシラン、ジ−n−ヘキシルジエトキシシラン、ジ−n−ヘプチルジメトキシシラン、ジ−n−ヘプチルジエトキシシラン、ジ−n−オクチルジメトキシシラン、ジ−n−オクチルジエトキシシラン、ジ−n−シクロヘキシルジメトキシシラン、ジ−n−シクロヘキシルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、3−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン等のジアルコキシシラン類;トリメチルメトキシシラン、トリメチルエトキシシラン等のモノアルコキシシラン類等を挙げることができる。また、これらの珪素アルコキシドやシランカップリング剤は、1種を単独で又は2種以上を混合して使用することができる。 Specific examples of the silicon alkoxide (the compound represented by the general formula (1) and the condensation product thereof in which W is an alkoxy group) and the silane coupling agent include tetramethoxysilane, tetraethoxysilane, tetra -Tetraalkoxysilanes such as n-propoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane; methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane N-propyltriethoxysilane, isopropyltrimethoxysilane, isopropyltriethoxysilane, n-butyltrimethoxysilane, n-butyltriethoxysilane, n-pentyltrimethoxysilane, n-hexyltrimethoxysilane, n- Ptyltrimethoxysilane, n-octyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, cyclohexyltrimethoxysilane, cyclohexyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-chloro Propyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-amino Propyltriethoxysilane, 2-hydroxyethyltrimethoxysilane, 2-hydroxyethyltriethoxysilane, 2-hydroxypropyltrimethoxysilane, 2-hydroxypropyltriet Sisilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-isocyanatopropyltrimethoxysilane, 3-isocyanatopropyltriethoxy Silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxy Silane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyltri-n-propoxysilane, 3- ( Trialkoxysilanes such as (meth) acryloyloxypropyltriisopropoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane; dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, Di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, diisopropyldimethoxysilane, diisopropyldiethoxysilane, di-n-butyldimethoxysilane, di-n-butyldiethoxysilane, di-n-pentyldimethoxysilane Di-n-pentyldiethoxysilane, di-n-hexyldimethoxysilane, di-n-hexyldiethoxysilane, di-n-heptyldimethoxysilane, di-n-heptyldiethoxysilane Di-n-octyldimethoxysilane, di-n-octyldiethoxysilane, di-n-cyclohexyldimethoxysilane, di-n-cyclohexyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, 3- (meth) acryloyloxy Examples include dialkoxysilanes such as propylmethyldimethoxysilane; monoalkoxysilanes such as trimethylmethoxysilane and trimethylethoxysilane. These silicon alkoxides and silane coupling agents can be used alone or in combination of two or more.
上記珪素アルコキシドやシランカップリング剤が縮合生成物として使用されるとき、該縮合生成物のポリスチレン換算重量平均分子量は、好ましくは200〜5000、さらに好ましくは300〜1000である。上記珪素アルコキシドの中では、フェニル基を有する珪素アルコキシド、例えばフェニルトリメトキシシラン、フェニルトリエトキシシラン、ジフェニルジメトキシシランが、水及び乳化剤の存在下における重合安定性に優れるため、非常に好ましい。 When the silicon alkoxide or silane coupling agent is used as a condensation product, the condensation product preferably has a polystyrene equivalent weight average molecular weight of 200 to 5,000, more preferably 300 to 1,000. Among the silicon alkoxides, silicon alkoxides having a phenyl group, for example, phenyltrimethoxysilane, phenyltriethoxysilane, and diphenyldimethoxysilane are very preferable because they have excellent polymerization stability in the presence of water and an emulsifier.
本実施形態に用いることができる加水分解性珪素化合物の中で、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン、3−(メタ)アクリロイルオキシプロピルトリn−プロポキシシラン、3−(メタ)アクリロイルオキシプロピルトリイソプロポキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、2−トリメトキシシリルエチルビニルエーテル等のビニル重合性基を有するシランカップリング剤や、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン等のチオール基を有するシランカップリング剤は、ビニル単量体との共重合又は連鎖移動反応により化学結合を生成することが可能である。このため、ビニル重合性基やチオール基を有するシランカップリング剤を、単独で又は上述した珪素アルコキシド、シランカップリング剤、及びそれらの縮合生成物と混合若しくは複合化させて用いた場合、本実施形態の重合体エマルジョン粒子を構成する加水分解性珪素化合物の重合生成物とビニル単量体の重合生成物とは、化学結合により複合化できる。この様な重合体エマルジョン粒子を含有する光触媒塗膜は、耐候性、強度等に優れているため、非常に好ましい。 Among hydrolyzable silicon compounds that can be used in this embodiment, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyl Methyldimethoxysilane, 3- (meth) acryloyloxypropyltri-n-propoxysilane, 3- (meth) acryloyloxypropyltriisopropoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, 2-trimethoxy Silane coupling agents having a vinyl polymerizable group such as silylethyl vinyl ether and silane coupling agents having a thiol group such as 3-mercaptopropyltrimethoxysilane and 3-mercaptopropyltriethoxysilane are It is possible to generate a chemical bond by copolymerization or chain transfer reaction with. For this reason, when a silane coupling agent having a vinyl polymerizable group or a thiol group is used alone or mixed or compounded with the above-described silicon alkoxide, silane coupling agent, and their condensation products, The polymerized product of the hydrolyzable silicon compound and the polymerized product of the vinyl monomer constituting the polymer emulsion particles in the form can be combined by chemical bonding. A photocatalyst coating film containing such polymer emulsion particles is very preferable because it is excellent in weather resistance, strength and the like.
上記ビニル単量体としては、例えば、アクリル酸エステル、メタクリル酸エステル、芳香族ビニル化合物、シアン化ビニル類の他、カルボキシル基含有ビニル単量体、水酸基含有ビニル系単量体、グリシジル基含有ビニル単量体、カルボニル基含有ビニル単量体、2級及び/又は3級アミド基を有するビニル単量体、アニオン型ビニル単量体を挙げることができる。上記(メタ)アクリル酸エステルの例としては、アルキル部の炭素数が1〜50の(メタ)アクリル酸アルキルエステル、エチレンオキシド基の数が1〜100個の(ポリ)オキシエチレンジ(メタ)アクリレートが挙げられる。(メタ)アクリル酸エステルの具体例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ドデシルが挙げられる。(ポリ)オキシエチレンジ(メタ)アクリレートの具体例としては、ジ(メタ)アクリル酸エチレングリコール、ジ(メタ)アクリル酸ジエチレングリコール、メトキシ(メタ)アクリル酸ジエチレングリコール、ジ(メタ)アクリル酸テトラエチレングリコールが挙げられる。 Examples of the vinyl monomer include acrylic acid ester, methacrylic acid ester, aromatic vinyl compound, vinyl cyanide, carboxyl group-containing vinyl monomer, hydroxyl group-containing vinyl monomer, and glycidyl group-containing vinyl. Examples thereof include a monomer, a carbonyl group-containing vinyl monomer, a vinyl monomer having a secondary and / or tertiary amide group, and an anionic vinyl monomer. Examples of the (meth) acrylic acid ester include (meth) acrylic acid alkyl ester having 1 to 50 carbon atoms in the alkyl portion, and (poly) oxyethylene di (meth) acrylate having 1 to 100 ethylene oxide groups. Is mentioned. Specific examples of (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and methyl (meth) acrylate. Examples include cyclohexyl, cyclohexyl (meth) acrylate, lauryl (meth) acrylate, and dodecyl (meth) acrylate. Specific examples of (poly) oxyethylene di (meth) acrylate include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, diethylene glycol methoxy (meth) acrylate, tetraethylene glycol di (meth) acrylate Is mentioned.
なお、本明細書中で、(メタ)アクリルとはメタアクリル又はアクリルを簡便に表記したものである。 In the present specification, (meth) acrylic is a simple description of methacrylic or acrylic.
上記カルボキシル基含有ビニル単量体としては、例えば、アクリル酸、メタクリル酸、クロトン酸、イタコン酸、マレイン酸、フマール酸、無水マレイン酸、又はイタコン酸、マレイン酸、フマール酸などの2塩基酸のハーフエステルが挙げられる。カルボン酸基含有のビニル単量体を用いることによって、重合体エマルジョン粒子にカルボキシル基を導入することができ、エマルジョンとしての安定性を向上させ、外部からの分散破壊作用に抵抗力を持たせることが可能となる。この際、導入したカルボキシル基は、一部又は全部を、アンモニアやトリエチルアミン、ジメチルエタノールアミン等のアミン類やNaOH、KOH等の塩基で中和することもできる。 Examples of the carboxyl group-containing vinyl monomer include dibasic acids such as acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, maleic anhydride, or itaconic acid, maleic acid, and fumaric acid. A half ester is mentioned. By using a carboxylic acid group-containing vinyl monomer, a carboxyl group can be introduced into the polymer emulsion particles, improving the stability as an emulsion, and providing resistance to external dispersion destruction. Is possible. At this time, part or all of the introduced carboxyl group can be neutralized with an amine such as ammonia, triethylamine or dimethylethanolamine, or a base such as NaOH or KOH.
カルボキシル基含有ビニル単量体の使用量は、1種又は2種以上の混合物として、全ビニル単量体中において0〜50質量%であることが耐水性の面から好ましい。 It is preferable from the surface of water resistance that the usage-amount of a carboxyl group-containing vinyl monomer is 0-50 mass% in all the vinyl monomers as 1 type, or 2 or more types of mixtures.
また、上記水酸基含有ビニル単量体としては、例えば、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピリ(メタ)アクリレート、3−ヒドロキシプロピリ(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、3−ヒドロキシブチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート等の(メタ)アクリル酸のヒドロキシアルキルエステルや、ジ−2−ヒドロキシエチルフマレート、モノ−2−ヒドロキシエチルモノブチルフマレート、アリルアルコールやエチレンオキシド基の数が1〜100個の(ポリ)オキシエチレンモノ(メタ)アクリレート、プロピレンオキシド基の数が1〜100個の(ポリ)オキシプロピレンモノ(メタ)アクリレート、さらには、「プラクセルFM、FAモノマー」(ダイセル化学(株)製の、カプロラクトン付加モノマーの商品名)や、その他のα,β−エチレン性不飽和カルボン酸のヒドロキシアルキルエステル類を挙げることができる。上記(ポリ)オキシエチレンモノ(メタ)アクリレートの具体例としては、(メタ)アクリル酸エチレングリコール、メトキシ(メタ)アクリル酸エチレングリコール、(メタ)アクリル酸ジエチレングリコール、メトキシ(メタ)アクリル酸ジエチレングリコール、(メタ)アクリル酸テトラエチレングリコール、メトキシ(メタ)アクリル酸テトラエチレングリコールが挙げられる。また、(ポリ)オキシプロピレンモノ(メタ)アクリレートの具体例としては、(メタ)アクリル酸プロピレングリコール、メトキシ(メタ)アクリル酸プロピレングリコール、(メタ)アクリル酸ジプロピレングリコール、メトキシ(メタ)アクリル酸ジプロピレングリコール、(メタ)アクリル酸テトラプロピレングリコール、メトキシ(メタ)アクリル酸テトラプロピレングリコールが挙げられる。 Examples of the hydroxyl group-containing vinyl monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth). Hydroxyalkyl esters of (meth) acrylic acid such as acrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, di-2-hydroxyethyl fumarate, mono-2-hydroxyethyl monobutyl fuma (Poly) oxyethylene mono (meth) acrylate having 1 to 100 acrylates, allyl alcohol or ethylene oxide groups, (poly) oxypropylene mono (meth) acrylate having 1 to 100 propylene oxide groups, , "Plaxel FM, F Monomer "(manufactured by Daicel Chemical Industries, Ltd., trade name of caprolactone addition monomer) and other alpha, hydroxyalkyl esters of β- ethylenically unsaturated carboxylic acid. Specific examples of the (poly) oxyethylene mono (meth) acrylate include ethylene glycol (meth) acrylate, ethylene glycol methoxy (meth) acrylate, diethylene glycol (meth) acrylate, diethylene glycol methoxy (meth) acrylate, ( Examples thereof include tetraethylene glycol (meth) acrylate and tetraethylene glycol methoxy (meth) acrylate. Specific examples of (poly) oxypropylene mono (meth) acrylate include propylene glycol (meth) acrylate, propylene glycol methoxy (meth) acrylate, dipropylene glycol (meth) acrylate, and methoxy (meth) acrylic acid. Examples include dipropylene glycol, (meth) acrylic acid tetrapropylene glycol, and methoxy (meth) acrylic acid tetrapropylene glycol.
