JP2010102430A - Substrate processing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing system achieving improvement in security and operability. <P>SOLUTION: The substrate processing system has a substrate processing device processing a substrate and a control device editing and operating control data for controlling the processing device, wherein the control device includes an authentication means for authenticating an operator; an acceptance means for accepting editing and operation of the control data from the authenticated operator; and an invalidation means for storing edited content to invalidate the authentication of the authenticated operator if the control data has been finally edited before predetermined time when the predetermined time passes in a state in which the editing and the operation of the control data is not accepted, and invalidating the authentication of the authenticated operator after completing the operation of the control data if the control data has been finally operated before the predetermined time. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a substrate processing system for processing a substrate such as a semiconductor substrate or a glass substrate.

This type of substrate processing system includes a substrate processing apparatus and a remote terminal. The substrate processing apparatus is controlled based on various parameters and recipes. A dedicated application is installed in the remote terminal, and the user using the remote terminal accesses the substrate processing apparatus via the network by starting the application and logging in, and edits and manipulates parameters and recipes. Can do.
When there are an unspecified number of users who use a remote terminal, after a user (user A) logs in and works, he leaves the remote terminal without logging out, and another user (user B) There is a risk of pretending to work.
In order to solve such a security problem, for example, when a user disconnects a session without logging out and another user connects the session again, a warning screen as shown in FIG. 1 is displayed. A technique for prompting another user to log out is known.
However, it is very complicated for the user to be prompted to log out in this way.

  The present invention has been made from the above-described background, and an object thereof is to provide a substrate processing system that realizes improvements in security and operability.

  To achieve the above object, a substrate processing system according to the present invention includes a substrate processing apparatus that processes a substrate, and a control that controls the substrate processing apparatus by editing and operating control data for controlling the substrate processing apparatus. A substrate processing system having an apparatus, wherein the control device authenticates an operator of the control device, and accepting means for receiving control data editing and operation from the operator authenticated by the authentication device And when the predetermined time has passed without the editing and operation of the control data being accepted by the accepting means, and the control data has been edited last time before the predetermined time, the editing And the control data is lastly operated before a predetermined time before the authentication of the operator authenticated by the authentication means is invalidated. The, after the operation of the control data is completed, a substrate processing system and a disabling means for disabling the authentication of the authenticated operator by the authentication means.

  Preferably, the operation of the control data is copy, deletion and movement of the control data.

  Preferably, the invalidation means does not accept the editing and operation of the control data by the accepting means, and if the predetermined time has passed and the control data has been edited immediately before, the edited control data Is stored in the buffer.

  Preferably, when the operator authenticated by the authenticating unit is authenticated again, the receiving unit receives editing and operation of control data stored in the buffer from the re-authenticated operator.

  Preferably, a buffer in which control data is stored by the invalidating means is provided for each operator.

  According to the substrate processing system of the present invention, since impersonation of the user is prevented without prompting re-login, security and operability can be improved.

[Overall configuration of substrate processing system 1]
Hereinafter, the best mode for carrying out the present invention will be described with reference to the drawings.
FIG. 2 is a diagram showing a configuration of the substrate processing system 1 according to the embodiment of the present invention.
As shown in FIG. 2, the substrate processing system 1 includes substrate processing apparatuses 10-1 to 10-n, a router 16, and an external operation device 17, which can communicate with each other via a communication network 18 such as a LAN. It is connected like that.
With such a configuration, in the substrate processing system 1, the substrate processing apparatuses 10-1 to 10-n receive control from the external operation device 17.

In addition, when any of the plurality of substrate processing apparatuses 10-1 to 10-n that can exist is shown without being specified, it is abbreviated as the substrate processing apparatus 10 or the like.
Hereinafter, in each drawing, the same code | symbol is attached | subjected to the substantially same component.

[Substrate processing apparatus 10]
Each of the substrate processing apparatuses 10 includes a substrate processing apparatus main body 11. Further, the substrate processing apparatus main body 11 includes a main controller 12, a switching hub 13, an operation device 14, and a video cable 15, respectively.
On the outer wall of the substrate processing apparatus main body 11 (for example, the back side of the substrate processing apparatus 10 (the left side in FIG. 2)), an operation device 14 is mounted. The operating device 14 is connected to the main controller via a video cable.
Further, an external operating device 17 is connected to the substrate processing apparatus 10 so as to be connected to the main controller 12 via the switching hub 13.
Details of the substrate processing apparatus 10 will be described later.

