JP2011123263A - Proximity exposure device and proximity exposure method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device and a proximity exposure method capable of reducing exposure unevenness occurring by reduction in an exposure value when a shading member is returned to the upstream side. <P>SOLUTION: In the proximity exposure device 1, respective shading units 14 have four pairs of shading members 60a-63b arranged movably in the X direction respectively. The pairs of shading members 60a-63d individually have through-holes 90a-93b allowing passage of exposure light EL. The respective through-holes 90a-93b are formed so that the exposure light EL is shaded by any one of the pairs of shading members 60a-63b facing the respective through-holes 90a-93b when the pairs of shading members 60a-63b are overlapped mutually. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a proximity exposure apparatus and a proximity exposure method. More specifically, the present invention relates to a color filter substrate or an array substrate of a large flat panel display such as a liquid crystal display such as a TFT (Thin Film Transistor) or a plasma display. The present invention relates to a proximity exposure apparatus and a proximity exposure method suitable for exposing and transferring a pattern.

  As an exposure method for large flat panel displays such as liquid crystal displays and plasma displays used in large thin TVs, etc., the mask is subdivided, and a plurality of mask holders for holding these masks are arranged in a staggered pattern to form a substrate. A proximity scanning exposure method is known in which exposure is performed while moving the image in one direction (see, for example, Patent Document 1). This exposure method utilizes the fact that a large pattern can be formed by joining together on the premise that there is a portion that is repeated to some extent in the pattern formed on the substrate. In this case, the mask does not need to be large in accordance with the panel, and a relatively inexpensive mask can be used.

  In the exposure apparatus described in Patent Document 1, a plurality of light shielding members are used to move the light shielding member in accordance with the moving speed of the substrate, and during the exposure, the moved light shielding member is returned to the upstream side while being overlapped. In this way, it has been proposed to suppress the influence on exposure due to the movement of the light shielding member.

JP 2007-310007 A

  By the way, in the above proximity exposure apparatus, further improvement in exposure accuracy is required, and even if the light shielding member is returned to the upstream side while being overlapped during exposure, the exposure amount is reduced in the exposure region of the substrate below the light shielding member. For this reason, there is a possibility that an underexposure portion due to the light shielding member is generated in the exposure region, resulting in uneven exposure of the product.

  The present invention has been made in view of the above-described problems, and a purpose thereof is a proximity exposure apparatus and a proximity exposure that can suppress exposure unevenness caused by a reduction in exposure amount when returning a light shielding member to the upstream side. It is to provide a method.

The above object of the present invention can be achieved by the following constitution.
(1) a substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiating units disposed above the plurality of mask holding units and irradiating exposure light; and
A plurality of light shielding units arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A proximity exposure apparatus that irradiates exposure light to the substrate conveyed in the predetermined direction through the mask and exposes the pattern of the mask on the substrate,
Each of the light shielding units has at least one set of a plurality of light shielding members arranged to be movable in the predetermined direction,
The plurality of light shielding members each include a light passage portion that allows the exposure light to pass therethrough,
Each of the light passage portions is formed such that when the plurality of light shielding members are overlapped, the exposure light is shielded by any of the plurality of light shielding members facing each of the light passage portions. A proximity exposure apparatus.
(2) The plurality of light shielding members include first and second light shielding members each having a plurality of light passage portions arranged at predetermined intervals in a direction orthogonal to the predetermined direction,
(1) The plurality of light passing portions of the first light shielding member and the plurality of light passing portions of the second light shielding member are arranged offset in the orthogonal direction. Proximity exposure equipment.
(3) The proximity according to (1) or (2), wherein each of the light shielding units includes a plurality of driving mechanisms capable of driving the plurality of light shielding members in the predetermined direction and the vertical direction, respectively. Exposure device.

