JP2011118726A - Information processing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an information processing system that can prevent depletion of resources. <P>SOLUTION: The information processing system includes a transmitting device that transmits information, and a receiving device that receives information. The transmitting device includes: a storage unit for storing information; a control unit for controlling transmission of the information stored in the storage unit to the receiving device responding to a request from the receiving device based on a resource state of the receiving device and a resource state of the transmitting device; and a transmitting section for transmitting to the receiving device the information stored in the storage unit based on the control by the control unit. The receiving device includes a transmission requesting section for requesting the transmitting device to transmit the information stored in the storage unit, and a receiving section for receiving from the transmitting section the information stored in the storage unit. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an information processing system that transmits and receives information acquired by an apparatus.

This type of information processing system includes a client that requests information generated by a substrate processing apparatus and the like, and a server that accumulates information acquired by the substrate processing apparatus and transmits information in response to a client request. Is done. Here, depending on a situation where a client request is made, resources (for example, a memory, a CPU, and a network) may be exhausted, and the function of the information processing system may be deteriorated.
In Patent Document 1, when an application that operates on one computer performs processing while cooperating with an application that operates on another computer, by notifying resource information of each computer only when necessary, The document describes preventing wasteful use of resources.
In Patent Document 2, when the substrate processing apparatus and the communication apparatus communicate based on the configuration information, when the configuration information is updated, the communication apparatus is notified of the fact and communicates based on the updated configuration information. According to the document, the system stop time is shortened.

Japanese Patent Application Laid-Open No. 11-249997 JP 2008-258251 A

  An object of the present invention is made from the background described above, and is to provide an information processing system capable of preventing resource depletion.

  In order to achieve the above object, an information processing system according to the present invention includes a transmission device that transmits information and a reception device that receives information. The transmission device includes a storage unit that stores information, and the reception device. A control unit that controls transmission of information stored in the storage unit to the receiving device based on a resource state of the receiving device and a resource state of the transmitting device in response to a request from the control unit; Based on the control by the transmitter, a transmitter that transmits information stored in the storage unit to the receiver, and the receiver receives information stored in the storage unit from the transmitter A transmission request unit that requests transmission; and a reception unit that receives information stored in the storage unit from the transmission unit.

  The substrate processing apparatus according to the present invention can prevent resource depletion.

It is a figure which shows the structure of the information processing system used as the background of this invention. It is a figure which shows the structure of the information processing system which concerns on embodiment of this invention. It is a perspective view of a substrate processing apparatus. It is side surface perspective drawing of a substrate processing apparatus. It is a figure which shows the hardware constitutions of a client and a server centering on a control apparatus. It is a figure which shows the structure of the information processing program run on a client. It is an example of a client resource table. It is a flowchart which shows the operation | movement flow (S10) of the information processing program run on a client. It is a figure which shows the structure of the information processing program run on a server. It is an example of a server resource table. It is an example of a resource table. It is an example of a resource threshold value. It is a flowchart which shows the operation | movement flow (S20) of the information processing program run on a server.

First, the background of the present invention will be described with reference to FIG.
FIG. 1 is a diagram illustrating a configuration of the information processing system 1. As shown in FIG. 1, the information processing system 1 includes a plurality of substrate processing apparatuses 10-1 to 10-n (n is a positive number) and a plurality of clients 12-1 to 12-m (m is a positive number. The server 14 and the server 14 may be communicably connected to each other via the network 16.
With such a configuration, information acquired in the plurality of substrate processing apparatuses 10-1 to 10-n is transmitted and received between the plurality of clients 12-1 to 12-m and the server 14.
The clients 12-1 to 12-m have a function as a general computer. The server 14 has functions as a general computer and accumulates information acquired in the plurality of substrate processing apparatuses 10-1 to 10-n. The network 16 is, for example, a LAN and a WAN.
Hereinafter, when any of a plurality of constituent elements such as the substrate processing apparatuses 10-1 to 10-n is indicated without being specified, the substrate processing apparatus 10 may be simply abbreviated. Further, in the information processing system 1 in FIG. 1, only one server 14 exists, but a plurality of servers 14 may exist (the same applies to the information processing system 2 described later).