[Main controller 12]
The main controller 12 is used as a control means for controlling at least a processing furnace (described later), and the substrate processing apparatus 10 is controlled by the main controller 12. Further, the main controller 12 accepts editing and operation on parameters and recipes related to the substrate processing apparatus 10 from the operation device 14 and the external operation device 17 via the video cable 15 and the communication network 18. For example, when the main controller 12 accepts editing of a parameter related to a motor (described later), the main controller 12 reflects the received editing content on the transport control unit (described later). When the main controller 12 accepts editing of parameters related to the heater (described later), the main controller 12 reflects the accepted editing content on the process control unit (described later).

Here, the parameters relating to the substrate processing apparatus 10 include, for example, a user who operates the substrate processing apparatus 10, an authority parameter that defines operation authority set in advance according to a group to which the user belongs, and a function operated by the user. Function control parameters to be limited. Moreover, the recipe regarding the substrate processing apparatus 10 is an operation recipe which consists of a some process, for example.
Parameters and recipes related to the substrate processing apparatus 10 are stored in a file format in a RAM (described later) of a control unit related to the parameters and recipes. For example, parameters and recipes related to the motor are stored in the RAM of the transfer control unit, and parameters and recipes related to the heater are stored in the RAM of the process control unit.
Hereinafter, changing at least part of parameters and recipes stored in the file format related to the substrate processing apparatus 10 will be referred to as “file editing”, and copying, deleting, and moving will be referred to as “file operations”.

[Operation device 14]
The operating device 14 is disposed in the vicinity of the substrate processing apparatus 10. Here, the operating device 14 is mounted on the substrate processing apparatus body 11, but may be integrated with the substrate processing apparatus 10 or may be separated from the substrate processing apparatus 10.
Here, the operating device 14 is arranged in the vicinity of the substrate processing apparatus 10 means that the operating device 14 is arranged at a position where a user operating the substrate processing apparatus 10 can check the state of the substrate processing apparatus 10. Say.

The operation device 14 includes, for example, a display device (not shown) composed of a liquid crystal display panel.
When a CPU (not shown) of the operation device 14 executes a display control program (described later), at least a screen for performing user authentication, file editing, and file operation is displayed on the display device.

[External operation device 17]
The external operation device 17 has a display device similar to the operation device 14, and also in the external operation device 17, a CPU (not shown) of the external operation device 17 executes a display control program (described later), thereby displaying the display device. At least a screen for performing user authentication, file editing, and file operation is displayed.
The external operation device 17 is made of, for example, WBT (Windows (registered trademark) -Based Terminal). The WBT is a dedicated terminal for connecting to a server on which the above TSE operates via a network for processing.
The external operation device 17 is disposed in the vicinity of the substrate processing apparatus 10 (or the substrate processing apparatus main body 11). Here, the external operating device 17 is configured to be directly connected to the substrate processing apparatus main body 11 and to access the main controller via the switching hub 13, but is connected to the substrate processing apparatus main body 11 via the router 16. May be.
Here, one external operation device 17 is configured to be connected to one substrate processing apparatus 10, but a plurality of external operation devices 17 are connected to one substrate processing apparatus 10. It may be configured.
The external operating device 17 may be installed in a clean room where the substrate processing apparatus 10 is installed, or may be installed on another floor.

[Detailed Configuration of Substrate Processing Apparatus 10]
FIG. 3 shows the substrate processing apparatus 10 using a perspective view. FIG. 4 shows the substrate processing apparatus 10 using a side perspective view.
The substrate processing apparatus 10 processes a wafer 100 made of silicon or the like used as a substrate.

As shown in FIGS. 3 and 4, the substrate processing apparatus 10 includes a substrate processing apparatus main body 11. In the substrate processing apparatus 10, a hoop (substrate container; hereinafter referred to as a pod) 101 that is used as a wafer carrier storing the wafer 100 is used.
A front maintenance port 102 used as an opening provided for maintenance is installed in the front front portion of the front wall 11a of the substrate processing apparatus main body 11, and a front maintenance door 103 for opening and closing the front maintenance port 102 is installed. It has been. An operation unit (not shown) is installed in the vicinity of the upper front maintenance door 103.