(4) A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, which are disposed above the plurality of mask holders, respectively. A plurality of irradiation units that irradiate, and a plurality of light shielding units that are arranged between each of the irradiation units and each of the mask holding units and shield the exposure light emitted from the irradiation unit. Each of the light shielding units has at least one set of a plurality of light shielding members arranged so as to be movable in the predetermined direction, and the plurality of light shielding members pass through the exposure light. A proximity exposure method of a proximity exposure apparatus that irradiates exposure light to the substrate conveyed in the predetermined direction through the mask and exposes the pattern of the mask on the substrate,
Transporting the substrate below the mask;
The plurality of light shielding members are moved in the predetermined direction while being overlapped so that the exposure light is shielded by any of the plurality of light shielding members facing each of the light passing portions, and the mask Forming a light shielding region on the substrate by shielding the pattern;
The plurality of light-shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction so that the exposure light passes through the light passage portions, and Crossing the mask pattern and returning upstream to the mask;
A proximity exposure method characterized by comprising:
(5) The proximity exposure method according to (4), further comprising a step of raising the plurality of light shielding members moved to the downstream side with respect to the mask before returning to the upstream side.
(6) A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, which are disposed above the plurality of mask holders, respectively, A plurality of irradiation units that irradiate, and a plurality of light shielding units that are arranged between each of the irradiation units and each of the mask holding units and shield the exposure light emitted from the irradiation unit. Each of the light shielding units has at least one set of a plurality of light shielding members arranged so as to be movable in the predetermined direction, and the plurality of light shielding members pass through the exposure light. A proximity exposure method of a proximity exposure apparatus that irradiates exposure light to the substrate conveyed in the predetermined direction through the mask and exposes the pattern of the mask on the substrate,
Transporting the substrate below the mask;
The plurality of light shielding members are moved in the predetermined direction while being overlapped so that the exposure light is shielded by any of the plurality of light shielding members facing each of the light passing portions, and the mask Forming a light shielding region on the substrate by shielding the pattern;
Moving the plurality of light-shielding members after moving downstream with respect to the mask relative to each other in the orthogonal direction so that the positions of the respective light passing portions coincide with each other;
The plurality of light shielding members are moved in a direction opposite to the predetermined direction so that the exposure light passes through the light passing portions, and the mask is crossed across the pattern of the mask being exposed. Returning to the upstream side with respect to
A proximity exposure method characterized by comprising:
(7) The proximity exposure method according to (6), wherein the plurality of light-shielding members after moving downstream with respect to the mask are moved while being relatively moved in the orthogonal direction. .
(8) A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of mask holders, which are disposed above the plurality of mask holders, respectively, A plurality of irradiation units that irradiate, and a plurality of light shielding units that are arranged between each of the irradiation units and each of the mask holding units and shield the exposure light emitted from the irradiation unit. Each of the light shielding units has at least one light shielding member arranged so as to be movable in the predetermined direction, and emits exposure light to the substrate conveyed in the predetermined direction through the mask. A proximity exposure method of a proximity exposure apparatus that irradiates and exposes a pattern of the mask on the substrate,
Transporting the substrate below the mask;
Moving the light shielding member in the predetermined direction, shielding the mask pattern and forming a light shielding region on the substrate;
Raising the light blocking member moved downstream relative to the mask;
Returning the light-shielding member after the rising across the pattern of the mask being exposed to the upstream side with respect to the mask;
A proximity exposure method characterized by comprising:

  According to the proximity exposure apparatus of the present invention, each light shielding unit has at least one set of a plurality of light shielding members arranged to be movable in the predetermined direction, and the plurality of light shielding members are the exposure light. Each of the light passage portions is shielded by any of the plurality of light shielding members facing each light passage portion when the plurality of light shielding members are overlaid. Formed to be. As a result, a normal light shielding operation can be performed using a plurality of light shielding members, and when returning the light shielding member to the upstream side, the exposure light passes through the light passage portion and suppresses a rapid change in the exposure amount. It is possible to suppress exposure unevenness caused by a decrease in exposure amount.

  Further, according to the proximity exposure method, the plurality of light shielding members are used, and the substrate is transported under the mask, and the exposure light is exposed to any one of the plurality of light shielding members facing each light passage portion. A plurality of light shielding members are moved in a predetermined direction so as to be shielded, and a mask pattern is shielded to form a light shielding region on the substrate. A step of moving a plurality of light shielding members in a direction opposite to a predetermined direction so that the exposure light passes through each light passage, and returning the light to the upstream side with respect to the mask across the pattern of the mask being exposed; Have. As a result, a normal light shielding operation can be performed using a plurality of light shielding members, and when returning the light shielding member to the upstream side, the exposure light passes through the light passage portion and suppresses a rapid change in the exposure amount. It is possible to suppress exposure unevenness caused by a decrease in exposure amount.

  Further, according to another proximity exposure method, a plurality of light shielding members whose exposure light faces each light passing portion in a state where the substrate is transported under the mask using the plurality of light shielding members. A process of forming a light-shielding region on the substrate by shielding a mask pattern while overlapping a plurality of light-shielding members, and a state where the substrate is transported under the mask, A step of relatively moving the plurality of light blocking members after moving downstream relative to the mask so that the positions of the light passing portions in the orthogonal direction coincide with each other, and the substrate is conveyed below the mask. In such a state, the plurality of light shielding members are moved in the direction opposite to the predetermined direction so that the exposure light passes through each light passing portion, and crosses the pattern of the mask being exposed to the mask. And returning to the upstream side Having. As a result, a normal light shielding operation can be performed using a plurality of light shielding members, and a rapid change in the exposure amount can be suppressed when returning the light shielding member to the upstream side, which occurs due to a decrease in the exposure amount. Exposure unevenness can be suppressed. In addition, since the plurality of light shielding members can be returned to the upstream side while being superimposed, the tact time can be shortened.

