JP2008040066A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure device that can appropriately light-shield a non-exposure region by using a light-shielding member upon carrying out pattern exposure by relatively moving a substrate and a mask. <P>SOLUTION: While exposing an exposure region, a non-exposure region can be shielded from light regardless to the number of exposure regions by moving blind members 20, 30 into an upstream side crossing the exposure light EL. As one of the blind members 20, 30 can be accelerated or decelerated while overlapping the other stationary member, influences on exposure can be suppressed. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus, and more particularly to an exposure apparatus suitable for exposing and transferring a mask pattern of a mask onto a substrate of a large flat panel display such as a liquid crystal display or a plasma display.

Large flat panel displays such as liquid crystal displays and plasma displays used in large thin televisions and the like are manufactured by proximity exposure transfer of a mask pattern onto a substrate by a divided sequential exposure method. As a conventional sequential sequential exposure apparatus of this type, for example, a mask smaller than the substrate as the material to be exposed is used, the mask is held on the mask stage and the substrate is held on the work stage, and both are placed close to each other. In this state, the work stage is moved stepwise with respect to the mask, and the substrate is exposed to light for pattern exposure from the mask side at each step, thereby exposing a plurality of mask patterns drawn on the mask onto the substrate. There is known one in which a plurality of displays and the like are created on a single substrate by transfer. In particular, in the technique of Patent Document 1, a mask pattern can be exposed on a large substrate by moving a smaller mask and a light source in synchronization with the substrate.
Japanese Patent Laid-Open No. 11-237744

  By the way, when a plurality of panels are cut out from a large glass substrate, an exposure pattern is exposed and transferred to an area on the glass substrate corresponding to the panel, but the area corresponding to between adjacent panels is exposed light. This is a non-exposed area that should not be irradiated. Therefore, it is conceivable to provide a light shielding member between the light source and the glass substrate so as to cover the non-exposed area so that the exposure light does not reach the non-exposed area. However, when the types and number of panels cut out from one glass substrate are different, it is necessary to provide various types of light-shielding members according to the types, and there are problems such as an increase in cost and an increase in space.

  Therefore, in view of the problems of the related art, the present invention provides an exposure apparatus capable of appropriately shielding a non-exposed region using a light shielding member when pattern exposure is performed by relatively moving a substrate and a mask. Objective.

In order to achieve the above object, the exposure apparatus of the present invention comprises:
An irradiation unit that emits light for exposure; and
A substrate drive unit that holds a substrate having an exposure region and a non-exposure region, and moves the exposure light emitted from the irradiation unit in a predetermined direction;
A plurality of movable light shielding members disposed between the irradiation unit and the substrate, extending in a direction intersecting the predetermined direction, and shielding light;
A light shielding member driving unit that drives the light shielding member,
When one light shielding member accelerates across the exposure light emitted from the irradiation unit, the leading edge of the one light shielding member is in a position overlapping with another light shielding member, and is emitted from the irradiation unit. When decelerating across the exposure light, the trailing edge of the one light shielding member is positioned so as to overlap the other light shielding member.

  Here, a movable light-shielding member is provided, and while irradiating light from the irradiating unit to the exposure area, at least once across the light from the irradiating unit and in a direction opposite to the predetermined direction If the light shielding member is driven so as to move, only a single light shielding member can be used to appropriately shield the exposure light from reaching regardless of the width and number of non-exposed areas. Further, since the light shielding member has a compact and lightweight structure, the entire exposure apparatus can be simplified and made compact. However, in the case of a single light shielding member, if acceleration / deceleration occurs in the exposure region, it may be difficult to control the exposure amount.

  On the other hand, according to the present invention, when one light shielding member accelerates across the exposure light emitted from the irradiation section, the leading edge of the one light shielding member overlaps with another light shielding member. Therefore, when decelerating across the exposure light emitted from the irradiating unit, the drive control is performed so that the trailing edge of the one light shielding member overlaps the other light shielding member. The acceleration / deceleration of the two light shielding members is performed in the shadow of the other light shielding member, and since the speed is constant when coming out of the shadow, the exposure amount can be easily controlled. The “leading edge” refers to an edge in the forward direction of the light shielding member, and the “following edge” refers to an edge in the backward direction of the light shielding member. The term “overlap” refers to overlapping in a direction that blocks exposure light emitted from the irradiation unit.