A pod loading / unloading port 104 is opened on the front wall 11 a of the substrate processing apparatus body 11 so as to communicate with the inside and outside of the substrate processing apparatus body 11, and the pod loading / unloading unit 104 is opened and closed by the front shutter 105. It has become.
A load port 106 is installed on the front front side of the pod loading / unloading unit 104, and the load port 106 is configured so that the pod 101 is placed and aligned. The pod 101 is loaded onto the load port 106 by an in-process transfer device (not shown) and unloaded from the load port 106.

  A rotary pod shelf 107 is installed at an upper portion of the substrate processing apparatus main body 11 in a substantially central portion in the front-rear direction, and the rotary pod shelf 107 is configured to store a plurality of pods 101. That is, the rotary pod shelf 107 includes a column 108 that is vertically installed and intermittently rotates in a horizontal plane, and a plurality of shelf plates 109 that are radially supported by the column 108 at each of the upper, middle, and lower levels. The plurality of shelves 109 are configured to hold the pods 101 in a state where the pods 101 are respectively placed on the plurality.

  A pod transfer device 110 is installed between the load port 106 and the rotary pod shelf 107 in the substrate processing apparatus main body 11. The pod transfer device 110 can be moved up and down while holding the pod 101. And a pod transport mechanism 110b as a transport mechanism. The pod transport device 110 is connected to the load port 106, the rotary pod shelf 107, and the pod opener 111 by continuous operation of the pod elevator 110a and the pod transport mechanism 110b. It is comprised so that the pod 101 may be conveyed between.

  A sub-housing 112 is installed across the rear end of the substrate processing apparatus main body 11 at a lower portion in a substantially central portion in the front-rear direction. A pair of wafer loading / unloading ports 113 for loading / unloading the wafer 100 into / from the sub-casing 112 are arranged on the front wall 112a of the sub-casing 112 in two vertical rows. A pair of pod openers 111 are respectively installed at the lower wafer loading / unloading port 113. The pod opener 111 includes a mounting table 114 on which the pod 101 is mounted and a cap attaching / detaching mechanism 115 for attaching / detaching the cap of the pod. The pod opener 111 is configured to open and close the wafer loading / unloading opening of the pod 101 by attaching / detaching the cap of the pod 101 placed on the placing table 114 by the cap attaching / detaching mechanism 115.

  The sub-housing 112 constitutes a transfer chamber 116 that is fluidly isolated from the installation space of the pod transfer device 110 and the rotary pod shelf 107. A wafer transfer mechanism 117 is installed in the front region of the transfer chamber 116. The wafer transfer mechanism 117 is capable of rotating or linearly moving the wafer 100 in the horizontal direction and a wafer transfer apparatus 117a. It is comprised with the wafer transfer apparatus elevator 117b for raising / lowering. As schematically shown in FIG. 3, the wafer transfer apparatus elevator 117 b is installed between the right end of the substrate processing apparatus main body 11 and the right end of the front area of the transfer chamber 116 of the sub-housing 112. By the continuous operation of the wafer transfer device elevator 117b and the wafer transfer device 117a, the wafer 100 is loaded (charging) on the boat 118 with the tweezer 117c of the wafer transfer device 117a as the placement portion of the wafer 100. It is configured to be removed (discharged).

  In the rear area of the transfer chamber 116, a standby unit 119 that accommodates and waits for the boat 118 is configured. A processing furnace 120 is provided above the standby unit 119. A lower end portion of the processing furnace 120 is configured to be opened and closed by a furnace port shutter 121.

As schematically shown in FIG. 3, a boat elevator 122 for raising and lowering the boat 118 is installed between the right end of the substrate processing apparatus main body 11 and the right end of the standby unit 119 of the sub casing 112. ing. A seal cap 124 serving as a lid is horizontally installed on an arm 123 serving as a connecting tool connected to a lifting platform of the boat elevator 122, and the seal cap 124 supports the boat 118 vertically, and a lower end of the processing furnace 120. It is comprised so that a part can be obstruct | occluded.
The boat 118 includes a plurality of holding members, and is configured to hold a plurality of (for example, about 50 to 125) wafers 100 horizontally in a state where the centers thereof are aligned in the vertical direction. Has been.