  According to still another proximity exposure method, the substrate is transported under the mask using at least one light shielding member, and the light shielding member is moved in a predetermined direction to shield the mask pattern on the substrate. The step of forming the light shielding region, the step of raising the light shielding member moved to the downstream side with respect to the mask, and the raised light shielding member across the pattern of the mask being exposed are returned to the upstream side with respect to the mask. And a process. Also by this, a normal light shielding operation can be performed, and when the light shielding member is returned to the upstream side, an abrupt change in the exposure amount can be suppressed, and uneven exposure caused by a decrease in the exposure amount can be suppressed. .

It is a top view of the proximity exposure apparatus which is embodiment of this invention. It is a front view of the proximity exposure apparatus in FIG. It is a perspective view which shows the light shielding member and mask pattern of this embodiment. It is a side view which shows the drive mechanism of the light shielding member of this embodiment. (A) is a front view which shows a pair of light shielding member, (b) is a front view which shows the state by which the pair of light shielding members were overlapped in the light-shielding process. It is a figure which shows the board | substrate which has a non-exposure area | region. (A) is a side view which shows the positional relationship of each light shielding member in a light shielding process, (b) is a side view which shows the state which the light shielding member moved downstream with respect to the mask in an exposure process, (C) is a side view which shows the positional relationship of each light shielding member in a return process. It is a side view which shows the light for exposure which passes the light shielding member in the return process of FIG.7 (c). (A) is a front view which shows a pair of light shielding member in the modification of this embodiment, (b) is a front view which shows the state by which the pair of light shielding members were overlapped in the light shielding process.

(First embodiment)
Hereinafter, embodiments of a proximity exposure apparatus and a proximity exposure method according to a first embodiment of the present invention will be described in detail with reference to the drawings. In the following description, a glass for forming a plurality of color filter panels having an exposed region in which a black matrix layer as a base pattern layer is formed and a non-exposed region in which a base pattern layer is not formed. A proximity exposure apparatus and a proximity exposure method for forming any of red (R), green (G), and blue (B) colored layers on a substrate will be described.

  First, an outline of the configuration of the proximity exposure apparatus 1 of the present embodiment will be described. As shown in FIGS. 1 and 2, the proximity exposure apparatus 1 of the present embodiment floats and supports a substrate (color filter substrate) W, and transports the substrate in a predetermined direction (X direction in FIG. 1). The mechanism 10 and a plurality of masks M are respectively held, and a plurality (in the embodiment shown in FIG. 1, left and right respectively) arranged in two rows in a zigzag manner along a direction (Y direction in FIG. 1) orthogonal to a predetermined direction. 6) mask holding units 11, a mask driving unit 12 that drives the mask holding unit 11, a plurality of irradiation units 13 that are arranged on the top of the plurality of mask holding units 11 and irradiate the exposure light EL, respectively. A plurality of light shielding units 14 disposed between each irradiation unit 13 and each mask holding unit 11 for shielding the exposure light EL emitted from the irradiation unit 13, and each operating part of the proximity exposure apparatus 1. Control unit 1 for controlling movement And, mainly includes the.

  The substrate transport mechanism 10 includes a floating unit 16 and a substrate driving unit 17 that holds one side of the substrate W in the Y direction (upper side in FIG. 1) and transports it in the X direction. The levitation unit 16 includes a plurality of exhaust air pads 20 and intake / exhaust air pads 21 respectively provided on a plurality of frames 19, and the exhaust air pads 20 and the intake / exhaust air pads 21 are provided via pumps (not shown) and solenoid valves (not shown). Air is exhausted or sucked and exhausted from the exhaust air pad 21. As shown in FIG. 1, the substrate driving unit 17 includes a suction pad 22 that holds one end of the substrate W that is levitated and supported by the levitating unit 16, and includes a motor 23, a ball screw 24, and a nut (not shown). The substrate W is transported in the X direction along the guide rail 26 by the ball screw mechanism 25. As shown in FIG. 2, the plurality of frames 19 are arranged via another level block 28 on the apparatus base 27 installed on the ground via the level block 18. Further, the substrate W may be transported by a linear servo actuator instead of the ball screw mechanism 25.