The substrate processing apparatus 10 processes a substrate based on a process recipe. Specifically, the process recipe describes a procedure for processing the substrate, and the substrate processing apparatus 10 controls each component in the apparatus along this procedure. For example, the substrate processing apparatus 10 controls the heater so that the temperature in the processing furnace becomes a temperature at which the substrate can be processed.
Information acquired along with the execution of the substrate processing (for example, an actual measurement value of the temperature in the processing furnace; hereinafter referred to as “substrate processing information”) is once stored in the substrate processing apparatus 10 and then set in a predetermined timing ( For example, after a series of substrate processing is completed, the data is transmitted to the server 14 and accumulated.
In the following, information transmitted / received in the information processing system 1 is assumed to be substrate processing information acquired by the substrate processing apparatus 10, but this is merely an example and acquired by an apparatus other than the substrate processing apparatus 10. Information may be transmitted and received (the same applies to the information processing system 2 described later).

The client 12 requests the server 14 to transmit the accumulated substrate processing information via the network 16.
The server 14 can simultaneously connect and transmit information according to the size of the accumulated substrate processing information, that is, the “maximum number of simultaneous connections” that is the number of clients that can simultaneously connect and transmit information. Threshold information including “maximum acquisition time” that is possible time and “maximum item number” that is the number of data items that can be connected and transmitted at the same time is stored in advance. In addition, the server 14 acquires connection client information including “current connection number” that is the number of currently connected clients and “connection user information” that is information related to the connection status of the user from the client 12 and holds the connection client information.
The server 14 transmits the accumulated substrate processing information to the client 12 via the network 16 based on the threshold information and the connection client information in response to a request from the client 12.
However, if there is a variation in the state of the accumulated substrate processing information (for example, the data length and the accumulated amount per unit time), the resource may not be used effectively or the resource may be exhausted.
It is also conceivable that the client 12 performs control so that the resources are not exhausted by dividing the substrate processing information transmitted from the server 14 by a predetermined unit. However, in this case, an overhead is generated due to the division of information, and resources may be exhausted.

Next, the information processing system 2 according to the embodiment of the present invention will be described.
FIG. 2 is a diagram showing a configuration of the information processing system 2 according to the embodiment of the present invention. As shown in FIG. 2, the information processing system 2 allows a plurality of substrate processing apparatuses 10-1 to 10-n, a plurality of clients 20-1 to 20-m and a server 22 to communicate with each other via a network 16. Connected and configured.
Similar to the information processing system 1 in FIG. 1, substrate processing information acquired in the plurality of substrate processing apparatuses 10 is transmitted and received between the plurality of clients 20 and the server 22 by such a configuration.

Next, the substrate processing apparatus 10 will be further described.
[Detailed configuration of substrate processing equipment]
First, a detailed configuration of the substrate processing apparatus 10 will be described.
FIG. 3 shows the substrate processing apparatus 10 using a perspective view. FIG. 4 shows the substrate processing apparatus 10 using a side perspective view.
The substrate processing apparatus 10 processes a wafer 100 made of silicon or the like used as a substrate.

As shown in FIGS. 3 and 4, the substrate processing apparatus 10 includes a substrate processing apparatus main body 11. In the substrate processing apparatus 10, a hoop (substrate container; hereinafter referred to as a pod) 101 that is used as a wafer carrier storing the wafer 100 is used.
A front maintenance port 102 used as an opening provided for maintenance is installed in the front front portion of the front wall 11a of the substrate processing apparatus main body 11, and a front maintenance door 103 for opening and closing the front maintenance port 102 is installed. It has been. An operation unit (not shown) is installed in the vicinity of the upper front maintenance door 103.

A pod loading / unloading port 104 is opened on the front wall 11 a of the substrate processing apparatus body 11 so as to communicate with the inside and outside of the substrate processing apparatus body 11, and the pod loading / unloading unit 104 is opened and closed by the front shutter 105. It has become.
A load port 106 is installed on the front front side of the pod loading / unloading unit 104, and the load port 106 is configured so that the pod 101 is placed and aligned. The pod 101 is loaded onto the load port 106 by an in-process transfer device (not shown) and unloaded from the load port 106.

  A rotary pod shelf 107 is installed at an upper portion of the substrate processing apparatus main body 11 in a substantially central portion in the front-rear direction, and the rotary pod shelf 107 is configured to store a plurality of pods 101. That is, the rotary pod shelf 107 includes a column 108 that is vertically installed and intermittently rotates in a horizontal plane, and a plurality of shelf plates 109 that are radially supported by the column 108 at each of the upper, middle, and lower levels. The plurality of shelves 109 are configured to hold the pods 101 in a state where the pods 101 are respectively placed on the plurality.