  Further, as schematically shown in FIG. 3, a clean atmosphere or an inert gas is present at the left end of the transfer chamber 116 opposite to the wafer transfer device elevator 117b side and the boat elevator 122 side. A clean unit 126 composed of a supply fan and a dustproof filter is installed so as to supply clean air 125, and the position of the wafer in the circumferential direction is set between the wafer transfer device 117a and the clean unit 126. A notch alignment device (not shown) is installed as a substrate alignment device for alignment.

  The clean air 125 blown out from the clean unit 126 is circulated to the notch aligner / wafer transfer device 117a and the boat 118 in the standby unit 119, and is then sucked in by a duct (not shown), and the substrate processing apparatus body 11 Is exhausted to the outside, or is circulated to the primary side (supply side) which is the suction side of the clean unit 126, and is again blown out into the transfer chamber 117 by the clean unit 126. .

[Operation of the substrate processing apparatus 10]
Next, the operation of the substrate processing apparatus 10 of the present invention will be described.
As shown in FIGS. 3 and 4, when the pod 101 is supplied to the load port 106, the pod loading / unloading port 104 is opened by the front shutter 105, and the pod 101 above the load port 106 is a pod transfer device. 110 is carried into the substrate processing apparatus main body 11 from the pod loading / unloading port 104.

  The loaded pod 101 is automatically transported and delivered by the pod transport device 110 to the designated shelf plate 109 of the rotary pod shelf 107, temporarily stored, and then one pod opener from the shelf plate 109. After being transferred to 111 and delivered and temporarily stored, it is transferred from the shelf plate 109 to one pod opener 111 and transferred to the mounting table 114, or directly transferred to the pod opener 111 and loaded. It is transferred to the mounting table 114. At this time, the wafer loading / unloading port 113 of the pod opener 111 is closed by the cap attaching / detaching mechanism 115, and clean air 125 is circulated and filled in the transfer chamber 116. For example, the transfer chamber 116 is filled with nitrogen gas as clean air 125, so that the oxygen concentration is set to 20 ppm or less, which is much lower than the oxygen concentration inside the substrate processing apparatus body 11 (atmosphere). .

The pod 101 mounted on the mounting table 114 has its opening-side end face pressed against the opening edge of the wafer loading / unloading port 113 in the front wall 112a of the sub-housing 112, and the cap is removed by the cap attaching / detaching mechanism 123. The wafer loading / unloading port is opened.
When the pod 101 is opened by the pod opener 111, the wafer 100 is picked up from the pod 101 by the tweezer 117c of the wafer transfer device 117a through the wafer loading / unloading port, aligned with the wafer by a notch alignment device (not shown), and then transferred. It is carried into the standby section 119 behind the loading chamber 116 and loaded (charged) into the boat 118. The wafer transfer device 117 a that has transferred the wafer 100 to the boat 118 returns to the pod 101 and loads the next wafer into the boat 118.

  During the loading operation of the wafer into the boat 118 by the wafer transfer mechanism 117 in the one (upper or lower) pod opener 111, the other (lower or upper) pod opener 111 receives another pod from the rotary pod shelf 107. 101 is transferred and transferred by the pod transfer device 110, and the opening operation of the pod 101 by the pod opener 111 is simultaneously performed.

  When a predetermined number of wafers 100 are loaded into the boat 118, the lower end of the processing furnace 120 closed by the furnace port shutter 121 is opened by the furnace port shutter 121. Subsequently, the boat 118 holding the group of wafers 100 is loaded into the processing furnace 120 when the seal cap 124 is lifted by the boat elevator 122.

After loading, arbitrary processing is performed on the wafer 100 in the processing furnace 120.
After the processing, the wafer 100 and the pod 101 are ejected to the outside of the casing by the reverse procedure described above except for the wafer alignment process in a notch alignment apparatus (not shown).

[Hardware configuration of substrate processing system 1]
Hereinafter, a hardware configuration in the substrate processing system 1 will be described.
FIG. 5 is a diagram illustrating a hardware configuration of the substrate processing system 1.
As shown in FIG. 5, the substrate processing apparatus main body 11 in the substrate processing apparatus 10 includes a transfer controller 19 and a process controller 21 in addition to the main controller 12, the switching hub 13, the operating device 14, and the video cable 15 described above. Have.