上述した水酸基含有ビニル単量体の使用量は、1種又は2種以上の混合物として、全ビニル単量体中において好ましくは0〜80質量%、より好ましくは0.1〜50質量%である。 The use amount of the hydroxyl group-containing vinyl monomer described above is preferably 0 to 80% by mass, more preferably 0.1 to 50% by mass in all vinyl monomers as one or a mixture of two or more. .
また、上記グリシジル基含有ビニル単量体としては、例えば、グリシジル(メタ)アクリレート、アリルグリシジルエーテル、アリルジメチルグリシジルエーテルを挙げることができる。グリシジル基含有ビニル単量体の使用量は、全ビニル単量体中において好ましくは0〜50質量%である。 Examples of the glycidyl group-containing vinyl monomer include glycidyl (meth) acrylate, allyl glycidyl ether, and allyl dimethyl glycidyl ether. The amount of the glycidyl group-containing vinyl monomer used is preferably 0 to 50% by mass in all vinyl monomers.
水酸基含有ビニル単量体、グリシジル基含有ビニル単量体や、カルボニル基含有ビニル単量体を使用すると、重合体エマルジョン粒子が反応性を有し、ヒドラジン誘導体やカルボン酸誘導体、イソシアネート誘導体等により架橋させて耐溶剤性等の優れた塗膜形成が可能となる。 When a hydroxyl group-containing vinyl monomer, a glycidyl group-containing vinyl monomer, or a carbonyl group-containing vinyl monomer is used, the polymer emulsion particles are reactive and crosslinked by hydrazine derivatives, carboxylic acid derivatives, isocyanate derivatives, etc. Thus, it is possible to form a coating film having excellent solvent resistance.
上記2級及び/又は3級アミド基を有するビニル単量体の例としては、N−アルキル又はN−アルキレン置換(メタ)アクリルアミドを例示することができ、具体的には、例えば、N−メチルアクリルアミド、N−メチルメタアクリルアミド、N−エチルアクリルアミド、N,N−ジメチルアクリルアミド、N,N−ジメチルメタアクリルアミド、N,N−ジエチルアクリルアミド、N−エチルメタアクリルアミド、N−メチル−N−エチルアクリルアミド、N−メチル−N−エチルメタアクリルアミド、N−イソプロピルアクリルアミド、N−n−プロピルアクリルアミド、N−イソプロピルメタアクリルアミド、N−n−プロピルメタアクリルアミド、N−メチル−N−n−プロピルアクリルアミド、N−メチル−N−イソプロピルアクリルアミド、N−アクリロイルピロリジン、N−メタクリロイルピロリジン、N−アクリロイルピペリジン、N−メタクリロイルピペリジン、N−アクリロイルヘキサヒドロアゼピン、N−アクリロイルモルホリン、N−メタクリロイルモルホリン、N−ビニルピロリドン、N−ビニルカプロラクタム、N,N’−メチレンビスアクリルアミド、N,N’−メチレンビスメタクリルアミド、N−ビニルアセトアミド、ダイアセトンアクリルアミド、ダイアセトンメタアクリルアミド、N−メチロールアクリルアミド、N−メチロールメタアクリルアミドを挙げることができる。 Examples of the vinyl monomer having a secondary and / or tertiary amide group include N-alkyl or N-alkylene-substituted (meth) acrylamide. Specifically, for example, N-methyl Acrylamide, N-methyl methacrylamide, N-ethyl acrylamide, N, N-dimethyl acrylamide, N, N-dimethyl methacrylamide, N, N-diethyl acrylamide, N-ethyl methacrylamide, N-methyl-N-ethyl acrylamide, N-methyl-N-ethylmethacrylamide, N-isopropylacrylamide, Nn-propylacrylamide, N-isopropylmethacrylamide, Nn-propylmethacrylamide, N-methyl-Nn-propylacrylamide, N-methyl -N-Isopropyl Aqua Luamide, N-acryloylpyrrolidine, N-methacryloylpyrrolidine, N-acryloylpiperidine, N-methacryloylpiperidine, N-acryloylhexahydroazepine, N-acryloylmorpholine, N-methacryloylmorpholine, N-vinylpyrrolidone, N-vinylcaprolactam, N , N′-methylenebisacrylamide, N, N′-methylenebismethacrylamide, N-vinylacetamide, diacetone acrylamide, diacetone methacrylamide, N-methylol acrylamide, and N-methylol methacrylamide.
上記以外のビニル単量体の具体例としては、例えば(メタ)アクリルアミド、エチレン、プロピレン、イソブチレン等のオレフィン類、ブタジエン等のジエン類、塩化ビニル、塩化ビニリデンフッ化ビニル、テトラフルオロエチレン、クロロトリフルオロエチレン等のハロオレフィン類、酢酸ビニル、プロピオン酸ビニル、n−酪酸ビニル、安息香酸ビニル、p−t−ブチル安息香酸ビニル、ピバリン酸ビニル、2−エチルヘキサン酸ビニル、バーサチック酸ビニル、ラウリン酸ビニル等のカルボン酸ビニルエステル類、酢酸イソプロペニル、プロピオン酸イソプロペニル等のカルボン酸イソプロペニルエステル類、エチルビニルエーテル、イソブチルビニルエーテル、シクロヘキシルビニルエーテル等のビニルエーテル類、スチレン、ビニルトルエン等の芳香族ビニル化合物、酢酸アリル、安息香酸アリル等のアリルエステル類、アリルエチルエーテル、アリルフェニルエーテル等のアリルエーテル類、さらに4−(メタ)アクリロイルオキシ−2,2,6,6,−テトラメチルピペリジン、4−(メタ)アクリロイルオキシ−1,2,2,6,6,−ペンタメチルピペリジン、パーフルオロメチル(メタ)アクリレート、パーフルオロプロピル(メタ)アクリレート、パーフルオロプロピロメチル(メタ)アクリレート、ビニルピロリドン、トリメチロールプロパントリ(メタ)アクリレート、(メタ)アクリル酸アリルやそれらの併用が挙げられる。 Specific examples of vinyl monomers other than those described above include, for example, olefins such as (meth) acrylamide, ethylene, propylene, and isobutylene, dienes such as butadiene, vinyl chloride, vinylidene chloride, tetrafluoroethylene, and chlorotri Haloolefins such as fluoroethylene, vinyl acetate, vinyl propionate, vinyl n-butyrate, vinyl benzoate, vinyl pt-butylbenzoate, vinyl pivalate, vinyl 2-ethylhexanoate, vinyl versatate, lauric acid Carboxylic acid vinyl esters such as vinyl, isopropenyl acetate, isopropenyl propionate, etc., vinyl ethers such as ethyl vinyl ether, isobutyl vinyl ether, cyclohexyl vinyl ether, styrene, vinyl Aromatic vinyl compounds such as toluene, allyl esters such as allyl acetate and allyl benzoate, allyl ethers such as allyl ethyl ether and allyl phenyl ether, and 4- (meth) acryloyloxy-2,2,6,6 -Tetramethylpiperidine, 4- (meth) acryloyloxy-1,2,2,6,6, -pentamethylpiperidine, perfluoromethyl (meth) acrylate, perfluoropropyl (meth) acrylate, perfluoropropyromethyl ( Examples thereof include (meth) acrylate, vinylpyrrolidone, trimethylolpropane tri (meth) acrylate, allyl (meth) acrylate, and combinations thereof.
本実施形態においては、ビニル単量体の重合生成物の分子量を制御する目的で、連鎖移動剤を使用してもよい。 In this embodiment, a chain transfer agent may be used for the purpose of controlling the molecular weight of the polymerization product of the vinyl monomer.
かかる連鎖移動剤の例としては、n−オクチルメルカプタン、n−ドデシルメルカプタン、t−ドデシルメルカプタンのようなアルキルメルカプタン類;ベンジルメルカプタン、ドデシルベンジルメルカプタンのような芳香族メルカプタン類;チオリンゴ酸のようなチオカルボン酸又はそれらの塩若しくはそれらのアルキルエステル類、又はポリチオール類、ジイソプロピルキサントゲンジスルフィド、ジ(メチレントリメチロールプロパン)キサントゲンジスルフィド及びチオグリコール、さらにはα−メチルスチレンのダイマー等のアリル化合物を挙げることができる。 Examples of such chain transfer agents include alkyl mercaptans such as n-octyl mercaptan, n-dodecyl mercaptan, t-dodecyl mercaptan; aromatic mercaptans such as benzyl mercaptan and dodecyl benzyl mercaptan; thiocarboxylic acids such as thiomalic acid. Examples thereof include allyl compounds such as acids or salts thereof or alkyl esters thereof, or polythiols, diisopropylxanthogen disulfide, di (methylenetrimethylolpropane) xanthogen disulfide and thioglycol, and α-methylstyrene dimer. .
これら連鎖移動剤は、全ビニル単量体に対して好ましくは0.001〜30質量%、さらに好ましくは0.05〜10質量%の範囲で用いることができる。 These chain transfer agents can be used in the range of preferably 0.001 to 30% by mass, more preferably 0.05 to 10% by mass with respect to the total vinyl monomers.
加水分解性珪素化合物に対するビニル単量体の質量比は、5/95〜95/5、好ましくは10/90〜90/10である。 The mass ratio of the vinyl monomer to the hydrolyzable silicon compound is 5/95 to 95/5, preferably 10/90 to 90/10.
本実施形態において、加水分解性珪素化合物としてビニル重合性基を有するシランカップリング剤を用いることが耐候性の面から特に好ましく、その配合量は重合体エマルジョン粒子100質量部に対して0.01質量部以上20質量部以下であることが重合安定性の面から好ましい。さらに好ましくは、0.1質量部以上10質量部以下である。 In the present embodiment, it is particularly preferable from the viewpoint of weather resistance to use a silane coupling agent having a vinyl polymerizable group as the hydrolyzable silicon compound, and its blending amount is 0.01 to 100 parts by mass of the polymer emulsion particles. It is preferable from the viewpoint of polymerization stability that it is not less than 20 parts by mass. More preferably, they are 0.1 mass part or more and 10 mass parts or less.
また、ビニル重合性基を有するシランカップリング剤の配合量は、ビニル単量体100質量部に対して0.1質量部以上100質量部以下であることが重合安定性の面から好ましい。 Moreover, it is preferable from the surface of superposition | polymerization stability that the compounding quantity of the silane coupling agent which has a vinyl polymerizable group is 0.1 to 100 mass parts with respect to 100 mass parts of vinyl monomers.
本実施形態においては、上述した加水分解性珪素化合物に環状シロキサンオリゴマーを併用して用いることが可能である。環状シロキサンオリゴマーの併用により、柔軟性等に優れた光触媒塗膜を形成することができる。 In this embodiment, it is possible to use a cyclic siloxane oligomer in combination with the hydrolyzable silicon compound described above. By using the cyclic siloxane oligomer in combination, a photocatalytic coating film excellent in flexibility and the like can be formed.
上記環状シロキサンオリゴマーとしては、下記一般式(2)で表される化合物を例示することができる。
(R’2SiO)m (2)
(式中、R’は、水素原子、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種を表す。mは整数であり、2≦m≦20である。)
As said cyclic siloxane oligomer, the compound represented by following General formula (2) can be illustrated.
(R ' 2 SiO) m (2)
(In the formula, R ′ is a hydrogen atom, a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an unsubstituted or substituted carbon atom having 1 to 30 carbon atoms. It represents at least one selected from an alkyl group having 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, m is an integer, and 2 ≦ m ≦ 20 is there.)
上記環状シロキサンオリゴマーの中で、反応性等の点からオクタメチルシクロテトラシロキサン等の環状ジメチルシロキサンオリゴマーが好ましい。 Among the cyclic siloxane oligomers, cyclic dimethylsiloxane oligomers such as octamethylcyclotetrasiloxane are preferable from the viewpoint of reactivity.
また、本実施形態において、上述した加水分解性珪素化合物にチタンアルコキシド、ジルコニウムアルコキシド、及びそれらの縮合生成物、または、それらのキレート化物を併用して用いることもできる。これらの化合物の併用により、耐水性、硬度等に優れた光触媒塗膜を形成することができる。 Moreover, in this embodiment, titanium alkoxide, zirconium alkoxide, and their condensation products, or those chelating products can also be used together with the hydrolyzable silicon compound mentioned above. By using these compounds in combination, a photocatalytic coating film excellent in water resistance, hardness and the like can be formed.