  A pod transfer device 110 is installed between the load port 106 and the rotary pod shelf 107 in the substrate processing apparatus main body 11. The pod transfer device 110 can be moved up and down while holding the pod 101. And a pod transport mechanism 110b as a transport mechanism. The pod transport device 110 is connected to the load port 106, the rotary pod shelf 107, and the pod opener 111 by continuous operation of the pod elevator 110a and the pod transport mechanism 110b. It is comprised so that the pod 101 may be conveyed between.

  A sub-housing 112 is installed across the rear end of the substrate processing apparatus main body 11 at a lower portion in a substantially central portion in the front-rear direction. A pair of wafer loading / unloading ports 113 for loading / unloading the wafer 100 into / from the sub-casing 112 are arranged on the front wall 112a of the sub-casing 112 in two vertical rows. A pair of pod openers 111 are respectively installed at the lower wafer loading / unloading port 113. The pod opener 111 includes a mounting table 114 on which the pod 101 is mounted and a cap attaching / detaching mechanism 115 for attaching / detaching the cap of the pod. The pod opener 111 is configured to open and close the wafer loading / unloading port of the pod 101 by attaching / detaching the cap of the pod 101 placed on the placing table 114 by the cap attaching / detaching mechanism 115.

  The sub-housing 112 constitutes a transfer chamber 116 that is fluidly isolated from the installation space of the pod transfer device 110 and the rotary pod shelf 107. A wafer transfer mechanism 117 is installed in the front region of the transfer chamber 116. The wafer transfer mechanism 117 is capable of rotating or linearly moving the wafer 100 in the horizontal direction and a wafer transfer apparatus 117a. It is comprised with the wafer transfer apparatus elevator 117b for raising / lowering. As schematically shown in FIG. 1, the wafer transfer apparatus elevator 117 b is installed between the right end of the substrate processing apparatus main body 11 and the right end of the front area of the transfer chamber 116 of the sub housing 112. By continuously operating the wafer transfer device elevator 117b and the wafer transfer device 117a, the wafer 100 is loaded (charging) on the boat 118 using the tweezers 117c of the wafer transfer device 117a as the wafer 100 mounting portion. It is configured to be removed (discharged).

  In the rear area of the transfer chamber 116, a standby unit 119 that accommodates and waits for the boat 118 is configured. A processing furnace 120 is provided above the standby unit 119. A lower end portion of the processing furnace 120 is configured to be opened and closed by a furnace port shutter 121.

As schematically shown in FIG. 3, a boat elevator 122 for raising and lowering the boat 118 is installed between the right end of the substrate processing apparatus main body 11 and the right end of the standby unit 119 of the sub casing 112. ing. A seal cap 124 serving as a lid is horizontally installed on an arm 123 serving as a connecting tool connected to a lifting platform of the boat elevator 122, and the seal cap 124 supports the boat 118 vertically, and a lower end of the processing furnace 120. It is comprised so that a part can be obstruct | occluded.
The boat 118 includes a plurality of holding members, and is configured to hold a plurality of (for example, about 50 to 125) wafers 100 horizontally in a state where the centers thereof are aligned in the vertical direction. Has been.

  Further, as schematically shown in FIG. 3, a clean atmosphere or an inert gas is present at the left end of the transfer chamber 116 opposite to the wafer transfer device elevator 117b side and the boat elevator 122 side. A clean unit 126 composed of a supply fan and a dustproof filter is installed so as to supply clean air 125, and the position of the wafer in the circumferential direction is set between the wafer transfer device 117a and the clean unit 126. A notch alignment device (not shown) is installed as a substrate alignment device for alignment.

  The clean air 125 blown out from the clean unit 126 is circulated to the notch aligner / wafer transfer device 117a and the boat 118 in the standby unit 119, and is then sucked in by a duct (not shown), and the substrate processing apparatus main body 11 Is exhausted to the outside, or is circulated to the primary side (supply side) which is the suction side of the clean unit 126, and is again blown out into the transfer chamber 117 by the clean unit 126. .

[Operation of substrate processing equipment]
Next, the operation of the substrate processing apparatus 10 of the present invention will be described.
As shown in FIGS. 3 and 4, when the pod 101 is supplied to the load port 106, the pod loading / unloading port 104 is opened by the front shutter 105, and the pod 101 above the load port 106 is a pod transfer device. 110 is carried into the substrate processing apparatus main body 11 from the pod loading / unloading port 104.