The transfer control unit 19 includes a transfer system controller 20 including a CPU, for example, and the process control unit 21 includes a process system controller 22 including a CPU, for example. The transport system controller 20 and the process system controller 22 are connected to the main controller 12 via the switching hub 13.
Details of the transfer system controller 20 and the process system controller 22 will be described later.

[Transport control unit 19]
FIG. 6 shows details of the transport control unit 19.
As shown in FIG. 6, the transport control unit 19 includes the transport system controller 20 described above, a ROM (Read Only Memory) 200, a RAM (Random Access Memory) 201, a motor driver 202, a motor driver 203, and An I / O control unit 204 that performs I / O control with the motor driver 202 and the motor driver 203 is included. The ROM 200 and RAM 201 store parameters and recipes related to the motor 205 and the motor 206.
The transfer system controller 20 reflects the contents of file editing and file operations on the display devices of the operation device 14 and the external operation device 17 in parameters and recipes stored in the RAM 201 and the like, and based on the reflected parameters and recipes. Then, control data for transporting the substrate is output to the motor driver 202 and the motor driver 203.
The motor driver 202 and the motor driver 203 control the transfer of the wafer 100 in the substrate processing system 1 by using a motor 205 and a motor 206 that are used as drive sources for transferring the substrate.

[Process control unit 21]
FIG. 7 shows details of the process control unit 21.
As shown in FIG. 7, the process control unit 21 includes the process system controller 22 described above, and includes a ROM 200, a RAM 201, a temperature control unit 207, a gas control unit 208, a pressure control unit 209, a temperature control unit 207, and the like. And an I / O control unit 204 that performs I / O control. The ROM 200 and the RAM 201 store parameters and recipes related to the processing furnace 120, the heater 210, the MFC (mass flow controller) 211, the gas pipe 212, the exhaust pipe 213, the pressure sensor 214, and the valve 215 described above.
The process system controller 22 reflects the contents of file editing and file operations on the display devices of the operation device 14 and the external operation device 17 in the parameters and recipes stored in the RAM 201 and the like, and based on the reflected parameters and recipes. Then, control data for processing the substrate is output to the temperature control unit 207, the gas control unit 208, and the pressure control unit 209.

The temperature control unit 207 controls the temperature in the processing furnace 120 by a heater 210 provided on the outer periphery of the processing furnace 120.
The gas control unit 208 controls the supply amount of the reaction gas supplied into the processing furnace 120 based on the output value from the MFC (mass flow controller) 211 provided in the gas pipe 212 of the processing furnace 120.
The pressure control unit 209 controls the pressure in the processing furnace 120 by opening and closing the valve 215 based on the output value of the pressure sensor 214 provided in the exhaust pipe 213 of the processing furnace 120.
As described above, the sub-controller such as the temperature control unit 207 controls each part (the heater 210, the MFC 211, the valve 215, and the like) of the substrate processing apparatus 10 based on the control data from the process system controller 22.

[Display control program 23]
FIG. 8 is a diagram showing a functional configuration of the display control program 23 executed in the operation device 14 and the external operation device 17 described above.
As illustrated in FIG. 8, the display control program 23 includes a user interface (UI unit) 24, an authentication unit 25, an authentication information storage unit 26, a session monitoring unit 27, a session information storage unit 28, and an operation control unit 29.
The display control program 23 is stored in an external storage medium (not shown) such as a floppy (registered trademark) disk and a CD-ROM, supplied to the operating device 14 and the external operating device 17, and loaded into a memory (not shown). Then, it is executed on the operating system (not shown) operating on the operation device 14 and the external operation device 17 by specifically using hardware resources.
The display control program 23 may be supplied from a computer connected to the communication network 18 described above.

[UI unit 24]
In the display control program 23, the UI unit 24 accepts a user's work on a display device (not shown) and outputs it to each component of the display control program 23. For example, when accepting a user name and password for user authentication, the UI unit 24 outputs them to the authentication unit 25, and when accepting file editing and file operations, outputs them to the operation control unit 30. In addition, the UI unit 24 displays data created by each component of the display control program 23 and processing contents of each component on the display device. For example, when the user authentication by the authentication unit 25 fails, the UI unit 24 displays that fact on the display device, and when the operation control unit 29 automatically logs out, displays that fact on the display device. .