  After the light shielding member is accelerated, it is preferable to move at the same speed as the substrate, and among the light shielding members, the light shielding member that is later decelerated is preferably stationary after passing through the position of the light shielding member that is already stationary. .

  Three or more light shielding members may be provided.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a top view of the exposure apparatus according to the present embodiment, and FIG. 2 is a side view showing a state during exposure of the exposure apparatus according to the present embodiment. In the following embodiments, the horizontal plane is defined by the X-axis direction and the Y-axis direction, and the Z-axis direction defines the vertical direction.

  In FIG. 1, on a base 1, a large thin plate-like substrate W is gripped by a substrate chuck (substrate drive unit) 2 and can move from left to right along with a substrate chuck 2 along a rail 2a. On the base 1, there are seven holding devices 10 for sucking and holding the mask M on the left side (upstream side) and six on the right side (downstream side) across the mask transport line (also referred to as mask transport path) L (total). 13) are arranged. Compared to the substrate W held by the holding device 10, the small masks M are alternately arranged in a staggered manner with the mask transport line L in between. In FIG. 1, the seven holding devices 10 on the left side and the three holding devices 10 on the right side are in the exposure position, and the three holding devices 10 on the right side are in the mask delivery position. It is in.

  Each holding device 10 is in the X-axis direction on the base 1 in the left-right direction in FIG. 2 (the direction perpendicular to the mask transport line L in FIG. 1, and the substrate W is from left to right along the X-axis direction. The arm 11 is arranged so as to be movable with respect to a frame (not shown), the holding part 12 is arranged at the tip of the arm 11 and holds the mask M on the lower surface, and the arm 11. The Z-axis moving device 13 that drives the holding portion 12 in the Z-axis direction (vertical direction in FIG. 2), the θ-axis moving device 14 that drives the holding portion 12 to rotate about the normal line of the upper surface of the base 1, and the arm 11 On the other hand, it has a Y-axis moving device 15 that drives the holding unit 12 in the Y-axis direction (the vertical direction in FIG. 2). The holding part 12 has a rectangular opening (not shown). A discharge suction unit (not shown) is attached to the base 1 so as to face the lower surface of the substrate W.

  During an exposure operation performed using the exposure apparatus of the present embodiment, the substrate W is moved together with the substrate chuck 2 from the left to the right along the rail 2a from a drive unit (not shown). At this time, the substrate W is transported in the X-axis direction in a state of floating from the upper surface of the discharge unit (not shown), and the lower surface side of the substrate W is prevented from being damaged.

  When the exposure light EL is projected from the light source LS in the upper exposure unit (irradiation unit) OPU while moving the substrate W to a predetermined position, the exposure light EL passes through the mask M held by the holding device 10. Then, the pattern is exposed and transferred to the substrate W. At this time, the shift of the pattern due to the movement error of the substrate W is corrected by finely adjusting the position of the mask M by the Z-axis moving device 13, the θ-axis moving device 14, and the Y-axis moving device 15 of the holding device 10. be able to. Similarly, pattern exposure can be performed on the entire substrate W by performing continuous exposure. In the present embodiment, since the masks M held on both sides of the mask transport line L are arranged in a staggered manner, even if the masks M on one side of the mask transport line L are arranged apart from each other, A pattern can be formed on the substrate W without a gap.

  By the way, when a plurality of panels are cut out from the substrate W, the exposure pattern is exposed and transferred to the region on the substrate W corresponding to the panel, but the region corresponding to between adjacent panels is irradiated with exposure light. This is a non-exposed area that should not be. Therefore, in the present embodiment, the blind members (light shielding members) 20 and 30 are arranged between the fixed exposure unit OPU and the substrate W.