  The loaded pod 101 is automatically transported and delivered by the pod transport device 110 to the designated shelf plate 109 of the rotary pod shelf 107, temporarily stored, and then one pod opener from the shelf plate 109. After being transferred to 111 and delivered and temporarily stored, it is transferred from the shelf plate 109 to one pod opener 111 and transferred to the mounting table 114, or directly transferred to the pod opener 111 and loaded. It is transferred to the mounting table 114. At this time, the wafer loading / unloading port 113 of the pod opener 111 is closed by the cap attaching / detaching mechanism 115, and clean air 125 is circulated and filled in the transfer chamber 116. For example, the transfer chamber 116 is filled with nitrogen gas as clean air 125, so that the oxygen concentration is set to 20 ppm or less, which is much lower than the oxygen concentration inside the substrate processing apparatus main body 11 (atmosphere). .

The pod 101 mounted on the mounting table 114 has its opening-side end face pressed against the opening edge of the wafer loading / unloading port 113 in the front wall 112a of the sub-housing 112, and the cap is removed by the cap attaching / detaching mechanism 123. The wafer loading / unloading port is opened.
When the pod 101 is opened by the pod opener 111, the wafer 100 is picked up from the pod 101 by the tweezer 117c of the wafer transfer device 117a through the wafer loading / unloading port, aligned with the notch alignment device (not shown), and then transferred. It is carried into the standby section 119 behind the loading chamber 116 and loaded (charged) into the boat 118. The wafer transfer device 117 a that has transferred the wafer 100 to the boat 118 returns to the pod 101 and loads the next wafer into the boat 118.

  During the loading operation of the wafer into the boat 118 by the wafer transfer mechanism 117 in the one (upper or lower) pod opener 111, the other (lower or upper) pod opener 111 receives another pod from the rotary pod shelf 107. 101 is transferred and transferred by the pod transfer device 110, and the opening operation of the pod 101 by the pod opener 111 is simultaneously performed.

When a predetermined number of wafers 100 are loaded into the boat 118, the lower end of the processing furnace 120 closed by the furnace port shutter 121 is opened by the furnace port shutter 121. Subsequently, the boat 118 holding the group of wafers 100 is loaded into the processing furnace 120 when the seal cap 124 is lifted by the boat elevator 122.
After loading, arbitrary processing is performed on the wafer 100 in the processing furnace 120.
After the processing, the wafer 100 and the pod 101 are discharged to the outside of the casing by the reverse procedure described above, except for the wafer alignment process in a notch alignment apparatus (not shown).

Next, the client 20 and the server 22 will be further described.
[Hardware configuration of client and server]
First, the hardware configuration of the client 20 and the server 22 will be described.
FIG. 5 is a diagram showing the hardware configuration of the client 20 and the server 22 with the control device 24 at the center.

  As shown in FIG. 5, the client 20 and the server 22 include a control device 24 including a CPU 26 and a memory 28, and a communication interface (hereinafter, “communication IF”) 30 that transmits and receives information to and from an external device via the network 16. And a storage device 32 such as a hard disk drive, a display device 34 such as a liquid crystal display, and an input device 36 such as a keyboard and a mouse. As described above, the client 20 and the server 22 have functions as a general computer, and execute an information processing program described later.

[Software configuration of client and server]
Next, software configurations of the client 20 and the server 22 will be described.
FIG. 6 is a diagram showing the configuration of the information processing program 38 installed in the client 20 and executed on the client 20.
As illustrated in FIG. 6, the information processing program 38 includes a user interface (hereinafter “UI”) unit 380, a user instruction transmission unit 382, a client resource table request reception unit 384, a client resource monitoring unit 386, and a client resource table storage unit. 388, a client resource table transmission unit 390 and a substrate processing information reception unit 392. With such a configuration, the client 20 requests the server 22 to transmit substrate processing information and receives the substrate processing information from the server 22.