[Authentication unit 25]
The authentication unit 25 determines whether the user name and password received from the UI unit 24 match any of the user name and password registered in advance in the authentication information storage unit 26. If the authentication unit 25 determines that they match, the authentication unit 25 determines that the operator of the display device is a legitimate user (successful user authentication), and permits the operator of the display device to perform file editing and file operation. On the other hand, if this is not the case, it is determined that the operator of the display device is not a legitimate user (user authentication has failed), and file editing and file operations are prohibited for the operator of the display device.
Further, the authentication unit 25 transmits such a user authentication history to the authentication information storage unit 26, and transmits the name of the user who has succeeded in authentication to the session information storage unit 28.

[Authentication Information Storage Unit 26]
For example, as illustrated in FIG. 9, the authentication information storage unit 26 includes data items such as a user name, a password, and a login history.
The user name and password are registered in advance by an administrator of the substrate processing system 1 or the like. The login history is stored as a history of user authentication when user authentication is performed by the authentication unit 25 described above.

[Session monitoring unit 27]
For example, the session monitoring unit 27 inquires about the connection state of the session by executing an API (for example, WTSQuerySessionInformation) to the OS at intervals of one second.
Furthermore, the session monitoring unit 27 updates the connection state of the session information storage unit 28 according to the inquired connection state. For example, when the inquired connection state is active, the session monitoring unit 27 updates the connection state in the session information storage unit 28 to become active. On the other hand, the session monitoring unit 27 notifies the operation control unit 29 of a session disconnection event when the inquired connection state is disconnected and the connection state stored in the session information storage unit 28 is active. The connection state of the session information storage unit 28 is updated. The session disconnection event is, for example, that the UI unit 24 does not accept processing by the user within a predetermined time.

[Session Information Storage Unit 28]
For example, as shown in FIG. 10, the session information storage unit 28 includes data items such as a user name and a connection state. As the user name, the one transmitted from the authentication unit 25 is set, and as the connection state, the initial value “disconnected” is set here.

[Operation control unit 29]
The operation control unit 29 outputs the content of the process performed by the user received from the UI unit 24 to the main controller 12 described above. Further, the operation control unit 29 automatically logs out appropriately when a session disconnection event is notified from the session monitoring unit 27.
Specifically, when the process accepted from the UI unit 24 immediately before the occurrence of the session disconnection event is file editing, the operation control unit 29 does not reflect the edited content (that is, the edited content has been edited). Discard the content and save it as it was before it was edited), and end the session (logout). The operation control unit 29 may end the session after the edited content is stored in a buffer file (not shown) created in advance. The buffer file may be accessible by the same user logging in again. Also, the buffer file may be provided for each user.
In addition, when the process accepted from the UI unit 24 immediately before the occurrence of the session disconnection event is a file operation, the operation control unit 29 checks whether or not the file operation is completed at a predetermined time interval. After confirming that the file operation is finished, end the session.
The operation control unit 29 updates the login history of the authentication information storage unit 26 when the session is terminated.

FIG. 11 is a screen displayed by the UI unit 24 described above.
FIG. 11A is a main screen displayed by the UI unit 24. The main screen is an initial screen displayed when execution of the display control program 23 is started.
As shown in FIG. 11A, a login button 30 for user authentication appears on the main screen.

FIG. 11B is an authentication screen displayed by the UI unit 24. The authentication screen is switched to this authentication screen when the login button 30 is pressed on the main screen.
As shown in FIG. 11B, the authentication screen includes a user name input unit 31 that is a form for inputting a user name, a password input unit 32 that is a form for inputting a password, and the input user name and password. A confirm button 33 for confirming appears.

FIG. 11C is a menu screen displayed by the UI unit 24. The menu screen is switched to this menu screen when the confirmation button 33 is pressed on the authentication screen and the user authentication is successful based on the input user name and password.
As shown in FIG. 11C, a file edit button 34 and a file operation button display unit 35 appear on the menu screen. Here, a file copy button 36, a file delete button 37, and a file move button 38 appear as file operation buttons.