The mask drive unit 12 is attached to a frame (not shown), and is attached to the X direction drive unit 31 that drives the mask holding unit 11 along the X direction, and the tip of the X direction drive unit 31. Is attached to the tip of the Y direction drive unit 32, and the mask holding unit 11 is rotationally driven in the θ direction (around the horizontal plane of the X and Y directions). A θ-direction drive unit 33 and a Z-direction drive unit 34 that is attached to the tip of the θ-direction drive unit 33 and drives the mask holding unit 11 in the Z direction (vertical direction of the horizontal plane composed of the X and Y directions). Accordingly, the mask holding unit 11 attached to the tip of the Z direction driving unit 34 can be driven in the X, Y, Z, and θ directions by the mask driving unit 12. X, Y, θ, Z
The order of arrangement of the direction driving units 31, 32, 33, and 34 can be changed as appropriate.

  Further, as shown in FIG. 1, a mask changer 2 in which the masks M of the mask holding portions 11a and 11b can be simultaneously exchanged between the carry-in side and carry-out side mask holding portions 11a and 11b arranged in two rows in a staggered manner. Is arranged. The used or unused mask M transported by the mask changer 2 is transferred to and from the mask stockers 3 and 4 by the loader 5. The mask M is pre-aligned by a mask pre-alignment mechanism (not shown) during the transfer between the mask stockers 3 and 4 and the mask changer 2.

  As shown in FIG. 2, the irradiation unit 13 disposed on the upper part of the mask holding unit 11 includes a light source 41 such as a YAG laser or an excimer laser, and a concave mirror 42 that collects light emitted from the light source 41, Two types of optical integrators 43 arranged so as to be switchable in the vicinity of the focal point of the concave mirror 42, a plane mirror 45 and a spherical mirror 46 for changing the direction of the optical path, and arranged between the plane mirror 45 and the optical integrator 43. And an exposure control shutter 44 for controlling the opening and closing of the irradiation light path. The light source 41 may be an ultra-high pressure mercury lamp that emits continuous light including ultraviolet light, or a YAG laser or excimer laser that emits flash light.

As shown in FIGS. 3 and 4, each light shielding unit 14 has at least one set (four sets in this embodiment) of a plurality of (books) arranged at different heights so as to be movable in the X direction and the Z direction. In the embodiment, there are two light shielding members 60, 61, 62, 63 (60a, 60b, 61a, 61b, 62a, 62b, 63a, 63b). Each light-shielding member 60, 61, 62, 63 has a substantially rectangular shape extending in the Y direction, and one end thereof is linear motor 70a, 70b, 71a, 71b, 72a, 72b, 73a, 73b ( It is connected to a light shielding member X-direction drive mechanism. The linear motors 70a to 73b are movable in the X-axis direction along guide rails 75a, 75b, 76a, 76b, 77a, 77b, 78a, and 78b by a driver (not shown).
Further, both end portions of the guide rails 75a to 78b are respectively attached to the nut members 81 of the pair of light shielding members Z-direction drive mechanism 80. The pair of light shielding member Z-direction drive mechanisms 80 includes a ball screw mechanism, and rotates the screw shaft 83 by a motor 82 to move the nut member 81 in the vertical direction along the guide rail 84.

  Among these light shielding members 60, 61, 62, and 63, the first and second sets of light shielding members 60a to 61b have equal widths w1 and w2, respectively, and the first and second sets of light shielding members 60a and 60b, respectively. The third and fourth light shielding members 62a to 63b disposed above 61b have widths w3 and w4 that are wider than widths w1 and w2, respectively. Note that the widths w1 to w4 of the light shielding members 60a to 63b in each group can be arbitrarily set, and w1, w2, w3, and w4 may have different dimensions.

  As shown in FIG. 5A, the first set of light shielding members 60a and 60b have the same width w1, and each of the light shielding members 60a and 60b has two in the X direction and two in the Y direction. And a plurality of through holes (light passage portions) 90a and 90b that allow the exposure light EL to pass therethrough. The through holes 90a and 90b of the respective light shielding members 60a and 60b are formed symmetrically with respect to the line L that passes through the intermediate portion in the X direction and extends in the Y direction, and the through holes 90a of the one light shielding member 60a. The through holes 90b of the other light shielding member 90b are offset from each other in the Y direction. Specifically, the center in the Y direction of the through hole 90b of the other light shielding member 60b is disposed at the intermediate position in the Y direction between the adjacent through holes 90a of the one light shielding member 60a. Thus, as shown in FIG. 5B, when the light shielding members 60a and 60b are moved and overlapped in the X direction, the through hole 90a faces the light shielding portion of the other light shielding member 60b, Since the through hole 90b faces the light shielding portion of one light shielding member 60a, each of the light shielding members 60a and 60b can shield the exposure light EL. Further, the maximum width in the X direction when the first set of light shielding members 60a and 60b shields the light is assumed that the distance in the X direction from the long side in the X direction of each light shielding member 60a and 60b to the through holes 90a and 90b is d. Set to w1 + d.