  FIG. 3 is a perspective view showing the blind member and the substrate, but the mask and the like are omitted. Hereinafter, for ease of understanding, the substrate is depicted as having only one row of exposure areas, but there are actually a plurality of rows. In FIG. 3, the blind member 20 that is the first light shielding member has a linear strip shape extending orthogonally to the X-axis direction (that is, in the Y-axis direction), and its end is connected to the linear motor LM1. Has been. The linear motor LM1 that is the first drive unit is movable in the X-axis direction along the guide rail GS1 by a driver (not shown). When the edges 21 and 22 on both sides in the X-axis direction of the blind member 20 are forward in the movement direction, they constitute a leading edge, and when the edges 21 and 22 are behind in the movement direction, they constitute a trailing edge. The linear motors LM1 and LM2 constitute a light shielding member driving unit.

  On the other hand, the blind member 30 that is the second light shielding member is a linear strip plate located between the blind member 20 and the substrate W and extending orthogonally to the X-axis direction (that is, in the Y-axis direction). And the end part is connected with linear motor LM2. The linear motor LM2 as the second drive unit is movable in the X-axis direction along the guide rail GS2 by a driver (not shown). When the edges 31 and 32 on both sides in the X-axis direction of the blind member 30 are in front of the moving direction, they constitute a leading edge, and when they are behind in the moving direction, they constitute a trailing edge. In FIG. 3, the blind members 20 and 30 block part of the exposure light EL that has passed through an opening area of a mask (not shown).

  Next, the operation of the blind members 20 and 30 during exposure will be described. FIG. 4 is a schematic view of the blind members 20, 30, the mask M, and the substrate W in the Y-axis direction, and schematically shows the operation during exposure. When an optical system having intermediate imaging is used, the movement of the blind members 20 and 30 and the movement direction of the non-exposure area (shadow) to be shielded may be reversed. Therefore, the movement of the shadow will be described as the operation of the blind members 20 and 30. In addition, when an optical system having intermediate imaging is used, the amount of movement of the blind members 20 and 30 may differ from the amount of movement of the non-exposure area (shadow) that is shielded from light. Therefore, the amount of movement of the shadow will be described as the amount of movement of the blind members 20 and 30.

  In FIG. 4, the substrate W is moved at a constant speed in the X-axis direction by a substrate driving unit (not shown). The mask M has an opening AP, and light from the irradiation unit passes through the opening area AP from above in the Z-axis direction. The upper surface of the substrate W includes an exposure area ER and a non-exposure area NR. In FIG. 4, for easy understanding, the exposure area ER and the non-exposure area NR are shown as being stepped, but actually there is no step. Above the mask M, the blind members 20 and 30 are displaced in synchronization with the movement of the substrate W by driving the linear motors LM1 and LM2 (FIG. 3), so that the exposure can be controlled.

  When the exposure area ER of the substrate W is irradiated with light passing through the opening area AP at the initial position shown in FIG. 4A, the blind members 20 and 30 are stationary above the upstream end of the opening area AP. It is supported in the state. Here, when the non-exposure region NR of the substrate W approaches the opening region AP, as shown in FIG. 4B, the blind member 30 starts to be driven in the X-axis direction (rightward in the drawing) It accelerates until it becomes the same speed as the substrate W. This acceleration is performed while the leading edge overlaps the blind member 20. Therefore, when the non-exposure region NR of the moving substrate W comes out of the shadow of the blind member 20, the non-exposure region NR is shielded by the blind member 30 moving at the same speed as the substrate W. The boundary between the ER and the non-exposure region NR can be clearly blocked.

  Further, when the substrate W moves in the same direction, the next exposure area ER approaches the opening area AP. Therefore, as shown in FIG. 4C, the blind member 20 starts to be driven in the X-axis direction (rightward in the drawing) and is accelerated until the speed becomes equal to that of the substrate W. This acceleration is performed while the leading edge overlaps the blind member 30. As shown in FIGS. 4D and 4E, when the next exposure area ER of the moving substrate W enters the opening area AP, the non-exposure area NR that precedes the opening area AP has a width A corresponding thereto. In addition, the blind members 20 and 30 moving in the same direction as the substrate W at the same speed continue to be shielded from light. Thereby, exposure of the non-exposure area NR can be avoided.