上記チタンアルコキシドの具体例としては、例えば、テトラメトキシチタン、テトラエトキシチタン、テトラ−i−プロポキシチタン、テトラ−n−プロポキシチタン、テトラ−n−ブトキシチタン、テトラ−sec−ブトキシチタン、テトラ−tert−ブトキシチタンが挙げられる。 Specific examples of the titanium alkoxide include, for example, tetramethoxy titanium, tetraethoxy titanium, tetra-i-propoxy titanium, tetra-n-propoxy titanium, tetra-n-butoxy titanium, tetra-sec-butoxy titanium, tetra-tert. -Butoxy titanium is mentioned.
上記チタンアルコキシドが縮合生成物として使用されるとき、該縮合生成物のポリスチレン換算重量平均分子量は、好ましくは200〜5000、さらに好ましくは300〜1000である。 When the titanium alkoxide is used as a condensation product, the weight average molecular weight in terms of polystyrene of the condensation product is preferably 200 to 5,000, more preferably 300 to 1,000.
また、上記ジルコニウムアルコキシドの具体例としては、テトラメトキシジルコニウム、テトラエトキシジルコニウム、テトラ−i−プロポキシジルコニウム、テトラ−n−プロポキシジルコニウム、テトラ−n−ブトキシジルコニウム、テトラ−sec−ブトキシジルコニウム、テトラ−tert−ブトキシジルコニウムが挙げられる。 Specific examples of the zirconium alkoxide include tetramethoxy zirconium, tetraethoxy zirconium, tetra-i-propoxy zirconium, tetra-n-propoxy zirconium, tetra-n-butoxy zirconium, tetra-sec-butoxy zirconium, tetra-tert. -Butoxyzirconium is mentioned.
上記ジルコニウムアルコキシドが縮合生成物として使用されるとき、該縮合生成物のポリスチレン換算重量平均分子量は、好ましくは200〜5000、さらに好ましくは300〜1000である。 When the zirconium alkoxide is used as a condensation product, the weight average molecular weight in terms of polystyrene of the condensation product is preferably 200 to 5,000, more preferably 300 to 1,000.
また、遊離の金属化合物(例えば、チタニウムアルコキシド及びジルコニウムアルコキシド)に配位させてキレート化物を形成するのに好ましいキレート化剤としては、ジエタノールアミン、トリエタノールアミン等のアルカノールアミン類;エチレングリコール、ジエチレングリコール、プロピレングリコール等のグリコール類;アセチルアセトン;アセト酢酸エチルなどであって分子量1万以下のものを例示することができる。これらのキレート化剤を用いることにより、加水分解性珪素化合物の重合速度を制御することができ、水及び乳化剤の存在下における重合安定性を優れたものにするため非常に好ましい。この際、キレート化剤は、これを配位させる遊離の金属化合物の金属原子1モル当たり、0.1モル〜2モルの割合で用いると効果が大きく好ましい。 Preferred chelating agents for coordination with free metal compounds (eg, titanium alkoxide and zirconium alkoxide) to form a chelate include alkanolamines such as diethanolamine and triethanolamine; ethylene glycol, diethylene glycol, Examples thereof include glycols such as propylene glycol; acetylacetone; ethyl acetoacetate and the like having a molecular weight of 10,000 or less. By using these chelating agents, the polymerization rate of the hydrolyzable silicon compound can be controlled, and this is very preferable because the polymerization stability in the presence of water and an emulsifier is excellent. In this case, the chelating agent is preferably used in a ratio of 0.1 mol to 2 mol per mol of the metal atom of the free metal compound that coordinates it.
本実施形態において、重合体エマルジョン粒子の合成に用いることができる乳化剤としては、例えば、アルキルベンゼンスルホン酸、アルキルスルホン酸、アルキルスルホコハク酸、ポリオキシエチレンアルキル硫酸、ポリオキシエチレンアルキルアリール硫酸、ポリオキシエチレンジスチリルフェニルエーテルスルホン酸等の酸性乳化剤、酸性乳化剤のアルカリ金属(Li、Na、K等)塩、酸性乳化剤のアンモニウム塩、脂肪酸石鹸等のアニオン性界面活性剤や、例えば、アルキルトリメチルアンモニウムブロミド、アルキルピリジニウムブロミド、イミダゾリニウムラウレート等の四級アンモニウム塩、ピリジニウム塩、イミダゾリニウム塩型のカチオン性界面活性剤、ポリオキシエチレンアルキルアリールエーテル、ポリオキシエチレンソルビタン脂肪酸エステル、ポリオキシエチレンオキシプロピレンブロックコポリマー、ポリオキシエチレンジスチリルフェニルエーテル等のノニオン型界面活性剤やラジカル重合性の二重結合を有する反応性乳化剤を例示することができる。 In this embodiment, as an emulsifier that can be used for the synthesis of polymer emulsion particles, for example, alkylbenzene sulfonic acid, alkyl sulfonic acid, alkyl sulfosuccinic acid, polyoxyethylene alkylsulfuric acid, polyoxyethylene alkylaryl sulfuric acid, polyoxyethylene Acidic emulsifiers such as distyrylphenyl ether sulfonic acid, alkali metal (Li, Na, K, etc.) salts of acidic emulsifiers, ammonium salts of acidic emulsifiers, anionic surfactants such as fatty acid soaps, for example, alkyltrimethylammonium bromide, Quaternary ammonium salts such as alkylpyridinium bromides, imidazolinium laurates, pyridinium salts, imidazolinium salt type cationic surfactants, polyoxyethylene alkylaryl ethers, polyoxyethylenes Nsorubitan fatty acid esters may be exemplified a reactive emulsifier having a polyoxyethylene polyoxypropylene block copolymer, a nonionic surfactant or a radically polymerizable such as polyoxyethylene distyryl phenyl ether double bond.
これらの乳化剤の中で、ラジカル重合性の二重結合を有する反応性乳化剤を選択すると、重合体エマルジョン粒子の水分散安定性が非常に良好になると共に、該重合体エマルジョン粒子を含有する光触媒塗膜は、耐候性、耐水性等に優れるため、非常に好ましい。 Among these emulsifiers, when a reactive emulsifier having a radical polymerizable double bond is selected, the water dispersion stability of the polymer emulsion particles becomes very good, and the photocatalyst coating containing the polymer emulsion particles is performed. The film is very preferable because it is excellent in weather resistance, water resistance and the like.
上記ラジカル重合性の二重結合を有する反応性乳化剤としては、例えば、スルホン酸基又はスルホネート基を有するビニル単量体、硫酸エステル基を有するビニル単量体やそれらのアルカリ金属塩、アンモニウム塩、ポリオキシエチレン等のノニオン基を有するビニル単量体、4級アンモニウム塩を有するビニル単量体を挙げることができる。 Examples of the reactive emulsifier having a radical polymerizable double bond include, for example, a vinyl monomer having a sulfonic acid group or a sulfonate group, a vinyl monomer having a sulfate group, an alkali metal salt thereof, an ammonium salt, Examples thereof include vinyl monomers having a nonionic group such as polyoxyethylene, and vinyl monomers having a quaternary ammonium salt.
上記反応性乳化剤の具体例として、スルホン酸基又はスルホネート基を有するビニル単量体の塩を例にとると、ラジカル重合性の二重結合を有し、かつスルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基により一部が置換された、炭素数1〜20のアルキル基、炭素数2〜4のアルキルエーテル基、炭素数2〜4のポリアルキルエーテル基、炭素数6又は10のアリール基及びコハク酸基からなる群から選ばれる置換基を有する化合物であるか、スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基が結合しているビニル基を有するビニルスルホネート化合物が挙げられる。硫酸エステル基を有するビニル単量体としては、例えば、ラジカル重合性の二重結合を有し、かつ硫酸エステル基のアンモニウム塩、ナトリウム塩又はカリウム塩である基により一部が置換された、炭素数1〜20のアルキル基、炭素数2〜4のアルキルエーテル基、炭素数2〜4のポリアルキルエーテル基及び炭素数6又は10のアリール基からなる群から選ばれる置換基を有する化合物が挙げられる。 As a specific example of the reactive emulsifier, taking a vinyl monomer salt having a sulfonic acid group or a sulfonate group as an example, it has a radical polymerizable double bond, and is an ammonium salt or sodium salt of a sulfonic acid group. Or an alkyl group having 1 to 20 carbon atoms, an alkyl ether group having 2 to 4 carbon atoms, a polyalkyl ether group having 2 to 4 carbon atoms, a 6 or 10 carbon atom, partially substituted with a group that is a potassium salt Examples thereof include a vinyl sulfonate compound having a substituent selected from the group consisting of an aryl group and a succinic acid group, or having a vinyl group to which a group of an ammonium salt, sodium salt or potassium salt of a sulfonic acid group is bonded. It is done. As the vinyl monomer having a sulfate ester group, for example, carbon having a radical polymerizable double bond and partially substituted by a group that is an ammonium salt, sodium salt or potassium salt of a sulfate ester group. Examples include compounds having a substituent selected from the group consisting of an alkyl group having 1 to 20 carbon atoms, an alkyl ether group having 2 to 4 carbon atoms, a polyalkyl ether group having 2 to 4 carbon atoms, and an aryl group having 6 or 10 carbon atoms. It is done.
上記スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基により一部が置換されたコハク酸基を有する化合物の具体例としては、アリルスルホコハク酸塩が挙げられる。これらの具体例として、例えば、エレミノールJS−2(商品名)(三洋化成(株)製)、ラテムルS−120、S−180A又はS−180(商品名)(花王(株)製)を挙げることができる。 Specific examples of the compound having a succinic acid group partially substituted with a group which is an ammonium salt, sodium salt or potassium salt of the sulfonic acid group include allylsulfosuccinate. Specific examples thereof include, for example, Eleminol JS-2 (trade name) (manufactured by Sanyo Kasei Co., Ltd.), Latemul S-120, S-180A or S-180 (trade name) (manufactured by Kao Corporation). be able to.
また、上記スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基により一部が置換された、炭素数2〜4のアルキルエーテル基又は炭素数2〜4のポリアルキルエーテル基を有する化合物の具体例として、例えばアクアロンHS−10又はKH−1025(商品名)(第一工業製薬(株)製)、アデカリアソープSE−1025N又はSR−1025(商品名)(旭電化工業(株)製)を挙げることができる。 Further, a compound having an alkyl ether group having 2 to 4 carbon atoms or a polyalkyl ether group having 2 to 4 carbon atoms, which is partially substituted by a group which is an ammonium salt, sodium salt or potassium salt of the sulfonic acid group. As specific examples, for example, Aqualon HS-10 or KH-1025 (trade name) (Daiichi Kogyo Seiyaku Co., Ltd.), Adekaria Soap SE-1025N or SR-1025 (trade name) (Asahi Denka Kogyo Co., Ltd.) ).
その他、スルホネート基により一部が置換されたアリール基を有する化合物の具体例として、p−スチレンスルホン酸のアンモニウム塩、ナトリウム塩及びカリウム塩が挙げられる。 Other specific examples of the compound having an aryl group partially substituted with a sulfonate group include ammonium salt, sodium salt and potassium salt of p-styrenesulfonic acid.
上記スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基が結合しているビニル基を有するビニルスルホネート化合物として、例えば、2−スルホエチルアクリレート等のアルキルスルホン酸(メタ)アクリレートやメチルプロパンスルホン酸(メタ)アクリルアミド、アリルスルホン酸等のアンモニウム塩、ナトリウム塩及びカリウム塩が挙げられる。 Examples of the vinyl sulfonate compound having a vinyl group to which the ammonium salt, sodium salt or potassium salt of the sulfonic acid group is bonded include, for example, alkyl sulfonic acid (meth) acrylates such as 2-sulfoethyl acrylate and methylpropane sulfone. Examples thereof include ammonium salts such as acid (meth) acrylamide and allyl sulfonic acid, sodium salts, and potassium salts.
また、上記の硫酸エステル基のアンモニウム塩、ナトリウム塩又はカリウム塩により一部が置換された炭素数2〜4のアルキルエーテル基又は炭素数2〜4のポリアルキエーテル基を有する化合物としては、例えばスルホネート基により一部が置換されたアルキルエーテル基を有する化合物が挙げられる。 Examples of the compound having an alkyl ether group having 2 to 4 carbon atoms or a polyalkyl ether group having 2 to 4 carbon atoms partially substituted with the ammonium salt, sodium salt or potassium salt of the sulfate ester group include, for example, Examples thereof include compounds having an alkyl ether group partially substituted with a sulfonate group.