The UI unit 380 is an instruction input by the user via the input device 36 in FIG. 5 (for example, an instruction for requesting transmission of a temperature monitor value, an MFC monitor value, an APC monitor value, and a pressure monitor value in the substrate processing information). Accept. Further, the UI unit 380 outputs the substrate processing information received by the substrate processing information receiving unit 392 to the display device 34 in FIG.
The user instruction transmission unit 382 transmits the user instruction received by the UI unit 380 to the server 22 via the communication IF 30 in FIG.
The client resource table request reception unit 384 receives a client resource table request from the server 22 via the communication IF 30.
The client resource monitoring unit 386 collects information indicating these states from the CPU 26, the memory 28, the network 16 and the like in FIG. 5 and stores them in the client resource table storage unit 388 as a client resource table in the format shown in FIG. To do.
The client resource table transmission unit 390 receives the client resource table request received from the client resource table request by the client resource table request reception unit 384 as a trigger, and sends the client resource table stored in the client resource table storage unit 388 to the server via the communication IF 30. 22 to send.
The substrate processing information receiving unit 392 receives the substrate processing information transmitted from the server 22 via the communication IF 30.

FIG. 8 is a flowchart showing an operation flow (S10) of the information processing program 38 of FIG.
As shown in FIG. 8, in step 100 (S100), it is determined whether the UI unit 380 in FIG. 6 has received an instruction from the user. When the UI unit 380 receives a user instruction, the process proceeds to step 102, and the process of step 100 is repeated until the UI unit 380 receives a user instruction.
In step 102 (S102), the user instruction transmission unit 382 in FIG. 6 transmits the user instruction received by the UI unit 380 in step 100 to the server 22.
In step 104 (S104), it is determined whether or not the substrate processing information receiving unit 392 in FIG. 6 has received all the substrate processing information from the server 22 in accordance with the user instruction received in step 100. If the substrate processing information receiving unit 392 has received all the substrate processing information as instructed by the user, the processing ends. On the other hand, if this is not the case (for example, if reception of substrate processing information has not yet started or if only part of the substrate processing information has been received), the processing proceeds to step 106.

In step 106 (S106), it is determined whether the client resource table request receiving unit 384 in FIG. 6 has received a client resource table request from the server 22. When the client resource table request receiving unit 384 receives the request for the client resource table, the process proceeds to step 108. Otherwise, the process returns to step 104.
In step 108 (S108), the client resource table transmission unit 390 of FIG. 6 reads the client resource table from the client resource table storage unit 388 and transmits it to the server 22.

FIG. 9 is a diagram showing a configuration of the information processing program 40 executed on the server 22.
As shown in FIG. 9, the information processing program 40 includes a substrate processing information receiving unit 400, a substrate processing information storage unit 402, a user instruction receiving unit 404, a transmission size determining unit 406, a client resource table request transmitting unit 408, and a client resource table. A reception unit 410, a server resource monitoring unit 412, a server resource table storage unit 414, a resource threshold storage unit 416, and a substrate processing information transmission unit 418 are included. With such a configuration, the server 22 transmits the substrate processing information acquired in the substrate processing apparatus 10 in response to a request from the client 20.

The substrate processing information receiving unit 400 receives the substrate processing information from the substrate processing apparatus 10 via the communication IF 30 in FIG. 5 and stores it in the substrate processing information storage unit 402.
The user instruction receiving unit 404 receives a user instruction from the client 20 via the communication IF 30.
The transmission size determination unit 406 determines the size (hereinafter referred to as “transmission size”) of the substrate processing information that the server 22 transmits to the client 20 in one transmission triggered by the user instruction receiving unit 404 receiving the user instruction. decide.
Specifically, the transmission size determination unit 406 determines the transmission size based on the client resource table, the server resource table, and the resource threshold.

The client resource table is received by the client resource table request transmitting unit 408 transmitting a request for the client resource table to the client 20 via the communication IF 30 at the timing when the user instruction receiving unit 404 receives the user instruction. The unit 410 receives from the client 20 via the communication IF 30.
In the server resource table, the server resource monitoring unit 412 collects information indicating these states from the CPU 26, the memory 28, the network 16, and the like in FIG. 5, and the server resource table storage unit 414 as a server resource table in the format shown in FIG. 10A, for example. The data stored in is read out.
Note that the user instruction, the client resource table, and the server resource table are collected into a resource table having a format shown in FIG. 10B, for example. 10B, (1) corresponds to the contents of the server resource table, (2) corresponds to the contents of the client resource table received from the client 20-1, and (3) corresponds to the user instruction received from the client 20-1. Corresponding to (4) corresponds to the client resource table and user instruction received from the client 20-2, and (5) corresponds to the client resource table and user instruction received from the client 20-m. That is, the resource table includes the server resource table, the client resource table of the client 20 connected to the server 22, and the contents of the client resource table of the client 20 that has been connected to the server 22.
The resource threshold value set in advance by the user, for example, the resource threshold value stored in the resource threshold value storage unit 416 as the resource threshold value in the format shown in FIG. 10C is read.