  Further, when the substrate W moves in the same direction, the preceding exposure area ER has left the opening area AP (at the same time, the leading edge of the blind 30 has also left the opening area AP), as shown in FIG. Then, the blind member 30 is decelerated and stopped in a state where it protrudes into the opening area AP by the amount of protrusion Δ above the downstream end of the opening area AP. When the blind member 30 is decelerated, the trailing edge of the blind member 30 overlaps the blind member 20, so that the exposure area is not affected by the deceleration. Further, as shown in FIG. 4G, the blind member 20 is moved at the same speed as the substrate W until the non-exposure region NR of the substrate W approaches the shadow of the blind member 30, and FIG. As shown, after the trailing edge of the blind member 20 overlaps the blind member 30, the blind member 20 is decelerated. Therefore, there is no influence of the change in the exposure area due to the deceleration. In such a case, the blind member 20 passes through the position of the blind member 30 and stops in an overshooted state.

  Here, it is necessary to return the blind members 20 and 30 to the initial position (position shown in FIG. 4A) until the next non-exposure area (not shown) approaches. Therefore, as shown in FIG. 4 (i), the overshoot blind member 20 is first accelerated in the reverse direction (leftward in the figure) and moved at a constant speed. Such acceleration is performed while the leading edge of the blind member 20 is overlapped with the blind member 30 and is completed before the blind member 30 comes out of the blind member 30 (see FIG. 4J). The influence on can be avoided.

  Subsequently, as shown in FIG. 4 (k), the blind member 30 is accelerated in the reverse direction (leftward in the figure) and moved at the same speed as the blind member 20. This acceleration is completed until the leading edge of the blind member 30 overlaps the blind member 20 and the subsequent edge moves away from the downstream end of the opening area AP, so that the influence on the exposure amount due to the acceleration of the blind member 30 is avoided. it can. As shown in FIG. 4 (l), the blind members 20 and 30 cross the opening area AP at a predetermined speed and maintain the width B in the X-axis direction (in the direction opposite to the substrate W). )Moving.

  The amount Δ that the blind member 20 protrudes into the opening area AP at the upstream end and the amount Δ that the blind member 30 protrudes into the opening area AP at the downstream end are calculated back from the speed and width B of the blind members 20 and 30. Is set. That is, by associating the protrusion amount Δ with the speed and width B of the blind members 20 and 30, the exposure amount of the exposure region crossed by the blind members 20 and 30 and the exposure region not crossed are equalized. As a result, uneven exposure can be suppressed.

  When the leading edge of the blind member 20 passes the upstream end of the opening area AP, the blind member 20 is decelerated and stopped above the upstream end of the opening area AP as shown in FIG. When the blind member 20 is decelerated, the trailing edge of the blind member 20 overlaps the blind member 30, so that the exposure amount is not affected by the deceleration. As shown in FIG. 4 (n), after the blind member 20 is stopped in a state where the blind member 20 protrudes into the opening area AP by the amount Δ, the blind member 30 is decelerated and stopped (see FIG. 4 (o)). Since the blind member 30 is decelerated while the row edge overlaps the blind member 20, the exposure amount is not affected by the deceleration. In such a case, the blind member 30 passes through the position of the blind member 20 and stops in an overshooted state. In this way, after the blind members 20 and 30 return to the initial positions, when the exposure area approaches again, the same operation as described above is repeated, and the exposure of the plurality of exposure areas and the shielding of the non-exposure areas are performed. It can be carried out.

  FIG. 5 is a flowchart showing a series of exposure operations in the exposure apparatus of the present embodiment. In step S101, n = 1 is set. In step S102, the first non-exposure region NR is shielded by the blind members 20 and 30, and in step S103, the blind member 20 is exposed while the first exposure region ER is being exposed. 30 to the upstream side. If it is determined in step S104 that the exposure of all the exposure areas ER has not been completed, n = n + 1 is set in step S105, and steps S102 and S103 are repeated. On the other hand, if it is determined that the exposure of all the exposure areas ER has been completed, the exposure operation ends.

  According to the present embodiment, during exposure of the exposure area, the blind member 20 and 30 are moved to the upstream side with respect to the exposure light EL, so that the blind member regardless of the number of exposure areas. 20 and 30 can be used to shield the non-exposed area. In addition, since the acceleration / deceleration of one of the blind members 20 and 30 is performed in a state of being overlapped with the other stationary member, the influence on the exposure can be suppressed.