また、ノニオン基を有するビニル単量体の具体例としては、α−〔1−〔(アリルオキシ)メチル〕−2−(ノニルフェノキシ)エチル〕−ω−ヒドロキシポリオキシエチレン(商品名:アデカリアソープNE−20、NE−30、NE−40等、旭電化工業(株)製)、ポリオキシエチレンアルキルプロペニルフェニルエーテル(商品名:アクアロンRN−10、RN−20、RN−30、RN−50等、第一製薬工業(株)製)を挙げることができる。 In addition, specific examples of vinyl monomers having a nonionic group include α- [1-[(allyloxy) methyl] -2- (nonylphenoxy) ethyl] -ω-hydroxypolyoxyethylene (trade name: ADEKA rear soap). NE-20, NE-30, NE-40, etc., manufactured by Asahi Denka Kogyo Co., Ltd.), polyoxyethylene alkylpropenyl phenyl ether (trade names: Aqualon RN-10, RN-20, RN-30, RN-50, etc.) , Daiichi Pharmaceutical Industry Co., Ltd.).
上記乳化剤の使用量としては、重合体エマルジョン粒子100質量部に対して、10質量部以下となる範囲内が適切であり、なかでも、0.001〜5質量部となる範囲内が好ましい。 As the usage-amount of the said emulsifier, the inside of the range used as 10 mass parts or less with respect to 100 mass parts of polymer emulsion particle | grains is suitable, Especially, it exists within the range used as 0.001-5 mass parts.
また、上記乳化剤以外に、重合体エマルジョン粒子の水分散安定性を向上させる目的で分散安定剤を使用することもできる。該分散安定剤としては、ポリカルボン酸及びスルホン酸塩からなる群から選ばれる各種の水溶性オリゴマー類や、ポリビニルアルコール、ヒドロキシエチルセルロース、澱粉、マレイン化ポリブタジエン、マレイン化アルキッド樹脂、ポリアクリル酸(塩)、ポリアクリルアミド、水溶性又は水分散性アクリル樹脂などの合成又は天然の水溶性又は水分散性の各種の水溶性高分子物質が挙げられ、これらの1種又は2種以上の混合物を使用することができる。 In addition to the above emulsifiers, a dispersion stabilizer can also be used for the purpose of improving the water dispersion stability of the polymer emulsion particles. Examples of the dispersion stabilizer include various water-soluble oligomers selected from the group consisting of polycarboxylic acids and sulfonates, polyvinyl alcohol, hydroxyethyl cellulose, starch, maleated polybutadiene, maleated alkyd resin, polyacrylic acid (salt ), Synthetic or natural water-soluble or water-dispersible water-soluble polymer substances such as polyacrylamide, water-soluble or water-dispersible acrylic resin, etc., and one or a mixture of two or more of these are used. be able to.
これらの分散安定剤を使用する場合、その使用量としては、重合体エマルジョン粒子100質量部に対して、10質量部以下となる範囲内が適切であり、なかでも、0.001〜5質量部となる範囲内が好ましい。 When these dispersion stabilizers are used, the amount used is suitably within 10 parts by mass or less with respect to 100 parts by mass of the polymer emulsion particles, and in particular, 0.001 to 5 parts by mass. Within the range is preferable.
本実施形態において、加水分解性珪素化合物及びビニル単量体の重合は、重合触媒存在下で実施するのが好ましい。 In the present embodiment, the polymerization of the hydrolyzable silicon compound and the vinyl monomer is preferably performed in the presence of a polymerization catalyst.
ここで、加水分解性珪素化合物の重合触媒としては、塩酸、フッ酸等のハロゲン化水素類、酢酸、トリクロル酢酸、トリフルオロ酢酸、乳酸等のカルボン酸類、硫酸、p−トルエンスルホン酸等のスルホン酸類、アルキルベンゼンスルホン酸、アルキルスルホン酸、アルキルスルホコハク酸、ポリオキシエチレンアルキル硫酸、ポリオキシエチレンアルキルアリール硫酸、ポリオキシエチレンジスチリルフェニルエーテルスルホン酸等の酸性乳化剤類、酸性又は弱酸性の無機塩、フタル酸、リン酸、硝酸のような酸性化合物類;水酸化ナトリウム、水酸化カリウム、ナトリウムメチラート、酢酸ナトリウム、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムヒドロキシド、トリブチルアミン、ジアザビシクロウンデセン、エチレンジアミン、ジエチレントリアミン、エタノールアミン類、γ−アミノプロピルトリメトキシシラン、γ−(2−アミノエチル)−アミノプロピルトリメトキシシランのような塩基性化合物類;ジブチル錫オクチレート、ジブチル錫ジラウレートのような錫化合物を挙げることができる。 Here, as a polymerization catalyst for the hydrolyzable silicon compound, hydrogen halides such as hydrochloric acid and hydrofluoric acid, carboxylic acids such as acetic acid, trichloroacetic acid, trifluoroacetic acid and lactic acid, sulfones such as sulfuric acid and p-toluenesulfonic acid, etc. Acids, alkylbenzenesulfonic acid, alkylsulfonic acid, alkylsulfosuccinic acid, polyoxyethylene alkylsulfuric acid, polyoxyethylene alkylarylsulfuric acid, polyoxyethylene distyrylphenyl ether sulfonic acid and other acidic emulsifiers, acidic or weakly acidic inorganic salts, Acidic compounds such as phthalic acid, phosphoric acid, nitric acid; sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, tetramethylammonium chloride, tetramethylammonium hydroxide, tributylamine, diazabicycloundecene, ethyl Basic compounds such as diamine, diethylenetriamine, ethanolamine, γ-aminopropyltrimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane; tin compounds such as dibutyltin octylate and dibutyltin dilaurate Can be mentioned.
これらの中で、加水分解性珪素化合物の重合触媒としては、重合触媒のみならず乳化剤としての作用を有する酸性乳化剤類、特に炭素数が5〜30のアルキルベンゼンスルホン酸(ドデシルベンゼンスルホン酸等)が非常に好ましい。 Among these, as a polymerization catalyst for a hydrolyzable silicon compound, not only a polymerization catalyst but also an acidic emulsifier having an action as an emulsifier, particularly an alkylbenzene sulfonic acid having 5 to 30 carbon atoms (such as dodecylbenzene sulfonic acid). Highly preferred.
一方、ビニル単量体の重合触媒としては、熱又は還元性物質などによってラジカル分解してビニル単量体の付加重合を起こさせるラジカル重合触媒が好適であり、水溶性又は油溶性の過硫酸塩、過酸化物、アゾビス化合物等が使用される。その例としては、過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム、過酸化水素、t−ブチルヒドロパーオキシド、t−ブチルパーオキシベンゾエート、2,2−アゾビスイソブチロニトリル、2,2−アゾビス(2−ジアミノプロパン)ヒドロクロリド、2,2−アゾビス(2,4−ジメチルバレロニトリル)が挙げられ、その配合量としては全ビニル単量体100質量部に対して、0.001〜5質量部が好ましい。なお、重合速度の促進、及び70℃以下での低温の重合を望むときには、例えば、重亜硫酸ナトリウム、塩化第一鉄、アスコルビン酸塩、ロンガリット等の還元剤をラジカル重合触媒と組み合わせて用いると有利である。加水分解性珪素化合物及びビニル単量体の重合は、別々に実施することも可能であるが、同時に実施することにより有機・無機複合化が達成できるので好ましい。 On the other hand, as the polymerization catalyst for the vinyl monomer, a radical polymerization catalyst that causes radical polymerization by heat or a reducing substance to cause addition polymerization of the vinyl monomer is preferable, and is a water-soluble or oil-soluble persulfate. Peroxides, azobis compounds and the like are used. Examples include potassium persulfate, sodium persulfate, ammonium persulfate, hydrogen peroxide, t-butyl hydroperoxide, t-butyl peroxybenzoate, 2,2-azobisisobutyronitrile, 2,2-azobis. (2-diaminopropane) hydrochloride and 2,2-azobis (2,4-dimethylvaleronitrile) are mentioned, and the blending amount is 0.001 to 5 mass with respect to 100 mass parts of the total vinyl monomer. Part is preferred. When acceleration of the polymerization rate and low temperature polymerization at 70 ° C. or lower are desired, it is advantageous to use a reducing agent such as sodium bisulfite, ferrous chloride, ascorbate, or longalite in combination with the radical polymerization catalyst. It is. Polymerization of the hydrolyzable silicon compound and the vinyl monomer can be carried out separately, but it is preferable because the organic / inorganic composite can be achieved by carrying out the polymerization simultaneously.
本実施形態において、重合体エマルジョン粒子の粒子径が10〜800nmであることが好ましい。この様な粒子径の範囲に調整し、粒子径が100nm以下のコロイダルシリカと組み合わせた光触媒塗膜は、耐候性、防汚性等に特に優れていて好ましい。また、重合体エマルジョン粒子の粒子径は数平均粒子径で30〜300nmであると、得られる塗膜の透明性が向上し、より好ましい。重合体エマルジョン粒子の粒子径は下記実施例に記載の方法に準拠して測定される。 In the present embodiment, it is preferable that the particle diameter of the polymer emulsion particles is 10 to 800 nm. A photocatalyst coating film adjusted to such a particle diameter range and combined with colloidal silica having a particle diameter of 100 nm or less is particularly excellent in weather resistance, antifouling property and the like, and is preferable. The particle diameter of the polymer emulsion particles is more preferably 30 to 300 nm in terms of number average particle diameter because the transparency of the resulting coating film is improved. The particle diameter of the polymer emulsion particles is measured according to the method described in the following examples.
このような粒子径の重合体エマルジョン粒子を得る方法として、乳化剤がミセルを形成するのに十分な量の水の存在下に加水分解性珪素化合物及びビニル単量体を重合する、いわゆる乳化重合が最も適した方法である。 As a method for obtaining polymer emulsion particles having such a particle size, so-called emulsion polymerization in which an emulsifier polymerizes a hydrolyzable silicon compound and a vinyl monomer in the presence of a sufficient amount of water to form micelles. This is the most suitable method.
乳化重合のやり方(方法)としては、例えば、加水分解性珪素化合物及びビニル単量体は、そのまま、又は乳化した状態で、一括若しくは分割で、又は連続的に反応容器中に滴下し、前記重合触媒の存在下、好ましくは大気圧から必要により10MPaの圧力下で、約30〜150℃の反応温度で重合させればよい。場合によっては、これ以上の圧力で、又はこれ以下の温度条件で重合を行っても差し支えない。加水分解性珪素化合物及び全ビニル単量体の総量と水との比率は最終固形分量が0.1〜70質量%、好ましくは1〜55質量%の範囲になるように設定するのが好ましい。また、乳化重合をするにあたり粒子径を成長又は制御させるために、予め水相中にエマルジョン粒子を存在させて重合させるシード重合法によってもよい。重合反応は、系中のpHが好ましくは1.0〜10.0、より好ましくは1.0〜6.0の範囲で進行させればよい。pHは、燐酸二ナトリウムやボラックス、又は、炭酸水素ナトリウム、アンモニアなどのpH緩衝剤を用いて調節することが可能である。 As a method (method) of the emulsion polymerization, for example, the hydrolyzable silicon compound and the vinyl monomer are dropped into the reaction vessel as they are or in an emulsified state, all at once or in a divided manner, or continuously. The polymerization may be performed at a reaction temperature of about 30 to 150 ° C. in the presence of a catalyst, preferably from atmospheric pressure to a pressure of 10 MPa if necessary. In some cases, the polymerization may be carried out at a higher pressure or lower temperature. The ratio between the total amount of the hydrolyzable silicon compound and all vinyl monomers and water is preferably set so that the final solid content is in the range of 0.1 to 70% by mass, preferably 1 to 55% by mass. Further, in order to grow or control the particle diameter in carrying out emulsion polymerization, a seed polymerization method in which emulsion particles are preliminarily present in an aqueous phase may be used. The polymerization reaction may be allowed to proceed in the range of pH in the system of preferably 1.0 to 10.0, more preferably 1.0 to 6.0. The pH can be adjusted using a pH buffer such as disodium phosphate, borax, sodium hydrogen carbonate, or ammonia.
本実施形態において、重合体エマルジョン粒子が2層以上の層から形成されるコア/シェル構造であると、該重合体エマルジョン粒子を含有する光触媒塗膜は機械的物性(強度と柔軟性のバランス等)に優れて好ましい。 In this embodiment, when the polymer emulsion particles have a core / shell structure formed of two or more layers, the photocatalytic coating film containing the polymer emulsion particles has mechanical properties (such as a balance between strength and flexibility). ) And is preferable.
上記コア/シェル構造の重合体エマルジョン粒子を製造する方法として、多段乳化重合が非常に有用である。 Multi-stage emulsion polymerization is very useful as a method for producing the polymer emulsion particles having the core / shell structure.
