JP2011124292A5 - - Google Patents

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Publication number
JP2011124292A5
JP2011124292A5 JP2009278951A JP2009278951A JP2011124292A5 JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5 JP 2009278951 A JP2009278951 A JP 2009278951A JP 2009278951 A JP2009278951 A JP 2009278951A JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5
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JP
Japan
Prior art keywords
sensor
surface plate
exposure apparatus
stage
reaction force
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Application number
JP2009278951A
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English (en)
Japanese (ja)
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JP5473575B2 (ja
JP2011124292A (ja
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Priority to JP2009278951A priority Critical patent/JP5473575B2/ja
Priority claimed from JP2009278951A external-priority patent/JP5473575B2/ja
Publication of JP2011124292A publication Critical patent/JP2011124292A/ja
Publication of JP2011124292A5 publication Critical patent/JP2011124292A5/ja
Application granted granted Critical
Publication of JP5473575B2 publication Critical patent/JP5473575B2/ja
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JP2009278951A 2009-12-08 2009-12-08 露光装置及びデバイス製造方法 Active JP5473575B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009278951A JP5473575B2 (ja) 2009-12-08 2009-12-08 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009278951A JP5473575B2 (ja) 2009-12-08 2009-12-08 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011124292A JP2011124292A (ja) 2011-06-23
JP2011124292A5 true JP2011124292A5 (enrdf_load_stackoverflow) 2013-01-31
JP5473575B2 JP5473575B2 (ja) 2014-04-16

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ID=44287920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009278951A Active JP5473575B2 (ja) 2009-12-08 2009-12-08 露光装置及びデバイス製造方法

Country Status (1)

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JP (1) JP5473575B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10649347B2 (en) 2013-10-29 2020-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6449875B2 (ja) * 2013-10-29 2019-01-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US20210246962A1 (en) * 2018-08-31 2021-08-12 Panasonic Intellectual Property Management Co., Ltd. Damping device
JP7308458B2 (ja) * 2018-08-31 2023-07-14 パナソニックＩｐマネジメント株式会社 制振装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU3167299A (en) * 1998-04-09 1999-11-01 Nikon Corporation Vibration eliminating device and exposure system
JP2000068195A (ja) * 1998-08-24 2000-03-03 Canon Inc デバイス製造装置
JP2000216082A (ja) * 1999-01-27 2000-08-04 Nikon Corp ステ―ジ装置および露光装置
JP2001153139A (ja) * 1999-11-26 2001-06-08 Canon Inc 磁気軸受式能動制振装置およびこれを用いた露光装置
JP2004193424A (ja) * 2002-12-12 2004-07-08 Nikon Corp 移動制御方法及び装置、露光装置、並びにデバイス製造方法
JP2005354022A (ja) * 2004-05-14 2005-12-22 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
US7649613B2 (en) * 2006-03-03 2010-01-19 Asml Netherlands B.V. Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
JP2008051330A (ja) * 2006-08-27 2008-03-06 Tokyo Univ Of Agriculture & Technology 消振システム

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