FIG. 12 is a flowchart for explaining the overall operation (S10) of the display control program 23.
In step 100 (S100), the UI unit 24 described above displays the main screen shown in FIG. 11A.
In step 101 (S101), the UI unit 24 determines whether or not the login button 30 on the main screen has been pressed. If it is determined that the login button 30 has been pressed, the process proceeds to step 102. On the other hand, if not, the determination in step 101 is repeated.
In step 102 (S102), the UI unit 24 displays the authentication screen shown in FIG. 11B.
In step 103 (S103), the authentication unit 25 described above performs user authentication based on the user name input to the user name input unit 31 and the password input to the password input unit 32 on the authentication screen. If the user authentication is successful, the process proceeds to step 104; otherwise, the determination in step 103 is repeated.

In step 104 (S104), a new session is created for the user who succeeded in the authentication in step 103 to edit and manipulate the file, and a session ID is assigned to the user.
Further, the initial value of the connection state is stored in the session information storage unit 28 described above, and the process proceeds to step 105 and step 108. Note that the processing in steps 105 to 107 and the processing in steps 108 to 109 are performed in parallel, and the processing in step 107 proceeds to automatic logout processing (S30) with the event detection in step 110 as a trigger.
In step 105 (S105), the UI unit 24 displays the menu screen shown in FIG. 11C.
In step 106 (S106), the UI unit 24 determines whether or not a button on the menu screen has been pressed. If it is determined that any button has been pressed, the process proceeds to step 107. On the other hand, if not, the determination in step 106 is repeated.

In step 107 (S107), the UI unit 24 accepts the user's work on the display device. In step 107, if the operation control unit 29 receives a session disconnection event in step 109, the operation control unit 29 proceeds to an automatic logout process (S30).
In step 108 (S108), the session monitoring unit 27 described above determines whether or not a predetermined time has elapsed since the session was created in step 104. When it is determined that a predetermined time has elapsed, the process proceeds to session monitoring processing (S20). On the other hand, if not, the determination in step 108 is repeated.
In step 109 (S109), the operation control unit 29 described above determines whether a session disconnection event has been received from the session monitoring unit 27. If it is determined that a session disconnection event has been received, the process proceeds to an automatic logout process (S30). If not, the process returns to step 108.

FIG. 13 is a flowchart for explaining the session monitoring process (S20).
In step 200 (S200), the above-described session monitoring unit 27 inquires about the connection state of the session, and proceeds to the process of step 201.
In step 201 (S201), it is determined whether the connection state inquired in step 201 is active or disconnected. If the inquired connection state is disconnected, the process proceeds to step 202. If active, the process proceeds to step 203.
In step 202 (S202), it is determined whether the connection state stored in the session information storage unit 28 of the session determined to be disconnected in step 201 is active or disconnected. . When the connection state of the session information storage unit 28 is active, the process proceeds to step 204, and when it is disconnected, the session monitoring process is terminated.

In step 203 (S203), the session monitoring unit 27 updates the connection state of the session information storage unit 28 to become active.
In step 204 (S204), the session monitoring unit 27 notifies the operation control unit 29 of a session disconnection event, and the process proceeds to step 205.
In step 205 (S205), the session monitoring unit 27 updates the connection state of the session information storage unit 28 to be disconnected.

FIG. 14 is a flowchart illustrating the automatic logout process (S30) described above.
In step 300 (S300), the operation control unit 29 determines whether the process accepted in step 107 described above is file editing. If it is determined that the user is editing a file, the process proceeds to step 303; otherwise, the process proceeds to step 301.
In step 301 (S301), the operation control unit 29 determines whether or not the process accepted in step 107 is a file operation. If it is determined that the user is operating a file, the process proceeds to step 302; otherwise, the process proceeds to step 304.
In step 302 (S302), the operation control unit 29 determines whether or not a predetermined time has elapsed since the determination in step 301. If it is determined that a predetermined time has elapsed, the process returns to the determination in step 301. If not, the determination in step 302 is repeated.

In step 303 (S303), the contents determined to be being edited in step 300 are not reflected, and the process proceeds to step 304.
In step 304 (S304), the UI unit 24 switches the menu screen displayed in step 105 to the main screen, and proceeds to the processing in step 305.
In step 305 (S305), the operation control unit 29 ends the session created in step 104 and updates the login history in the authentication information storage unit 26.