ここで、多段乳化重合とは、2種類以上の異なった組成の加水分解性珪素化合物やビニル単量体を調製し、これらを別々の段階に分けて重合することを意味する。 Here, the multistage emulsion polymerization means that two or more kinds of hydrolyzable silicon compounds and vinyl monomers having different compositions are prepared and polymerized in separate stages.
以下に、多段乳化重合の中で最も単純で有用な2段乳化重合による重合体エマルジョン粒子の合成を例に、本実施形態の多段乳化重合による重合体エマルジョン粒子の合成について説明する。 Hereinafter, the synthesis of polymer emulsion particles by multi-stage emulsion polymerization according to this embodiment will be described by taking the synthesis of polymer emulsion particles by 2-stage emulsion polymerization as the simplest and most useful among multi-stage emulsion polymerizations as an example.
本実施形態において、2段乳化重合による重合体エマルジョン粒子の合成として、例えば水及び乳化剤の存在下にビニル単量体及び/又は加水分解性珪素化合物を重合して得られるシード粒子の存在下に、加水分解性珪素化合物及び/又はビニル単量体を重合する方法を例示できる。 In this embodiment, as the synthesis of polymer emulsion particles by two-stage emulsion polymerization, for example, in the presence of seed particles obtained by polymerizing a vinyl monomer and / or a hydrolyzable silicon compound in the presence of water and an emulsifier. A method of polymerizing a hydrolyzable silicon compound and / or a vinyl monomer can be exemplified.
上記2段乳化重合による重合体エマルジョン粒子の合成は、第1系列(ビニル単量体及び/又は加水分解性金属化合物)を供給して乳化重合する第1段の重合と、第1段に引き続き、第2系列(ビニル単量体及び/又は加水分解性金属化合物)を供給し、水性媒体中において乳化重合する第2段の重合からなる2段階の重合工程により行われる。この際、第1系列中の固形分質量(M1)と第2系列中の固形分質量(M2)との質量比は、好ましくは(M1)/(M2)=9/1〜1/9、より好ましくは8/2〜2/8である。 The synthesis of the polymer emulsion particles by the above-mentioned two-stage emulsion polymerization consists of the first stage polymerization in which the first series (vinyl monomer and / or hydrolyzable metal compound) is supplied and emulsion polymerization, and the first stage. The second series (vinyl monomer and / or hydrolyzable metal compound) is supplied, and this is carried out by a two-stage polymerization process comprising a second stage polymerization in which emulsion polymerization is carried out in an aqueous medium. At this time, the mass ratio of the solid content mass (M1) in the first series to the solid content mass (M2) in the second series is preferably (M1) / (M2) = 9/1 to 1/9, More preferably, it is 8/2 to 2/8.
本実施形態において、好ましいコア/シェル構造の重合体の特徴は、第1段の重合で得られたシード粒子の粒子径が、粒径分布(体積平均粒子径/数平均粒子径)の大きな変化なしに(好ましくは単分散の状態で)、第2段の重合によって大きくなる(粒子径の増大)ことを挙げることができる。 In the present embodiment, the polymer having a preferable core / shell structure is characterized in that the particle size of the seed particles obtained by the first stage polymerization changes greatly in the particle size distribution (volume average particle size / number average particle size). Without (preferably in a monodispersed state), it can be increased (increase in particle size) by the second stage polymerization.
また、コア/シェル構造の確認は、例えば、透過型電子顕微鏡等による形態観察や粘弾性測定による解析等により実施することが可能である。 The core / shell structure can be confirmed by, for example, morphological observation with a transmission electron microscope, analysis by viscoelasticity measurement, or the like.
本実施形態において、3段以上の多段乳化重合を実施する場合は、上述した2段重合による重合体エマルジョン粒子の合成例を参考に、重合する系列の数を増加させればよい。 In the present embodiment, when multi-stage emulsion polymerization of three or more stages is performed, the number of series to be polymerized may be increased with reference to the synthesis example of the polymer emulsion particles by the two-stage polymerization described above.
重合体エマルジョン粒子の配合量は、光触媒塗膜全体に対する質量%として0超〜70%であることが好ましい。より好ましくは、1〜60%であり、さらに好ましくは5〜50%である。 The blending amount of the polymer emulsion particles is preferably more than 0 to 70% as mass% with respect to the entire photocatalyst coating film. More preferably, it is 1-60%, More preferably, it is 5-50%.
本実施形態に係る上記光触媒用金属化合物以外の金属酸化物粒子(B2)としては、例えば、二酸化ケイ素(シリカ)粒子、酸化アルミニウム(アルミナ)粒子、珪酸カルシウム粒子、酸化マグネシウム粒子、酸化アンチモン粒子、酸化ジルコニウム粒子及びそれらの複合酸化物粒子が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いられる。それらの中でも、表面水酸基が多く、金属酸化物粒子の表面積が大きくなり、金属酸化物粒子同士の結合、又は金属酸化物と重合体粒子との結合を強固にするという観点から、二酸化ケイ素粒子、酸化アルミニウム粒子、酸化アンチモン粒子及びそれらの複合酸化物粒子が好ましく、二酸化ケイ素を基本単位とするシリカの溶媒中の分散体であるコロイダルシリカ粒子がより好ましい。 Examples of the metal oxide particles (B2) other than the metal compound for photocatalyst according to the present embodiment include silicon dioxide (silica) particles, aluminum oxide (alumina) particles, calcium silicate particles, magnesium oxide particles, antimony oxide particles, Examples thereof include zirconium oxide particles and composite oxide particles thereof. These are used singly or in combination of two or more. Among them, from the viewpoint of increasing the surface hydroxyl groups, increasing the surface area of the metal oxide particles, and strengthening the bond between the metal oxide particles or the bond between the metal oxide and the polymer particles, the silicon dioxide particles, Aluminum oxide particles, antimony oxide particles and composite oxide particles thereof are preferable, and colloidal silica particles which are a dispersion in a solvent of silica having silicon dioxide as a basic unit are more preferable.
コロイダルシリカは、ゾル−ゲル法で調製して使用することもでき、市販品を利用することもできる。ゾル−ゲル法で調製する場合には、Werner Stober etal;J.Colloid and Interface Sci.,26,62−69(1968)、Rickey D.Badley et al;Lang muir 6,792−801(1990)、色材協会誌,61[9]488−493(1988)などを参照することができる。水を分散媒体とする酸性のコロイダルシリカとしては、例えば、市販品として日産化学工業(株)製スノーテックス(商標)−O、スノーテックス−OS、旭電化工業(株)製アデライト(商標)AT−20Q、クラリアントジャパン(株)製クレボゾール(商標)20H12、クレボゾール30CAL25などが利用できる。 Colloidal silica can be prepared and used by a sol-gel method, and a commercially available product can also be used. For preparation by the sol-gel method, Werner Stober et al; Colloid and Interface Sci. , 26, 62-69 (1968), Rickey D .; Badley et al; Lang muir 6, 792-801 (1990), Color Material Association Journal, 61 [9] 488-493 (1988), and the like. Examples of the acidic colloidal silica using water as a dispersion medium include, as commercial products, Snowtex (trademark) -O manufactured by Nissan Chemical Industries, Ltd., Snowtex-OS, Adelite (trademark) AT manufactured by Asahi Denka Kogyo Co., Ltd. -20Q, Clariant Japan K.K. clebosol (trademark) 20H12, clebosol 30CAL25, etc. can be used.
塩基性のコロイダルシリカとしては、アルカリ金属イオン、アンモニウムイオン、アミンの添加で安定化したシリカがあり、例えば、日産化学工業(株)製スノーテックス−20、スノーテックス−30、スノーテックス−C、スノーテックス−C30、スノーテックス−CM40、スノーテックス−N、スノーテックス−N30、スノーテックス−K、スノーテックス−XL、スノーテックス−YL、スノーテックス−ZL、スノーテックスPS−M、スノーテックスPS−Lなど;旭電化工業(株)製アデライトAT−20、アデライトAT−30、アデライトAT−20N、アデライトAT−30N、アデライトAT−20A、アデライトAT−30A、アデライトAT−40、アデライトAT−50など;クラリアントジャパン(株)製クレボゾール30R9、クレボゾール30R50、クレボゾール50R50など、デュポン社製ルドックス(商標)HS−40、ルドックスHS−30、ルドックスLS、ルドックスSM−30を挙げることができる。 Examples of basic colloidal silica include silica stabilized by addition of alkali metal ions, ammonium ions, and amines, such as SNOWTEX-20, SNOWTEX-30, SNOWTEX-C, manufactured by Nissan Chemical Industries, Ltd. SNOWTEX-C30, SNOWTEX-CM40, SNOWTEX-N, SNOWTEX-N30, SNOWTEX-K, SNOWTEX-XL, SNOWTEX-YL, SNOWTEX-ZL, SNOWTEX PS-M, SNOWTEX PS- L, etc .; Adelite AT-20, Adelite AT-30, Adelite AT-20N, Adelite AT-30N, Adelite AT-20A, Adelite AT-30A, Adelite AT-40, Adelite AT-50, etc. ; Clariant Japan Co., Ltd. Ltd. Kurebozoru 30R9, Kurebozoru 30R50, such Kurebozoru 50R50, DuPont Ludox (TM) HS-40, Ludox HS-30, Ludox LS, mention may be made of Ludox SM-30.
また、水溶性溶媒を分散媒体とするコロイダルシリカとしては、例えば、日産化学工業(株)製MA−ST−M(粒子径が20〜25nmのメタノール分散タイプ)、IPA−ST(粒子径が10〜15nmのイソプロピルアルコール分散タイプ)、EG−ST(粒子径が10〜15nmのエチレングリコール分散タイプ)、EG−ST−ZL(粒子径が70〜100nmのエチレングリコール分散タイプ)、NPC−ST(粒子径が10〜15nmのエチレングリコールモノプロピルエーテール分散タイプ)を挙げることができる。 Further, as colloidal silica using a water-soluble solvent as a dispersion medium, for example, MA-ST-M (methanol dispersion type having a particle diameter of 20 to 25 nm), IPA-ST (particle diameter of 10) manufactured by Nissan Chemical Industries, Ltd. ˜15 nm isopropyl alcohol dispersion type), EG-ST (ethylene glycol dispersion type with particle diameter of 10 to 15 nm), EG-ST-ZL (ethylene glycol dispersion type with particle diameter of 70 to 100 nm), NPC-ST (particles) And ethylene glycol monopropyl ether dispersion type) having a diameter of 10 to 15 nm.
また、これらコロイダルシリカは1種又は2種類以上組み合わせてもよい。コロイダルシリカは、少量成分として、アルミナ、アルミン酸ナトリウムなどを含んでいてもよい。また、コロイダルシリカは、安定剤として無機塩基(水酸化ナトリウム、水酸化カリウム、水酸化リチウム、アンモニアなど)や有機塩基(テトラメチルアンモニウムなど)を含んでいてもよい。金属酸化物粒子(B2)の粒子径は、平均で100nm以下であることが好ましい。さらに好ましくは、50nm以下であり、よりさらに好ましくは20nmである。粒子径が平均で10nm以下の金属酸化物粒子(B2)を用いると、得られる光触媒塗膜の透明性が非常に高く、最も好ましい。金属酸化物粒子(B2)の粒子径(数平均粒子径)は、下記実施例に記載の方法に準拠して測定される。 These colloidal silicas may be used alone or in combination of two or more. Colloidal silica may contain alumina, sodium aluminate or the like as a minor component. Colloidal silica may contain an inorganic base (such as sodium hydroxide, potassium hydroxide, lithium hydroxide, or ammonia) or an organic base (such as tetramethylammonium) as a stabilizer. The average particle diameter of the metal oxide particles (B2) is preferably 100 nm or less. More preferably, it is 50 nm or less, More preferably, it is 20 nm. Use of metal oxide particles (B2) having an average particle size of 10 nm or less is most preferable because the resulting photocatalyst coating film has very high transparency. The particle diameter (number average particle diameter) of the metal oxide particles (B2) is measured according to the method described in the following examples.
本実施形態の光触媒塗膜の膜厚は特に限定されないが、0.05〜100μmであることが好ましく、0.1〜10μmであることがより好ましく、1.0〜2.5μmであることが更に好ましい。この厚さが100μm以下であることにより、良好な透明性を確保することができ、0.05μm以上であることにより、防汚性、光触媒活性等の機能をより有効に発現することができる。 Although the film thickness of the photocatalyst coating film of this embodiment is not specifically limited, It is preferable that it is 0.05-100 micrometers, It is more preferable that it is 0.1-10 micrometers, It is 1.0-2.5 micrometers. Further preferred. When the thickness is 100 μm or less, good transparency can be secured, and when the thickness is 0.05 μm or more, functions such as antifouling properties and photocatalytic activity can be more effectively expressed.