  FIG. 6 is a time chart showing the positions of the blind members 20 and 30 and the mask M on the horizontal axis and the time on the vertical axis. The regions shielded by the blind member 20 and the regions shielded by the blind member 30 are shown. Are indicated by different hatchings. Accordingly, an area drawn by any hatching is not exposed. The range of the opening area AP is indicated by a one-dot chain line.

  In FIG. 6, exposure starts at a point A in the exposure area from the upstream end of the opening area AP, and the exposure is ended by the blind member 30 on the downstream end side. On the other hand, for the point B in the exposure area, the exposure starts from the upstream end of the opening area AP, and the exposure ends at the downstream end of the opening area AP. Is shielded from light for a predetermined time.

  In the ideal state shown in FIG. 6A, the blind members 20 and 30 are not accelerated or decelerated, but instantaneously reach a predetermined speed or stop. In this state, the exposure time ET1 at point A is equal to the sum of the exposure time ET2 before passing through the blind members 20 and 30 at point B and the exposure time ET3 after passing through (ET1 = ET2 + ET3), the amount of protrusion Δ of the blind member 30 is set. However, in actuality, acceleration is necessary to bring the blind members 20 and 30 to a predetermined speed, and deceleration is necessary to make them stand still.

  FIG. 6B shows a state in which the blind members 20 and 30 are accelerated and decelerated. In this case, the exposure time ET1 ′ at point A is smaller than the sum of the exposure time ET2 before passing through the blind members 20 and 30 at point B and the exposure time ET3 after passing through (ET1 ′ <ET2 + ET3). ). In other words, the exposure at point A and the exposure at point B means that exposure unevenness occurs.

  On the other hand, in the state shown in FIG. 6C corresponding to the present embodiment, acceleration / deceleration is performed in a state where the blind members 20 and 30 are overlapped with each other. Is equal to the sum of the exposure time ET2 before the blind members 20 and 30 pass and the exposure time ET3 after the passage (ET1 = ET2 + ET3). Thereby, it is possible to realize exposure with high accuracy while suppressing exposure unevenness in the entire exposure region.

  The present invention has been described above with reference to the embodiments. However, the present invention should not be construed as being limited to the above-described embodiments, and can be modified or improved as appropriate. For example, the number of exposure areas and non-exposure areas is arbitrary.

It is a top view of the exposure apparatus concerning this Embodiment. It is a side view which shows the state at the time of exposure of the exposure apparatus concerning this Embodiment. It is a perspective view which shows a blind member and a board | substrate. It is the figure which looked at the blind members 20 and 30 and the board | substrate W in the Y-axis direction. It is a flowchart which shows exposure operation | movement. It is a time chart figure of movement of blind members 20 and 30.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Base 2 Substrate chuck 2a Rail 10 Holding device 11 Arm 12 Holding part 13 Z-axis moving device 14 θ-axis moving device 15 Y-axis moving device 20 Blind member 30 Blind member ER Exposure area GS1 Guide rail GS2 Guide rail L Mask transport line LM1 , LM2 Linear motor LS Light source M Mask NR Non-exposure area OPU Exposure unit

Claims (3)

An irradiation unit that emits light for exposure; and
A substrate drive unit that holds a substrate having an exposure region and a non-exposure region, and moves the exposure light emitted from the irradiation unit in a predetermined direction;
A plurality of movable light shielding members disposed between the irradiation unit and the substrate, extending in a direction intersecting the predetermined direction, and shielding light;
A light shielding member driving unit that drives the light shielding member,
When one light shielding member accelerates across the exposure light emitted from the irradiation unit, the leading edge of the one light shielding member is in a position overlapping with another light shielding member, and is emitted from the irradiation unit. An exposure apparatus according to claim 1, wherein when the light is decelerated across the exposure light, the trailing edge of the one light shielding member is positioned so as to overlap another light shielding member.   The exposure apparatus according to claim 1, wherein the light shielding member moves at a speed equal to that of the substrate after being accelerated. The exposure apparatus according to claim 1, wherein three or more light shielding members are provided.

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