JP2011124292A5 - - Google Patents

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Publication number
JP2011124292A5
JP2011124292A5 JP2009278951A JP2009278951A JP2011124292A5 JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5 JP 2009278951 A JP2009278951 A JP 2009278951A JP 2009278951 A JP2009278951 A JP 2009278951A JP 2011124292 A5 JP2011124292 A5 JP 2011124292A5
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Japan
Prior art keywords
sensor
surface plate
exposure apparatus
stage
reaction force
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JP2009278951A
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Japanese (ja)
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JP5473575B2 (en
JP2011124292A (en
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Priority to JP2009278951A priority Critical patent/JP5473575B2/en
Priority claimed from JP2009278951A external-priority patent/JP5473575B2/en
Publication of JP2011124292A publication Critical patent/JP2011124292A/en
Publication of JP2011124292A5 publication Critical patent/JP2011124292A5/ja
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Claims (9)

定盤と、
前記定盤上で移動可能なステージと、
前記ステージを駆動するアクチュエータと、
質量体と前記質量体を移動させるアクチュエータとを有し前記ステージの移動に起因して前記定盤に発生する振動を低減するための反力カウンタと、
投影光学系と、
前記投影光学系を支持する構造体と、
前記投影光学系、前記構造体、前記定盤を支持する床のいずれかに設けられた振動を検出するセンサと、
前記センサからの出力に基づいて、前記定盤の振動が小さくなるように前記質量体を移動させるアクチュエータを制御する制御手段と、を備えることを特徴とする露光装置。
A surface plate,
A stage movable on the surface plate;
An actuator for driving the stage;
A reaction force counter having a mass body and an actuator for moving the mass body to reduce vibration generated in the surface plate due to the movement of the stage;
A projection optical system;
A structure that supports the projection optical system;
A sensor for detecting vibration provided on any one of the floor supporting the projection optical system, the structure, and the surface plate;
An exposure apparatus comprising: a control unit that controls an actuator that moves the mass body based on an output from the sensor so that vibration of the surface plate is reduced.
前記制御手段は、ステージ位置指令値に基づいて反力カウンタ位置指令値を生成する反力カウンタ位置指令値生成部と、前記センサからの出力に基づいて前記反力カウンタの推力を補正するための推力補正値を生成する推力補正値生成部と、を含むことを特徴とする請求項1に記載の露光装置。The control means includes a reaction force counter position command value generation unit that generates a reaction force counter position command value based on a stage position command value, and a function for correcting the thrust of the reaction force counter based on an output from the sensor. The exposure apparatus according to claim 1, further comprising a thrust correction value generation unit that generates a thrust correction value. 前記制御手段は、ステージ推力指令値に基づいて反力カウンタ推力指令値を生成する反力カウンタ推力指令値生成部を含むことを特徴とする請求項2に記載の露光装置。The exposure apparatus according to claim 2, wherein the control unit includes a reaction force counter thrust command value generation unit that generates a reaction force counter thrust command value based on a stage thrust command value. 前記センサは、前記構造体に設けられ、前記構造体と前記定盤との相対位置、相対速度、相対加速度のいずれかを検出するセンサであることを特徴とする請求項1に記載の露光装置。The exposure apparatus according to claim 1, wherein the sensor is a sensor that is provided in the structure and detects any of a relative position, a relative speed, and a relative acceleration between the structure and the surface plate. . 前記センサは、前記構造体の加速度を検出するセンサであることを特徴とする請求項1に記載の露光装置。The exposure apparatus according to claim 1, wherein the sensor is a sensor that detects acceleration of the structure. 前記センサは、前記投影光学系の加速度を検出するセンサであることを特徴とする請求項1に記載の露光装置。The exposure apparatus according to claim 1, wherein the sensor is a sensor that detects acceleration of the projection optical system. 前記センサは、前記床の加速度を検出するセンサであることを特徴とする請求項1に記載の露光装置。The exposure apparatus according to claim 1, wherein the sensor is a sensor that detects acceleration of the floor. 請求項1〜7のいずれか1項に記載の露光装置を用いて基板にパターンを露光する工程と、The process of exposing a pattern to a board | substrate using the exposure apparatus of any one of Claims 1-7,
露光された基板を現像する工程とを有することを特徴とするデバイス製造方法。And a step of developing the exposed substrate.
定盤と、A surface plate,
前記定盤上で移動可能なステージと、A stage movable on the surface plate;
前記ステージを駆動するアクチュエータと、An actuator for driving the stage;
質量体と前記質量体を移動させるアクチュエータとを有し前記ステージの移動に起因して前記定盤に発生する振動を低減するための反力カウンタと、A reaction force counter having a mass body and an actuator for moving the mass body to reduce vibration generated in the surface plate due to the movement of the stage;
本体構造体と、A body structure;
前記本体構造体、前記定盤を支持する床のいずれかに設けられた振動を検出するセンサと、A sensor for detecting vibration provided on any of the main body structure and the floor supporting the surface plate;
前記センサからの出力に基づいて、前記定盤の振動が小さくなるように前記質量体を移動させるアクチュエータを制御する制御手段と、を備えることを特徴とする装置。And a control means for controlling an actuator that moves the mass body based on an output from the sensor so as to reduce vibration of the surface plate.
JP2009278951A 2009-12-08 2009-12-08 Exposure apparatus and device manufacturing method Active JP5473575B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009278951A JP5473575B2 (en) 2009-12-08 2009-12-08 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009278951A JP5473575B2 (en) 2009-12-08 2009-12-08 Exposure apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2011124292A JP2011124292A (en) 2011-06-23
JP2011124292A5 true JP2011124292A5 (en) 2013-01-31
JP5473575B2 JP5473575B2 (en) 2014-04-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009278951A Active JP5473575B2 (en) 2009-12-08 2009-12-08 Exposure apparatus and device manufacturing method

Country Status (1)

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JP (1) JP5473575B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10649347B2 (en) 2013-10-29 2020-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2015062921A1 (en) * 2013-10-29 2015-05-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2020044703A1 (en) * 2018-08-31 2020-03-05 パナソニックIpマネジメント株式会社 Vibration control device
WO2020044704A1 (en) * 2018-08-31 2020-03-05 パナソニックIpマネジメント株式会社 Vibration control device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999053217A1 (en) * 1998-04-09 1999-10-21 Nikon Corporation Vibration eliminating device and exposure system
JP2000068195A (en) * 1998-08-24 2000-03-03 Canon Inc Device manufacturing equipment
JP2000216082A (en) * 1999-01-27 2000-08-04 Nikon Corp Stage device and aligner
JP2001153139A (en) * 1999-11-26 2001-06-08 Canon Inc Magnetic bearing type active vibration damping device and exposing device using same
JP2004193424A (en) * 2002-12-12 2004-07-08 Nikon Corp Movement control method, movement controller, aligner and device manufacturing method
JP2005354022A (en) * 2004-05-14 2005-12-22 Canon Inc Stage equipment, exposure apparatus, and device manufacturing method
US7649613B2 (en) * 2006-03-03 2010-01-19 Asml Netherlands B.V. Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
JP2008051330A (en) * 2006-08-27 2008-03-06 Tokyo Univ Of Agriculture & Technology Vibration damping system

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