本実施形態の光触媒塗膜には、そこに含まれる各粒子の分散安定性の観点から、分散安定剤が含まれていてもよい。分散安定剤としては、例えば、ポリカルボン酸及びスルホン酸塩からなる群から選ばれる各種の水溶性オリゴマー類、ポリビニルアルコール、ヒドロキシエチルセルロース、澱粉、マレイン化ポリブタジエン、マレイン化アルキッド樹脂、ポリアクリル酸(塩)、ポリアクリルアミド、アクリル樹脂に代表される合成若しくは天然の各種の高分子物質が挙げられる。分散安定剤は、1種を単独で又は2種以上を混合して用いられる。 The photocatalyst coating film of the present embodiment may contain a dispersion stabilizer from the viewpoint of dispersion stability of each particle contained therein. Examples of the dispersion stabilizer include various water-soluble oligomers selected from the group consisting of polycarboxylic acids and sulfonates, polyvinyl alcohol, hydroxyethyl cellulose, starch, maleated polybutadiene, maleated alkyd resin, polyacrylic acid (salt ), Various synthetic or natural polymer materials represented by polyacrylamide and acrylic resins. A dispersion stabilizer is used individually by 1 type or in mixture of 2 or more types.
また、本実施形態の光触媒塗膜には、その用途及び使用方法などに応じて、通常の塗料や成型用樹脂に添加配合される成分、例えば、溶剤、増粘剤、レベリング剤、チクソ化剤、消泡剤、凍結安定剤、艶消し剤、架橋反応触媒、顔料、硬化触媒、架橋剤、充填剤、皮張り防止剤、分散剤、湿潤剤、光安定剤、酸化防止剤、紫外線吸収剤、レオロジーコントロール剤、消泡剤、成膜助剤、防錆剤、染料、可塑剤、潤滑剤、還元剤、防腐剤、防黴剤、消臭剤、黄変防止剤、静電防止剤又は帯電調製剤等が含まれていてもよい。 In addition, the photocatalyst coating film of the present embodiment has components added to and blended with ordinary paints and molding resins, for example, a solvent, a thickener, a leveling agent, and a thixotropic agent, depending on the application and method of use. , Antifoaming agent, Freezing stabilizer, Matting agent, Crosslinking reaction catalyst, Pigment, Curing catalyst, Crosslinking agent, Filler, Anti-skinning agent, Dispersant, Wetting agent, Light stabilizer, Antioxidant, UV absorber , Rheology control agent, antifoaming agent, film forming aid, rust preventive agent, dye, plasticizer, lubricant, reducing agent, preservative, antifungal agent, deodorant, anti-yellowing agent, antistatic agent or A charge adjusting agent or the like may be contained.
本実施形態の光触媒塗膜は、光触媒組成物を基体又は基体を被覆するコーティングの表面に塗布して乾燥することにより得られる。光触媒組成物を塗布する基体材料としては、例えば合成樹脂、天然樹脂、繊維に代表される有機基材、金属、セラミックス、ガラス、石、セメント、コンクリートに代表される無機基材や、それらの組み合わせが挙げられる。 The photocatalyst coating film of this embodiment is obtained by applying the photocatalyst composition to the surface of a substrate or a coating covering the substrate and drying it. Examples of the base material on which the photocatalyst composition is applied include organic substrates represented by synthetic resins, natural resins, fibers, inorganic substrates represented by metals, ceramics, glass, stone, cement, concrete, and combinations thereof. Is mentioned.
上記合成樹脂としては、熱可塑性樹脂及び硬化性樹脂(熱硬化性樹脂、光硬化性樹脂、湿気硬化性樹脂等)が挙げられる。その具体例としては、例えばシリコーン樹脂、アクリル樹脂、メタクリル樹脂、フッ素樹脂、アルキド樹脂、アミノアルキド樹脂、ビニル樹脂、ポリエステル樹脂、スチレン−ブタジエン樹脂、ポリオレフィン樹脂、ポリスチレン樹脂、ポリケトン樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリアセタール樹脂、ポリエーテルエーテルケトン樹脂、ポリフェニレンオキシド樹脂、ポリスルホン樹脂、ポリフェニレンスルホン樹脂ポリエーテル樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、尿素樹脂、フェノール樹脂、メラミン樹脂、エポキシ樹脂、ウレタン樹脂、シリコーン−アクリル樹脂が挙げられる。また、上記天然樹脂としては、例えば、セルロース系樹脂、天然ゴムに代表されるイソプレン系樹脂、カゼインに代表されるタンパク質系樹脂が挙げられる。 Examples of the synthetic resin include thermoplastic resins and curable resins (thermosetting resins, photocurable resins, moisture curable resins, and the like). Specific examples include silicone resin, acrylic resin, methacrylic resin, fluorine resin, alkyd resin, aminoalkyd resin, vinyl resin, polyester resin, styrene-butadiene resin, polyolefin resin, polystyrene resin, polyketone resin, polyamide resin, polycarbonate. Resin, polyacetal resin, polyether ether ketone resin, polyphenylene oxide resin, polysulfone resin, polyphenylene sulfone resin polyether resin, polyvinyl chloride resin, polyvinylidene chloride resin, urea resin, phenol resin, melamine resin, epoxy resin, urethane resin, A silicone-acrylic resin is mentioned. Examples of the natural resin include cellulose resins, isoprene resins typified by natural rubber, and protein resins typified by casein.
基体が樹脂板や繊維である場合、その表面は、コロナ放電処理やフレーム処理、プラズマ処理等の表面処理がされていてもよいが、これらの表面処理は必須ではない。 When the substrate is a resin plate or fiber, the surface thereof may be subjected to a surface treatment such as a corona discharge treatment, a flame treatment, or a plasma treatment, but these surface treatments are not essential.
本実施形態の光触媒塗膜は、光触媒組成物をその用途等に応じて、任意の方法で塗布され得られる。塗布方法としては、例えばスプレー吹き付け法、フローコーティング法、ロールコート法、刷毛塗り法、ディップコーティング法、スピンコーティング法、スクリーン印刷法、キャスティング法、グラビア印刷法、フレキソ印刷法が挙げられる。 The photocatalyst coating film of the present embodiment can be applied by any method according to the use of the photocatalyst composition. Examples of the application method include spray spraying, flow coating, roll coating, brush coating, dip coating, spin coating, screen printing, casting, gravure printing, and flexographic printing.
本実施形態の光触媒塗膜は、光触媒組成物を塗布した後、乾燥して揮発分を除去することにより得られる。この際、例えば、20℃〜80℃の低温で乾燥した後、所望により、好ましくは20℃〜500℃、より好ましくは40℃〜250℃の熱処理を行ってもよく、紫外線照射等を行ってもよい。 The photocatalyst coating film of this embodiment is obtained by applying a photocatalyst composition and then drying to remove volatile components. At this time, for example, after drying at a low temperature of 20 ° C. to 80 ° C., heat treatment at 20 ° C. to 500 ° C., more preferably 40 ° C. to 250 ° C. may be performed as desired, and ultraviolet irradiation or the like is performed. Also good.
本実施形態において、光触媒塗装製品は、基体と、その基体上に形成された上記光触媒塗膜とを備えるものである。この光触媒塗装製品は、本実施形態の光触媒塗膜を備える他は公知の態様と同様であればよい。本実施形態の光触媒塗装製品の具体例としては、例えば、建材、建物外装、建物内装、窓枠、窓ガラス、構造部材、住宅等建築設備、車両用照明灯のカバー、窓ガラス、機械装置や物品の外装、防塵カバー及び塗装、表示機器、そのカバー、交通標識、各種表示装置、広告塔等の表示物、道路用、鉄道用等の遮音壁、橋梁、ガードレールの外装及び塗装、トンネル内装及び塗装、碍子、太陽電池カバー、太陽熱温水器集熱カバー等の外部で用いられる電子、電気機器の外装部、特に透明部材、ビニールハウス、温室等の外装が挙げられる。この光触媒塗装製品は、基体の表面に上記光触媒粒子(A)とバインダー(B)とを含む光触媒組成物を塗布し乾燥し、基体上に光触媒塗膜を形成することによって得てもよいが、その製造方法はこれに限定されない。例えば、基体と光触媒塗膜とを同時に成形してもよく、より具体的には一体成形してもよい。 In this embodiment, a photocatalyst-coated product includes a substrate and the photocatalyst coating film formed on the substrate. The photocatalyst-coated product may be the same as a known aspect except that the photocatalyst coating film of this embodiment is provided. Specific examples of the photocatalyst-coated product of the present embodiment include, for example, building materials, building exteriors, building interiors, window frames, window glass, structural members, building facilities such as houses, vehicle illumination lamp covers, window glass, mechanical devices, Exterior of goods, dustproof cover and painting, display equipment, its covers, traffic signs, various display devices, display objects such as advertising towers, sound insulation walls for roads and railways, bridges, exterior and painting of guardrails, tunnel interior and painting , Electronic parts used outside such as insulators, solar battery covers, solar water heater heat collection covers, etc., and exterior parts of electrical equipment, especially exteriors such as transparent members, greenhouses and greenhouses. This photocatalyst-coated product may be obtained by applying the photocatalyst composition containing the photocatalyst particles (A) and the binder (B) to the surface of the substrate and drying to form a photocatalyst coating film on the substrate. The manufacturing method is not limited to this. For example, the substrate and the photocatalyst coating film may be molded at the same time, and more specifically, may be integrally molded.
また、本実施形態の光触媒塗膜をある基体上に成形した後、その光触媒塗膜をその基体から剥離させた又はその基体と密着させた状態で、別の基体に接着、融着等により密着させてもよい。 In addition, after the photocatalyst coating film of the present embodiment is formed on a substrate, the photocatalyst coating film is adhered to another substrate by adhesion, fusion, or the like in a state where the photocatalyst coating film is peeled off or adhered to the substrate. You may let them.
以上、本発明を実施するための形態について説明したが、本発明は上記本実施形態に限定されるものではない。本発明は、その要旨を逸脱しない範囲で様々な変形が可能である。 As mentioned above, although the form for implementing this invention was demonstrated, this invention is not limited to the said this embodiment. The present invention can be variously modified without departing from the gist thereof.
以下の実施例、参考例及び比較例により本発明を具体的に説明するが、これらは本発明の範囲を限定するものではない。各種の物性は以下に示す方法で測定した。 The following examples, reference examples and comparative examples will specifically explain the present invention, but these do not limit the scope of the present invention. Various physical properties were measured by the following methods.
1.・O2 -の定量
ルミノール化学発光を用いて次の手順で行った。暗箱内のマグネティックスターラ上に設置した石英セル(光路(長さ)1cm×幅1cm)に、3.5mLの0.01M NaOH水溶液を入れ、そこに更に15mgの金属化合物(光触媒)粉末を投入し懸濁して懸濁液を得た。次いで、LED(Hamamatsu Photonics(浜松ホトニクス)社製、型番「LC−L2」波長:365nm)を光源として、懸濁液が入った上記セルに10秒間の紫外光照射を行った。照射後の懸濁液に、7mMのルミノール溶液を50μL添加し、・O2 -によって生じた化学発光をバンドパスフィルターに通した後、電子冷却光電子増倍管で検出し、〔・O2 -〕の値を導出した。
1. · O 2 - using quantitative luminol chemiluminescence was performed in the following procedure. Into a quartz cell (light path (length) 1 cm x width 1 cm) placed on a magnetic stirrer in a dark box, 3.5 mL of 0.01 M NaOH aqueous solution is added, and then 15 mg of metal compound (photocatalyst) powder is added. Suspension was obtained. Next, using the LED (Hamamatsu Photonics (Hamamatsu Photonics), model number “LC-L2” wavelength: 365 nm) as a light source, the cell containing the suspension was irradiated with ultraviolet light for 10 seconds. 50 μL of 7 mM luminol solution was added to the suspension after irradiation, and chemiluminescence generated by • O 2 − was passed through a bandpass filter, and then detected with an electron-cooled photomultiplier tube [• O 2 − ] Was derived.