  The inner diameters of the through holes 90a and 90b are such that when the light shielding members 60a and 60b are lifted and moved above the mask, the diffracted light of the exposure light EL that has passed around the light shielding members 60a and 60b and the through holes 90a and 90b. However, it is preferable that the entire region under the light shielding members 60a and 60b of the mask M is irradiated.

Further, the Y-direction distance d1 between the side surface near the Y-direction fixed end of one light shielding member 60a and the through hole 90a near the side surface is equal to the side surface near the free end direction in the Y direction of the other light shielding member 60b and the through hole 90b near the side surface. In addition, the Y-direction distance d2 between the side surface near the Y-direction free end of one light shielding member 60a and the through hole 90a near the side surface is the side surface near the Y-direction fixed end of the other light-shielding member 60b. And the Y-direction distance d2 to the through hole 90b closer to the side surface. Accordingly, the pair of light shielding members 60a and 60b can be configured by the same member by being used in the Y direction.
The second to fourth light shielding members 61a to 63b also have a plurality of through holes 91a, 91b, 92a, which are configured in the same manner as the plurality of through holes 90a, 90b of the first light shielding members 60a, 60b. 92b, 93a, 93b. In addition, the internal diameter and number of each through-hole 90a-93b are suitably set according to the dimension of light-shielding member 60a-63b.

  Next, the operation of the proximity exposure apparatus 1 configured as described above will be described. Here, as a substrate to be used, for example, as shown in FIG. 6, a substrate W having a non-exposed region NR between panels is used, and red (R), green (G), and blue (B) colored layers are used. A case where any one of the above patterns is transferred to a photoresist coated on the substrate W will be described.

The proximity exposure apparatus 1 floats and holds the substrate W by the air flow of the exhaust air pad 20 and the intake / exhaust air pad 21 of the levitation unit 16, and adsorbs one end of the substrate W by the substrate drive unit 17 to a constant speed in the X direction. Carry in. The substrate W located below the mask holding unit 11 is irradiated with the exposure light EL from the irradiation unit 13 through the mask M, and the pattern of the mask M is transferred to the photoresist applied to the substrate W. To do. At this time, the positional error between the substrate W and the mask M is determined by the θ direction drive unit 33 and the command signal output from the control unit 15 based on the position data of the substrate W and the mask M detected by an imaging unit (not shown). Correction is performed (position alignment) by operating the Y-direction drive unit 32 and finely adjusting the position of the mask M.

  Here, as shown in FIG. 7A, the non-exposed region NR of the substrate W is the mask M when the substrate W is transported under the mask M and the pattern is transferred to the substrate W. Enter below the pattern area. Then, each set of light shielding members 60a to 63b waiting on the upstream side with respect to the mask M is arranged with a necessary overlap in the transport direction, and is disposed so as to shield the non-exposure region NR. Further, each set of light shielding members 60a to 63b is configured to mask the mask M while overlapping the light shielding members 60a to 63b so that the exposure light EL is shielded by the light shielding members 60a to 63b facing the through holes 90a to 93b. The pattern is shielded from light. For example, in the first set of light shielding members 60a and 60b, the through hole 90a of one light shielding member 60a faces the light shielding portion of the other light shielding member 60b, and the through hole 90b of the other light shielding member 60b It opposes the light shielding part of the light shielding member 60a. Note that the first set of light shielding members 60a and 60b can shield the exposure light EL while changing the width in the X direction in the range of w1 to w1 + d. Then, the light shielding members 60, 61, 62, 63 are moved in the X direction at the same speed as the conveyance of the substrate W to shield the pattern of the mask M, thereby forming a light shielding region on the non-exposure region NR.

  At this time, it is preferable that the first set and the second set of light shielding members 60 and 61 positioned below are arranged on the most upstream side and the most downstream side. For example, when the second light shielding member 61 moves to the downstream side with respect to the mask M and exposure is started, the width of the light that diffracts the exposure light and wraps around the light shielding member 61 is reduced, and the exposure region It is possible to clearly expose and transfer the boundary between the ER and the non-exposure area NR (light shielding area).

  On the other hand, as shown in FIG. 7B, after the exposure is started by shielding the exposed area NR, all the light shielding members 60 a to 63 b are moved to the downstream side of the mask M. Thereafter, during the exposure operation until the next light shielding area is shielded, the light shielding members 60, 61, 62, 63 after moving to the downstream side with respect to the mask M are moved at a high speed in the direction opposite to the X direction to perform exposure. It is necessary to return to the upstream side of the mask M across the pattern of the mask M.

