JP2011124292A5 - - Google Patents
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- JP2011124292A5 JP2011124292A5 JP2009278951A JP2009278951A JP2011124292A5 JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5 JP 2009278951 A JP2009278951 A JP 2009278951A JP 2009278951 A JP2009278951 A JP 2009278951A JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- surface plate
- exposure apparatus
- stage
- reaction force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (9)
前記定盤上で移動可能なステージと、
前記ステージを駆動するアクチュエータと、
質量体と前記質量体を移動させるアクチュエータとを有し前記ステージの移動に起因して前記定盤に発生する振動を低減するための反力カウンタと、
投影光学系と、
前記投影光学系を支持する構造体と、
前記投影光学系、前記構造体、前記定盤を支持する床のいずれかに設けられた振動を検出するセンサと、
前記センサからの出力に基づいて、前記定盤の振動が小さくなるように前記質量体を移動させるアクチュエータを制御する制御手段と、を備えることを特徴とする露光装置。 A surface plate,
A stage movable on the surface plate;
An actuator for driving the stage;
A reaction force counter having a mass body and an actuator for moving the mass body to reduce vibration generated in the surface plate due to the movement of the stage;
A projection optical system;
A structure that supports the projection optical system;
A sensor for detecting vibration provided on any one of the floor supporting the projection optical system, the structure, and the surface plate;
An exposure apparatus comprising: a control unit that controls an actuator that moves the mass body based on an output from the sensor so that vibration of the surface plate is reduced.
露光された基板を現像する工程とを有することを特徴とするデバイス製造方法。And a step of developing the exposed substrate.
前記定盤上で移動可能なステージと、A stage movable on the surface plate;
前記ステージを駆動するアクチュエータと、An actuator for driving the stage;
質量体と前記質量体を移動させるアクチュエータとを有し前記ステージの移動に起因して前記定盤に発生する振動を低減するための反力カウンタと、A reaction force counter having a mass body and an actuator for moving the mass body to reduce vibration generated in the surface plate due to the movement of the stage;
本体構造体と、A body structure;
前記本体構造体、前記定盤を支持する床のいずれかに設けられた振動を検出するセンサと、A sensor for detecting vibration provided on any of the main body structure and the floor supporting the surface plate;
前記センサからの出力に基づいて、前記定盤の振動が小さくなるように前記質量体を移動させるアクチュエータを制御する制御手段と、を備えることを特徴とする装置。And a control means for controlling an actuator that moves the mass body based on an output from the sensor so as to reduce vibration of the surface plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009278951A JP5473575B2 (en) | 2009-12-08 | 2009-12-08 | Exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009278951A JP5473575B2 (en) | 2009-12-08 | 2009-12-08 | Exposure apparatus and device manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011124292A JP2011124292A (en) | 2011-06-23 |
JP2011124292A5 true JP2011124292A5 (en) | 2013-01-31 |
JP5473575B2 JP5473575B2 (en) | 2014-04-16 |
Family
ID=44287920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009278951A Active JP5473575B2 (en) | 2009-12-08 | 2009-12-08 | Exposure apparatus and device manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5473575B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10649347B2 (en) | 2013-10-29 | 2020-05-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2015062921A1 (en) * | 2013-10-29 | 2015-05-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2020044703A1 (en) * | 2018-08-31 | 2020-03-05 | パナソニックIpマネジメント株式会社 | Vibration control device |
WO2020044704A1 (en) * | 2018-08-31 | 2020-03-05 | パナソニックIpマネジメント株式会社 | Vibration control device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999053217A1 (en) * | 1998-04-09 | 1999-10-21 | Nikon Corporation | Vibration eliminating device and exposure system |
JP2000068195A (en) * | 1998-08-24 | 2000-03-03 | Canon Inc | Device manufacturing equipment |
JP2000216082A (en) * | 1999-01-27 | 2000-08-04 | Nikon Corp | Stage device and aligner |
JP2001153139A (en) * | 1999-11-26 | 2001-06-08 | Canon Inc | Magnetic bearing type active vibration damping device and exposing device using same |
JP2004193424A (en) * | 2002-12-12 | 2004-07-08 | Nikon Corp | Movement control method, movement controller, aligner and device manufacturing method |
JP2005354022A (en) * | 2004-05-14 | 2005-12-22 | Canon Inc | Stage equipment, exposure apparatus, and device manufacturing method |
US7649613B2 (en) * | 2006-03-03 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method |
JP2008051330A (en) * | 2006-08-27 | 2008-03-06 | Tokyo Univ Of Agriculture & Technology | Vibration damping system |
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2009
- 2009-12-08 JP JP2009278951A patent/JP5473575B2/en active Active
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