2.H2O2の定量
上記1と同様にして得られた懸濁液に、上記と同じ装置で同様に紫外光照射後、30分間、・O2 -の消失を待ち、その後、7mMのルミノール溶液を懸濁液に50μL添加した。更に10分後、6.2μMのヘモグロビン溶液を懸濁液に50μL添加し、生じた化学発光を検出し、〔H2O2〕の値を導出した。
2. Quantitative determination of H 2 O 2 The suspension obtained in the same manner as in 1 above was irradiated with ultraviolet light in the same manner as above, and after waiting for disappearance of O 2 − for 30 minutes, a 7 mM luminol solution was then added. Was added to the suspension. Ten minutes later, 50 μL of a 6.2 μM hemoglobin solution was added to the suspension, and the resulting chemiluminescence was detected to derive the value of [H 2 O 2 ].
3.・OHの定量
0.1mMのクマリン水溶液を調製し、上記と同じ寸法の石英セル中に15mgの金属化合物(光触媒)粉末とクマリン水溶液35mLとを懸濁させて懸濁液を得た。この懸濁液に波長365nm、強度32mW/cm2のLED光を120秒照射した。次に、懸濁液から金属化合物(光触媒)粉末を分離するために、照射終了後の懸濁液にKClを0.5g添加し、24時間暗所に静置した。その後、上澄み液をとりサンプルとし、Fluorescence spectrophotometer(型番「RF−5300PC」、SHIMADZU社製)で蛍光の測定をした。この時、KCl添加による蛍光測定時の光散乱は影響しなかった。既知濃度のクマリンの蛍光強度を、上記サンプルの蛍光強度と比較することで・OHを定量し、〔・OH〕の値を導出した。
3. -Determination of OH A 0.1 mM coumarin aqueous solution was prepared, and 15 mg of a metal compound (photocatalyst) powder and 35 mL of a coumarin aqueous solution were suspended in a quartz cell having the same dimensions as described above to obtain a suspension. This suspension was irradiated with LED light having a wavelength of 365 nm and an intensity of 32 mW / cm 2 for 120 seconds. Next, in order to separate the metal compound (photocatalyst) powder from the suspension, 0.5 g of KCl was added to the suspension after the irradiation, and the mixture was allowed to stand in the dark for 24 hours. Thereafter, the supernatant was taken as a sample, and fluorescence was measured with a Fluorescence spectrophotometer (model number “RF-5300PC”, manufactured by SHIMADZU). At this time, light scattering at the time of fluorescence measurement by addition of KCl did not affect. By comparing the fluorescence intensity of a coumarin having a known concentration with the fluorescence intensity of the sample, .OH was quantified to derive a value of [.OH].
4.固形分濃度
調製した試料約2gをアルミ皿にとり、150℃で1時間加熱した。加熱前後の試料の質量を測定し、その差から固形分濃度を計算した。
4). Solid content concentration Approximately 2 g of the prepared sample was placed in an aluminum dish and heated at 150 ° C. for 1 hour. The mass of the sample before and after heating was measured, and the solid content concentration was calculated from the difference.
5.数平均粒子径
試料中の固形分含有量が1〜20質量%となるよう適宜溶媒を加えて希釈し、湿式粒度分析計(日本国日機装製マイクロトラックUPA−9230)を用いて測定した。
5. Number average particle diameter A sample was appropriately diluted by adding a solvent so that the solid content in the sample was 1 to 20% by mass, and measured using a wet particle size analyzer (Microtrac UPA-9230, manufactured by Nihon Koki Co., Ltd.).
6.塗膜膜厚
塗膜の膜厚を、ハロゲン光源装置(MORITEX社製、商品名「MHF−D100LR」)を装着した膜厚測定装置(SPECTRA・COOP社製、商品名「HandyLambda II THICKNESS」)を用いて測定した。
6). Film thickness The film thickness was measured using a film thickness measuring device (SPECTRA COOP, trade name “HandyLambda II THICKNESS”) equipped with a halogen light source device (MORITEX, trade name “MHF-D100LR”). And measured.
7.外観(色差)
カラーガイド(BYK Gardner社製)を用いて標準板からの色差を求めた。
7). Appearance (color difference)
The color difference from the standard plate was determined using a color guide (BYK Gardner).
8.接触角(初期接触角)
20℃での水の接触角を、接触角計(協和界面科学社製、商品名「DROP MASTER 500」)を用いて測定した。
8). Contact angle (initial contact angle)
The contact angle of water at 20 ° C. was measured using a contact angle meter (trade name “DROP MASTER 500” manufactured by Kyowa Interface Science Co., Ltd.).
9.耐候性(SWOM1000時間曝露後の水接触角及び色差)
スガ試験機社製のサンシャインウエザーメーターを用いて曝露試験(ブラックパネル温度63℃、降雨18分/2時間)を行い、曝露前と曝露開始1000時間後との間での色差を上記7の方法で測定し、接触角を上記8の方法で測定した。曝露前の色差を標準とし、曝露前後の状態変化をΔEとして評価した。
9. Weather resistance (water contact angle and color difference after 1000 hours exposure to SWOM)
Using the sunshine weather meter manufactured by Suga Test Instruments Co., Ltd., an exposure test (black panel temperature 63 ° C., rainfall 18 minutes / 2 hours) is performed, and the color difference between the exposure before and 1000 hours after the exposure is started And the contact angle was measured by the above method 8. The color difference before exposure was used as a standard, and the state change before and after exposure was evaluated as ΔE.
10.防汚性(防汚染性)
試験板を一般道路(トラック通行量500〜1000台/日程度)に面したフェンスに1年間貼りつけて汚染させた後、汚染の度合いを目視にて評価した。
◎:汚れが認められない、
○:全体的に少し汚れているが、雨スジによる汚れは認められない、
△:やや雨スジによる汚れがある、
×:著しい雨スジによる汚れがある。
10. Antifouling (antifouling)
After the test plate was affixed to a fence facing a general road (traffic volume of about 500 to 1000 vehicles / day) for 1 year and contaminated, the degree of contamination was evaluated visually.
◎: dirt is not recognized,
○: Slightly dirty overall, but no dirt due to rain streaks
△: Some dirt due to rain streaks,
X: Dirt due to significant rain streaks.
11.下地塗膜劣化観察
試料をエポキシ樹脂(商品名、Quetol812)に包埋後、独国Reichert社製ULTRACUT−N型ミクロトーム(商品名)により50〜60nmの厚さの超薄切片を作成し、支持膜を張ったメッシュに積載した後、カーボン蒸着を行い、検鏡用試料とし、TEM(日立製HF2000型、加速電圧:125kV)により塗膜断面の観察を行い、下地塗膜の劣化状態を評価した。
○:下地塗膜の劣化が観察されない、
×:下地塗膜の劣化が観察される。
11. Observation of underlying coating film deterioration After embedding the sample in an epoxy resin (trade name, Quetol 812), an ultrathin section having a thickness of 50 to 60 nm was prepared and supported by a ULTRACUT-N microtome (trade name) manufactured by Reichert, Germany. After loading on a mesh with a film attached, carbon deposition is carried out to make a sample for microscopy, and the cross-section of the coating film is observed with a TEM (HITACHI HF2000 type, acceleration voltage: 125 kV) to evaluate the deterioration state of the underlying coating film. did.
○: Deterioration of the undercoat is not observed,
X: Deterioration of the base coating film is observed.
[参考例]
重合体エマルジョン粒子(B1−1)水分散体の合成
還流冷却器、滴下槽、温度計及び撹拌装置を有する反応器に、イオン交換水400g、10質量%のドデシルベンゼンスルホン酸水溶液4.0gを投入した後、撹拌下で反応器中の温度を80℃に加温した。この反応器中に、ジメチルジメトキシシラン54.5g、フェニルトリメトキシシラン34.4g、及びメチルトリメトキシシラン1.0gからなる混合液と、過硫酸アンモニウムの2質量%水溶液15.0gとを、反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。その後、反応器中の温度を80℃に維持して約1時間撹拌を続けた。次に、アクリル酸n−ブチル12.3g、フェニルトリメトキシシラン13.5g、テトラエトキシシラン31.4g、及び3−メタクリロキシプロピルトリメトキシシラン1.2gからなる混合液と、メタクリル酸メチル24.6g、アクリル酸1g、反応性乳化剤(商品名「アデカリアソープSR−1025」、旭電化(株)製、固形分25%水溶液)1.2g、反応性乳化剤(商品名「アクアロンKH−1025」、第一工業製薬(株)製、固形分25%水溶液)0.7g、過硫酸アンモニウムの2質量%水溶液8.5g、及びイオン交換水255gからなる混合液とを、反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに、反応器中の温度を80℃に維持して約2時間撹拌を続けた後、室温まで冷却し、100メッシュの金網で濾過した。イオン交換水で固形分を10.0質量%に調整し、重合体粒子として数平均粒子径120nmの重合体エマルジョン粒子(B1−1)の水分散体を得た。
[Reference example]
Synthesis of Polymer Emulsion Particle (B1-1) Aqueous Dispersion In a reactor having a reflux condenser, a dropping tank, a thermometer and a stirring device, 400 g of ion-exchanged water and 4.0 g of a 10% by mass dodecylbenzenesulfonic acid aqueous solution were added. After charging, the temperature in the reactor was heated to 80 ° C. with stirring. In this reactor, 54.5 g of dimethyldimethoxysilane, 34.4 g of phenyltrimethoxysilane, and 1.0 g of methyltrimethoxysilane, and 15.0 g of a 2% by weight aqueous solution of ammonium persulfate were added to the reactor. It was dripped simultaneously over about 2 hours in the state which maintained the inside temperature at 80 degreeC. Thereafter, the temperature in the reactor was maintained at 80 ° C., and stirring was continued for about 1 hour. Next, a mixed liquid composed of 12.3 g of n-butyl acrylate, 13.5 g of phenyltrimethoxysilane, 31.4 g of tetraethoxysilane, and 1.2 g of 3-methacryloxypropyltrimethoxysilane, and methyl methacrylate 24. 6 g, acrylic acid 1 g, reactive emulsifier (trade name “Adekaria Soap SR-1025”, manufactured by Asahi Denka Co., Ltd., 25% solids aqueous solution), reactive emulsifier (trade name “AQUALON KH-1025”) , Daiichi Kogyo Seiyaku Co., Ltd., 25% solid content aqueous solution) 0.7 g, ammonium persulfate 2% by weight aqueous solution 8.5 g, and a mixture of ion-exchanged water 255 g. It was dripped simultaneously over about 2 hours in the state kept at ° C. Further, the temperature in the reactor was maintained at 80 ° C. and stirring was continued for about 2 hours, and then the mixture was cooled to room temperature and filtered through a 100 mesh wire net. The solid content was adjusted to 10.0% by mass with ion-exchanged water, and an aqueous dispersion of polymer emulsion particles (B1-1) having a number average particle size of 120 nm was obtained as polymer particles.
[実施例1]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に、上記1の方法で測定した〔・O2 -〕の値が11.7nM、上記2の方法で測定した〔H2O2〕の値が0.31nM、上記3の方法で測定した〔・OH〕の値が176nMのシリカ被覆ルチル型酸化チタンを含むシリカ被覆ルチル型酸化チタンゾル(A−1)(酸化チタン100質量部に対するシリカ被覆量:8質量部、固形分:30質量%、ロッド状一次粒子、粒子長(l)の相加平均値:35nm、粒子直径(d)の相加平均値:6nm)3.7gと、エタノール13.9gと、水21.3gとを混合し攪拌することにより光触媒組成物(C−1)を得た。
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−1)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−1)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−1)を得た。この試験板(D−1)の各種評価結果を表1に示す。
[Example 1]
The value of [• O 2 − ] measured by the above method 1 was 11.7 nM on 100 g of the polymer emulsion particle (B1-1) aqueous dispersion (solid content 10.0% by mass), measured by the above method 2. The silica-coated rutile-type titanium oxide sol (A-1) containing silica-coated rutile-type titanium oxide having a [H 2 O 2 ] value of 0.31 nM and a [.OH] value of 176 nM measured by the above method 3 ( Silica coating amount with respect to 100 parts by mass of titanium oxide: 8 parts by mass, solid content: 30% by mass, rod-shaped primary particles, arithmetic average value of particle length (l): 35 nm, arithmetic average value of particle diameter (d): 6 nm) 3.7 g, ethanol 13.9 g, and water 21.3 g were mixed and stirred to obtain a photocatalyst composition (C-1).
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance with a film thickness of 1 μm, was prepared on another surface (front surface) of the glass plate on which one side (back surface) was black-printed. The said photocatalyst composition (C-1) was apply | coated to the single side | surface (surface) of this glass plate by the bar-coat method. Then, the test plate (D-1) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-1) for 10 minutes at 70 degreeC. Various evaluation results of this test plate (D-1) are shown in Table 1.