  In the returning step, first, the light shielding members 60, 61, 62, 63 are raised to a predetermined return height by the light shielding member Z-direction drive mechanism 80. Then, as shown in FIG. 7C, the light shielding members 60a to 63b are moved away from each other in the X direction in the direction opposite to the transport direction to cross the pattern of the mask M being exposed. As a result, as shown in FIG. 8, the exposure light EL is close to the light shielding members 60a and 60b in the mask M because the light passing through both sides in the X direction and the light passing through the through holes 90a and 90b are diffracted, respectively. Irradiated with an area, a rapid change in exposure amount can be eliminated, and uneven exposure can be reduced.

  Then, after all the light shielding members 60a to 63b are returned to the upstream side with respect to the mask M, the light shielding member Z-direction drive mechanism 80 lowers the light shielding member 60a to 63b to a predetermined light shielding height. It waits in preparation for passing under the pattern area of M.

  As described above, according to the proximity exposure apparatus 1 of the present embodiment, each light shielding unit 14 has four pairs of light shielding members 60a to 63b that are arranged so as to be movable in the X direction. The light shielding members 60a to 63d are respectively provided with through holes 90a to 93b that allow the exposure light EL to pass through. The through holes 90a to 93b are exposed when the pair of light shielding members 60a to 63b are overlaid. Is formed so as to be shielded by any one of the pair of light shielding members 60a to 63b facing the through holes 90a to 93b. With this apparatus 1, a normal light shielding operation can be performed using the pair of light shielding members 60a to 63b of each group, and when returning the light shielding members 60a to 63b to the upstream side, the exposure light EL is passed through the through holes 90a to 90a. 93b can be passed, and a rapid change in the exposure amount can be suppressed, and uneven exposure caused by a decrease in the exposure amount can be suppressed.

  Further, according to the proximity exposure method, a pair of light shielding members 60a to 63b is used to transport the substrate W below the mask M, and a pair of light shielding light beams for exposure light EL facing the through holes 90a to 93b. A step of moving the pair of light shielding members 60a to 63b in the X direction so as to be shielded by any of the members 60a to 63b, shielding the pattern of the mask M, and forming a light shielding region on the substrate W; The pair of light shielding members 60a to 63b after moving to the downstream side with respect to the mask M is moved in the direction opposite to the transport direction so that the exposure light EL passes through the through holes 90a to 93b, and the mask being exposed. Crossing the pattern of M and returning it to the upstream side with respect to the mask M. By this method, a normal light shielding operation can be performed using the plurality of light shielding members 60a to 63b, and the exposure light EL passes through the through holes 90a to 93b when the light shielding members 60a to 63b are returned to the upstream side. In addition, a rapid change in the exposure amount can be suppressed, and uneven exposure caused by a decrease in the exposure amount can be suppressed.

  Furthermore, the exposure light EL which passes through the through-holes 90a-93b is further provided with the process which raises each pair of light-shielding member 60a-63b which moved to the downstream side with respect to the mask M before returning to the upstream side. The region where the diffracted light is irradiated onto the mask M can be expanded, and the inner diameters of the through holes 90a to 93b do not have to be increased. Thereby, the X direction width | variety at the time of light-shielding by a pair of light-shielding member 60a-63b can be set large.

(Second Embodiment)
Next, a proximity exposure apparatus and a proximity exposure method according to a second embodiment of the present invention will be described in detail with reference to the drawings. In the present embodiment, the configuration of the light shielding member of the light shielding unit is different from that of the first embodiment. For this reason, the same or equivalent parts as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted or simplified. Also in the present embodiment, the light shielding members 60a to 63b in each group are different only in the width in the X direction, and therefore only the first light shielding members 60a and 60b will be described.

  In the present embodiment, as shown in FIG. 9A, each of the light shielding members 60a and 60b is formed in a comb-teeth shape, and has base portions 100a and 100b extending in a rectangular shape in the Y direction, and each base portion 100a, A plurality of projecting pieces 101a and 101b extending in the X direction and arranged at predetermined intervals in the Y direction, and the exposure light EL passes through the adjacent projecting pieces 101a and 101b and the base 102, respectively. Opening recesses 102a and 102b (light passage portions) are formed.

  The projecting pieces 101a and 101b of the light shielding members 60a and 60b are arranged in directions opposite to each other in the X direction, that is, one extends in the transport direction and the other in the direction opposite to the transport direction, and is offset in the Y direction. Has been. Therefore, the opening recess 102a of one light shielding member 60a and the opening recess 102b of the other light shielding member 60b are arranged offset in the Y direction. In addition, the Y-direction width of each of the projecting pieces 101a and 101b and the Y-direction width of each of the opening recesses 102a and 102b are set to substantially the same size, and when the light shielding members 60a and 60b are overlapped, the opening recess Since 102a faces the protruding piece 101b of the other light shielding member 60b, and the opening recess 102b faces the protruding piece 101a of the one light shielding member 60a, each light shielding member 60a, 60b shields the exposure light EL. be able to. Note that the width in the Y direction of the protruding pieces 101a and 101b may be set slightly larger than the width in the Y direction of the opening recesses 102a and 102b in consideration of diffraction of the exposure light EL.