  As described above, when a session disconnection event is detected after the user is authenticated, the authenticated user is automatically logged out, so that the user does not need to log out manually.

  In addition, the substrate processing apparatus 10 which comprises the substrate processing system which concerns on this invention is applied not only to a semiconductor manufacturing apparatus but to the apparatus which processes glass substrates, such as an LCD apparatus. The substrate processing apparatus 10 constituting the substrate processing system according to the present invention is also applied to an exposure apparatus, a coating apparatus, a drying apparatus, a heating apparatus, and the like, which are other substrate processing apparatuses. Moreover, the substrate processing apparatus 10 which comprises the substrate processing system which concerns on this invention does not limit the process in a furnace, forms the film | membrane containing a process which forms CVD, PVD, an oxide film, nitriding diffusion, and a metal. A film forming process including a process can be performed. Furthermore, the substrate processing apparatus 10 constituting the substrate processing system according to the present invention can perform annealing, oxidation, nitriding, diffusion, and the like.

It is a warning screen displayed in a prior art. 1 is a diagram showing a configuration of a substrate processing system 1 according to an embodiment of the present invention. It is the substrate processing apparatus 10 shown using a perspective view. It is the substrate processing apparatus 10 shown using a side perspective view. 2 is a diagram showing a hardware configuration of a substrate processing system 1. FIG. Details of the conveyance control unit 19 are described. Details of the process control unit 21 are described. It is a figure which shows the function structure of the display control program 23 performed in the operating device 14 and the external operating device 17. It is an example of the authentication information memorize | stored in the authentication information storage part 26. FIG. 4 is an example of session information stored in a session information storage unit 28. 3 is a main screen displayed by the UI unit 24. FIG. 4 is an authentication screen displayed by the UI unit 24. 3 is a menu screen displayed by the UI unit 24. FIG. It is a flowchart explaining the whole operation | movement (S10) of the display control program 23. It is a flowchart explaining a session monitoring process (S20). It is a flowchart explaining an automatic logout process (S30).

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing system 10 Substrate processing apparatus 11 Substrate processing apparatus main body 12 Main controller 13 Switching hub 14 Operation apparatus 15 Video cable 16 Router 17 External operation apparatus 18 Communication network 19 Conveyance control part 20 Conveyance system controller 21 Process control part 22 Process system controller 23 Display control program 24 UI unit 25 Authentication unit 26 Authentication information storage unit 27 Session information storage unit 28 Session monitoring unit 29 Operation control unit 30 Login button 31 User name input unit 32 Password input unit 33 Confirm button 34 File edit button 35 File operation Button display section 36 File copy button 37 File delete button 38 File move button 100 Wafer 101 Pod 102 Front maintenance port 103 Front maintenance Door 104 pod loading / unloading port 105 front shutter 106 load port 107 rotary pod shelf 108 column 109 substrate container mounting table 110 pod transfer device 111 pod opener 112 sub casing 113 wafer loading / unloading port 114 mounting table 115 cap attaching / detaching mechanism 116 Transfer chamber 117 Wafer transfer mechanism 118 Boat 119 Standby section 120 Processing furnace 121 Furnace shutter 122 Boat elevator 123 Arm 124 Seal cap 125 Clean air 126 Clean unit 200 ROM
201 RAM
202 Motor Driver 203 Motor Driver 204 I / O Control Unit 205 Motor 206 Motor 207 Temperature Control Unit 208 Gas Control Unit 209 Pressure Control Unit 210 Heater 211 MFC
212 Gas piping 213 Exhaust piping 214 Pressure sensor 215 Valve

Claims (1)

A substrate processing system comprising: a substrate processing apparatus that processes a substrate; and a control device that controls and controls the substrate processing apparatus by editing and operating control data for controlling the substrate processing apparatus,
The control device includes:
Authentication means for authenticating an operator of the control device;
Receiving means for receiving control data editing and operation from an operator authenticated by the authentication means;
When the predetermined time has passed without the editing and operation of the control data being accepted by the accepting means, and the control data has been edited last before the predetermined time, the edited data has been edited. The content is saved, the authentication of the operator authenticated by the authentication means is invalidated, and when the control data is last operated before a predetermined time, after the operation of the control data is completed, the authentication And a disabling unit for disabling the authentication of the operator authenticated by the unit.

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