[実施例2]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に、数平均粒子径12nmの水分散コロイダルシリカ(商品名「スノーテックスO」、日産化学工業(株)製、固形分20質量%)(B2)50gと、シリカ被覆ルチル型酸化チタンゾル(A−1)7.4gと、エタノール27.8gと、水92.6gとを混合し攪拌することにより光触媒組成物(C−2)を得た。
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−2)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−2)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−2)を得た。この試験板(D−2)の各種評価結果を表1に示す。
[Example 2]
100 g of polymer emulsion particles (B1-1) in water dispersion (solid content: 10.0% by mass), water-dispersed colloidal silica having a number average particle diameter of 12 nm (trade name “Snowtex O”, manufactured by Nissan Chemical Industries, Ltd.) , 20% by mass of solid content) (B2) 50 g, 7.4 g of silica-coated rutile-type titanium oxide sol (A-1), 27.8 g of ethanol, and 92.6 g of water were mixed and stirred to obtain a photocatalytic composition. (C-2) was obtained.
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance to a thickness of 1 μm on another surface (front surface) of a glass plate on which one side (back surface) was black-printed, was prepared. The photocatalyst composition (C-2) was applied to one side (surface) of this glass plate by a bar coating method. Then, the test plate (D-2) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-2) at 70 degreeC for 10 minute (s). Various evaluation results of this test plate (D-2) are shown in Table 1.
[実施例3]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に、上記1の方法で測定した〔・O2 -〕の値が0.5nM、上記2の方法で測定した〔H2O2〕の値が0.19nM、上記3の方法で測定した〔・OH〕の値が130nMのシリカ被覆ルチル型酸化チタンを含むシリカ被覆ルチル型酸化チタンゾル(A−2)(酸化チタン100質量部に対するシリカ被覆量:12質量部、固形分:30質量%、ロッド状一次粒子、粒子長(l)の相加平均値:35nm、粒子直径(d)の相加平均値:6nm)3.7gと、エタノール13.9gと、水21.3gとを混合し攪拌することにより光触媒組成物(C−3)を得た。
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−3)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−3)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−3)を得た。この試験板(D−3)の各種評価結果を表1に示す。
[Example 3]
The value of [• O 2 − ] measured by the above method 1 is 100 n (100% by weight of solid content) of the polymer emulsion particle (B1-1) aqueous dispersion of 0.5 nM, measured by the above method 2. The silica-coated rutile type titanium oxide sol (A-2) containing silica-coated rutile type titanium oxide having a [H 2 O 2 ] value of 0.19 nM and a [.OH] value of 130 nM measured by the above method 3 ( Silica coating amount with respect to 100 parts by mass of titanium oxide: 12 parts by mass, solid content: 30% by mass, rod-shaped primary particles, arithmetic average value of particle length (l): 35 nm, arithmetic average value of particle diameter (d): 6 nm) 3.7 g, ethanol 13.9 g, and water 21.3 g were mixed and stirred to obtain a photocatalyst composition (C-3).
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance to a thickness of 1 μm on another surface (front surface) of a glass plate on which one side (back surface) was black-printed, was prepared. The photocatalyst composition (C-3) was applied to one surface (surface) of this glass plate by a bar coating method. Then, the test plate (D-3) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-3) for 10 minutes at 70 degreeC. Various evaluation results of this test plate (D-3) are shown in Table 1.
[実施例4]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に数平均粒子径12nmの水分散コロイダルシリカ(商品名「スノーテックスO」、日産化学工業(株)製、固形分20質量%)(B2)50gと、シリカ被覆ルチル型酸化チタンゾル(A−2)7.4gと、エタノール27.8gと、水92.6gとを混合し攪拌することにより光触媒組成物(C−4)を得た。
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−4)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−4)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−4)を得た。この試験板(D−4)の各種評価結果を表1に示す。
[Example 4]
Polymer emulsion particles (B1-1) 100 g (solid content 10.0 mass%) of water dispersion colloidal silica having a number average particle diameter of 12 nm (trade name “Snowtex O”, manufactured by Nissan Chemical Industries, Ltd.) (Solid content 20% by mass) (B2) 50 g, silica-coated rutile type titanium oxide sol (A-2) 7.4 g, ethanol 27.8 g, and water 92.6 g were mixed and stirred to obtain a photocatalytic composition ( C-4) was obtained.
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance to a thickness of 1 μm on another surface (front surface) of a glass plate on which one side (back surface) was black-printed, was prepared. The said photocatalyst composition (C-4) was apply | coated to the single side | surface (surface) of this glass plate by the bar coating method. Then, the test plate (D-4) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-4) at 70 degreeC for 10 minute (s). Various evaluation results of this test plate (D-4) are shown in Table 1.
[比較例1]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に、上記1の方法で測定した〔・O2 -〕の値が36.4nM、上記2の方法で測定した〔H2O2〕の値が0.45nM、上記3の方法で測定した〔・OH〕の値が419nMのシリカ被覆アナターゼ型酸化チタンを含む石原産業(株)製シリカ被覆アナターゼ型酸化チタン水分散体(A−3)(商品名「MPT−422」、一次粒子の粒子直径(d)の相加平均値:30nm、酸化チタン100質量部に対するシリカ被覆量:15質量部、固形分:20質量%)5.6gと、エタノール13.9gと、水19.4gとを混合し攪拌することにより光触媒組成物(C−5)を得た。
TMIコメント→(重複と思われるため、「酸化チタン(A−3)の水分散液」を削除しました。)
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−3)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−5)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−5)を得た。この試験板(D−5)の各種評価結果を表1に示す。
[Comparative Example 1]
The value of [· O 2 − ] measured by the above method 1 was 36.4 nM, measured by the above method 2, on 100 g of the polymer emulsion particle (B1-1) aqueous dispersion (solid content 10.0% by mass). The silica-coated anatase-type titanium oxide manufactured by Ishihara Sangyo Co., Ltd., which contains silica-coated anatase-type titanium oxide having a [H 2 O 2 ] value of 0.45 nM and a [.OH] value of 419 nM measured by the above method 3. Aqueous dispersion (A-3) (trade name “MPT-422”, arithmetic average value of particle diameter (d) of primary particles: 30 nm, silica coating amount with respect to 100 parts by mass of titanium oxide: 15 parts by mass, solid content: 20 mass%) 5.6 g, 13.9 g of ethanol, and 19.4 g of water were mixed and stirred to obtain a photocatalyst composition (C-5).
TMI comment → (Since it seems to be a duplicate, "Titanium oxide (A-3) aqueous dispersion" has been deleted.)
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance to a thickness of 1 μm on another surface (front surface) of a glass plate on which one side (back surface) was black-printed, was prepared. The said photocatalyst composition (C-3) was apply | coated to the single side | surface (surface) of this glass plate by the bar-coat method. Then, the test plate (D-5) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-5) for 10 minutes at 70 degreeC. Various evaluation results of this test plate (D-5) are shown in Table 1.
[比較例2]
重合体エマルジョン粒子(B1−1)水分散体100g(固形分10.0質量%)に、数平均粒子径12nmの水分散コロイダルシリカ(商品名「スノーテックスO」、日産化学工業(株)製、固形分20質量%)(B2)50gと、石原産業(株)製シリカ被覆アナターゼ型酸化チタン水分散体(A−3)11.1gと、エタノール27.8gと、水88.9gとを混合し攪拌することにより光触媒組成物(C−6)を得た。
片面(裏面)に黒色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め1μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に上記光触媒組成物(C−6)をバーコート法にて塗布した。その後、塗布した光触媒組成物(C−6)を70℃で10分間乾燥することにより、光触媒塗膜が形成された試験板(D−6)を得た。この試験板(D−6)の各種評価結果を表1に示す。
[Comparative Example 2]
100 g of polymer emulsion particles (B1-1) in water dispersion (solid content: 10.0% by mass), water-dispersed colloidal silica having a number average particle diameter of 12 nm (trade name “Snowtex O”, manufactured by Nissan Chemical Industries, Ltd.) , 20 mass% solid content) (B2) 50 g, 11.1 g of silica-coated anatase type titanium oxide aqueous dispersion (A-3) manufactured by Ishihara Sangyo Co., Ltd., 27.8 g of ethanol, and 88.9 g of water. By mixing and stirring, a photocatalyst composition (C-6) was obtained.
A glass plate having a size of 10 cm × 10 cm, in which an acrylic silicone resin was applied in advance to a thickness of 1 μm on another surface (front surface) of a glass plate on which one side (back surface) was black-printed, was prepared. The said photocatalyst composition (C-6) was apply | coated to the single side | surface (surface) of this glass plate by the bar-coat method. Then, the test plate (D-6) in which the photocatalyst coating film was formed was obtained by drying the apply | coated photocatalyst composition (C-6) at 70 degreeC for 10 minute (s). Various evaluation results of this test plate (D-6) are shown in Table 1.
本発明の光触媒用金属化合物を使用すれば、下地塗膜の上に、保護層が不要のまま必要な光触媒活性を発揮する光触媒層を設けることができ、現場施工性に優れる1層コートタイプの光触媒塗料を提供できる。本発明の光触媒塗膜は、セルフクリーニング性に優れ、建築外装、内装材、外装表示用途、自動車、ディスプレイ、レンズ等のコーティング剤としても有用である。 If the metal compound for photocatalysts of this invention is used, the photocatalyst layer which exhibits a required photocatalytic activity can be provided on a base coating film without the need for a protective layer. A photocatalytic coating can be provided. The photocatalyst coating film of the present invention is excellent in self-cleaning properties, and is also useful as a coating agent for architectural exteriors, interior materials, exterior display applications, automobiles, displays, lenses and the like.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013147571A (en) * | 2012-01-19 | 2013-08-01 | Kikusui Chemical Industries Co Ltd | Heat-shielding coating |
JP2013220397A (en) * | 2012-04-18 | 2013-10-28 | Asahi Kasei Chemicals Corp | Metal compound for photocatalyst, photocatalytic composition, photocatalytic coating film and photocatalytic coating product |
WO2014017575A1 (en) * | 2012-07-26 | 2014-01-30 | 株式会社サクラクレパス | Photocatalyst coating liquid, method for producing same, and photocatalyst |
KR101481991B1 (en) | 2013-05-23 | 2015-01-14 | 주식회사 랩죤 | Photoactive nano-composite material, manufacturing method thereof, and multi-functional coating agent using the same |
JP2016184023A (en) * | 2015-03-25 | 2016-10-20 | 旭化成株式会社 | Coating film for solar cell cover glass and method for producing the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008142655A (en) * | 2006-12-12 | 2008-06-26 | Asahi Kasei Chemicals Corp | Water-based photocatalyst composition |
JP2010005613A (en) * | 2008-05-26 | 2010-01-14 | Asahi Kasei Chemicals Corp | Complex, functional structure and coating agent |
-
2010
- 2010-11-25 JP JP2010262918A patent/JP2011131211A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008142655A (en) * | 2006-12-12 | 2008-06-26 | Asahi Kasei Chemicals Corp | Water-based photocatalyst composition |
JP2010005613A (en) * | 2008-05-26 | 2010-01-14 | Asahi Kasei Chemicals Corp | Complex, functional structure and coating agent |
Non-Patent Citations (2)
Title |
---|
JPN6015008946; TADA, H. et al.: 'Effect of Silica-coating over Rutile Titania Particles on the Suppression of their Photocatalytic Ac' 色材協会誌 Vol. 62, No. 7, 1989, p. 399-403 * |
JPN6015008947; ZHANG, H. et al.: 'Synthesis of TiO2/SiO2 Core/Shell Nanocable Arrays' J. Phys. Chem. B Vol. 108, No. 39, 2004, p. 14866-14869 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013147571A (en) * | 2012-01-19 | 2013-08-01 | Kikusui Chemical Industries Co Ltd | Heat-shielding coating |
JP2013220397A (en) * | 2012-04-18 | 2013-10-28 | Asahi Kasei Chemicals Corp | Metal compound for photocatalyst, photocatalytic composition, photocatalytic coating film and photocatalytic coating product |
WO2014017575A1 (en) * | 2012-07-26 | 2014-01-30 | 株式会社サクラクレパス | Photocatalyst coating liquid, method for producing same, and photocatalyst |
KR101481991B1 (en) | 2013-05-23 | 2015-01-14 | 주식회사 랩죤 | Photoactive nano-composite material, manufacturing method thereof, and multi-functional coating agent using the same |
JP2016184023A (en) * | 2015-03-25 | 2016-10-20 | 旭化成株式会社 | Coating film for solar cell cover glass and method for producing the same |
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