The maximum width in the X direction when the first set of light shielding members 60a and 60b shields light is the width in the X direction of the base portions 100a and 100b of the light shielding members 60a and 60b, and the length in the X direction of the protruding pieces 101a and 101b. If d is set, it is set to w1 + d.
Furthermore, also in the present embodiment, the pair of light shielding members 60a and 60b are configured by the same member by being used in the Y direction.
Therefore, as in the present embodiment, even when a pair of comb-shaped light shielding members 60a and 60b is used, a normal light shielding operation can be performed and the light shielding members 60a and 60b can be performed as in the first embodiment. When returning 60b to the upstream side, the exposure light EL passes through the opening recesses 102a and 102b, so that a rapid change in the exposure amount can be suppressed, and uneven exposure caused by a decrease in the exposure amount can be suppressed. .
In the present embodiment, in the returning step, even if the base portions 100a and 100b of the pair of light shielding members 60a and 60b are overlapped and returned together upstream, a rapid change in exposure amount is suppressed. be able to.

  In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably.

(Modification 1)
For example, in the above-described embodiment, the exposure light passes through the light passing portion by returning each light shielding member to the upstream side without overlapping at least in the light passing portion, but at least one of the pair of light shielding members. By having the light shielding member Y direction drive mechanism that drives the light shielding member in the Y direction, the light passing portions of the pair of light shielding members can be returned to the upstream side while being overlapped.

That is, the pair of light shielding members after moving to the downstream side with respect to the mask is moved relatively in the Y direction so that the positions in the Y direction of the respective light passing portions coincide with each other, and the exposure light is emitted from the pair of light shielding members. The pair of light shielding members may be moved in the direction opposite to the transport direction while overlapping each other so as to pass through each light passage portion, and may be returned to the upstream side with respect to the mask across the pattern of the mask being exposed. Thereby, a pair of light shielding members can be returned together upstream, and the time required for the return process can be shortened. For example, in the above embodiment, the first and second sets of light shielding members 60a to 61b having the same dimensions are returned to the upstream side together, and the third and fourth sets of light shielding members 62a to 63b having the same dimensions are brought together. You may return to the upstream side.
It should be noted that the pair of light shielding members may rise after being moved relative to each other before returning to the upstream side, or may be moved relatively after being raised.

(Modification 2)
In the above embodiment, a light shielding member having a light passage part is used. However, at least one rectangular light shielding member having no light passage part is used, and the light shielding member is raised and then upstream. Also by returning to the side, it is possible to prevent a rapid change in the exposure amount at the mask by the exposure light diffracted through the side surface in the longitudinal direction. That is, the present invention includes a step of transporting the substrate below the mask, a step of moving the light shielding member in the predetermined direction, shielding the mask pattern to form a light shielding region on the substrate, A step of raising the light shielding member moved to the downstream side with respect to the mask, and a step of returning the raised light shielding member to the upstream side with respect to the mask across the pattern of the mask being exposed. The structure which has these.

  Further, in the above embodiment, the light shielding member Z-direction drive mechanism is configured to drive all the light shielding members together, but each light shielding member may be provided with a Z-direction drive mechanism.

  Each set of light shielding members is not limited to two, and may be constituted by three or more light shielding members.

  In addition, the light shielding member may form a light passage portion by a through hole or an opening formed by processing into a desired shape, or a material that shields light on the surface of the transparent member may be formed in a desired shape. You may comprise a light passage part by making it adhere.

  In the above-described embodiment, the substrate transport mechanism 10 has been described as transporting the substrate W while floating and holding it by the floating unit 16 and the substrate driving unit 17. You may hold | maintain and convey while mounting.

  Furthermore, in the above-described embodiment, the scanning exposure method in which exposure is performed while continuously transporting the substrate has been described. However, the present invention may be applied to an exposure method in which the substrate is temporarily stopped during exposure and the transport and exposure are repeated.