  The substrate processing information transmission unit 418 reads the substrate processing information from the substrate processing information storage unit 402 based on the user instruction received by the user instruction reception unit 404, and sets the communication IF 30 with the transmission size determined by the transmission size determination unit 406. To the client 20.

FIG. 11 is a flowchart showing an operation flow (S20) of the information processing program 40 of FIG.
As shown in FIG. 11, in step 200 (S <b> 200), it is determined whether or not the user instruction receiving unit 404 of FIG. 9 has received a user instruction from the client 20. When the user instruction receiving unit 404 receives the user instruction, the process proceeds to step 202, and the process of step 200 is repeated until the user instruction receiving unit 404 receives the user instruction.
In step 202 (S202), the client resource table request transmission unit 408 in FIG. 9 requests the client resource table from the client 20 that is the transmission source of the user instruction received in step 200.
In step 204 (S204), it is determined whether or not the client resource table receiving unit 410 in FIG. 9 has received the client resource table from the client 20. When the client resource table receiving unit 410 receives the client resource table, the process proceeds to step 206 (S206), and the processes of steps 202 to 204 are repeated until the client resource table receiving unit 410 receives the client resource table. It is.

In step 206 (S206), the client resource table received by the client resource table receiving unit 410 is output to the transmission size determining unit 406 in FIG. The transmission size determination unit 406 reads the server resource table from the server resource table storage unit 414 in FIG. 9 and also reads the resource threshold value from the resource threshold storage unit 416 in FIG.
In step 208 (S208), the transmission size determination unit 406 determines the transmission size based on the client resource table output in step 206, the server resource table read in step 206, and the resource threshold.
Specifically, the transmission size determination unit 406 determines the transmission size of the client 20 based on the client resource table, server resource table, and resource threshold of the client. For example, when determining the transmission size of the client 20-1, the transmission size is determined based on the client resource table of the client 20-1, the server resource table of the server 22 from which the substrate processing information is acquired, and the resource threshold.
The transmission size of the client 20 in which the resource usage rate of at least one of the client resource table and the server resource table exceeds the maximum value set by the resource threshold is determined to be 0, and the transmission size of the other client 20 is, for example, a client resource The higher the resource usage rate of the table, the smaller the number of transmissions (the number of times the server 22 transmits the substrate processing information to the client 20).

In step 210 (S210), it is determined whether or not the transmission size determined in step 208 is non-zero. If the transmission size is non-zero, the process proceeds to step 212; otherwise, the processes of steps 202 to 210 are repeated.
In step 212 (S212), the substrate processing information transmission unit 418 in FIG. 9 reads the substrate processing information from the substrate processing information storage unit 402 in FIG. 9 based on the user instruction received in step 200, and is determined in step 208. It transmits to the client 20 with a transmission size.
In step 214 (S214), it is determined whether or not the substrate processing information transmission unit 418 has transmitted all the substrate processing information in accordance with the user instruction received in step 200. If the substrate processing information transmission unit 418 has transmitted all the substrate processing information as instructed by the user, the processing ends. On the other hand, if not (for example, when only a part of the substrate processing information is transmitted), the processing of steps 202 to 214 is repeated until all the substrate processing information is transmitted according to the user instruction.

DESCRIPTION OF SYMBOLS 1 Information processing system 10 Substrate processing apparatus 12 Client 14 Server 16 Network 2 Information processing system 20 Client 22 Server 38 Information processing program 40 Information processing program

Claims (1)

A transmitting device for transmitting information and a receiving device for receiving information;
The transmitter is
A storage unit for storing information;
A control unit that controls transmission of information stored in the storage unit to the receiving device based on a resource state of the receiving device and a resource state of the transmitting device in response to a request from the receiving device;
A transmission unit that transmits information stored in the storage unit to the reception device based on the control by the control unit;
The receiving device is:
A transmission request unit that requests the transmission unit to transmit information stored in the storage unit;
A receiving unit that receives information stored in the storage unit from the transmission unit;

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