DESCRIPTION OF SYMBOLS 1 Proximity exposure apparatus 10 Substrate conveyance mechanism 11 Mask holding part 13 Irradiation part 14 Light shielding unit 60, 61a, 61b 1st set light shielding member 61, 61a, 61b 2nd set light shielding member 62, 62a, 62b 3rd set light shielding Member 63, 63a, 63b 4th set of light shielding member 90a, 90b, 91a, 91b, 92a, 92b, 93a, 93b Through-hole (light passage part)
102a, 102b Opening recess (light passage part)
EL Exposure light M Mask W Glass substrate

Claims (8)

A substrate transport mechanism capable of transporting a substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiating units disposed above the plurality of mask holding units and irradiating exposure light; and
A plurality of light shielding units arranged between each of the irradiation units and each of the mask holding units, for shielding the exposure light emitted from the irradiation unit;
A proximity exposure apparatus that irradiates exposure light to the substrate conveyed in the predetermined direction through the mask and exposes the pattern of the mask on the substrate,
Each of the light shielding units has at least one set of a plurality of light shielding members arranged to be movable in the predetermined direction,
The plurality of light shielding members each include a light passage portion that allows the exposure light to pass therethrough,
Each of the light passage portions is formed such that when the plurality of light shielding members are overlapped, the exposure light is shielded by any of the plurality of light shielding members facing each of the light passage portions. A proximity exposure apparatus. The plurality of light shielding members include first and second light shielding members each having a plurality of light passage portions arranged at predetermined intervals in a direction orthogonal to the predetermined direction,
2. The plurality of light passage portions of the first light shielding member and the plurality of light passage portions of the second light shielding member are arranged offset in the orthogonal direction, respectively. Proximity exposure equipment.   3. The proximity exposure apparatus according to claim 1, wherein each of the light shielding units includes a plurality of driving mechanisms capable of driving the plurality of light shielding members in the predetermined direction and the vertical direction, respectively. A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of masks that are arranged above the plurality of mask holders and irradiate exposure light. And a plurality of light shielding units arranged between each of the irradiation units and each of the mask holding units and configured to shield the exposure light emitted from the irradiation unit, Each of the light shielding units has at least one set of a plurality of light shielding members arranged to be movable in the predetermined direction, and each of the plurality of light shielding members includes a light passage portion that allows the exposure light to pass therethrough. A proximity exposure method of a proximity exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Transporting the substrate below the mask;
The plurality of light shielding members are moved in the predetermined direction while being overlapped so that the exposure light is shielded by any of the plurality of light shielding members facing each of the light passing portions, and the mask Forming a light shielding region on the substrate by shielding the pattern;
The plurality of light-shielding members after moving downstream with respect to the mask are moved in a direction opposite to the predetermined direction so that the exposure light passes through the light passage portions, and Crossing the mask pattern and returning upstream to the mask;
A proximity exposure method characterized by comprising:   5. The proximity exposure method according to claim 4, further comprising a step of raising the plurality of light shielding members moved to the downstream side with respect to the mask before returning to the upstream side. A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of masks that are arranged above the plurality of mask holders and irradiate exposure light. And a plurality of light shielding units arranged between each of the irradiation units and each of the mask holding units and configured to shield the exposure light emitted from the irradiation unit, Each of the light shielding units has at least one set of a plurality of light shielding members arranged to be movable in the predetermined direction, and each of the plurality of light shielding members includes a light passage portion that allows the exposure light to pass therethrough. A proximity exposure method of a proximity exposure apparatus that irradiates the substrate transported in the predetermined direction with exposure light through the mask and exposes the pattern of the mask on the substrate,
Transporting the substrate below the mask;
The plurality of light shielding members are moved in the predetermined direction while being overlapped so that the exposure light is shielded by any of the plurality of light shielding members facing each of the light passing portions, and the mask Forming a light shielding region on the substrate by shielding the pattern;
Moving the plurality of light-shielding members after moving downstream with respect to the mask relative to each other in the orthogonal direction so that the positions of the respective light passing portions coincide with each other;
The plurality of light shielding members are moved in a direction opposite to the predetermined direction so that the exposure light passes through the light passing portions, and the mask is crossed across the pattern of the mask being exposed. Returning to the upstream side with respect to
A proximity exposure method characterized by comprising:   The proximity exposure method according to claim 6, wherein the plurality of light shielding members after moving downstream with respect to the mask are moved while being relatively moved in the orthogonal direction. A substrate transport mechanism capable of transporting a substrate along a predetermined direction, a plurality of mask holders that respectively hold a plurality of masks, and a plurality of masks that are arranged above the plurality of mask holders and irradiate exposure light. And a plurality of light shielding units arranged between each of the irradiation units and each of the mask holding units and configured to shield the exposure light emitted from the irradiation unit, The light shielding unit has at least one light shielding member arranged to be movable in the predetermined direction, and irradiates exposure light through the mask to the substrate transported in the predetermined direction. A proximity exposure method of a proximity exposure apparatus that exposes a pattern of the mask on the substrate,
Transporting the substrate below the mask;
Moving the light shielding member in the predetermined direction, shielding the mask pattern and forming a light shielding region on the substrate;
Raising the light blocking member moved downstream relative to the mask;
Returning the light-shielding member after the rising across the pattern of the mask being exposed to the upstream side with respect to the mask;
A proximity exposure method characterized by comprising:

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